CA2049265A1 - Copolyimides, their preparation and the use thereof - Google Patents
Copolyimides, their preparation and the use thereofInfo
- Publication number
- CA2049265A1 CA2049265A1 CA 2049265 CA2049265A CA2049265A1 CA 2049265 A1 CA2049265 A1 CA 2049265A1 CA 2049265 CA2049265 CA 2049265 CA 2049265 A CA2049265 A CA 2049265A CA 2049265 A1 CA2049265 A1 CA 2049265A1
- Authority
- CA
- Canada
- Prior art keywords
- substituted
- carbon atoms
- radicals
- unsubstituted
- c4alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000002360 preparation method Methods 0.000 title claims abstract description 10
- 150000003839 salts Chemical class 0.000 claims abstract description 25
- 239000012528 membrane Substances 0.000 claims abstract description 22
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 125000003277 amino group Chemical group 0.000 claims abstract description 9
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims abstract description 8
- 150000001768 cations Chemical class 0.000 claims abstract description 8
- 239000011241 protective layer Substances 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims abstract description 4
- -1 aromatic tetracarboxylic acid radicals Chemical class 0.000 claims description 73
- 125000004432 carbon atom Chemical group C* 0.000 claims description 57
- 150000003254 radicals Chemical class 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 20
- 150000004984 aromatic diamines Chemical class 0.000 claims description 17
- 239000002904 solvent Substances 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 229910052736 halogen Inorganic materials 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 150000002367 halogens Chemical class 0.000 claims description 10
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 10
- XAKBSHICSHRJCL-UHFFFAOYSA-N [CH2]C(=O)C1=CC=CC=C1 Chemical group [CH2]C(=O)C1=CC=CC=C1 XAKBSHICSHRJCL-UHFFFAOYSA-N 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- 150000004985 diamines Chemical class 0.000 claims description 7
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 7
- 239000010410 layer Substances 0.000 claims description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 7
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 6
- 150000001735 carboxylic acids Chemical class 0.000 claims description 6
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical group C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 5
- 150000000000 tetracarboxylic acids Chemical class 0.000 claims description 5
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 4
- 150000002170 ethers Chemical class 0.000 claims description 4
- 150000001555 benzenes Chemical class 0.000 claims description 3
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 125000004957 naphthylene group Chemical group 0.000 claims description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 230000005855 radiation Effects 0.000 abstract description 4
- 238000004132 cross linking Methods 0.000 abstract 1
- 150000001991 dicarboxylic acids Chemical class 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- 239000004642 Polyimide Substances 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 229920001721 polyimide Polymers 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 206010034960 Photophobia Diseases 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 208000013469 light sensitivity Diseases 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N n-propyl alcohol Natural products CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- SMNDYUVBFMFKNZ-UHFFFAOYSA-N 2-furoic acid Chemical compound OC(=O)C1=CC=CO1 SMNDYUVBFMFKNZ-UHFFFAOYSA-N 0.000 description 4
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical compound C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 4
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 3
- ZYVYEJXMYBUCMN-UHFFFAOYSA-N 1-methoxy-2-methylpropane Chemical compound COCC(C)C ZYVYEJXMYBUCMN-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229930016911 cinnamic acid Natural products 0.000 description 3
- 235000013985 cinnamic acid Nutrition 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- 239000003880 polar aprotic solvent Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- LOZWAPSEEHRYPG-UHFFFAOYSA-N 1,4-dithiane Chemical compound C1CSCCS1 LOZWAPSEEHRYPG-UHFFFAOYSA-N 0.000 description 2
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 2
- 150000008041 alkali metal carbonates Chemical class 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 2
- 235000017557 sodium bicarbonate Nutrition 0.000 description 2
- 235000017550 sodium carbonate Nutrition 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 235000010199 sorbic acid Nutrition 0.000 description 2
- 239000004334 sorbic acid Substances 0.000 description 2
- 229940075582 sorbic acid Drugs 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 150000003628 tricarboxylic acids Chemical class 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- CRPTXKKKIGGDBX-UHFFFAOYSA-N (z)-but-2-ene Chemical group [CH2]C=CC CRPTXKKKIGGDBX-UHFFFAOYSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- WNBQDDAKLKODPH-UHFFFAOYSA-N 1,2,4-triazolidine Chemical compound C1NCNN1 WNBQDDAKLKODPH-UHFFFAOYSA-N 0.000 description 1
- JRLFRFTXXMZSND-UHFFFAOYSA-N 1,2,4-triazoline Chemical compound C1NNC=N1 JRLFRFTXXMZSND-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- CIISBYKBBMFLEZ-UHFFFAOYSA-N 1,2-oxazolidine Chemical compound C1CNOC1 CIISBYKBBMFLEZ-UHFFFAOYSA-N 0.000 description 1
- CZSRXHJVZUBEGW-UHFFFAOYSA-N 1,2-thiazolidine Chemical compound C1CNSC1 CZSRXHJVZUBEGW-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- IMLSAISZLJGWPP-UHFFFAOYSA-N 1,3-dithiolane Chemical compound C1CSCS1 IMLSAISZLJGWPP-UHFFFAOYSA-N 0.000 description 1
- OGYGFUAIIOPWQD-UHFFFAOYSA-N 1,3-thiazolidine Chemical compound C1CSCN1 OGYGFUAIIOPWQD-UHFFFAOYSA-N 0.000 description 1
- NIOYEYDJTAEDFH-UHFFFAOYSA-N 1-(2-hydroxyethoxy)-2-methylpropan-2-ol Chemical compound CC(C)(O)COCCO NIOYEYDJTAEDFH-UHFFFAOYSA-N 0.000 description 1
- LIRNFNXOTBZTPP-UHFFFAOYSA-N 1-[2-(2-hydroxyethoxy)ethoxy]-2-methylpropan-2-ol Chemical compound CC(C)(O)COCCOCCO LIRNFNXOTBZTPP-UHFFFAOYSA-N 0.000 description 1
- YLHUPYSUKYAIBW-UHFFFAOYSA-N 1-acetylpyrrolidin-2-one Chemical compound CC(=O)N1CCCC1=O YLHUPYSUKYAIBW-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- MBDUIEKYVPVZJH-UHFFFAOYSA-N 1-ethylsulfonylethane Chemical compound CCS(=O)(=O)CC MBDUIEKYVPVZJH-UHFFFAOYSA-N 0.000 description 1
- UUFQTNFCRMXOAE-UHFFFAOYSA-N 1-methylmethylene Chemical compound C[CH] UUFQTNFCRMXOAE-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- OXBLVCZKDOZZOJ-UHFFFAOYSA-N 2,3-Dihydrothiophene Chemical compound C1CC=CS1 OXBLVCZKDOZZOJ-UHFFFAOYSA-N 0.000 description 1
- GCUDWDNUXMSUIK-UHFFFAOYSA-N 2,3-dihydro-1,2-benzoxazole Chemical compound C1=CC=C2CNOC2=C1 GCUDWDNUXMSUIK-UHFFFAOYSA-N 0.000 description 1
- WOHLSTOWRAOMSG-UHFFFAOYSA-N 2,3-dihydro-1,3-benzothiazole Chemical compound C1=CC=C2SCNC2=C1 WOHLSTOWRAOMSG-UHFFFAOYSA-N 0.000 description 1
- HRCMXYXVAWHBTH-UHFFFAOYSA-N 2,3-dihydro-1,3-benzoxazole Chemical compound C1=CC=C2OCNC2=C1 HRCMXYXVAWHBTH-UHFFFAOYSA-N 0.000 description 1
- YJUFGFXVASPYFQ-UHFFFAOYSA-N 2,3-dihydro-1-benzothiophene Chemical compound C1=CC=C2SCCC2=C1 YJUFGFXVASPYFQ-UHFFFAOYSA-N 0.000 description 1
- HBEDSQVIWPRPAY-UHFFFAOYSA-N 2,3-dihydrobenzofuran Chemical compound C1=CC=C2OCCC2=C1 HBEDSQVIWPRPAY-UHFFFAOYSA-N 0.000 description 1
- JKTCBAGSMQIFNL-UHFFFAOYSA-N 2,3-dihydrofuran Chemical compound C1CC=CO1 JKTCBAGSMQIFNL-UHFFFAOYSA-N 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- YTTFFPATQICAQN-UHFFFAOYSA-N 2-methoxypropan-1-ol Chemical compound COC(C)CO YTTFFPATQICAQN-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VSWICNJIUPRZIK-UHFFFAOYSA-N 2-piperideine Chemical compound C1CNC=CC1 VSWICNJIUPRZIK-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 1
- MGADZUXDNSDTHW-UHFFFAOYSA-N 2H-pyran Chemical compound C1OC=CC=C1 MGADZUXDNSDTHW-UHFFFAOYSA-N 0.000 description 1
- ULKFLOVGORAZDI-UHFFFAOYSA-N 3,3-dimethyloxetan-2-one Chemical compound CC1(C)COC1=O ULKFLOVGORAZDI-UHFFFAOYSA-N 0.000 description 1
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 1
- WEQPBCSPRXFQQS-UHFFFAOYSA-N 4,5-dihydro-1,2-oxazole Chemical compound C1CC=NO1 WEQPBCSPRXFQQS-UHFFFAOYSA-N 0.000 description 1
- GUUULVAMQJLDSY-UHFFFAOYSA-N 4,5-dihydro-1,2-thiazole Chemical compound C1CC=NS1 GUUULVAMQJLDSY-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BUDQDWGNQVEFAC-UHFFFAOYSA-N Dihydropyran Chemical compound C1COC=CC1 BUDQDWGNQVEFAC-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- WRYCSMQKUKOKBP-UHFFFAOYSA-N Imidazolidine Chemical compound C1CNCN1 WRYCSMQKUKOKBP-UHFFFAOYSA-N 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- ZWXPDGCFMMFNRW-UHFFFAOYSA-N N-methylcaprolactam Chemical compound CN1CCCCCC1=O ZWXPDGCFMMFNRW-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- WYNCHZVNFNFDNH-UHFFFAOYSA-N Oxazolidine Chemical compound C1COCN1 WYNCHZVNFNFDNH-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- YPWFISCTZQNZAU-UHFFFAOYSA-N Thiane Chemical compound C1CCSCC1 YPWFISCTZQNZAU-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- IYABWNGZIDDRAK-UHFFFAOYSA-N allene Chemical group C=C=C IYABWNGZIDDRAK-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- ZSIQJIWKELUFRJ-UHFFFAOYSA-N azepane Chemical compound C1CCCNCC1 ZSIQJIWKELUFRJ-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- RFRXIWQYSOIBDI-UHFFFAOYSA-N benzarone Chemical compound CCC=1OC2=CC=CC=C2C=1C(=O)C1=CC=C(O)C=C1 RFRXIWQYSOIBDI-UHFFFAOYSA-N 0.000 description 1
- MXMZCLLIUQEKSN-UHFFFAOYSA-N benzimidazoline Chemical compound C1=CC=C2NCNC2=C1 MXMZCLLIUQEKSN-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 125000005510 but-1-en-2-yl group Chemical group 0.000 description 1
- OWBTYPJTUOEWEK-UHFFFAOYSA-N butane-2,3-diol Chemical compound CC(O)C(C)O OWBTYPJTUOEWEK-UHFFFAOYSA-N 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 150000003857 carboxamides Chemical class 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- VZWXIQHBIQLMPN-UHFFFAOYSA-N chromane Chemical compound C1=CC=C2CCCOC2=C1 VZWXIQHBIQLMPN-UHFFFAOYSA-N 0.000 description 1
- QZHPTGXQGDFGEN-UHFFFAOYSA-N chromene Chemical compound C1=CC=C2C=C[CH]OC2=C1 QZHPTGXQGDFGEN-UHFFFAOYSA-N 0.000 description 1
- CCRCUPLGCSFEDV-UHFFFAOYSA-N cinnamic acid methyl ester Natural products COC(=O)C=CC1=CC=CC=C1 CCRCUPLGCSFEDV-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000001047 cyclobutenyl group Chemical group C1(=CCC1)* 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001162 cycloheptenyl group Chemical group C1(=CCCCCC1)* 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000522 cyclooctenyl group Chemical group C1(=CCCCCCC1)* 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000298 cyclopropenyl group Chemical group [H]C1=C([H])C1([H])* 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005070 decynyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C#C* 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- BTVWZWFKMIUSGS-UHFFFAOYSA-N dimethylethyleneglycol Natural products CC(C)(O)CO BTVWZWFKMIUSGS-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 125000005066 dodecenyl group Chemical group C(=CCCCCCCCCCC)* 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000004366 heterocycloalkenyl group Chemical group 0.000 description 1
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000005980 hexynyl group Chemical group 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 125000002510 isobutoxy group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])O* 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- CCRCUPLGCSFEDV-BQYQJAHWSA-N methyl trans-cinnamate Chemical compound COC(=O)\C=C\C1=CC=CC=C1 CCRCUPLGCSFEDV-BQYQJAHWSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 125000005187 nonenyl group Chemical group C(=CCCCCCCC)* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005069 octynyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C#C* 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000005981 pentynyl group Chemical group 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000015320 potassium carbonate Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000011085 pressure filtration Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- USPWKWBDZOARPV-UHFFFAOYSA-N pyrazolidine Chemical compound C1CNNC1 USPWKWBDZOARPV-UHFFFAOYSA-N 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- ZVJHJDDKYZXRJI-UHFFFAOYSA-N pyrroline Natural products C1CC=NC1 ZVJHJDDKYZXRJI-UHFFFAOYSA-N 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 231100000489 sensitizer Toxicity 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- FCFMKFHUNDYKEG-UHFFFAOYSA-N thietane 1,1-dioxide Chemical compound O=S1(=O)CCC1 FCFMKFHUNDYKEG-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000000825 ultraviolet detection Methods 0.000 description 1
- 125000005065 undecenyl group Chemical group C(=CCCCCCCCCC)* 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/62—Polycondensates having nitrogen-containing heterocyclic rings in the main chain
- B01D71/64—Polyimides; Polyamide-imides; Polyester-imides; Polyamide acids or similar polyimide precursors
- B01D71/641—Polyamide-imides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
- B01D71/62—Polycondensates having nitrogen-containing heterocyclic rings in the main chain
- B01D71/64—Polyimides; Polyamide-imides; Polyester-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/14—Polyamide-imides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31721—Of polyimide
Abstract
ABSTRACT
Copolyimides, their preparation and the use thereof Mixtures of salts of organic dicarboxylic acids and organic compounds of non-salt character, dissolved in a C1-C4alkanol, can be concentrated or separated with a semipermeable membrane made from a copolyimide which contains a first aromatic diamine radical (1) and a second aromatic diamine radical (2) which carries -SO3M
groups, wherein M is H?, a mono- to trivalent metal cation or an ammonium cation. The first amine radical (1) and/or the second diamine radical (2) contains C1-C4alkyl groups in both o-positions to at least one amino group. These copolyamides are also radiation-sensitive (self-crosslinking) and can be used for the production of protective layers or relief images, development being carried out in an aqueous alkaline medium.
