CA2378190A1 - Microfabricated elastomeric valve and pump systems - Google Patents

Microfabricated elastomeric valve and pump systems Download PDF

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Publication number
CA2378190A1
CA2378190A1 CA002378190A CA2378190A CA2378190A1 CA 2378190 A1 CA2378190 A1 CA 2378190A1 CA 002378190 A CA002378190 A CA 002378190A CA 2378190 A CA2378190 A CA 2378190A CA 2378190 A1 CA2378190 A1 CA 2378190A1
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CA
Canada
Prior art keywords
elastomeric
microfabricated
layer
channel
elastomeric layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002378190A
Other languages
French (fr)
Other versions
CA2378190C (en
Inventor
Marc A. Unger
Hou-Pu Chou
Todd A. Thorsen
Axel Scherer
Stephen R. Quake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
California Institute of Technology CalTech
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Individual
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Filing date
Publication date
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Priority to CA 2721172 priority Critical patent/CA2721172C/en
Publication of CA2378190A1 publication Critical patent/CA2378190A1/en
Application granted granted Critical
Publication of CA2378190C publication Critical patent/CA2378190C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/12—Machines, pumps, or pumping installations having flexible working members having peristaltic action
    • F04B43/14—Machines, pumps, or pumping installations having flexible working members having peristaltic action having plate-like flexible members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/50273—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the means or forces applied to move the fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
    • B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
    • B01L3/502738—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by integrated valves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C51/00—Shaping by thermoforming, i.e. shaping sheets or sheet like preforms after heating, e.g. shaping sheets in matched moulds or by deep-drawing; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B5/00—Devices comprising elements which are movable in relation to each other, e.g. comprising slidable or rotatable elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
    • B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12Q—MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
    • C12Q1/00—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
    • C12Q1/68—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions involving nucleic acids
    • C12Q1/6869—Methods for sequencing
    • C12Q1/6874—Methods for sequencing involving nucleic acid arrays, e.g. sequencing by hybridisation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
    • F04B43/04—Pumps having electric drive
    • F04B43/043—Micropumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15C—FLUID-CIRCUIT ELEMENTS PREDOMINANTLY USED FOR COMPUTING OR CONTROL PURPOSES
    • F15C1/00—Circuit elements having no moving parts
    • F15C1/02—Details, e.g. special constructional devices for circuits with fluid elements, such as resistances, capacitive circuit elements; devices preventing reaction coupling in composite elements ; Switch boards; Programme devices
    • F15C1/06—Constructional details; Selection of specified materials ; Constructional realisation of one single element; Canal shapes; Jet nozzles; Assembling an element with other devices, only if the element forms the main part
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F15—FLUID-PRESSURE ACTUATORS; HYDRAULICS OR PNEUMATICS IN GENERAL
    • F15C—FLUID-CIRCUIT ELEMENTS PREDOMINANTLY USED FOR COMPUTING OR CONTROL PURPOSES
    • F15C5/00—Manufacture of fluid circuit elements; Manufacture of assemblages of such elements integrated circuits
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/16—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members
    • F16K1/18—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps
    • F16K1/20—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with pivoted closure-members with pivoted discs or flaps with axis of rotation arranged externally of valve member
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/10—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit
    • F16K11/20—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with two or more closure members not moving as a unit operated by separate actuating members
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K13/00—Other constructional types of cut-off apparatus; Arrangements for cutting-off
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/126—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a diaphragm, bellows, or the like
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00—Subject matter not provided for in other groups of this subclass
    • F16K99/0001—Microvalves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00—Subject matter not provided for in other groups of this subclass
    • F16K99/0001—Microvalves
    • F16K99/0003—Constructional types of microvalves; Details of the cutting-off member
    • F16K99/0015—Diaphragm or membrane valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00—Subject matter not provided for in other groups of this subclass
    • F16K99/0001—Microvalves
    • F16K99/0034—Operating means specially adapted for microvalves
    • F16K99/0042—Electric operating means therefor
    • F16K99/0046—Electric operating means therefor using magnets
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00—Subject matter not provided for in other groups of this subclass
    • F16K99/0001—Microvalves
    • F16K99/0034—Operating means specially adapted for microvalves
    • F16K99/0042—Electric operating means therefor
    • F16K99/0048—Electric operating means therefor using piezoelectric means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00—Subject matter not provided for in other groups of this subclass
    • F16K99/0001—Microvalves
    • F16K99/0034—Operating means specially adapted for microvalves
    • F16K99/0042—Electric operating means therefor
    • F16K99/0051—Electric operating means therefor using electrostatic means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00—Subject matter not provided for in other groups of this subclass
    • F16K99/0001—Microvalves
    • F16K99/0034—Operating means specially adapted for microvalves
    • F16K99/0055—Operating means specially adapted for microvalves actuated by fluids
    • F16K99/0059—Operating means specially adapted for microvalves actuated by fluids actuated by a pilot fluid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00—Additional constructional details
    • B01L2300/08—Geometry, shape and general structure
    • B01L2300/0861—Configuration of multiple channels and/or chambers in a single devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00—Additional constructional details
    • B01L2300/08—Geometry, shape and general structure
    • B01L2300/0887—Laminated structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00—Additional constructional details
    • B01L2300/12—Specific details about materials
    • B01L2300/123—Flexible; Elastomeric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2400/00—Moving or stopping fluids
    • B01L2400/04—Moving fluids with specific forces or mechanical means
    • B01L2400/0403—Moving fluids with specific forces or mechanical means specific forces
    • B01L2400/046—Chemical or electrochemical formation of bubbles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
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    • B01L2400/04—Moving fluids with specific forces or mechanical means
    • B01L2400/0475—Moving fluids with specific forces or mechanical means specific mechanical means and fluid pressure
    • B01L2400/0481—Moving fluids with specific forces or mechanical means specific mechanical means and fluid pressure squeezing of channels or chambers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2400/00—Moving or stopping fluids
    • B01L2400/06—Valves, specific forms thereof
    • B01L2400/0633—Valves, specific forms thereof with moving parts
    • B01L2400/0655—Valves, specific forms thereof with moving parts pinch valves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
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    • B81B2201/054—Microvalves
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
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    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00—Subject matter not provided for in other groups of this subclass
    • F16K2099/0073—Fabrication methods specifically adapted for microvalves
    • F16K2099/0074—Fabrication methods specifically adapted for microvalves using photolithography, e.g. etching
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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    • F16K2099/0076—Fabrication methods specifically adapted for microvalves using electrical discharge machining [EDM], milling or drilling
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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    • F16K2099/0078—Fabrication methods specifically adapted for microvalves using moulding or stamping
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K99/00—Subject matter not provided for in other groups of this subclass
    • F16K2099/0082—Microvalves adapted for a particular use
    • F16K2099/0094—Micropumps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes
    • Y10T137/0402—Cleaning, repairing, or assembling
    • Y10T137/0491—Valve or valve element assembling, disassembling, or replacing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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    • Y10T137/0318—Processes
    • Y10T137/0402—Cleaning, repairing, or assembling
    • Y10T137/0491—Valve or valve element assembling, disassembling, or replacing
    • Y10T137/0497—Fluid actuated or retarded
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/206—Flow affected by fluid contact, energy field or coanda effect [e.g., pure fluid device or system]
    • Y10T137/2224—Structure of body of device
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87249—Multiple inlet with multiple outlet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87917—Flow path with serial valves and/or closures
    • Y10T137/87981—Common actuator
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24744—Longitudinal or transverse tubular cavity or cell

Abstract

A method of fabricating an elastomeric structure, comprising : forming a fir st elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first rece ss extending along a bottom surface of the first elastomeric layer; forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer; bonding the bottom surface of the second elastomeric layer onto a top surfac e of the first elastomeric layer such that a control channel forms in the seco nd recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channe l forms in the first recess between the first elastomeric layer and the planar substrate.

Claims (433)

1. A microfabricated elastomeric structure, comprising:
an elastomeric block formed with microfabricated recesses therein, a portion of the elastomeric block deflectable when the portion is actuated.
2. The microfabricated elastomeric structure of claim 1 wherein the recesses have a width in the range of 0.01 µm to 1000 µm.
3. The microfabricated elastomeric structure of claim 1 wherein the recesses have a width in the range of 0.2 µm to 500 µm.
4. The microfabricated elastomeric structure of claim 1 wherein the recesses have a width in the range of 10 µm to 200 µm.
5. The microfabricated elastomeric structure of claim 1 wherein the recesses have a depth to height ratio of between about 0.1:1 and 100:1.
6. The microfabricated elastomeric structure of claim 1 wherein the recesses have a depth to height ratio of between about 1:1 and 50:1.
7. The microfabricated elastomeric structure of claim 1 wherein the recesses have a depth to height ratio of between about 2:1 and 20:1.
8. The microfabricated elastomeric structure of claim 1 wherein the recesses have a depth of between about 0.01 µm and 1000 µm.
9. The microfabricated elastomeric structure of claim 1 wherein the recesses have a depth of between about 0.2 µm and 250 µm.
10. The microfabricated elastomeric structure of claim 1 wherein the recesses have a depth of between about 2 µm and 20 µm.
11. The microfabricated elastomeric structure of claim 1 wherein the portion has a thickness of between about 0.01 µm and 1000 µm.
12. The microfabricated elastomeric structure of claim 1 wherein the portion has a thickness of between about 0.2 µm and 250 µm.
13. The microfabricated elastomeric structure of claim 1, wherein the portion has a thickness of between about 2 µm and 50 µm.
