CA2127323A1 - Process for Preparing High Crystallinity Oxide Thin Film - Google Patents

Process for Preparing High Crystallinity Oxide Thin Film

Info

Publication number
CA2127323A1
CA2127323A1 CA2127323A CA2127323A CA2127323A1 CA 2127323 A1 CA2127323 A1 CA 2127323A1 CA 2127323 A CA2127323 A CA 2127323A CA 2127323 A CA2127323 A CA 2127323A CA 2127323 A1 CA2127323 A1 CA 2127323A1
Authority
CA
Canada
Prior art keywords
substrate
thin film
oxide thin
supplied
high crystallinity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2127323A
Other languages
French (fr)
Other versions
CA2127323C (en
Inventor
So Tanaka
Michitomo Iiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP19085493A external-priority patent/JP3413888B2/en
Priority claimed from JP5200016A external-priority patent/JPH0738164A/en
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of CA2127323A1 publication Critical patent/CA2127323A1/en
Application granted granted Critical
Publication of CA2127323C publication Critical patent/CA2127323C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming superconductor layers
    • H10N60/0381—Processes for depositing or forming superconductor layers by evaporation independent of heat source, e.g. MBE
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/22—Complex oxides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/22—Complex oxides
    • C30B29/225—Complex oxides based on rare earth copper oxides, e.g. high T-superconductors
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/22—Complex oxides
    • C30B29/32—Titanates; Germanates; Molybdates; Tungstates

Abstract

A process for preparing an oxide thin film which has a crystalline, clean and smooth surface on a substrate. The process is conducted by using an apparatus comprising a vacuum chamber in which an oxidizing gas of O2 including O3 can be supplied near the substrate so that pressure around the substrate can be increased while maintaining high vacuum near an evaporation source and Knudsen cell evaporation sources arranged in the vacuum chamber wherein the substrate is heated, molecular beam of constituent atoms of the oxide excluding oxygen are supplied from the K
cell evaporation sources and an oxidizing gas is locally supplied to the vicinity of the substrate.
CA002127323A 1993-07-02 1994-07-04 Process for preparing high crystallinity oxide thin film Expired - Fee Related CA2127323C (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP190854/1993 1993-07-02
JP19085493A JP3413888B2 (en) 1993-07-02 1993-07-02 Method of forming oxide thin film
JP200016/1993 1993-07-19
JP5200016A JPH0738164A (en) 1993-07-19 1993-07-19 Method of stacking upper layer thin film over oxide superconducting thin film

Publications (2)

Publication Number Publication Date
CA2127323A1 true CA2127323A1 (en) 1995-01-03
CA2127323C CA2127323C (en) 1998-08-18

Family

ID=26506345

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002127323A Expired - Fee Related CA2127323C (en) 1993-07-02 1994-07-04 Process for preparing high crystallinity oxide thin film

Country Status (4)

