CA1031673A - Method of making n-type amorphous semiconductor material - Google Patents

Method of making n-type amorphous semiconductor material

Info

Publication number
CA1031673A
CA1031673A CA201,660A CA201660A CA1031673A CA 1031673 A CA1031673 A CA 1031673A CA 201660 A CA201660 A CA 201660A CA 1031673 A CA1031673 A CA 1031673A
Authority
CA
Canada
Prior art keywords
making
semiconductor material
amorphous semiconductor
type amorphous
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA201,660A
Other languages
French (fr)
Other versions
CA201660S (en
Inventor
Howard K. Rockstad
Richard A. Flasck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Application granted granted Critical
Publication of CA1031673A publication Critical patent/CA1031673A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/26Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups H01L29/16, H01L29/18, H01L29/20, H01L29/22, H01L29/24, e.g. alloys
    • H01L29/263Amorphous materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
CA201,660A 1973-07-02 1974-06-04 Method of making n-type amorphous semiconductor material Expired CA1031673A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/375,794 US3983076A (en) 1973-07-02 1973-07-02 N-type amorphous semiconductor materials

Publications (1)

Publication Number Publication Date
CA1031673A true CA1031673A (en) 1978-05-23

Family

ID=23482373

Family Applications (1)

Application Number Title Priority Date Filing Date
CA201,660A Expired CA1031673A (en) 1973-07-02 1974-06-04 Method of making n-type amorphous semiconductor material

Country Status (7)

Country Link
US (1) US3983076A (en)
JP (1) JPS5039467A (en)
CA (1) CA1031673A (en)
DE (1) DE2429507A1 (en)
GB (1) GB1477670A (en)
IT (1) IT1025022B (en)
NL (1) NL7408935A (en)

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JPS5846452B2 (en) * 1976-02-20 1983-10-17 株式会社日立製作所 Vapor deposition method of yalium oxide thin film for image pickup tube photoelectric conversion target
JPS585849B2 (en) * 1976-02-20 1983-02-02 株式会社日立製作所 Method for depositing cerium oxide thin film
JPS5683050A (en) * 1979-12-12 1981-07-07 Toshiba Corp Semiconductor device
JPS57151735U (en) * 1981-02-10 1982-09-24
JPS57132530U (en) * 1981-02-10 1982-08-18
BR8601387A (en) * 1985-03-29 1986-12-02 Raychem Ltd DEVICE TO PROTECT AN ELECTRIC CIRCUIT, ELECTRIC CIRCUIT, ELECTRIC COMPONENT AND USE OF AN AMORPUS COMPOSITION
EP0242902A3 (en) * 1986-03-26 1988-08-31 Raychem Limited Protection device
GB8621430D0 (en) * 1986-09-05 1987-01-14 Raychem Ltd Overvoltage protection device
GB8623176D0 (en) * 1986-09-26 1987-01-14 Raychem Ltd Circuit protection device
GB8623177D0 (en) * 1986-09-26 1987-01-14 Raychem Ltd Circuit protection device
GB8623178D0 (en) * 1986-09-26 1987-01-14 Raychem Ltd Circuit protection device
JP2790654B2 (en) * 1989-04-28 1998-08-27 ホーヤ株式会社 Method for forming titanium dioxide film on plastic lens substrate
US5356485A (en) * 1992-04-29 1994-10-18 The United States Of America As Represented By The Secretary Of Commerce Intermetallic thermocouples
GB2322707B (en) * 1996-06-17 2000-07-12 Mercury Diagnostics Inc Electrochemical test device and related methods
US6001239A (en) 1998-09-30 1999-12-14 Mercury Diagnostics, Inc. Membrane based electrochemical test device and related methods
GB2380475A (en) * 2001-10-03 2003-04-09 Qinetiq Ltd Chalcogenide glass
GB0124308D0 (en) * 2001-10-10 2001-11-28 Unilever Plc Detergent compositions
US6891749B2 (en) * 2002-02-20 2005-05-10 Micron Technology, Inc. Resistance variable ‘on ’ memory
WO2007088626A1 (en) * 2006-02-02 2007-08-09 Renesas Technology Corp. Semiconductor device
US7772120B2 (en) * 2007-01-09 2010-08-10 International Business Machines Corporation Chemical vapor deposition method for the incorporation of nitrogen into materials including germanium and antimony
EP2068368B1 (en) * 2007-12-06 2012-10-10 Electronics and Telecommunications Research Institute Method for manufacturing n-type and p-type chalcogenide thin film transistor
US8178906B2 (en) * 2008-01-11 2012-05-15 Electro Scientific Industries, Inc. Laser chalcogenide phase change device
US7693388B1 (en) * 2008-09-15 2010-04-06 The United States Of America As Represented By The Secretary Of The Navy Thermally stable IR transmitting chalcogenide glass
KR20140058208A (en) * 2012-11-06 2014-05-14 삼성전자주식회사 Image sensor
DE102014103560A1 (en) 2013-03-15 2014-09-18 Schott Corporation Optical bonding through the use of low-softening optical glass for IR optical applications and formed products

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3343972A (en) * 1964-03-02 1967-09-26 Texas Instruments Inc Ge-te-as glasses and method of preparation
US3360649A (en) * 1965-04-22 1967-12-26 Texas Instruments Inc Ge-sb-se glass compositions
US3451794A (en) * 1966-04-29 1969-06-24 Texas Instruments Inc Method for melt-casting infrared transmitting glasses
US3440068A (en) * 1966-12-21 1969-04-22 Texas Instruments Inc Amorphous glass compositions
LU52765A1 (en) * 1967-01-06 1968-08-06
US3511993A (en) * 1967-10-18 1970-05-12 Texas Instruments Inc Ge-se-te glass in an infrared detection system
US3820968A (en) * 1970-04-15 1974-06-28 Texas Instruments Inc Making paths of devitrifiable chalcogenide glasses
US3771073A (en) * 1970-07-13 1973-11-06 Bell Telephone Labor Inc Ultrasonic devices using germanium-containing chalogenide glasses
US3709813A (en) * 1971-04-30 1973-01-09 Texas Instruments Inc Ion-selective electrochemical sensor

Also Published As

Publication number Publication date
GB1477670A (en) 1977-06-22
US3983076A (en) 1976-09-28
NL7408935A (en) 1975-01-06
IT1025022B (en) 1978-08-10
JPS5039467A (en) 1975-04-11
DE2429507A1 (en) 1975-01-23

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