CA2283563C - Micromachined opto-flow gas sensor - Google Patents
Micromachined opto-flow gas sensor Download PDFInfo
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- CA2283563C CA2283563C CA002283563A CA2283563A CA2283563C CA 2283563 C CA2283563 C CA 2283563C CA 002283563 A CA002283563 A CA 002283563A CA 2283563 A CA2283563 A CA 2283563A CA 2283563 C CA2283563 C CA 2283563C
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/37—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using pneumatic detection
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/1702—Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N2021/0346—Capillary cells; Microcells
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/1702—Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids
- G01N2021/1704—Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids in gases
Abstract
A micromachined integrated opto-fluidic or opto-acoustic sensor (10) having a rapidly intensity-varying or pulsing light source (14), an interference filter (16), a gas cavity (20), which may or may not be an optical and/or acoustic resonator tuned to a particular wavelength of light, or sound frequency, into which the detected gas can diffuse via a filter (22), and a fluidic or pressure sensor (19) to detect the heating and cooling, and the resulting expansion and contraction of the gas due to the absorption of light at the particular wavelength by the specific gas being detected. The presence of other gases is inferred from the detected gas.
Description
MICROMACHINED OPTO-FLOW GAS SENSOR
BACKGROUND
The invention pertains to gas sensors and particularly to toxic gas sensors. More particularly, the invention pertains to micromachined integrated circuit gas and liquid sensors.
Related art devices for sensing toxic gases such as C0, NO, NO2 and VOCs generated by combustion processes have been based on sensors indicating changes in metal oxide film conductivity, chemiluminescence, fluorescence, various forms of IR absorption, and so forth. These sensors have been either too costly, unstable, or insensitive to meet the requirements of a low-cost, reliable toxic gas sensor.
Their sensing such toxic gases in concentrations that are commensurate with the levels at which they can be harmful to health and life is difficult, especially if it is to be done via low-cost, affordable and reliable sensors. Often the older gas engines or heaters, operated by budget-minded users, are most likely to be a source of toxic gases which endanger these users and others. These users are the ones most unlikely to buy toxic gas indicators, unless someone manages to bring affordable and appropriate technology to them.
SUNIlKARY OF THE INVENTION
According to one aspect of the present invention, there is provided a micromachined integrated circuit gas/liquid sensor comprising: a first layer; a set of microemitters formed on a first surface of said first layer providing an electromagnetic pulsating radiation; a second layer; a narrow band pass filter for a first wavelength formed on a first surface of said second layer; a third -1a-layer; a fourth layer having a first surface adjacent to a first surface of said third layer, wherein said third and fourth layers have central portions removed to form a cavity; a detector designed as a flow sensor; a porous filter layer formed adjacent to a second surface of said fourth layer; and wherein: the first surface of said first layer is adjacent to a second surface of said second layer;
the first surface of said second layer is adjacent to a second surface of said third layer, and the detector outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
According to another aspect of the present invention, there is provided a micromachined integrated circuit gas/liquid sensor comprising: a first layer; a set of microemitters formed on a first surface of said first layer providing an electromagnetic pulsating radiation; a second layer; a narrow band pass filter for a first wavelength formed on a first surface of said second layer; a third layer; a fourth layer having a first surface adjacent to a first surface of said third layer, wherein said third and fourth layers have central portions removed to form a cavity; a detector designed as a pressure sensor; a porous filter layer formed adjacent to a second surface of said fourth layer; and wherein: the first surface of said first layer is adjacent to a second surface of said second layer;
the first surface of said second layer is adjacent to a second surface of said third layer, and the detector outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
According to still another aspect of the present invention, there is provided a micromachined gas/liquid sensor comprising: a first layer, wherein said first layer is a wafer; a light source formed on a first surface of said -lb-first layer providing an electromagnetic, pulsating radiation; a second layer formed on said first surface of said first layer except in the region of the light source;
an optical filter formed on a first surface of said second layer, whereby a second surface of said second layer is adjacent to first surface of said first layer; a cavity adjacent to said optical filter; a pressure sensor or flow sensor formed in the region of said cavity; a porous filter adjacent to said cavity, wherein said cavity is positioned between said optical filter and said porous filter; wherein the pressure sensor outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
According to yet another aspect of the present invention, there is provided a micromachined gas/liquid sensor comprising: a first layer, wherein said first layer is a wafer; a light source formed on a first surface of said first layer providing an electromagnetic, pulsating radiation; a second layer formed on said first surface of said first layer except in the region of the light source;
an optical filter formed on a first surface of said second layer, whereby a second surface of said second layer is adjacent to first surface of said first layer; a cavity adjacent to said optical filter; a pressure sensor or flow sensor formed in the region of said cavity; a porous filter adjacent to said cavity, wherein said cavity is positioned between said optical filter and said porous filter; wherein the flow sensor outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
The present invention provides a new, useful, low-cost, reliable and "conservative" indication of the presence of a toxic gas or objectionable constituents of combustion -lc-products. It is not necessary to directly measure the toxic or objectionable gases, if one can identify a phenomenon that would indicate or infer their presence with a meaningful probability level.
Carbon dioxide (C02) indicates the presence of objectionable concentrations of combustion products. C02 is generated by known combustion processes, in concentrations that are 10 to 100 times higher than those of CO, NOX or volatile organic compounds (VOCs). Yet one can measure COz at concentration levels that are 3 to 30 times lower than the above-noted gases, especially via non-dispersive infrared (NDIR) sensing.
-~-The present sensor provides more reliable, affordable and sensitive detection than direct NDIR sensing of toxic gases. It also provides additional detection/alarm protection against high CO, concentrations.
The sensor takes advantage of the indirect indication of toxic combustion products, such as CO, NO,, and VOCs via CO, detection, and a low-cost, integrated optical sensor design made available at a reasonable price to meet the toxic gas sensing needs of users of unvented space heaters (or kitchen stoves) and the needs of automobile drivers that wish to detect exhaust fumes from cars or near them.
Combustion products, especially those from gasoline or diesel fuel are known to consist of 5-15% C02, 10-20% H,O, 0-10% 02, 70-80% N,, 0.001 to 0.4% NOõ 0.001 to 0.2% CO (CO in worn or maladjusted automotive engines may be up to 2%), and 0.001 to 0.3% hydrocarbons (HC), i.e., CO, concentrations always predominate.
Still, dilution of exhaust gas of the car in front is expected to be 10 to 1000-fold before reaching the cabin air intake of the following car, so that the CO, concentration is likely to be 0.005 to 1.5%, which is measurable, while the toxic gas concentration is only in the 0.0001 to 0.04% range. The latter concentrations are much more difficult to measure, and especially so with low-cost sensors, which would often not begin to sense those gases in spite of being present in concentrations that cause discomfort or adverse health effects.
The integrated design of the present sensor enhances its ruggedness, portability, manufacturability and affordability. The sensor cell, detector and optical filter are integrated into one micromachined unit which is of lower cost, i.e., more affordable and more widely applicable than related-art sensors. The present sensor is more compact and therefore more rugged, more portable and of faster response. The faster response is due to the smaller cavity and ability to operate at higher source frequencies.
The flow detector features a much smaller flow channel, 10-25 micrometers (microns) versus 150 to 500 microns for related art devices. The total integrated sensor system is 10 to 100 times smaller than the related art sensors, which makes the present system more affordable, portable, faster response and versatile. The present detectors are also 10 to 100 times less costly than the related-art detectors.
In summary, the invention is a low-cost opto-fluidic or opto-acoustic sensing system, which is a micromachined integrated sensor, which has a rapidly pulsing, thin-film light or heat source, an appropriate multi-layer interference filter (IF), anti-reflective (AR) coatings, and a specially etched silicon wafer, via a sacrificial layer, to form a sample gas cavity, which may be an optically or acoustically tuned resonator to the absorption wavelength of the gas to be detected, into which the sample gas can diffuse in and out via a suitable fluid filter such as a stainless steel frit which has a porosity that is optimized by a certain compression of the frit, and a flow sensor (thermal microanemometer) or microphone (piezoresistive sensing film) embedded in a wall of the cavity.
