CA1178102A - Imageable film including an intermediate layer containing metal and metal oxide or sulfide and a photoresist layer - Google Patents

Imageable film including an intermediate layer containing metal and metal oxide or sulfide and a photoresist layer

Info

Publication number
CA1178102A
CA1178102A CA000393624A CA393624A CA1178102A CA 1178102 A CA1178102 A CA 1178102A CA 000393624 A CA000393624 A CA 000393624A CA 393624 A CA393624 A CA 393624A CA 1178102 A CA1178102 A CA 1178102A
Authority
CA
Canada
Prior art keywords
metal
layer
article
metal oxide
sulfide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000393624A
Other languages
French (fr)
Inventor
George H. Crawford
Richard S. Fisch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of CA1178102A publication Critical patent/CA1178102A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials

Abstract

Abstract of the Disclosure Imaging materials are disclosed which comprise a substrate having a metal/ (metal oxide or sulfide) coating with an optical density of at least 0.2 on one surface of the substrate and a photoresist layer over said coating.

Description

2 31, 0 31 C A N / M A L

. "

I MAG EAB LE F I LM

`; ~ech~ical F i eld The present invention relate.s to novel structures which are useful as imageable films. These films would be particularly useful in the field of micrographics and graphic arts and comprise a substrate having a layer comprising a dispersion of 1~ metal and 2) metal oxide or sulfide and a photoresist composition over said metal layer.

10Background Of The Art Many imageable materials and imaging ; technologies are commercially available today. The most useful of these technologies tend to have photosensitive capahilities which enable convenient reproduction of images. This is particularly true in the micrographics ~; and grapllic arts field.
The most commonly used imaging systems are based on silver halide emulsion technology~ diazonium salt technology, or photopolymerizable composition technology.
Each of these different systems has its own advantages and problems.
Silver halide films are the most widely used graphic arts material. These films show high resolution, high imaging speedsy and consistency in their performanceO
However, because of the rising cost of silver, systems using silver halide emulsions are becoming economically disadvantageous. Silver halide films also have other ;~di5advantages including the requirement for multiple skeps in processing, unstable processing solutions, and lack of dimensional stability~
Imaging systems using diazonium salt compositions provide high resolution and are considerably less expensive than silver to produce. The visible image produced by most diazonium salt systems consists of a dye and tends to have limits on the maximum optical densities ::, , . .

i. 9L78~LOZ
~2-or image color obtainable, higher minimum densities than desirable, and often suffers from a low contrast Al~hough thermally developable diazonium salt systems are available in the marketplace, many diazonium salt image systems still rely upon ammonia development which is undesirable because of the difficulty of working in a closed environment with ammonia. Often the diaæo image comprises a dye and is not considered archival in the micrographic context~
- 10 Photopolymeric imaging systems are hoth inex-pensive and easy to make. However, these systems usually depend upon the loading of the photopolymeric layer with opaciying material to provide optical density, which tends to reduce the sensitivity of the photosensitive layer.
One type of system which has recently been introduced to the art comprises a substrate having on at least one surface thereof a roughened metallic layer which is overcoated with a me~al or metal alloy layer and subsequently coated with a photosensitive resist composi-tion. This type of technology is exemplified by U.S.
Patent No. 4,138,262 wherein a bismuth layer is sputter deposited upon a substrate and a continuous high optical ~ density layer of bismuth or an alloy of bismuth is vacuum - 25 deposited on the sputtered metal layer to provide a highly opaque appearance to the surfacee This system is developed in two steps by firs~ imagewise exposing the photoresist layer, then dissolving away the photoresist material in an imagewise manner to expose the underlayers o~ metal. The exposed metal or metal alloy is etched away in a second step. When viewed from the photoresist side, ; this provides a black metal image on a clear background.
When viewed from the opposite side, this provides a shiny metal layer on a clear background. This system requires two separate metal coating steps and requires two developing solutions, one for the photoresist and the other for the metal or metal alloy opaque layer. The ~7~

., .
system as disclosed is also limited in the metals that can be used. Other systems which utilize photoresist layers over metal or metallized substrates are disclosed in U.K.
Patent No. 1,468,746 wherein substrates of metal are overcoated with photoresist materials. The film is shown to be particularly desirable for microforming images and shown to have outstanding edge acutance and high resolution. The system will only provide images having substantially pure metal features.
U.S. Patents Nos. 4,008,084 and 4,158,079 show imaging systems using combinations of metals in different layers or different layers of metals and metal oxides -~ under photoresist compositions. The latter patent in particular shows an imaging system comprising a substrate ., having respectively on at least one surface an aluminum foil layer, an aluminum oxide layer and a photoresist compositionS This material suf~ers from poor bonding of ,~ the aluminum oxide layer to the photopolymer layer which '~ causes separation of those layers during development, particularly by aqueous alkaline developers conven~ionally used with photoresist materials. The juncture between the metal/metal oxide layer has a sharp, discontinuous transition from metal to metal oxide because of the manner in which it is formed.
~; 25 U~S. Patent No. 4,158,079 discloses another imageable composite comprising a substrate, an aluminum foil layer, an aluminum oxide layer and a photoresist layer. the aluminum foil layer is adhered to the substrate by an adhesive and the aluminum oxide layer is produced by anodization of the foil. The optical density fo the composite is increased by adding coloring material to the aluminum oxide layer prior to applying the photoresist. This composite has the disadvantage of requiring multiple steps in manufcturing of the substrate (both lamination and anodization) and in the fact that addition of a coloring material to the aluminum oxide layer fills the pores of that layer and reduces the ability of the photoresist layer to bond to that surface.

