CA2154415A1 - Method of transporting and applying a surface treatment liquid using gas bubbles - Google Patents
Method of transporting and applying a surface treatment liquid using gas bubblesInfo
- Publication number
- CA2154415A1 CA2154415A1 CA002154415A CA2154415A CA2154415A1 CA 2154415 A1 CA2154415 A1 CA 2154415A1 CA 002154415 A CA002154415 A CA 002154415A CA 2154415 A CA2154415 A CA 2154415A CA 2154415 A1 CA2154415 A1 CA 2154415A1
- Authority
- CA
- Canada
- Prior art keywords
- solution
- gas
- bubbles
- pwa
- transporting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 36
- 238000004381 surface treatment Methods 0.000 title claims description 13
- 239000007788 liquid Substances 0.000 title abstract description 21
- 239000007789 gas Substances 0.000 claims abstract description 32
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000004094 surface-active agent Substances 0.000 claims abstract description 7
- 230000001590 oxidative effect Effects 0.000 claims abstract description 6
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract description 5
- 230000009467 reduction Effects 0.000 claims description 16
- 230000003068 static effect Effects 0.000 claims description 8
- 239000006260 foam Substances 0.000 claims description 7
- 230000000630 rising effect Effects 0.000 claims description 4
- 230000003028 elevating effect Effects 0.000 claims description 3
- 230000001939 inductive effect Effects 0.000 claims description 2
- 230000001172 regenerating effect Effects 0.000 claims 1
- 238000005476 soldering Methods 0.000 abstract description 21
- 239000003638 chemical reducing agent Substances 0.000 abstract description 13
- 230000008929 regeneration Effects 0.000 abstract description 9
- 238000011069 regeneration method Methods 0.000 abstract description 9
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 5
- 239000001301 oxygen Substances 0.000 abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 abstract description 5
- 239000011148 porous material Substances 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 58
- 239000003795 chemical substances by application Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- -1 polypropylene Polymers 0.000 description 4
- 230000000712 assembly Effects 0.000 description 3
- 238000000429 assembly Methods 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 230000001627 detrimental effect Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000010405 reoxidation reaction Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002572 peristaltic effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/20—Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
- B23K1/203—Fluxing, i.e. applying flux onto surfaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3489—Composition of fluxes; Methods of application thereof; Other methods of activating the contact surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
Abstract
A method is provided for dynamically transporting and applying a liquid to a surface, such as the bottom surface of a printed wiring assembly (PWA). The liquid may comprise an aqueous reducing agent solution for removing surface oxides prior to a soldering operation. The PWA
is placed in proximity with the treatment solution held in a reservoir. Gas bubbles generated in the solution dynamically elevate and apply the solution to the bottom surface of the PWA. The bubbles may be formed by a non-oxidizing gas, such as nitrogen, introduced through a porous material. A flat surface of porous material produces a uniform bubble size that allows controlled and precise application of the solution. The porous material and the gas pressure may be varied to so that the bubbles elevate the solution to the desired level. The gas bubbles are short-lived (without surfactants) so that rapid transport, replenishment, and regeneration of the solution can be achieved. Moreover, nitrogen gas is injected at the PWA surface as the bubbles burst so that reaction of the solution or the PWA with oxygen is minimized. The gas bubble method also minimizes the pressure that forces treatment liquid through PWA through-holes to the top surface where it can be difficult to remove.
is placed in proximity with the treatment solution held in a reservoir. Gas bubbles generated in the solution dynamically elevate and apply the solution to the bottom surface of the PWA. The bubbles may be formed by a non-oxidizing gas, such as nitrogen, introduced through a porous material. A flat surface of porous material produces a uniform bubble size that allows controlled and precise application of the solution. The porous material and the gas pressure may be varied to so that the bubbles elevate the solution to the desired level. The gas bubbles are short-lived (without surfactants) so that rapid transport, replenishment, and regeneration of the solution can be achieved. Moreover, nitrogen gas is injected at the PWA surface as the bubbles burst so that reaction of the solution or the PWA with oxygen is minimized. The gas bubble method also minimizes the pressure that forces treatment liquid through PWA through-holes to the top surface where it can be difficult to remove.
Description
Method of Transporting and Applying a Surface Treatment Liquid using Gas Bubbles Technical Field 2 The present invention relates to methods of transporting and applying a liquid to a surface and, in particular, to a method of applying a surface treatment liquid using bubbles of gas to elevate 4 and transport the liquid from a reservoir to the surface being treated.
