CA1323949C - Ternary photoinitiator system for addition polymerization - Google Patents

Ternary photoinitiator system for addition polymerization

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Publication number
CA1323949C
CA1323949C CA000562679A CA562679A CA1323949C CA 1323949 C CA1323949 C CA 1323949C CA 000562679 A CA000562679 A CA 000562679A CA 562679 A CA562679 A CA 562679A CA 1323949 C CA1323949 C CA 1323949C
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Canada
Prior art keywords
donor
composition according
sensitizing
compound
composition
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Expired - Lifetime
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CA000562679A
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French (fr)
Inventor
Michael C. Palazzotto
F. Andrew Ubel, Iii
Joel D. Oxman
M. Zaki Ali
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3M Co
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Minnesota Mining and Manufacturing Co
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00Preparations for dentistry
    • A61K6/80Preparations for artificial teeth, for filling teeth or for capping teeth
    • A61K6/884Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
    • A61K6/887Compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/116Redox or dye sensitizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing

Abstract

Abstract Photocurable addition-polymerizable compositions containing a free-radically-polymerizable monomer and a photoinitiator system containing i) an arylidonium salt, ii) a sensitizing compound, and iii) an electron donor having an oxidation potential that is greater than zero and less than or equal to that of p-dimethyoxybenzene (1.32 volts vs. S.C.E.). The compositions cure rapidly and deeply under ultraviolet or visible light.

Description

1 32~9~C) TERN~RY PIIOTOINITIATOR SYSTEM
FOR ADDITION_POLYMERJ.ZATIVN

~, TEC~INICAL FIELD
This invention relates to phc,toinitiator systems for use in addition (free radically-initiated) polymerization.

BACKGROUND ART
~ryliodonium salts have been previously described or use as photoinitiators in addition-polymerizable 1 compositions. References relating to such compositions include U.S. Pat. Nos. 3,729,313, 3,7Q1,769, 3,808,006, 4,228,232, ~,250,053 and 4,428,807; H.J. Timpe and H.
saumann, Wiss. z. Tech. Hochsch. Leuna-Mersebur~, 26, 439 (1984); H. saumann, s. Strehmel, H. J. Timpe and U. Lammel, J Prakt, Chem, 326 (3), 415 (1984); and H. saumann, U.
` Oertel and H. J. Timpe, Euro. Polym. J., 22 (4), 313 (~pril .. . . ....
3, 1986).
2~ Mono- and di-ketones have also previously been described for use as photoinitiators in addition-`' polymerizable compositions. References relating to such i compositions include U.S. Pat. Nos. 3,427,161, 3,756,827, 3,759,807 and 4,071,424; U.K. Pat. Specification No.
1,304,112; European Pllblished ~at. Appl. No. 150,952 and ` Chem. Abs. 95:225704U.

i SUMr~RY OF TIIE INVENTION
'~-1 3 The present invention provides, in one aspect, an , 30 addition-polymerizable composition comprising:
a) Eree-radically-polymerizable monomer ("monomer"), and b) photoinitiator system, soluble in said ~ monomer, comprising PhotochemicallY effective amounts :~ 35 o . . .
,~
.
;.~ .
:.: --1--.

.

~ " : . .. . .

,~:, : , ; : :
i. ,. . , -i.'' , . ~ ~, . ;!~' . .: , , :

'' 1 323q~9 `~ ~ry l;od~ni~
A i) ~ H~ ~ h~ salt ("iodonium salt"), ~ ii) sensiti~ing compo~lnd ("sensitizer") i cap~ble o~ ~bsorbing light somewhere within the range of wavelengths between 300 and 1000 nanometers and capable of sensitizing 2-methyl-4,6-bis(trichloromethyl)-s-triazine, and iii) electron donor compound ("donor"), Ç, said donor being different from said sensitizee and wherein zero < Eo~ (donor) < EOx(p-dimethoxybenzene).
The compositions of the invention provide a very ~ useful combination of cure speed, cure depth and shelf i life. They cure well even when loaded with large amounts ~ of fillers, and can be used in a variety of applications } includ;ng graphic arts imaging (e.g., for color prooEing systems, curable inks, or silverless imaging~, printing i plates (e.g., projection plates or laser plates)~
photoresists, solder masks, coated abrasives, magnetic media, photocurable adhesives (e.g., for orthodontics) and I photocurable composites (e.g., for autobody repair or -j 20 dentistry).
`y The invention also provides a method for preparing photopolymerized compositions, and polymerized articles made therefrom.

DETAIL~D DESCRIPTION OF THE INVENTION
'~ A wide variety of monomers can be photopoly-merized using the photoinitiator system of the invention.
,, Suitable monomers contain at least one ethylenically-unsaturated double bond, can be oligomers, and are capable of undergoing addition polymerization. Such monomers ' include mono-, di- or poly- acrylates and methacrylates j such as methyl acrylate, methyl methacrylate, ethyl ;l acrylate, isopropyl methacrylate, n-hexyl acrylate, stearyl acrylate, allyl acrylate, glycerol diacrylate, glycerol triacrylate, ethyleneglycol diacrylate, diethyleneglycol diacrylate, triethyleneglycol dimethacrylate, 1,3-propanediol diacrylate, 1,3 propanediol dimethacrylate, ;~, i -2-: i . ,.
.. ,; ,. . . .
... .
','', ~' : ' 1 3239~9 trimethylolpropane triacrylate, 1,2,4-butanetriol ~ trimethacrylate, 1,4-cyclohexanedio3 diacrylate, ! pentaerythritol triacrylate, pentaerythritol tetraacrylate, - pentaerythritol tetramethacrylate, sorbitol hexacrylate, bis[1-(2-acryloxy)]-p-ethoxyphenyldimethylmethane, bis[l-(3-acryloxy-2-hydroxy)]-p-propoxyphenyl-dimethylmethane, trishydroxyethyl-isocyanurate trimeth-acrylate; the bis-acrylates and bis-methacrylate~s of polyethylene glycols of molecular weight 2~0-500, copolymerizable mixtures of acrylated monomers such as those of U.S. Pat. No. 4,652,274, and acrylated oligomers such as those of U.S. Pat. No. 4,642,126; unsaturated amides such as methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide, diethylene triamine tris-acrylamide and `l beta-methacrylaminoethyl methacrylate; and vinyl compounds such as styrene, diallyl phthalate, divinyl succinate, divinyl adipate and divinylphthalate. Mixtures of two or ~ more monomers can be used if desired.
.~ 20 The monomer is combined with a three component or ternary photoinitiator system. The first component in the photoinitiator system is the iodonium salt, i.e., a diaryliodonium salt. The iodonium salt should be soluble in the monomer and preferably is shelf-stable (i.e., does not spontaneously promote polymerization) when dissolved therein in the presence of the sensitizer and donor.
Accordingly, selection of a particular iodonium salt may depend to some extent upon the particular monomer, sensitizer and donor chosen. Suitable iodonium salt.s are ~, 30 described in u.S. Pat. Nos. 3,729,313, 3,741,769, 3, 808, 006, 4, 250, 053 and 9,394,403. The iodonium salt can be a simple salt (e.g., containing an anion such as Cl , Br , I or C~HsSO3 ) or a metal complex salt (e.g., , containing an anion such as sF~ , PF6 , SbF6 , SbFsOH or `~ 35 AsF6-). Mixtures of iodonium salts can be used if desired.
j Preferred iodonium salts include diphenyliodonium i~ salts such as diphenyliodonium chloride, di~henyliodonium J
. ,.

i ~ .
`l : 3 -3-.~

. 1 .:'': : . :

" ., ~ .
, .` :

. .,: ` : :

-- 1 3239~9 hexafluorophosphate and diphenyliodonium tetrafluoroborate.
The second component in the photoinitiator system is the sensitizer. The sensitizer should be soluble in the monomer, and is capable of light absorption somewhere within the range oE wavelenyths between about 300 an~ about lO00 nanometers, more preferably about 400 and about 700 nanometers and most preferably about 400 to about 600 nanometers. The sensitizer is also capable of sensitizing - 2-methyl-4,6-bis(trichloromethyl)-s-triazine, using thetest procedure described in U.S. Pat. No. 3,729,313. Using currently available materials, that test is carried out as follows. A standard test solution is prepared having the Eollowing composition:
5.0 parts of a 5% (weight by volume) solution in methanol of 45,000-55,000 molecular weight, 9.0-13.0~
hydroxyl content polyvinyl butyral ("Butvar B76", Monsanto) 0.3 parts trimethylolpropane trimethacrylate 0.03 parts 2-methyl-4,6-bis(trichloromethyl)-s-triazine (see Bull. Chem. Soc. Japan, 42, 2924~2930, 1~69).
To this solution is added 0.01 parts of the `1 compound to be tested as a sensitizer. The solution is ! knife-coated onto a 0.05mm clear polyester film using ai knife orifice of 0.05mm, and the coating is air dried for about 30 minutes. A 0.05mm clear polyester cover film is ~l 25 carefully placed over the dried but soft and tacky coating with minimum entrapment of air. The resulting sandwich ~! construction is then exposed for three minutes to 161,000 ;~ Lux of incident light from a tungsten light source ~; providing light in both the visible and ultraviolet range :! 30 ("FCH" 650 watt quartz-iodine lamp, General Electric).
Z Exposure is made through a stencil so as to ' provide exposed and unexposed areas in the construction.After exposure the cover film is removed and the coating is treated with a finely divided colored powder, such as a , 35 color toner powder of the type conventionally used in xerography. If the tested compound is a sensitizer, the trimethylolpropane trimethacrylate monomer will ~e :.~
~ -4-... .
~, .

. ~; , .
: , ~, ., , , . :
.,.. , ., . . ~

---``" 1 323949 ~olymerized in the light-exposed areas by the light-generated free radicals from the 2-methyl-4,6-~i bis(trichloromethyl)-s-triaæine, Since the polymerized areas will be essentially tack-free, the colored powder will selectively adhere only to the tacky, unexposed areas of the coating, providing a visual image corresponding to that in the stencil.
referably, in addition to passing the above test, a sensitizer is also selected based in part upon shelf stability considerations. Accordingly, selection of a particular sensitizer may depend to some extent upon the particular monomer, iodonium salt and donor chosen.
Suitable sensitizers are believed to include ; compounds in the following categories: ketones, coumarin dyes (e.g., ketocoumarins), xanthene dyes, acridine dyes, thiazole dyes, tlliazine dyes, oxazine dyes, azine dyes, aminoketone dyes, porphyrins, aromatic polycyclic hydrocarbons, p-substituted aminostyryl ketone compounds, aminotriaryl methanes, merocyanines, squarylium dyes and pyridinium dyes. Ketones (e.g., monoketones or alpha-diketones), ketocoumarins, aminoarylketones and substituted aminostyryl ketone compounds are preferred sensitizers. For applications requiring high sensitivity (e.g., graphic arts), it is preferred to employ a , ~5 sensitizer containing a julolidinyl moiety. For applica-- tions requiring deep cure (e.g., cure of highly-filled composites), it is preferred to employ sensitizers having an extinction coefficient below about 1000, more preferably ~ below about 100, at the desired wavelength oE irra~iation ,!.,~ 30 or photopolymerization.
~.~
~1 By way of example, a preferred class of ketone q sensitizers has the formula:
. .
.:
ACO ( X ) bB

where X is CO or CRlR~, where ~l and R2 can be the same or different, and can be hyclrogen, alkyl, alkaryl or aralkyl, ,, ."'Jf ; ~`31 '''.1'1 ,.,i,, ~ .

' `. ' .. .
, .: ~. .
- :
,. ..

: ' 1 3239~9 l~ is zero or l, and ~ ancl s can be the same or different and can be substituted (llaving one or more non-inter~ering substituents) or unsubstituted aryl, alkyl, alkaryl, or aralkyl groups, or together A and B can form a cyclic structure which can be a substituted or unsubstituted cycloaliphatic, aromatic, heteroaromatic or fused aromatic ring.
Suitable ketones of the above formula include monoketones (b=0) such as 2,2-, 4,4- or 2,4-dihydroxy-benzophenone, di-2-pyridyl ketone, di-2-furanyl ketone, di-2-thiophenyl ketone, benzoin, fluorenone, chalcone, ichler~s ketone, 2-fluoro-9-fluorenone, 2-chlorothioxanthone, acetophenone, benzophenone, 1- or ` 2-acetonaphthone, 9-acetylanthracene, 2-, 3- or 9-acetylphenanthrene, 4-acetylbiphenyl, propiophenone, '~ n-butyrophenone, valerophenone, 2-, 3- or 4-acetylpyridine, 3-acetylcoumarin arld the like. Suitable diketones include aralkyldiketones such as anthraquinone, 'i phenanthrenequinone, o-, m- and p-diacetylbenzene, 1,3-, 1,4-, 1,5-, 1,6-, 1,7- and 1,8-diacetylnaphthalene, 1,5-, 1,8- and 9,10-diacetylanthracene, and the like. Suitahle a--diketones ~b=1 and x=CO) include 2,3-butanedione, J 2,3-pentanedione, 2,3-hexanedione, 3,4-hexanedione, 2,3-heptanedione, 3,4-heptanedione, 2,3-octanedione, 4,5-octanedione, benzil, 2,2'-, 3,3'- and ~,4'-dihydroxylbenzil, furil, di-3,3'-indolylethanedione, 2,3-bornanedione (camphorquinone), biacetyl, 1,2-cyclohexanedione, 1,2-naphthaquinone, acenaphthaquinone, and the like.
Preferred ketoco~lmarins and p-substituted aminostyryl ketone compouncls are listed in TAsLE II, below.
-~ The third component in the photoinitiator system4 iS the electron donor. A wide variety of donors can be employed. The donor is soluble in the monomer, and should ~ 35 meet the oxidation potential (Eox) limitation discussed in',i'4 more detail below. Preferably, the donor also is selected .i ~)ased in part upon shelf stability considerations.
~ .
.;i ,.,~

.:i :-'4 1 3239~9 Accordingly, selection oE a particular donor may ~lepend in part on the monomer, iodonium salt and sensitizer chosen.
Suitable donors are capable of increasing the speed of cure or clepth of cure oE a composition of the invention upon exposure to light of the desired wavelength. Also, the donor has an E ~ greater than zero and less than or equal to EOx(p-dimethoxybenzene). Preferably Eox (donor) is between about 0.5 and 1 volts vs. a saturated calomel electrode ~"S.C.E."). Eo, ~donor) values can be measured experimentally, or obtained Erom references .such as N. L. Weinburg, Ed., Technigue of Electroorganic Synthesis ~i Part II Techn ues of Chemis~y, Vol. V ~1975), and C. R. Mann and K. K. salneS, _ectrochemical Reactions in ; Nonaqueous Systems (1970).
Preferred donors include amines (including aminoaldehydes and aminosilanes), amides (including phosphoramides), ethers ~including thioethers), ureas (including thioureas), ferrocene, sulfinic acids and their salts, salts of ferrocyanide, ascorbic acid and its salts, dithiocarbamic acid and its salts, salts of xanthates, salts of ethylene diamis~e tetraacetic acid and salts of tetraphenylboronic acid. The donor can be unsubstituted or ~ substituted witll one or more non-interfering substituents.
i Particularly preferred donors contain an electron donor X5 atom ~uch as a nitrogen, oxygen, phosphorus, or sulfur atom, and an abstractable hydrogen atom bonded to a carbon or silicon atom alpha to the electron donor atom.
Preferred amine donor compounds include alkyl-, aryl-, alkaryl- and aralkyl-amines such as me~hylamine, ~, 30 ethylamine, propylarnine, butylamine, triethanolamine, '4l amylamine~ hexylamine, 2,4-dimethylaniline, ;~ 2,3-dimethylaniline, o-, m- and p-toluidine, benzylamine, aminopyridine, N,N'-dimethylethylenediamine, N,N'-diethylethylenediamine, N,N'-dibenzylethylenediamine, N,N'-diethyl-1,3-propanediamine, N,N'-diethyl-2-butene-1,4-~ diamine, N,N'-dimethyl-1,6-hexanediamine, piperazine, "'3 4,4t-trimethylenedipiperidine, 4,4'-ethylenedipiperidine, ;l -7-., .

.
:`,''; ' '~ ` `

i - , .~. .

p-N,N-dimetl~ylaminophenethclnol and p-N,N--dimethylamino-benzonitrile; aminoalclehydes such as p-N,N-dimethylamino-benzaldehyde, p-N,N-diethylaminoben~aldehyde, 9-julolidine carboxaldehyde and 4-morpholinobenzaldehyde; and aminosilanes such as trimethylsilylmorpholine, trimethylsilylpiperidine, bis(dimethylamino)diphenylsilane, tris(dimethylamino)methylsilane, N,N-diethylaminotrimethylsilane, tris(dimethylamino)phenylsilane, tris(methylsilyl)amine, tris(dimethylsilyl)amine, bis(dimethylsilyl)amine, N,N-bis(dimethylsilyl)aniline, N-phenyl-N-dimethylsilyl-aniline and N,N-dimethyl-N-dimethylsilylamine. Tertiary aromatic alkylamines, particularly those having at least one electron-withdrawing group on the aromatic ring, have , 15 been found to provide especially good shelf stability.
Good shelf stability has also been obtained using amines that are solids at room temperature. Good photographic speed has been obtained using amines that contain one or more julolidinyl moieties.
Preferred amide donor compounds include N,N-dimethylacetamide, N,N-diethylacetamide, N-methyl-~-l N-phenylacetamide, hexamethylphosphoramide, hexaethyl-~, phosphoramide, hexapropylphosphoramide, trimorpholino-phosphine oxide and tripiperidinophosphine oxide.
Suitable ether donor compounds include ~,4'-dimethoxybiphenyl, 1,2,4-trimethoxybenzene and 1,2,4,5-tetramethoxybenzene.
Suitable urea donor compounds include N,N'-dimethylurea, N,N-dimettlylurea, N,N'-diphenylurea, 39 tetramethylthiourea, tetraethylthiourea, tetra-n-butylthiourea, N,N-di-n--butylthiourea, N,N'-di--n-butylthiourea, N,N-diphenylthiourea and N,N'-diphenyl-N,N'-diethylthiourea.
The three components of the photoinitiator system ~5 are present in "photochemically effective amounts", that ~; is, amounts of each component sufficient to enable the monomer to undergo photochemical gelation or hardening upon exposure to light of the desired wavelength. Preferably, , ,1 'l :-. ~ ., .

: :.

1 3239~9 Eor every 100 parts oE monomer, the photocurable composition contains about 0.005 to abo~t 10 parts (more preferably about 0.1 to about 4 parts) each of iodonium salt, sensitizer and donor. The amounts of each component are independently variable and thus need not be equal, with larger amo~nts generally providing faster cure, but shorter shelf life. Sensitizers with high extinction coefficlents (e.g., above about lO,OpO) at the desired wavelength of irradiation for photopolymerization generally are used in reduced amounts.
The photocurable composition can contain a wide variety of adjuvants depending upon the desired end use.
Suitable adjuvants include solvents, diluents, resins, binders, plasticizers, pigments, dyes, inorganic or organic reinforcing or extending fillers (at preferred amounts of about 10% to about 90% by weight, based on the total weight of the composition), thixotropic agents, indicators, ,~ inhibitors, stabilizers, UV absorbers, medicaments (e.g., leachable fluorides) and the like. The amounts and types of such adjuvants, and their manner of addition to the composition will be familiar to those skilled in the art.
J The photocurable composition can be cured using a ~1 variety of metho-]s. It is convenient to employ light sources that emit ultraviolet or visible light such as quartz halogen lamps, tungsten-halogen lamps, mercury arcs, carbon arcs, low-, medium-, and high-pressure mercury lamps, plasma arcs, light emitting diodes and lasers.
lectron beam ("E-beam") irradiation and other curing ~3. devices that do not depend on light emission can also be employed. In general, heat or an inert atmosphere will ` accelerate cure.
he following ei:amples are offered to aid in understanding the invention and are not to be construed as limiting the scope thereof. Unless otherwise indicated, , 35 all parts and percentages are by weight.
.j , ':~
1 _9_ ., .~

,,~

", '~
' ,~, 1 323q49 hree stock solutions were prepared from 0.25 parts camphorquinone (CPQ), 50 parts triethyleneglycol dimethacrylate (TEGDMA) and 50 parts bisphenol A diglycidyl ether dimethacrylate (BisGMA). 0.50 Part diphenyliodonium hexafluorophosphate (~2I+PF6-) was added to the first solution. 0.25 Part sodium p-toluenesulfinate (STS) was added to the second solution. 0.50 Part ~2I~PF6 and 0.25 part STS were added to the third solution. ~ach solution was poured into a 6mm diameter "Teflon" mold to a depth of 2.5 mm, covered with polyester film and irradiated for 10 seconds using a handheld visible light curing lamp ("Visilux", 3M) whose lightguide output end was place~
directly on the polyester film.
The solutions containing only CPQ and ~2I~PF6 or CPQ and STS formed a soft gel. The solution containing ~ CPS, ~2I~PFfi- and STS hardened to a solid having a Barcol-! hardness of 40 (ASTM D-2583) on both its top and bottom surfaces.
In a further experiment, three stock solutions were prepared from 11.85 parts each of the above monomers, J~ 76 parts Eiller, and 0.25 part CPQ. 0.25 Part ~2I+PFfi wasadded to the first solution. 0.25 Part N,N-dimethyl-aminophenethyl alcohol ("D-1") was added to the second solution. 0.25 Part ~2I+PFc- and 0.25 part D-1 were added to the third solution. Each solution was cured in a mold as described above, but using a 6mm deep mold and a 20 1 second cure time. The solution containing onlv ~zI PF6 ;, did not cure. The solution containing only D-1 had top and;~ 30 ~ottom sarcol hardness values of 56 and 2, respectively.
The solution containing both ~2I+PF6- and D-l had top and il bottom Barcol h~rdness values of 60 and 30, respectively.
; The above data illustrates that an increased degree of polymerization and deptll of cure can be obtained using a composition cured according to the invention.

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--`` 1 323949 Equimolar amounts of a variety of donors were added to monomer stock solutions containing 50 parts trimethylolpropane trimetllacrylate, 50 parts 1,4-butanediol dimethacrylate, 0.25 part CPQ and optionally O.S part of the iodonium salt (~2I PFf .
he resulting solutions were irradiated with visible light at an intensity of 60 mW/cm2 ~as measured by a United Detector Technology Model 351 portable photometer/radiometer) at 400-500 nm. The solutions were . stirred using a glass rod and the time required to reach the gelation point was recorded. Set out below in TA~LE I
are the run number, clonor compound, EOx (donor), ~eight ~; percent donor, and gel times for solutions prepared with and without the iodonium salt. The donors are listed in ABLE I in order of generally decreasing oxidation potential.
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Gel tlme, seco_ds Sensitizer/
Rull Eo X Sensitizer/ donor/
No. DonoL- _~nor) donor _ nor iodoni_m salt 1 control O >200 19n 2 acetonitrile 2.60 0.124>200 >190 `~ 3 nitrobenzene 0.3i3~200 ~190 i 4 methyletllylketolle 0.218>200 >190 ,~ 10 5 2,5-dimethyl-2,4-hexad;ene ?.lO0.334 >200 >190 6 ethylnlethylthio~cetate ~.700.407 >200 >190 7 p-bromothioanisole 1.60 0.615>200 >190 , 8 3,3'-dimethoxybil~henyl 1.600.649 >200 >190 ;~ 9 tetrahydrof~lrall 1.60 0.220>200 >190 ;~ 15 10 hexaethylbenzene 1.49 0.492>20n >190 ~ tl methoxyphenylphenyletller 0.604 >200 188 i~3 12 p-dimethoxybenzene 1.34 0.418205 160 13 N,N-dimethylacetam;de 1.32 0.264204 150 i1 14 phenylacetate 1.30 0.413>200 >190 `,~ 20 15 n-propylamine 1.30 0.20090 24 16 aniline 1.28 0.282>200 >190 17 1,3-dibutylthiourea 0.570>200 137 18 tetramethylurea 0.35294 101 19 tetrabutylthiourea 0.90938 29 dipentylamine 1.22 0.477159 19 21 1,?.,4-trimethoxybenzene 1.120.509 >225 55 22 hexamethylphosphoramide 1.000.543 80 50 23 tripiperdinophosphine oxide 1.000.~07 52 40 j1 24 trimethylsilylmorpholine 0.483112 21 `~ 30 25 N,N-dimethylben~ylamine 1.000.410 18 8 ~ 26 tris--dimethy1silylamine 0.580 108 32 ,m 27 triethanolallline 0.96 0.45217 6 28 tris(dimethylamino)- 0.71915 9 ~ phenylsilane ,~ 35 29 triphenylamine 0.86 0.737~200 >190 -;i 30 triphenylphosplline 0.794>200 172 ~ 31 p-dimethylaminobell~aldelly~le ().70 0.452 13 11 ;~ 32 N,N-dimethyl-p-toluidille 0.650.410 14 7 33 p-dimethylaminopllenyl- 0.65 0.50013 8 ~i~; alcohol .

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~; I 3239~q he above clata illustrates that an increased cl-re rate is obtained using a composition of the invention, and ;:: demonstrates the advantage of using donors whose Eox value .. is less than or equal to that of p-dimethoxybenzene and 5 t.hat have an abstractable hydrogen atom on a carbon or silicon atom alpha to the donor atom.

Solutions similar to those oE U.S. Pat. No.
4,228,232 (Ro~lsseau~ were prepared from 4.3 parts pentaerythritol tetraacrylate, 5.6 parts "Oligomer P-II"
(Rousseau, Col. 11, 61% by weight in MEK), 0.30 parts ~' triethylamine, 14.9 parts of a dispersion containing 4.1%
-~. Pigment Red 48 (~F 15865) and 8.2% polyvinyl formal resin ~ 15 t"Formvar 12/85"~ Monsanto) in n-propanol-water azeotrope, `~ and 74.2 parts n-propanol-wat.er azeotrope. As was the case . in Rousseau, the amount of triethylamine was just .~ sufficient to neutralize the acid in oligomer P-II, and .~ thus the triethylami.ne d.id not serve as a donor. To 5 parts of the above solutions were added 0.02 part ~2l+PF6-, varying amounts of various sensitizers, and optionally 0.015 part of the donor compound 9-julolidine carboxyaldehyde. The solutions were then coated with .. wire-wound rods onto grained and anodized aluminum at : 25 coating weights of 1-2 g/m2 and dried at 66~C for 2 :~ minutes. The resulting photosensitive printing plates were topcoated with 5% aqueous polyv ~ yl alcohol containing 0.26 .~ parts surfactant ~"Triton X-100 , Rohm and Haas) as a coating aid at coating weights of 1-2 g/m2. The dried ~ 30 plates were exposed through a ~ density increment, 21 step .`~ sensitivity yuide (Stouffer Graphic Arts) for 2 sec. using i a 172,000 Lux~ungsten light source at a distance of 25.4 - cm ("Model 70~`Transparency Maker, 3M). The exposed plates were developed with an aqueous solution of 46 n-propanol 2% sodium metasilicate and 0.066 surfactant ("Dowfax ~.AL , ~ Dow Chemical Company). Set out below in TAsLE II are the .~ run number, the type and amount of sensitizer and its ~ma~
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~ 1 3239~9 value, a statement ("yes" or "no") indicating whether or not the optional donor was added, and the number of solid steps retained after exposure ancl development. Higher step values indicate greater sensitiv;ty. Exposure values ~in ergs/cm2 required to form one solid step; last column in TABLE II ) for many of the plates were also measured by exposing the plates to coherent light using an argon-ion laser (488 nm), or by exposing the plates to incoherent light at the absorption maximum of the sensitizer using a one Kw high pressure mercury-xenon light source directed . through a variable frequency monochromator having a 20 nm bandpass. The monochromator output was measured using a radiometer. Numerically lower exposure values indicate , increased sensitivity.
From the data in TAsLE II it can be seen that plates containing iodonium salt, sensitizer and donor are more sensitive than plates containing only iodonium salt and sensitizer. An exposure value of 450 ergs/cm at 488 nm (argon-ion laser) was obtained using a combination of diphenyliodonium salt, ketocoumarin sensitizer, and 9-julolidine carboxaldehyde (Run 8). Eor comparison, the relatively sensitive laser-imageable compositions o~
Rousseau Exs. 18 and 19 (cols. 18-l9) have an exposure value at 488 nm of only 3,200 ergs/cm2.

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~ 1 32~q -: ' EXAMPLE 4 A coating formulation was prepared from the following ingredients:
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% Solids acrylamide 43.3 N,N'-methylenebisacrylamide 4.3 ~i polyvinyl alcohol 51.9 ~'ri (m~w. 2000, 75~ hydroly~ed) surfactant ("Triton X-100") 0.5 :
made up to 11.5% solids in a 1/1 v/v acetonitrile/water ~' mixture. Using a red safelight, coating samples were prepared by combining 25ml portions of the above stock ~, 15 solution with O.Olg of the sensitizer and optionally adding O.lg ~2I~PFG and/or O.lg STS. The samples were coated ~ onto gelatin-subbed polyester film using a #18 wire wound q rod, dried with a heat gun, then oven-dried for 2 minutes ~;~, at 60C. The coated films were exposed under vacuum y 20 through a 21 step sensitivity guide, using a tungsten ("Model 70" Transparency Maker, 3M) or ultraviolet (2Kw erkey Ascor, Berkey Technical Company) light source. The exposed samples were developed using a 3/20, v/v ~ water/methanol solvent mixture. Relative speed was ^~ 25 determined by the number of steps (average of 3 samples) `~ remaining after development. Set out below in 'I'A~LE III
~; are the results for the samples exposed to visible light, .* and set out below in TAsLE IV are the results for the ~,i samples exposed to ultraviolet light. Each exposure was 30 sec. in the visible region or 60 sec. in the ultraviolet region except as noted.
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The above data illustrates that combination of an iodonium salt, sensitizer and donor can increase imaging ; speed by one to two orders of magnitude compared to compositions containing only sensitizer and donor or only sensitizer and iodonium salt.

, EXAMPLE 5 To illustrate the effect of Eox (donor) upon cure speed, a series of compositions was evaluated as follows.
A monomer stock solution was prepared from 10~ penta--~~ erythritol tetraacrylate in 4/1, w/w, acetonitrile/water.
o 3 ml portions of this solution in 13 x lOOmm "Pyrex"
test tubes were added about 0.02g of ~2I+PF6 and/or a `~ donor compound and enough sensitizer to give an optical $ 15 density of between 1 and 2, as evaluated visually. The solutions were purged with N2 for 2 minutes before and ~ ~ ~ continuously during l ~ht irradiation. The light source .1i ~ was a Kodak "Carousel~rProjector lamp equipped with a 440nm ~ filter. Relative speed was determined by measuring `.'`5f 20 gelation time.
l Set out below in TAsLE V are the run number, the ;~ sensitizers and their ~m~x values, the donor compounds and ,'`~f their Eox values, and the gelation times for solutions ~1f containing iodonium salt plus sensitizer, sensitizer plus .,`~f 25 donor, or iodonium salt plus sensitizer plus donor.
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1 3239~9 ,,~, The above data illustrates that when Eox (donor) is decreased, cure speed generally increases ~see also 'I'ABLE I).

S ~XAMPLE 6 A polyester cloth backing ~woven, spun polyester `' cloth, 0.03 g/cm2, Milli~en) was impregnated with resin by saturating the backing with an ultraviolet-light-curable resin mixture made by ~ bining 75 parts epoxy-acrylate resin ("Novacure 3500't-~ nterez), 15 parts pentaerythritol triacrylate, 9 parts n-vinyl pyrrolidone and 1 part ~,~-dimethoxy-a-phenyl acetophenone, and curing the resin under ultraviolet light in air using an energy density of 0.3 J/cm2.
A coated abrasive binder resin was prepared from a 50:50 mixture of the triacrylate of tris-hydroxyethyliso-` cyanurate and the triacrylate of trimethylolpropane, filled to 50% with calcium carbonate. 0.25 Part each of ~2I+PF6-, i CPQ and D-1 were mixed into the binder resin.
`~ 20 The resin-impregnated backing was knife-coated with the binder resin at a coating thickness of O.lmm, then ~ drop-coated witll grade 50 Al2O3 mineral. The binder was ;~ cured under nitrogen in 5 to 10 seconds using a high intensity visible light source (Model F440 with 4V678 lamp, ~3 25 Fusion Systems) operated at a distance of a~out lS ~m.
Microscopic examination of the cured abrasive showed that i cure took place throughout the binder, even underneath ;~l individual mineral granules. sy comparison, if the photoinitiator system was excluded from the resin and a 5Mrad dose of E-beam irradiation (250 ~v acceleration ~ potential) was employed to effect cure, pools of wet '~ ! uncured resin remained under individual mineral granules ~` and the granules were poorly adhered on the backing.
A sample of the coated abrasive was size coated c 35 with the same resin system, using a coating weight just i~ sufficient to coat the mineral gran~les. The size coat was , cured under the visible light source used to cure the make . ~.

....

~ 3239~9 :~
coat. The resulting coatecl abrasive was evaluated using a reciprocating grindillg apparatus ("rocker drum") on a 6mm thick 1018 carbon steel wor~piece. After 500 cycles, no -` shelling was observed and an av~rage of 0.77g of steel was removed. A comparison abrasive sample was prepared using a make coat that contained the same photoinitiator system ` (cured using visible light), and a size coat that did not contain the photoinitiator system (cured using E-beam).
'I'he comparison abrasive shelled after only 20 cycles and removed only 0.02g of steel.
Comparable results were obtained when sensitizers such as benzil, 2-chlorothioxanthone and fluorenone were substituted for camphorquinone. Improved uncured resin '~ shelf life and ambient light stability were obtained when donor compounds such as ethyl p-dimethylaminobenzoate, ; p-dimethylaminobenzaldehyde and p-dimethylaminobenzonitrile were substituted for p-dimethylaminophenethyl alcohol.
The above-described abrasive binder system should be a useful substitute for standard phenolic-based binders, i 20 and could offer reduced energy consumption and higher throughput during manufacture.

~ A visible-light-curable orthodontic bracket i 25 adhesive was prepared by mixiny together 197 parts BisGMA, `~ 197 parts TEGDMA, 1,618 parts silane-treated microparticles (Example 1, U.S. Pat. No. 4,503,169), 33 parts pyrogenic silica ~"R-972", DeGussa), 2 parts ~2I PF6 , 1 part I CPQ and 3 parts triethanolamine to yield a paste-like -~' 30 composition. A bovine incisal tooth was potted in a circular acrylic cylinder, and the labial surface of the ~j tooth cleaned with a pumice slurry, rinsed, dried and `~ etched with gelled 37% phosphoric acid for 1 minute. The tooth was rinsed with distilled water ~or 45 seconds, air dried, coated on its etched surface with a methacrylate-based primer ("Light-Curable Enamel sond"~ 3M), hlown with .~
air to level the primer, and irrad ~ ted for 20 seconds with a handheld curing light ("Visilux"r~3M).
~j Yu~r ~ 2 :

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,i:;..... ;. , ~ ~ : ' ..i':

`` 1 3~39~9 thin film of the above-described orthodontic bracket adhesive was applied to the entire back surface of a standard stainless steel orthodontic bracket (4.0 x 4.0 mm, 100 mesh backing). The bracket was then pressed firmly against the etched, primed bovine tooth. The lightguide output end was oriented orthogonally with respect to the face of the bracket, at a distance of about 3mm, and the light energi~ed for 20 seconds.
Fifty brackets were bonded to teeth using the ; lO above procedure. The resulting cured bracket-tooth assemblies were stored for various periods o~ time, then A clamped in the fixed jaw of an "Instron'~tensile tester . (Instron Engineering Corporation). The movable jaw of the`
tester was fastened to the bracket using a length of orthodontic wire. The shear force required to cause bond ~i failure was measured at a jaw separation rate of 2mm/minute, and an average value determined for five ,~,r samples at each storage time. Set out below in TABLE VI
`~ are the storage times and measured average shear bond ;. 20 strengths for the above-described adhesive, along with comparison values for a conven~ onal two-part chemical cure orthodontic adhesive ("Concise~ No. 1960, 3M) and a commercially available one-part light cure orthodontic adhesive ("Heliosit ~ Vivadent, cured according to the i! 25 manufacturer's instructions).
:.' r~-~
'1 , i 30 ... .
. .................................................................. .
.~ 35 .1 .

, ., ~i . ~
, -25- -1 3239~9 TABLE VI
~verage shear bond strength,_~g/cm2 _ Stora~e timeAdhesive of EXAMPLE 7 C nclse _eliosit 30 seconds 103.3 (~) 53.6 52 minutes 112.3 Ic~ 68.5 5 minutes 102.9 82.0 77.2 lO minutes 99.1 105.6 80.0 1 hour~ 12.9 150.0 86.1 2~ hours~ ') 134.9 115.6 93.
103 months~) 160.1 ~c~ ~c 6 months~ 186.5 12 months(a) 172.2 18 months(a) 161.6 _ ; 15 Notes to TABLE VI:
(a) Stored in 37c distilled water.
tb) Average of 10 samples, prepared using two different batches of adhesive.
(c) Not determined.
'''.,' ~0 The commercial chemical cure adhesive requires at least 5 minutes waiting time before archwire application.
he commercial light cure adhesive also requires some waiting time before archwire application, and its ultimate strength is believed to be insufficiently high to prevent occasional bracket adhesion failure. In contrast, the ~ adhesive made from the photoinitiator system of this '1 invention exhibits rapid strength buildup and high ultimate bond strength. It should enable immediate archwire application, and reduce the incidence of early bracket adhesion failure.
.;
Various moclifications and alterations of this invention will be apparent to those skilled in the art ~' 35 without departing from the scope and spirit of this invention. It should be understood that this invention is ~ not limited to the illustrative embodiments set forth `, herein.
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Claims (28)

1. An addition-polymerizable composition comprising:
a) free-radically-polymerizable monomer, and b) photoinitiator system, soluble in said monomer, comprising photochemically effective amounts of i) aryliodonium salt, ii) sensitizing compound capable of absorbing light somewhere within the range of wavelengths between 300 and 1000 nanometers and capable of sensitizing
2-methyl-4,6-bis(trichloromethyl)-s-triazine, and iii) electron donor compound, said donor being different from said sensitizing compound and zero < Eox (donor) ? Eox(p-dimethoxybenzene).

2. A composition according to claim 1, wherein said aryliodonium salt comprises a diphenyliodonium simple salt or diphenyliodonium metal complex salt.
3. A composition according to claim 1, wherein said range of wavelengths is 400 to 700 nanometers.
4. A composition according to claim 1, wherein said range of wavelengths is 400 to 600 nanometers.
5. A composition according to claim 1, wherein said sensitizing compound is selected from the group consisting of ketones, coumarin dyes, xanthene dyes, acridine dyes, thiazole dyes, thiazine dyes, oxazine dyes, azine dyes, aminoketone dyes, porphyrins, aromatic polycyclic hydrocarbons, p-substituted aminostyryl ketone compounds, aminotriaryl methanes, merocyanines, squarylium dyes and pyridinium dyes.
6. A composition according to claim 1, wherein said sensitizing compound comprises a ketone, ketocoumarin, aminoaryl-ketone or p-substituted aminostyrylketone compound.
7. A composition according to claim 1, wherein said sensitizing compound contains at lest one julolidinyl moiety.
8. A composition according to claim 1, wherein said sensitizing compound comprises an .alpha.-diketone having an extinction coefficient below 103 at the wavelength at which said composition is irradiated when photopolymerized.
9. A composition according to claim 1, wherein said sensitizing compound comprises camphorquinone.
10. A composition according to claim 1, wherein said sensitizing compound has the formula:

ACO(X)bB
where X is CO or CR1R2, where R1 and R2 can be the same or different, and can be hydrogen, alkyl, alkaryl of aralkyl, b is zero or 1, and A and B can be the same or different and can be aryl, alkyl, alkaryl or aralkyl groups unsubstituted or substituted by a substituent which does not interfere with said sensitizing or together A and B can form a cyclic structure which can be a cycloaliphatic, aromatic, heteroaromatic or fused aromatic ring unsubstituted or substituted by a substituent which does not interfere with said sensitizing.
11. A composition according to claim 1, wherein said Eox (donor) is between 0.5 and 1 volts vs. a saturated calomel electrode.
12. A composition according to claim 1, wherein said donor is selected from the group consisting of amines, amides, ethers, ureas, ferrocene, sulfinic acids and their salts, salts of ferrocyanide, ascorbic acid and its salts, dithiocarbamic acid and its salts, salts of xanthates, salts of ethylene diamine tetraacetic acid and salts of tetraphenylboronic acid.
13. A composition according to claim 1, wherein said donor contains a nitrogen, oxygen, phosphorus or sulfur donor atom and an abstractable hydrogen atom bonded to a carbon or silicon atom alpha to said donor atom.
14. A composition according to claim 1, wherein said donor comprises a tertiary amine containing an aromatic ring.
15. A composition according to claim 14, wherein there is at least one electron-withdrawing group on said aromatic ring.
16. A composition according to claim 1, wherein said donor contains one or more julolidinyl moieties.
17. A composition according to claim 16, wherein said donor comprises 9-julolidine carboxyaldehyde.
18. A composition according to claim 1, wherein said composition contains, for every 100 parts by weight of said monomer, 0.005 to 10 parts by weight each of said aryliodonium salt, said sensitizing compound and said donor.
19. A composition according to claim 18, wherein said composition contains, for every 100 parts by weight of said monomer, 0.1 to 4 parts by weight each of said aryliodonium salt, said sensitizing compound and said donor.
20. A composition according to claim 18, wherein said composition further comprises 10% to 90% reinforcing and/or extending fillers, based on the total weight of said composition.
21. A composition according to claim 20, in the form of a photocurable adhesive applied to an orthodontic bracket.
22. A composition according to claim 21, wherein said sensitizing compound comprises camphorquinone and said donor comprises triethanolamine.
23. A composition according to claim 20, in the form of a photocurable composite suitable for use as a dental restorative.
24. A composition according to claim 1, in the form of a photocurable or photocured image-bearing coating atop a support.
25. A composition according to claim 24, wherein said coating and said support comprise a printing plate in which, before photopolymerization, said sensitizing compound comprises a ketone, ketocoumarin, aminoarylketone or p-substituted aminostyryl ketone compound.
26. A composition according to claim 25, wherein said donor comprises 9-julolidine carboxaldehyde.
27. An addition-polymerizable composition comprising:
a) free-radically-polymerizable monomer, and b) photoinitiator system, soluble in said monomer, comprising 0.1 to 4 parts each of i) diphenyliodonium metal complex salt, ii) ketone, ketocoumarin, aminoarylketone or p-substituted aminostyryl ketone sensitizing compound capable of absorbing light somewhere within the range of wavelengths between 400 and 600 nanometers and capable of sensitizing 2-methyl-4,6-bis(trichloromethyl)-s- triazine, and iii) electron donor compound containing a nitrogen donor atom and having an abstractable hydrogen atom bonded to a carbon or silicon atom alpha to said nitrogen atom, wherein said donor compound is different from said sensitizing compound and wherein 0.5 < Eox (donor) ? 1 volt vs. a saturated calomel electrode.
28. A method for addition photopolymerization comprising the step of irradiating a composition with light having a wavelength between 300 and 1000 nanometers until said composition gels or hardens, said composition comprising:
a) free-radically-polymerizable monomer, and b) photoinitiator system, soluble in said monomer, comprising photochemically effective amounts of i) aryliodonium salt, ii) sensitizing compound capable of absorbing light somewhere within the range of wavelengths between 300 and 1000 nanometers and capable of sensitizing 2-methyl-4,6-bis(trichloromethyl)-s-triazine, and iii) electron donor compound, said donor being different from said sensitizing compound and zero < Eox (donor) ? Eox(p-dimethoxybenzene).
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US6017660A (en) 2000-01-25
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DE3856261T2 (en) 1999-06-17
US5545676A (en) 1996-08-13
BR8801531A (en) 1988-11-08
JPS63273602A (en) 1988-11-10
EP0290133B1 (en) 1998-10-28
EP0290133A3 (en) 1990-05-02
EP0290133A2 (en) 1988-11-09

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