14. The microfabricated elastomeric structure of claim 1, wherein the portion responds linearly to an applied actuation force.
15. The microfabricated elastomeric structure of claim 1, wherein the portion is actuated at a speed of 100 Hz or greater.
16. The microfabricated elastomeric structure of claim 1, wherein the structure contains substantially no dead volume when the portion is actuated.
17. The microfabricated elastomeric structure of claim 1 wherein:
the recesses comprise a first microfabricated channel and a second microfabricated channel; and the portion comprises an elastomeric membrane deflectable into either of the first or second microfabricated channels when the membrane is actuated.
18. A microfabricated elastomeric structure of claim 1 wherein;
the recesses comprise a first microfabricated channel and a first microfabricated recess; and the portion comprises an elastomeric membrane deflectable into the first microfabricated channel when the membrane is actuated.
19. A microfabricated elastomeric structure of claim 18 wherein the first microfabricated recess comprises a second microfabricated channel.
20. The microfabricated elastomeric structure of claim 18 wherein the membrane is deflectable into the first channel when the first microfabricated recess is pressurized.
21. The microfabricated elastomeric structure of claim 18 wherein the membrane is deflectable into the first channel when the membrane is electrostatically actuated.
22. The microfabricated elastomeric structure of claim 21 wherein:
a first conductive portion is provided in the membrane; and a second conductive portion is disposed on an opposite side of the first channel from the first conductive portion.
23. The microfabricated elastomeric structure of claim 22 wherein at least one of the first and second conductive portions comprises an intrinsically conductive elastomer.
24. The microfabricated elastomeric structure of claim 22 wherein at least one of the first and second conductive portions comprises an elastomer doped with a conductive material.
25. The microfabricated elastomeric structure of claim 24wherein the conductive material comprises fine metal particles.
26. The microfabricated elastomeric structure of claim 24 wherein the conductive material comprises carbon.
27. The microfabricated elastomeric structure of claim 18 wherein the membrane is deflectable into the first channel when the membrane is magnetically actuated.
28. The microfabricated elastomeric structure of claim 27 wherein:
a magnetic portion is provided in the membrane; and means for applying a magnetic field is disposed on an opposite side of the first channel from the magnetic portion.
29. The microfabricated elastomeric structure of claim 27 wherein:
a magnetic portion is provided in the membrane; and means for applying a magnetic field is disposed on the same side of the first channel as the magnetic portion.
30. The microfabricated elastomeric structure of claim 28 wherein the means for applying a magnetic field comprises a magnet.
31. The microfabricated elastomeric structure of claim 28 wherein the means for applying a magnetic field comprises a magnetic coil.
32. The microfabricated elastomeric structure of claim 28 wherein the means for applying a magnetic field comprises a microfabricated magnetic coil.
33. The microfabricated elastomeric structure of claim 28 wherein the magnetic portion comprises an intrinsically magnetic elastomer.
34. The microfabricated elastomeric structure of claim 28 wherein the magnetic portion comprises an elastomer doped with a magnetic material.
35. The microfabricated elastomeric structure of claim 34 wherein the dopant comprises a magnetically polarizable material.
36. The microfabricated elastomeric structure of claim 34 wherein the dopant comprises a permanently magnetized material.
37. The microfabricated elastomeric structure of claim 27 wherein:
a permanently magnetized portion is provided in the membrane; and means for applying a magnetic field is disposed on the same side of the first channel from the permanently magnetized portion.
38. The microfabricated elastomeric structure of claim 27 wherein:
a permanently magnetized portion is provided in the membrane; and means for applying a magnetic field is disposed on an opposite side of the first channel from the permanently magnetized portion.
39. The microfabricated elastomeric structure of claim 19, wherein the first and second microfabricated channels cross over one another, but do not intersect.
40. The microfabricated elastomeric structure of claim 19, wherein the first and second microfabricated channels are disposed at an angle to one another, but do not contact one another.
41. The microfabricated elastomeric structure of claim 19 wherein the first and second microfabricated channels both pass through the elastomeric structure.
42. The microfabricated elastomeric structure of claim 19 wherein the second microfabricated channel passes through the elastomeric structure and the first microfabricated channel passes along a surface of the elastomeric structure.
43. The microfabricated elastomeric structure of claim 42, further comprising:
a planar substrate positioned adjacent the surface of the elastomeric structure along which the first microfabricated channel passes.
44. The microfabricated elastomeric structure of claim 18, further comprising:
second and third recesses separated from the first channel by second and third membranes respectively, which are deflectable into the first channel.
45. The microfabricated elastomeric structure of claim 19, further comprising:
third and fourth channels disposed parallel to the second channel, wherein the second, third and fourth channels are separated from the first channel by first, second and third membranes respectively, deflectable into the first channel.
46. The microfabricated elastomeric structure of claim 45, wherein the first, second, and third membranes are deflectable into the first channel when the second, third and fourth channels, respectively, are pressurized.
47. The microfabricated elastomeric structure of claim 44 wherein the first, second, and third membranes are deflectable into the first channel when the membranes are eletrostatically actuated.
48. The microfabricated elastomeric structure of claim 47, wherein, first, second and third conductive portions are provided in the respective membranes; and fourth, fifth and sixth conductive portions are provided opposite the respective first, second and third conductive portions such that the first and fourth, second and fifth and third and sixth conductive portions are disposed on opposite sides of the first channel.
49. The microfabricated elastomeric structure of claim 44, wherein the membranes are deflectable into the first channel when the membranes are magnetically actuated.
50. The microfabricated elastomeric structure of claim 49, wherein, first, second and third magnetic portions are provided in the respective first, second and third membranes; and means for applying a magnetic field is disposed on an opposite side of the first channel from the magnetic portion.
51. The microfabricated elastomeric structure of claim 49, wherein, first, second and third permanently magnetized portions are provided in the respective first, second and third membranes; and means for applying a magnetic field is disposed on the same side of the first channel from the magnetic portion.
52. The microfabricated elastomeric structure of claim 49, wherein, first, second and third permanently magnetized portions are provided in the respective first, second and third membranes; and means for applying a magnetic field is disposed on an opposite side of the first channel from the magnetic portion..
53. The microfabricated elastomeric structure of claim 19 further comprising a third microfabricated channel parallel to the first channel, the second channel having both wide and narrow portions disposed along its length, with a wide portion being disposed adjacent the first channel and a narrow portion being disposed adjacent the third channel.
54. The microfabricated elastomeric structure of claim 53, wherein pressurizing the second channel causes the membrane separating the second channel from the first channel to be deflected into the first channel but does not cause the membrane separating the third channel from the second channel to be deflected into the third channel.~
55. The microfabricated elastomeric structure of claim 18 wherein the membrane has a curved bottom surface such that the top of the first channel is curved.
56. The microfabricated elastomeric structure of claim 18 wherein at least one of a bottom surface of the membrane and a top surface of the first channel bear protrusions.
57. A microfabricated elastomeric structure comprising:
an elastomeric block;
a first channel and a second channel separated by a separating portion of the elastomeric structure; and a microfabricated recess in the elastomeric block adjacent to the separating portion such that the separating portion may be actuated to deflect into the microfabricated recess.
58. The microfabricated elastomeric structure of claim 57 wherein the microfabricated recess experiences a reduced pressure which causes the separating portion to deflect into the microfabricated recess.
59. The microfabricated elastomeric structure of claim 57 wherein the separating portion is deflectable into the microfabricated recess when the separating portion is electrostatically actuated.
60. The microfabricated elastomeric structure of claim 59 wherein:
a first conductive portion is provided in the separating portion; and a second conductive portion is disposed on an opposite side of the microfabricated recess from the first conductive portion.
61. The microfabricated elastomeric structure of claim 57 wherein the separating portion is deflectable into the first channel when the separating portion is magnetically actuated.
62. The microfabricated elastomeric structure of claim 61 wherein:
a first magnetic portion is provided in the separating portion; and means for producing a magnetic field is disposed on an opposite side of the microfabricated recess from the first magnetic portion.
63. The microfabricated elastomeric structure of claim 61 wherein:
a first permanently magnetized portion is provided in the separating portion; and means for producing a magnetic field is disposed on an opposite side of the microfabricated recess from the first permanently magnetized portion.
64. The microfabricated elastomeric structure of claim 61 wherein:
a first permanently magnetized portion is provided in the separating portion; and means for producing a magnetic field is disposed on the same side of the microfabricated recess from the first permanently magnetized portion.
65. The elastomeric structure of claim 57, further comprising a planar substrate positioned adjacent a surface of the elastomeric structure along which the first and second channels pass.
66. The microfabricated elastomeric structure of claim 57 wherein deflection of the separating portion opens a passageway between the first and second channels.
67. The elastomeric structure of claim 57, wherein first recess has a wide segment disposed adjacent to the portion.
68. The microfabricated elastomeric structure of claim 1 wherein the elastomeric structure comprises a material selected from the group consisting of:
polyisoprene, polybutadiene, polychloroprene, polyisobutylene, poly(styrene-butadiene-styrene), the polyurethanes, and silicones.
69. The microfabricated elastomeric structure of claim 1 wherein the elastomeric structure comprises a material selected from the group consisting of:
poly(bis(fluoroalkoxy)phosphazene) (PNF, Eypel-F), poly(carborane-siloxanes)(Dexsil), poly(acrylonitrile-butadiene)(nitrite rubber), poly(1-butene), poly(chlorotrifluoroethylene-vinylidene fluoride) copolymers (Kel-F), poly(ethyl vinyl ether), poly(vinylidene fluoride), poly(vinylidene fluoride -hexafluoropropylene) copolymer (Viton).