Background of the Invention 6 The application of surface treatment liquids is pertinent to the field of soldering electronic co",pollents and circuit boards. In an automated production system for soldering printed wiring 8 assemblies (PWAs--printed wiring boards stuffed with components), for example, it is desirable to apply an oxide reduction solution to prepare the PWAs for soldering. A method of o restoring solderability of electronic components by applying an oxide reduction solution is described in U.S. Pat. No. 5,104,494 issued April 14, 1992. A further description of reducing 12 agents and their regeneration is provided in U.S. Pat. No. 5,304,297 issued April 19, 1994.
The teachings of these prior patents are incorporated herein by reference. In a "fluxless"
14 soldering system (i.e., one in which an oxide removing agent is not present during the actual soldering operation), the reduction solution application system must be compatible with the 16 PWA conveyer system, must allow sufficient bottom clearance for the electronic components and leads, and should minimi7~ the amount of treatment solution applied to the top side of the 18 PWA (where it is more difficult to remove). A method and apparatus for applying a reduction treatment solution by forming a "wave" of the fluid is described in U.S. Pat. No. 5,162,082 issued on November 10, 1992, the teachings of which are incorporated herein by reference.
A need has been identified for improved soldering systems. The desirability of a continuous 22 surface treatment and fluxless soldering operation, along with space and compatibility requirements of PWA conveyor systems, have led to difficulties in conveying PWAs to the 24 surface of a treatment liquid contained in a reservoir. In addition, there is a desire to minimi7e oxygen concentration in the atmosphere around the PWAs during oxide reduction treatment to 26 avoid excessive discharge of the reducing agent (which would lower the effectiveness of the reduction treatment) and to avoid reoxidation of the treated PWAs before soldering.
~154~15 Summary of the Invention 2 In the method of the present invention, a liquid is transported from a container or reservoir and applied to a surface, such as the bottom surface of a printed wiring assembly (PWA--a printed 4 wiring board stuffed with electronic components), that is placed in proximity with the liquid in the reservoir. The liquid may comprise an aqueous reducing agent solution for removing 6 oxides from a PWA in preparation for soldering, for example. In the method, which may be termed Gas Actuated Liquid Elevation (GALE), gas bubbles are used to transport the reducing 8 solution from the reservoir and apply it to the bottom surface of the PWA. The bubbles may be formed in the solution by gaseous nitrogen (or other non-oxidizing gas) introduced through a 10 porous device or material, such as porous plastic of the type commonly known and used in the art of foam fluxers, for example. The gas dispersion m~tlori~l may be formed in any a~liate 12 shape, but a flat surface has been found to produce a ullirollll bubble size that allows controlled and precise application of the solution. For an aqueous solution without surfactants (such as 14 the preferred reducing agent solution), the gas bubbles are short-lived so that rapid solution transport and replenishment is achieved. Dynamic elevation of the solution more than two 16 centimeters above the static level in the reservoir has been demonstrated using a gas pressure of about 50 psi. In the process of applying the reducing agent solution to a PWA, nitrogen gas is 18 injected right at the PWA surface as the bubbles burst. This effect minimi7es the reaction of the solution with oxygen. The use of bubbles for treating a PWA also has the advantage of 20 ~ irlg the pressure that forces treatment liquid to the top surface of the PWA (via through-holes in the PWA), where it is difficult to remove effectively from under components.
22 A principal object of the invention is effective transport and application of a surface treatment liquid. A feature of the invention is generation of short-lived gas bubbles to transport and apply 24 the liquid to the treated surface. An advantage of the invention is controlled application and replenishment of a reducing agent treatment solution in a non-oxidizing environment.
26 Brief Description of the Drawings For a more complete understanding of the present invention and for further advantages thereof, 28 the following Detailed Description of the Preferred Embodiments makes reference to the accompanying Drawings, in which:
30 FIGURE 1 is a schematic side view of an apparatus for elevating and applying a surface treatment liquid in accordance with the method of the present invention.
~1~4~15 Detailed Description of the Preferred Embodiments 2 In basic form, the present invention comprises a method of transporting and applying a liquid to a surface. The method is applicable to the field of "fluxless" soldering, in which electronic 4 components, parts, devices, or assemblies, such as printed wiring assemblies (PWAs), are treated with a reducing agent solution to remove surface oxides prior to soldering. In an 6 automated soldering system, the present invention provides a continuous surface treatment process that is compatible with PWA conveyor and soldering systems. The present method 8 improves on the prior art by transporting the treatment solution to the bottom surface of PWAs and rapidly replenishing it to avoid depletion of the reactive agent. The reducing agent application system allows sufficient bottom clearance for electronic components and leads and minimi7es the amount of treatment solution applied to the top side of PWAs, where it can be 12 difficult to remove from under components on the board. The method also minimi7es the oxygen concentration in the atmosphere around PWAs during oxide reduction treatment to 14 avoid excessive discharge of the reducing agent (which would lower the effectiveness of the reduction treatment) and to avoid reoxidation of treated PWAs before soldering. A schematic 16 side view of an apparatus for performing the method of the present invention is illustrated in Figure 1.
