CA2181591A1 - Electrostatic discharge protection of isfet sensors - Google Patents
Electrostatic discharge protection of isfet sensorsInfo
- Publication number
- CA2181591A1 CA2181591A1 CA002181591A CA2181591A CA2181591A1 CA 2181591 A1 CA2181591 A1 CA 2181591A1 CA 002181591 A CA002181591 A CA 002181591A CA 2181591 A CA2181591 A CA 2181591A CA 2181591 A1 CA2181591 A1 CA 2181591A1
- Authority
- CA
- Canada
- Prior art keywords
- isfet
- liquid
- interface
- electrostatic discharge
- capacitor structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4148—Integrated circuits therefor, e.g. fabricated by CMOS processing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Abstract
Methods, apparatus and chip fabrication techniques are described which provide electrostatic discharge (ESD) protection to ion-sensitive field effect transistors (ISFET) based device (250) used to selectively measure ions in liquid (299).
According to one aspect of the invention, an ESD protection circuit, made up of conventional protective elements (201, 202, 206), is integrated onto the same silicon chip on which ISFET (250) is formed, along with interface (203) that is in contact with liquid (299) being measured and which does not open up paths for D.C.
leakage currents between ISFET
(250) and liquid (299). According to a preferred embodiment of the invention, a capacitor structure is used as interface (203) between protection circuit (201, 202, 206) and liquid sample (299).
Further aspects of the invention are directed to methods per se for providing ESD protection for ISFET sensors utilizing interface means (203) (e.g., capacitor structure) referred to hereinabove, and processes for fabricating the novel interface on a silicone wafer.
According to one aspect of the invention, an ESD protection circuit, made up of conventional protective elements (201, 202, 206), is integrated onto the same silicon chip on which ISFET (250) is formed, along with interface (203) that is in contact with liquid (299) being measured and which does not open up paths for D.C.
leakage currents between ISFET
(250) and liquid (299). According to a preferred embodiment of the invention, a capacitor structure is used as interface (203) between protection circuit (201, 202, 206) and liquid sample (299).
Further aspects of the invention are directed to methods per se for providing ESD protection for ISFET sensors utilizing interface means (203) (e.g., capacitor structure) referred to hereinabove, and processes for fabricating the novel interface on a silicone wafer.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8-183,733 | 1994-01-19 | ||
US08/183,733 US5414284A (en) | 1994-01-19 | 1994-01-19 | ESD Protection of ISFET sensors |
PCT/US1995/000426 WO1995020243A1 (en) | 1994-01-19 | 1995-01-12 | Electrostatic discharge protection of isfet sensors |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2181591A1 true CA2181591A1 (en) | 1995-07-27 |
CA2181591C CA2181591C (en) | 2008-04-29 |
Family
ID=22674080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002181591A Expired - Fee Related CA2181591C (en) | 1994-01-19 | 1995-01-12 | Electrostatic discharge protection of isfet sensors |
Country Status (10)
Country | Link |
---|---|
US (2) | US5414284A (en) |
EP (1) | EP0749632B1 (en) |
JP (1) | JP3701308B2 (en) |
KR (1) | KR100358534B1 (en) |
CN (1) | CN1120985C (en) |
AU (1) | AU1602195A (en) |
CA (1) | CA2181591C (en) |
DE (1) | DE69535202T2 (en) |
RU (1) | RU2134877C1 (en) |
WO (1) | WO1995020243A1 (en) |
Families Citing this family (76)
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US6300148B1 (en) * | 1998-10-05 | 2001-10-09 | Advanced Micro Devices | Semiconductor structure with a backside protective layer and backside probes and a method for constructing the structure |
US6387724B1 (en) | 1999-02-26 | 2002-05-14 | Dynamics Research Corporation | Method of fabricating silicon-on-insulator sensor having silicon oxide sensing surface |