BRIEF DESCRIPTION OF THE DRAWING
Figure 1 reveals an integrated opto-fluidic gas sensor.
Figure 2 shows another version of the opto-fluidic gas sensor.
Figure 3 shows a microsensor hybrid design in which the flow sensor and the narrow band pass filter reside on one micromachined block.
Figure 4 reveals an integrated opto-acoustic gas sensor.
Figure 5 shows another integrated gas sensor DESCRIPTION OF THE EMBODIMENTS
Figure 1 is a diagram that shows a basic structure of inferential gas sensor 10.
Silicon wafer 11 has an etched space 12 on one side. On that side having depression 12 is attached a silicon wafer 13 having a set of microemitters 14 on the side facing wafer 11. Wafer 11 may be instead a glass plate which could provide for better optical performance in terms of filtering some infrared (IR) wavelengths. Formed on the surface or side of wafer 11 adjacent to microemitters 14 is an antireflective (AR) coating 15. On the other side of wafer 11 is a narrow band pass interference filter (IF) 16 designed to pass only infrared light having a wavelength that is the same as the absorption wavelength (4.3 microns) of CO2 or of the chosen gas to be detected (3.4 microns for VOC, 4.6 microns for C0, and so forth.). The AR and IF coatings or films may be interchanged in location with each other. Silicon wafer 17 is bonded or attached to filter 16 and a flow sensor 19 (thermal micro anemometer) or microphone (piezoresistive sensing film) is formed on silicon wafer 17. Silicon wafer 18 is bonded to wafer 17. Silicon wafers 17 and 18 are etched to form a cavity 20. Flow sensor 19 is situated in a pathway 21 between cavity 20 and the ambient volume or I I
space external to sensor 10. Gas or air can flow in and out of cavity 20 via path or channel 21. A porous gas filter 22, which permits diffusion of gas from the ambient space into cavity 20, is bonded to wafer 18 thereby completing the forming of cavity 20.
Filter rriay be a wafer having a large number of small etched holes or a polymer, ceramic or stainless steel frit, as examples. Preferred is a stainless steel frit compressed to optimal porosity. Microemitters 14 and flow sensor 19 are connected through the wafer conductors, contacts or vias 23 to contact pads 24, are only for contacts to external power and signal output. Gaskets 104 may be formed on contacts 24, for the purposes of electrical communication with another wafer formed over wafer 13, upon which electronics may be situated. Such gaskets may have the properties of electrical conduction in essentially one axis such as up and down and not sideways.
Formed on wafer 13 may be an integrated circuit (IC) or an application specific integrated circuit (ASIC) 25 for providing electronics for processing signals from flow sensor 19.
Microemitter 14 is a 32 x 32 array of microemitters that function as a light source or heater for sensor 10. The array 14 surface is about 12 times, its total emission is about 0.5 times but its 4.3 micron emission is 2.8 times that of a mini-tungsten light bulb. Cavity 20 is about 1 x 1 x 1 or 2x2x 1 millimeters (mm). Cavity 20 cannot be too small because thermal quenching would occur, thus reducing the sensitivity of gas sensor 10. Flow sensor channel 21 is about 10-25 microns wide.
Figure 2 is a cross-section diagram of opto-fluidic gas sensor 45. Silicon wafer 46 is about 5 x 5 mm square and about 500 microns thick. Wafer 46, like wafer 13 of figure 1, has formed on it a heater or light source 47 of IR radiation. Source 47 is fabricated from a high refractory material such as a metal oxide or ceramic-like material. Grooves or pits 48 are etched in wafer 46 provide heat dissipation for source 47. Leads 60, about 25 microns thick, are attached to contacts 49 for providing an AC
signal at a frequency from 10 to 100 hertz to activate source 47 so as to emanate radiation or illumination 51. Spacers 50 are formed on the periphery of chip or wafer 46. A silicon wafer 52 about 500 microns thick is formed. Wafer 52 may instead be a glass plate. An AR film coating 53 is fonmed on a first side of wafer 52 and a narrow band pass IF multiple stack layer 54 for passing 4.3 microns of light is formed on a second side of wafer 52. AR film layer 53 is about 2 to 6 films of quarter wavelength thicknesses of alternating materials having different indices of refraction.
IF layer 54 is a stack of half wavelength films of alternating materials having different indices of refraction. Wafer 52 is brought into proximity with wafer 46 upon contact of spacers 50 on wafer 46 at a peripheral surface of wafer 52 to form a thermally isolating space 55.
The first or second side of wafer 52 may be closest to wafer 46; however, figure 2 shows the first side of wafer 52 closest to wafer 46. A 500 micron silicon detector wafer 56 is formed on wafer 52. Wafer 56 is etched to create a cavity 57 in the middle with portions of wafer 56 being proximate to wafer 52 at the periphery of wafer 52. At one side on the periphery of wafer 56 is formed a flow sensor 58 which is electrically connected externally with contacts 59 on wafer 56 to leads 60. Wafer 56 has a via 61 etched near flow sensor 58 to facilitate the flow of gas or air 62 by flow sensor 58. A
solder ring 63 is formed on the outer periphery of wafer 56. A top cap wafer 64 is formed on solder ring 62 proximate to wafer 56. The central portion of wafer 64 is etched to form cavity 57 in conjunction with wafer 56. There is about an 18 micron via or flow channel 65 that is formed between wafers 56 and 64 so that air or gas 62 can flow back and forth between cavity 57, past flow sensor 58, and through via 61 to an environment external of gas sensor 45. Formed on wafer 64 is a porous filter layer 66 which forms a wall of cavity 57. Filter 66 allows ambient gas 67 of the environment external to gas sensor 45 to infiltrate or diffuse in and out of cavity 57 to equalize the concentration of the ingredients of the gases and air. Layer 66 may be a wafer with pores etched in it but here it is a stainless steel frit which is porous. The stainless steel frit is compressed to attain the correct porosity for gas sensor 45. The frit may have 2 micron pores covering about 40-50 percent of the frit area, and be about 50 microns thick.
The function of sensor 45 is to detect the magnitude of CO2 in the ambient atmosphere. Light source 47 has an electrical AC signal at a frequency up to about 100 hertz applied to it. Light source 47 emanates radiation 51 that is composed mainly of IR
light. Radiation 51 has a varying or pulsing magnitude or intensity at the frequency of the electrical AC signal applied to source 47. Fluctuating or pulsing light 51 passes = through cavity 55 and AR layer 53 and into wafer 52. From wafer 52, light 51 passes through narrow band pass filter 54 which filters out effectively all of the wavelengths of light 51 except that of 4.3 microns which is the absorption wavelength of CO1The 4.3 micron light 51 enters cavity 57. If CO, gas 67 infiltrates through filter 66 into cavity I I
51, COz gas 67 heats up during the period it absorbs the light and cools down when light 51 is not present during the minimum magnitude of the period of the fluctuating or pulsing of light 51. During absorption of light 51 by gas 67, gas 67 heats up and expands in volume thereby forcing a flow 62 out of cavity 57 through channe165, by flow sensor 58 and out of sensor 45 through via 61. If cavity 51 is a resonator optically or acoustically tuned to the absorption wavelength, the effects of the light or sound upon the absorbing gas is greatly increased resulting in much improved detection of very small amounts of gas 67. Acoustic resonator techniques may also be used. In the periodic absence of light 51, gas 67 stops absorbing light and cools down.
Then gas 67 1o contracts in volume thereby causing a flow 62 into sensor 45 through via 61, by flow sensor 58 and through channel 65 into cavity 57. Thus, there is a fluctuation of gas 67 and respective flow 62 over flow sensor 58 that corresponds to the fluctuation of light 51. The porosity of filter 66 is small enough so as not to prevent pressure pulsations or flow 62 from happening through or by flow sensor 58. Flow sensor 58 outputs a signal that is indicative of and proportional to the amount, magnitude or velocity of flow 62 going through or by sensor 58. Sensor 58 measures a flow 62 rate in cubic centimeters per second. The amount, magnitude or velocity of flow 62 is proportional to the amount of CO2 gas 67 present in cavity 57 and immediately external to gas sensor 45.
The presence of any other gas in absence of CO, does not cause any pressure pulsations or flow 62 or any fluctuation of flow 62 because there is no absorption of the 4.3 micron light 51 when it enters cavity 57. Thus, the signal from flow sensor 58 is indicative of the amount of CO2 gas 67 present around gas sensor 45. A processor 68, which is connected to flow sensor 58, inferentially determines from the amount of COZ
gas 67, the presence and amounts of the various toxic gases that are in the ambient environment immediately around and about micromachined inferential toxic gas indicator 45.
If light source 47 were to be an incandescent mini-tungsten filament lamp, like source 74 in figure 3, the effective rate of the AC excitation signal would be about 10 hertz. An increased frequency would result in less effectiveness on the expansion and absorption of the gas. A DC signal result in no detection of the light absorbing gas 67.
The present integrated circuit light source 47 can effectively be cycled or pulsed up to 100 hertz which results in greater sensitivity of sensor 45. The sensitivity increase is equal to the square root of the ratio of the effective frequencies of the two light sources which is about 3.16, that is, the square root of 100/10.
Gas sensor 45 may be designed to directly detect and indicate the presence of other gases or liquids besides CO2. Narrow band pass filter 54 would be changed to a filter that would pass a different wavelength of light 51 which would be equivalent to the absorption wavelength of the other kind of gas to be detected and measured. For instance, filter would be designed to pass 4.6 micron wavelength of light if CO were to be detected by sensor 45 or to a wavelength from 3.2 to 3.4 microns if a gas or liquid having hydrocarbon (CH) bonds were to be detected by sensor 45. Another change or adjustment that would better facilitate detection of a specific gas or liquid would be that of diffusion filter 66. For example, adjustment of the porosity of stainless steel frit or filter 66 may achieve by the amount of compression that is applied to frit 66.
Compressing frit 66 causes it to be less porous and increases the signal-to-noise ratio of the output of flow sensor 58. This ratio increases because the reduced porosity or freedom of flow through filter 66 results in a crisper flow 62 over flow sensor 58 when gas 67 is expanding and contracting in response to the absorption of fluctuating light 51.
However, the response time to the measurement of the immediate presence of gas 67, external to sensor 45, is slower since the infiltration of gas 67 into cavity 57 is much slower because of the more restrictive or less porous filter 66 to ambient gas.
Figure 3 shows an overview of a low-cost opto-flow sensor 70, which is a CO, microsensor hybrid design, in which a sensor cell 71, flow detector 72 and IR
filter 73 on glass 99 reside on one micromachined silicon block 100 in a plastic housing 79.
Glass plate 99 could be replaced with a silicon wafer. Light bulb 74 is integrated into this design. Chip contact pads 75 are pressed towards lead frame wires 76 by felt-metal spring-washer 77. This package features direct contact between the chip and lead frame 76 embedded in plastic molding 79, thus saving the cost of wire bonding or the unreliability/noise of the zebra strip contacts, depending on the reference, the integration of flow sensor 72 into sensor cavity 71, chip 78 held in place, not with an unstable material such as an elastomer, but with a more stable one such as stainless steel 80, selected light source 74 is operated at an AC voltage level that causes the peak output to be no less than the peak level after suitable (90%) derating; this is to achieve a combination of maximum life and maximum output at the highest practical frequency I I
near 100 Hz. Sensor 70 is plugged to a tube 100 with housing 102, which also functions as a stop against felt-metal spring-washer 77, from which the gas or air to be monitored comes. Plastic or steel snaps 103 secure sensor 70 to tube 101.
Figure 4 is another structure of gas sensor 26. Silicon substrate 27 is formed to be as thin as possible to maximize optimal efficiency. A multilayer narrow band pass IF
28 for a 4.3 micron wavelength is formed on a first side of Si substrate 27.
Spacers 29 are formed on the periphery of IF layer 28. Layer 28 may be a wafer of silicon or other appropriate material, or a glass plate. A one micron silicon nitride support 30 is formed.
A 0.1 micron heater serpentine or IR light source 31 is formed or embedded in layer 30.
Spacers 29 are formed on the periphery of the heater side of support layer 30.
Supports 29 of layers 28 and 30 are brought together to form a 2 micron evacuated or air-filled cavity 82 for thermal isolation between layers 30 and 28. A 0.1 to 0.3 micron Au reflective coating layer 32 is formed on the other side of layer 30, not supporting heater or IR light source 31. A 0.1 micron silicon layer 33 is formed on layer 32 to protect the Au film. An AR coating layer 34 for a 4.3 micron wavelength is formed on the second side of substrate 27, opposite if the first side having IF layer 28 formed on it. A porous support 35 is formed on the periphery of layer 34. A 1 to 2 micron polysilicon layer 36 is formed. A 0.1 to 0.3 micron piezoresistive sensor film layer 37 is formed on layer 36, and a 0.1 to 0.2 micron Au reflective coating layer 38 is formed on layer 37.
Porous support 35 is formed also on the periphery of layer 38. Support 35 with layers 34 and 38 form a gas cavity 44 having about 2 microns between layers 34 and 38. An electrical alternating current (AC) input terminal 39 is connected to heater or light source 31. A
plus 5 volt termina140 is connected to a first end of layer 38, and an output terminal 41 is connected to a second end of layer 38. A load resistor or reactance 42 is connected between output termina141 and a reference voltage 43.
Air and/or gas from the ambient enviionment about sensor 26 diffuse into cavity 44 via porous spacer 35. Spacer 35 may be silicon or other material with tiny etched holes; alternately, spacer 35 may also be a porous stainless steel frit.
Functionally, light source 31 is activated and emanates light with a charging or pulsing intensity between 10 to 100 hertz. If source 31 were an incandescent light the rate would be closer to 10 hertz but if it were an array of microheaters as in Figure 2. the rate could approach 100 hertz. Light 83 goes through narrow band pass filter 28, silicon substrate 27 and antireflective (AR) coating 34, into cavity 44 containing the gas, if any, to be detected, which diffuses into cavity 44 through porous spacer 35. Iristead of spacer 35 being porous, layers 36, 37 and 38 could be replaced with a porous layer such as that of silicon or a stainless steel frit. The piezoresistive sensor film could be on a portion of the porous layer or frit, or in the vicinity of spacer 35. The narrow band pass filter and the AR coating are designed for the absorption wavelength of the gas to be detected. When light 83 in cavity 44 has the same wavelength as the absorption wavelength of a gas present in cavity 44, the gas heats up upon absorption of light 83. The gas expands and increases the pressure within cavity 44. The pressure causes piezoresistive layer or sensor 37 to bend or distort and output a voltage indication at output 41.
When light 83 decreases in intensity or is off, the gas cools resulting in a cavity 44 pressure decrease thereby causing piezoresistive element 37 to bend or distort in the opposite direction or way. The magnitude of the voltage from sensor 37 is an indication of the amount of concentration of gas in cavity 44, and about the environment ambient to sensor 26. The porosity of spacer 35 or the layer in lieu of layers 36-38, needs to be sufficiently minimal so that a detectable pressure can be created in cavity 44 when light impinges and is absorbed by the detected gas. This gas detector 26 is regarded as an opto-acoustic sensor having a microphone-like detection.
Figure 5 shows another version of an opto-acoustic sensor. A 3.0 micron interference narrow band pass filter 88 for a wavelength of 4.3 microns is formed on a first surface of a 250 micron silicon substrate 89. Layer 89 may be instead a glass plate.
A 2.0 micron anti-reflective coating 90 is formed on a second surface, i.e., the other side of silicon substrate 89. An antireflective (AR) coating may also be formed on filter 88.
Heater 86 may be formed in a one micron, polysilicon layer 87 which is formed on filter 88 of substrate 89. A 0.1 micron reflective coating 98 for a 4.3 micron wavelength light is formed on the surface of layer 87.
Polysilicon layer 87 is formed resulting in a 2 micron cavity 91, with a sacrificial layer on layer 88. The sacrificial layer is removed. Cavity 91 provides thermal insulation between heater 86 and substrate 89. A 2.0 micron sacrificial layer is formed and etched on the AR side of substrate 89 for a 2.0 micron cavity 92 as done for cavity 91. A 0.1 micron reflective coating 94 for a wavelength of 4.3 microns is formed on the sacrificial layer. A 0.1 micron piezoresistive film 93 is formed partially on coating 90, I I
coating 94 and the sacrificial layer for cavity 92. A 2.0 micron polysilicon layer 95 is formed partially on piezoelectric layer 93, reflective coating 94 and the sacrificial layer for cavity 92.
Small (0.1 micron) holes 96 are etched in polysilicon layer 95 so that the sacrificial layer can be removed to result in cavity 92. Holes 96 also form the porous wall of cavity 92 so that air and/or gas of the ambient environment of sensor 85 may diffuse into cavity 92. Heater 86 emits light 97 that goes through layers 87, 88, 89 and 90 into cavity 92. If there is a gas having an absorption wavelength of 4.3 microns, it heats up and the increased pressure bends piezoresistive element 93 which produces an electrical signal. Heater 86 emits light 97 having a varying or pulsing intensity which causes the gas to heat up and cool. This cycling is sensed by element 93. The magnitude of such cycling is an indication of the amount of concentration of the gas, e.g., CO,, in cavity 92 and in the ambient environment of sensor 85.
BACKGROUND
The invention pertains to gas sensors and particularly to toxic gas sensors. More particularly, the invention pertains to micromachined integrated circuit gas and liquid sensors.
Related art devices for sensing toxic gases such as C0, NO, NO2 and VOCs generated by combustion processes have been based on sensors indicating changes in metal oxide film conductivity, chemiluminescence, fluorescence, various forms of IR absorption, and so forth. These sensors have been either too costly, unstable, or insensitive to meet the requirements of a low-cost, reliable toxic gas sensor.
Their sensing such toxic gases in concentrations that are commensurate with the levels at which they can be harmful to health and life is difficult, especially if it is to be done via low-cost, affordable and reliable sensors. Often the older gas engines or heaters, operated by budget-minded users, are most likely to be a source of toxic gases which endanger these users and others. These users are the ones most unlikely to buy toxic gas indicators, unless someone manages to bring affordable and appropriate technology to them.
SUNIlKARY OF THE INVENTION
According to one aspect of the present invention, there is provided a micromachined integrated circuit gas/liquid sensor comprising: a first layer; a set of microemitters formed on a first surface of said first layer providing an electromagnetic pulsating radiation; a second layer; a narrow band pass filter for a first wavelength formed on a first surface of said second layer; a third -1a-layer; a fourth layer having a first surface adjacent to a first surface of said third layer, wherein said third and fourth layers have central portions removed to form a cavity; a detector designed as a flow sensor; a porous filter layer formed adjacent to a second surface of said fourth layer; and wherein: the first surface of said first layer is adjacent to a second surface of said second layer;
the first surface of said second layer is adjacent to a second surface of said third layer, and the detector outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
According to another aspect of the present invention, there is provided a micromachined integrated circuit gas/liquid sensor comprising: a first layer; a set of microemitters formed on a first surface of said first layer providing an electromagnetic pulsating radiation; a second layer; a narrow band pass filter for a first wavelength formed on a first surface of said second layer; a third layer; a fourth layer having a first surface adjacent to a first surface of said third layer, wherein said third and fourth layers have central portions removed to form a cavity; a detector designed as a pressure sensor; a porous filter layer formed adjacent to a second surface of said fourth layer; and wherein: the first surface of said first layer is adjacent to a second surface of said second layer;
the first surface of said second layer is adjacent to a second surface of said third layer, and the detector outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
According to still another aspect of the present invention, there is provided a micromachined gas/liquid sensor comprising: a first layer, wherein said first layer is a wafer; a light source formed on a first surface of said -lb-first layer providing an electromagnetic, pulsating radiation; a second layer formed on said first surface of said first layer except in the region of the light source;
an optical filter formed on a first surface of said second layer, whereby a second surface of said second layer is adjacent to first surface of said first layer; a cavity adjacent to said optical filter; a pressure sensor or flow sensor formed in the region of said cavity; a porous filter adjacent to said cavity, wherein said cavity is positioned between said optical filter and said porous filter; wherein the pressure sensor outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
According to yet another aspect of the present invention, there is provided a micromachined gas/liquid sensor comprising: a first layer, wherein said first layer is a wafer; a light source formed on a first surface of said first layer providing an electromagnetic, pulsating radiation; a second layer formed on said first surface of said first layer except in the region of the light source;
an optical filter formed on a first surface of said second layer, whereby a second surface of said second layer is adjacent to first surface of said first layer; a cavity adjacent to said optical filter; a pressure sensor or flow sensor formed in the region of said cavity; a porous filter adjacent to said cavity, wherein said cavity is positioned between said optical filter and said porous filter; wherein the flow sensor outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
The present invention provides a new, useful, low-cost, reliable and "conservative" indication of the presence of a toxic gas or objectionable constituents of combustion -lc-products. It is not necessary to directly measure the toxic or objectionable gases, if one can identify a phenomenon that would indicate or infer their presence with a meaningful probability level.
Carbon dioxide (C02) indicates the presence of objectionable concentrations of combustion products. C02 is generated by known combustion processes, in concentrations that are 10 to 100 times higher than those of CO, NOX or volatile organic compounds (VOCs). Yet one can measure COz at concentration levels that are 3 to 30 times lower than the above-noted gases, especially via non-dispersive infrared (NDIR) sensing.
-~-The present sensor provides more reliable, affordable and sensitive detection than direct NDIR sensing of toxic gases. It also provides additional detection/alarm protection against high CO, concentrations.
The sensor takes advantage of the indirect indication of toxic combustion products, such as CO, NO,, and VOCs via CO, detection, and a low-cost, integrated optical sensor design made available at a reasonable price to meet the toxic gas sensing needs of users of unvented space heaters (or kitchen stoves) and the needs of automobile drivers that wish to detect exhaust fumes from cars or near them.
Combustion products, especially those from gasoline or diesel fuel are known to consist of 5-15% C02, 10-20% H,O, 0-10% 02, 70-80% N,, 0.001 to 0.4% NOõ 0.001 to 0.2% CO (CO in worn or maladjusted automotive engines may be up to 2%), and 0.001 to 0.3% hydrocarbons (HC), i.e., CO, concentrations always predominate.
Still, dilution of exhaust gas of the car in front is expected to be 10 to 1000-fold before reaching the cabin air intake of the following car, so that the CO, concentration is likely to be 0.005 to 1.5%, which is measurable, while the toxic gas concentration is only in the 0.0001 to 0.04% range. The latter concentrations are much more difficult to measure, and especially so with low-cost sensors, which would often not begin to sense those gases in spite of being present in concentrations that cause discomfort or adverse health effects.
The integrated design of the present sensor enhances its ruggedness, portability, manufacturability and affordability. The sensor cell, detector and optical filter are integrated into one micromachined unit which is of lower cost, i.e., more affordable and more widely applicable than related-art sensors. The present sensor is more compact and therefore more rugged, more portable and of faster response. The faster response is due to the smaller cavity and ability to operate at higher source frequencies.
The flow detector features a much smaller flow channel, 10-25 micrometers (microns) versus 150 to 500 microns for related art devices. The total integrated sensor system is 10 to 100 times smaller than the related art sensors, which makes the present system more affordable, portable, faster response and versatile. The present detectors are also 10 to 100 times less costly than the related-art detectors.
In summary, the invention is a low-cost opto-fluidic or opto-acoustic sensing system, which is a micromachined integrated sensor, which has a rapidly pulsing, thin-film light or heat source, an appropriate multi-layer interference filter (IF), anti-reflective (AR) coatings, and a specially etched silicon wafer, via a sacrificial layer, to form a sample gas cavity, which may be an optically or acoustically tuned resonator to the absorption wavelength of the gas to be detected, into which the sample gas can diffuse in and out via a suitable fluid filter such as a stainless steel frit which has a porosity that is optimized by a certain compression of the frit, and a flow sensor (thermal microanemometer) or microphone (piezoresistive sensing film) embedded in a wall of the cavity.
BRIEF DESCRIPTION OF THE DRAWING
Figure 1 reveals an integrated opto-fluidic gas sensor.
Figure 2 shows another version of the opto-fluidic gas sensor.
Figure 3 shows a microsensor hybrid design in which the flow sensor and the narrow band pass filter reside on one micromachined block.
Figure 4 reveals an integrated opto-acoustic gas sensor.
Figure 5 shows another integrated gas sensor DESCRIPTION OF THE EMBODIMENTS
Figure 1 is a diagram that shows a basic structure of inferential gas sensor 10.
Silicon wafer 11 has an etched space 12 on one side. On that side having depression 12 is attached a silicon wafer 13 having a set of microemitters 14 on the side facing wafer 11. Wafer 11 may be instead a glass plate which could provide for better optical performance in terms of filtering some infrared (IR) wavelengths. Formed on the surface or side of wafer 11 adjacent to microemitters 14 is an antireflective (AR) coating 15. On the other side of wafer 11 is a narrow band pass interference filter (IF) 16 designed to pass only infrared light having a wavelength that is the same as the absorption wavelength (4.3 microns) of CO2 or of the chosen gas to be detected (3.4 microns for VOC, 4.6 microns for C0, and so forth.). The AR and IF coatings or films may be interchanged in location with each other. Silicon wafer 17 is bonded or attached to filter 16 and a flow sensor 19 (thermal micro anemometer) or microphone (piezoresistive sensing film) is formed on silicon wafer 17. Silicon wafer 18 is bonded to wafer 17. Silicon wafers 17 and 18 are etched to form a cavity 20. Flow sensor 19 is situated in a pathway 21 between cavity 20 and the ambient volume or I I
space external to sensor 10. Gas or air can flow in and out of cavity 20 via path or channel 21. A porous gas filter 22, which permits diffusion of gas from the ambient space into cavity 20, is bonded to wafer 18 thereby completing the forming of cavity 20.
Filter rriay be a wafer having a large number of small etched holes or a polymer, ceramic or stainless steel frit, as examples. Preferred is a stainless steel frit compressed to optimal porosity. Microemitters 14 and flow sensor 19 are connected through the wafer conductors, contacts or vias 23 to contact pads 24, are only for contacts to external power and signal output. Gaskets 104 may be formed on contacts 24, for the purposes of electrical communication with another wafer formed over wafer 13, upon which electronics may be situated. Such gaskets may have the properties of electrical conduction in essentially one axis such as up and down and not sideways.
Formed on wafer 13 may be an integrated circuit (IC) or an application specific integrated circuit (ASIC) 25 for providing electronics for processing signals from flow sensor 19.
Microemitter 14 is a 32 x 32 array of microemitters that function as a light source or heater for sensor 10. The array 14 surface is about 12 times, its total emission is about 0.5 times but its 4.3 micron emission is 2.8 times that of a mini-tungsten light bulb. Cavity 20 is about 1 x 1 x 1 or 2x2x 1 millimeters (mm). Cavity 20 cannot be too small because thermal quenching would occur, thus reducing the sensitivity of gas sensor 10. Flow sensor channel 21 is about 10-25 microns wide.
Figure 2 is a cross-section diagram of opto-fluidic gas sensor 45. Silicon wafer 46 is about 5 x 5 mm square and about 500 microns thick. Wafer 46, like wafer 13 of figure 1, has formed on it a heater or light source 47 of IR radiation. Source 47 is fabricated from a high refractory material such as a metal oxide or ceramic-like material. Grooves or pits 48 are etched in wafer 46 provide heat dissipation for source 47. Leads 60, about 25 microns thick, are attached to contacts 49 for providing an AC
signal at a frequency from 10 to 100 hertz to activate source 47 so as to emanate radiation or illumination 51. Spacers 50 are formed on the periphery of chip or wafer 46. A silicon wafer 52 about 500 microns thick is formed. Wafer 52 may instead be a glass plate. An AR film coating 53 is fonmed on a first side of wafer 52 and a narrow band pass IF multiple stack layer 54 for passing 4.3 microns of light is formed on a second side of wafer 52. AR film layer 53 is about 2 to 6 films of quarter wavelength thicknesses of alternating materials having different indices of refraction.
IF layer 54 is a stack of half wavelength films of alternating materials having different indices of refraction. Wafer 52 is brought into proximity with wafer 46 upon contact of spacers 50 on wafer 46 at a peripheral surface of wafer 52 to form a thermally isolating space 55.
The first or second side of wafer 52 may be closest to wafer 46; however, figure 2 shows the first side of wafer 52 closest to wafer 46. A 500 micron silicon detector wafer 56 is formed on wafer 52. Wafer 56 is etched to create a cavity 57 in the middle with portions of wafer 56 being proximate to wafer 52 at the periphery of wafer 52. At one side on the periphery of wafer 56 is formed a flow sensor 58 which is electrically connected externally with contacts 59 on wafer 56 to leads 60. Wafer 56 has a via 61 etched near flow sensor 58 to facilitate the flow of gas or air 62 by flow sensor 58. A
solder ring 63 is formed on the outer periphery of wafer 56. A top cap wafer 64 is formed on solder ring 62 proximate to wafer 56. The central portion of wafer 64 is etched to form cavity 57 in conjunction with wafer 56. There is about an 18 micron via or flow channel 65 that is formed between wafers 56 and 64 so that air or gas 62 can flow back and forth between cavity 57, past flow sensor 58, and through via 61 to an environment external of gas sensor 45. Formed on wafer 64 is a porous filter layer 66 which forms a wall of cavity 57. Filter 66 allows ambient gas 67 of the environment external to gas sensor 45 to infiltrate or diffuse in and out of cavity 57 to equalize the concentration of the ingredients of the gases and air. Layer 66 may be a wafer with pores etched in it but here it is a stainless steel frit which is porous. The stainless steel frit is compressed to attain the correct porosity for gas sensor 45. The frit may have 2 micron pores covering about 40-50 percent of the frit area, and be about 50 microns thick.
The function of sensor 45 is to detect the magnitude of CO2 in the ambient atmosphere. Light source 47 has an electrical AC signal at a frequency up to about 100 hertz applied to it. Light source 47 emanates radiation 51 that is composed mainly of IR
light. Radiation 51 has a varying or pulsing magnitude or intensity at the frequency of the electrical AC signal applied to source 47. Fluctuating or pulsing light 51 passes = through cavity 55 and AR layer 53 and into wafer 52. From wafer 52, light 51 passes through narrow band pass filter 54 which filters out effectively all of the wavelengths of light 51 except that of 4.3 microns which is the absorption wavelength of CO1The 4.3 micron light 51 enters cavity 57. If CO, gas 67 infiltrates through filter 66 into cavity I I
51, COz gas 67 heats up during the period it absorbs the light and cools down when light 51 is not present during the minimum magnitude of the period of the fluctuating or pulsing of light 51. During absorption of light 51 by gas 67, gas 67 heats up and expands in volume thereby forcing a flow 62 out of cavity 57 through channe165, by flow sensor 58 and out of sensor 45 through via 61. If cavity 51 is a resonator optically or acoustically tuned to the absorption wavelength, the effects of the light or sound upon the absorbing gas is greatly increased resulting in much improved detection of very small amounts of gas 67. Acoustic resonator techniques may also be used. In the periodic absence of light 51, gas 67 stops absorbing light and cools down.
Then gas 67 1o contracts in volume thereby causing a flow 62 into sensor 45 through via 61, by flow sensor 58 and through channel 65 into cavity 57. Thus, there is a fluctuation of gas 67 and respective flow 62 over flow sensor 58 that corresponds to the fluctuation of light 51. The porosity of filter 66 is small enough so as not to prevent pressure pulsations or flow 62 from happening through or by flow sensor 58. Flow sensor 58 outputs a signal that is indicative of and proportional to the amount, magnitude or velocity of flow 62 going through or by sensor 58. Sensor 58 measures a flow 62 rate in cubic centimeters per second. The amount, magnitude or velocity of flow 62 is proportional to the amount of CO2 gas 67 present in cavity 57 and immediately external to gas sensor 45.
The presence of any other gas in absence of CO, does not cause any pressure pulsations or flow 62 or any fluctuation of flow 62 because there is no absorption of the 4.3 micron light 51 when it enters cavity 57. Thus, the signal from flow sensor 58 is indicative of the amount of CO2 gas 67 present around gas sensor 45. A processor 68, which is connected to flow sensor 58, inferentially determines from the amount of COZ
gas 67, the presence and amounts of the various toxic gases that are in the ambient environment immediately around and about micromachined inferential toxic gas indicator 45.
If light source 47 were to be an incandescent mini-tungsten filament lamp, like source 74 in figure 3, the effective rate of the AC excitation signal would be about 10 hertz. An increased frequency would result in less effectiveness on the expansion and absorption of the gas. A DC signal result in no detection of the light absorbing gas 67.
The present integrated circuit light source 47 can effectively be cycled or pulsed up to 100 hertz which results in greater sensitivity of sensor 45. The sensitivity increase is equal to the square root of the ratio of the effective frequencies of the two light sources which is about 3.16, that is, the square root of 100/10.
Gas sensor 45 may be designed to directly detect and indicate the presence of other gases or liquids besides CO2. Narrow band pass filter 54 would be changed to a filter that would pass a different wavelength of light 51 which would be equivalent to the absorption wavelength of the other kind of gas to be detected and measured. For instance, filter would be designed to pass 4.6 micron wavelength of light if CO were to be detected by sensor 45 or to a wavelength from 3.2 to 3.4 microns if a gas or liquid having hydrocarbon (CH) bonds were to be detected by sensor 45. Another change or adjustment that would better facilitate detection of a specific gas or liquid would be that of diffusion filter 66. For example, adjustment of the porosity of stainless steel frit or filter 66 may achieve by the amount of compression that is applied to frit 66.
Compressing frit 66 causes it to be less porous and increases the signal-to-noise ratio of the output of flow sensor 58. This ratio increases because the reduced porosity or freedom of flow through filter 66 results in a crisper flow 62 over flow sensor 58 when gas 67 is expanding and contracting in response to the absorption of fluctuating light 51.
However, the response time to the measurement of the immediate presence of gas 67, external to sensor 45, is slower since the infiltration of gas 67 into cavity 57 is much slower because of the more restrictive or less porous filter 66 to ambient gas.
Figure 3 shows an overview of a low-cost opto-flow sensor 70, which is a CO, microsensor hybrid design, in which a sensor cell 71, flow detector 72 and IR
filter 73 on glass 99 reside on one micromachined silicon block 100 in a plastic housing 79.
Glass plate 99 could be replaced with a silicon wafer. Light bulb 74 is integrated into this design. Chip contact pads 75 are pressed towards lead frame wires 76 by felt-metal spring-washer 77. This package features direct contact between the chip and lead frame 76 embedded in plastic molding 79, thus saving the cost of wire bonding or the unreliability/noise of the zebra strip contacts, depending on the reference, the integration of flow sensor 72 into sensor cavity 71, chip 78 held in place, not with an unstable material such as an elastomer, but with a more stable one such as stainless steel 80, selected light source 74 is operated at an AC voltage level that causes the peak output to be no less than the peak level after suitable (90%) derating; this is to achieve a combination of maximum life and maximum output at the highest practical frequency I I
near 100 Hz. Sensor 70 is plugged to a tube 100 with housing 102, which also functions as a stop against felt-metal spring-washer 77, from which the gas or air to be monitored comes. Plastic or steel snaps 103 secure sensor 70 to tube 101.
Figure 4 is another structure of gas sensor 26. Silicon substrate 27 is formed to be as thin as possible to maximize optimal efficiency. A multilayer narrow band pass IF
28 for a 4.3 micron wavelength is formed on a first side of Si substrate 27.
Spacers 29 are formed on the periphery of IF layer 28. Layer 28 may be a wafer of silicon or other appropriate material, or a glass plate. A one micron silicon nitride support 30 is formed.
A 0.1 micron heater serpentine or IR light source 31 is formed or embedded in layer 30.
Spacers 29 are formed on the periphery of the heater side of support layer 30.
Supports 29 of layers 28 and 30 are brought together to form a 2 micron evacuated or air-filled cavity 82 for thermal isolation between layers 30 and 28. A 0.1 to 0.3 micron Au reflective coating layer 32 is formed on the other side of layer 30, not supporting heater or IR light source 31. A 0.1 micron silicon layer 33 is formed on layer 32 to protect the Au film. An AR coating layer 34 for a 4.3 micron wavelength is formed on the second side of substrate 27, opposite if the first side having IF layer 28 formed on it. A porous support 35 is formed on the periphery of layer 34. A 1 to 2 micron polysilicon layer 36 is formed. A 0.1 to 0.3 micron piezoresistive sensor film layer 37 is formed on layer 36, and a 0.1 to 0.2 micron Au reflective coating layer 38 is formed on layer 37.
Porous support 35 is formed also on the periphery of layer 38. Support 35 with layers 34 and 38 form a gas cavity 44 having about 2 microns between layers 34 and 38. An electrical alternating current (AC) input terminal 39 is connected to heater or light source 31. A
plus 5 volt termina140 is connected to a first end of layer 38, and an output terminal 41 is connected to a second end of layer 38. A load resistor or reactance 42 is connected between output termina141 and a reference voltage 43.
Air and/or gas from the ambient enviionment about sensor 26 diffuse into cavity 44 via porous spacer 35. Spacer 35 may be silicon or other material with tiny etched holes; alternately, spacer 35 may also be a porous stainless steel frit.
Functionally, light source 31 is activated and emanates light with a charging or pulsing intensity between 10 to 100 hertz. If source 31 were an incandescent light the rate would be closer to 10 hertz but if it were an array of microheaters as in Figure 2. the rate could approach 100 hertz. Light 83 goes through narrow band pass filter 28, silicon substrate 27 and antireflective (AR) coating 34, into cavity 44 containing the gas, if any, to be detected, which diffuses into cavity 44 through porous spacer 35. Iristead of spacer 35 being porous, layers 36, 37 and 38 could be replaced with a porous layer such as that of silicon or a stainless steel frit. The piezoresistive sensor film could be on a portion of the porous layer or frit, or in the vicinity of spacer 35. The narrow band pass filter and the AR coating are designed for the absorption wavelength of the gas to be detected. When light 83 in cavity 44 has the same wavelength as the absorption wavelength of a gas present in cavity 44, the gas heats up upon absorption of light 83. The gas expands and increases the pressure within cavity 44. The pressure causes piezoresistive layer or sensor 37 to bend or distort and output a voltage indication at output 41.
When light 83 decreases in intensity or is off, the gas cools resulting in a cavity 44 pressure decrease thereby causing piezoresistive element 37 to bend or distort in the opposite direction or way. The magnitude of the voltage from sensor 37 is an indication of the amount of concentration of gas in cavity 44, and about the environment ambient to sensor 26. The porosity of spacer 35 or the layer in lieu of layers 36-38, needs to be sufficiently minimal so that a detectable pressure can be created in cavity 44 when light impinges and is absorbed by the detected gas. This gas detector 26 is regarded as an opto-acoustic sensor having a microphone-like detection.
Figure 5 shows another version of an opto-acoustic sensor. A 3.0 micron interference narrow band pass filter 88 for a wavelength of 4.3 microns is formed on a first surface of a 250 micron silicon substrate 89. Layer 89 may be instead a glass plate.
A 2.0 micron anti-reflective coating 90 is formed on a second surface, i.e., the other side of silicon substrate 89. An antireflective (AR) coating may also be formed on filter 88.
Heater 86 may be formed in a one micron, polysilicon layer 87 which is formed on filter 88 of substrate 89. A 0.1 micron reflective coating 98 for a 4.3 micron wavelength light is formed on the surface of layer 87.
Polysilicon layer 87 is formed resulting in a 2 micron cavity 91, with a sacrificial layer on layer 88. The sacrificial layer is removed. Cavity 91 provides thermal insulation between heater 86 and substrate 89. A 2.0 micron sacrificial layer is formed and etched on the AR side of substrate 89 for a 2.0 micron cavity 92 as done for cavity 91. A 0.1 micron reflective coating 94 for a wavelength of 4.3 microns is formed on the sacrificial layer. A 0.1 micron piezoresistive film 93 is formed partially on coating 90, I I
coating 94 and the sacrificial layer for cavity 92. A 2.0 micron polysilicon layer 95 is formed partially on piezoelectric layer 93, reflective coating 94 and the sacrificial layer for cavity 92.
Small (0.1 micron) holes 96 are etched in polysilicon layer 95 so that the sacrificial layer can be removed to result in cavity 92. Holes 96 also form the porous wall of cavity 92 so that air and/or gas of the ambient environment of sensor 85 may diffuse into cavity 92. Heater 86 emits light 97 that goes through layers 87, 88, 89 and 90 into cavity 92. If there is a gas having an absorption wavelength of 4.3 microns, it heats up and the increased pressure bends piezoresistive element 93 which produces an electrical signal. Heater 86 emits light 97 having a varying or pulsing intensity which causes the gas to heat up and cool. This cycling is sensed by element 93. The magnitude of such cycling is an indication of the amount of concentration of the gas, e.g., CO,, in cavity 92 and in the ambient environment of sensor 85.
Claims (37)
1. A micromachined integrated circuit gas/liquid sensor comprising:
a first layer;
a set of microemitters formed on a first surface of said first layer providing an electromagnetic pulsating radiation;
a second layer;
a narrow band pass filter for a first wavelength formed on a first surface of said second layer;
a third layer;
a fourth layer having a first surface adjacent to a first surface of said third layer, wherein said third and fourth layers have central portions removed to form a cavity;
a detector designed as a flow sensor;
a porous filter layer formed adjacent to a second surface of said fourth layer; and wherein:
the first surface of said first layer is adjacent to a second surface of said second layer;
the first surface of said second layer is adjacent to a second surface of said third layer, and the detector outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
a first layer;
a set of microemitters formed on a first surface of said first layer providing an electromagnetic pulsating radiation;
a second layer;
a narrow band pass filter for a first wavelength formed on a first surface of said second layer;
a third layer;
a fourth layer having a first surface adjacent to a first surface of said third layer, wherein said third and fourth layers have central portions removed to form a cavity;
a detector designed as a flow sensor;
a porous filter layer formed adjacent to a second surface of said fourth layer; and wherein:
the first surface of said first layer is adjacent to a second surface of said second layer;
the first surface of said second layer is adjacent to a second surface of said third layer, and the detector outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
2. The sensor of claim 1 wherein:
a channel is formed in at least one first surface of said third and fourth layers, from the cavity to an outer edge of said third and fourth layers;
said detector is formed in said channel.
a channel is formed in at least one first surface of said third and fourth layers, from the cavity to an outer edge of said third and fourth layers;
said detector is formed in said channel.
3. The sensor of claim 2 wherein said porous filter layer is a frit having low porosity.
4. The sensor of claim 3 wherein:
said first, third and fourth layers are wafers;
and said second layer is a glass plate.
said first, third and fourth layers are wafers;
and said second layer is a glass plate.
5. The sensor of claim 3 wherein said first, second, third and fourth layers are wafers.
6. The sensor of claim 3 wherein said frit has a porosity that may be decreased with increased compression of said frit or increased with decreased compression of said frit, for optimal porosity.
7. A micromachined integrated circuit gas/liquid sensor comprising:
a first layer;
a set of microemitters formed on a first surface of said first layer providing an electromagnetic pulsating radiation;
a second layer;
a narrow band pass filter for a first wavelength formed on a first surface of said second layer;
a third layer;
a fourth layer having a first surface adjacent to a first surface of said third layer, wherein said third and fourth layers have central portions removed to form a cavity;
a detector designed as a pressure sensor;
a porous filter layer formed adjacent to a second surface of said fourth layer; and wherein:
the first surface of said first layer is adjacent to a second surface of said second layer;
the first surface of said second layer is adjacent to a second surface of said third layer, and the detector outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
a first layer;
a set of microemitters formed on a first surface of said first layer providing an electromagnetic pulsating radiation;
a second layer;
a narrow band pass filter for a first wavelength formed on a first surface of said second layer;
a third layer;
a fourth layer having a first surface adjacent to a first surface of said third layer, wherein said third and fourth layers have central portions removed to form a cavity;
a detector designed as a pressure sensor;
a porous filter layer formed adjacent to a second surface of said fourth layer; and wherein:
the first surface of said first layer is adjacent to a second surface of said second layer;
the first surface of said second layer is adjacent to a second surface of said third layer, and the detector outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
8. The sensor of claim 7 wherein said detector is formed in said cavity and designed as a piezoresistive pressure sensor.
9. The sensor of claim 8 wherein the cavity is a resonator, and wherein said resonator is tuned to the first wavelength.
10. The sensor of claim 9 wherein said first, third and fourth layers are semiconductor wafers, and wherein said second layer comprises glass.
11. The sensor according to any one of claims 1 to 10 further comprising:
a first through-the-layer contact formed on a second surface of said first layer and through said first layer to said set microemitters; and a second through-the-layer contact formed on the second surface of said first layer and through said first, second and third layers to said detector.
a first through-the-layer contact formed on a second surface of said first layer and through said first layer to said set microemitters; and a second through-the-layer contact formed on the second surface of said first layer and through said first, second and third layers to said detector.
12. The sensor of claim 11 further comprising an integrated circuit formed on the second surface of said first layer.
13. The sensor of claim 12 further comprising an antireflective coating formed on the second surface of said second layer.
14. The sensor of claim 13 wherein:
said detector can output a signal that indicates a magnitude of a change of volume of the gas or liquid; and the magnitude of the change of volume indicates an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, in the cavity and in turn in the ambient environment of the sensor.
said detector can output a signal that indicates a magnitude of a change of volume of the gas or liquid; and the magnitude of the change of volume indicates an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, in the cavity and in turn in the ambient environment of the sensor.
15. The sensor of claim 14 further comprising a processor, wherein:
the signal from said detector, indicating an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, goes to said processor; and said processor processes the signal from said detector and provides inferred information.
the signal from said detector, indicating an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, goes to said processor; and said processor processes the signal from said detector and provides inferred information.
16. The sensor of claim 15 wherein:
said processor comprises a table of information.
said processor comprises a table of information.
17. The sensor of claim 16 wherein:
the first wavelength is at an absorption wavelength of CO2; and the presence of CO2 indicates the presence of certain combustion products.
the first wavelength is at an absorption wavelength of CO2; and the presence of CO2 indicates the presence of certain combustion products.