Country Link
US (1) US5501175A (en)
EP (1) EP0633331B1 (en)
CA (1) CA2127323C (en)
DE (1) DE69422666T2 (en)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2152718A1 (en) * 1994-07-04 1996-01-05 Takao Nakamura Process for preparing high crystallinity oxide thin film
JPH0867968A (en) * 1994-08-26 1996-03-12 Sumitomo Electric Ind Ltd Production of oxide thin film
GB2323209A (en) * 1997-03-13 1998-09-16 Sharp Kk Molecular beam epitaxy apparatus and method
EP1038996B1 (en) * 1998-09-11 2007-09-05 Japan Science and Technology Agency Combinatorial molecular layer epitaxy device
US6541079B1 (en) * 1999-10-25 2003-04-01 International Business Machines Corporation Engineered high dielectric constant oxide and oxynitride heterostructure gate dielectrics by an atomic beam deposition technique
DE60135100D1 (en) 2000-03-24 2008-09-11 Cymbet Corp E WITH ULTRA-THIN ELECTROLYTES
US7309269B2 (en) * 2002-04-15 2007-12-18 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
US7294209B2 (en) * 2003-01-02 2007-11-13 Cymbet Corporation Apparatus and method for depositing material onto a substrate using a roll-to-roll mask
US7603144B2 (en) * 2003-01-02 2009-10-13 Cymbet Corporation Active wireless tagging system on peel and stick substrate
US20040131760A1 (en) * 2003-01-02 2004-07-08 Stuart Shakespeare Apparatus and method for depositing material onto multiple independently moving substrates in a chamber
US6906436B2 (en) * 2003-01-02 2005-06-14 Cymbet Corporation Solid state activity-activated battery device and method
US7211351B2 (en) 2003-10-16 2007-05-01 Cymbet Corporation Lithium/air batteries with LiPON as separator and protective barrier and method
WO2005067645A2 (en) * 2004-01-06 2005-07-28 Cymbet Corporation Layered barrier structure having one or more definable layers and method
US7776478B2 (en) * 2005-07-15 2010-08-17 Cymbet Corporation Thin-film batteries with polymer and LiPON electrolyte layers and method
US20070012244A1 (en) * 2005-07-15 2007-01-18 Cymbet Corporation Apparatus and method for making thin-film batteries with soft and hard electrolyte layers
KR101387855B1 (en) * 2005-07-15 2014-04-22 사임베트 코퍼레이션 Thin-film batteries with soft and hard electrolyte layers and method
US20080232761A1 (en) * 2006-09-20 2008-09-25 Raveen Kumaran Methods of making optical waveguide structures by way of molecular beam epitaxy
US9853325B2 (en) 2011-06-29 2017-12-26 Space Charge, LLC Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices
US11527774B2 (en) 2011-06-29 2022-12-13 Space Charge, LLC Electrochemical energy storage devices
US10658705B2 (en) 2018-03-07 2020-05-19 Space Charge, LLC Thin-film solid-state energy storage devices
US10601074B2 (en) 2011-06-29 2020-03-24 Space Charge, LLC Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices
US20140272345A1 (en) * 2013-03-15 2014-09-18 Rubicon Technology, Inc. Method of growing aluminum oxide onto substrates by use of an aluminum source in an environment containing partial pressure of oxygen to create transparent, scratch-resistant windows
CN113454262A (en) * 2020-01-28 2021-09-28 株式会社爱发科 Deposition source and deposition apparatus
CN114457407A (en) * 2020-04-21 2022-05-10 中国工程物理研究院材料研究所 Preparation method of hexagonal phase cerium trioxide single crystal film

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1332324C (en) * 1987-03-30 1994-10-11 Jun Shioya Method for producing thin film of oxide superconductor
JPH075435B2 (en) * 1987-03-31 1995-01-25 住友電気工業株式会社 Method and device for manufacturing superconducting thin film
US4981714A (en) * 1987-12-14 1991-01-01 Sharp Kabushiki Kaisha Method of producing ferroelectric LiNb1-31 x Tax O3 0<x<1) thin film by activated evaporation
US5361720A (en) * 1988-04-22 1994-11-08 British Technology Group Ltd. Epitaxial deposition
WO1990002215A1 (en) * 1988-08-19 1990-03-08 Regents Of The University Of Minnesota Preparation of superconductive ceramic oxides using ozone
US5236895A (en) * 1988-11-24 1993-08-17 Kawasaki Jukogyo Kabushiki Kaisha Production of oxide superconducting films by laser sputtering using N22
JPH0354116A (en) * 1989-07-24 1991-03-08 Sumitomo Electric Ind Ltd Compound oxide superconducting thin film and production thereof
US5260267A (en) * 1989-07-24 1993-11-09 Sumitomo Electric Industries, Ltd. Method for forming a Bi-containing superconducting oxide film on a substrate with a buffer layer of Bi2 O3
CA2029038C (en) * 1989-10-31 1993-12-14 Keizo Harada Process and system for preparing a superconducting thin film of oxide
JPH03150218A (en) * 1989-11-07 1991-06-26 Sumitomo Electric Ind Ltd Production of superconductive thin film
US5264413A (en) * 1990-03-07 1993-11-23 Ivan Bozovic Bi-Sr-Ca-Cu-O compounds and methods
DE69132972T2 (en) * 1991-01-07 2003-03-13 Ibm Superconducting field effect transistor with inverse MISFET structure and method for its production
JPH04357198A (en) * 1991-02-20 1992-12-10 Sanyo Electric Co Ltd Production of superconducting oxide thin film
FR2675951B1 (en) * 1991-04-23 1997-08-29 Thomson Csf JOSEPHSON JUNCTION STRUCTURE.

Also Published As

Publication number Publication date
DE69422666D1 (en) 2000-02-24
US5501175A (en) 1996-03-26
DE69422666T2 (en) 2000-07-27
CA2127323C (en) 1998-08-18
EP0633331B1 (en) 2000-01-19
EP0633331A1 (en) 1995-01-11

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