Copolyimides, their preparation and the use thereof Mixtures of salts of organic dicarboxylic acids and organic compounds of non-salt character, dissolved in a C1-C4alkanol, can be concentrated or separated with a semipermeable membrane made from a copolyimide which contains a first aromatic diamine radical (1) and a second aromatic diamine radical (2) which carries -SO3M
groups, wherein M is H?, a mono- to trivalent metal cation or an ammonium cation. The first amine radical (1) and/or the second diamine radical (2) contains C1-C4alkyl groups in both o-positions to at least one amino group. These copolyamides are also radiation-sensitive (self-crosslinking) and can be used for the production of protective layers or relief images, development being carried out in an aqueous alkaline medium.
Description
Copolyirnides~ their preparation and the use thereof The present invention relates to aromatic polyimides of aromatic diamines (1) which are substituted in the nucleus by alkyl, and aromatic diamines (2) which carry sulfonic acid groups which may be in salt form, and aromatic tetracarboxylic acids, and to a process for their preparation. The invention further relates to material coated with said copolyimides and to the use of said copolyimides for producing protective layers or relief images or in the form of semipermeable membranes for concentrating or separating mixtures of salts of organic carboxylic acids and compounds of non-salt character.
Aromatic polyimides of benzophenonetetracarboxylic acids and aromatic mononuclear or binuclear diamines which may contain -SO3~ groups are disclosed in DE-A-l 962 588.
The polyimides are only soluble in phenolic solvents and can be used for the preparation of coating compositions.
In EP-A-0 132 221, EP-A-0 162 017 and 0 181 837 there are disclosed aromatic polyimides of tetracarboxylic acid which contain benzophenone groups and aromatic diamines which are substituted by alkyl groups in the ortho-positions to the amino groups, which polyimides are soluble in polar aprotic solvents are self-crosslinkable. These polyimides can be used for producing protective layers or relief images, but thedevelopment must be carried out in an organic solvent - a disadvantageous procedure from the environmental aspect.
Surprisingly, it has now been found that aromatic copolyimides of aromatic tetracarboxylic acids and tricarboxylic or aromatic tricarboxylic acids and a first aromatic diamine and a second aromatic diamine which carries -SO3H- groups in salt form, said first and/or said second diamine being Cl-C4alkyl-substituted in both ortho-positions to at least one amino group, retain their light-sensitivity and are soluble not only in polar aprotic solvents but also in aqueous alkaline media. They can therefore be processed in simple manner from organic solutions to films, semipermeable membranes and protective layers. When producing relief images, development can be carried out in aqueous alkaline media.
',J~ a ~
In one of its aspects, the invention relates to copolyimides having an inherent viscosity of 0.2 to 3.0 dVg, measured at 25C in ~ solution of 0.5 ~, by weight of the copolyimide in N-methylpyrrolidone, and comprising A) at least one structural repeating unit of aromatic tetracarboxylic acid radicals (a) which contain 10 to 30 carbon atoms and which are unsubstituted or substituted by halogen, nitro, Cl-C4alkyl, Cl-C4alkoxy or phenacyl, and aromatic diamine radicals (b) which contain 6 to 30 carbon atoms and which are unsubstituted or substituted by C1-C4alkyl or halogen; and at least one additional optional structural repeating unit of aromatic tricarboxylic acid radicals (c) of 9 to 30 carbon atoms, which radicals are unsubstituted or substituted as for (a), and of identical or different diamine radicals (b), and B) at least one structural repeating unit of identical or different tetracarboxylic acid radicals (a) and aromatic diamines (d) which contain 6 to 30 carbon atoms and which are unsubstituted or substituted by Cl-C4alkyl, and which contain at least one -SO3M group attached to the aromatic nucleus, wherein M is H~, a mono- to trivalent metal cation, N~I4ffl or an organic ammonium cation of 1 to 30 carbon atoms; and additional optional structural repeating units of identical or different aromatic tricarboxylic acid radicals (c) and identical or different diamine radicals (d), with the proviso that at least one of said diamine radicals (b) or (d) is substituted by C1-C4alkyl in both ortho-positions to at least one N atom.
Preferably both ortho-positions to both N atoms are substituted by Cl-C4alkyl. More particularly, the diamine radicals (b) or (d) are substituted by C1-C4alkyl in both ortho-positions of both N atoms. Most preferably, each of the diamine radicals (b) and (d) is substituted by Cl-C4alkyl in both ortho-positions of both N atoms. Cl-C4Alkyl may be n-, iso- or tert-butyl, n- or isopropyl and, preferably, methyl or ethyl.
The copolyimide preferably contains 5 to 95 mol %, more particularly 30 to 95 mol %
and, most preferably, 50 to 95 mol %, of component (a), and 95 to 5 mol %, more particularly 5 to 70 mol % and, most preferably, 50 to 5 mol %, of component (b), based on the copolyimide.
The amount of tricarboxylic acid radicals (c) present in the copolyimide may be up to 60 mol %, preferably up to 30 mol % and, most preferably, up to 10 mol %, based on the 2~C~
Aromatic polyimides of benzophenonetetracarboxylic acids and aromatic mononuclear or binuclear diamines which may contain -SO3~ groups are disclosed in DE-A-l 962 588.
The polyimides are only soluble in phenolic solvents and can be used for the preparation of coating compositions.
In EP-A-0 132 221, EP-A-0 162 017 and 0 181 837 there are disclosed aromatic polyimides of tetracarboxylic acid which contain benzophenone groups and aromatic diamines which are substituted by alkyl groups in the ortho-positions to the amino groups, which polyimides are soluble in polar aprotic solvents are self-crosslinkable. These polyimides can be used for producing protective layers or relief images, but thedevelopment must be carried out in an organic solvent - a disadvantageous procedure from the environmental aspect.
Surprisingly, it has now been found that aromatic copolyimides of aromatic tetracarboxylic acids and tricarboxylic or aromatic tricarboxylic acids and a first aromatic diamine and a second aromatic diamine which carries -SO3H- groups in salt form, said first and/or said second diamine being Cl-C4alkyl-substituted in both ortho-positions to at least one amino group, retain their light-sensitivity and are soluble not only in polar aprotic solvents but also in aqueous alkaline media. They can therefore be processed in simple manner from organic solutions to films, semipermeable membranes and protective layers. When producing relief images, development can be carried out in aqueous alkaline media.
',J~ a ~
In one of its aspects, the invention relates to copolyimides having an inherent viscosity of 0.2 to 3.0 dVg, measured at 25C in ~ solution of 0.5 ~, by weight of the copolyimide in N-methylpyrrolidone, and comprising A) at least one structural repeating unit of aromatic tetracarboxylic acid radicals (a) which contain 10 to 30 carbon atoms and which are unsubstituted or substituted by halogen, nitro, Cl-C4alkyl, Cl-C4alkoxy or phenacyl, and aromatic diamine radicals (b) which contain 6 to 30 carbon atoms and which are unsubstituted or substituted by C1-C4alkyl or halogen; and at least one additional optional structural repeating unit of aromatic tricarboxylic acid radicals (c) of 9 to 30 carbon atoms, which radicals are unsubstituted or substituted as for (a), and of identical or different diamine radicals (b), and B) at least one structural repeating unit of identical or different tetracarboxylic acid radicals (a) and aromatic diamines (d) which contain 6 to 30 carbon atoms and which are unsubstituted or substituted by Cl-C4alkyl, and which contain at least one -SO3M group attached to the aromatic nucleus, wherein M is H~, a mono- to trivalent metal cation, N~I4ffl or an organic ammonium cation of 1 to 30 carbon atoms; and additional optional structural repeating units of identical or different aromatic tricarboxylic acid radicals (c) and identical or different diamine radicals (d), with the proviso that at least one of said diamine radicals (b) or (d) is substituted by C1-C4alkyl in both ortho-positions to at least one N atom.
Preferably both ortho-positions to both N atoms are substituted by Cl-C4alkyl. More particularly, the diamine radicals (b) or (d) are substituted by C1-C4alkyl in both ortho-positions of both N atoms. Most preferably, each of the diamine radicals (b) and (d) is substituted by Cl-C4alkyl in both ortho-positions of both N atoms. Cl-C4Alkyl may be n-, iso- or tert-butyl, n- or isopropyl and, preferably, methyl or ethyl.
The copolyimide preferably contains 5 to 95 mol %, more particularly 30 to 95 mol %
and, most preferably, 50 to 95 mol %, of component (a), and 95 to 5 mol %, more particularly 5 to 70 mol % and, most preferably, 50 to 5 mol %, of component (b), based on the copolyimide.
The amount of tricarboxylic acid radicals (c) present in the copolyimide may be up to 60 mol %, preferably up to 30 mol % and, most preferably, up to 10 mol %, based on the 2~C~
acid radicals. Preferred copolyimides contain only radicals of tetracarboxylic acids. The inherent viscosity is preferably 0.3 to 2.0 dl/g, most preferably 0.3 to 1.5 dl/g.
The halogen substit-~ents are preferably F, Cl and Br. The Cl-C4alkyl and Cl-C4alkoxy substituents are typically methyl, ethyl, n- or isopropyl or n-, iso- or tert-butyl, methoxy, ethoxy, n- or isopropoxy or n-, iso- or tert-butoxy.
