CA2244956A1 - Electromagnetic high-frequency or microwave apparatus - Google Patents

Electromagnetic high-frequency or microwave apparatus Download PDF

Info

Publication number
CA2244956A1
CA2244956A1 CA002244956A CA2244956A CA2244956A1 CA 2244956 A1 CA2244956 A1 CA 2244956A1 CA 002244956 A CA002244956 A CA 002244956A CA 2244956 A CA2244956 A CA 2244956A CA 2244956 A1 CA2244956 A1 CA 2244956A1
Authority
CA
Canada
Prior art keywords
microwave device
chamber
antenna elements
transmission
wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002244956A
Other languages
French (fr)
Inventor
Jeng-Ming Wu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WU JENG MING
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2244956A1 publication Critical patent/CA2244956A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/3222Antennas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32743Means for moving the material to be treated for introducing the material into processing chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/32247Resonators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32266Means for controlling power transmitted to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/321Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211Antennas, e.g. particular shapes of coils

Abstract

The invention concerns an electromagnetic high-frequency or microwave apparatus comprising a treatment chamber (6) with a transfer wall (7, 7', 7") which allows electromagnetic waves to pass through to an adjacent chamber (4) and is designed to influence the intensity distribution of the transfer of the electromagnetic waves into the treatment chamber (6). The apparatus according to the invention enables the intensity of the transferred waves to be controlled with low losses in that the transfer wall (7, 7', 7") comprises a plurality of rod-shaped antenna elements (10, 10') oriented at an angle to the plane of the wall of the adjacent chamber (4), the antenna elements (10, 10') projecting centrally through through-openings (14, 14') delimited by electrically conductive material.