18 Figure 1 illustrates a side view of a conveyor line 10 moving from left to right, as indicated by arrow 11. As an example, conveyor line 10 may serve to transport solderable parts 12, such as electronic PWAs, through an automated soldering system (not shown). In this example, the present invention includes a reservoir 14 containing a reducing agent solution 16 that may be 22 replenished through an inlet 15 connected to a regeneration cell (not shown) in which excess solution 16 is collected. Solution 16, which is further described in U.S. Pat. Nos. 5,104,494 24 and 5,304,297 (incorporated by reference), comprises an oxide reduction treatment fluid that is applied to the bottom surface of parts 12. It is well known in the prior art that solution 16 may 26 be applied to parts 12 using a "wave" of fluid, borrowing the technique from wave soldering as further described in U.S. Pat. No. 5,162,082.
2~ In the present invention, reservoir 14 includes a porous means or material 18, such as a porous sheet of polypropylene or polyethylene, for example, for dispersing gas and introducing bubbles into solution 16. An inlet 19 may be used to provide gas 20 to means 18 in reservoir 14. Porous means 18 may comprise any device or material in any shape suitable for generating 32 gas bubbles 22 in a liquid, although a flat surface is preferred to produce uniform bubbles 22 for controlled and precise application of solution 16. When used with a reducing agent solution 21~4415 , .
16, gas 20 typically comprises an inert or non-oxidizing gas such as nitrogen, for example.
2 Gas 20 is provided to reservoir 14 at sufficient pressure to pass through porous means 18 and generate bubbles 22 in solution 16. Porous means 18 and the pressure of gas 20 may be varied 4 as required to generate bubbles 22 of sufficient quantity and desired size in solution 16.
Gas bubbles 22 generated by porous means 18 rise through solution 16 to expand above the 6 static level of solution 16 and eventually burst. This method, which may be termed Gas Actuated Liquid Elevation (GALE), uses gas bubbles 22 to elevate and apply reducing solution 8 16 dynamically to the bottom surface of parts 12. A dynamic solution rise or elevation of more than two centimeters (i.e., above the static level of solution 16) has been demonstrated using a gas pressure of about 50 psi. For an aqueous solution 16 without surfactants (such as the preferred reducing agent solution), gas bubbles 22 are short-lived, providing rapid solution 12 transport and replenishment and allowing regeneration of the reactive agent as it is consumed during oxide reduction at the PWA surface. The dynamic short-lived bubbles and rapid 14 solution transport of the present method contrast sharply with prior art foam fluxers, which use long-lived bubbles (i.e., relatively static bubbles produced by foam-inducing surfactants) and 16 no significant regeneration of the flux solution.
A typical soldering operation is performed in a non-oxidizing atmosphere (usually nitrogen) to 18 minimi7e oxidation that degrades solderability of parts 12. In the process of applying a reducing agent solution 16 to part 12 (such as a PWA) in accordance with the present 2~ invention, nitrogen gas 20 is injected right at the surface of part 12 as bubbles 22 burst. As a result, exposure of part 12 and solution 16 to oxygen is minimi7.ed. This method of treating 22 part 12 with solution 16 also has the advantage of minimi7.ing the pressure that forces solution 16 to the top surface of parts such as PWAs (via through-holes in the PWAs), where it is 24 difficult to remove effectively from under components on the PWAs.
After solution 16 has been applied to part 12 by dynamic bubbles 22 (and detrimental oxides on 26 part 12 have been reduced), most of solution 16 can be removed by a dry system using an angled gas jet 24 (such as a "nitrogen knife") to move any residual solution 16 along the top 28 surface of part 12. A vacuum source 26 may be used to remove solution 16 from the bottom surface. In addition, part 12 may be rinsed, if necessary, by a fine spray of deionized water 28 (top and bottom), driven by nitrogen gas, for example. Spray units 28 can travel back and forth along the surface of parts 12 and spray only small quantities of water. Most of the residual 32 rinse water can be removed (if necessary or desirable) by a second nitrogen knife and vacuum -system, as illustrated. All of solution 16 and rinse water removed from parts 12 can be . 21S1415 collected and fed into a separate hoIding tank or a solution regeneration unit (not shown).
