CA2156868A1 - Process for stabilizing polymeric material - Google Patents
Process for stabilizing polymeric materialInfo
- Publication number
- CA2156868A1 CA2156868A1 CA002156868A CA2156868A CA2156868A1 CA 2156868 A1 CA2156868 A1 CA 2156868A1 CA 002156868 A CA002156868 A CA 002156868A CA 2156868 A CA2156868 A CA 2156868A CA 2156868 A1 CA2156868 A1 CA 2156868A1
- Authority
- CA
- Canada
- Prior art keywords
- phosphite
- carrier solution
- butyl
- styrene
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000000463 material Substances 0.000 title claims description 12
- 230000000087 stabilizing effect Effects 0.000 title description 2
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000002904 solvent Substances 0.000 claims abstract description 17
- 239000003960 organic solvent Substances 0.000 claims abstract description 14
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 9
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 7
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims abstract description 7
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims abstract description 5
- 229920001577 copolymer Polymers 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 19
- 239000000178 monomer Substances 0.000 claims description 18
- -1 diene compound Chemical class 0.000 claims description 13
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 239000007788 liquid Substances 0.000 claims description 3
- 229920002554 vinyl polymer Polymers 0.000 claims description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 2
- 229920000468 styrene butadiene styrene block copolymer Polymers 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 230000000379 polymerizing effect Effects 0.000 claims 2
- 229920000642 polymer Polymers 0.000 abstract description 19
- 229920003048 styrene butadiene rubber Polymers 0.000 abstract description 2
- 229920001169 thermoplastic Polymers 0.000 abstract description 2
- 238000010348 incorporation Methods 0.000 abstract 1
- 239000004416 thermosoftening plastic Substances 0.000 abstract 1
- 229920001971 elastomer Polymers 0.000 description 43
- 239000005060 rubber Substances 0.000 description 41
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 28
- 125000003118 aryl group Chemical group 0.000 description 21
- 229920000578 graft copolymer Polymers 0.000 description 17
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 14
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 12
- 150000001993 dienes Chemical class 0.000 description 12
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 8
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 7
- 229920001400 block copolymer Polymers 0.000 description 7
- 239000000839 emulsion Substances 0.000 description 7
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 6
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 6
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 5
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 4
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229920003244 diene elastomer Polymers 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 229920001195 polyisoprene Polymers 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000005062 Polybutadiene Substances 0.000 description 3
- 125000005396 acrylic acid ester group Chemical class 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000005250 alkyl acrylate group Chemical group 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- 229920002857 polybutadiene Polymers 0.000 description 3
- 229920005604 random copolymer Polymers 0.000 description 3
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 2
- WAEOXIOXMKNFLQ-UHFFFAOYSA-N 1-methyl-4-prop-2-enylbenzene Chemical group CC1=CC=C(CC=C)C=C1 WAEOXIOXMKNFLQ-UHFFFAOYSA-N 0.000 description 2
- CYLVUSZHVURAOY-UHFFFAOYSA-N 2,2-dibromoethenylbenzene Chemical compound BrC(Br)=CC1=CC=CC=C1 CYLVUSZHVURAOY-UHFFFAOYSA-N 0.000 description 2
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical class COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Chemical class OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000004945 emulsification Methods 0.000 description 2
- 125000003106 haloaryl group Chemical group 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- APPOKADJQUIAHP-UHFFFAOYSA-N hexa-2,4-diene Chemical compound CC=CC=CC APPOKADJQUIAHP-UHFFFAOYSA-N 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 229920012128 methyl methacrylate acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- OGQVROWWFUXRST-FNORWQNLSA-N (3e)-hepta-1,3-diene Chemical compound CCC\C=C\C=C OGQVROWWFUXRST-FNORWQNLSA-N 0.000 description 1
- RGASRBUYZODJTG-UHFFFAOYSA-N 1,1-bis(2,4-ditert-butylphenyl)-2,2-bis(hydroxymethyl)propane-1,3-diol dihydroxyphosphanyl dihydrogen phosphite Chemical compound OP(O)OP(O)O.C(C)(C)(C)C1=C(C=CC(=C1)C(C)(C)C)C(O)(C(CO)(CO)CO)C1=C(C=C(C=C1)C(C)(C)C)C(C)(C)C RGASRBUYZODJTG-UHFFFAOYSA-N 0.000 description 1
- PDKAXHLOFWCWIH-UHFFFAOYSA-N 1,1-dichlorobuta-1,3-diene Chemical compound ClC(Cl)=CC=C PDKAXHLOFWCWIH-UHFFFAOYSA-N 0.000 description 1
- WVAFEFUPWRPQSY-UHFFFAOYSA-N 1,2,3-tris(ethenyl)benzene Chemical compound C=CC1=CC=CC(C=C)=C1C=C WVAFEFUPWRPQSY-UHFFFAOYSA-N 0.000 description 1
- BOGRNZQRTNVZCZ-UHFFFAOYSA-N 1,2-dimethyl-butadiene Natural products CC=C(C)C=C BOGRNZQRTNVZCZ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- LKNKAEWGISYACD-UHFFFAOYSA-N 1-bromobuta-1,3-diene Chemical compound BrC=CC=C LKNKAEWGISYACD-UHFFFAOYSA-N 0.000 description 1
- XPXMCUKPGZUFGR-UHFFFAOYSA-N 1-chloro-2-(1,2,2-trichloroethenyl)benzene Chemical compound ClC(Cl)=C(Cl)C1=CC=CC=C1Cl XPXMCUKPGZUFGR-UHFFFAOYSA-N 0.000 description 1
- HVOKBODBWQEEGI-UHFFFAOYSA-N 1-ethenyl-3,5-diethylbenzene Chemical compound CCC1=CC(CC)=CC(C=C)=C1 HVOKBODBWQEEGI-UHFFFAOYSA-N 0.000 description 1
- VVTGQMLRTKFKAM-UHFFFAOYSA-N 1-ethenyl-4-propylbenzene Chemical compound CCCC1=CC=C(C=C)C=C1 VVTGQMLRTKFKAM-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- CISIJYCKDJSTMX-UHFFFAOYSA-N 2,2-dichloroethenylbenzene Chemical compound ClC(Cl)=CC1=CC=CC=C1 CISIJYCKDJSTMX-UHFFFAOYSA-N 0.000 description 1
- GVTJVTFUVRQJKK-UHFFFAOYSA-N 2,3-dibromobuta-1,3-diene Chemical compound BrC(=C)C(Br)=C GVTJVTFUVRQJKK-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical class FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OYUNTGBISCIYPW-UHFFFAOYSA-N 2-chloroprop-2-enenitrile Chemical compound ClC(=C)C#N OYUNTGBISCIYPW-UHFFFAOYSA-N 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- TVONJMOVBKMLOM-UHFFFAOYSA-N 2-methylidenebutanenitrile Chemical compound CCC(=C)C#N TVONJMOVBKMLOM-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZSNRMRKAYAJYRZ-UHFFFAOYSA-N 4-methylidenehex-2-ene Chemical compound CCC(=C)C=CC ZSNRMRKAYAJYRZ-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical class NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- VVNCNSJFMMFHPL-VKHMYHEASA-N D-penicillamine Chemical compound CC(C)(S)[C@@H](N)C(O)=O VVNCNSJFMMFHPL-VKHMYHEASA-N 0.000 description 1
- 229920002943 EPDM rubber Polymers 0.000 description 1