Description

t , CA 022449~6 1998-07-30 W~ 97/28555 - 1 - PCT/D~97/00185 Electromagnetic radio-$requency or microwave device The invention relates to an electromagnetic radio-frequency or microwave device having a treatment chamber with a transmission wall, which is pe~m~rhle for the electromagnetic waves, to an adjacent chamber and with a design of the tra~smission chamber ~sic] for influencing the intensity distribution of the transmission of the elect-~ ~netic waves into the treatment chamber.
It is known for the intensity distribution of microwaves which are transmitted through a transmission wall from a ch~mher into a treatment ~ hr-' er to be in~luenced by a special design of the transmission wall.
DE 94 05 808 U discloses a plasma processing device in which a plasma is produced in a treatment t-hr 'cr by means of microwaves that are introduced, for example for surface processing of objects which are introduced into the treatment chamber. In this case, the microwaves are produced in a rectangular hollow waveguide of elongated de~ign, and are output at the side via a waveguide which projects into the hollow waveguide. In this case, the waveguide is designed in the form of a disk and forms a boundary wall for the treatment chrmher. In order to introduce the microwave energy uniformly into the treat-ment chrmher, a screen of conductive material is located between the waveguide and the treatment chamber, which screen is designed as a perforated metal sheet, the size CA 022449~6 l998-07-30 ~ of the through-holes increasing as the distance from the hollow waveguide increases, in order in this way to make it possible to compensate for the decrease in the micro-wave energy as the distance from the hollow waveguide increases.
The use of such a screen as a transmission wall of the treatment chamber leads, however, to a consider-able reduction in the microwave energy introduced into the treatment chamber. The introduction of energy into the treatment chamber is thus made uniform at the expense of a considerable reduction in the microwave energy.
It is furthermore known for it to be possible to produce a plasma in a treatment chamber by radio-frequency excitation as well.
The invention is thus based on the problem of de~igning an electromagnetic radio-frequency or microwave device of the type mentioned initially such that it is possible to transmit electr~-~netic waves into the treatment chamber with a predetermined intensity profile or as uniformly as possible without as a consequence having to accept a considerable reduction in the trans-mitted electromagnetic energy.
Based on this problem, an electr~-~n~tic radio-frequency or microwave device of the type mentioned initially is characterized in that the transmission wall has a large number of antenna elements which are directed at an angle to the wall plane of the adjacent chamber, are in the form of rods, and project centrally through through-openings which are bounded by electrically CA 022449~6 1998-07-30 conductive material.
According to the invention, the excitation energy i8 injected from the adjacent chamber into the antenna elements and is emitted by them in the direction of the treatment chamber. Together with the through-openings which surround them and are composed of electrically conductive material, the antenna elements form a type of coaxial conductor. The elect ~ -gnetic energy transmitted via the antenna element into the treatment chamber can be adjusted by adjusting the coupling conditions of the antenna elements for the excitation energy in the adjacent chamber.
For the transmission of mic~o. ~es, this can be done in a simple ~9nne~ by means of the length of the antenna elements, which projects out of the through-openings. The through-openings are in this case prefer-ably designed as through-chambers which are connected directly, or with an intermediate space, to a plate, which is pe --hle for microwaves, of the transmission wall.
It is possible to design the length of the various antenna elements to be different over the surface of the transmission wall in order in this way, if neces-sary, to unify or produce a desired intensity profile over the area of the transmission wall.
On that surface of the conductive material point-ing towards the adjacent chamber, the through-chambers preferably have a circular through-opening with a diameter which is considerably greater than the diameter , , CA 02244956 1998-07-30 of the antenna element. The diameter of the through-opening is preferably about 2 to 5 times, fur~he~m~re preferably about 3 times, greater than the diameter of the antenna element.
The through-chamber can eYp~n~ in stepped form underneath the through-opening and can be designed there, for example, with a round or rectangular, preferably sguare, cro~s section.
The ratio of the diameter of the through-opening to the diameters of the antenna element likewise allows the transmission of the energy via the transmission wall to be controlled.
In a particularly preferred embo~; m~n t, the through-ch~hers are formed in a common electrically conductive plate.
The transmission according to the invention through the through-wall with the aid of antenna elements can-also be used in cascaded form in that the surface of the through-chambers is connected to coupling chambers which are designed as further through-chambers, each centrally have a coupling antenna element, and project into the plurality of antenna elements in the through-chambers. Such an arrangement is expediently designed with two metal plates which rest flat on one another, the number of antenna elements being a multiple of the number of coupling antenna elements. In this case, the coupling chambers are also pro~ided with a circular through-opening, preferably on their surface pointing towards the adjacent chamber, the size of which circular through-CA 022449~6 1998-07-30 opening relative to the diameter of a coupling antenna element allowing the energy transmission to be con-trolled. The length of the coupling antenna elements can also be used to influence the energy transmission, in a similar ~nne~ to that with the antenna elements.
The adjacent chamber, as a transmission chamber, preferably has a longitl~;n~l axis rl~nn;ng parallel to the transmission wall, and has at least one waveguide, directed parallel to the longit~ n~l axis, for injecting microwaves into the adjacent chamber.
The waveguide can in this case preferably be de~igned in the form of a rod and can project through an opening in a partition wall into a cavity resonator whose longit~l~;n~l axis is at right angles to the longit-l~;
axis of the transmission chamber.
The waveguide ends at a distance ~rom the elec-trically effective end wall opposite the cavity resonator. The distance between the electrically effec-tive end wall and the waveguide is preferably variable by means of a movable, conductive piston. This takes account of the situation in which the resonance conditions in the transmission chamber are very greatly changed by varying the length of the antenna elements, which can be compen-sated for by moving the conductive piston as the electrically effective end wall.
It is also possible to arrange a plurality of w_~eyuides parallel to one another in the transmission chamber and to allocate Cf _ ~tment8 to the waveguides by means of conductive int~rm~;ate walls. This on its -CA 022449~6 1998-07-30 own allows the microwave energy to be injected in a uniform ~-n~e~ into the transmission chamber. Symmetrical arrangements of antenna elements of the transmission wall are expediently allocated to each ~a~e~ide within the compartments. In this case, in each ca~e one piston, which acts as an end wall, is expediently arranged mo~ably within the indi~idual compartments.
In order to excite the plasma with radio-frequency energy (in the general MHz band below micl~. v-frequency), it is advantageous if the antenna elementsare angled, run with an angled end essentially parallel to the inner conductor of a coaxial conductor which is formed in the adjacent chamber, project with the other end through the through-wall into the treatment chamber, and are arranged there at a distance from a common opposing electrode, which is at the same potential as the outer conductor. In this case, the antenna elements which project through the through-wall may expediently ha~e end pieces which are formed parallel to the opposing electrode. In this case as well, the antenna elements expediently form a coaxial conductor section with through-chambers composed of conductive material, through which coaxial conductor section the radio-frequency energy is transmitted well. Selection of the distance and the length of the angled end of the antenna element with respect to the COA~; A 1 conductor allows the injection condition to be selected and the amount of excitation energy transmitted at the point of the respective antenna element to be adjusted.