TW434704B (en) * | 1999-06-11 | 2001-05-16 | Univ Nat Yunlin Sci & Tech | Device of amorphous WO3 ion sensitive field effect transistor (ISFET) and method for making the same |
JP2000356619A (en) * | 1999-06-14 | 2000-12-26 | Sumitomo Metal Ind Ltd | Ph sensor and ph measurement method using it |
US6218208B1 (en) | 1999-07-02 | 2001-04-17 | National Science Council | Fabrication of a multi-structure ion sensitive field effect transistor with a pH sensing layer of a tin oxide thin film |
US7151036B1 (en) * | 2002-07-29 | 2006-12-19 | Vishay-Siliconix | Precision high-frequency capacitor formed on semiconductor substrate |
US6538300B1 (en) | 2000-09-14 | 2003-03-25 | Vishay Intertechnology, Inc. | Precision high-frequency capacitor formed on semiconductor substrate |
TW468233B (en) | 2000-09-16 | 2001-12-11 | Univ Nat Yunlin Sci & Tech | Apparatus and measurement method of hysteresis and time shift for ISFET containing amorphous silicon hydride sensing membrane |
KR20030075437A (en) * | 2002-03-19 | 2003-09-26 | (주)티오스 | The ISFET-probe fabrication and measuring-system design technology for electrostatic discharge protection of the ISFET sensor |
TW544752B (en) | 2002-05-20 | 2003-08-01 | Univ Nat Yunlin Sci & Tech | Method for producing SnO2 gate ion sensitive field effect transistor (ISFET), and method and device for measuring the temperature parameters, drift and hysteresis values thereof |
US20040104454A1 (en) * | 2002-10-10 | 2004-06-03 | Rohm Co., Ltd. | Semiconductor device and method of producing the same |
DE10260961A1 (en) * | 2002-12-20 | 2004-07-01 | Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG | Semiconductor sensor with contact on the front |
US7337898B2 (en) * | 2003-09-30 | 2008-03-04 | Fred Lewter | Golf bag |
JP4065855B2 (en) * | 2004-01-21 | 2008-03-26 | 株式会社日立製作所 | Biological and chemical sample inspection equipment |
CA2538232A1 (en) * | 2004-01-21 | 2005-08-11 | Rosemount Analytical Inc. | Ion sensitive field effect transistor (isfet) sensor with improved gate configuration |
TWI241020B (en) * | 2004-03-31 | 2005-10-01 | Univ Nat Yunlin Sci & Tech | Method of manufacturing TiO2 sensing film, ISFET having TiO2 sensing film, and methods and apparatus for measuring the temperature parameter, drift, and hysteresis thereof |
US20050225916A1 (en) * | 2004-04-02 | 2005-10-13 | Siemens Medical Solutions Usa, Inc. | Ultrasound membrane transducer collapse protection system and method |
ITTO20040386A1 (en) * | 2004-06-09 | 2004-09-09 | Infm Istituto Naz Per La Fisi | FIELD-EFFECTIVE DEVICE FOR THE DETECTION OF SMALL QUANTITIES OF ELECTRIC CHARGE, SUCH AS THOSE GENERATED IN BIOMOLECULAR PROCESSES, IMMOBILIZED NEAR THE SURFACE. |
GB2416210B (en) * | 2004-07-13 | 2008-02-20 | Christofer Toumazou | Ion sensitive field effect transistors |
CN100446417C (en) * | 2004-12-23 | 2008-12-24 | 中国科学院电子学研究所 | Differential circuit for reading out signal of integrated ISFET sensor based on two modes |
US20060174683A1 (en) * | 2005-02-07 | 2006-08-10 | Ulrich Bonne | Functionalized field effect transistor sensor with self checking |
TWI244702B (en) * | 2005-04-04 | 2005-12-01 | Univ Nat Yunlin Sci & Tech | Titanium oxide thin film for extended gate field effect transistor using reactive sputtering |
EP1729121A1 (en) * | 2005-05-30 | 2006-12-06 | Mettler-Toledo AG | Electrochemical sensor |
CN101101272B (en) * | 2006-07-07 | 2010-10-13 | 中国科学院电子学研究所 | Biochemical microsensing integrated chip, its manufacture and mould preparation method |
DE102006052863B4 (en) * | 2006-11-09 | 2018-03-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Protective structure for semiconductor sensors and their use |
US8349167B2 (en) | 2006-12-14 | 2013-01-08 | Life Technologies Corporation | Methods and apparatus for detecting molecular interactions using FET arrays |