70. The microfabricated elastomeric structure of claim 1 wherein the elastomeric structure comprises a material selected from the group consisting of:
elastomer compositions of polyvinylchloride (PVC), polysulfone, polycarbonate, polymethylinethacrylate (PMMA), or polytertrafluoroethylene (Teflon).
71. The microfabricated elastomeric structure of claim 68 wherein the elastomeric structure comprises a material selected from the group consisting of:
polydimethylsiloxane (PDMS) such as General Electric RTV 615, Dow Chemical Corp. Sylgard 182, 184, or 186, and aliphatic urethane diacrylates such as Ebecryl 270 or Irr 245 from UCB Chemicals.
72. The microfabricated elastomeric structure of claim 43 wherein the planar substrate is glass.
73. The microfabricated elastomeric structure of claim 43 wherein the planar substrate is an elastomeric material.
74. A microfabricated elastomeric structure of claim 18 wherein;
the first microfabricated channel is T-shaped and includes a stem in fluid communication with a first branch and a second branch;
the elastomeric mambrane overlies and is deflectable into the first branch;
and the elastomeric structure further comprises a second recess overlying the second branch such that a second elastomeric membrane is deflectable into the second branch when the membrane is actuated, such that a flow of fluid into the stem may be directed into one of the first branch and the second branch by actuating the second elastomeric membrane and the first elastomeric membrane, respectively.
METHODS OF ACTUATING
75. A method of actuating an elastomeric structure comprising:
providing an elastomeric block formed with first and second microfabricated recesses therein, the first and second microfabricated recesses separated by a membrane portion of the elastomeric block deflectable into one of the first and second recesses in response to an actuation force; and applying an actuation force to the membrane portion such that the membrane portion is deflected into one of the first and the second recesses.
76. The method of claim 75 wherein the step of applying an actuation force comprises applying a pressure to the second microfabricated recess to deflect the membrane portion into the first microfabricated recess.
77. The method of claim 75 wherein the step of applying an actuation force comprises applying an electrical field to attract a conductive portion of the membrane into the first microfabricated recess.
78. The method of claim 75 wherein the step of applying an actuation force comprises applying a magnetic field to attract a magnetically polarizable portion of the membrane into the first microfabricated recess.
79. The method of claim 75 wherein the step of applying an actuation force comprises applying a magnetic field to attract a permanently magnetized portion of the membrane into the first microfabricated recess.
80. The method of claim 75 wherein the step of applying an actuation force comprises applying a magnetic field to repel a permanently magnetized portion of the membrane into the first microfabricated recess.
81. A method of controlling fluid or gas flow through an elastomeric structure comprising:
providing an elastomeric structure having a first microfabricated channel and a first microfabricated recess, the first microfabricated channel and the first microfabricated recess separated by a membrane deflectable into the first channel;
passing a fluid or gas flow through the first channel; and deflecting the membrane into the first channel.
82. The method of claim 81 wherein the membrane is deflected into the first channel by increasing pressure within the microfabricated recess.
83. The method of claim 82 wherein pressure is increased in the first microfabricated recess by a chemical reaction occurring with in the first microfabricated recess.
84. The method of claim 83 wherein the chemical reaction is electrolysis.
85. The method of claim 82 wherein the increased pressure is caused by electrostatic actuation of a bellows structure in fluid communication with the first microfabricated recess.
86. The method of claim 83 wherein the increased pressure is caused by magnetic actuation of a bellows structure in fluid communication with the first microfabricated recess.
87. The method of claim 82 wherein the increased pressure within the first microfabricated recess arises due to an electrokinetic flow within the first microfabricated recess.
88. The method of claim 81, further comprising:
providing a first conductive portion in the membrane;
providing a second conductive portion such that the first and second conductive portions are disposed on opposite sides of the first channel; and applying a voltage to the first and second conductive portions such that the membrane is deflected into the first channel by an attractive electrostatic force.
89. The method of claim 81 further comprising:
providing a magnetically polarizable portion in the membrane; and applying a magnetic field across the first channel such that the membrane is deflected into the first channel by an attractive magnetic force.
90. The method of claim 81 further comprising:
providing a permanently magnetized portion in the membrane; and applying a magnetic field across the first channel such that the membrane is deflected into the first channel by an attractive magnetic force.
91. The method of claim 81 further comprising:
providing a permanently magnetized portion in the membrane; and applying a magnetic field such that the membrane is deflected into the first channel by a repulsive magnetic force.
92. A method of controlling fluid or gas flow through an elastomeric structure comprising:
providing an elastomeric block, the elastomeric block having first, second, and third microfabricated recesses, and the elastomeric block having a first microfabricated channel passing therethrough, the first, second and third microfabricated recesses separated from the first channel by respective first, second and third membranes deflectable into the first channel; and deflecting the first, second and third membranes into the first channel in a repeating sequence to peristaltically pump a flow of fluid through the first channel.
93. The method of claim 92 wherein the first, second and third membranes are deflected into the first channel by increasing pressure within the first, second and third channels.
94. The method of claim 92 further comprising:
providing first, second and third conductive portions in respective first, second and third membranes;
providing a fourth, fifth and sixth second conductive portion opposite the respective first, second and third conductive portions such that the first and fourth, second and fifth, and third and sixth conductive portions are disposed on opposite sides of the first channel; and applying in a repeated sequence voltage to the first and fourth, second and fifth, and third and sixth conductive portions such that the membranes are deflected into the first channel by an attractive electrostatic force.
95. The method of claim 92 further comprising:
providing first, second and third magnetically polarizable portions in the first, second and third membranes, respectively;
applying in a repeated sequence a magnetic field to the first, second, and third magnetically polarizable portions such that the first, second, and third membranes are deflected into the first channel by an attractive magnetic force.
96. The method of claim 92 further comprising:
providing first, second and third permanently magnetized portions in the first, second and third membranes, respectively;

applying in a repeated sequence a magnetic field to the first, second, and third permanently magnetized portions such that the first, second, and third membranes are deflected into the first channel by an attractive magnetic force.
97. The method of claim 92 further comprising:
providing first, second and third permanently magnetized portions in the first, second and third membranes, respectively;
applying in a repeated sequence a magnetic field to the first, second, and third permanently magnetized portions such that the first, second, and third membranes are deflected into the first channel by an repulsive magnetic force.
98. A method of controlling fluid or gas flow through an elastomeric structure comprising:
providing an elastomeric block having a first microfabricated channel and a second microfabricated channel separated by a separating portion, a first microfabricated recess adjacent to the separating portion;
passing a fluid or gas flow through the first channel; and deflecting the separating portion into the first microfabricated recess, thereby creating a passageway between the first microfabricated channel and the second microfabricated channel.
99. The method of claim 98 wherein the separating portion is deflected into the first microfabricated recess by decreasing pressure within the first microfabricated recess.
100. The method of claim 98, further comprising:
providing a first conductive portion in the separating portion;
providing a second conductive portion such that the first and second conductive portions are disposed on opposite sides of the first microfabricated recess; and applying a voltage to the first and second conductive portions such that the separating portion is deflected into the first microfabricated recess by an attractive electrostatic force.
101. The method of claim 98 further comprising:
providing a magnetically polarizable portion in the separating portion; and applying a magnetic field across the first microfabricated recess such that the membrane is deflected into the first microfabricated recess by an attractive magnetic force.
102. The method of claim 98 further comprising:
providing a permanently magnetized portion in the separating portion; and applying a magnetic field across the first microfabricated recess such that the membrane is deflected into the first microfabricated recess by an attractive magnetic force.
103. The method of claim 98 further comprising:
providing a permanently magnetized portion in the membrane; and applying a magnetic field such that the membrane is deflected into the first microfabricated recess by a repulsive magnetic force.
104. A method of actuating a microfabricated elastomeric structure comprising:
providing an elastomeric structure having first and second microfabricated conductive portions, at least one of the first and the second microfabricated conductive portions deflectable when an electrical charge is supplied to the two microfabricated conductive portions; and applying a voltage to the two microfabricated conductive portions, thereby generating an attractive force therebetween such that at least one of the microfabricated conductive portions is deflected.
105. A method of actuating a microfabricated elastomeric structure comprising:
providing an elastomeric structure having a magnetic portion deflectable when a magnetic field is applied; and applying a magnetic field to the magnetic portion thereby generating an actuating force on the magnetic portion such that the magnetic portion is deflected.
106. The use of a deflectable membrane to control flow of a fluid in a microfabricated channel of an elastomeric structure.
107. The use of elastomeric layers to make a microfabricated elastomeric device containing a microfabricated movable portion.
108. The use of an elastomeric material to make a microfabricated valve or pump.
109. A method of microfabricating an elastomeric structure, comprising:
microfabricating a first elastomeric layer;
microfabricating a second elastomeric layer;
positioning the second elastomeric layer on top of the first elastomeric layer; and bonding a bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer.
110. The method of claim 109 wherein the first and second elastomeric layers are microfabricated by replication molding.
111. The method of claim 109 wherein the first and second elastomeric layers are microfabricated by laser cutting.
112. The method of claim 109 wherein the first and second elastomeric layers are microfabricated by chemical etching.
113. The method of claim 113 wherein the first and second elastomeric layers are microfabricated by sacrificial layer methods.