, CA 02244956 1998-07-30 The treatment chamber i8 preferably designed as a vacuum chamber, the arrangement preferably being used as a plasma treatment arrangement. In this case, a treatment table may be designed at an adjustable height within the treatment chamber, in a m~nne~ known per se.
In particular for hard vacuums, it may be expedient for coil arrangements to be provided on the outside of the treatment area in order to form a magnetic field, in order to use the influence of the magnetic field to increase the probability of collisions between gas particles and thus to improve the capability to ignite the plasma. In this case, it may be expedient to arrange a plurality of p~rm~n~nt magnets underneath the treatment table.
For certain applications in the plasma, it may be expedient to arrange a negatively charged screen between the treatment table and the transmission wall as an electron trap, through which only ions pass for plasma treatment.
The invention will be explained in more detail in the following text with reference to exemplary embo~; ~nts which are illustrated in the drawing, in which:
Figure 1 shows a vertical section through a microwave device according to the invention.
Figure 2 3hows a perspective view of a metal plate which is provided with through-chambers and has antenna elements inserted centrally.
Figure 3 shows a schematic view of the underneath of the CA 022449~6 1998-07-30 metal plate according to Figure 2, without antenna elements.
Figure 4 shows a perspective, schematic illustration of the microwave device according to Figure 1.
Figure 5 shows a horizontal section through a trans-mission chamber having a plurality of wave-guides arranged parallel to one another.
Figure 6 shows a schematic illustration of a trans-mission wall having cascaded antenna elements and through-chambers.
Figure 6a shows a variant of the embodiment according to Figure 6.
Figure 7 shows an arrangement according to Figure 1 having an electrode trap in the treatment chamber and excitation coils for a magnetic field.
Figure 8 shows an arrangement according to Figure 1 having a coil arrangement ~or producing a magnetic field and having an arrangement of perm~nent magnets underneath the treatment table.
Figure 9 shows a variant of the design o~ the trans-mission wall relating to the embodiment accord-ing to Figures 1, 7 and 8.
~5 Figure 10 shows a further variant of the transmission wall.
Figure 11 shows yet another variant of the transmission wall.
Figure 12 shows a schematic illustration of a treatment -. , CA 022449~6 1998-07-30 g device according to the invention designed for radio-frequency excitation.

Figure 1 shows an arrangement in which microwaves are produced in a hollow waveguide 1 having a rectangular cross section. The microwaves are output through a side opening 2 in the hollow waveguide 1 with the aid of at least one waveguide 3 in the form of a rod, and are introduced into a transmission ~hr-~ cr 4. The trans-mission chamber 4 is essentially bounded by metallic walls 5. A treatment chamber 6 projects into a recess located on one longitn~in~l side of the rectangular transmission chamber 4 and, with the exception of the wall 7 pointing towards the adjacent transmission chamber 4, is bounded on all sides by metallic walls 8. The treatment chamber 6 is designed as a vacuum chamber. The transmission wall 7 comprises a plate 9 which i8 per~?~hle for microwaves, a large number of antenna elements 10 which extend at right angles to the pe~-~hle plate 9 into the transmission chr 'er 4, as well as a metallic plate 11 which extends over the entire longi-t~;n~ side of the transmission chamber 4. Through-chambers 12 are formed in the metallic plate 11, are open towards the pe~m~Ahle plate 9, and are thus bounded by it. At the sides, the square through-ch~hers are bounded by thin wall~ 13, designed in the form of grids, of the metallic plate 11. Located on the surface is a circular through-opening 14 of roughly the same thickness as the walls 13, the through-openings 14 having a diameter D

