CA466114A - Glossmeter - Google Patents
GlossmeterInfo
- Publication number
- CA466114A CA466114A CA466114A CA466114DA CA466114A CA 466114 A CA466114 A CA 466114A CA 466114 A CA466114 A CA 466114A CA 466114D A CA466114D A CA 466114DA CA 466114 A CA466114 A CA 466114A
- Authority
- CA
- Canada
- Prior art keywords
- glossmeter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA466114T |
Publications (1)
Publication Number | Publication Date |
---|---|
CA466114A true CA466114A (en) | 1950-06-27 |
Family
ID=35601736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA466114A Expired CA466114A (en) | Glossmeter |
Country Status (1)
Country | Link |
---|---|
CA (1) | CA466114A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3229564A (en) * | 1961-05-12 | 1966-01-18 | Bausch & Lomb | Reflectometer |
US3245306A (en) * | 1961-10-05 | 1966-04-12 | Aluminum Co Of America | Photometer and method |
FR2258626A1 (en) * | 1974-01-17 | 1975-08-18 | Pluss Stauffer Ag | |
US4583861A (en) * | 1981-08-12 | 1986-04-22 | Tokyo Shibaura Denki Kabushiki Kaisha | Surface condition judging apparatus |
WO1994007110A1 (en) * | 1992-09-17 | 1994-03-31 | Luxtron Corporation | Optical endpoint determination during the processing of material layers |
US5891352A (en) * | 1993-09-16 | 1999-04-06 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
-
0
- CA CA466114A patent/CA466114A/en not_active Expired
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3229564A (en) * | 1961-05-12 | 1966-01-18 | Bausch & Lomb | Reflectometer |
US3245306A (en) * | 1961-10-05 | 1966-04-12 | Aluminum Co Of America | Photometer and method |
FR2258626A1 (en) * | 1974-01-17 | 1975-08-18 | Pluss Stauffer Ag | |
US4072426A (en) * | 1974-01-17 | 1978-02-07 | Pluss-Staufer Ag | Method and apparatus for determining the reflective properties of surfaces, especially coated surfaces |
US4583861A (en) * | 1981-08-12 | 1986-04-22 | Tokyo Shibaura Denki Kabushiki Kaisha | Surface condition judging apparatus |
US5499733A (en) * | 1992-09-17 | 1996-03-19 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
WO1994007110A1 (en) * | 1992-09-17 | 1994-03-31 | Luxtron Corporation | Optical endpoint determination during the processing of material layers |
US5695660A (en) * | 1992-09-17 | 1997-12-09 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
US6077452A (en) * | 1992-09-17 | 2000-06-20 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
US6110752A (en) * | 1992-09-17 | 2000-08-29 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
US5891352A (en) * | 1993-09-16 | 1999-04-06 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
US6413147B1 (en) | 1993-09-16 | 2002-07-02 | Herbert E. Litvak | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
US6426232B1 (en) | 1993-09-16 | 2002-07-30 | Luxtron Corporation | Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
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