114. The method of claim 109 wherein the first and second elastomeric layers are microfabricated by injection molding.
115. The method of claim 109 wherein:
the first elastomeric layer is fabricated on a first micromachined mold having at least one raised protrusion which forms at least one recess in the bottom of the first elastomeric layer; and the second elastomeric layer is fabricated on a second micromachined mold having at least one raised protrusion which forms at least one recess in the bottom of the first elastomeric layer.
116. The method of claim 115 wherein the first micromachined mold has at least one first raised protrusion which forms at least one first channel in the bottom surface of the first elastomeric layer.
117. The method of claim 116 wherein the second micromachined mold has at least one second raised protrusion which forms at least one second channel in the bottom surface of the second elastomeric layer.
118. The method of claim 117 wherein a bottom surface of the second elastomeric layer is bonded onto a top surface of the first elastomeric layer such that the at least one second channel is enclosed between the first and second elastomeric layers.
119. The method of claim 116 further comprising positioning the first elastomeric layer on top of a planar substrate such that the at least one first channel is enclosed between the first elastomeric layer and the planar substrate.
120. The method of claim 116 wherein a hermetic seal is formed between the bottom of the first layer and the top of the planar substrate.
121. The method of claim 109 further comprising:
microfabricating an n th elastomeric layer; and bonding the bottom surface of the (n-1)th elastomeric layer onto a top surface of the n th elastomeric layer.
122. The method of claim 109 further comprising:
sequential addition of further elastomeric layers, whereby each layer is added by:
microfabricating a successive elastomeric layer; and bonding the bottom surface of the successive elastomeric layer onto a top surface of the elastomeric structure.
123. A method of microfabricating an elastomeric structure comprising:
providing a first microfabricated elastomeric structure;
providing a second microfabricated elastomeric structure; and bonding a surface of the first elastomeric structure onto a surface of the second elastomeric structure.
124. The method of claim 109 wherein at least one of the first elastomeric layer and the second elastomeric layer are fabricated from a material selected from the group consisting of:

elastomeric compositions of polyisoprene, polybutadiene, polychloroprene, polyisobutylene, poly(styrene-butadiene-styrene), the polyurethanes, and silicones.
125. The method of claim 109 wherein at least one of the first elastomeric layer and the second elastomeric layer are fabricated from a material selected from the group consisting of:
poly(bis(fluoroalkoxy)phosphazene) (PNF, Eypel-F), poly(carborane-siloxanes)(Dexsil), poly(acrylonitrile-butadiene)(nitrite rubber), poly(1-butene), poly(chlorotrifluoroethylene-vinylidene fluoride)copolymers(Kel-F), poly(ethyl vinyl ether), poly(vinylidene fluoride), poly(vinylidene fluoride -hexafluoropropylene) copolymer(Viton).
126. The method of claim 109 wherein at least one of the first elastomeric layer and the second elastomeric layer are fabricated from a composition selected from the group consisting of:
polyvinylchloride(PVC), polysulfone, polycarbonate, polymethylmethacrylate (PMMA), or polytertrafluoroethylene(Teflon).
127. The method of claim 124 wherein at least one of the first elastomeric layer and the second elastomeric layer are fabricated from a material selected from the group consisting of polydimethylsiloxane (PDMS) such as General Electric RTV 615, Dow Chemical Corp. Sylgard 182, 184, or 186, and aliphatic urethane diacrylates such as Ebecryl 270 or Irr 245 from UCB Chemicals.
128. The method of claim 109 wherein the first elastomeric layer has an excess of a first chemical species and the second elastomeric layer has an excess of a second chemical species.
129. The method of claim 128 wherein the elastomeric layers comprise thermoset elastomers which are bonded together by heating above an elastic/plastic transition temperature of at least one of the first and second elastomeric layers.
130. The method of claim 128 wherein the first and second chemical species comprise different molecules.
131. The method of claim 128 wherein the first and second chemical species comprise different polymer chains.
132. The method of claim 128 wherein the first and second chemical species comprise different side groups on the same type of polymer chains.
133. The method of claim 128 wherein the first chemical species forms bonds with the second chemical species when at least one chemical species is activated.
134. The method of claim 133 wherein the at least one chemical species is activated by light.
135. The method of claim 133 wherein the at least one chemical species is activated by heat.
136. The method of claim 133 wherein the at least one chemical species is activated by the addition of a third chemical species.
137. The method of claim 136 wherein the at least one chemical species diffuses through the elastomer structure.
138. The method of claim 128 wherein the first and second elastomeric layers are formed of different elastomeric materials.
139. The method of claim 128 wherein the first and second elastomeric layers are initially composed of the same elastomeric material, and an additional elastomeric material is added to one of the first and second layers.
140. The method of claim 128 wherein the first and second elastomeric layers are composed of the same component materials, but differ in the ratio in which the component materials are mixed together.
141. The method of claim 140 wherein each of the elastomeric layers is made of two-part silicone.
142. The method of claim 141 wherein each elastomeric layer comprises an addition cure elastomer system.
143. The method of claim 141 wherein the silicone comprises two different reactive groups and a catalyst.
144. The method of claim 143 wherein the first reactive group comprises silicon hydride moieties, the second reactive group comprises vinyl moieties, and the catalyst comprises platinum.
145. The method of claim 144 wherein each elastomeric layer comprises G.E. RTV 615.
146. The method of claim 145 wherein the first elastomeric layer is mixed with a ratio of less than 10A:1B (excess Si-H groups) and the second elastomeric layer is mixed with a ratio of more than 10A: 1B (excess vinyl groups).
147. The method of claim 146 wherein the first elastomeric layer has a ratio of 3A:1B (excess Si-H groups) and the second elastomeric layer has a ratio of 30A:1B (excess vinyl groups).
148. The method of claim 128 wherein each of the elastomeric layers are made of polyurethane.
149. The method of claim 148 wherein the polyurethane comprises Ebecryl 270 or Irr 245 from UCB Chemicals.
150. The method of claim 109 wherein the first and second elastomeric layers are made of the same material.
151. The method of claim 150 wherein at least one of the first and second elastomeric layers are incompletely cured.
152. The method of claim 150 wherein both the first and second elastomeric layers comprise a crosslinking agent.
153. The method of claim 152 wherein the crosslinking agent is activated by light.
154. The method of claim 152 wherein the crosslinking agent is activated by heat.
155. The method of claim 152 wherein the crosslinking agent is activated by an additional chemical species.
156. The method of claim 150 wherein the elastomeric layers comprise thermoset elastomers which are bonded together by heating above an elastic/plastic transition temperature of at least one of the first and second elastomeric layers.
157. The method of claim 109 wherein the first and second layers are bonded by a layer of adhesive.
158. The method of claim 157 wherein the adhesive comprises an uncured elastomer which is cured to bond the first and second elastomeric layers together.
159. The method of claim 158 wherein the adhesive comprises the same material as at least one of the first or second elastomeric layers.
160. The method of claim 109 wherein at least one of the elastomeric layers further comprises a conductive portion.
161. The method of claim 160 wherein the conductive portion is made by metal deposition.
162. The method of claim 161 wherein the conductive portion is made by sputtering.
163. The method of claim 161 wherein the conductive portion is made by evaporation.
164. The method of claim 161 wherein the conductive portion is made by electroplating.
165. The method of claim 161 wherein the conductive portion is made by electroless plating.
166. The method of claim 161 wherein the conductive portion is made by chemical epitaxy.
167. The method of claim 160 wherein the conductive portion is made by made by carbon deposition.
168. The method of claim 167 wherein the conductive portion is made by mechanically rubbing material directly onto the elastomeric layer.
169. The method of claim 167 wherein the conductive portion is made by exposing the elastomer to a solution of carbon particles in solvent.
170. The method of claim 169 wherein the solvent causes swelling of the elastomer.
171. The method of claim 169 wherein the elastomer comprises silicone and the solvent comprises a chlorinated solvent.
172. The method of claim 167 wherein the conductive portion is made by electrostatic deposition.
173. The method of claim 167 wherein the conductive portion is made by a chemical reaction producing carbon.
174. The method of claim 160 wherein the conductive portion is made by:
patterning a thin layer of metal on a flat substrate;
adhering the elastomeric layer onto the flat substrate; and peeling the elastomeric layer off the flat substrate, such that the metal sticks to the elastomeric layer and comes off the flat substrate.
175. The method of claim 174 wherein the adhesion of the metal to the flat substrate is weaker than the adhesion of the metal to the elastomer.
176. Method of claim 160 wherein the conductive portion is patterned.
177. The method of claim 176 wherein the conductive portion is patterned by masking a surface of the conductive portion with a patterned sacrificial material.
178. The method of claim 176 wherein the conductive portion is patterned by:
depositing a sacrificial material on one of the elastomeric layers, patterning the sacrificial material, depositing a thin coat of conductive material thereover, and removing the sacrificial material.
179. The method of claim 176 wherein the conductive portion is patterned by masking the surface with a shadow mask.
180. The method of claim 179 wherein the conductive portion is patterned by:
positioning a shadow mask adjacent to an elastomeric layer;
depositing a thin coat of conductive material through apertures in the shadow mask; and removing the shadow mask.
181. The method of claim 176 wherein the conductive portion is patterned by etching.
182. The method of claim 181 wherein the conductive portion is patterned by:
depositing a mask layer onto one of the elastomeric layers;
patterning the mask layer;
etching the conductive portion through holes in the mask layer; and removing the mask layer.
183. The method of claim 160 wherein the conductive portion is produced by doping the elastomer with a conductive material.