CA 022449~6 1998-07-30 which is between 2 and 5 times as great as the diameter d of the antenna elements 10, which are arranged centrally in the through-opening 14 and in the through-chamber 12.
The antenna elements 10 project to a certain extent over the metal plate ll into the transmission ch~her 4, in which case it is possible to influence the amount of injected microwave energy by means of the length of the antenna elements.
The antenna elements 10 are preferably kept available in different lengths and are used experiment-ally in different lengths in order to achie~e an optimized configuration. Changing to an antenna element 10 ha~ing a different length ; c~iAtely and dramatically changes the resonance condition in the transmission chamber 4. In order to allow adaptations to be carried out in each case here, the transmission ~h--' cr 4 is pro~ided on the side opposite the hollow waveguide 1 with a movable metallic piston 15, by means of which an optimum resonance condition can be set empirically once again in the transmission chamber 4.
Figure 2 shows the metallic plate 11 with its circular through-openings 14 on the surface. The antenna elements lO, which are in the form of rods, are inserted centrally into the circular through-openings 14.
The view of the underneath of the metallic plate 11 according to Figure 3 shows that the through-chamber~
12 ha~e a square cross section and ~YrAn~ in stepped form underneath the through-opening 14. The through-chA~hers CA 022449~6 1998-07-30 12 are bounded by the walls 13 designed in the form of grids.
Figure 4 shows the schematic arrangement of the hollow waveguide 1, transmission chamber 4 and treatment chamber 6, which are all respectively designed to be cuboid.
Figure 5 shows a modified exemplary ~hodiment, in which three waveguides 3 project into the hollow waveguide in arrangements that are parallel to one another and parallel to the transmission wall 7, these waveguides 3 ext~n~;ng over the length of the trans-mission ch~her 4. Figure 5 shows that each waveguide 3 is allocated on each of its two sides a row of circular through-openings 14 with antenna elements 10, the symmetrical arrangement on both sides of the waveguide 3 being a major feature. ~on~ctive int~ ?~; ate walls 16 are used to form c~rA~tments for each w_vey~ide 3, and these compartments preclude any mutual influence between the antenna elements 10 through a plurality of waveguides 3.
A movable piston 15 is provided as an electrically effective end wall for each compartment 17.
Figure 6 shows a cascaded design of the trans-mi sion wall 7'. A further metallic plate 18 is in this cane placed on the metallic plate 11 and is provided with similar through-chambers 19 and circular through-openings 20. A coupling antenna element 21 is in~erted centrally into the through-chamber 19 and the through-opening 20, projects out of the through-chamber 19 into the trans-r CA 02244956 1998-07-30 ~ 12 ~
~ mission chamber 4, and naturally ends at a distance from the surface of the metallic plate 11.
As can be seen, a plurality of antenna elements 10 project into the through-chamber 19, for example four 5 antenna elements 10 in a symmetrical arrangement with re~pect to the central coupling antenna element 21~ The advantage of this arrangement is that it results in the microwave energy being transmitted uni~ormly through the numerous antenna elements 10, but the adjustment tasks 10 need be carried out only with the coupling antenna elements 21 (in particular by means of their length), while the antenna elements 10 can be designed to have the same length, that i8 to say they no longer need be adjusted (Figure 6a). The adjustment of the considerably 15 smaller number of coupling antenna elements 21 is, however, sufficient to take account of ho oye.Leous transmissions from the transmission chamber 4~
Figure 7 shows the arrangement according to Figure 1, but with a coil arrangement 22 being provided 20 around the treatment chamber 6 in order to form a etic field in the treatment chamber 6. The magnetic field considerably increases the number of collisions between gas particles, 80 that plasma ignition can be achieved even in a hard vacuum.
Furthe~m~re, the treatment chamber 6 is provided with a grid 23~ in the form of a screen, between the transmission wall 7 and a treatment table 24~ The grid 23 has a negative voltage applied to it, 80 that it traps electrons and allows only ions to pass through. In this CA 022449~6 l99X-07-30 way, the arrangement is used as an ion source for treatment of products that are placed on the treatment table 24.
In the case of the embo~;m~7nt illustrated in 5 Figure 8, an arrangement comprising numerous pe~m~s-nent -~n~7ts 25, of alternately opposite polarity, is located underneath the treatment table. This achieves local compression of the plasma, which assists ignition of the plasma.
In the caE~e of the embodiment illustrated in Figure 9, the antenna elements 10 are designed with different lengths and all end at the plate 9, which is p~ ~shle for microwaves, of the transmission wall 7. The antenna elements project with different lengths out of 15 the through-openings 14. The injection of the mic v.-~,e energy, which is introduced into the chAmher 4, into the antenna elements 10 can be regulated by means of the projecting length of the antenna elements. Otherwise, the antenna elements 10 are located in through-ch~mhers 12, 20 which are bounded by the walls 13.
In the case of the embo~; nt illustrated in Figure 10, the antenna elements 10 project with different lengths out of the through-openings 14 in the direction of the chamber 4, but run between the through-openings 14 25 and the microwave-pe~m~Ahle plate 9 of the transmission wall 7 in a common int~me~l;ate space 26, which is produced by the fact that the inte ~;Ate walls 13 according to the exemplary embo~;m~nts illustrated in Figures 1, 7, 8 and 9 are omitted.