.. .

:, .

., .
;, : "
~7~

.,, Summary of the Invention .:, The present invention relates to a novel i~nageable construction com-prising a substrate having on at least one surface thereof a layer comprising dispersion of 1) a metal and 2) a metal oxide or sulfide, and a photoresist composition over said layer. These elements can display an excellent cohesion within the metal/~etal oxide or sulfide) layers and a good adhesion to the photo-resist layer so that the various portions of these layers do not undesirably separate during development of the photoresist material. These photosensitive ~;
` elements are further capable of being developed to their final image in a ~- 10 single step.
; According to one aspect of the present invention there is provided ~n `~ imageable article comprising ~a) a substrate, (b3 on at least one surface of said substrate a first opacifying layer comprising a dispersion of (i) metal and(ii) metal oxide or sulfide with an optical density of at least 0.2 derived from~: the dispersion, and (c) a photoresist layer on said first layer, wherein said opacifying layer is at least 15 Angstroms in thickness and comprises a mixture j !
of (a) metal and (b) metal oxide or sulfide, said opacifying layer characterizedby having a region of higher concentration of metal on one surface than on a second surface, and having said one surface of the said opacifying layer bonded to said substrate, having said second surface facing away from said substrate, ; and having a zone of continuous transition of the concentration of metal from said region of higher concentration of metal to said second surface.
According to another aspect of the present invention there is provided an imageable article as defined above in which component (ii) of part (b) and component (b) of part (c) are each a metal oxide.

, :
,., ~ -~a-~ .

;Detailed Description of the Drawings ; The present invention relates to novel imaging elements which comprise ~'a substrate having on at least one surface thereof a layer having an optical density of at least 0.2 and comprising a dispersion of 1) a metal and 2) a metal oxide or sulfide. The dispersion may be of metal in metal oxide or sulfide, or it may be of metal oxide or sulfide in metal. The layer may be a homogeneous . or anisotropic dispersion, with transition between regions of relatively higher 'metal/~metal oxide or sulfide) ratios to regions of relatively lower ratios of metal/(metal oxide or sulfide). The graded layer may, in fact, have a transition ,::
from essentially pure metal to essentially pure metal oxide or metal sulfide, and the dispersion containing layer may be deposited continuously onto a metal or metalli~ed substrate. The use of the graded layer provides excellent coher-ence for this optical density providing layer and provides the capability of high optical densities and high contrast between D ax and D i areas of the developed -film. The term "homogeneous" as used herein refers to the fact that the relative proportions of materials within the layer are fairly constant throughout its thickness even though the materials may be present as dispersed phases.

':

.
.

.~
, ., , ,, ., --~
, , ~, .