184. The method of claim 183 wherein the conductive material comprises a metal.
185. The method of claim 183 wherein the conductive material comprises carbon.
186. The method of claim 183 wherein the conductive material comprises a conductive polymer.
187. The method of claim 183 wherein the elastomer used is inherently conductive.
188. The method of claim 160 further comprising sealing the microfabricated elastomeric structure onto a flat substrate, wherein the flat substrate comprises at least one conductive portion.
189. The method of claim 188 wherein the flat substrate is covered by an insulating layer.
190. The method of claim 54 wherein at least one of the first or second elastomeric layers comprises a magnetic portion.
191. The method of claim 190 wherein the magnetic portion is composed of an intrinsically magnetic elastomer.
192. The method of claim 190 wherein the magnetic portion is composed of an elastomer doped with a magnetic material.
193. The method of claim 192 wherein the magnetic dopant is a magnetically polarizeable material.
194. The method of claim 193 wherein the magnetic dopant is fine iron particles.
195. The method of claim 192 wherein the magnetic dopant is a permanently magnetized material.
196. The method of claim 195 wherein the permanently magnetized material is NdFeB or SmCo magnetized by exposure to a high magnetic field.
197. The method of claim 190 wherein pieces of magnetic material are relatively large compared with the size of the magnetic portion are incorporated into the elastomer.
198. The method of claim 197 wherein the magnetic material is a magnetically polarizeable material.
199. The method of claim 198 wherein the magnetic material is iron.
200. The method of claim 197 wherein the magnetic material is permanently magnetized.
201. The method of claim 200 wherein the permanently magnetized material is NdFeB or SmCo magnetized by exposure to a high magnetic field.
202. The method of claim 190 further comprising providing a structure capable of generating a switchable magnetic field, disposed adjacent to said magnetic portion, such that the application of said magnetic field to the elastomeric structure causes the generation of a force on the magnetic portion.
203. The method of claim 202 wherein the structure generating the magnetic field is a magnet coil.
204. The method of claim 202 wherein the structure generating the magnetic field is a substrate with at least one microfabricated magnet coil disposed thereon.
205. A method of microfabricating an elastomeric structure, comprising:
forming a first elastomeric layer on a substrate;
curing the first elastomeric layer;
patterning a first sacrificial layer over the first elastomeric layer;
forming a second elastomeric layer over the first elastomeric layer, thereby encapsulating the first patterned sacrificial layer between the first and second elastomeric layers;
curing the second elastomeric layer; and removing the first patterned sacrificial layer selective to the first elastomeric layer and the second elastomeric layer, thereby forming at least one first recess between the first and second layers of elastomer.
206. The method of claim 205 further comprising patterning a second sacrificial layer over the substrate prior to forming the first elastomeric layer, such that the second patterned sacrificial layer is removed during removal of the first patterned sacrifical layer to form at least one recess along a bottom of the first elastomeric layer.
207. The method of claim 205 further comprising:
patterning a second sacrificial layer over the second elastomeric layer;
forming a third elastomeric layer over the second elastomeric layer, thereby encapsulating the second patterned sacrificial layer between the second and third elastomeric layers; and curing the third elastomeric layer such that the second patterned sacrificial layer is removed during removal of the first patterned sacrifical layer to form a recess between the second and third elastomeric layers.
208. The method of claim 205 further comprising:
patterning an (n-1)th sacrifical layer over the nth elastomer layer;
forming a (n+1)th elastomeric layer over the (n-1)th patterned sacrifical layer; and bonding the bottom surface of the (n-1)th elastomeric layer onto a top surface of the n th elastomeric layer thereby encapsulating the (n-1)th patterned sacrificial layer between the nth and (n+1)th elastomeric layers; and curing the (n+1) elastomeric layer such that the (n-1)th patterned sacrificial layer is removed during removal of the first patterned sacrifical layer to form a recess between the nth and (n+1)th elastomeric layers.
209. The method of claim 205 wherein the first patterned sacrificial layer comprises photoresist.
210. The method of claim 205 wherein the at least one of the first and second elastomeric layers are formed by spincoating.
211. The method of claim 205 wherein the first recess comprises a channel.
212. The method of claim 205 further comprising bonding the first elastomeric layer to the second elastomeric layer.
213. The method of claim 207 further comprising:
bonding the first elastomeric layer to the second elastomeric layer; and bonding the third elastomeric layer to the second elastomeric layer.
214. The method of claim 205 wherein at least one of the first elastomeric layer and the second elastomeric layer are formed from a material selected from the group consisting of:
polyisoprene, polybutadiene, polychloroprene, polyisobutylene, poly(styrene-butadiene-styrene), the polyurethanes, and silicones.
215. The method of claim 205 wherein at least one of the first elatomeric layer and the second elastomeric layer are formed from a material selected from the group consisting of:
poly(bis(fluoroalkoxy)phosphazene) (PNF, Eypel-F), poly(carborane-siloxanes) (Dexsil), poly(acrylonitrile-butadiene) (nitrile rubber), poly(1-butene), poly(chlorotrifluoroethylene-vinylidene fluoride) copolymers (Kel-F), poly(ethyl vinyl ether), poly(vinylidene fluoride), poly(vinylidene fluoride -hexafluoropropylene) copolymer (Viton).
216. The method of claim 205 wherein at least one of the first elastomeric layer and the second elastomeric structure are fabricated from a material selected from the group consisting of:
elastomeric compositions of polyvinylchloride (PVC), polysulfone, polycarbonate, polymethylmethacrylate (PMMA), or polytertrafluoroethylene (Teflon).
217. The method of claim 214 wherein the elastomeric structure is fabricated from a material selected from the group consisting of:
polydimethylsiloxane (PDMS) such as General Electric RTV 615, Dow Chemical Corp. Sylgard 182, 184, or 186, and aliphatic urethane diacrylates such as Ebecryl 270 or Irr 245 from UCB Chemicals.
218. The method of claim 212 wherein the bonding occurs by interpenetration and reaction of the polymer chains of the uncured elastomer with the polymer chains of the cured elastomer.
219. The method of claim 212 wherein the first elastomeric layer has an excess of a first chemical species and the second elastomeric layer has an excess of a second chemical species.
220. The method of claim 219 wherein the first and second chemical species comprise different molecules.
221. The method of claim 219 wherein the first and second chemical species comprise different polymer chains.
222. The method of claim 219 wherein the first and second chemical species comprise different side groups on the same type of polymer chains.
223. The method of claim 219 wherein the first chemical species forms bonds with the second chemical species when at least one chemical species is activated.
224. The method of claim 223 wherein the at least one chemical species is activated by light.
225. The method of claim 223 wherein the at least one chemical species is activated by heat.
226. The method of claim 223 wherein the at least one chemical species is activated by the addition of a third chemical species.
227. The method of claim 226 wherein the at least one chemical species diffuses through the elastomer structure.
228. The method of claim 219 wherein the first and second elastomeric layers are formed of different elastomeric materials.
229. The method of claim 219 wherein the first and second elastomeric layers are initially composed of the same elastomeric material, and an additional elastomeric material is added to one of the first and second layers.
230. The method of claim 219 wherein the first and second elastomeric layers are composed of the same component materials but differ in the ratio in which the component materials are mixed together.
231. The method of claim 230 wherein each of the elastomeric layers is made of two-part silicone.
232. The method of claim 231 wherein each elastomeric layer comprises an addition cure elastomer system.
233. The method of claim 231 wherein the silicone comprises two different reactive groups and a catalyst.
234. The method of claim 233 wherein the first reactive group comprises silicon hydride moieties, the second reactive group comprises vinyl moieties, and the catalyst comprises platinum.
235. The method of claim 234 wherein each elastomeric layer comprises G.E. RTV 615.
236. The method of claim 235 wherein the first elastomeric layer is mixed with a ratio of less than 10A:1B (excess Si-H groups) and the second elastomeric layer is mixed with a ratio of more than 10A:1B (excess vinyl groups).
237. The method of claim 229 wherein the first elastomeric layer has a ratio of 3A:1B (excess Si-H groups) and the second elastomeric layer has a ratio of 30A:1B (excess vinyl groups).
238. The method of claim 219 wherein each of the elastomeric layers are made of polyurethane.
239. The method of claim 238 wherein the polyurethane comprises Ebecryl 270 or Irr 245 from UCB Chemicals.
240. The method of claim 212 wherein the first and second elastomeric layers are made of the same material.
241. The method of claim 240 wherein at least one of the first and second elastomeric layers are incompletely cured.
242. The method of claim 240 wherein the first and second elastomeric layers include a crosslinking agent.
243. The method of claim 242 wherein the crosslinking agent is activated by light.
244. The method of claim 242 wherein the crosslinking agent is activated by heat.
245. The method of claim 242 wherein the crosslinking agent is activated by an additional chemical species.
246. The method of claim 212 wherein the elastomeric layers comprise thermoset elastomers which are bonded together by heating above an elastic/plastic transition temperature of at least one of the first and second elastomeric layers.
247. The method of claim 205 wherein at least one of the first elastomeric layer and the second elastomeric layer further comprise a conductive portion.
248. The method of claim 247 wherein the conductive portion is made by metal deposition.
249. The method of claim 247 wherein the conductive portion is made by sputtering.
250. The method of claim 247 wherein the conductive portion is made by evaporation.
251. The method of claim 248 wherein the conductive portion is made by electroplating.
252. The method of claim 248 wherein the conductive portion is made by electroless plating.
253. The method of claim 248 wherein the conductive portion is made by chemical epitaxy.
254. The method of claim 247 wherein the conductive portion is made by made by carbon deposition.
255. The method of claim 254 wherein the conductive portion is made by mechanically rubbing material directly onto the elastomeric layer.