CA 022449~6 1998-07-30 Figure 11 shows an exemplary embo~; -nt in which the antenna elements 10 have through-openings 14 and through-chambers 12 passing through them, a c~- -interm~;ate space 27 being formed, however, between the5 through-chambers 12 and the plate 9, which is perme~le to microwaves, of the transmission wall 7, into which int~ ?~; ate space 27 the antenna elements 10 likewise project with different lengths according to this exemplary ~bodiment. This makes it possible to control not only the microwave energy injected into the antenna elements from the chamber 4, but also the microwave energy emitted into the treatment chamber 6.
Figure 12 shows a schematic illustration ~or excitation of the plasma in the treatment chamber 6 by means of elect~ -gn~tic radio-~requency energy whose fre~uency is thus below microwave fre~uency. For this purpose, the adjacent chamber 4 is designed as a type of co~Y;~l conductor having an inner con~ctor 28 which extends over the length of the chamber 4 and having a rectangular casing 29 which surrounds the inner conductor 28 at a distance from it and is composed of electrically conductive material.
Antenna elements 10' likewise project at right angles to a transmission wall 7'' between the adjacent chamber 4 and the treatment chamber 6. Within the adjacent chamber 4, the antenna elements 10' have angled end~ 30, which run essentially parallel to the inner conductor 28. The antenna elements 10' have through-chambers 12' passing through them, and these through-CA 022449~6 l998-07-30 chambers 12' are bounded by electrically conductive walls 13'.
Located within the through-ch~nhers 12' are sealing pieces 31 which are composed of dielectric material and have no adverse effect on radio-frequency conduction. The sealing pieces 31 run essentially aligned with walls 32 which bound the treatment chAmher 6 and are composed of electrically conductive material. The antenna elements 10' have sealing piece~ 31 passing through them, 10 and their ends 33 project into the treatment chamber 6.
End pieces 34 are integrally formed at the ends 33 and run essentially parallel to a common opposing electrode 35, which is at ground potential.
In order to reduce the mutual influence between the antenna elements 10', compartment walls 36 are located both within the chamber 4 and within the treat-ment chamber 6 and shield the ends 30 and 34 of the antenna elements 10' from one another.
A plasma is produced by means of radio-frequency 20 excitation in the treatment chamber 6, which i8 sealed in a gas-tight T~-nne~- by the walls 32 and the sealing pieces 31, in which case it is possible to make the plasma uniform and to set a desired energy pro~ile by virtue of the nature of the injection of radio-frequency energy into the antenna elements 10' via the bent ends 30.
.

Claims (31)