- 229920000181 Ethylene propylene rubber Polymers 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical class O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BEIOEBMXPVYLRY-UHFFFAOYSA-N [4-[4-bis(2,4-ditert-butylphenoxy)phosphanylphenyl]phenyl]-bis(2,4-ditert-butylphenoxy)phosphane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(C=1C=CC(=CC=1)C=1C=CC(=CC=1)P(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C BEIOEBMXPVYLRY-UHFFFAOYSA-N 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 229920006318 anionic polymer Polymers 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
- ZPOLOEWJWXZUSP-WAYWQWQTSA-N bis(prop-2-enyl) (z)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C/C(=O)OCC=C ZPOLOEWJWXZUSP-WAYWQWQTSA-N 0.000 description 1
- FPODCVUTIPDRTE-UHFFFAOYSA-N bis(prop-2-enyl) hexanedioate Chemical compound C=CCOC(=O)CCCCC(=O)OCC=C FPODCVUTIPDRTE-UHFFFAOYSA-N 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 239000008364 bulk solution Substances 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- BZDKYAZTCWRUDZ-UHFFFAOYSA-N buta-1,3-diene;methyl 2-methylprop-2-enoate;prop-2-enenitrile;styrene Chemical compound C=CC=C.C=CC#N.COC(=O)C(C)=C.C=CC1=CC=CC=C1 BZDKYAZTCWRUDZ-UHFFFAOYSA-N 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- WWPXOMXUMORZKI-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1.CCCCOC(=O)C=C WWPXOMXUMORZKI-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000009563 continuous hemofiltration Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 229940075911 depen Drugs 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- 229920005676 ethylene-propylene block copolymer Polymers 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000003055 glycidyl group Chemical class C(C1CO1)* 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- KETWBQOXTBGBBN-UHFFFAOYSA-N hex-1-enylbenzene Chemical compound CCCCC=CC1=CC=CC=C1 KETWBQOXTBGBBN-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 229920000092 linear low density polyethylene Polymers 0.000 description 1
- 239000004707 linear low-density polyethylene Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Chemical class OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N para-hydroxystyrene Natural products OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000346 polystyrene-polyisoprene block-polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 229920001935 styrene-ethylene-butadiene-styrene Polymers 0.000 description 1
- 150000003440 styrenes Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- PLCFYBDYBCOLSP-UHFFFAOYSA-N tris(prop-2-enyl) 2-hydroxypropane-1,2,3-tricarboxylate Chemical compound C=CCOC(=O)CC(O)(CC(=O)OCC=C)C(=O)OCC=C PLCFYBDYBCOLSP-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- 125000002348 vinylic group Chemical group 0.000 description 1
Classifications
-
- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F6/00—Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof
- D01F6/02—Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
- D01F6/04—Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds from polyolefins
- D01F6/06—Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds from polyolefins from polypropylene
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6571—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms
- C07F9/6574—Esters of oxyacids of phosphorus
- C07F9/65742—Esters of oxyacids of phosphorus non-condensed with carbocyclic rings or heterocyclic rings or ring systems
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/16—Making expandable particles
- C08J9/18—Making expandable particles by impregnating polymer particles with the blowing agent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/52—Phosphorus bound to oxygen only
- C08K5/527—Cyclic esters
-
- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F1/00—General methods for the manufacture of artificial filaments or the like
- D01F1/02—Addition of substances to the spinning solution or to the melt
- D01F1/10—Other agents for modifying properties
-
- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F6/00—Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof
- D01F6/02—Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
- D01F6/04—Monocomponent artificial filaments or the like of synthetic polymers; Manufacture thereof from homopolymers obtained by reactions only involving carbon-to-carbon unsaturated bonds from polyolefins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
- C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
Abstract
A polymerization process is provided involving a carrier solution containing an organic solvent and a phosphite. The phosphite is highly soluble in the solvent and allows for an incorporation of a minimum of solvent in the carrier solution. The phosphite is of the formula:
Description
PROCESS FOR STABILIZING POLYMERIC MATERIAL
BA~O~Nv OF THE l~V~. ~ lON
Fleld of the Inventlon The present invention relates to solvent utilizing polymerization processes, and more particularly relates to solvent based delivery systems for phosphites.
DESCRIPTION OF RELATED ART
Solvent utilizing polymerization processes are generally known. Such processes are useful for manufacturing polymers such as homopolymers, block copolymers and graft copolymers, and include processes commonly referred to as bulk, mass, suspension and emulsion processes. Some of the processes attempt to incorporate antioxidants such as phosphites into the polymer material by introducing a solvent containing the antioxidant into the reaction process. These solvents generally need to be removed at some point in the process, and consequently there is at times a desire to m;n;m;ze the amount of solvent in the process. Many phosphites, however, do not exhibit high levels of solubility in various organic solvents, for example, aliphatic or aromatic liquid (25C) hydrocarbons, for further example, cyclohexane.
Accordingly, there is a desire to provide a phosphite which exhibits high levels of solubility in organic solvents, and to provide a solvent deliverY
system for the phosphite which m;nimizes the amount of solvent required.
SUMMARY OF THE lNVk~ ~lON
The present invention involves a polymerization process involving the delivery of a phosphite into the process via a solvent carrier, and further S involves a solvent carrier solution containing a phosphite wherein the phosphite is of the formula:
C(CH3)3 H3C-CH2-CH2-CH2 ~ ~CH2-O \ ~ y2 CH3-CH2/ CH2-O yl wherein yl is an alkyl and y2 iS selected from tert-butyl and sec-butyl. The solvent is an organic solvent.
DETAILED DESCRIPTION OF T~E l~V' .. lON
A process is provided for making polymeric materials. One embodiment of the process involves introducing a carrier solution into a reaction mass.
The carrier solution contains an organic solvent and a phosphite that exhibits a high degree of solubility in the organic solvent.
The process is useful for making polymeric materials cont~; nl ng (desired from) diene compounds.
The diene rubber polymers which can be used in the present invention are characterized by the following types (a) and (b): (a) ABA-type or ABA'-type copolymer (or their combination); (b) AB type di block copolymer.
In the aforementioned types, A and A' are blocks derived from comonomers consisting of unsaturated alkenyl aromatic compounds (e.g., styrene, a-methylstyrene, vinyltoluene, vinylxylene, vinylnaphthalene, etc.) or their mixtures, B is a block derived from comonomers consisting of diene compounds (e.g., butadiene, chlorobutadiene, isoprene, l,3-pentadiene, 2,3-dimethylbutadiene, etc.) or their mixtures.