18. A micromachined gas/liquid sensor comprising:
a first layer, wherein said first layer is a wafer;
a light source formed on a first surface of said first layer providing an electromagnetic, pulsating radiation;
a second layer formed on said first surface of said first layer except in the region of the light source;
an optical filter formed on a first surface of said second layer, whereby a second surface of said second layer is adjacent to first surface of said first layer;
a cavity adjacent to said optical filter;
a pressure sensor or flow sensor formed in the region of said cavity;
a porous filter adjacent to said cavity, wherein said cavity is positioned between said optical filter and said porous filter; wherein the pressure sensor outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
a first layer, wherein said first layer is a wafer;
a light source formed on a first surface of said first layer providing an electromagnetic, pulsating radiation;
a second layer formed on said first surface of said first layer except in the region of the light source;
an optical filter formed on a first surface of said second layer, whereby a second surface of said second layer is adjacent to first surface of said first layer;
a cavity adjacent to said optical filter;
a pressure sensor or flow sensor formed in the region of said cavity;
a porous filter adjacent to said cavity, wherein said cavity is positioned between said optical filter and said porous filter; wherein the pressure sensor outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
19. The sensor of claim 18 wherein:
said optical filter is a narrow band pass filter for passing light from said light source, having a first wavelength into said cavity; and a gas or liquid to be sensed has an absorption wavelength at the first wavelength.
said optical filter is a narrow band pass filter for passing light from said light source, having a first wavelength into said cavity; and a gas or liquid to be sensed has an absorption wavelength at the first wavelength.
20. The sensor of claim 18 or 19 wherein said second layer is glass or a wafer.
21. The sensor according to any one of claims 18 to 20 wherein said porous filter has a porosity that is sufficient for the gas or liquid to infiltrate through said porous filter into said cavity and to result in a pressure change in said cavity upon expansion or compression of the gas or liquid.
22. The sensor of claim 21 wherein said porous filter is a frit that is optimally compressed so as to adjust the porosity of said porous filter to be sufficient for the gas or liquid to infiltrate into said cavity and to result in a pressure change upon expansion or contraction of the gas or liquid.
23. The sensor of claim 21 wherein:
said pressure sensor can output a signal that indicates a magnitude of the expansion or contraction of the gas or liquid; and the magnitude of the expansion or contraction indicates an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, in said cavity and in turn in the ambient environment of the sensor.
said pressure sensor can output a signal that indicates a magnitude of the expansion or contraction of the gas or liquid; and the magnitude of the expansion or contraction indicates an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, in said cavity and in turn in the ambient environment of the sensor.
24. The sensor according to any one of claims 18 to 20 wherein said porous filter is a compressed metal frit.
25. A micromachined gas/liquid sensor comprising:
a first layer, wherein said first layer is a wafer;
a light source formed on a first surface of said first layer providing an electromagnetic, pulsating radiation;
a second layer formed on said first surface of said first layer except in the region of the light source;
an optical filter formed on a first surface of said second layer, whereby a second surface of said second layer is adjacent to first surface of said first layer;
a cavity adjacent to said optical filter;
a pressure sensor or flow sensor formed in the region of said cavity;
a porous filter adjacent to said cavity, wherein said cavity is positioned between said optical filter and said porous filter; wherein the flow sensor outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
a first layer, wherein said first layer is a wafer;
a light source formed on a first surface of said first layer providing an electromagnetic, pulsating radiation;
a second layer formed on said first surface of said first layer except in the region of the light source;
an optical filter formed on a first surface of said second layer, whereby a second surface of said second layer is adjacent to first surface of said first layer;
a cavity adjacent to said optical filter;
a pressure sensor or flow sensor formed in the region of said cavity;
a porous filter adjacent to said cavity, wherein said cavity is positioned between said optical filter and said porous filter; wherein the flow sensor outputs a signal indicative of and proportional to the concentration of a gas or liquid component.
26. The sensor of claim 25 wherein:
said optical filter is a narrow band pass filter for passing light from said light source, having a first wavelength into said cavity; and a gas or liquid to be sensed has an absorption wavelength at the first wavelength.
said optical filter is a narrow band pass filter for passing light from said light source, having a first wavelength into said cavity; and a gas or liquid to be sensed has an absorption wavelength at the first wavelength.
27. The sensor of claim 25 or 26 wherein said second layer is glass or a wafer.
28. The sensor according to any one of claims 25 to 27 wherein said porous filter has a porosity that is sufficient for the gas or liquid to infiltrate through said porous filter into said cavity and to result in a pressure change in said cavity upon expansion or compression of the gas or liquid.
29. The sensor of claim 28 wherein said porous filter is a frit that is optimally compressed so as to adjust the porosity of said porous filter to be sufficient for the gas or liquid to infiltrate into said cavity and to result in a pressure change upon expansion or contraction of the gas or liquid.
30. The sensor according to any one of claims 25 to 27 wherein said porous filter is a compressed metal frit.
31. The sensor of claim 29 wherein:
said flow sensor can output a signal that indicates a magnitude of the expansion or contraction of the gas or liquid; and the magnitude of the expansion or contraction indicates an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, in said cavity and in turn in the ambient environment of the sensor.
said flow sensor can output a signal that indicates a magnitude of the expansion or contraction of the gas or liquid; and the magnitude of the expansion or contraction indicates an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, in said cavity and in turn in the ambient environment of the sensor.
32. The sensor according to any one of claims 1 to 31 further comprising a processor, wherein:
the signal from said pressure sensor or flow sensor, indicating an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, goes to said processor; and said processor processes the signal from said pressure sensor or flow sensor and provides inferred information.
the signal from said pressure sensor or flow sensor, indicating an amount of concentration of the gas or liquid having an absorption wavelength at the first wavelength, goes to said processor; and said processor processes the signal from said pressure sensor or flow sensor and provides inferred information.
33. The sensor of claim 32 wherein the first wavelength is at an absorption wavelength of CO.
34. The sensor of claim 32 wherein the first wavelength is at an absorption wavelength of CO2.
35. The sensor of claim 32 wherein:
said processor comprises a table of information.
said processor comprises a table of information.
36. The sensor of claim 32 further comprising an integrated circuit formed on said first layer and wherein said integrated circuit has a processor.
37. The sensor of claim 36 further comprising an antireflective coating for the first wavelength formed on said second layer.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/841,748 US5869749A (en) | 1997-04-30 | 1997-04-30 | Micromachined integrated opto-flow gas/liquid sensor |
| US08/841,748 | 1997-04-30 | ||
| PCT/US1998/008741 WO1998049540A1 (en) | 1997-04-30 | 1998-04-29 | Micromachined opto-flow gas sensor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2283563A1 CA2283563A1 (en) | 1998-11-05 |
| CA2283563C true CA2283563C (en) | 2008-07-15 |
Family
ID=25285606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002283563A Expired - Fee Related CA2283563C (en) | 1997-04-30 | 1998-04-29 | Micromachined opto-flow gas sensor |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US5869749A (en) |
| EP (1) | EP0979401B1 (en) |
| JP (1) | JP4183285B2 (en) |
| CA (1) | CA2283563C (en) |
| DE (1) | DE69806477T2 (en) |
| WO (1) | WO1998049540A1 (en) |
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| CN103681537B (en) * | 2012-09-25 | 2016-08-17 | 精材科技股份有限公司 | Wafer encapsulation body and forming method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0979401A1 (en) | 2000-02-16 |
| EP0979401B1 (en) | 2002-07-10 |
| US5869749A (en) | 1999-02-09 |
| JP2001522463A (en) | 2001-11-13 |
| US5886249A (en) | 1999-03-23 |
| DE69806477D1 (en) | 2002-08-14 |
| DE69806477T2 (en) | 2003-02-20 |
| JP4183285B2 (en) | 2008-11-19 |
| CA2283563A1 (en) | 1998-11-05 |
| WO1998049540A1 (en) | 1998-11-05 |
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