2 Excess water can be removed by evaporation, for example. Final drying of parts 12, if necessary before soldering, can be accomplished in a convection oven along conveyor line 10.
4 The suitability of the present method for use in a soldering operation was tested using a small applicator system having a square (10 cm x 10 cm) porous polypropylene or polyethylene sheet 6 18 for generating bubbles 22 in oxide reduction solution 16. Tin-lead coated printed wiring board (PWB) coupons (having the same dimensions) were positioned on a rack 2 cm above the 8 level of solution 16 inside a nitrogen atmosphere glove box. Solution 16 was recirculated through inlet 15 by a peristaltic pump from a regeneration cell to/from reservoir 14. Nitrogen 0 gas 20 was fed to the bottom side of the porous sheet 18 with sufficient pressure to produce a bubble layer rising at least 2 cm above the static level of solution 16. Porous sheets 18 having 12 various average pore sizes (10 to 120,~1m) and thicknesses (0.6 to 1.0 cm) were evaluated with comparable results. After treatment of the PWB coupons for various times (10 to 30 seconds), 14 through-holes on the PWB coupons were analyzed to determine the extent of oxide removal.
Testing of PWB coupons as received (prior to treatment with solution 16) indicated large 16 amounts of detrimental oxides, which were effectively removed by the dynamic bubble application of solution 16 as described above. Good uniformity of the application of solution 18 16 was demonstrated by testing through-holes at various locations on the PWB coupons.
As mentioned above, the method of elevating and applying solution 16 using gas bubbles 22is ao distinctly different from known methods of applying foam fluxers in a soldering operation. In the present method, bubbles 22 are short-lived (unlike foams) because no surfactants are used 22 in solution 16. Short-lived bubbles 22 provide dynamic, rapid transport and replenishment of solution 16 and liberal application of solution 16 to parts 12 for reduction of surface oxides 24 detrimental to solderability. Rapid transport also allows regeneration of the reactive agent in the solution after it is spent in reducing the surface oxides. In contrast, surfactants are used in prior 26 art foams to produce long-lived bubbles where the object is to minimi7e the amount of flux applied to a PWA surface and there is no requirement for regeneration of the flux.
28 Although the present invention has been described with respect to specific embodiments thereof, various changes and modifications can be carried out by those skilled in the art without 30 departing from the scope of the invention. Therefore, it is intended that the present invention encompass such changes and modifications as fall within the scope of the appended claims.
Background of the Invention 6 The application of surface treatment liquids is pertinent to the field of soldering electronic co",pollents and circuit boards. In an automated production system for soldering printed wiring 8 assemblies (PWAs--printed wiring boards stuffed with components), for example, it is desirable to apply an oxide reduction solution to prepare the PWAs for soldering. A method of o restoring solderability of electronic components by applying an oxide reduction solution is described in U.S. Pat. No. 5,104,494 issued April 14, 1992. A further description of reducing 12 agents and their regeneration is provided in U.S. Pat. No. 5,304,297 issued April 19, 1994.
The teachings of these prior patents are incorporated herein by reference. In a "fluxless"
14 soldering system (i.e., one in which an oxide removing agent is not present during the actual soldering operation), the reduction solution application system must be compatible with the 16 PWA conveyer system, must allow sufficient bottom clearance for the electronic components and leads, and should minimi7~ the amount of treatment solution applied to the top side of the 18 PWA (where it is more difficult to remove). A method and apparatus for applying a reduction treatment solution by forming a "wave" of the fluid is described in U.S. Pat. No. 5,162,082 issued on November 10, 1992, the teachings of which are incorporated herein by reference.
A need has been identified for improved soldering systems. The desirability of a continuous 22 surface treatment and fluxless soldering operation, along with space and compatibility requirements of PWA conveyor systems, have led to difficulties in conveying PWAs to the 24 surface of a treatment liquid contained in a reservoir. In addition, there is a desire to minimi7e oxygen concentration in the atmosphere around the PWAs during oxide reduction treatment to 26 avoid excessive discharge of the reducing agent (which would lower the effectiveness of the reduction treatment) and to avoid reoxidation of the treated PWAs before soldering.