The ABA-type or ABA'-type copolymer may be a so-called "tapered" block copolymer, in which threeblocks are directly connected to each other or via a "random copolymer" consisting of an alkenyl aromatic compound and a diene compound constituting each block, or a radial teleblock copolymer consisting of an alkenyl aromatic compound and a diene compound.
The AB type di block copolymer is a "tapered" block copolymer in which two blocks are directly connected to one each other or via a "random copolymer"
consisting of an alkenyl aromatic compound and a diene compound constituting each block.
Examples of especially desirable rubber polymers correspo~ing to the aforementioned type (a) include a styrene-ethylene-butadiene-styrene blockcopolymer, styrene-butadiene-styrene block copolymer, styrene-isoprene-styrene block copolymer, etc. Examples of especially rubber polymers corresponding to the aforementioned type (b) include a stYrene-ethYlene-propylene block copolymer, styrene-butadiene block copolymer, etc.
The aforementioned rubber polymers may be totally hydrogenated, partially hydrogenated, or acid-modified using maleic anhydride, etc. In particular, hydrogenated polymers are especially desirable in consideration of the thermal ageing resistance.
It is desirable that the quantity of rubber polymer content be 1-80 parts by weight (with respect to lO0 parts by weight) of the resin composition of the present invention. Then, it is desirable that 21568~8 the relative quantities of components (a) and (b) be 3-97 wt % and 97-3-wt %, respectively.
If necessary, furthermore, other rubbers (e.g., ethylene-propylene rubber, etc.) may be used in combination with the aforementioned rubber polymers of components (a) and (b).
The process is also useful for making graft copolymer having a diene rubber component. Rubber modified monovinylidene aromatic resins comprising (a) a rubber modified monovinylidene aromatic graft copolymer and (b) an ungrafted rigid copolymer, are generally prepared by graft polymerization of a mixture of a monovinylidene aromatic monomer and one or more comonomers in the presence of one or more rubbery polymeric substrates. Depen~ing on the amount of rubber present, a separate matrix or continuous rigid phase of ungrafted rigid (co)polymer may be simultaneously obtained along with the rubber modified monovinylidene aromatic graft polymer. The resins may also be produced by blending a rigid monovinylidene aromatic copolymer with one or more rubber modified monovinylidene aromatic graft copolymers. Typically, the rubber modified resins comprise the rubber modified graft copolymer at a level of from 5 to lO0 percent by weight based on the total weight of the resin, more preferably from lO to 95 percent by weight thereof, more-preferably 20 to 90 percent by weight thereof, and most preferably from l5 to 85 percent by weight thereof; and the rubber modified resin comprises the ungrafted rigid polymer at a level of from 0 to 95 percent by weight based on the total weight of the resin, more preferably from 5 to 90 percent by weight thereof, more preferably from lO to 80 percent by weight 2156~68 thereof and most preferably from 15 to 85 percent by weight thereof.
Monovinylidene aromatic monomers which may be employed include styrene, alpha-methyl styrene, halostyrenes i.e. dibromostyrene, mono or di alkyl, alkoxy or hydroxy substitute groups on the nuclear ring of the monovinylidene aromatic monomer i.e.
vinyl toluene, vinylxylene, butylstyrene, para-hydroxystyrene or methoxystyrene or mixtures thereof.
The monovinylidenearomatic monomers utilized are generically described by the following formula:
X R H
X - C C
X \ X H
wherein X is selected from the group consisting of hydrogen, alkyl groups of 1 to 5 carbon atoms, cycloalkyl, aryl, alkaryl, aralkyl, alkoxy, aryloxy, lS and halogens. R is selected from the group consisting of hydrogen, alkyl groups of 1 to 5 carbon atoms and halogens such as bromine and chlorine.
Examples of substituted vinylaromatic compounds include styrene, 4-methylstyrene, 3,5-diethylstyrene, 4-n-propylstyrene, a-methylstyrene, a-methyl vinyltoluene, a-chlorostyrene, a-bromostyrene, dichlorostyrene, dibromostyrene, tetrachlorostyrene, mixtures thereof and the like. The preferred `_ 215S8~8 monovinylidene aromatic monomers used are styrene and/or a-methylstyrene.
Comonomers which may be used with the monovinylidene aromatic monomer includes acrylonitrile, methacrylonitrile, Cl to C8 alkyl or aryl substituted acrylate, C~ to C8 alkyl, aryl or haloaryl substituted methacrylate, acrylic acid, methacrylic acid, itaconic acid, acrylamide, N-substituted acrylamide or methacrylamide, maleic anhydride, maleimide, N-alkyl, aryl or haloaryl substituted maleimide, glycidyl (meth)acrylates, hydroxy alkyl (meth)acrylates or mixtures thereof.
The acrylonitrile, substituted acrylonitrile, or acrylic acid esters are described generically by the following formula:
H R
C = C - Y
wherein Rlmay be selected from the same group set out for R as previously defined and Y is selected from the group consisting of cyano and carbalkoxy groups wherein the alkoxy group of the carbalkoxy contains from one or about twelve carbon atoms. Examples of such monomers include acrylonitrile, ethacrylonitrile, methacrylonitrile, a-chloroacrylonitrile, a-bromoacrylonitrile, methyl acrylate, methyl methacrylate, ethyl acrylate, butyl acrylate, propylacrylate, isopropyl acrylate and mixtures thereof. The preferred monomer is acrylonitrile and the preferred acrylic acid esters are ethyl acrylate and methyl methacrylate. It lS
215 6 8 ~ 8 08SC12217/08SC12197 also preferred that the acrylic acid esters, when included, are employed in combination with styrene or acrylonitrile.
The rubber modified graft copolymer comprises (i) the rubber substrate, and (ii) a rigid polymeric superstrate portion grafted to the rubber substrate.
The rubber substrate is preferably present in the graft copolymer at a level of from 5 to 85 percent by weight based on the total weight of the graft copolymer, more preferably from 10 to 80 percent by weight thereof, and most preferably 20 to 70 percent by weight thereof; and the rigid superstrate is preferably present at a level of from 15 to 95 percent by weight based on the total weight of the graft copolymer, more preferably from 20 to 90 percent by weight thereof, and most preferably from 30 to 80 percent by weight thereof.
For high rubber graft emulsion resins, the rubber level will range from 50 to 85% by weight based on the total weight of the rubber modified resin. For mass polymerization, the rubber level ranges from 4 to 40% by weight based on the total weight of the rubber modified resin. For blends of an ungrafted rigid copolymer (such as styrene-acrylonitrile copolymer) with an emulsion high rubbergraft (HRG) copolymer (such as acrylonitrile-butadiene-styrene graft copolymers), the rubber loading will typically range from 10 to 40% rubber based on the total weight of the rubber modified resin.