Patent Claims
1. Electromagnetic radio-frequency or microwave device having a treatment chamber (6) with a transmission wall (7, 7', 7''), which is permeable for the electro-magnetic waves, to an adjacent chamber (4) and with a design of the transmission wall (7, 7', 7'') for influencing the intensity distribution of the transmission of the electromagnetic waves into the treatment chamber (6), characterized in that the transmission wall (7, 7', 7'') has a large number of antenna elements (10, 10') which are directed at an angle to the wall plane of the adjacent chamber (4), are in the form of rods, and project centrally through through-openings (14, 14') which are bounded by electrically conductive material.
2. Microwave device according to claim 1, characterized in that the transmission wall (7, 7') has a plate (9) which is permeable for microwaves and a plate (11) which is composed of electrically conductive material and in which the through-openings (14) are located.
3. Microwave device according to claim 2, characterized in that a common intermediate area (26) is formed between the through-openings (14) and the plate (9) which is permeable for microwaves.
4. Microwave device according to claim 2, characterized in that through-chambers (12) are formed between through-openings (14) and the plate (9) which is permeable for microwaves.
5. Microwave device according to claim 4, characterized in that a common intermediate area (27) is formed between the through-chambers (12) and the plate (9) which is permeable for microwaves.
6. Microwave device according to one of claims 1 to 5, characterized in that the antenna elements (10) are at right angles to the permeable plate (9).
7. Microwave device according to one of claims 2 to 6, characterized in that, on that surface of the conductive material (11) pointing towards the adjacent chamber (4), the through-chambers (12) have a circular through-opening (14) with a diameter (D) which is greater than the diameter (d) of the antenna element (10).
8. Microwave device according to claim 7, characterized in that the diameter (D) of the through-opening (14) is approximately 2 to 5 times, preferably about 3 times, greater than the diameter (d) of the antenna element (10).
9. Microwave device according to claim 7 or 8, characterized in that the through-chambers (12) expand in stepped form towards the permeable plate (9) following the through-opening (14).
10. Microwave device according to one of claims 7 to 9, characterized in that the through-chamber (12) has a rectangular cross section, preferably a square cross section, following the through-opening (14).
11. Microwave device according to one of claims 1 to 10, characterized in that the through-chambers (12) are formed in a common electrically conductive plate (11).
12. Microwave device according to one of claims 1 to 11, characterized in that the antenna elements (10) project from the surface of the through-chambers (12).
13. Microwave device according to one of claims 1 to 12, characterized in that the length of various antenna elements (10) is designed to be different over the surface of the transmission wall (7).
14. Microwave device according to one of claims 1 to 13, characterized in that the through-openings (14) are connected to coupling chambers (19) which are designed as further through-chambers, each centrally have a coupling antenna element (21), and project into the plurality of antenna elements (10).
15. Microwave device according to claim 11, characterized in that, on their surface pointing towards the adjacent chamber (4), the coupling chambers (19) also have a circular through-opening (20).
16. Microwave device according to claim 15, characterized in that the coupling antenna elements (21) are designed with different lengths and project out of their through-openings (20).
17. Microwave device according to one of claims 1 to 16, characterized in that the adjacent chamber (4), as a transmission chamber, has a longitudinal axis running parallel to the transmission wall (7), and has at least one waveguide (3), directed parallel to the longitudinal axis, for injecting microwaves into the transmission chamber (4).
18. Microwave device according to claim 17, characterized in that the waveguide (3) is designed in the form of a rod and projects through an opening (2) in a partition wall into a hollow waveguide (1) whose longitudinal axis is at right angles to the longitudinal axis of the transmission chamber (4).
19. Microwave device according to claim 17 or 18, characterized in that the waveguide (3) ends at a distance from the end wall opposite the hollow waveguide (1) and in that the distance to the electrically effective end wall is variable by means of a movable, conductive piston (15).
20. Microwave device according to one of claims 17 to 19, characterized in that a plurality of waveguides (3) project parallel to one another into the transmission chamber (4), and in that compartments (17) are allocated to the waveguides (3) by means of conductive intermediate walls (16).
21. Microwave device according to claim 20, characterized in that, within the compartments (17), symmetrical arrangements of antenna elements (10) are allocated to each waveguide (3).
22. Microwave device according to claim 20 or 21, characterized in that a piston (15) which acts as an end wall is in each case arranged movably within the compartments (17).
23. Radio-frequency device according to claim 1, characterized in that the antenna elements (10') are angled, run with an angled end (30) essentially parallel to the inner conductor (28) of a coaxial conductor (28, 29) which is formed in the adjacent chamber (4), project with the other end (33) through the transmission wall (7'') into the treatment chamber (6), and are arranged there at a distance from a common opposing electrode (35), which is at the same potential as the outer conductor (29).
24. Radio-frequency device according to claim 23, characterized in that the antenna elements (10') which project through the transmission wall (7'') have end pieces (34) which are formed parallel to the opposing electrode (35).
25. Radio-frequency device according to claim 23 or 24, characterized in that the antenna elements (10') have passing through them through-chambers (12') composed of conductive material (13').
26. Radio-frequency or microwave device according to one of claims 1 to 25, characterized in that the treatment chamber (6) is designed as a vacuum chamber.
27. Radio-frequency or microwave device according to one of claims 1 to 26, characterized in that a treatment table (24) is designed at an adjustable height within the treatment chamber (6).
28. Radio-frequency or microwave device according to one of claims 1 to 27, characterized in that coil arrangements (22) are provided on the outside of the treatment chamber (6) in order to form a magnetic field.
29. Radio-frequency or microwave device according to one of claims 1 to 28, characterized in that an arrangement of a plurality of permanent magnets (25) is arranged in the treatment chamber (6).
30. Radio-frequency or microwave device according to one of claims 1 to 29, characterized by a screen (23) which is arranged between the treatment table (24) and the transmission wall (7, 7') as an electron trap.
31. Use of the radio-frequency or microwave device according to one of claims 1 to 30 for forming a plasma in the treatment chamber (6).
CA002244956A 1996-02-02 1997-01-31 Electromagnetic high-frequency or microwave apparatus Abandoned CA2244956A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19603685.2 1996-02-02
DE19603685A DE19603685C1 (en) 1996-02-02 1996-02-02 Microwave oven

Publications (1)

Publication Number Publication Date
CA2244956A1 true CA2244956A1 (en) 1997-08-07

Family

ID=7784299

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002244956A Abandoned CA2244956A1 (en) 1996-02-02 1997-01-31 Electromagnetic high-frequency or microwave apparatus

Country Status (7)

Country Link
US (1) US6114811A (en)
EP (1) EP0878020B1 (en)
JP (1) JP2000504146A (en)
KR (1) KR19990082209A (en)
CA (1) CA2244956A1 (en)
DE (2) DE19603685C1 (en)
WO (1) WO1997028555A1 (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6502328B1 (en) * 2000-05-17 2003-01-07 Arrow Pneumatics, Inc. Seal for holding a microwave antenna at a pressurized tank of a gas drying system and method
FR2840451B1 (en) * 2002-06-04 2004-08-13 Centre Nat Rech Scient DEVICE FOR PRODUCING A PLASMA TABLECLOTH
TW200415726A (en) * 2002-12-05 2004-08-16 Adv Lcd Tech Dev Ct Co Ltd Plasma processing apparatus and plasma processing method
DE10341239B4 (en) * 2003-09-08 2006-05-24 Roth & Rau Ag ECR plasma source with linear plasma outlet
JP5213150B2 (en) * 2005-08-12 2013-06-19 国立大学法人東北大学 Plasma processing apparatus and product manufacturing method using plasma processing apparatus
WO2008127158A1 (en) * 2007-04-11 2008-10-23 Telefonaktiebolaget Lm Ericsson (Publ) Arrangement and method for simulating a radio access network
DE102007035359B4 (en) * 2007-07-27 2012-09-20 Rational Ag Coupling device for microwave transmission in a food processing device
JP5011139B2 (en) * 2008-01-28 2012-08-29 株式会社アルバック Vacuum equipment
US8800483B2 (en) 2009-05-08 2014-08-12 Peter F. Vandermeulen Methods and systems for plasma deposition and treatment
US8808496B2 (en) * 2011-09-30 2014-08-19 Tokyo Electron Limited Plasma tuning rods in microwave processing systems
US9728416B2 (en) 2011-09-30 2017-08-08 Tokyo Electron Limited Plasma tuning rods in microwave resonator plasma sources
US9111727B2 (en) * 2011-09-30 2015-08-18 Tokyo Electron Limited Plasma tuning rods in microwave resonator plasma sources
US9396955B2 (en) * 2011-09-30 2016-07-19 Tokyo Electron Limited Plasma tuning rods in microwave resonator processing systems
US20130084706A1 (en) * 2011-09-30 2013-04-04 Tokyo Electron Limited Plasma-Tuning Rods in Surface Wave Antenna (SWA) Sources
JP6225243B2 (en) * 2013-03-15 2017-11-01 東京エレクトロン株式会社 Microwave processing system and substrate processing method
US20140262040A1 (en) * 2013-03-15 2014-09-18 Tokyo Electron Limited Method and system using plasma tuning rods for plasma processing
TWI553700B (en) * 2013-11-06 2016-10-11 東京威力科創股份有限公司 Multi-cell resonator microwave surface-wave plasma apparatus
US9531167B2 (en) * 2014-06-02 2016-12-27 Nxp Usa, Inc. Device and method for connecting an RF generator to a coaxial conductor
US9518555B2 (en) 2014-12-04 2016-12-13 Freescale Semiconductor, Inc. Radiation devices
US10490386B2 (en) 2017-06-27 2019-11-26 Peter F. Vandermeulen Methods and systems for plasma deposition and treatment
US10861667B2 (en) 2017-06-27 2020-12-08 Peter F. Vandermeulen Methods and systems for plasma deposition and treatment