~154~15 Summary of the Invention 2 In the method of the present invention, a liquid is transported from a container or reservoir and applied to a surface, such as the bottom surface of a printed wiring assembly (PWA--a printed 4 wiring board stuffed with electronic components), that is placed in proximity with the liquid in the reservoir. The liquid may comprise an aqueous reducing agent solution for removing 6 oxides from a PWA in preparation for soldering, for example. In the method, which may be termed Gas Actuated Liquid Elevation (GALE), gas bubbles are used to transport the reducing 8 solution from the reservoir and apply it to the bottom surface of the PWA. The bubbles may be formed in the solution by gaseous nitrogen (or other non-oxidizing gas) introduced through a 10 porous device or material, such as porous plastic of the type commonly known and used in the art of foam fluxers, for example. The gas dispersion m~tlori~l may be formed in any a~liate 12 shape, but a flat surface has been found to produce a ullirollll bubble size that allows controlled and precise application of the solution. For an aqueous solution without surfactants (such as 14 the preferred reducing agent solution), the gas bubbles are short-lived so that rapid solution transport and replenishment is achieved. Dynamic elevation of the solution more than two 16 centimeters above the static level in the reservoir has been demonstrated using a gas pressure of about 50 psi. In the process of applying the reducing agent solution to a PWA, nitrogen gas is 18 injected right at the PWA surface as the bubbles burst. This effect minimi7es the reaction of the solution with oxygen. The use of bubbles for treating a PWA also has the advantage of 20 ~ irlg the pressure that forces treatment liquid to the top surface of the PWA (via through-holes in the PWA), where it is difficult to remove effectively from under components.
22 A principal object of the invention is effective transport and application of a surface treatment liquid. A feature of the invention is generation of short-lived gas bubbles to transport and apply 24 the liquid to the treated surface. An advantage of the invention is controlled application and replenishment of a reducing agent treatment solution in a non-oxidizing environment.
26 Brief Description of the Drawings For a more complete understanding of the present invention and for further advantages thereof, 28 the following Detailed Description of the Preferred Embodiments makes reference to the accompanying Drawings, in which:
30 FIGURE 1 is a schematic side view of an apparatus for elevating and applying a surface treatment liquid in accordance with the method of the present invention.
~1~4~15 Detailed Description of the Preferred Embodiments 2 In basic form, the present invention comprises a method of transporting and applying a liquid to a surface. The method is applicable to the field of "fluxless" soldering, in which electronic 4 components, parts, devices, or assemblies, such as printed wiring assemblies (PWAs), are treated with a reducing agent solution to remove surface oxides prior to soldering. In an 6 automated soldering system, the present invention provides a continuous surface treatment process that is compatible with PWA conveyor and soldering systems. The present method 8 improves on the prior art by transporting the treatment solution to the bottom surface of PWAs and rapidly replenishing it to avoid depletion of the reactive agent. The reducing agent application system allows sufficient bottom clearance for electronic components and leads and minimi7es the amount of treatment solution applied to the top side of PWAs, where it can be 12 difficult to remove from under components on the board. The method also minimi7es the oxygen concentration in the atmosphere around PWAs during oxide reduction treatment to 14 avoid excessive discharge of the reducing agent (which would lower the effectiveness of the reduction treatment) and to avoid reoxidation of treated PWAs before soldering. A schematic 16 side view of an apparatus for performing the method of the present invention is illustrated in Figure 1.
18 Figure 1 illustrates a side view of a conveyor line 10 moving from left to right, as indicated by arrow 11. As an example, conveyor line 10 may serve to transport solderable parts 12, such as electronic PWAs, through an automated soldering system (not shown). In this example, the present invention includes a reservoir 14 containing a reducing agent solution 16 that may be 22 replenished through an inlet 15 connected to a regeneration cell (not shown) in which excess solution 16 is collected. Solution 16, which is further described in U.S. Pat. Nos. 5,104,494 24 and 5,304,297 (incorporated by reference), comprises an oxide reduction treatment fluid that is applied to the bottom surface of parts 12. It is well known in the prior art that solution 16 may 26 be applied to parts 12 using a "wave" of fluid, borrowing the technique from wave soldering as further described in U.S. Pat. No. 5,162,082.
2~ In the present invention, reservoir 14 includes a porous means or material 18, such as a porous sheet of polypropylene or polyethylene, for example, for dispersing gas and introducing bubbles into solution 16. An inlet 19 may be used to provide gas 20 to means 18 in reservoir 14. Porous means 18 may comprise any device or material in any shape suitable for generating 32 gas bubbles 22 in a liquid, although a flat surface is preferred to produce uniform bubbles 22 for controlled and precise application of solution 16. When used with a reducing agent solution 21~4415 , .
16, gas 20 typically comprises an inert or non-oxidizing gas such as nitrogen, for example.
2 Gas 20 is provided to reservoir 14 at sufficient pressure to pass through porous means 18 and generate bubbles 22 in solution 16. Porous means 18 and the pressure of gas 20 may be varied 4 as required to generate bubbles 22 of sufficient quantity and desired size in solution 16.