Examples of rubbery polymers for the substrate include: conjugated dienes, copolymers of a diene with styrene, acrylonitrile, methacrylonitrile or C
to C8 alkyl acrylate which contain at least 50%
(preferably at least 65% by weight) conjugated 21568~8 ~ 08SC12217/08SC12197 dienes, polyisoprene or mixtures thereof; olefin rubbers i.e. ethylene propylene copolymer (EPR) or ethylene propylene non-conjugated diene ~EPDM);
silicone rubbers; or Cl or C8 alkyl acrylate s homopolymers or copolymers with butadiene and/or styrene. The acrylic polymer may also contain up to 5% of one or more polyfunctional crosslinking agents such as alkylenediol di(meth)acrylates, alkylenetriol tri(meth)acrylates, polyester di(meth)acrylates, divinylbenzene, trivinylbenzene, butadiene, isoprene and optionally graftable monomers such as, triallyl cyanurate, triallyl isocyanurate, allyl (meth)acrylate, diallyl maleate, diallyl fumarate, diallyl adipate, triallyl esters of citric acid or mixtures of these agents.
The diene rubbers may preferably be polybutadiene, polyisoprene and copolymers of butadiene with up to 35% by weight of comonomers such as styrene, acrylonitrile, methylmethacrylate or C~-C6-alkylacrylate which are produced by aqueous radical emulsion polymerisation. The acrylate rubbers may be cross-linked, particulate emulsion copolymers substantially of Cl-C8-alkylacrylate, in particular C2-C6-alkylacrylate, optionally in admixture with up to 15% by weight of comonomers such as styrene, methylmethacrylate, butadiene, vinyl methyl ether or acrylonitrile and optionally up to 5% by weight of a polyfunctional crosslinking comonomer, e.g.
divinylbenzene,glycol-bis-acrylates,bisacrylamides, phosphoric acid triallylester, citric acid triallylester, allylesters of acrylic acid or - methacrylic acid, triallylcyanurate, triallylisocyanurate. Also suitable are mixtures of diene- and alkylacrylate rubbers and rubbers which have a so-called core/sheath structure, e.g. a core of diene rubber and a sheath of acrylate or vice versa.
Specific conjugated diene monomers normally utilized in preparing the rubber substrate of the graft polymer are generically described by the following formula:
X~ H H X
C = C - C = C
X~ X~
wherein X~ is selected from the group consisting of hydrogen, alkyl groups containing from one to five carbon atoms, chlorine or bromine. Examples of dienes that may be used are butadiene, isoprene, 1,3-heptadiene, methyl-1,3-pentadiene, 2,3-dimethylbutadiene, 2-ethyl-1,3-pentadiene 1,3- and 2,4-hexadienes, chloro and bromo substituted butadienes s~ch as dichlorobutadiene, bromobutadiene, dibromobutadiene, mixtures thereof, and the like. A
preferred conjugated diene is 1,3 butadiene.
The substrate polymer, as mentioned, is preferably a conjugated diene polymer such as polybutadiene, polyisoprene, or a copolymer, such as butadiene-styrene, butadiene-acrylonitrile, or the like. The rubbery polymeric substrate portion must exhibit a glass transition temperature (Tg) of less than about 0C.
Mixtures of one or more rubbery polymers previously described for preparing the monovinylidene aromatic graft polymers, or mixtures of one or more rubber modified monovinylidene aromatic graft polymers disclosed herein may also be employed.
21~6~68 Furthermore, the rubber may comprise either a block or random copolymer. The rubber particle size used in this invention as measured by simple light transmission methods or capillary hydrodynamic chromatography (CHDF) may be described as having an average particle size by weight of select one of the following: 0.05 to 1.2 microns, preferably .2 to .8 microns, for emulsion based polymerized rubber latices or 0.5 to 10 microns, preferably 0.6 to 1.5 microns, for mass polymerized rubber substrates which also have included grafted monomer occlusions. The rubber substrate is preferably a particulate, highly crosslinked diene or alkyl acrylate rubber, and preferably has a gel content greater than 70%.
Preferred graft superstrates include copolymers of styrene and acrylonitrile, copolymers of a-methylstyrene and acrylonitrile and methylmethacrylate polymers or copolymers with up to 50% by weight of C~-C6 alkylacrylates, acrylonitrile or styrene. Specific examples of monovinylidene aromatic graft copolymers include but are not limited to the following: acrylonitrile-butadiene-styrene (ABS ), acrylonitrile-styrene-butyl acrylate (ASA), methylmethacrylate-acrylonitrile-butadiene-styrene (MABS ), acrylonitrile-ethylene-propylene-non-conjugated diene-styrene (AES ) .
The ungrafted rigid polymers (typically free of rubber) are resinous, thermoplastic polymers of styrene, -methylstyrene, styrenes substituted in the nucleus such as p-methylstyrene, methyl acrylate, methylmethacrylate,acrylonitrile,methacrylonitrile, maleic acid anhydride, N-substituted maleimide, vinyl acetate or mixtures thereof. Styrene/acrylonitrile copolymers, a-methylstyrene/acrylonitrile copolymers and methylmethacrylate/acrylonitrile copolymers are preferred.
The ungrafted rigid copolymers are known and may be prepared by radical polymerisation, in particular by emulsion, suspension, solution or bulk polymerisation. They preferably have number average molecular weights of from 20,000 to 200,000 and limiting viscosity numbers [~] of from 20 to 110 ml/g (determined in dimethylformamide at 25C).
10The number average molecular weight of the grafted rigid superstrate of the monovinylidene aromatic resin is designed to be in the range of 20,000 to 350,000. The ratio of monovinylidene aromatic monomer to the second and optionally third 15monomer may range from 90/10 to 50/50 preferably 80/20 to 60/40. The third monomer may optional replace 0 to 50~ of one or both of the first and second monomers.
These rubber modified monovinylidene aromatic graft polymers may be polymerized either by mass, emulsion, suspension, solution or combined processes such as bulk-suspension, emulsion-bulk, bulk-solution or other techniques well known in the art.
Furthermore, these rubber modified monovinylidene aromatic graft copolymers may be produced either by continuous, semibatch or batch processes.
The organic solvent may be any suitable organic solvent, which preferably has a melt temperature below 25C, and suitable examples include C3 to C20 hydrocarbons, more preferably C4 to Cl0 hydrocarbons, such as benzene, tetrahydrofuran, dioxane, 1,2-dimethoxyethane and n-hexane, and most preferably is cyclohexane. Other suitable solvents include aliphatic or aromatic hydrocarbons, mineral oil, and hydrocarbon monomers such as styrene. The carrier solution is a solution of organic solvent and phosphite. The phosphite is preferably present at a level of from 1 to 50 percent by weight based on the total weight of the carrier solution, more preferably from 10 to 50 percent by weight thereof, and most preferably from 20 to 40 percent by weight thereof.
The organic solvent is preferably present in the carrier solution at a level of from 50 to 99 percent by weight based on the total weight of the carrier solution, more preferably from 50 to 90 percent by weight thereof, and most preferably from 60 to 80 percent by weight thereof.