~ 8~
:: 5.
, .
Previous efforts to produce imageable articles from metal or me~allized substrates have encountered a number of difficulties, particularly when using aluminum : as the metal~ Photoresist materials, both positive acting and negative acting, tend to bond poorly to the metal surface. This poor bonding is most particularly deleterious during development of an image on the articleO
The developer solutions, which are generally organic solvent containing aqueous alkaline solutions, tend to channel between the metal substrate and the portions of the photoresist layer which are not supposed to be removed by the developer. This causes indescriminate removal of the resist and destruction of the image. Anodization of the metal layer produces a porous metal oxide coating to which the photoresist may adhere well 7 but ~his is an expensive and time consuming process~ Application of a metal oxide layer by vapor deposition or sputtering produces a smooth layer from which the photoresist is also generally removed hy channelling of the developer. It has been found in the practice of the present invention that - layers comprised of a dispersion~of 1) metal and 2) metal oxides or sulfides provide improved bonding over pure ; metal and pure metal oxide layers. Additionally, these dispersions are able to provide a ran~e of optical densities to the article. The dispersion of the metal and its oxidized product itself produces the optical densi~y and may provide coloration ranging through pale yellow, tan, gol~, gray, purple-black, blue-black and solid black.
It has been estimated that there is a sufficient disper-~ 30 sion of the metal in the oxidized metal phase or the ; oxidized metal in the metal phase when an optical density of at least 0.2 is provided by a surface zone of the dispersion. This may be a reflection or transmission optical density, whichever is most conveniently measured on the article.
The substrate may be substantially anymaterial. Depending upon the use of the product, the ~ 6~ 2 ;
selected substrate could be ceramic, glass, metal, ` polymeric, ibrous, etc. It is preferred to use polymeric materials as the substrate, and the present invention contemplates the use of both transparent and opaque thermoplastic and thermoset films. Thermoplastic materialsr and especially biaxially oriented films, are generally preferred because of their greater ability to ; resist breaking and cracking. Any organic polymeric material inc~uding but not limited to polyesters, polyolefins, polycarbonates, polyvinyl resins, polyvinyl acetals, polyamides, polyurethanes, polyepoxides, polysiloxanes~ polyacrylates7 polymethacrylates, polystyrene, and the like may be used in the practice of the present invention. The main purpose of these films is to provide a support for the final image, and the film does not itself enter into the imaging characteristics or photosensitive properties of the system itself. The support may be as thin or thick as is necessar~ Eor support, ranging for example, from 50 micrometers to 2 mm.
A preferred range would be from 75 or 100 to 500 micro-meters.
The photoresist composition may ~e any photo-: sensitive resist material known in the art. This includes both positive acting and negative acting photoresist systems. Positive acting photoresist systems ordinarily ; comprise polymeric binders containing positive acting diazonium salts or resins such as those disclosed, for example, in U.S. Patents Nos. 3,046,120, 3,469,902, and
3,210~239. rrhe positive acting photosensitizers are ' 30 commercially available and are well reported in the : literature. Negative acting photosensitive resist systems ordinarily comprise a polymerizable composition which polymerizes in an imagewise fashion when irradiated, such as by exposure to light. These compositions are well reported in the literature and are widely commercially available. These compositions ordinarily comprise ethylenically or polyethylenically unsaturated photo-:

polymeri~able materials, although photosensitve epoxy sys~ems are also knownin the art. Preferably eihylenically unsaturated photopolymerizable systems are used, such as acrylate, methacrylate, acrylamide and allyl systems.
Acrylic and methacrylic polymeri~able systems are most preferred according to the practice of the present invention. United States Patent Nos. 3,639,185, ; 4,008,084, 4,138,262, 4,139,391, 4,158,079, 3,469,982, United Kingdom Patent No. 1,468,746, as well as the composition disclosed in United States Patent No.
4,247,616, disclose photosensitive compositions generally useful in the practice of the present invention. United States Patent No. 4,314,022, discloses etchant solutions particularly useful in the practice of the present invention.
The clispersion layer used in the practice of the present invention comprises a layer of from at least 15 or 25 Angstroms to 5 x 10 Angstroms in thickness. Thi~s layer, hereinafter referred to as the opaque or opacifying layer, may, for example, comprise a homogeneous, metal/(metal oxide or sulfide) dispersed composition or a graded composition having variations in the relative proportions of metal to metal oxide or metal sulfide incrementally or with sharp lines of demarcation across general dimensions in the thickness of the layer. The graded layer may be essentially pure metal on one side and nearly pure metal oxide or metal sulfide on the other as long as the minimum optical density is provided, but may also be a dispersed mixture of me*al and metal oxide or sulfide on both sides with varying proportions therebetween. If there is no visually discernible variation between one side of the disposed layer and the other, the substrate should provide a contrast between imaged and non-imaged areas and development should etch entirely through the opaque layer. The opaque layer is capable of providing optical densities in excess of 4, but may also provide translucent layers having yellow, gold, tan, grey, black or blue/black coloration therein. The graded opaque ,~

.