256. The method of claim 254 wherein the conductive portion is made by exposing the elastomer to a solution of carbon particles in solvent.
257. The method of claim 256 wherein the solvent causes swelling of the elastomer.
258. The method of claim 256 wherein the elastomer comprises silicone and the solvent comprises a chlorinated solvent.
259. The method of claim 254 wherein the conductive portion is made by electrostatic deposition.
260. The method of claim 254 wherein the conductive portion is made by a chemical reaction producing carbon.
261. The method of claim 247 wherein the conductive portion is made by:
patterning a thin layer of metal on a flat substrate;
adhering the elastomeric layer onto the flat substrate; and peeling the elastomeric layer off the flat substrate, such that the metal sticks to the elastomeric layer and comes off the flat substrate.
262. The method of claim 261 wherein the adhesion of the metal to the flat substrate is weaker than the adhesion of the metal to the elastomer.
263. Method of claim 247 wherein the conductive portion is patterned.
264. The method of claim 262 wherein the conductive portion is patterned by masking a surface of the conductive portion with a patterned sacrificial material.
265. The method of claim 262 wherein the conductive portion is patterned by:
depositing a sacrificial material on one of the elastomeric layers, patterning the sacrificial material, depositing a thin coat of conductive material thereover, and removing the sacrificial material.
266. The method of claim 262 wherein the conductive portion is patterned by masking the surface with a shadow mask.
267. The method of claim 266 wherein the conductive portion is patterned by:
positioning a shadow mask adjacent to elastomeric layer;
depositing a thin coat of conductive material through apertures in the shadow mask; and removing the shadow mask.
268. The method of claim 262 wherein the conductive portion is patterned by etching.
269. The method of claim 268 wherein the conductive portion is patterned by:
depositing a mask layer onto one of the elastomeric layers;
patterning the mask layer;
etching the conductive portion through holes in the mask layer; and removing the mask layer.
270. The method of claim 250 wherein the conductive portion is produced by doping the elastomer with a conductive material.
271. The method of claim 270 wherein the conductive material comprises a metal.
272. The method of claim 270 wherein the conductive material comprises carbon.
273. The method of claim 270 wherein the conductive material comprises a conductive polymer.
274. The method of claim 269 wherein the elastomer is inherently conductive.
275. The method of claim 247 further comprising sealing the microfabricated structure on a flat surface, wherein the flat surface comprises at least one conductive portion.
276. The method of claim 275 wherein the flat substrate is covered by an insulating layer.
277. The method of claim 205 wherein at least one of the first or second elastomeric layers comprises a magnetic portion.
278. The method of claim 277 wherein the magnetic portion is composed of an intrinsically magnetic elastomer.
279. The method of claim 277 wherein the magnetic portion is composed of an elastomer doped with a magnetic material.
280. The method of claim 279 wherein the magnetic dopant is a magnetically polarizeable material.
281. The method of claim 280 wherein the magnetic dopant is fine iron particles.
282. The method of claim 279 wherein the magnetic dopant is permanently magnetized.
283. The method of claim 282 wherein the magnetic dopant is NdFeB or SmCo magnetized by exposure to a high magnetic field.
284. The method of claim 277 wherein pieces of magnetic material are relatively large compared with the size of the magnetic portion are incorporated into the elastomer.
285. The method of claim 284 wherein the magnetic material is a magnetically polarizeable material.
286. The method of claim 285, wherein the magnetic material is iron.
287. The method of claim 284, wherein the magnetic material is permanently magnetized.
288. The method of claim 287, wherein the permanently magnetic material is NdFeB or SmCo magnetized by exposure to a high magnetic field.
289. The method of claim 286, further comprising providing a structure capable of generating a switchable magnetic field, disposed adjacent to said magnetic portion, such that the application of said magnetic field to the elastomeric structure causes the generation of a force on the magnetic portion.
290. The method of claim 286, wherein the structure generating the magnetic field is a magnet coil.
291. The method of claim 286, wherein the structure generating the magnetic field is a substrate with at least one microfabricated magnet coil disposed thereon.
292. A method of fabricating an elastomeric structure, comprising:
forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer;
forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer;
bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
293. The method of claim 292, wherein the first and second elastomeric layers are each casted on top of the micromachined molds.
294. The method of claim 292, wherein the first and second recesses extend fully across the respective bottom surfaces of the first and second elastomeric layers.
295. The method of claim 292, wherein the recesses formed on the first and second elastomeric layers have a width to depth ratio of about 10 to 1.
296. The method of claim 295, wherein the recesses have a width of about 100 um and a depth of about 10 um.
297. The method of claim 292, wherein the first elastomeric layer has a thickness of about 40 um.
298. The method of claim 29, wherein the portion of the first elastomeric layer disposed between the first and second recesses has a thickness of about 30 um.
299. The method of claim 292, wherein the second elastomeric layer has a thickness of about 4 mm.
300. The method of claim 292, wherein the thickness of the second elastomeric layer is about 100 times the thickness of the first elastomeric layer.
301. The method of claim 412, wherein bonding the bottom surface of the second elastomeric layer onto the top surface of the first elastomeric layer comprises a soft lithography process.
302. The method of claim 412, wherein bonding the bottom surface of the second elastomeric layer onto the top surface of the first elastomeric layer by a soft lithography process comprises two-component addition-cure bonding.
303. The method of claim 412, wherein one of the bottom surface of the second elastomeric layer and the top surface of the first elastomeric layer have an excess of a binding component and the other of the bottom surface of the second elastomeric layer and the top surface of the first elastomeric layer have a deficit of the binding component.
304. The method of claim 292, wherein the first and second elastomeric layers are selected from the group of materials consisting of silicone rubber, polyisoprene, polybutadiene, polychloroprene, polyisobutylene, poly(styrene-butadiene-styrene), the polyurethanes, and silicones.
305. The method of claim 304, wherein the first and second layers are selected from the group of materials consisting of polyvinylchloride (PVC), polysulfone, polycarbonate, polymethylmethacrylate (PMMA), or polytertrafluoroethylene (Teflon).
306. The method of claim 304, wherein the first and second layers are selected from the group of materials consisting of General Electric RTV 615, or of the families including the polydimethylsiloxane (PDMS) such as Dow Chemical Corp.
Sylgard 182, 184, or 186, and aliphatic urethane diacrylates such as Ebecryl 270 or Irr 245 from UCB Chemicals.
307. The method of claim 292, wherein the bottom surface of the second elastomeric layer is bonded onto the top surface of the first elastomeric layer such that the first recess on the first elastomeric layer is disposed at an angle to the second recess on the second elastomeric layer.
308. The method of claim 307, wherein the angle is generally perpendicular.
309. The method of claim 292, wherein positioning the first layer on top of a planar substrate comprises:
sealing the first layer on top of the planar substrate.
310. The method of claim 292, further comprising:
sputtering, evaporating or electroplating a metallic powder into at least one of the elastomeric layers so as to form an electrode in a portion of the second elastomeric layer.
311. The method of claim 310, wherein the first electrode is formed on the portion of the second elastomeric layer disposed over the first recess.
312. The method of claim 292, further comprising:
depositing a metallic powder onto a portion of the planar substrate so as to form an electrode in a portion of the planar substrate.
313. The method of claim 312, wherein the portion of the planar substrate is disposed below the first recess.
314. The method of claim 292, further comprising:
depositing a magnetic material into at least one of the elastomeric layers so as to make at least a portion of the second elastomeric layer magnetic.
315. The method of claim 314, wherein the magnetic portion of the first elastomeric layer is disposed above the first recess.
316. The method of claim 292, further comprising:
depositing a metallic powder onto a portion of the planar substrate so as to make a portion of the planar substrate magnetic.
317. The method of claim 316, wherein the magnetic portion of the planar substrate is disposed below the first recess.~
318. The method of claim 292, further comprising:
doping at least one of the elastomeric layers with carbon black so as to make at least a portion of the elastomeric layer electrically conductive.
319. A method of controlling fluid or gas flow through the elastomeric structure of claim 292, comprising:
passing a fluid flow through the flow channel; and~
pressurizing the control channel such that a portion of the elastomeric structure separating the control channel from the flow channel is deflected into the flow channel so as to block fluid flow through the flow channel.
320. The method of claim 319, wherein the control channel is pressurized by a gas.
321. The method of claim 319, wherein the control channel is pressurized by a liquid.
322. A method of fabricating an elastomeric structure, comprising:

forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a plurality of first raised protrusions which form first recesses extending along a bottom surface of the first elastomeric layer;
forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess extending along a bottom surface of the second elastomeric layer;
bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a control channel forms in the second recess between the first and second elastomeric layers; and positioning the first layer on top of a planar substrate such that a plurality of flow channels form in the first recesses between the first elastomeric layer and the planar substrate.
323. The method of claim 322, wherein the plurality of first recesses are generally parallel to one another.
324. The method of claim 322, wherein the plurality of first recesses are generally disposed at an angle to the second recess.
325. The method of claim 324, wherein the angle is generally perpendicular.
326. A method of controlling fluid or gas flow through the elastomeric structure of claim 292, comprising:
passing fluid flows through the flow channels; and pressurizing the control channel such that portions of the elastomeric structure separating the control channel from the flow channels are deflected into the flow channels so as to block fluid flow through the flow channels.