One embodiment of the process involves feeding the carrier solution into a reaction mass. The reaction mass comprises vinyl monomers and diene monomers and/or diene derived polymers. The phosphite serves to enhAnce the oxidative stability of the polymeric materials during processing and post-processing. Another embodiment of the process involves introducing the carrier solution into the polymeric material, and then removing the solvent therefrom.
Other suitable processes for using the present invention include processes for making vinylic polymers including, for example, polystyrene, polyvinylchloride, anionic polymers, polybutadiene, polyisoprene, and polymethylmethacrylate.
Mass, bulk, mass-suspension, suspension and emulsion processes are well known in the art. The present invention involves improving the phosphite delivery system of those processes by utilizing a carrier solution that contains a phosphite which exhibits high levels of solubility in organic solvents.
`~ 21~6868 ~ 08SC12217/08SC12197 Polymeric material as used herein refers to either the final polymer product or the final polymeric product in solution or dispersion.
The phosphite preferably has a melt temperature 5 above 25C.
EXAMPLES
Table 1 Ex Phos SolubilitY %
1 Phos 1 50.1 A Phos A <10 B Phos B 15.7 C Phos C 12.4 Solubility for example 1 and comparative example A is measured as solubiiity in hexane with each percentage value being equal to grams of phos per milliliter of hexane (20% = 2 g/ml, 10% = lg~ml.
Phos A isTetrakis(2,4-di-tert-butylphenyl)4,4'-diphenylylenediphosphonite.
Phos 1 is of the formula ~X~P ~
The examples of Table 2 illustrate the in polymer solubility of the present phosphites which should facilitate phosphite dispersion in the polymer compositions.
Phos B is bis(2,4-di-t-butylphenyl) pentaerythritol diphosphite.
Phos C is tris(2,4-di-tert-butylphenyl) phosphite.
Phos D is trisnonylphenyphosphite.
2 15 6 ~ S 8 08SC12217/08SC12197 CEX D-G were comparative examples and examples 2 and 3 were examples of the present invention.
Phos 2 was of the formula ~~ ~
Values are set out as concentration in parts per million based on the total weight of the linear low density polyethylene. The greatly increasing values with time for examples 2 and 3 compared to CEX D-G
illustrates the greatly enhAnced solubility of the present phosphites.
r r~ o r ~D r u~ ~ o r-X ,C ~ o o a~
P~ o _I ~ ~ 0 ~ I C~ 0 ~n r u~ 0 ~
ou~ ~ ~ cn ~ 0 X
~ ~O ~ _~ ~1 _I
X O ~ o In U ~ O ~ I o~ ~ ~ I I r~
~q 0 L cq ~ ~7 E~ X O ~ a o r~ r o ~ ~~ ~ ~ ~ ~ o X O
.C~ _I U~ o U P~ o I I ~ ~ o~
~ tQ
X O ~ ~
p~ o I I r~ r ~, _ O ~
BA~O~Nv OF THE l~V~. ~ lON
Fleld of the Inventlon The present invention relates to solvent utilizing polymerization processes, and more particularly relates to solvent based delivery systems for phosphites.
DESCRIPTION OF RELATED ART
Solvent utilizing polymerization processes are generally known. Such processes are useful for manufacturing polymers such as homopolymers, block copolymers and graft copolymers, and include processes commonly referred to as bulk, mass, suspension and emulsion processes. Some of the processes attempt to incorporate antioxidants such as phosphites into the polymer material by introducing a solvent containing the antioxidant into the reaction process. These solvents generally need to be removed at some point in the process, and consequently there is at times a desire to m;n;m;ze the amount of solvent in the process. Many phosphites, however, do not exhibit high levels of solubility in various organic solvents, for example, aliphatic or aromatic liquid (25C) hydrocarbons, for further example, cyclohexane.
Accordingly, there is a desire to provide a phosphite which exhibits high levels of solubility in organic solvents, and to provide a solvent deliverY
system for the phosphite which m;nimizes the amount of solvent required.
SUMMARY OF THE lNVk~ ~lON
The present invention involves a polymerization process involving the delivery of a phosphite into the process via a solvent carrier, and further S involves a solvent carrier solution containing a phosphite wherein the phosphite is of the formula:
C(CH3)3 H3C-CH2-CH2-CH2 ~ ~CH2-O \ ~ y2 CH3-CH2/ CH2-O yl wherein yl is an alkyl and y2 iS selected from tert-butyl and sec-butyl. The solvent is an organic solvent.
DETAILED DESCRIPTION OF T~E l~V' .. lON
A process is provided for making polymeric materials. One embodiment of the process involves introducing a carrier solution into a reaction mass.
The carrier solution contains an organic solvent and a phosphite that exhibits a high degree of solubility in the organic solvent.
The process is useful for making polymeric materials cont~; nl ng (desired from) diene compounds.
The diene rubber polymers which can be used in the present invention are characterized by the following types (a) and (b): (a) ABA-type or ABA'-type copolymer (or their combination); (b) AB type di block copolymer.
In the aforementioned types, A and A' are blocks derived from comonomers consisting of unsaturated alkenyl aromatic compounds (e.g., styrene, a-methylstyrene, vinyltoluene, vinylxylene, vinylnaphthalene, etc.) or their mixtures, B is a block derived from comonomers consisting of diene compounds (e.g., butadiene, chlorobutadiene, isoprene, l,3-pentadiene, 2,3-dimethylbutadiene, etc.) or their mixtures.
The ABA-type or ABA'-type copolymer may be a so-called "tapered" block copolymer, in which threeblocks are directly connected to each other or via a "random copolymer" consisting of an alkenyl aromatic compound and a diene compound constituting each block, or a radial teleblock copolymer consisting of an alkenyl aromatic compound and a diene compound.
The AB type di block copolymer is a "tapered" block copolymer in which two blocks are directly connected to one each other or via a "random copolymer"
consisting of an alkenyl aromatic compound and a diene compound constituting each block.
Examples of especially desirable rubber polymers correspo~ing to the aforementioned type (a) include a styrene-ethylene-butadiene-styrene blockcopolymer, styrene-butadiene-styrene block copolymer, styrene-isoprene-styrene block copolymer, etc. Examples of especially rubber polymers corresponding to the aforementioned type (b) include a stYrene-ethYlene-propylene block copolymer, styrene-butadiene block copolymer, etc.
The aforementioned rubber polymers may be totally hydrogenated, partially hydrogenated, or acid-modified using maleic anhydride, etc. In particular, hydrogenated polymers are especially desirable in consideration of the thermal ageing resistance.
It is desirable that the quantity of rubber polymer content be 1-80 parts by weight (with respect to lO0 parts by weight) of the resin composition of the present invention. Then, it is desirable that 21568~8 the relative quantities of components (a) and (b) be 3-97 wt % and 97-3-wt %, respectively.
If necessary, furthermore, other rubbers (e.g., ethylene-propylene rubber, etc.) may be used in combination with the aforementioned rubber polymers of components (a) and (b).