... ~.
. "
layer in its preferred embodiment is characterised by having a transition region wherein the ratio of tmetal ^~ oxide or metal sulfide)/metal incrementally varies by at least 10 percent over a distance in the thickness oE not less than 15 angstroms. This transition is approximately continuous and the transition occurs in a continuous fashion without a sharp demarcation of zones which would cause poor adhesion between those zones. For example, a 50% change of proportions over 5 Angstroms is not continuous. This term is well understood in the artO
This continuous gradation can be produced by vapor deposition of metal and metal oxide in such a fashion that greater or lesser proportions of metal are first deposited - upon the substrate and increasing, decreasing or varying proportions of metal oxide or metal sulfide are deposited on the upper surface of the opaque layer. A convenient process for effecting manufacture of this layer is shown in Example 1. Essentially any metal may be used in the formation of ~he opaque layer. Generally preferred metals include aluminum, tin, zinc, chromium, titanium, silver, magnesium, manganese, iron, and the like. Mixtures of these metals may also be used in the practice of the present invention.
The metal/(metal oxide or sulfide) layer may be readily produced on the apparatus disclosed herein or by simple modification of existing metal vapor deposition apparatus.
The opacifying layers of the present invention may also be made by other prior art techniques and combinations of known techniques. For example, the sputtering of Al-A12O3 films onto substrates is known to produce both homogeneous and graded films ("Electrical and Structural Properties of Amorphous Metal-Metal Oxide Systems", J.J. ~auser, Physical Review, vol. 7, no. 9, pp. 4099-4104, 1 May 1973) and the oxidation of evaporated aluminum before it impacts the substrate can produce dispersions of metal and metal oxides with either oxygen ~.7~
g (I'Electrical Properties of Evaporated Aluminum Oxide Films", E.M~ DaSilva and P. White, J. Electrochemical Soc~, vol. 109, no. 1, pp. 12-15~ Jan. 1962) or water vapor ~"Aluminum Oxide Fims from the Reaction of Aluminum
- 5 and Water Vapor", L. H. Kaplan, Electrochemical Technology vol. 3, no. 11-12, pp. 335-337, Nov.-Dec. 1965). By using these two oxidizing techniques, that is oxidation of the metal vapor stream itself with an amount of oxidizing agent insufficient to convert all of the evaporated metal 10 to its me~al oxide, with a belt carrying the substrate to be coated, a continuous process may be performed. Where two separate coating layers are desired in the final product, as where the opacifying layer is on the surface of an aluminized substrate, the coating may he performed 15 essentially in a single piece of apparatus such as that shown in U.S. Patent No. 3,962,488, or with modification fo the source of the metal or the oxidizing agent in the manner shown by DaSilva et all or Kaplan. Two separate sources, one supplying metal and the other supplying metal 20 oxide, may also be used to provide a dispersed layer. For purposes of speed and convenience, continuous partial -- oxidation of the metal vapor stream in apparatus like that of DaSilva et al. or Kaplan appears to be preferred.
The use of the opacifying layers of the present 25 invention may provide a number of unique properties and advantages to the imageable systems of the present invention. E~cellent control of the opacity can be maintained and aesthetically pleasing images of various coloration without using dyes or other coloring agents can 30 be provided. By controlling the proportions of metal and metal oxides or sulfides, the etching rate of the opacifying layer also may be controlled. As previously mentioned, the adherence to the substrate and to the resist layer can be improved.
With regard to imageable layers having a pure metal such as aluminum as the surface of the substrate or as the lower part of the dispersion layer, additional ., i ~7~ 2 features are available~ The photosensitive side can be readily determined even on transparencies because of the different proportions oE materials. One side may be shiny and the other may be black, or example. The graded layer ; 5 also assists in preventing undercutting of the opacifying layer which can often occur with other substrates, The graded layer appears to enable uniform dissolving of the exposed opacifying layer and good clean-out of that layer in both a halftone and line image.
1~ The apparatus described herein and in the art may be so operated that the reactive gas or vapor (oxygen, sulfur, water, or hydrogen sulfide) is mixed with the metal - v~por atream so that a fairly macromolecularly homogeneous \ metal/(metal oxide or sulfide) composition is deposited ; 15 onto the substrate. Less than a stoichiometric amount of the reactive gas or vapor should be introduced into the metal vapor stream so that the deposited composition in fact comprises a mixture of oxides and metals which would provide reflective or transmissive optical density on the ,, . ~
subs~rate to be coated. Existing metal vapor deposition apparatus may be modified by providing a ~eactive gas or vapor inlet means which would inject the reactive gas or vapor (oxygen, sulfur, water or sulfur dioxide) into the metal vapor stream so that the composition of the material being deposited from the vapor phase is a fairly homogeneous or random mixture of metal and metal oxides or sulfides. This would provide a coating on the subs~rate which is a microscopic dispersion of metal particles in a metal oxide or sulfide phase or a suspension of metal oxide or sulfide particles in a metal phase. Generally 5 or 10 to 98% by weight of the metal present in the layer is in the form of a metal o~ide or sulfide. Preferably 25 to 98 of the metal present in the layer is in the form of a metal oxide or sulfide, and most preferably between 50 and 98%.
Whatever proportions are selected, for their use in the imaging technology of the present application, the coated substrate should have a reflection or transmission optical .

density of at least 0 2, values of 0.75, preferably at least 1.0, more preferably at least 2.0, and most preferably at least 2.5, 3.0 or higher can also be obtained. Transmission optical densities of 4.0 have been achieved with the metal/(metal oxide or sulfide) layers ; herein described.
All of the opacifying layers of the present invention may be characterized by their microscopic internal structure of metal and mekal oxide phases and particles. It is in fact this molecular inhomogeneity which tends to provide the opacity. The homogeneous layer is properly termed homogeneous because there may be no significant (less than 10%) variation in the relative proportions of metal and metal oxides and sulfides at ; 15 different points in the horizontal and/or vertical directions within the layer. This layer can also be said ~o be vertically isotropic.
In the use of homogeneous opacifying layers for imaging constructions, it is generally desirable to have the imaging development process etch through the entirety of the opacifying layer exposed by removal of the light sensitive layer in order to expc)se the supporting substrate, which may be transparent, white, colored, etc.
; These and other aspects o~ the present invention will be presented in the following example. All propor-tions are in weight percent unless otherwise stated.