The tetracarboxylic acid radicals preferably contain 10 to 24 carbon atoms, mostpreferably 10 to 18 carbon atoms, the tricarboxylic acid radicals preferably contain 9 to 24 carbon atoms, most preferably 9 to 18 carbon atoms, and the diamine radicals (b) and (d) preferably contain 6 to 24 carbon atoms and, most preferably, 6 to 18 carbon atoms.
M in the S03M group as ammonium cation may be NH4~ or an ammonium cation of a primary, secondary or tertiary open-chain amine containing preferably 1 to 24, most preferably 1 to 16 ,carbon atoms, or an ammonium cation of a monocyclic or bicyclic secondary or tertiary amine or of a tricyclic tertiary amine containing preferably 4 to 12 carbon atoms.
M as a metal cation can be a mono- to trivalent cation of metals of the main groups and subgroups, of the transition metals and of the noble metals. Mono- or divalent cations are preferred. Typical examples of metals are: Li, Na, K, Rb, Cs, Mg, Ca, Sr, Ba, In, Sn, Pb, Cu, Ag, Au, Zn, Cd, Hg, Cr, Mo, Mn, Fe, Co, Ni, Rn, Rh, Pd, Ir, Pt, Sb, Bi, as well as the group of the rare earth metals. Preferred metals are the alkaline and alkaline earth metals, Cu, Ag, Au, Fe, Co, Ni, Zn, Cd and Mn.
In a preferred embodiment of the invention, M is H~, NH4~, an alkali metal cation or a primary, secondary, tertiary or quaternary ammonium cation of 1 to 24 carbon atoms.
Illustrative examples of tri- and tetracarboxylic acids and diamines from which the radicals are derived are described, inter alia, in EP-A-0 132 221, EP-A-0 162 017 and EP-A-0 181 837. Aromatic diamines containing -S03M groups are known in dyestuff chemistry and some are commercially available.
Preferred copolyimides of this invention comprise ~ i3 ~
a) structural units of formula I
O o Il 11 --N R~ N--R2- (I) Il 11 o o and additional optional structural units of formula II
O
Il / \
--C--R3 N--R4-NH- (II) o and b) structural units of formula III
O O
Il 11 --N~ R5 N - R6- (III) Il 11 O O
and additional optional structural units of formula IV
/C\
--C--R7 ~N--R8-NH- (I~i') o wherein Rl and Rs are each independently of the other an unsubstituted or substituted tetravalent aromatic radical of 6 to 20 carbon atoms, to which two of the carbonyl groups in ortho- or peri-position are attached, R3 and R7 are each independently of the other an unsubstituted or substituted trivalent aromatic radical of 6 to 20 carbon atoms, to which two carbonyl groups in ortho- or peri-position are attached, R2 and R4 are each independently of the other a divalent aromatic hydrocarbon radical of 6 to 20 carbon atoms which is unsubstituted or substituted by Cl-C4alkyl or halogen and R6 and R8 are each independently of the other a divalent aromatic hydrocarbon radical of 6 to 20 carbon atoms which is unsubstituted or substituted by Cl-C4alkyl and which contains at least one -S03M group, wherein M is H~3, a mono- to trivalent metal cation, NH4~ or an organic ammonium cation of 1 to 30 carbon atoms, with the proviso that the radicals R2 and R4 and/or the radicals R6 and R8 are substituted by Cl-C4alkyl in both ortho-positions to at least one N atom.
Preferred copolyimides are those wherein Rl and Rs are each independently of the other radicals of formula Rg O O
~P
~Y2~ .
wherein two bonds are in ortho-position to each other, Rg is H or phenacyl, Yl is a direct bond, -CH2-, -CH(CH3)-, -C(CH3)2-, -O-, -S-, -SO-, -SO2-, -C(O)O- or -NRIo-, p is 0 or 1, Y2 is -CH2-, -CH(CH3)-, -C(CH3)2-, -O-, -S-, -SO-, -SO2-, -CO- or -NRIo-, and Rlo is H or j~a ~ 6 ~
Cl-C6alkyl.
Particularly preferred copolyimides are those wherein R1 and Rs are each independently of the other radicals of formula ~e~ 3~ c ~, ~ Y~ or ~Y2x~
wherein two bonds are in ortho-position to each otber, Yl is a direct bond, -CH2-, -O-, -S-or -SO2-, and Y2 is a direct bond, -O-, -S- or -CO-.
In particular, R1 and R5 are tetravalent radicals of pyrromellitic acid, bcnzophenonetetra-carboxylic acid and thioxanthonetetracarboxylic acid.
R3 and R7 are preferably each independently of the other radicals of formula ~ or ~ Y3~
wherein two bonds are attached in ortho-position to each other, and Y3 is a direct bond, -S-, -O-, -CH2- or-CO-.
In a further preferred embodiment of the invention, the tetracarboxylic acid radicals R
and Rs and the tricarboxylic acid radicals R3 and R7 contain a benzophenone group.
The radicals R2, R4, R6 and R8 are preferably a phenylene, naphthylene or an unbridged or bridged biphenylene radical.
~ ~y ~
In preferred copolyimides of the invention, R2 and R4 are each independently of the other an unsubstituted or a chloro-, bromo- or Cl-C4alkyl-substituted radical of formulae 3X~
wherein Xl is a direct bond, -CH2-, tCH2~2 . -HC=CH-, CH3CH\, (CH3)2C\, -NRIo-, -N=N-, -CO-, -O-, -S-, -SO- or -SO2, and Rlo is H or Cl-C6alkyl, and R6 and R8 each independently of the other a radical of formulae _~ ~X2~
(Rl,)x (R11)X (R1o)x wherein X2 independently has the same meaning as Xl, Rll is Cl-C4alkyl, x is 0, 1, 2 or 3, and M is H 33, NH4~33, an alkali metal cation or a primary, secondary, tertiary or quaternary ammonium cation of 1 to 24 carbon atoms.
Especially preferred copolyimides are those comprising structural units of formulae I and III, and Xl and X2 are each independently of the other a direct bond, -CH2-, -CH=CH-, -CO-, -O- or-S-.
A particularly preferred group of copolyimides is that comprising structural units of formula I and III, wherein Rl and Rs are each independently of the other a tetravalent radical of the benzene series which is unsubstituted or substituted by phenacyl, -NO2-, -Cl or -Br, or a radical of formula r ~J ~ 5 ~ 8 ~
O O O
~ ~ ~ or wherein p is 0 or 1 and Y2 is a direct bond, -CH2-, -S-, -O- or -CO-, R2 in bo~h ortho-posilions to at least one amino group is methyl- and/or ethyl-substituted 1,3- or 1,4-phenylene, or in both o-positions to the amino groups is methyl- and/or ethyl-substituted 3,3'- or 4,4'-diphenylmethanediyl, and R6 is a radical of formulae ~ ' ~X2~
(R11)X (R11)X (R11)X
wherein X2 is a direct bond. -CH=CH- or -CH2-, Rll is methyl and/or ethyl, x is 0, 1, 2 or 3, and M is H~', NH4~, Li~, Na~, K~3, Rb~, Cs~, primary, secondary, tertiary or quaternary ammonium of 1 to 20 carbon atoms.
The most preferred copolyamides are those wherein R6 is a radical of formula or ,"~ CH- CH~
(CH3)3 wherein M is H~, NH4q3, Li~, Na~, K~, Rb~, Cs~, tertiary or quaternary ammonium of 4 to 20 carbon atoms.
The invention further relates to a process for the preparation of copolyimides according to claim 1, which comprises A) reacting and cyclising at least one ietracarboxylic acid (a') of 10 to 30 carbon atoms, .~ ~ 4 ~
which is unsllbstituted or substituted by halogen, nitro, Cl-C4alkyl, Cl-C4alkoxy or phenacyl, and at least one optional aromatic tricarboxylic acid (c') of 9 to 30 carbon atoms, which is unsubstituted or saubstituted as for (a'), or a polyamide forming derivative thereof, B) with at least one aromatic diamine (b') of 6 to 30 carbon atoms, which is unsubstituted or substituted by Cl-C4alkyl or halogen, and with at least one aromatic diamine (d') of 6 to 30 carbon atoms, which is unsubstituted or substituted by Cl-C4alkyl, and which contains at least one -SO3M group attached to the aromatic nucleus, with the proviso that at least one of said diamines (b') or (d') is substituted by C1-C4alkyl in both ortho-positions to at least one amino group.
Acid derivatives are typically anhydrides, esters, amides and halides, preferably chlorides.
The monomers used in the process are known and some are commercially available or can be prepared by known processes.
The preparation of the polyimides is preferably carried out in solution. Suitable inert solvents are listed below. The reaction temperatures may be in the rnage from -20 to 300C.
The procedure is conveniently such that the tetracarboxylic dianhydride and the diamine are reacted first to form a polyamic acid precursor, which is then cyclised, with elimination of water. The cyclisation may be carried out under heat. It is convenient to carry out the cyclisation using condensing agents such as carboxylic anhydrides, typically acetic anhydride. The polyimides can then be isolated by customary methods, for example by removal of the solvent or precipitation by addition of a non-solvent.
A further process consists in reacting the tetracarboxylic anhydride with a diisocyanate in one step to the polyimide.
From the novel copolyimides it is possible to prepare semipermeable membranes with which, surprisingly, mixtures of organic compounds can be separated or individual-constituents concentrated.
In another of its aspects, the invention relates to a process for concentrating or separating salts of organic carboxylic acids from organic compounds of non-salt character with the ;~ ~J L v~
aid of semipermeable membranes, which process comprises contacting a solution of the salts and organic compounds in an unsubstituted or Cl-C3alkoxy-substituted Cl-C4alkanol, mixtures of such alkanols or mixtures of such alkanols with ethers, with one side of the membrane, the pure solvent being present on the other side of the membrane, and said membrane is made from a copolyimide, and to the use of novel copolyimides in the form of semipermeable membranes for concentrating or separating salts of organic carboxylic acids from organic compounds of non-salt character.
The concentration of the salts and organic compounds is preferably 0.0001 to 10 percent by weight, more particularly 0.001 to 5 percent by weight and, most preferably, 0.001 to 3 percent by weight.
The thickness of the membrane may be from S to 300 ~Lm, preferably from 20 to 200 llm.
The alkanol used as solvent contains 1 to 4, and, preferably, 1 to 3, carbon atoms. It may be substituted by methoxy or ethoxy. Representative examples of such alkanols are:
methanol, ethanol, n- and isopropanol, n-, iso- and tert-butanol, methoxyethanol, ethoxy-ethanol, propoxyethanol, l-methoxypropan-3-ol, 2-methoxypropan- l-ol. Preferred solvents are methanol, ethanol, 1- or 2-propanol and 2-methoxyethanol. It is also possible to use mixtures of the alkanols with one another or with ethers, such as diethyl ether or ethylene glycol dimethyl ether.
The salt of the organic carboxylic acid may be an ammonium or a metal salt, such as NH4~E', an ammonium cation of a primary, secondary or tertiary amine containing a total of 1 to 20 carbon atoms, an alkali metal salt or an alkaline earth metal salt. Alkali metal salts and ammonium salts are preferred. NH4~\ and Li~3 salts are most preferred.
The organic carboxylic acid may be selected from mono-, di-, tri- or tetracarboxylic acids.
Aliphatic, cycloaliphatic, aromatic and heterocyclic or heteroaromatic monocarboxylic acids which contain 1 to 18, preferably 1 to 12, carbon atoms, are preferred.
In a preferred embodiment of the invention, the organic acid has the formula (A) Ra-X-COOH (A) wherein X is a direct bond, Cl-C4alkylene, C2-C4alkylidene or C2-C4alkenylene, R3 is H, Cl-Cl2alkyl, c2-cl2alkenyl~ c2-cl2alkynyl~ C3-Cl2cycloalkyl, C3-CI2cycloalkenyl,C6-Cl6aryl, C3-Cl2heterocycloalkyl, C3-Cl2heterocycloalkenyl, C6-Cl6heteroaryl, which are unsubstituted or substituted by -OH, -SH, -CN, -NO2, halogen, Cl-C6alkyl, C1-C6alkoxy, Cl-C6alkylthio, C1-C6alkyl-Y-, where Y is -CO-, -SO-, -SO2-, -CO-O-, -O-CO-, -CO-NRbRc-, -NRbRc-CO-, and Rb and Rc are each independently of the other H, C1-C6alkyl, C2-C4hydroxyalkyl or Rb and Rc, when taken together, are tetramethylene, pentamethylene or 3-oxapentyl-1,4-ene.