The process is also useful for making graft copolymer having a diene rubber component. Rubber modified monovinylidene aromatic resins comprising (a) a rubber modified monovinylidene aromatic graft copolymer and (b) an ungrafted rigid copolymer, are generally prepared by graft polymerization of a mixture of a monovinylidene aromatic monomer and one or more comonomers in the presence of one or more rubbery polymeric substrates. Depen~ing on the amount of rubber present, a separate matrix or continuous rigid phase of ungrafted rigid (co)polymer may be simultaneously obtained along with the rubber modified monovinylidene aromatic graft polymer. The resins may also be produced by blending a rigid monovinylidene aromatic copolymer with one or more rubber modified monovinylidene aromatic graft copolymers. Typically, the rubber modified resins comprise the rubber modified graft copolymer at a level of from 5 to lO0 percent by weight based on the total weight of the resin, more preferably from lO to 95 percent by weight thereof, more-preferably 20 to 90 percent by weight thereof, and most preferably from l5 to 85 percent by weight thereof; and the rubber modified resin comprises the ungrafted rigid polymer at a level of from 0 to 95 percent by weight based on the total weight of the resin, more preferably from 5 to 90 percent by weight thereof, more preferably from lO to 80 percent by weight 2156~68 thereof and most preferably from 15 to 85 percent by weight thereof.
Monovinylidene aromatic monomers which may be employed include styrene, alpha-methyl styrene, halostyrenes i.e. dibromostyrene, mono or di alkyl, alkoxy or hydroxy substitute groups on the nuclear ring of the monovinylidene aromatic monomer i.e.
vinyl toluene, vinylxylene, butylstyrene, para-hydroxystyrene or methoxystyrene or mixtures thereof.
The monovinylidenearomatic monomers utilized are generically described by the following formula:
X R H
X - C C
X \ X H
wherein X is selected from the group consisting of hydrogen, alkyl groups of 1 to 5 carbon atoms, cycloalkyl, aryl, alkaryl, aralkyl, alkoxy, aryloxy, lS and halogens. R is selected from the group consisting of hydrogen, alkyl groups of 1 to 5 carbon atoms and halogens such as bromine and chlorine.
Examples of substituted vinylaromatic compounds include styrene, 4-methylstyrene, 3,5-diethylstyrene, 4-n-propylstyrene, a-methylstyrene, a-methyl vinyltoluene, a-chlorostyrene, a-bromostyrene, dichlorostyrene, dibromostyrene, tetrachlorostyrene, mixtures thereof and the like. The preferred `_ 215S8~8 monovinylidene aromatic monomers used are styrene and/or a-methylstyrene.
Comonomers which may be used with the monovinylidene aromatic monomer includes acrylonitrile, methacrylonitrile, Cl to C8 alkyl or aryl substituted acrylate, C~ to C8 alkyl, aryl or haloaryl substituted methacrylate, acrylic acid, methacrylic acid, itaconic acid, acrylamide, N-substituted acrylamide or methacrylamide, maleic anhydride, maleimide, N-alkyl, aryl or haloaryl substituted maleimide, glycidyl (meth)acrylates, hydroxy alkyl (meth)acrylates or mixtures thereof.
The acrylonitrile, substituted acrylonitrile, or acrylic acid esters are described generically by the following formula:
H R
C = C - Y
wherein Rlmay be selected from the same group set out for R as previously defined and Y is selected from the group consisting of cyano and carbalkoxy groups wherein the alkoxy group of the carbalkoxy contains from one or about twelve carbon atoms. Examples of such monomers include acrylonitrile, ethacrylonitrile, methacrylonitrile, a-chloroacrylonitrile, a-bromoacrylonitrile, methyl acrylate, methyl methacrylate, ethyl acrylate, butyl acrylate, propylacrylate, isopropyl acrylate and mixtures thereof. The preferred monomer is acrylonitrile and the preferred acrylic acid esters are ethyl acrylate and methyl methacrylate. It lS
215 6 8 ~ 8 08SC12217/08SC12197 also preferred that the acrylic acid esters, when included, are employed in combination with styrene or acrylonitrile.
The rubber modified graft copolymer comprises (i) the rubber substrate, and (ii) a rigid polymeric superstrate portion grafted to the rubber substrate.
The rubber substrate is preferably present in the graft copolymer at a level of from 5 to 85 percent by weight based on the total weight of the graft copolymer, more preferably from 10 to 80 percent by weight thereof, and most preferably 20 to 70 percent by weight thereof; and the rigid superstrate is preferably present at a level of from 15 to 95 percent by weight based on the total weight of the graft copolymer, more preferably from 20 to 90 percent by weight thereof, and most preferably from 30 to 80 percent by weight thereof.
For high rubber graft emulsion resins, the rubber level will range from 50 to 85% by weight based on the total weight of the rubber modified resin. For mass polymerization, the rubber level ranges from 4 to 40% by weight based on the total weight of the rubber modified resin. For blends of an ungrafted rigid copolymer (such as styrene-acrylonitrile copolymer) with an emulsion high rubbergraft (HRG) copolymer (such as acrylonitrile-butadiene-styrene graft copolymers), the rubber loading will typically range from 10 to 40% rubber based on the total weight of the rubber modified resin.
Examples of rubbery polymers for the substrate include: conjugated dienes, copolymers of a diene with styrene, acrylonitrile, methacrylonitrile or C
to C8 alkyl acrylate which contain at least 50%
(preferably at least 65% by weight) conjugated 21568~8 ~ 08SC12217/08SC12197 dienes, polyisoprene or mixtures thereof; olefin rubbers i.e. ethylene propylene copolymer (EPR) or ethylene propylene non-conjugated diene ~EPDM);
silicone rubbers; or Cl or C8 alkyl acrylate s homopolymers or copolymers with butadiene and/or styrene. The acrylic polymer may also contain up to 5% of one or more polyfunctional crosslinking agents such as alkylenediol di(meth)acrylates, alkylenetriol tri(meth)acrylates, polyester di(meth)acrylates, divinylbenzene, trivinylbenzene, butadiene, isoprene and optionally graftable monomers such as, triallyl cyanurate, triallyl isocyanurate, allyl (meth)acrylate, diallyl maleate, diallyl fumarate, diallyl adipate, triallyl esters of citric acid or mixtures of these agents.
The diene rubbers may preferably be polybutadiene, polyisoprene and copolymers of butadiene with up to 35% by weight of comonomers such as styrene, acrylonitrile, methylmethacrylate or C~-C6-alkylacrylate which are produced by aqueous radical emulsion polymerisation. The acrylate rubbers may be cross-linked, particulate emulsion copolymers substantially of Cl-C8-alkylacrylate, in particular C2-C6-alkylacrylate, optionally in admixture with up to 15% by weight of comonomers such as styrene, methylmethacrylate, butadiene, vinyl methyl ether or acrylonitrile and optionally up to 5% by weight of a polyfunctional crosslinking comonomer, e.g.
divinylbenzene,glycol-bis-acrylates,bisacrylamides, phosphoric acid triallylester, citric acid triallylester, allylesters of acrylic acid or - methacrylic acid, triallylcyanurate, triallylisocyanurate. Also suitable are mixtures of diene- and alkylacrylate rubbers and rubbers which have a so-called core/sheath structure, e.g. a core of diene rubber and a sheath of acrylate or vice versa.