Gas bubbles 22 generated by porous means 18 rise through solution 16 to expand above the 6 static level of solution 16 and eventually burst. This method, which may be termed Gas Actuated Liquid Elevation (GALE), uses gas bubbles 22 to elevate and apply reducing solution 8 16 dynamically to the bottom surface of parts 12. A dynamic solution rise or elevation of more than two centimeters (i.e., above the static level of solution 16) has been demonstrated using a gas pressure of about 50 psi. For an aqueous solution 16 without surfactants (such as the preferred reducing agent solution), gas bubbles 22 are short-lived, providing rapid solution 12 transport and replenishment and allowing regeneration of the reactive agent as it is consumed during oxide reduction at the PWA surface. The dynamic short-lived bubbles and rapid 14 solution transport of the present method contrast sharply with prior art foam fluxers, which use long-lived bubbles (i.e., relatively static bubbles produced by foam-inducing surfactants) and 16 no significant regeneration of the flux solution.
A typical soldering operation is performed in a non-oxidizing atmosphere (usually nitrogen) to 18 minimi7e oxidation that degrades solderability of parts 12. In the process of applying a reducing agent solution 16 to part 12 (such as a PWA) in accordance with the present 2~ invention, nitrogen gas 20 is injected right at the surface of part 12 as bubbles 22 burst. As a result, exposure of part 12 and solution 16 to oxygen is minimi7.ed. This method of treating 22 part 12 with solution 16 also has the advantage of minimi7.ing the pressure that forces solution 16 to the top surface of parts such as PWAs (via through-holes in the PWAs), where it is 24 difficult to remove effectively from under components on the PWAs.
After solution 16 has been applied to part 12 by dynamic bubbles 22 (and detrimental oxides on 26 part 12 have been reduced), most of solution 16 can be removed by a dry system using an angled gas jet 24 (such as a "nitrogen knife") to move any residual solution 16 along the top 28 surface of part 12. A vacuum source 26 may be used to remove solution 16 from the bottom surface. In addition, part 12 may be rinsed, if necessary, by a fine spray of deionized water 28 (top and bottom), driven by nitrogen gas, for example. Spray units 28 can travel back and forth along the surface of parts 12 and spray only small quantities of water. Most of the residual 32 rinse water can be removed (if necessary or desirable) by a second nitrogen knife and vacuum -system, as illustrated. All of solution 16 and rinse water removed from parts 12 can be . 21S1415 collected and fed into a separate hoIding tank or a solution regeneration unit (not shown).
2 Excess water can be removed by evaporation, for example. Final drying of parts 12, if necessary before soldering, can be accomplished in a convection oven along conveyor line 10.
4 The suitability of the present method for use in a soldering operation was tested using a small applicator system having a square (10 cm x 10 cm) porous polypropylene or polyethylene sheet 6 18 for generating bubbles 22 in oxide reduction solution 16. Tin-lead coated printed wiring board (PWB) coupons (having the same dimensions) were positioned on a rack 2 cm above the 8 level of solution 16 inside a nitrogen atmosphere glove box. Solution 16 was recirculated through inlet 15 by a peristaltic pump from a regeneration cell to/from reservoir 14. Nitrogen 0 gas 20 was fed to the bottom side of the porous sheet 18 with sufficient pressure to produce a bubble layer rising at least 2 cm above the static level of solution 16. Porous sheets 18 having 12 various average pore sizes (10 to 120,~1m) and thicknesses (0.6 to 1.0 cm) were evaluated with comparable results. After treatment of the PWB coupons for various times (10 to 30 seconds), 14 through-holes on the PWB coupons were analyzed to determine the extent of oxide removal.
Testing of PWB coupons as received (prior to treatment with solution 16) indicated large 16 amounts of detrimental oxides, which were effectively removed by the dynamic bubble application of solution 16 as described above. Good uniformity of the application of solution 18 16 was demonstrated by testing through-holes at various locations on the PWB coupons.
As mentioned above, the method of elevating and applying solution 16 using gas bubbles 22is ao distinctly different from known methods of applying foam fluxers in a soldering operation. In the present method, bubbles 22 are short-lived (unlike foams) because no surfactants are used 22 in solution 16. Short-lived bubbles 22 provide dynamic, rapid transport and replenishment of solution 16 and liberal application of solution 16 to parts 12 for reduction of surface oxides 24 detrimental to solderability. Rapid transport also allows regeneration of the reactive agent in the solution after it is spent in reducing the surface oxides. In contrast, surfactants are used in prior 26 art foams to produce long-lived bubbles where the object is to minimi7e the amount of flux applied to a PWA surface and there is no requirement for regeneration of the flux.