327. The method of claim 326, wherein the control channel is pressurized by a gas.
328. The method of claim 326, wherein the control channel is pressurized by a liquid.
329. A method of fabricating an elastomeric structure, comprising:

forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess extending along a bottom surface of the first elastomeric layer;
forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a plurality of second raised protrusions which form a plurality of second recesses extending along a bottom surface of the second elastomeric layer;
bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that a plurality of control channels form in the second recesses between the first and second elastomeric layers; and positioning the first layer on top of a planar substrate such that a flow channel forms in the first recess between the first elastomeric layer and the planar substrate.
330. The method of claim 329, wherein the plurality of second recesses are generally parallel to one another.
331. The method of claim 329, wherein the plurality of second recesses are generally disposed at an angle to the first recess.
332. The method of claim 331 wherein the angle is generally perpendicular.
333. A method of controlling fluid or gas flow through the elastomeric structure of claim 329, comprising:
pressurizing the control channels in a repeating sequence such that portions of the elastomeric structure separating the control channels from the flow channel are deflected into the flow channel in sequence, so as to sequentially push fluid flow through the flow channel, thereby generating a peristaltic pumping affect.
334. The method of claim 329, wherein the control channels are pressurized by a gas.
335. The method of claim 329, wherein the control channels are pressurized by a liquid.
336. A method of fabricating an elastomeric structure, comprising:
forming a first elastomeric layer on top of a substrate;
depositing a first photoresist layer on the top surface of the first elastomeric layer;
removing a portion of the first photoresist layer such that a first line of photoresist remains on the top surface of the first elastomeric layer;
forming a second elastomeric layer over the first elastomeric layer thereby encapsulating the first line of photoresist between the first and second elastomeric layers;
depositing a second photoresist layer on the top surface of the second elastomeric layer;
removing a portion of the second photoresist layer such that a second line of photoresist remains on the top surface of the second elastomeric layer;
forming a third elastomeric layer over the second elastomeric layer thereby encapsulating the second line of photoresist between the second and third elastomeric layers; and removing the first and second lines of photoresist, thereby forming respective first and second channels passing through the elastomeric structure.
337. The method of claim 425, further comprising:
bonding the second elastomeric layer to the first elastomeric layer by a soft lithography process; and bonding the third elastomeric layer to the second elastomeric layer by a soft lithography process, thereby forming an integrated elastomeric structure.
338. The method of claim 336, further comprising:~
removing the substrate from the bottom of the integrated elastomeric structure.
339. The method of claim 425, wherein bonding of the second elastomeric layer to the first elastomeric layer and of the third elastomeric layer to the second elastomeric layer comprises:
two component addition-cure bonding.
340. The method of claim 336, wherein first line or pattern of photoresist on the first elastomeric layer is disposed at an angle to the second line of photoresist on the second elastomeric layer.
341. The method of claim 340, wherein the angle is generally perpendicular.
342. The method of claim 336, wherein the first and second lines or patterns of photoresist deposited on the first and second elastomeric layers have a width to depth ratio of about 10 to 1.
343. The method of claim 336, wherein the first and second lines or patterns of photoresist deposited on the first and second elastomeric layers have a width of about 100 um and a depth of about 10 um.
344. The method of claim 336, wherein the second elastomeric layer has a thickness of about 40 um.
345. The method of claim 336, wherein the third elastomeric layer has a thickness of about 4 mm.
346. The method of claim 425, wherein the first and second elastomeric layers are cured together.
347. The method of claim 425, wherein the first and second elastomeric layers are cured together.
348. The method of claim 336, wherein the first and second elastomeric layers are selected from the group of materials consisting of silicone rubber, polyisoprene, polybutadiene, polychloroprene, polyisobutylene, poly(styrene-butadiene-styrene), the polyurethanes, and silicones.
349. The method of claim 348, wherein the first and second layers are selected from the group of materials consisting of polyvinylchloride (PVC), polysulfone, polycarbonate, polymethylinethacrylate (PMMA), or polytertrafluoroethylene (Teflon).
350. The method of claim 348, wherein the first and second elastomers layers are selected from the group of materials consisting of General Electric RTV 615, or of the families including the polydimethylsiloxane (PDMS) such as Dow Chemical Corp.
Sylgard 182, 184, or 186, and aliphatic urethane diacrylates such as Ebecryl 270 or Irr 245 from UCB Chemicals.
351. The method of claim 336, further comprising:
any of the steps set out in claims 304 above.
352. A method of controlling fluid or gas flow through the elastomeric structure of claim 1, comprising:
passing a fluid flow through the first channel; and pressurizing the second channel such that a portion of the elastomeric structure separating the second channel from the first channel is deflected into the first channel so as to block fluid flow through the first channel.
353. The method of claim 336, wherein the second channel is pressurized by a gas.
354. The method of claim 336, wherein the second channel is pressurized by a liquid.
355. A method of fabricating an elastomeric structure, comprising:
forming a first elastomeric layer on top of a substrate;
depositing a first photoresist layer on the top surface of the first elastomeric layer;
removing a portion of the first photoresist layer such that a plurality of first lines of photoresist remain on the top surface of the first elastomeric layer;
forming a second elastomeric layer over the first elastomeric layer thereby encapsulating the first lines of photoresist between the first and second elastomeric layers;
depositing a second photoresist layer on the top surface of the second elastomeric layer;
removing a portion of the second photoresist layer such that a second line of photoresist remains on the top surface of the second elastomeric layer;
forming a third elastomeric layer over the second elastomeric layer thereby encapsulating the second line of photoresist between the second and third elastomeric layers; and removing the first and second lines of photoresist, thereby forming respective first and second channels passing through the elastomeric structure.
356. The method of claim 425, further comprising:
bonding the second elastomeric layer to the first elastomeric layer by a soft lithography process; and bonding the third elastomeric layer to the second elastomeric layer by a soft lithography process, thereby forming an integrated elastomeric structure.
357. The method of claim 335, wherein the plurality of first lines of photoresist are generally parallel to one another.
358. The method of claim 335, wherein the plurality of first lines of photoresist are generally disposed at an angle to the second line of photoresist.
359. The method of claim 358, wherein the angle is generally perpendicular.
360. A method of controlling fluid or gas flow through the elastomeric structure of claim 336, comprising:
passing fluid flows through the first channels; and pressurizing the second channel such that portions of the elastomeric structure separating the second channel from the first channels are deflected into the first channels so as to block fluid flow through the second channels.
361. The method of claim 360, wherein the second channel is pressurized by a gas.
362. The method of claim 360, wherein the second channel is pressurized by a liquid.
363. A method of fabricating an elastomeric structure, comprising:
forming a first elastomeric layer on top of a substrate;
depositing a first photoresist layer on the top surface of the first elastomeric layer;
removing a portion of first photoresist layer such that a first line of photoresist remains on the top surface of the first elastomeric layer;

forming a second elastomeric layer over the first elastomeric layer thereby encapsulating the first line of photoresist between the first and second elastomeric layers;
depositing a second photoresist layer on the top surface of the second elastomeric layer;
removing a portion of the second photoresist layer such that a plurality of second lines of photoresist remain on the top surface of the second elastomeric layer;
depositing a third elastomeric layer over the second elastomeric layer thereby encapsulating the plurality of second lines of photoresist between the second and third elastomeric layers; and removing the first and second lines of photoresist, thereby forming respective first and second channels passing through the elastomeric structure.
364. The method of claim 363, further comprising:
bonding the second elastomeric layer to the first elastomeric layer; and bonding the third elastomeric layer to the second elastomeric layer, thereby forming an integrated elastomeric structure.
365. The method of claim 363, wherein the plurality of second lines of photoresist are generally parallel to one another.
366. The method of claim 363, wherein the plurality of second lines of photoresist are generally disposed at an angle to the first line of photoresist.
367. The method of claim 366, wherein the angle is generally perpendicular.
368. A method of controlling fluid or gas flow through the elastomeric structure of claim 336, comprising:
pressurizing the second channels in a repeating sequence such that portions of the elastomeric structure separating the second channels from the first channel are deflected into the first channel in sequence, so as to sequentially push fluid flow through the first channel, thereby generating a peristaltic pumping affect.
369. The method of claim 368, wherein the second channel is pressurized by a gas.
370. The method of claim 368, wherein the second channel is pressurized by a liquid.
371. An elastomeric structure for regulating fluid or gas flow, comprising:
an elastomeric block formed with first and second microfabricated channels passing therethrough, wherein the first and second microfabricated channels cross over one another, but do not intersect.
372. A structure for regulating fluid or gas flow, comprising:
a planar substrate; and an elastomeric block disposed on the top of the planar substrate, wherein the elastomeric block comprises a first recess extending along its bottom surface, the first recess forming a first microfabricated channel extending along between the planar substrate and the elastomeric block, and wherein the elastomeric block further comprises a second microfabricated channel passing therethrough, wherein the first and second microfabricated channels cross over one another, but do not intersect.
373. The structure of claim 371, wherein the first and second microfabricated channels are disposed at an angle to one another.
374. The structure of claim 373, wherein the angle is perpendicular.
375. The structure of claim 371, wherein the first and second microfabricated channels have a width to height ratio of about 10 to 1.
376. The structure of claim 371, wherein the first and second microfabricated channels have a width of about 100 um and a height of about 10 um.
377. The structure of claim 371, wherein the elastomeric structure or block is fabricated according to any of the present methods.
378. The structure of claim 371, wherein the planar substrate is glass.
379. The structure of claim 371, wherein the planar substrate is an elastomeric material.
380. The structure of claim 371, wherein a top surface of the first channel is curved.
381. The structure of claim 371, wherein the portion of the elastomeric structure disposed between the first and second channels at an intersection of the first and second channels has a thickness of about 30 um.