Specific conjugated diene monomers normally utilized in preparing the rubber substrate of the graft polymer are generically described by the following formula:
X~ H H X
C = C - C = C
X~ X~
wherein X~ is selected from the group consisting of hydrogen, alkyl groups containing from one to five carbon atoms, chlorine or bromine. Examples of dienes that may be used are butadiene, isoprene, 1,3-heptadiene, methyl-1,3-pentadiene, 2,3-dimethylbutadiene, 2-ethyl-1,3-pentadiene 1,3- and 2,4-hexadienes, chloro and bromo substituted butadienes s~ch as dichlorobutadiene, bromobutadiene, dibromobutadiene, mixtures thereof, and the like. A
preferred conjugated diene is 1,3 butadiene.
The substrate polymer, as mentioned, is preferably a conjugated diene polymer such as polybutadiene, polyisoprene, or a copolymer, such as butadiene-styrene, butadiene-acrylonitrile, or the like. The rubbery polymeric substrate portion must exhibit a glass transition temperature (Tg) of less than about 0C.
Mixtures of one or more rubbery polymers previously described for preparing the monovinylidene aromatic graft polymers, or mixtures of one or more rubber modified monovinylidene aromatic graft polymers disclosed herein may also be employed.
21~6~68 Furthermore, the rubber may comprise either a block or random copolymer. The rubber particle size used in this invention as measured by simple light transmission methods or capillary hydrodynamic chromatography (CHDF) may be described as having an average particle size by weight of select one of the following: 0.05 to 1.2 microns, preferably .2 to .8 microns, for emulsion based polymerized rubber latices or 0.5 to 10 microns, preferably 0.6 to 1.5 microns, for mass polymerized rubber substrates which also have included grafted monomer occlusions. The rubber substrate is preferably a particulate, highly crosslinked diene or alkyl acrylate rubber, and preferably has a gel content greater than 70%.
Preferred graft superstrates include copolymers of styrene and acrylonitrile, copolymers of a-methylstyrene and acrylonitrile and methylmethacrylate polymers or copolymers with up to 50% by weight of C~-C6 alkylacrylates, acrylonitrile or styrene. Specific examples of monovinylidene aromatic graft copolymers include but are not limited to the following: acrylonitrile-butadiene-styrene (ABS ), acrylonitrile-styrene-butyl acrylate (ASA), methylmethacrylate-acrylonitrile-butadiene-styrene (MABS ), acrylonitrile-ethylene-propylene-non-conjugated diene-styrene (AES ) .
The ungrafted rigid polymers (typically free of rubber) are resinous, thermoplastic polymers of styrene, -methylstyrene, styrenes substituted in the nucleus such as p-methylstyrene, methyl acrylate, methylmethacrylate,acrylonitrile,methacrylonitrile, maleic acid anhydride, N-substituted maleimide, vinyl acetate or mixtures thereof. Styrene/acrylonitrile copolymers, a-methylstyrene/acrylonitrile copolymers and methylmethacrylate/acrylonitrile copolymers are preferred.
The ungrafted rigid copolymers are known and may be prepared by radical polymerisation, in particular by emulsion, suspension, solution or bulk polymerisation. They preferably have number average molecular weights of from 20,000 to 200,000 and limiting viscosity numbers [~] of from 20 to 110 ml/g (determined in dimethylformamide at 25C).
10The number average molecular weight of the grafted rigid superstrate of the monovinylidene aromatic resin is designed to be in the range of 20,000 to 350,000. The ratio of monovinylidene aromatic monomer to the second and optionally third 15monomer may range from 90/10 to 50/50 preferably 80/20 to 60/40. The third monomer may optional replace 0 to 50~ of one or both of the first and second monomers.
These rubber modified monovinylidene aromatic graft polymers may be polymerized either by mass, emulsion, suspension, solution or combined processes such as bulk-suspension, emulsion-bulk, bulk-solution or other techniques well known in the art.
Furthermore, these rubber modified monovinylidene aromatic graft copolymers may be produced either by continuous, semibatch or batch processes.
The organic solvent may be any suitable organic solvent, which preferably has a melt temperature below 25C, and suitable examples include C3 to C20 hydrocarbons, more preferably C4 to Cl0 hydrocarbons, such as benzene, tetrahydrofuran, dioxane, 1,2-dimethoxyethane and n-hexane, and most preferably is cyclohexane. Other suitable solvents include aliphatic or aromatic hydrocarbons, mineral oil, and hydrocarbon monomers such as styrene. The carrier solution is a solution of organic solvent and phosphite. The phosphite is preferably present at a level of from 1 to 50 percent by weight based on the total weight of the carrier solution, more preferably from 10 to 50 percent by weight thereof, and most preferably from 20 to 40 percent by weight thereof.
The organic solvent is preferably present in the carrier solution at a level of from 50 to 99 percent by weight based on the total weight of the carrier solution, more preferably from 50 to 90 percent by weight thereof, and most preferably from 60 to 80 percent by weight thereof.
One embodiment of the process involves feeding the carrier solution into a reaction mass. The reaction mass comprises vinyl monomers and diene monomers and/or diene derived polymers. The phosphite serves to enhAnce the oxidative stability of the polymeric materials during processing and post-processing. Another embodiment of the process involves introducing the carrier solution into the polymeric material, and then removing the solvent therefrom.
Other suitable processes for using the present invention include processes for making vinylic polymers including, for example, polystyrene, polyvinylchloride, anionic polymers, polybutadiene, polyisoprene, and polymethylmethacrylate.
Mass, bulk, mass-suspension, suspension and emulsion processes are well known in the art. The present invention involves improving the phosphite delivery system of those processes by utilizing a carrier solution that contains a phosphite which exhibits high levels of solubility in organic solvents.
`~ 21~6868 ~ 08SC12217/08SC12197 Polymeric material as used herein refers to either the final polymer product or the final polymeric product in solution or dispersion.
The phosphite preferably has a melt temperature 5 above 25C.
EXAMPLES
Table 1 Ex Phos SolubilitY %
1 Phos 1 50.1 A Phos A <10 B Phos B 15.7 C Phos C 12.4 Solubility for example 1 and comparative example A is measured as solubiiity in hexane with each percentage value being equal to grams of phos per milliliter of hexane (20% = 2 g/ml, 10% = lg~ml.
Phos A isTetrakis(2,4-di-tert-butylphenyl)4,4'-diphenylylenediphosphonite.
Phos 1 is of the formula ~X~P ~
The examples of Table 2 illustrate the in polymer solubility of the present phosphites which should facilitate phosphite dispersion in the polymer compositions.
Phos B is bis(2,4-di-t-butylphenyl) pentaerythritol diphosphite.