28 Although the present invention has been described with respect to specific embodiments thereof, various changes and modifications can be carried out by those skilled in the art without 30 departing from the scope of the invention. Therefore, it is intended that the present invention encompass such changes and modifications as fall within the scope of the appended claims.
Claims (9)
1. A method of transporting and applying a surface treatment solution to a surface of a part, comprising the steps of:
providing a reservoir containing the surface treatment solution at a static level;
connecting said reservoir to a source of gas;
generating dynamic short-lived bubbles of said gas rising in the solution, said rising bubbles elevating the solution in said reservoir above said static level;
placing the surface of the part to be treated above said static level of the solution; and said rising bubbles transporting and applying the solution to the surface of the part.
providing a reservoir containing the surface treatment solution at a static level;
connecting said reservoir to a source of gas;
generating dynamic short-lived bubbles of said gas rising in the solution, said rising bubbles elevating the solution in said reservoir above said static level;
placing the surface of the part to be treated above said static level of the solution; and said rising bubbles transporting and applying the solution to the surface of the part.
2. The method of Claim 1, wherein the step of generating said dynamic short-lived bubbles includes providing the surface treatment solution with no foam-inducing surfactants.
3. The method of Claim 2, wherein said connecting step comprises connecting saidreservoir to a source of non-oxidizing gas.
4. The method of Claim 2, wherein said connecting step comprises connecting saidreservoir to a source of nitrogen gas.
5. The method of Claim 2, wherein said transporting and applying step includes the step of replenishing the surface treatment solution.
6. The method of Claim 2, wherein said reservoir providing step includes providing an oxide reduction treatment solution in said reservoir.
7. The method of Claim 6, wherein said transporting and applying step includes the step of regenerating said oxide reduction treatment solution.
8 . The method of Claim 7, further comprising the step of removing said applied oxide reduction treatment solution from the part after reduction of surface oxides on the part.
9. The method of Claim 2, wherein said transporting and applying step includes rapidly transporting the surface treatment solution from said reservoir to the surface of the part.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/398,473 | 1995-03-03 | ||
| US08/398,473 US5605719A (en) | 1995-03-03 | 1995-03-03 | Method of transporting and applying a surface treatment liquid using gas bubbles |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2154415A1 true CA2154415A1 (en) | 1996-09-04 |
Family
ID=23575506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002154415A Abandoned CA2154415A1 (en) | 1995-03-03 | 1995-07-21 | Method of transporting and applying a surface treatment liquid using gas bubbles |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5605719A (en) |
| EP (1) | EP0730395A3 (en) |
| JP (1) | JPH08243474A (en) |
| CA (1) | CA2154415A1 (en) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09231899A (en) * | 1995-12-20 | 1997-09-05 | Yazaki Corp | Fuse with low melting point metal and its holding structure |
| US6607783B1 (en) | 2000-08-24 | 2003-08-19 | Kimberly-Clark Worldwide, Inc. | Method of applying a foam composition onto a tissue and tissue products formed therefrom |
| EP1356161B8 (en) | 2000-11-08 | 2009-02-18 | Kimberly-Clark Worldwide, Inc. | Foam treatment of tissue products |
| US6582555B2 (en) | 2001-11-05 | 2003-06-24 | Kimberly-Clark Worldwide, Inc. | Method of using a nozzle apparatus for the application of the foam treatment of tissue webs |
| US6730171B2 (en) | 2001-11-05 | 2004-05-04 | Kimberly-Clark Worldwide, Inc. | Nozzle apparatus having a scraper for the application of the foam treatment of tissue webs |
| US6805965B2 (en) * | 2001-12-21 | 2004-10-19 | Kimberly-Clark Worldwide, Inc. | Method for the application of hydrophobic chemicals to tissue webs |
| US6835418B2 (en) * | 2002-05-31 | 2004-12-28 | Kimberly-Clark Worldwide, Inc. | Use of gaseous streams to aid in application of foam to tissue products |
