CA466114A - Glossmeter - Google Patents

Glossmeter

Info

Publication number
CA466114A
CA466114A CA466114A CA466114DA CA466114A CA 466114 A CA466114 A CA 466114A CA 466114 A CA466114 A CA 466114A CA 466114D A CA466114D A CA 466114DA CA 466114 A CA466114 A CA 466114A
Authority
CA
Canada
Prior art keywords
glossmeter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA466114A
Other languages
French (fr)
Inventor
Boor Ladislav
Reynolds Stock Charles
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wyeth Holdings LLC
Original Assignee
American Cyanamid Co
Publication date
Application granted granted Critical
Publication of CA466114A publication Critical patent/CA466114A/en
Expired legal-status Critical Current

Links

CA466114A Glossmeter Expired CA466114A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA466114T

Publications (1)

Publication Number Publication Date
CA466114A true CA466114A (en) 1950-06-27

Family

ID=35601736

Family Applications (1)

Application Number Title Priority Date Filing Date
CA466114A Expired CA466114A (en) Glossmeter

Country Status (1)

Country Link
CA (1) CA466114A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3229564A (en) * 1961-05-12 1966-01-18 Bausch & Lomb Reflectometer
US3245306A (en) * 1961-10-05 1966-04-12 Aluminum Co Of America Photometer and method
FR2258626A1 (en) * 1974-01-17 1975-08-18 Pluss Stauffer Ag
US4583861A (en) * 1981-08-12 1986-04-22 Tokyo Shibaura Denki Kabushiki Kaisha Surface condition judging apparatus
WO1994007110A1 (en) * 1992-09-17 1994-03-31 Luxtron Corporation Optical endpoint determination during the processing of material layers
US5891352A (en) * 1993-09-16 1999-04-06 Luxtron Corporation Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3229564A (en) * 1961-05-12 1966-01-18 Bausch & Lomb Reflectometer
US3245306A (en) * 1961-10-05 1966-04-12 Aluminum Co Of America Photometer and method
FR2258626A1 (en) * 1974-01-17 1975-08-18 Pluss Stauffer Ag
US4072426A (en) * 1974-01-17 1978-02-07 Pluss-Staufer Ag Method and apparatus for determining the reflective properties of surfaces, especially coated surfaces
US4583861A (en) * 1981-08-12 1986-04-22 Tokyo Shibaura Denki Kabushiki Kaisha Surface condition judging apparatus
US5499733A (en) * 1992-09-17 1996-03-19 Luxtron Corporation Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
WO1994007110A1 (en) * 1992-09-17 1994-03-31 Luxtron Corporation Optical endpoint determination during the processing of material layers
US5695660A (en) * 1992-09-17 1997-12-09 Luxtron Corporation Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
US6077452A (en) * 1992-09-17 2000-06-20 Luxtron Corporation Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
US6110752A (en) * 1992-09-17 2000-08-29 Luxtron Corporation Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
US5891352A (en) * 1993-09-16 1999-04-06 Luxtron Corporation Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
US6413147B1 (en) 1993-09-16 2002-07-02 Herbert E. Litvak Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
US6426232B1 (en) 1993-09-16 2002-07-30 Luxtron Corporation Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment

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