Example 1 A suitable vapor coating of aluminum metal and aluminum oxide on a biaxially oriented polyester substrate was obtained by the following method.
A conventional vacuum vapor-coater having two resistance heaters located 12 inches (30.5 cm) below the conveyor belt (web) was modified to include an oxygen bleeder tube and a baffle. The oxygen bleeder tube and a vertical baffle was of a length greater than the width of the web and the tube was situated parallel to the plane of ~', ' , .

`-12- ~7~

the web moved directly above the center of each of the resistance heaters and 7 inches (15.8 cm) below the web.
The oxygen bleeder tube had fifty holes which were equally-spaced along its length and which were locateA
- 5 only on the side of the tube facing the web. The baffle was of a length of six~een inches (40.6 cm) and was : situated perpendicular to the direction in which the web moves and extended from 2 inches (5.08 cm) below the web to 3 inches (7.62 cm) below the oxygen bleeder tube, - 10 passing beyond ~he tube and into contact with the upstream side of that tube so as to ~orm a barrier preventing passing of the oxygen to the other side of the baffle.
The above~described vacuum vapor-coater was pumped down to a pressure of 0.2 microns ~o~ m~rcury~ anfl 15 w~lile the horizon~al baffle was closed the resistance heaters were brought to a temperature sufficient to vaporize aluminum wire. Aluminum wire (1/16 inch thick) was then supplied to the resis~ance heaters. This permitted deposition of an aluminum metal vapcr coating 20 having a resistivity of 0.3 to 0.5 ohms/square when the web was moving at 20 to 25 feet (6.3 to 7O9 m) per minute.
Concomitant with the heating of the resistance heaters and the feeding of the wire as described above, the pressure within the vapor-coater increased to about 0.5 microns.
25 Oxygen was fed simultaneously into the vapor-coater through the oxygen bleeder tube at a rate les~ then stoichoimetric equivalence which maintained the pressure within the vapor-coater approximately constant at about 0.5 microns, With the web moving at the above indicated ~:30 rate and using a ODOO4 inch-thick (1.02 x 10-4 rn) film of polyethylene terephthalate as the substrate, a vapor coatin~ was obtained which was shiny silver in appearance when viewed from the back-side, namely through the polyester film (indicating essentially pure aluminum adjacent the polyester), and which was dark blue-black in appearance when viewed ~rom the front-side indicating that a mixture of metal and metal oxide was present. The "

~7~
~, -13~

, .
optical density of the vapor coating was 3.67. The coating directly in contact with the film was essentially pure aluminum and gradually the composition had more and more alumina towards ~he surface of the coated article~
The above vapor-coated substrate was suitable for employment as a substrate for a photographic resist ~- imaging system. The substrate provided good binding capahility for photoresist coatings which were applied thereto.
. , Example 2 -~ A negative~acting photosensitive composition was - formed by mixing the following ingredients, 40 parts by weight of 1,3-bis[3-(2-acryloyloxyethoxy)-2-hydroxy-propyl]~5,5-dimethyl-2,4-imidizolodinedione, 5 parts of diallyl orthophthalate prepolymer, 11 parts of a vinyl chloride-vinyl acetate (86/14) copolymer, 2 parts of a butylmethacrylic acid - methylacrylic acid copolymer, 4 parts of diphenyliodonium hexafluorophosphate photoini tiator, and 2 parts of a sensitizer, Michlers ketone.
This composition was coated onto the graded aluminum/aluminum oxide layer of Example 1 with a wire wound Meyer bar and dried for 4 minutes at ~4C to form about a 10 micron dry coating. The dried coating was ~ exposed throuyh a ten-step graphic arts tablet by means of - 25 a two kilowatt ultraviolet radiation source for five : seconds at a distance of one meter. After exposure, a conventional aqueous alkaline developer solution con-sisting of 1~ by wei~ht sodium hydroxide was used to wash ; away unexposed pho~opolymerizable materials, The exposed ; 30 image remained firmly attached to the black layer enabling the photopolymerized image to act ~s a resist layer while the exposed black areas were etched.
The same composition when adhered to a shiny i aluminum substrate was completely removed by the developer 35 after exposure, indicating the improved adherence provided by the black layer.

:,'';
":'"

, .. .