| US6797116B2 (en) | 2002-05-31 | 2004-09-28 | Kimberly-Clark Worldwide, Inc. | Method of applying a foam composition to a tissue product |
| US6797319B2 (en) * | 2002-05-31 | 2004-09-28 | Kimberly-Clark Worldwide, Inc. | Application of foam to tissue products using a liquid permeable partition |
| US6977026B2 (en) * | 2002-10-16 | 2005-12-20 | Kimberly-Clark Worldwide, Inc. | Method for applying softening compositions to a tissue product |
| US6761800B2 (en) * | 2002-10-28 | 2004-07-13 | Kimberly-Clark Worldwide, Inc. | Process for applying a liquid additive to both sides of a tissue web |
| US7029756B2 (en) * | 2002-11-06 | 2006-04-18 | Kimberly-Clark Worldwide, Inc. | Soft tissue hydrophilic tissue products containing polysiloxane and having unique absorbent properties |
| US6964725B2 (en) * | 2002-11-06 | 2005-11-15 | Kimberly-Clark Worldwide, Inc. | Soft tissue products containing selectively treated fibers |
| US6949168B2 (en) * | 2002-11-27 | 2005-09-27 | Kimberly-Clark Worldwide, Inc. | Soft paper product including beneficial agents |
| US7396593B2 (en) * | 2003-05-19 | 2008-07-08 | Kimberly-Clark Worldwide, Inc. | Single ply tissue products surface treated with a softening agent |
| JP2006336093A (en) * | 2005-06-06 | 2006-12-14 | Hyomen Shori System:Kk | Electrodeposition coating apparatus and method |
| US20090238979A1 (en) * | 2008-03-21 | 2009-09-24 | William Decesare | Method of Applying Catalytic Solution for Use in Electroless Deposition |
| DE102009060676B4 (en) * | 2009-12-28 | 2015-07-23 | Atotech Deutschland Gmbh | Process and device for wet-chemical treatment of items to be treated |
| CN102534589B (en) * | 2011-12-26 | 2013-09-25 | 东莞生益电子有限公司 | Copper block surface brown oxidation method |
| CN102548236A (en) * | 2011-12-26 | 2012-07-04 | 东莞生益电子有限公司 | Combined tray for surface brown oxidation of copper blocks and manufacturing method thereof |
| US10362720B2 (en) * | 2014-08-06 | 2019-07-23 | Greene Lyon Group, Inc. | Rotational removal of electronic chips and other components from printed wire boards using liquid heat media |
| CN105307399B (en) * | 2015-10-23 | 2017-11-28 | 深圳市强达电路有限公司 | A kind of processing method of small size, thin pure ceramic circuit-board |
| CN106550544A (en) * | 2016-12-06 | 2017-03-29 | 深圳市深联电路有限公司 | A kind of manufacture method of small size ceramics pcb board |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE416970C (en) * | 1977-01-03 | 1984-12-11 | Inventing Ab | SET FOR TREATING OR COATING SURFACES, EXAMPLE OF CURRENT MATERIALS |
| US4275656A (en) * | 1979-02-14 | 1981-06-30 | Charles J. Choma | Bubble printing method |
| JPS6072664A (en) * | 1983-09-27 | 1985-04-24 | Pioneer Electronic Corp | Soldering device for printed circuit board |
| US4684544A (en) * | 1986-02-19 | 1987-08-04 | General Motors Corporation | Solder fluxing method and apparatus |
| JPS63312983A (en) * | 1987-06-16 | 1988-12-21 | Hitachi Ltd | Electroless copper plating method and equipment therefor |
| US5286529A (en) * | 1988-02-24 | 1994-02-15 | Kabushiki Kaisha Toshiba | Method of forming an organic thin film |
| JPH04271829A (en) * | 1991-01-17 | 1992-09-28 | Pioneer Electron Corp | Lb membrane manufacturing device |
| US5104494A (en) * | 1991-07-02 | 1992-04-14 | Rockwell International Corp. | Method of restoring solderability |
| JPH0539579A (en) * | 1991-08-02 | 1993-02-19 | Mitsubishi Electric Corp | Device for electroless plating |
| US5162082A (en) * | 1991-12-16 | 1992-11-10 | Electrovert Ltd. | Electrochemical reduction treatment for soldering |
| US5304297A (en) * | 1993-02-26 | 1994-04-19 | Rockwell International Corporation | Reducing agent regeneration system |
| US5397604A (en) * | 1993-12-03 | 1995-03-14 | International Business Machines Corporation | Non-contact fluid applicator apparatus and method |
-
1995
- 1995-03-03 US US08/398,473 patent/US5605719A/en not_active Expired - Fee Related
- 1995-07-21 CA CA002154415A patent/CA2154415A1/en not_active Abandoned
- 1995-11-22 JP JP7304241A patent/JPH08243474A/en not_active Withdrawn
-
1996
- 1996-01-18 EP EP96100702A patent/EP0730395A3/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| EP0730395A3 (en) | 1998-04-15 |
| JPH08243474A (en) | 1996-09-24 |
| US5605719A (en) | 1997-02-25 |
| EP0730395A2 (en) | 1996-09-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued |