CA2308484A1 - Polymer optical waveguide and method for fabricating the same - Google Patents

Polymer optical waveguide and method for fabricating the same Download PDF

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Publication number
CA2308484A1
CA2308484A1 CA002308484A CA2308484A CA2308484A1 CA 2308484 A1 CA2308484 A1 CA 2308484A1 CA 002308484 A CA002308484 A CA 002308484A CA 2308484 A CA2308484 A CA 2308484A CA 2308484 A1 CA2308484 A1 CA 2308484A1
Authority
CA
Canada
Prior art keywords
polymer
optical waveguide
fabricating
core
polymer optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002308484A
Other languages
French (fr)
Other versions
CA2308484C (en
Inventor
Eun Ji Kim
Jung Hee Kim
Woo Hyuk Jang
Kwan Soo Han
Tae Hyung Rhee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co., Ltd.
Eun Ji Kim
Jung Hee Kim
Woo Hyuk Jang
Kwan Soo Han
Tae Hyung Rhee
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1019980046821A external-priority patent/KR100283955B1/en
Application filed by Samsung Electronics Co., Ltd., Eun Ji Kim, Jung Hee Kim, Woo Hyuk Jang, Kwan Soo Han, Tae Hyung Rhee filed Critical Samsung Electronics Co., Ltd.
Publication of CA2308484A1 publication Critical patent/CA2308484A1/en
Application granted granted Critical
Publication of CA2308484C publication Critical patent/CA2308484C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/1221Basic optical elements, e.g. light-guiding paths made from organic materials

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
  • Drying Of Semiconductors (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

The present invention discloses a polymer optical waveguide and a method of fabricating the same. The polymer optical waveguide comprises a core formed of polymer containing fluoride (F) of a 12-37 wt.% on the basis of total weight of the polymer, and having repeating units with at least two -C(=O)-N-C(=O) functional groups or at least four -N-C(=O)- functional groups; and a cladding in contact with the core and formed of polymer having a refractive index lower than the polymer for forming the core. If a core layer is etched according to the ICP etching method, the etch rate becomes at least three times faster than that of the conventional RIE etching method. Also, etching characteristics including uniformity of an etched plane and vertical profile are improved, thereby reducing damage to an optical waveguide. Thus, the light scattering loss of the optical waveguide can be minimized. Also, the method for fabricating of a polymer optical waveguide according to the present invention is useful for mass production of polymer optical waveguides.
CA002308484A 1997-11-05 1998-11-04 Polymer optical waveguide and method for fabricating the same Expired - Fee Related CA2308484C (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR19970058238 1997-11-05
KR1998/46821 1998-11-02
KR1019980046821A KR100283955B1 (en) 1997-11-05 1998-11-02 Polymer optical waveguide and its manufacturing method
KR1997/58238 1998-11-02
PCT/KR1998/000352 WO1999023514A1 (en) 1997-11-05 1998-11-04 Polymer optical waveguide and method for fabricating the same

Publications (2)

Publication Number Publication Date
CA2308484A1 true CA2308484A1 (en) 1999-05-14
CA2308484C CA2308484C (en) 2004-03-23

Family

ID=26633162

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002308484A Expired - Fee Related CA2308484C (en) 1997-11-05 1998-11-04 Polymer optical waveguide and method for fabricating the same

Country Status (8)

Country Link
US (1) US6233388B1 (en)
EP (1) EP1029251A1 (en)
JP (1) JP3728398B2 (en)
CN (1) CN1122186C (en)
AR (1) AR014388A1 (en)
AU (1) AU735433B2 (en)
CA (1) CA2308484C (en)
WO (1) WO1999023514A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6377732B1 (en) 1999-01-22 2002-04-23 The Whitaker Corporation Planar waveguide devices and fiber attachment
CN1216304C (en) 2001-03-08 2005-08-24 大金工业株式会社 Fluorine-containing material for optical waveguide
US6864041B2 (en) * 2001-05-02 2005-03-08 International Business Machines Corporation Gate linewidth tailoring and critical dimension control for sub-100 nm devices using plasma etching
US6599957B2 (en) 2001-05-07 2003-07-29 Corning Incorporated Photosensitive material suitable for making waveguides and method of making waveguides utilizing this photosensitive optical material
AU2002307120A1 (en) * 2001-05-07 2002-11-18 Corning Incorporated Photosensitive material suitable for making waveguides and method of making waveguides utilizing this photosensitive optical material
US6947651B2 (en) * 2001-05-10 2005-09-20 Georgia Tech Research Corporation Optical waveguides formed from nano air-gap inter-layer dielectric materials and methods of fabrication thereof
US7672560B2 (en) * 2008-05-13 2010-03-02 International Business Machines Corporation Coupling device for use in optical waveguides
KR102548183B1 (en) * 2018-06-29 2023-06-28 주식회사 엘지화학 Method for plasma etching process using faraday box
CN109669234B (en) * 2019-02-27 2020-11-03 南宁旭越光纤有限责任公司 Light guide strip capable of emitting light on whole body and preparation method thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2041133C (en) * 1990-04-27 1995-01-03 Toru Matsuura Polymide optical waveguide
US5225517A (en) * 1991-10-03 1993-07-06 E. I. Du Pont De Nemours And Company Polyimides from bis(4-aminophenoxy) naphthalene and 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride
US5324813A (en) * 1992-07-22 1994-06-28 International Business Machines Corporation Low dielectric constant fluorinated polymers and methods of fabrication thereof
US5317082A (en) * 1992-12-22 1994-05-31 Amoco Corporation Photodefinable optical waveguides
JPH07159738A (en) * 1993-12-06 1995-06-23 Hitachi Chem Co Ltd Composition for active optical waveguide, production of active optical waveguide using the same and active optical waveguide
US5649045A (en) * 1995-12-13 1997-07-15 Amoco Corporation Polymide optical waveguide structures

Also Published As

Publication number Publication date
AR014388A1 (en) 2001-02-28
EP1029251A1 (en) 2000-08-23
AU9765098A (en) 1999-05-24
AU735433B2 (en) 2001-07-05
CN1277677A (en) 2000-12-20
CN1122186C (en) 2003-09-24
WO1999023514A1 (en) 1999-05-14
CA2308484C (en) 2004-03-23
US6233388B1 (en) 2001-05-15
JP2001522059A (en) 2001-11-13
JP3728398B2 (en) 2005-12-21

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