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TWI580955B (en) | 2010-06-30 | 2017-05-01 | 生命技術公司 | Ion-sensing charge-accumulation circuits and methods |
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TWI584650B (en) | 2010-09-24 | 2017-05-21 | 生命技術公司 | Matched pair transistor circuits |
GB2540904B (en) | 2010-10-08 | 2017-05-24 | Dnae Group Holdings Ltd | Electrostatic discharge protection |
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US9970984B2 (en) | 2011-12-01 | 2018-05-15 | Life Technologies Corporation | Method and apparatus for identifying defects in a chemical sensor array |
US8821798B2 (en) | 2012-01-19 | 2014-09-02 | Life Technologies Corporation | Titanium nitride as sensing layer for microwell structure |
US8786331B2 (en) | 2012-05-29 | 2014-07-22 | Life Technologies Corporation | System for reducing noise in a chemical sensor array |
US9080968B2 (en) | 2013-01-04 | 2015-07-14 | Life Technologies Corporation | Methods and systems for point of use removal of sacrificial material |
US9841398B2 (en) | 2013-01-08 | 2017-12-12 | Life Technologies Corporation | Methods for manufacturing well structures for low-noise chemical sensors |
US8962366B2 (en) | 2013-01-28 | 2015-02-24 | Life Technologies Corporation | Self-aligned well structures for low-noise chemical sensors |
US8871549B2 (en) * | 2013-02-14 | 2014-10-28 | International Business Machines Corporation | Biological and chemical sensors |
US8841217B1 (en) | 2013-03-13 | 2014-09-23 | Life Technologies Corporation | Chemical sensor with protruded sensor surface |
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US10458942B2 (en) | 2013-06-10 | 2019-10-29 | Life Technologies Corporation | Chemical sensor array having multiple sensors per well |
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JPS57159055A (en) * | 1981-03-25 | 1982-10-01 | Toshiba Corp | Manufacture of semiconductor device |
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JP2610294B2 (en) * | 1988-03-31 | 1997-05-14 | 株式会社東芝 | Chemical sensor |
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DE4232532A1 (en) * | 1992-09-29 | 1994-04-28 | Ct Fuer Intelligente Sensorik | Ion-sensitive field effect transistor mfr. for higher reliability - involves electrostatic protection by diodes within well and substrate of CMOS structure in conjunction with pseudo-reference electrode |
-
1994
- 1994-01-19 US US08/183,733 patent/US5414284A/en not_active Expired - Lifetime
- 1994-10-13 US US08/322,226 patent/US5407854A/en not_active Expired - Lifetime
-
1995
- 1995-01-12 CN CN95191279A patent/CN1120985C/en not_active Expired - Lifetime
- 1995-01-12 RU RU96115918A patent/RU2134877C1/en not_active IP Right Cessation
- 1995-01-12 KR KR1019960703873A patent/KR100358534B1/en not_active IP Right Cessation
- 1995-01-12 CA CA002181591A patent/CA2181591C/en not_active Expired - Fee Related
- 1995-01-12 EP EP95908032A patent/EP0749632B1/en not_active Expired - Lifetime
- 1995-01-12 WO PCT/US1995/000426 patent/WO1995020243A1/en active IP Right Grant
- 1995-01-12 JP JP51959695A patent/JP3701308B2/en not_active Expired - Lifetime
- 1995-01-12 AU AU16021/95A patent/AU1602195A/en not_active Abandoned
- 1995-01-12 DE DE69535202T patent/DE69535202T2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0749632A1 (en) | 1996-12-27 |
JPH09508207A (en) | 1997-08-19 |
RU2134877C1 (en) | 1999-08-20 |
EP0749632B1 (en) | 2006-08-30 |
DE69535202T2 (en) | 2007-07-19 |
JP3701308B2 (en) | 2005-09-28 |
DE69535202D1 (en) | 2006-10-12 |
EP0749632A4 (en) | 1999-11-24 |
AU1602195A (en) | 1995-08-08 |
CN1120985C (en) | 2003-09-10 |
CA2181591C (en) | 2008-04-29 |
WO1995020243A1 (en) | 1995-07-27 |
US5407854A (en) | 1995-04-18 |
CN1143428A (en) | 1997-02-19 |
US5414284A (en) | 1995-05-09 |
KR100358534B1 (en) | 2003-01-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |
Effective date: 20130114 |