Phos C is tris(2,4-di-tert-butylphenyl) phosphite.
Phos D is trisnonylphenyphosphite.
2 15 6 ~ S 8 08SC12217/08SC12197 CEX D-G were comparative examples and examples 2 and 3 were examples of the present invention.
Phos 2 was of the formula ~~ ~
Values are set out as concentration in parts per million based on the total weight of the linear low density polyethylene. The greatly increasing values with time for examples 2 and 3 compared to CEX D-G
illustrates the greatly enhAnced solubility of the present phosphites.
r r~ o r ~D r u~ ~ o r-X ,C ~ o o a~
P~ o _I ~ ~ 0 ~ I C~ 0 ~n r u~ 0 ~
ou~ ~ ~ cn ~ 0 X
~ ~O ~ _~ ~1 _I
X O ~ o In U ~ O ~ I o~ ~ ~ I I r~
~q 0 L cq ~ ~7 E~ X O ~ a o r~ r o ~ ~~ ~ ~ ~ ~ o X O
.C~ _I U~ o U P~ o I I ~ ~ o~
~ tQ
X O ~ ~
p~ o I I r~ r ~, _ O ~
Claims (13)
1. A polymerization process comprising:
(a) introducing a carrier solution into a monomeric reaction mass, said carrier solution comprising a liquid organic solvent and a phosphite of the formula:
wherein Y1 is an alkyl and Y2 is selected from tert-butyl and sec-butyl, (b) polymerizing said monomeric reaction mass to produce a phosphite stabilized polymeric material.
(a) introducing a carrier solution into a monomeric reaction mass, said carrier solution comprising a liquid organic solvent and a phosphite of the formula:
wherein Y1 is an alkyl and Y2 is selected from tert-butyl and sec-butyl, (b) polymerizing said monomeric reaction mass to produce a phosphite stabilized polymeric material.
2. The process of Claim 1 wherein said solvent is removed from said polymeric material.
3. The process of Claim 1 wherein said reaction mass comprised a diene compound.
4. The process of Claim 1 wherein said reaction mass comprises a vinyl aromatic monomer.
5. The process of Claim 1 wherein said polymeric material comprises vinyl aromatic-diene copolymers.
6. The process of Claim 5 wherein said copolymer is a styrene-butadiene-styrene block copolymer.
7. A carrier solution for introducing a phosphite into a reaction mass of a polymerization process, said carrier solution comprising:
(a) an organic solvent, and (b) a phosphite of the formula wherein Y1 is an alkyl and Y2 is selected from tert-butyl and sec-butyl.
(a) an organic solvent, and (b) a phosphite of the formula wherein Y1 is an alkyl and Y2 is selected from tert-butyl and sec-butyl.
8. The carrier solution of Claim 7 wherein said solvent is cyclohexane.
9. The carrier solution of Claim 7 wherein Y1 and Y2 are each tert-butyl.
10. The carrier solution of Claim 7 wherein said phosphite is present at a level of from 1 to 50 percent by weight based on the total weight of the composition.
11. The carrier solution of Claim 7 wherein said phosphite is present at a level of from 2 to 25 percent by weight based on the total weight of the composition.
12. The carrier solution of Claim 7 wherein said phosphite is present at a level of from 2 to 15 percent by weight based on the total weight of the composition.
13. A polymerization process comprising:
(a) polymerizing a monomeric reaction mass to produce a polymeric material;
(b) introducing a carrier solution into said polymeric material, said carrier solution comprising a liquid organic solvent and a phosphite of the formula:
wherein Y1 is an alkyl and Y2 is selected from tert-butyl and sec-butyl.
(a) polymerizing a monomeric reaction mass to produce a polymeric material;
(b) introducing a carrier solution into said polymeric material, said carrier solution comprising a liquid organic solvent and a phosphite of the formula:
wherein Y1 is an alkyl and Y2 is selected from tert-butyl and sec-butyl.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/307,545 | 1994-09-16 | ||
US08/307,545 US5424348A (en) | 1993-07-22 | 1994-09-16 | Neo-diol phosphites as polymer stabilizers |
US08/361,786 | 1994-12-21 | ||
US08/361,786 US5500468A (en) | 1993-07-22 | 1994-12-21 | Process for stabilizing polymeric material |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2156868A1 true CA2156868A1 (en) | 1996-03-17 |
Family
ID=26975802
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002156868A Abandoned CA2156868A1 (en) | 1994-09-16 | 1995-08-24 | Process for stabilizing polymeric material |
CA002156866A Abandoned CA2156866A1 (en) | 1994-09-16 | 1995-08-24 | Liquid neo-diol phosphites as polymer stabilizers |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002156866A Abandoned CA2156866A1 (en) | 1994-09-16 | 1995-08-24 | Liquid neo-diol phosphites as polymer stabilizers |
Country Status (8)
Country | Link |
---|---|
US (1) | US5500468A (en) |
EP (1) | EP0702053B1 (en) |
JP (1) | JPH08208718A (en) |
AT (1) | ATE174943T1 (en) |
CA (2) | CA2156868A1 (en) |
DE (1) | DE69506815T2 (en) |
DK (1) | DK0702053T3 (en) |
ES (1) | ES2124966T3 (en) |
Families Citing this family (1)
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US6891117B1 (en) * | 2003-11-07 | 2005-05-10 | Cooper Wiring Devices, Inc. | Modular block switch assembly |
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US3281381A (en) * | 1958-06-17 | 1966-10-25 | Hooker Chemical Corp | Reaction products of pentaerythritol and phosphites as vinyl chloride stabilizer |
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-
1994
- 1994-12-21 US US08/361,786 patent/US5500468A/en not_active Expired - Lifetime
-
1995
- 1995-08-24 CA CA002156868A patent/CA2156868A1/en not_active Abandoned
- 1995-08-24 CA CA002156866A patent/CA2156866A1/en not_active Abandoned
- 1995-09-12 ES ES95306364T patent/ES2124966T3/en not_active Expired - Lifetime
- 1995-09-12 DK DK95306364T patent/DK0702053T3/en active
- 1995-09-12 EP EP95306364A patent/EP0702053B1/en not_active Expired - Lifetime
- 1995-09-12 DE DE69506815T patent/DE69506815T2/en not_active Expired - Fee Related
- 1995-09-12 AT AT95306364T patent/ATE174943T1/en not_active IP Right Cessation
- 1995-09-14 JP JP7236314A patent/JPH08208718A/en not_active Withdrawn
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DE69506815D1 (en) | 1999-02-04 |
ATE174943T1 (en) | 1999-01-15 |
DE69506815T2 (en) | 1999-08-19 |
CA2156866A1 (en) | 1996-03-17 |
DK0702053T3 (en) | 1999-08-23 |
EP0702053B1 (en) | 1998-12-23 |
US5500468A (en) | 1996-03-19 |
JPH08208718A (en) | 1996-08-13 |
ES2124966T3 (en) | 1999-02-16 |
EP0702053A1 (en) | 1996-03-20 |
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