Ra as alkyl, which may be linear or branched, is typically methyl, ethyl, n- and isopropyl, n- and isobutyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl and dodecyl.
Ra as alkenyl, which may be linear or branched, is typically vinyl, crotonyl, allyl, but-1-en-1-yl, but-1-en-2-yl, but-1-en-3-yl, but-1-en-4-yl, but-2-en-1-yl, but-2-en-2-yl, but-2-en-4-yl, pentenyl, hexenyl, heptenyl, octenyl, nonenyl, decenyl, undecenyl and dodecenyl.
Ra as alkynyl, which may be linear or branched, is typically ethynyl, prop-2-yn-1-yl, prop-2-yn-3-yl, butynyl, pentynyl, hexynyl, heptynyl, octynyl, decynyl and dodecynyl.
Ra as cycloalkyl and cycloalkenyl preferably contains 4 to 8, most preferably 5 or 6, carbon atoms. Typical examples are cyclopropyl and cyclopropenyl, cyclobutyl and cyclo-butenyl, cyclopentyl and cyclopentenyl, cyclohexyl and cyclohexenyl, cycloheptyl and cycloheptenyl, cyclooctyl and cyclooctenyl.
Ra as aryl preferably contains 6 to 12 carbon atoms. Typical examples are phenyl, biphenyl and naphthyl.
Ra as heterocycloalkyl and heterocycloalkenyl preferably contains 4 to 8, most preferably 4 to 6, ring carbon atoms. Preferred hetero atoms are those selected from the group consisting of O, S and NRd, wherein Rd is H, C1-C6alkyl or C1-C7acyl. Ra as heteroaryl preferably contains 4 to 11 ring carbon atoms and, preferably, hetero atoms selected from the group consisting of O, S and -N=. Typical examples of heterocycles are pyrrolidine, tetrahydrofuran, tetrahydrothiophen, pyrroline, dihydrofuran, dihydrothiophene, indane, dihydrocoumarone, dihydrobenzothiophene, carbazole, dibenzofuran, dibenzothiophene, pyrazolidine, imidazolidine, pyrazoline, imidazoline, benzimidazolidine, oxazolidine, oxazoline, thiazolidine, thiazoline, isooxazolidine, isooxazoline, isothiazolidine, 2 ~ .~
isothiazoline, benzoxazolidine, benzoisooxazolidine, benzothiazolidine, 1,2,3- or 1,2,4-triazolidine, 1,2,3- or 1,2,4-triazoline, 1,2,3- or 1,2,4-oxazolidine or-oxazoline, piperidine, di- and tetrahydropyridine, dihydro- and tetrahydropyran, di- and tetra-hydrothiopyran, piperazine, dehydropiperazine, morpholine, thiomorphol;ne, 1,3- and 1,4-dioxan, 1,4-dithiane, azepane, 1,3-Dioxolan, 1,3-dithiolane, pyrrole, indole, imidazole, benzoimidazole, furan, thiophene, benzofuran, benzothiophene, carbazole, dibenzofuran, dibenzothiophene, oxazole, isooxazole, thiazole, isothiazole, benzoxazole, benzothiazole, pyridine, pyrimidine, pyrazine, pyridazine, quinoline, isoquinoline, acridine, chromene, chroman, pyran, thiapyran, phenazine, phenoxazine, phenolthiazine, purine.
Rb, Rc and Rd as alkyl and hydroxyalkyl may be methyl, ethyl, n- or isopropyl, n-, iso- or tert-butyl, n-pentyl, n-hexyl, 2-hydroxyethyl, 2- or 3-hydroxypropyl, 2-, 3- or 4-hydroxybutyl. Rd as acyl is typically acetyl, propionyl and phenacyl.
Representative examples of X in formula A are methylene, ethylene, 1,2- or 1,3-propylene, 1,2-, 1,3- or 1,4-butylene, ethylidene, 1,1- or 2,2-propylidene, 1,1- or 2,2-butylidene, ethenylene, prop-1-en-1,3- or -1,2- or-2,3-ylene.
In a preferred embodiment of the invention, the salts are Li~3 or NH4~33 salts of carboxylic acids selected from the group consisting of furan-2-carboxylic acid, benzoic acid;
methylbenzoic acid, phenylacetic acid, cinnamic acid, sorbic acid or C2-C8-alkanecarboxylic acids.
The organic compound of non-salt character preferably contains 2 to 20, more particularly 2 to 16 and, most preferably, 2 to 12, carbon atoms. Most preferably the organiccompound is an ester of an organic monocarboxylic acid containing a total of 2 to 16 carbon atoms, an ether containing 2 to 12 carbon atoms, a ketone containing 3 to 16 carbon atoms, or an alcohol containing S to 16 carbon atoms.
In a preferred embodiment of the invention, the organic compound is a Cl-C6alkyl ester of furan-2-carboxylic acid, benzoic acid, methylbenzoic acid, phenylacetic acid, cinnamic acid, sorbic acid or a C2-C8alkanecarboxylic acid; a Cs-CI2alkanol or benzyl alcohol; a dialiphatic ketone of 3 to 10 carbon atoms, a Cl-C6alkylphenyl ketone or diphenyl ketone;
or a dialiphatic ether of 2 to 8 carbon atoms, a Cl-C6alkylphenyl ether or diphenyl ether.
For carrying out the process of this invention the membrane can be of different shape and ~3ii/ 3 built into separating modules of conventional construct;on. Thus, for example, flat membranes or asymmetrical membranes can be combined to two- or multi-compartmentsystems.It is also possible to use tubular membranes or hollow fibres which are normally used in the form of bundles. To increase mechanical stability, the membranes can be mounted on a supporting frame. The membranes are prepared by known methods.
The process of the invention is normally carried out at room temperature. To attain a sufficient rate of flOw it is advantageous to apply elevated pressure on the side of the solution. The pressure is preferably 1 to 10 MPa, most preferably 1 to 6 MPa. In a special embodiment of the invention, the process is carried out by the countercurrent principle.
The process of the invention may be used as concentration or purification process or for recovering or separating reaction components or by-products from reaction residues or reaction mixtures, or for isolating and purifying intermediates, especially when the substances in question are thermally labile.
The copolyimides of this invention are polymers having high glass transition temperatures and excellent heat stability, and they can be crosslinked direct by irradiation. They are suitable for making sheets, fibres and for coating substrates, for surface protection or for producing relief images, and the properties of the polycondensates can be modified by irradiation. The high melting aromatic copolyimides are preferably processed from solution.
The radiation sensitivity is especially high when the acid components of the copolymides contain benzophenone groups. To achieve short irradiation times it is preferred to subject copolyimides which contain such acid components to irradiation.
A preferred field of use is that of coating surfaces and producing relief images on such coated surfaces, to which utility the invention also relates. It is especially advantageous that, for attaining the desired properties, the novel copolyimides can be correspondingly adapted for specific requirements by the choice of different monomers and/or by blending different copolyimides. A îurther particular advantage of the novel copolyimides is their solubility in aqueous basic media, for example in aqueous solutions of aLkali metal hydroxides (NaOH, KOH), or in aqueous solutions of alkali metal carbonates (NaHCO3, Na2CO3, K2C3) 2 ~ 5 ~
The invention further relates to a coated material containing on a support a layer of a novel copolyimide.
To prepare the coated material, a copolyimide or a mixture thereof is dissolved preferably in a suitable organic solvent, with or without heating. Suitable solvents are polar aprotic solvents which may be used by themselves or as mixtures of at least two solvents. Typical examples of such solvents are: ethers such as dibutyl ether, tetrahydrofuran, dioxane, ethylene glycol, dimethyl ethylene glycol, dimethyl diethylene glycol, diethyl diethylene glycol, dimethyl triethylene glycol, halogenated hydrocarbons such as methylene chloride, chloroform, 1,2-dichlorethane, 1,1,1-trichloroethane, 1,1,2,2-tetrachloroethane,carboxylates and lactones such as ethyl acetate, methyl propionate, ethyl benzoate, 2-methoxyethylacetate, ~-butyrolactone, o-valerolactone and pivalolactone, carboxamides and lactams such as forrnamide, acetamide, N-methylformamide, N,N-dimethyl-formamide, N,N-dimethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, ~-butyrolactam, ~-caprolactam, N-methylpyrrolidone, N-acetylpyrrolidone, N-methyl-caprolactam, tetramethylurea, hexamethyiphosphoric triamide, sulfoxides such as dimethyl sulfoxide, sulfones such as dimethyl sulfone, diethyl sulfone, trimethylene sulfone, tetramethylene sulfone, trimethylamine, triethylamine, N-methylpyrrolidine, N-methylpiperidine, N-methylmorpholine, substituted benzenes such as chlorobenzene, nitrobenzene, phenols or cresol.
Undissolved constituents can be removed by filtration, preferably pressure filtration. The concentration of polymer in the coating material obtained is preferably not more than 50 % by weight, more particularly not more than 30 % by weight and, most preferably, not more than 20 % by weight, based on the solution. The solutions are storage-stable, but must be protected from the action of light.
During the preparation of the solutions it is possible to add further customary modifiers which do not adversely affect the light sensitivity. Typical examples of such modifiers are:
delustrants, levelling agents, finely particulate fillers, flame retardants, fluorescent whitening agents, antioxidants, light stabilisers, dyes, pigments and adhesion promoters. If desired, sensitisers may also be added, typically thioxanthone derivatives or benzophenone derivatives, so as to enhance the light sensitivity still further.
The coating composition can be applied to suitable substrates and carrier materials by conventional methods such as dip coating, brushing and spraying, whirl coating, cascade ?~
coating and curtain coating. Suitable substrates include plastics, metals and metal alloys, semi-metals, semi-conductors, glass, ceramics and other inorganic materials such as SiO2 and Si3N4. The solvent may subsequently be removed by heating and under vacuum.
Tack-free, dry and uniform films are obtained. Depending on the use, the films may have thickn~sses up to c. 500 ~,lm and more, preferably from 0.5 to 500 ~,lm and, most preferably, from 1 to 50 llm.
The radiation-sensitive layer in the material of this invention can be crosslinked by irradiation.
The photostructuring or photocrosslinking can be effected by high-energy radiation, typically by light, preferably in the UV range, by X-rays, laser light, electron beams and the like. The material of this invention is admirably suitable for producing protective films, passivation coatings, and as photographic recording material for heat-stable relief Images.
Fields of use include protective, insulating and passivation coatings in electrotechnology and electronics, photomasks for electronics, textile printing and the graphics industry, etch resists for making printed circuits and printing plates and integrated circuits, relays for making X-ray masks, as solder vamish, as dielectric for multilayer circuits, as structural element for liquid crystal displays.
Protective films are produced by direct irradiation, the exposure times depending essentially on the layer thicknesses and the light-sensitivity.
Photographic production of the relief structure is effected by imagewise exposure through a photomask and subsequent development by removing unexposed areas with an aqueous alkaline medium, preferably an aqueous solution of an alkali metal hydroxide (NaOH, KOH) or an aqueous solution of an alkali metal carbonate (Na2CO3, K2CO3, KHCO3, NaHCO3), after which the image produced may be stabilised by a thermal aftertreatment.
The invention further relates to a process for producing protective coatings or relief images, which comprises irradiating the layer of the material over the surface or through a photomask and thereafter developing the image in an aqueous alkaline medium by dissolving out the unexposed areas.
The polymer layer of the material of this invention has a light-sensitivity sufficient for many end uses and in some cases is high, and it can be photocrosslinked direct. The protective films and relief images are distinguished by good adhesion and by heat resistance, mechanical strength and resistance to chemicals. Only insignificant contraction is observed in thermal aftertreatments. In addition, the use of modifiers for inducing or increasing light-sensitivity can be avoided. The material is storage stable, but must be protected from the action of light.
The invention is illustrated in more detail by the following Examples.
A) Preparation of the copolvmers Examples A1-A14:
The diamines, dissolved in N-methylpyrrolidone (NMP), are charged to a 200 ml glass flask fitted with stirrer, reflux condenser, dropping funnel, drying tube and cooling bath.
The solution is cooled to 5C and then the tetracarboxylic anhydrides are added dropwise, with efficient stirring, to give a 20 % by weight solution. The solution is stirred for 4 hours at 20-25C. The resultant polyamic acid is cyclised by addition of triethylamine and acetic anhydride. The copolymer is precipitated in water after stirring for a further 12 hours and the precipitate is isolated by filtration, washed with methanol and dried under a high vacuum at 40C. Further particulars are given in Table 1.
- 17 - ~ ~ t~
X~ ~ !~D ~ I a ~o~ ' a ~,. ~ x a ~ ~ c ~ ~ a ~3~ ô ~;o c ^ ~ 9 ` ~ ~ ~ ~ ~ ~
~ ~l~ ~ ¢ .
~E l o . E E S ~ c ~' ~
~ N ~ ~ ~ b c C:, b c c _ ~ o C ~ C ` w ~ D w C - E ~ E
C _ C V~ C ,C U~ ~ C V') C D ' ~ ç3 o E Eô ~ ~ ~ _ ~ ~ ~ " s "~ c ô E ~ o _- _ o D ~ Y ~ < _ ? ~ ~ , 1 ; ~
a c~ td ~ ~ ~ ~ ~
_ E ~ ~ E E ~ O E E D~ O E fi ' o ~ ~ _, ~ ~ V~ ~ ~ ~ .~ ~
2 . E E D ~ D~ O E D ~ j E E D ~ C ~ 1 D~ E' ~ ~ .
c3 c ,~ c ~ ~, ~ b ~
b c ~ ~ ~" x ~ ~ c c '~
C C ~ C ~
, >~Co ~ ~_C ,~ ~ o o E ~o ~. E C o~ E~ o ~ ~ = E E
~_~ ~ ~
.. ~ ~ " E~ ,~
D o ~
9~
B) Permeation experiments Examples B1 to B7:
The membrane (diameter 4.7 cm, thickness 25 ~Lm) is secured in a support in the centre of a pressure cell. Each compartment is connected to a reservoir for the solution or pure solvent to which a pump is connected. Conductivity cells are positioned between reservoirs and pumps, and UV detectors are positioned between outlet and reservoirs. A
pressure of 2.5 MPa is applied on the side with the solution and a pressure of 0.3 MPa on the side with the solvent, and both the solution and the solution circulate in the sarne direction. The detectors measure the conductivity and UV absorption continuously. The data are evaluated by means of a computer program. The detectors are calibrated with the organic compound (methyl cinnamate) and with the salt of the carboxylic acid (lithium salt of cinnamic acid), and the calibration curves are converted into algorithms from which the desired data are computed. Methanol is used as solvene and the UV detection is carried out at 305 nm. The temperature is 25C.
The selctivity is defined as follows, GP being the amount by weight in the permeate and GL the amount by weight in the solution:
GP (nonpolar organic compound)/GP ~salt of the carboxylic acid) S=
GL (nonpolar organic compound)/GL (salt of the carboxylic acid) Further particulars are given in Table 2.
~; r~
~ 22 ~
00 ~ ~ o ~ x o . __~ v~
u~ c ~c~ c ~
c ~? 3 ~ - o o o o o o ~3 X ,~ ba C _~ ~0 , oc OaC O O O O O O O
- ~ C ~o o o o _ C ~ ~ ~ V~ C~
,_ C ~ C ~ ~ C
o X _ C C
~ .C ~ C ~ _ ,c u~ ~c~ ~ t ~ o <~ ~ ~0 c ~ ~ ~
cO~ t o, o ~ ~ c~
~ c o o o o o o c ~i ~ u~ ~ fi o c ~ ¢ ¢ ¢ ¢ ¢ ¢ ¢ 3 s _ o~
D ~ _ ~ ~ ~t 1~ ~D 1_ O C ~ oo ~ x ~ m m m E~ ~ _ $ ~i C) Exposure Examples Example C1: The copolyimide of Example A3 is dissolved in N-methylpyrrolidone (100 % by weight) and a copper laminate is coated with this solution with a 12 ,L knife (spin-coating) and dried at 100C. The coating is then exposed through a photomask (Stouffer wedge) for 30 seconds at an intensity of 40 mW/cm2 (Lamp: Ultralux 5000 H, distance 70 cm~. Development is then carried out with aqueous lN NaOH. The Stouffer step 7 is still clearly imaged.
Example C2: The copolyimide according to Example A2 is processed as in example C1.
The Stouffer step 8 is still clearly imaged.
The halogen substit-~ents are preferably F, Cl and Br. The Cl-C4alkyl and Cl-C4alkoxy substituents are typically methyl, ethyl, n- or isopropyl or n-, iso- or tert-butyl, methoxy, ethoxy, n- or isopropoxy or n-, iso- or tert-butoxy.
The tetracarboxylic acid radicals preferably contain 10 to 24 carbon atoms, mostpreferably 10 to 18 carbon atoms, the tricarboxylic acid radicals preferably contain 9 to 24 carbon atoms, most preferably 9 to 18 carbon atoms, and the diamine radicals (b) and (d) preferably contain 6 to 24 carbon atoms and, most preferably, 6 to 18 carbon atoms.
M in the S03M group as ammonium cation may be NH4~ or an ammonium cation of a primary, secondary or tertiary open-chain amine containing preferably 1 to 24, most preferably 1 to 16 ,carbon atoms, or an ammonium cation of a monocyclic or bicyclic secondary or tertiary amine or of a tricyclic tertiary amine containing preferably 4 to 12 carbon atoms.
M as a metal cation can be a mono- to trivalent cation of metals of the main groups and subgroups, of the transition metals and of the noble metals. Mono- or divalent cations are preferred. Typical examples of metals are: Li, Na, K, Rb, Cs, Mg, Ca, Sr, Ba, In, Sn, Pb, Cu, Ag, Au, Zn, Cd, Hg, Cr, Mo, Mn, Fe, Co, Ni, Rn, Rh, Pd, Ir, Pt, Sb, Bi, as well as the group of the rare earth metals. Preferred metals are the alkaline and alkaline earth metals, Cu, Ag, Au, Fe, Co, Ni, Zn, Cd and Mn.
In a preferred embodiment of the invention, M is H~, NH4~, an alkali metal cation or a primary, secondary, tertiary or quaternary ammonium cation of 1 to 24 carbon atoms.
Illustrative examples of tri- and tetracarboxylic acids and diamines from which the radicals are derived are described, inter alia, in EP-A-0 132 221, EP-A-0 162 017 and EP-A-0 181 837. Aromatic diamines containing -S03M groups are known in dyestuff chemistry and some are commercially available.
Preferred copolyimides of this invention comprise ~ i3 ~
a) structural units of formula I
O o Il 11 --N R~ N--R2- (I) Il 11 o o and additional optional structural units of formula II
O
Il / \
--C--R3 N--R4-NH- (II) o and b) structural units of formula III
O O
Il 11 --N~ R5 N - R6- (III) Il 11 O O
and additional optional structural units of formula IV
/C\
--C--R7 ~N--R8-NH- (I~i') o wherein Rl and Rs are each independently of the other an unsubstituted or substituted tetravalent aromatic radical of 6 to 20 carbon atoms, to which two of the carbonyl groups in ortho- or peri-position are attached, R3 and R7 are each independently of the other an unsubstituted or substituted trivalent aromatic radical of 6 to 20 carbon atoms, to which two carbonyl groups in ortho- or peri-position are attached, R2 and R4 are each independently of the other a divalent aromatic hydrocarbon radical of 6 to 20 carbon atoms which is unsubstituted or substituted by Cl-C4alkyl or halogen and R6 and R8 are each independently of the other a divalent aromatic hydrocarbon radical of 6 to 20 carbon atoms which is unsubstituted or substituted by Cl-C4alkyl and which contains at least one -S03M group, wherein M is H~3, a mono- to trivalent metal cation, NH4~ or an organic ammonium cation of 1 to 30 carbon atoms, with the proviso that the radicals R2 and R4 and/or the radicals R6 and R8 are substituted by Cl-C4alkyl in both ortho-positions to at least one N atom.
Preferred copolyimides are those wherein Rl and Rs are each independently of the other radicals of formula Rg O O
~P
~Y2~ .
wherein two bonds are in ortho-position to each other, Rg is H or phenacyl, Yl is a direct bond, -CH2-, -CH(CH3)-, -C(CH3)2-, -O-, -S-, -SO-, -SO2-, -C(O)O- or -NRIo-, p is 0 or 1, Y2 is -CH2-, -CH(CH3)-, -C(CH3)2-, -O-, -S-, -SO-, -SO2-, -CO- or -NRIo-, and Rlo is H or j~a ~ 6 ~
Cl-C6alkyl.
Particularly preferred copolyimides are those wherein R1 and Rs are each independently of the other radicals of formula ~e~ 3~ c ~, ~ Y~ or ~Y2x~
wherein two bonds are in ortho-position to each otber, Yl is a direct bond, -CH2-, -O-, -S-or -SO2-, and Y2 is a direct bond, -O-, -S- or -CO-.
In particular, R1 and R5 are tetravalent radicals of pyrromellitic acid, bcnzophenonetetra-carboxylic acid and thioxanthonetetracarboxylic acid.
R3 and R7 are preferably each independently of the other radicals of formula ~ or ~ Y3~
wherein two bonds are attached in ortho-position to each other, and Y3 is a direct bond, -S-, -O-, -CH2- or-CO-.
In a further preferred embodiment of the invention, the tetracarboxylic acid radicals R
and Rs and the tricarboxylic acid radicals R3 and R7 contain a benzophenone group.
The radicals R2, R4, R6 and R8 are preferably a phenylene, naphthylene or an unbridged or bridged biphenylene radical.
~ ~y ~
In preferred copolyimides of the invention, R2 and R4 are each independently of the other an unsubstituted or a chloro-, bromo- or Cl-C4alkyl-substituted radical of formulae 3X~
wherein Xl is a direct bond, -CH2-, tCH2~2 . -HC=CH-, CH3CH\, (CH3)2C\, -NRIo-, -N=N-, -CO-, -O-, -S-, -SO- or -SO2, and Rlo is H or Cl-C6alkyl, and R6 and R8 each independently of the other a radical of formulae _~ ~X2~
(Rl,)x (R11)X (R1o)x wherein X2 independently has the same meaning as Xl, Rll is Cl-C4alkyl, x is 0, 1, 2 or 3, and M is H 33, NH4~33, an alkali metal cation or a primary, secondary, tertiary or quaternary ammonium cation of 1 to 24 carbon atoms.
Especially preferred copolyimides are those comprising structural units of formulae I and III, and Xl and X2 are each independently of the other a direct bond, -CH2-, -CH=CH-, -CO-, -O- or-S-.
A particularly preferred group of copolyimides is that comprising structural units of formula I and III, wherein Rl and Rs are each independently of the other a tetravalent radical of the benzene series which is unsubstituted or substituted by phenacyl, -NO2-, -Cl or -Br, or a radical of formula r ~J ~ 5 ~ 8 ~
O O O
~ ~ ~ or wherein p is 0 or 1 and Y2 is a direct bond, -CH2-, -S-, -O- or -CO-, R2 in bo~h ortho-posilions to at least one amino group is methyl- and/or ethyl-substituted 1,3- or 1,4-phenylene, or in both o-positions to the amino groups is methyl- and/or ethyl-substituted 3,3'- or 4,4'-diphenylmethanediyl, and R6 is a radical of formulae ~ ' ~X2~
(R11)X (R11)X (R11)X
wherein X2 is a direct bond. -CH=CH- or -CH2-, Rll is methyl and/or ethyl, x is 0, 1, 2 or 3, and M is H~', NH4~, Li~, Na~, K~3, Rb~, Cs~, primary, secondary, tertiary or quaternary ammonium of 1 to 20 carbon atoms.
The most preferred copolyamides are those wherein R6 is a radical of formula or ,"~ CH- CH~
(CH3)3 wherein M is H~, NH4q3, Li~, Na~, K~, Rb~, Cs~, tertiary or quaternary ammonium of 4 to 20 carbon atoms.