382. The structure of claim 371, wherein the first and second channels are separated by a portion of the structure which is deflectable downward into the second channel when the first channel is pressurized, thereby closing the second channel.
383. The structure of claim 371, wherein the elastomeric block is formed from the group of materials consisting of silicone rubber, polyisoprene, polybutadiene, polychloroprene, polyisobutylene, poly(styrene-butadiene-styrene), the polyurethanes, silicones, General Electric RTV 615, or including polydimethylsiloxane (PDMS) such as Dow Chemical Corp. Sylgard 182, 184, or 186, and aliphatic urethane diacrylates such as Ebecryl 270 or Irr 245 from UCB Chemicals.
384. An elastomeric structure for regulating fluid or gas flow, comprising:
an elastomeric block formed with a plurality of parallel first microfabricated channels passing therethrough, and with a second microfabricated channels passing therethrough, wherein the second microfabricated channel crosses over, but do not intersect the plurality of parallel first microfabricated channels.
385. The elastomeric structure of claim 384, wherein the plurality of parallel first microfabricated channels are disposed at an angle to the second microfabricated channel.
386. The elastomeric structure of claim 385, wherein the angle is perpendicular.
387. A structure for regulating fluid or gas flow, comprising:
a planar substrate; and an elastomeric block bonded onto the top of the planar substrate, wherein the elastomeric block comprises a plurality of first recesses extending along its bottom surface, the plurality of first recesses forming a plurality of first channels extending along between the planar substrate and the elastomeric block, and wherein the elastomeric block further comprises a second channel passing therethrough, wherein the second channel crosses over, but does not intersect the plurality of first channels.
388. The structure of claim 387, wherein the plurality of first channels are disposed at an angle to the second microfabricated channel.
389. The elastomeric structure of claim 388, wherein the angle is perpendicular.
390. An elastomeric structure for regulating fluid or gas flow, comprising:
an elastomeric block formed with a first microfabricated channel passing therethrough, and with a of plurality of parallel second microfabricated channels passing therethrough, wherein the plurality of second microfabricated channels crosses over, but does not intersect the first microfabricated channel.
391. The elastomeric structure of claim 390, wherein the first microfabricated channel is disposed at an angle to the plurality of parallel second microfabricated channel.
392. The elastomeric structure of claim 391, wherein the angle is perpendicular.
393. A structure for regulating fluid or gas flow, comprising:
a planar substrate; and an elastomeric block bonded onto the top of the planar substrate, wherein the elastomeric block comprises a first recess extending along its bottom surface, the first recess forming a first channel extending along between the planar substrate and the elastomeric block, and wherein the elastomeric block further comprises a plurality of parallel second channels passing therethrough, wherein the plurality of parallel second channels cross over, but do not intersect the first channel.
394. The structure of claim 393, wherein the first channel is disposed at an angle to the plurality of second microfabricated channels.
395. The structure of claim 394, wherein the angle is perpendicular.
396. A method as set forth in claim 322, wherein the control channel has both wide and narrow portions disposed along its length, with wide portions disposed over at least one of the flow channels, and narrow portions disposed over the remainder of the flow channels.
397. A method as set forth in claim 326, wherein the control channel has both wide and narrow portions disposed along its length, with the wide portions disposed over at least one of the flow channels, and the narrow portions disposed over the remainder of the flow channels, wherein pressurizing the control channel causes portions of the elastomeric structure separating the control channel from the flow channels to be deflected into only those flow channels over which a wide portion of the control channel is disposed.
398. A method as set forth in claim 355 or a structure as set forth in claim 93, wherein the second channel has both wide and narrow portions disposed along its length, with wide portions disposed over at least one of the flow channels, and narrow portions disposed over the remainder of the flow channels.
399. A method as set forth in claim 326 or a structure as set forth in claim 96, wherein the second channel has both wide and narrow portions disposed along its length, with the wide portions disposed over at least one of the flow channels, and the narrow portions disposed over the remainder of the flow channels, wherein pressurizing the control channel causes portions of the elastomeric structure separating the control channel from the flow channels to be deflected into only those flow channels over which a wide portion of the control channel is disposed.
400. A method of fabricating an elastomeric structure, comprising:
forming a first elastomeric layer on top of a first micromachined mold, the first micromachined mold having a first raised protrusion which forms a first recess in the bottom surface of the first elastomeric layer;
forming a second elastomeric layer on top of a second micromachined mold, the second micromachined mold having a second raised protrusion which forms a second recess in the bottom surface of the second elastomeric layer;
bonding the bottom surface of the second elastomeric layer onto a top surface of the first elastomeric layer such that the second recess is enclosed between the first and second elastomeric layers; and positioning the first elastomeric layer on top of a planar substrate such that the first recess is enclosed between the first elastomeric layer and the planar substrate.
401. The method of claim 400, whereby the two cross channels cross, but do not intersect.
402. The method of claim 400, whereby the dimensions are correct for the elastomeric structure to function as a valve.
403. A method of fabricating an elastomeric structure, comprising:
forming a first elastomeric layer on top of a substrate;
depositing a first photoresist layer on the top surface of the first elastomeric layer;
removing a portion of the first photoresist layer such that a first pattern of photoresist remains on the top surface of the first elastomeric layer;
forming a second elastomeric layer over the first elastomeric layer thereby encapsulating the first pattern of photoresist between the first and second elastomeric layers;
depositing a second photoresist layer on the top surface of the second elastomeric layer;
removing a portion of the second photoresist layer such that a second pattern of photoresist remains on the top surface of the second elastomeric layer;
forming a third elastomeric layer over the second elastomeric layer thereby encapsulating the second pattern of photoresist between the second and third elastomeric layers; and removing the first and second patterns of photoresist, thereby forming respective first and second layers of recesses passing through the elastomeric structure.
404. The method of claim 402, whereby the two cross channels cross, but do not intersect.
405. The method of claim 403, whereby the dimensions are correct for the elastomeric structure to function as a valve.
406. An elastomeric structure, formed with multiple microfabricated recesses, wherein the recesses may cross over one another but do not intersect.
407. The elastomeric structure of claim 406, whereby the two cross channels cross, but do not intersect.
408. The elastomeric structure of claim 406, whereby the dimensions are correct for the elastomeric structure to function as a valve.
409. A microfabricated structure, comprising:
a planar substrate; and an elastomeric block disposed on top of the planar substrate, wherein the elastomeric block is formed with multiple microfabricated recesses, including recesses on the bottom of the block which may be sealed by the planar substrate, where the recesses may cross one another but do not intersect.
410. The microfabricated structure of claim 409, whereby the two cross channels cross, but do not intersect.
411. The microfabricated structure of claim 409, whereby the dimensions are correct for the elastomeric structure to function as a valve.
412. A method for bonding two layers of cured elastomer, comprising:
forming a first cured layer of elastomer;
forming a second cured layer of elastomer;
bringing the two layers into contact; and bonding the two layers together.
413. The method of claim 412, where the two layers are chemically different.
414. The method of claim 413, where the elastomer is formed from a mixture of two or more components, and the layers differ in the ratio of the components.
415. The method of claim 414, where the elastomer is a two-part silicone rubber.
416. The method of claim 412, where the elastomer is G.E. RTV 615, and the two layers are mixed in the ratios 3A:1B (excess Si-H groups) and 30A:1B
(excess vinyl groups).
417. The method of claim 414, where the elastomer is a two-part polyurethane.
418. The method of claim 417, where the elastomer is Ebecryl 270 or Irr 245 from UCB Chemicals.
419. The method of claim 417, where the elastomer is any of the materials listed in claims 13, 14 or 15.
420. The method of claim 412, where the two layers are of the same composition.
421. The method of claim 417, where the layers are incompletely cured.
422. The method of claim 417, where the layers contain a crosslinking agent which may be activated after the layers are cured.
423. The method of claim 417, where the layers may be bonded by heating.
424. The method of claim 412, where the two layers are bonded using a thin layer of adhesive.
425. A method for encapsulating a patternable resist layer, comprising:
forming a first cured layer of elastomer;
coating the first cured layer with a patternable resist layer;
patterning the resist layer;
adding a second layer of uncured elastomer;
curing the second layer of elastomer to form a monolithic elastomer block and encapsulate the patterned resist; and removing the patterned resist from the elastomer.
426. The method of claim 425, whereby multiple layers of resist are encapsulated in the elastomer.
427. The method of claim 425, whereby the composition of each layer of elastomer is the same.
428. The method of claim 425, whereby the composition of different layers of elastomer differs.
429. The method of claim 425, whereby the composition of each layer comprises any of the materials listed in claim 304.
430. A method of actuating the elastomeric structure of claim 292, comprising:
pressurizing the second channel such that a portion of the elastomeric structure separating the second channel from the first channel is deflected into the first channel.
431. The method of claim 319, whereby the control channel is pressurized such that a portion of the elastomeric structure separating the control channel from the flow channel is deflected into the flow channel so as to block fluid flow through the flow channel.
432. A method of actuating the elastomeric structure of claim 292, comprising:
further providing electrodes on the substrate and the membrane separating the two channels; and applying a voltage between the two electrodes, thus generating an attractive force between them.
433. A method of actuation the elastomeric structure of claim 292, comprising:
constructing the membrane separating the two channels of magnetically active elastomer; and applying a magnetic field to generate an attractive force towards the substrate.
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