.
' ' ~7~

- Example 3 A positive acting photoresist composition comprising the composition disclosed in Example 3 of U.S~
Patent No. 4,247,616 was coated onto the black substrate of Example 1 and dried at 94C to form a lO micron coatingO
The photosensitive layer was exposed to ultraviolet , radiation from a two kilowatt source through a ten step ; graphic arts tablet for fifteen seconds at a distance of one meter. The exposed image was developed in an aqueous ~. lO solution at 20C comprising 17.8 grams sulfonated dodecyl -.............. diphenyl ether, and 12~4 grams sodium hydroxide in one . liter of solution. A readable black and white image ~ resulted from the development.

- Example 4 A black opaque metal layer was deposited in the same manner as in Example l except that zinc wire was used.
The following negative acting photoresist compo~ition was prepared, with the proportions in parts by weight:
40 parts of Compound A of Example 1 of U.S.
; Patent No. 4r249~ollr 5 parts poly allylisopthalate (Dapon~ 35), lO parts ~86/14) copolymer of vinyl . acetate/vinyl chloride, 1.5 parts (80/20) copolymer n-butyl . acrylate/methyl acrylic acid, - 2 parts Michler's ketone tsensitizer), 8 parts diphenyliodonium hexafluorophosphate, and Acetone to 1000 parts Thls photoresist composition was coate~ at about 15 i microns dry thickness onto the opaque zinc layer and air ; dried at room temperature. The coafing was exposed through a ten step graphic arts tablet by a two kilowatt ultraviolet radiation source for two seconds at a distance of one meter. The exposed coating was developed with the solution of Example 3. The exposed areas of the photo-:

Q~

polymer layer remained as a film on the opaque zinc and protected the metal layer from the developer. The unexposed photopolymer and the unprotected metal were removed by development as in Example 3 leaving a black :,~
metal negative image.

Example 5 . _ . ~
Example 4 was repeated in its entirety except that tin was used as the metal and the photoresist composition was dried at 60C. A ~raphic arts halftone dot pattern comprising dots from 3 to 95~ of the surface area was used with a two kilovolt ultraviolet radiation - source at a distance of one meter to expose the dried - photopolymerizable composition. After development with the developer solution of Example 3, a black metal image of halftone dots was obtained reproducing the 3 to 95%
range of the target.

Example 6 A homogeneous opacifying layer of aluminum and alumin~m oxide on a polyethyleneterephthalate substrate was produced in a manner substantially identical to that of Example l, except that the baffle plate dividing the metal vapor stream into two portions was removed. The oxygen source was also relocated so that oxygen was fairly evenly dispersed throughout the metal vapor stream in ~ 25 proportions less than that necessary for complete ; c~nversion of the aluminum to aluminum oxide (Al2O3). A
blac~ layer (when viewed from either side) was thus deposited on the polyester.
The black layer was overcoated with a solution comprising:
0.14 g 1,3-bis(3[2,2,2-triacryloxymethyl]ethoxy-2-hydroxypropyl)-5,5-dimethyl-2,4-imido-; lidinedione ' 0.01 y polyallyl isophthalate . ..
,;

"
,:

` 0.03 g (85/14~ copolymer of vinyl chloride and vinyl ~' acetate 0~006 g (80/20) copolymer of n-butylmethacrylate and methylmethacrylic acid 0~008 g ~ichler's Ketone (sensitizer) 0.016 g diphenyliodonium hexafluorophosphate with 10 g of solution completed with 1,1,2-trichloroethane The solution was coated out and air dried to a thickness of about 15 micrometers. Ater drying this film was mated with a high contrast halftone negative film and exposed in a vacuum frame for 5 seconds ~o a 2 kilowatt mercury halide light source 1 meter from the plane oE the film. The exposed film was immersed in a 1~ solution of sodium hydroxide at 35C for 4 minutes with surface ;~ agitation. A high contrast black halftone image was visible. The image color was black when viewed from either side.
''`:
Example 7 ~n aluminum metal laye~ of about 600 A was vacuum vapor deposited onto a 4 mil (102 micron) polyester ; transparent support. A layer oi- aluminum/aluminum hydroxide was vacuum deposited on top of this layer. The ; technique described by DaSilva et al in J. Electrochemical ; 25 Soc., Vol. 109, No. 1, pp. 12-15~, Jan. 162, was used for ,., _ the application of this second layer. By adjustin~ the amount of oxygen introduced into the aluminum vapor stream this second layer exhibited a black color.
A positive acting photoresist layer as in Example 3 was coated over the second layer and dried. The photoresist side o the resulting imaging film was exposed to ultraviolet light from a 2 KW source for 15 seconds at a distance of one meter. The exposed film was developed in an aqueous solution of 1% by weight of sodium 35 hydroxide. A readable image, black on the outer surface but shiny when viewed through the base, was obtained.

.~' ' ' , .
. .
,, " .
,, ,; .
. .

Example_8 An opaque aluminum layer was deposited onto a 4 mil tlO2 microns) polyester base in the manner described in Example 7~ ~lso, as in Example 7, a second layer was vapor deposited over the first layer. In this case, however, the oxygen introduced into the aluminum vapor stream was adjusted to convert virtually all of the aluminum to aluminum oxide resulting in a substantially clear layer on the shiny aluminum surface. The film 10 viewed ~rom both sides appeared shiny.
The negative acting photoresist of Example 2 was overcoated onto this metal surface. The dried coating was exposed through a 10 step Graphic Arts sensitivity target by means of a 2 KW ultraviolet source for 5 seconds at a 15 distance of one meter. This film was then developed in 1%
sodium hydroxide aqueous solution. After only 15 seconds - of development time the resist layer lifted off the metal layer and a substantially inferior image was produced in the metal layer.
.~..
, 20 Example 4 A two layer Al/A1203 film was prepared as in Example 8, but this time the oxygen introduced into the ; aluminum vapor stream was adjusted to produce a brownish-copper hue when viewed from the front side of the web.
. .
; 25 Again as in Example 8, the negative~acting photoresist of Example 2 was overcoatefl onto the brownish layer, exposed in the sam~ manner, and developed in the same solution. A
sharp brownish copper colored image was obtained. The importance of the optical density being at least 0.2 in 30 the oxide layer is thus illustrated in comparison of those results with Example 8.

, .
i:~

,,;
:
'''~"

Claims (13)

THE EMBODIMENTS OF THE INVENTION IN WHICH AN EXCLUSIVE
PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS FOLLOWS:
1. An imageable article comprising (a) a substrate, (b) on at least one surface of said substrate a first opacifying layer comprising a dispersion of (i) metal and (ii) metal oxide or sulfide with an optical density of at least 0.2 derived from the dispersion, and (c) a photoresist layer on said first layer, wherein said opacifying layer is at least 15 Angstroms in thickness and comprises a mixture of (a) metal and (b) metal oxide or sulfide, said opacifying layer characterized by having a region of higher concentration of metal on one surface than on a second surface, and having said one surface of the said opacifying layer bonded to said substrate, having said second surface facing away from said substrate, and having a zone of contin-uous transition of the concentration of metal from said region of higher concen-tration of metal to said second surface.
2. The imageable article of claim 1, wherein the same metal comprises said (i) metal and said (ii) metal oxide or sulfide.
3. The imageable article of claim 1, wherein said photoresist is a nega-tive acting polyethylenically unsaturated photosensitive composition.
4. The imageable article of claim 1, wherein said photoresist comprises a positive acting photoresist composition.
5. The imageable article of claim 4, wherein said metal is selected from the group consisting of aluminum, tin, zinc, chromium, titanium, magnesium, man-ganese, nickel, iron and mixtures thereof.
6. The article of claim 1, wherein said photosensitive resist layer is selected from the group consisting of:
(a) positive acting photoresists comprising a polymeric binding and a positive acting diazonium salt or resin, and (b) negative acting photoresists comprising a composition capable of photopolymerizing in an image-wise fashion when irradiated.
7. The article of claim 6, wherein said photosensitive resist layer is a positive acting photoresist comprising a positive acting diazonium salt or resin in an epoxy polymeric binder.
8. The article of claim 1, 6 or 7, wherein the same metal comprises said metal and said metal oxide or sulfide and said metal is selected from the group consisting of aluminum, tin, zinc, chromium, titanium, magnesium, manganese, nic-kel, iron and mixtures thereof.
9. The article of claim 1, 6 or 7, wherein the same metal comprises said metal and said metal oxide or sulfide and that metal comprises aluminum.
10. The article of claim 1, 2 or 3, wherein component (ii) of part (b) is a metal oxide.
11. The article of claim 4, 5 or 6, wherein component (ii) of part (b) is a metal oxide.
12. The article of claim 1, 6 or 7, wherein component (ii) of part (b) is a metal oxide, the same metal comprises said metal and said metal oxide and said metal is selected from the group consisting of aluminum, tin, zinc, chromium, titanium, magnesium, manganese, nickel, iron and mixtures thereof.
13. The article of claim 1, 6 or 7, wherein component (ii) of part (b) is a metal oxide, the same metal comprises said metal and said metal oxide and that metal comprises aluminum.
CA000393624A 1981-02-04 1982-01-06 Imageable film including an intermediate layer containing metal and metal oxide or sulfide and a photoresist layer Expired CA1178102A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/231,031 US4387156A (en) 1981-02-04 1981-02-04 Imageable film containing a metal oxide opacifying layer
US231,031 1988-08-11

Publications (1)

Publication Number Publication Date
CA1178102A true CA1178102A (en) 1984-11-20

Family

ID=22867509

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000393624A Expired CA1178102A (en) 1981-02-04 1982-01-06 Imageable film including an intermediate layer containing metal and metal oxide or sulfide and a photoresist layer

Country Status (7)

Country Link
US (1) US4387156A (en)
EP (1) EP0057528B1 (en)
JP (1) JPS57147631A (en)
BR (1) BR8200561A (en)
CA (1) CA1178102A (en)
DE (1) DE3264598D1 (en)
MX (1) MX160780A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4728323A (en) * 1986-07-24 1988-03-01 Minnesota Mining And Manufacturing Company Antimicrobial wound dressings
US5011569A (en) * 1987-02-04 1991-04-30 Andus Corporation Thin film artwork compounds
US4940627A (en) * 1987-02-04 1990-07-10 Andus Corporation Thin film artwork compounds
US4911785A (en) * 1987-02-04 1990-03-27 Andus Corporation The method of forming a thin film artwork compounds
US5501938A (en) * 1989-03-30 1996-03-26 Rexham Graphics Inc. Ablation-transfer imaging/recording
EP0612285B1 (en) * 1991-10-11 1997-04-02 Minnesota Mining And Manufacturing Company Coated thin film for imaging
US6395483B1 (en) 1999-09-02 2002-05-28 3M Innovative Properties Company Arrays with mask layers
US6228555B1 (en) 1999-12-28 2001-05-08 3M Innovative Properties Company Thermal mass transfer donor element
US6492133B1 (en) 2000-05-01 2002-12-10 3M Innovative Properties Company Reflective disc assay devices, systems and methods
US20030124265A1 (en) * 2001-12-04 2003-07-03 3M Innovative Properties Company Method and materials for transferring a material onto a plasma treated surface according to a pattern
EP1546811B1 (en) * 2002-08-07 2008-04-09 VIM Technologies Ltd. Lithographic printing members and a method and a system for preparation of lithographic printing members

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS499977B1 (en) * 1969-08-29 1974-03-07
US3975197A (en) * 1973-02-12 1976-08-17 Minnesota Mining And Manufacturing Company Coated aluminum substrates
US4158079A (en) * 1973-08-13 1979-06-12 Swiss Aluminium Ltd. Composite material and a process and device for its manufacture
US4021592A (en) * 1974-03-07 1977-05-03 Fromson H A Process of making electroplated anodized aluminum articles and electroless plating
JPS5850342B2 (en) * 1975-05-12 1983-11-10 富士写真フイルム株式会社 Red-spotted moth
JPS5627138A (en) * 1979-08-14 1981-03-16 Fuji Photo Film Co Ltd Photosensitive image forming material

Also Published As

Publication number Publication date
DE3264598D1 (en) 1985-08-14
EP0057528B1 (en) 1985-07-10
US4387156A (en) 1983-06-07
EP0057528A1 (en) 1982-08-11
MX160780A (en) 1990-05-16
JPS57147631A (en) 1982-09-11
BR8200561A (en) 1982-12-07

Similar Documents

Publication Publication Date Title
EP0169049B1 (en) Dye transfer image process
CA1178102A (en) Imageable film including an intermediate layer containing metal and metal oxide or sulfide and a photoresist layer
CA1336145C (en) Photosensitive material and image forming method
EP0035574B1 (en) Photo-polymerizable light-sensitive resin composition and light-sensitive sheet material
EP0070102B1 (en) An imageable article comprising a photoresist layer coated on a metal layer having a microstructured surface
CA1103021A (en) Method of continuous tone imaging and imaging film therefor
GB1570081A (en) Image formation process using silver halide element
JPS5872940A (en) Laminate product and manufacture of such product containing information in hydrophilic colloid layer
JPS6024461B2 (en) step tablet
EP0176693A2 (en) Process for protecting vapor-deposited metal layers
JPH0150892B2 (en)
SU948301A3 (en) Light-sensitive material for obtaining images
EP0046028B1 (en) Imaging process and article employing photolabile, blocked surfactant
JPS6245547B2 (en)
GB2049210A (en) Photographic formation of visible images
US3922206A (en) Method of photo-etching and photogravure using fission fragment and/or alpha ray etch tracks from toned photographs
EP0087317B1 (en) Cold water soluble gelatin and process
US3788856A (en) Plural coated sheet material containing photosensitive semiconductive particles
US3711284A (en) Photographic film with subbing layers
US4362796A (en) Process of making photographic prints simulating depth and resultant article
US4467022A (en) Imaging process and article employing photolabile, blocked surfactant
US3615446A (en) Photographic copy medium comprising a semiconductor layer with a photopolymerizable layer thereover
JPS5972438A (en) Metallic image forming material
US4699859A (en) Dot-etchable image-containing element useful in lithographic mask formation and its production
FR2443084A1 (en) Use of etched photosensitive resin coatings to decorate mirrors - to reproduce image patterns containing fine detail

Legal Events

Date Code Title Description
MKEC Expiry (correction)
MKEX Expiry