The invention further relates to a process for the preparation of copolyimides according to claim 1, which comprises A) reacting and cyclising at least one ietracarboxylic acid (a') of 10 to 30 carbon atoms, .~ ~ 4 ~
which is unsllbstituted or substituted by halogen, nitro, Cl-C4alkyl, Cl-C4alkoxy or phenacyl, and at least one optional aromatic tricarboxylic acid (c') of 9 to 30 carbon atoms, which is unsubstituted or saubstituted as for (a'), or a polyamide forming derivative thereof, B) with at least one aromatic diamine (b') of 6 to 30 carbon atoms, which is unsubstituted or substituted by Cl-C4alkyl or halogen, and with at least one aromatic diamine (d') of 6 to 30 carbon atoms, which is unsubstituted or substituted by Cl-C4alkyl, and which contains at least one -SO3M group attached to the aromatic nucleus, with the proviso that at least one of said diamines (b') or (d') is substituted by C1-C4alkyl in both ortho-positions to at least one amino group.
Acid derivatives are typically anhydrides, esters, amides and halides, preferably chlorides.
The monomers used in the process are known and some are commercially available or can be prepared by known processes.
The preparation of the polyimides is preferably carried out in solution. Suitable inert solvents are listed below. The reaction temperatures may be in the rnage from -20 to 300C.
The procedure is conveniently such that the tetracarboxylic dianhydride and the diamine are reacted first to form a polyamic acid precursor, which is then cyclised, with elimination of water. The cyclisation may be carried out under heat. It is convenient to carry out the cyclisation using condensing agents such as carboxylic anhydrides, typically acetic anhydride. The polyimides can then be isolated by customary methods, for example by removal of the solvent or precipitation by addition of a non-solvent.
A further process consists in reacting the tetracarboxylic anhydride with a diisocyanate in one step to the polyimide.
From the novel copolyimides it is possible to prepare semipermeable membranes with which, surprisingly, mixtures of organic compounds can be separated or individual-constituents concentrated.
In another of its aspects, the invention relates to a process for concentrating or separating salts of organic carboxylic acids from organic compounds of non-salt character with the ;~ ~J L v~
aid of semipermeable membranes, which process comprises contacting a solution of the salts and organic compounds in an unsubstituted or Cl-C3alkoxy-substituted Cl-C4alkanol, mixtures of such alkanols or mixtures of such alkanols with ethers, with one side of the membrane, the pure solvent being present on the other side of the membrane, and said membrane is made from a copolyimide, and to the use of novel copolyimides in the form of semipermeable membranes for concentrating or separating salts of organic carboxylic acids from organic compounds of non-salt character.
The concentration of the salts and organic compounds is preferably 0.0001 to 10 percent by weight, more particularly 0.001 to 5 percent by weight and, most preferably, 0.001 to 3 percent by weight.
The thickness of the membrane may be from S to 300 ~Lm, preferably from 20 to 200 llm.
The alkanol used as solvent contains 1 to 4, and, preferably, 1 to 3, carbon atoms. It may be substituted by methoxy or ethoxy. Representative examples of such alkanols are:
methanol, ethanol, n- and isopropanol, n-, iso- and tert-butanol, methoxyethanol, ethoxy-ethanol, propoxyethanol, l-methoxypropan-3-ol, 2-methoxypropan- l-ol. Preferred solvents are methanol, ethanol, 1- or 2-propanol and 2-methoxyethanol. It is also possible to use mixtures of the alkanols with one another or with ethers, such as diethyl ether or ethylene glycol dimethyl ether.
The salt of the organic carboxylic acid may be an ammonium or a metal salt, such as NH4~E', an ammonium cation of a primary, secondary or tertiary amine containing a total of 1 to 20 carbon atoms, an alkali metal salt or an alkaline earth metal salt. Alkali metal salts and ammonium salts are preferred. NH4~\ and Li~3 salts are most preferred.
The organic carboxylic acid may be selected from mono-, di-, tri- or tetracarboxylic acids.
Aliphatic, cycloaliphatic, aromatic and heterocyclic or heteroaromatic monocarboxylic acids which contain 1 to 18, preferably 1 to 12, carbon atoms, are preferred.
In a preferred embodiment of the invention, the organic acid has the formula (A) Ra-X-COOH (A) wherein X is a direct bond, Cl-C4alkylene, C2-C4alkylidene or C2-C4alkenylene, R3 is H, Cl-Cl2alkyl, c2-cl2alkenyl~ c2-cl2alkynyl~ C3-Cl2cycloalkyl, C3-CI2cycloalkenyl,C6-Cl6aryl, C3-Cl2heterocycloalkyl, C3-Cl2heterocycloalkenyl, C6-Cl6heteroaryl, which are unsubstituted or substituted by -OH, -SH, -CN, -NO2, halogen, Cl-C6alkyl, C1-C6alkoxy, Cl-C6alkylthio, C1-C6alkyl-Y-, where Y is -CO-, -SO-, -SO2-, -CO-O-, -O-CO-, -CO-NRbRc-, -NRbRc-CO-, and Rb and Rc are each independently of the other H, C1-C6alkyl, C2-C4hydroxyalkyl or Rb and Rc, when taken together, are tetramethylene, pentamethylene or 3-oxapentyl-1,4-ene.
Ra as alkyl, which may be linear or branched, is typically methyl, ethyl, n- and isopropyl, n- and isobutyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl and dodecyl.
Ra as alkenyl, which may be linear or branched, is typically vinyl, crotonyl, allyl, but-1-en-1-yl, but-1-en-2-yl, but-1-en-3-yl, but-1-en-4-yl, but-2-en-1-yl, but-2-en-2-yl, but-2-en-4-yl, pentenyl, hexenyl, heptenyl, octenyl, nonenyl, decenyl, undecenyl and dodecenyl.
Ra as alkynyl, which may be linear or branched, is typically ethynyl, prop-2-yn-1-yl, prop-2-yn-3-yl, butynyl, pentynyl, hexynyl, heptynyl, octynyl, decynyl and dodecynyl.
Ra as cycloalkyl and cycloalkenyl preferably contains 4 to 8, most preferably 5 or 6, carbon atoms. Typical examples are cyclopropyl and cyclopropenyl, cyclobutyl and cyclo-butenyl, cyclopentyl and cyclopentenyl, cyclohexyl and cyclohexenyl, cycloheptyl and cycloheptenyl, cyclooctyl and cyclooctenyl.
Ra as aryl preferably contains 6 to 12 carbon atoms. Typical examples are phenyl, biphenyl and naphthyl.
Ra as heterocycloalkyl and heterocycloalkenyl preferably contains 4 to 8, most preferably 4 to 6, ring carbon atoms. Preferred hetero atoms are those selected from the group consisting of O, S and NRd, wherein Rd is H, C1-C6alkyl or C1-C7acyl. Ra as heteroaryl preferably contains 4 to 11 ring carbon atoms and, preferably, hetero atoms selected from the group consisting of O, S and -N=. Typical examples of heterocycles are pyrrolidine, tetrahydrofuran, tetrahydrothiophen, pyrroline, dihydrofuran, dihydrothiophene, indane, dihydrocoumarone, dihydrobenzothiophene, carbazole, dibenzofuran, dibenzothiophene, pyrazolidine, imidazolidine, pyrazoline, imidazoline, benzimidazolidine, oxazolidine, oxazoline, thiazolidine, thiazoline, isooxazolidine, isooxazoline, isothiazolidine, 2 ~ .~
isothiazoline, benzoxazolidine, benzoisooxazolidine, benzothiazolidine, 1,2,3- or 1,2,4-triazolidine, 1,2,3- or 1,2,4-triazoline, 1,2,3- or 1,2,4-oxazolidine or-oxazoline, piperidine, di- and tetrahydropyridine, dihydro- and tetrahydropyran, di- and tetra-hydrothiopyran, piperazine, dehydropiperazine, morpholine, thiomorphol;ne, 1,3- and 1,4-dioxan, 1,4-dithiane, azepane, 1,3-Dioxolan, 1,3-dithiolane, pyrrole, indole, imidazole, benzoimidazole, furan, thiophene, benzofuran, benzothiophene, carbazole, dibenzofuran, dibenzothiophene, oxazole, isooxazole, thiazole, isothiazole, benzoxazole, benzothiazole, pyridine, pyrimidine, pyrazine, pyridazine, quinoline, isoquinoline, acridine, chromene, chroman, pyran, thiapyran, phenazine, phenoxazine, phenolthiazine, purine.
Rb, Rc and Rd as alkyl and hydroxyalkyl may be methyl, ethyl, n- or isopropyl, n-, iso- or tert-butyl, n-pentyl, n-hexyl, 2-hydroxyethyl, 2- or 3-hydroxypropyl, 2-, 3- or 4-hydroxybutyl. Rd as acyl is typically acetyl, propionyl and phenacyl.
Representative examples of X in formula A are methylene, ethylene, 1,2- or 1,3-propylene, 1,2-, 1,3- or 1,4-butylene, ethylidene, 1,1- or 2,2-propylidene, 1,1- or 2,2-butylidene, ethenylene, prop-1-en-1,3- or -1,2- or-2,3-ylene.
In a preferred embodiment of the invention, the salts are Li~3 or NH4~33 salts of carboxylic acids selected from the group consisting of furan-2-carboxylic acid, benzoic acid;
methylbenzoic acid, phenylacetic acid, cinnamic acid, sorbic acid or C2-C8-alkanecarboxylic acids.
The organic compound of non-salt character preferably contains 2 to 20, more particularly 2 to 16 and, most preferably, 2 to 12, carbon atoms. Most preferably the organiccompound is an ester of an organic monocarboxylic acid containing a total of 2 to 16 carbon atoms, an ether containing 2 to 12 carbon atoms, a ketone containing 3 to 16 carbon atoms, or an alcohol containing S to 16 carbon atoms.
In a preferred embodiment of the invention, the organic compound is a Cl-C6alkyl ester of furan-2-carboxylic acid, benzoic acid, methylbenzoic acid, phenylacetic acid, cinnamic acid, sorbic acid or a C2-C8alkanecarboxylic acid; a Cs-CI2alkanol or benzyl alcohol; a dialiphatic ketone of 3 to 10 carbon atoms, a Cl-C6alkylphenyl ketone or diphenyl ketone;
or a dialiphatic ether of 2 to 8 carbon atoms, a Cl-C6alkylphenyl ether or diphenyl ether.
For carrying out the process of this invention the membrane can be of different shape and ~3ii/ 3 built into separating modules of conventional construct;on. Thus, for example, flat membranes or asymmetrical membranes can be combined to two- or multi-compartmentsystems.It is also possible to use tubular membranes or hollow fibres which are normally used in the form of bundles. To increase mechanical stability, the membranes can be mounted on a supporting frame. The membranes are prepared by known methods.
The process of the invention is normally carried out at room temperature. To attain a sufficient rate of flOw it is advantageous to apply elevated pressure on the side of the solution. The pressure is preferably 1 to 10 MPa, most preferably 1 to 6 MPa. In a special embodiment of the invention, the process is carried out by the countercurrent principle.
The process of the invention may be used as concentration or purification process or for recovering or separating reaction components or by-products from reaction residues or reaction mixtures, or for isolating and purifying intermediates, especially when the substances in question are thermally labile.
The copolyimides of this invention are polymers having high glass transition temperatures and excellent heat stability, and they can be crosslinked direct by irradiation. They are suitable for making sheets, fibres and for coating substrates, for surface protection or for producing relief images, and the properties of the polycondensates can be modified by irradiation. The high melting aromatic copolyimides are preferably processed from solution.
The radiation sensitivity is especially high when the acid components of the copolymides contain benzophenone groups. To achieve short irradiation times it is preferred to subject copolyimides which contain such acid components to irradiation.
A preferred field of use is that of coating surfaces and producing relief images on such coated surfaces, to which utility the invention also relates. It is especially advantageous that, for attaining the desired properties, the novel copolyimides can be correspondingly adapted for specific requirements by the choice of different monomers and/or by blending different copolyimides. A îurther particular advantage of the novel copolyimides is their solubility in aqueous basic media, for example in aqueous solutions of aLkali metal hydroxides (NaOH, KOH), or in aqueous solutions of alkali metal carbonates (NaHCO3, Na2CO3, K2C3) 2 ~ 5 ~
The invention further relates to a coated material containing on a support a layer of a novel copolyimide.
To prepare the coated material, a copolyimide or a mixture thereof is dissolved preferably in a suitable organic solvent, with or without heating. Suitable solvents are polar aprotic solvents which may be used by themselves or as mixtures of at least two solvents. Typical examples of such solvents are: ethers such as dibutyl ether, tetrahydrofuran, dioxane, ethylene glycol, dimethyl ethylene glycol, dimethyl diethylene glycol, diethyl diethylene glycol, dimethyl triethylene glycol, halogenated hydrocarbons such as methylene chloride, chloroform, 1,2-dichlorethane, 1,1,1-trichloroethane, 1,1,2,2-tetrachloroethane,carboxylates and lactones such as ethyl acetate, methyl propionate, ethyl benzoate, 2-methoxyethylacetate, ~-butyrolactone, o-valerolactone and pivalolactone, carboxamides and lactams such as forrnamide, acetamide, N-methylformamide, N,N-dimethyl-formamide, N,N-dimethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, ~-butyrolactam, ~-caprolactam, N-methylpyrrolidone, N-acetylpyrrolidone, N-methyl-caprolactam, tetramethylurea, hexamethyiphosphoric triamide, sulfoxides such as dimethyl sulfoxide, sulfones such as dimethyl sulfone, diethyl sulfone, trimethylene sulfone, tetramethylene sulfone, trimethylamine, triethylamine, N-methylpyrrolidine, N-methylpiperidine, N-methylmorpholine, substituted benzenes such as chlorobenzene, nitrobenzene, phenols or cresol.
Undissolved constituents can be removed by filtration, preferably pressure filtration. The concentration of polymer in the coating material obtained is preferably not more than 50 % by weight, more particularly not more than 30 % by weight and, most preferably, not more than 20 % by weight, based on the solution. The solutions are storage-stable, but must be protected from the action of light.
During the preparation of the solutions it is possible to add further customary modifiers which do not adversely affect the light sensitivity. Typical examples of such modifiers are:
delustrants, levelling agents, finely particulate fillers, flame retardants, fluorescent whitening agents, antioxidants, light stabilisers, dyes, pigments and adhesion promoters. If desired, sensitisers may also be added, typically thioxanthone derivatives or benzophenone derivatives, so as to enhance the light sensitivity still further.
The coating composition can be applied to suitable substrates and carrier materials by conventional methods such as dip coating, brushing and spraying, whirl coating, cascade ?~
coating and curtain coating. Suitable substrates include plastics, metals and metal alloys, semi-metals, semi-conductors, glass, ceramics and other inorganic materials such as SiO2 and Si3N4. The solvent may subsequently be removed by heating and under vacuum.
Tack-free, dry and uniform films are obtained. Depending on the use, the films may have thickn~sses up to c. 500 ~,lm and more, preferably from 0.5 to 500 ~,lm and, most preferably, from 1 to 50 llm.
The radiation-sensitive layer in the material of this invention can be crosslinked by irradiation.
The photostructuring or photocrosslinking can be effected by high-energy radiation, typically by light, preferably in the UV range, by X-rays, laser light, electron beams and the like. The material of this invention is admirably suitable for producing protective films, passivation coatings, and as photographic recording material for heat-stable relief Images.
Fields of use include protective, insulating and passivation coatings in electrotechnology and electronics, photomasks for electronics, textile printing and the graphics industry, etch resists for making printed circuits and printing plates and integrated circuits, relays for making X-ray masks, as solder vamish, as dielectric for multilayer circuits, as structural element for liquid crystal displays.
Protective films are produced by direct irradiation, the exposure times depending essentially on the layer thicknesses and the light-sensitivity.
Photographic production of the relief structure is effected by imagewise exposure through a photomask and subsequent development by removing unexposed areas with an aqueous alkaline medium, preferably an aqueous solution of an alkali metal hydroxide (NaOH, KOH) or an aqueous solution of an alkali metal carbonate (Na2CO3, K2CO3, KHCO3, NaHCO3), after which the image produced may be stabilised by a thermal aftertreatment.
The invention further relates to a process for producing protective coatings or relief images, which comprises irradiating the layer of the material over the surface or through a photomask and thereafter developing the image in an aqueous alkaline medium by dissolving out the unexposed areas.
The polymer layer of the material of this invention has a light-sensitivity sufficient for many end uses and in some cases is high, and it can be photocrosslinked direct. The protective films and relief images are distinguished by good adhesion and by heat resistance, mechanical strength and resistance to chemicals. Only insignificant contraction is observed in thermal aftertreatments. In addition, the use of modifiers for inducing or increasing light-sensitivity can be avoided. The material is storage stable, but must be protected from the action of light.
The invention is illustrated in more detail by the following Examples.
A) Preparation of the copolvmers Examples A1-A14:
The diamines, dissolved in N-methylpyrrolidone (NMP), are charged to a 200 ml glass flask fitted with stirrer, reflux condenser, dropping funnel, drying tube and cooling bath.
The solution is cooled to 5C and then the tetracarboxylic anhydrides are added dropwise, with efficient stirring, to give a 20 % by weight solution. The solution is stirred for 4 hours at 20-25C. The resultant polyamic acid is cyclised by addition of triethylamine and acetic anhydride. The copolymer is precipitated in water after stirring for a further 12 hours and the precipitate is isolated by filtration, washed with methanol and dried under a high vacuum at 40C. Further particulars are given in Table 1.
- 17 - ~ ~ t~
X~ ~ !~D ~ I a ~o~ ' a ~,. ~ x a ~ ~ c ~ ~ a ~3~ ô ~;o c ^ ~ 9 ` ~ ~ ~ ~ ~ ~
~ ~l~ ~ ¢ .
~E l o . E E S ~ c ~' ~
~ N ~ ~ ~ b c C:, b c c _ ~ o C ~ C ` w ~ D w C - E ~ E
C _ C V~ C ,C U~ ~ C V') C D ' ~ ç3 o E Eô ~ ~ ~ _ ~ ~ ~ " s "~ c ô E ~ o _- _ o D ~ Y ~ < _ ? ~ ~ , 1 ; ~
a c~ td ~ ~ ~ ~ ~
_ E ~ ~ E E ~ O E E D~ O E fi ' o ~ ~ _, ~ ~ V~ ~ ~ ~ .~ ~
2 . E E D ~ D~ O E D ~ j E E D ~ C ~ 1 D~ E' ~ ~ .
c3 c ,~ c ~ ~, ~ b ~
b c ~ ~ ~" x ~ ~ c c '~
C C ~ C ~
, >~Co ~ ~_C ,~ ~ o o E ~o ~. E C o~ E~ o ~ ~ = E E
~_~ ~ ~
.. ~ ~ " E~ ,~
D o ~
9~
B) Permeation experiments Examples B1 to B7:
The membrane (diameter 4.7 cm, thickness 25 ~Lm) is secured in a support in the centre of a pressure cell. Each compartment is connected to a reservoir for the solution or pure solvent to which a pump is connected. Conductivity cells are positioned between reservoirs and pumps, and UV detectors are positioned between outlet and reservoirs. A
pressure of 2.5 MPa is applied on the side with the solution and a pressure of 0.3 MPa on the side with the solvent, and both the solution and the solution circulate in the sarne direction. The detectors measure the conductivity and UV absorption continuously. The data are evaluated by means of a computer program. The detectors are calibrated with the organic compound (methyl cinnamate) and with the salt of the carboxylic acid (lithium salt of cinnamic acid), and the calibration curves are converted into algorithms from which the desired data are computed. Methanol is used as solvene and the UV detection is carried out at 305 nm. The temperature is 25C.
The selctivity is defined as follows, GP being the amount by weight in the permeate and GL the amount by weight in the solution:
GP (nonpolar organic compound)/GP ~salt of the carboxylic acid) S=
GL (nonpolar organic compound)/GL (salt of the carboxylic acid) Further particulars are given in Table 2.
~; r~
~ 22 ~
00 ~ ~ o ~ x o . __~ v~
u~ c ~c~ c ~
c ~? 3 ~ - o o o o o o ~3 X ,~ ba C _~ ~0 , oc OaC O O O O O O O
- ~ C ~o o o o _ C ~ ~ ~ V~ C~
,_ C ~ C ~ ~ C
o X _ C C
~ .C ~ C ~ _ ,c u~ ~c~ ~ t ~ o <~ ~ ~0 c ~ ~ ~
cO~ t o, o ~ ~ c~
~ c o o o o o o c ~i ~ u~ ~ fi o c ~ ¢ ¢ ¢ ¢ ¢ ¢ ¢ 3 s _ o~
D ~ _ ~ ~ ~t 1~ ~D 1_ O C ~ oo ~ x ~ m m m E~ ~ _ $ ~i C) Exposure Examples Example C1: The copolyimide of Example A3 is dissolved in N-methylpyrrolidone (100 % by weight) and a copper laminate is coated with this solution with a 12 ,L knife (spin-coating) and dried at 100C. The coating is then exposed through a photomask (Stouffer wedge) for 30 seconds at an intensity of 40 mW/cm2 (Lamp: Ultralux 5000 H, distance 70 cm~. Development is then carried out with aqueous lN NaOH. The Stouffer step 7 is still clearly imaged.
Example C2: The copolyimide according to Example A2 is processed as in example C1.
The Stouffer step 8 is still clearly imaged.
Claims (22)
1. A copolyimide having an inherent viscosity of 0.2 to 3.0 dl/g, measured at 25°C in a solution of 0.5 % by weight of said copolyimide in N-methylpyrrolidone, and comprising A) at least one structural repeating unit of aromatic tetracarboxylic acid radicals (a) which contain 10 to 30 carbon atoms and which are unsubstituted or substituted by halogen, nitro, Cl-C4alkyl, Cl-C4alkoxy or phenacyl, and aromatic diamine radicals (b) which contain 6 to 30 carbon atoms and which are unsubstituted or substituted by Cl-C4alkyl or halogen; and at least one additional optional structural repeating unit of aromatic tricarboxylic acid radicals (c) of 9 to 30 carbon atoms, which radicals are unsubstituted or substituted as for (a), and of identical or different diamine radicals (b), and B) at least one structural repeating unit of identical or different tetracarboxylic acid radicals (a) and aromatic diamines (d) which contain 6 to 30 carbon atoms and which are unsubstituted or substituted by Cl-C4alkyl, and which contain at least one -SO3M group attached to the aromatic nucleus, wherein M is H?, a mono- to trivalent metal cation, NH4? or an organic ammonium cation of 1 to 30 carbon atoms; and additional optional structural repeating units of identical or different aromatic tricarboxylic acid radicals (c) and identical or different diamine radicals (d), with the proviso that at least one of said diamine radicals (b) or (d) is substituted by C1-C4alkyl in both ortho-positions to at least one N atom.
2. A copolyimide according to claim 1, wherein the diamine radicals (b) are substituted by Cl-C4alkyl in both ortho-positions to both N atoms.
3. A copolyimide according to claim 1, wherein the diamine radicals (d) are substituted by Cl-C4alkyl in both ortho-positions of both N atoms.
4. A copolyimide according to claim 1, wherein the diamine radicals (b) and (d) are substituted by methyl and/or ethyl in both ortho-positions of both N atoms.
5. A copolyimide according to claim 1, which contains 5 to 95 mol % of component (A) and 95 to 5 mol % of component (B), based on said copolyimide.
6. A copolyimide according to claim 5, which contains 50 to 95 mol % of component (A) and 50 to 5 mol % of component (B).