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3923390A1 (en) * 1988-07-14 1990-01-25 Canon Kk DEVICE FOR FORMING A LARGE Vaporized VAPOR FILM USING AT LEAST TWO SEPARATELY DETERMINED ACTIVATED GASES
JPH0810634B2 (en) * 1990-06-01 1996-01-31 インターナショナル・ビジネス・マシーンズ・コーポレイション Microwave-fed material / plasma processing system
DE9102438U1 (en) * 1991-03-01 1992-06-25 Roehm Gmbh, 6100 Darmstadt, De
JPH05144785A (en) * 1991-11-22 1993-06-11 Mitsubishi Electric Corp Method and device for plasma processing
US5700326A (en) * 1992-02-27 1997-12-23 Canon Kabushiki Kaisha Microwave plasma processing apparatus
JPH06104188A (en) * 1992-09-22 1994-04-15 Hitachi Ltd Microwave plasma processing equipment
FR2711035B1 (en) * 1993-10-04 1995-12-29 Plasmion Device and method for forming a plasma by applying microwaves.
DE9405808U1 (en) * 1994-04-11 1994-06-09 Suesmuth Norbert Dipl Ing Plasma processing device

Also Published As

Publication number Publication date
EP0878020B1 (en) 2001-10-31
DE19603685C1 (en) 1997-08-21
DE59705185D1 (en) 2001-12-06
US6114811A (en) 2000-09-05
JP2000504146A (en) 2000-04-04
KR19990082209A (en) 1999-11-25
EP0878020A1 (en) 1998-11-18
WO1997028555A1 (en) 1997-08-07

Similar Documents

Publication Publication Date Title
CA2244956A1 (en) Electromagnetic high-frequency or microwave apparatus
EP0950341B1 (en) Baking oven for the high-temperature treatment of materials with a low dielectric loss factor
US5081398A (en) Resonant radio frequency wave coupler apparatus using higher modes
JPH04503589A (en) Improved resonant radio frequency wave coupler device
US4179673A (en) Interdigital filter
KR950005121A (en) RF Induced Plasma Sources for Plasma Processing
US5666023A (en) Device for producing a plasma, enabling microwave propagation and absorption zones to be dissociated having at least two parallel applicators defining a propogation zone and an exciter placed relative to the applicator
US4780642A (en) Electron cyclotron resonance ion source with coaxial injection of electromagnetic waves
US4746839A (en) Side-coupled standing-wave linear accelerator
CN1008503B (en) Electro magnetic energy seal
JPH0563413A (en) Device for generating field of regular microwave
KR102107510B1 (en) Device for generating plasma having a high range along an axis by electron cyclotron resonance (ecr) from a gaseous medium
KR100242332B1 (en) Microwave plasma generation device
GB1592036A (en) Standing wave linear accelerator and slotted input coupler
US4705988A (en) Device for guiding an electron beam
US5350974A (en) Coaxial electromagnetic wave injection and electron cyclotron resonance ion source
US4797597A (en) Microwave ion source
US5754008A (en) Device for creating a beam of adjustable-energy ions particularly for sequential vacuum treatment of surfaces with large dimensions
Lagarde et al. Influence of the applied field frequency on the characteristics of Ar and diffusion plasmas sustained at electron cyclotron resonance above multipolar magnetic field structures
DE4431785A1 (en) Plasma device
RU2120681C1 (en) Electron-cyclone resonance tuned device for microwave vacuum-plasma treatment of condensed media
US3509413A (en) Klystron with added inductance in resonant cavity
US4277723A (en) Symmetrical magnetron with output means on center axis
US2922131A (en) Folded cylinder gaseous discharge device
US3508268A (en) Waveguide slot radiator with electronic phase and amplitude control

Legal Events

Date Code Title Description
FZDE Discontinued