7. A copolyimide according to claim 1, which comprises a) structural units of formula I
(I) and additional optional structural units of formula II
(II), and b) structural units of formula III
(III) and additional optional structural units of formula IV
(IV) wherein R1 and R5 are each independently of the other an unsubstituted or substituted tetravalent aromatic radical of 6 to 20 carbon atoms, to which two of the carbonyl groups in ortho- or peri-position are attached, R3 and R7 are each independently of the other an unsubstituted or substituted trivalent aromatic radical of 6 to 20 carbon atoms, to which two carbonyl groups in ortho- or peri-position are attached, R2 and R4 are each independently of the other a divalent aromatic hydrocarbon radical of 6 to 20 carbon atoms which is unsubstituted or substituted by Cl-C4alkyl or halogen and R6 and R8 are each independently of the other a divalent aromatic hydrocarbon radical of 6 to 20 carbon atoms which is unsubstituted or substituted by Cl-C4alkyl and which contains at least one -SO3M group, wherein M is H?, a mono- to trivalent metal cation, NH4? or an organic ammonium cation of 1 to 30 carbon atoms, with the proviso that the radicals R2 and R4 and/or the radicals R6 and R8 are substituted by Cl-C4alkyl in both ortho-positions to at least one N atom.
(I) and additional optional structural units of formula II
(II), and b) structural units of formula III
(III) and additional optional structural units of formula IV
(IV) wherein R1 and R5 are each independently of the other an unsubstituted or substituted tetravalent aromatic radical of 6 to 20 carbon atoms, to which two of the carbonyl groups in ortho- or peri-position are attached, R3 and R7 are each independently of the other an unsubstituted or substituted trivalent aromatic radical of 6 to 20 carbon atoms, to which two carbonyl groups in ortho- or peri-position are attached, R2 and R4 are each independently of the other a divalent aromatic hydrocarbon radical of 6 to 20 carbon atoms which is unsubstituted or substituted by Cl-C4alkyl or halogen and R6 and R8 are each independently of the other a divalent aromatic hydrocarbon radical of 6 to 20 carbon atoms which is unsubstituted or substituted by Cl-C4alkyl and which contains at least one -SO3M group, wherein M is H?, a mono- to trivalent metal cation, NH4? or an organic ammonium cation of 1 to 30 carbon atoms, with the proviso that the radicals R2 and R4 and/or the radicals R6 and R8 are substituted by Cl-C4alkyl in both ortho-positions to at least one N atom.
8. A copolyimide according to claim 7, wherein R1 and R5 are each independently of the other radicals of formula , , , , or wherein two bonds are in ortho-position to each other, R9 is H or phenacyl, Y1 is a direct bond, -CH2-, -CH(CH3)-, -C(CH3)2-, -O-, -S-, -SO-, -SO2-, -C(O)O- or -NR10-, p is 0 or 1, Y2 is -CH2-, -CH(CH3)-, -C(CH3)2-, -O-, -S-, -SO-, -SO2-, -CO- or -NR10-, and R10 is H or C1-C6alkyl.
9. A copolyimide according to claim 7, wherein R1 and R5 are each independently of the other radicals of formula , , or wherein two bonds are in ortho-position to each other, Yl is a direct bond, -CH2-, -O-, -S-or -SO2-, and Y2 is a direct bond, -O-, -S- or -CO-.
10. A copolyimide according to claim 7, wherein R3 and R7 are preferably each independently of the other radicals of formula wherein two bonds are attached in ortho-position to each other, and Y3 is a direct bond, -S-, -O-, -CH2- or-CO-.
11. A copolyimide according to claim 7, wherein the tetracarboxylic acid radicals R1 and R5 and the tricarboxylic acid radicals R3 and R7 contain a benzophenone group.
12. A copolyimide according to claim 7, wherein R2, R4, R6 and R8 are preferably a phenylene, naphthylene or an unbridged or bridged biphenylene radical.
13. A copolyimide according to claim 7, wherein copolyimides of the invention, R2 and R4 are each independently of the other an unsubstituted or a chloro-, bromo- or Cl-C4-alkyl-substituted radical of formulae , , , wherein X1 is a direct bond, -CH2-, ?CH2?, -HC=CH-,, , -NR10-, -N=N-, -CO-, -O-,-S-, -SO- or -SO2, and R10 is H or C1-C6alkyl, and R6 and R8 each independently of the other a radical of formulae , wherein X2 independently has the same meaning as X1, R11 is C1-C4alkyl, x is 0, 1, 2 or 3, and M is H?, NH4?, an alkali metal cation or a primary, secondary, tertiary or quaternary ammonium cation of 1 to 24 carbon atoms.
14. A copolyimide according to claim 13, which comprises structural units of formulae I
and III, and Xl and X2 are each independently of the other a direct bond, -CH2-,-CH=CH-,-CO-, -O- or-S-.
and III, and Xl and X2 are each independently of the other a direct bond, -CH2-,-CH=CH-,-CO-, -O- or-S-.
15. A copolyimide according to claim 7, which comprises structural units of formula I and III, wherein R1 and R5 are each independently of the other a tetravalent radical of the benzene series which is unsubstituted or substituted by phenacyl, -NO2-, -Cl or -Br, or a radical of formula or wherein p is 0 or 1 and Y2 is a direct bond, -CH2-, -S-, -O- or -CO-, R2 in both ortho-positions to at least one amino group is methyl- and/or ethyl-substituted 1,3- or 1,4-phenylene, or in both o-positions to the amino groups is methyl- and/or ethyl-substituted 3,3'- or 4,4'-diphenylmethanediyl, and R6 is a radical of formulae , wherein X2 is a direct bond. -CH=CH- or -CH2-, R11 is methyl and/or ethyl, x is 0, 1, 2 or 3, and M is H?, NH4?, Li?, Na?, K?, Rb?, Cs?, primary, secondary, tertiary orquaternary ammonium of 1 to 20 carbon atoms.
16. A copolyimide according to claim 15, wherein R6 is a radical of formula or wherein M is H?, NH4?, Li?, Na?, K?, Rb?, Cs?, tertiary or quaternary ammonium of 4 to 20 carbon atoms.
17. A process for the preparation of a copolyimide according to claim 1, which comprises A) reacting and cyclising at least one tetracarboxylic acid (a') of 10 to 30 carbon atoms, which is unsubstituted or substituted by halogen, nitro, Cl-C4alkyl, Cl-C4alkoxy or phenacyl, and at least one optional aromatic tricarboxylic acid (c') of 9 to 30 carbon atoms, which is unsubstituted or substituted as for (a'), or a polyamide forming derivative thereof, B) with at least one aromatic diamine (b') of 6 to 30 carbon atoms, which is unsubstituted or substituted by Cl-C4alkyl or halogen, and with at least one aromatic diamine (d') of 6 to 30 carbon atoms, which is unsubstituted or substituted by C1-C4alkyl, and which contains at least one -SO3M group attached to the aromatic nucleus, with the proviso that at least one of said diamines (b') or (d') is substituted by Cl-C4alkyl in both ortho-positions to at least one amino group.
18. Coated material containing on a support a layer of a copolyamide according to claim 1.
19. A process for the production of protective layers or relief images, which comprises irradiating the layer of material over the surface or through a photomask, and therafter developing the image so produced in an aqueous alkaline medium by dissolving out the unexposed areas.
20. A process for concentrating or separating salts of organic carboxylic acids from organic compounds of non-salt character with the aid of a semipermeable membrane, which process comprises contacting a solution of the salts and organic compounds in an unsubstituted or C1-C3alkoxy substituted C1-C4alkanol, mixtures of such alkanols or mixtures of such alkanols with ethers, with one side of the membrane, the pure solvent being present on the other side of the membrane, and said membrane is made from a copolyamide as claimed in claim 1.
21. Use of a copolyimide according to claim 1 for the production of protective layers or relief images.
22. Use of a copolyimide according to claim 1 in the form of a semipermeable membrane for concentrating or separating salts of carboxylic acids from organic compounds of non-salt character.
FO 7.3/DA/ac*
FO 7.3/DA/ac*
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US5198316A (en) * | 1990-08-17 | 1993-03-30 | Ciba-Geigy Corporation | Copolyimides, their preparation and the use thereof |
FI93680C (en) * | 1992-05-07 | 1995-05-10 | Outokumpu Instr Oy | Support construction for thin film and process for making it |
AU698309B2 (en) * | 1993-04-09 | 1998-10-29 | Bayer Corporation | Electrochemical sensors |
US5387329A (en) * | 1993-04-09 | 1995-02-07 | Ciba Corning Diagnostics Corp. | Extended use planar sensors |
US5744575A (en) * | 1995-06-06 | 1998-04-28 | Ube Industries, Ltd. | Aromatic polyimide and gas separation |
US5725633A (en) * | 1995-06-30 | 1998-03-10 | Praxair Technology, Inc. | Sulfonated polyimide gas separation membranes |
EP0753336A3 (en) * | 1995-07-12 | 1997-07-02 | Bend Res Inc | Solvent resistant microporous polyimide membranes |
US6066696A (en) * | 1996-12-13 | 2000-05-23 | Samsung Display Devices Co. Ltd. | Optical alignment composition, alignment layer formed using the same and LCD having the alignment layer |
KR100230436B1 (en) * | 1996-12-17 | 1999-11-15 | 손욱 | Optical alignment composition, aligment layer formed therefrom, liquid crystal device employing the alignment layer |
ATE292822T1 (en) | 1998-11-13 | 2005-04-15 | Cellomics Inc | METHOD AND SYSTEM FOR EFFICIENTLY OBTAINING AND STORING EXPERIMENTAL DATA |
FR2789912B1 (en) * | 1999-02-18 | 2002-12-20 | Commissariat Energie Atomique | PROCESS AND DEVICE FOR SEPARATING SEMI-PERMEABLE MEMBRANES FROM SULPHONATED POLYIMIDES |
US6768982B1 (en) | 2000-09-06 | 2004-07-27 | Cellomics, Inc. | Method and system for creating and using knowledge patterns |
JP2006265175A (en) * | 2005-03-24 | 2006-10-05 | Yamaguchi Univ | Aromatic diamino compound |
JP5434490B2 (en) * | 2008-12-01 | 2014-03-05 | Jnc株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element |
JP2015083296A (en) | 2013-09-20 | 2015-04-30 | 富士フイルム株式会社 | Gas separation membrane, gas separation module, gas separation device, and gas separation method |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3666709A (en) * | 1968-12-14 | 1972-05-30 | Shawa Densen Denran Kk A K A S | Solvent soluble aromatic polymides and production thereof |
CA959191A (en) * | 1968-12-14 | 1974-12-10 | Munehiko Suzuki | Aromatic polymides and production thereof |
FR2050251A1 (en) * | 1969-07-08 | 1971-04-02 | Inst Francais Du Petrole | Sulphonated polyimides (i) used as ion ex- - changes and in electrodialysis |
FR2212356A1 (en) * | 1972-12-29 | 1974-07-26 | Inst Francais Du Petrole | Sulphonated imide amide copolymers - used as films membranes, cationic varnishes, ion exchangers, in electrodialysis etc |
US4629777A (en) * | 1983-05-18 | 1986-12-16 | Ciba-Geigy Corporation | Polyimides, a process for their preparation and their use |
DE3486131T2 (en) * | 1983-08-01 | 1993-10-28 | Hitachi Ltd | Low thermal expansion resin material for wiring insulation film. |
EP0162017B1 (en) * | 1984-05-17 | 1991-08-21 | Ciba-Geigy Ag | Homo and copolymer, process of their crosslinking and their use |
US4698295A (en) * | 1984-11-16 | 1987-10-06 | Ciba-Geigy Corporation | Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivatives |
US4978733A (en) * | 1989-03-09 | 1990-12-18 | Hoechst Celanese Corp. | Polyamide-polyamide-polyimide and polybenzoxazole-polyamide-polyimide polymer having at least one fluorine-containing linking group |
-
1991
- 1991-08-08 DE DE59105367T patent/DE59105367D1/en not_active Expired - Fee Related
- 1991-08-08 EP EP19910810624 patent/EP0471650B1/en not_active Expired - Lifetime
- 1991-08-12 US US07/744,620 patent/US5145940A/en not_active Expired - Fee Related
- 1991-08-15 IL IL99193A patent/IL99193A0/en unknown
- 1991-08-15 CA CA 2049265 patent/CA2049265A1/en not_active Abandoned
- 1991-08-16 JP JP22977791A patent/JPH0687957A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
IL99193A0 (en) | 1992-07-15 |
DE59105367D1 (en) | 1995-06-08 |
EP0471650A1 (en) | 1992-02-19 |
US5145940A (en) | 1992-09-08 |
JPH0687957A (en) | 1994-03-29 |
EP0471650B1 (en) | 1995-05-03 |
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