CA921314A - Dye-sensitized photopolymerization process - Google Patents

Dye-sensitized photopolymerization process

Info

Publication number
CA921314A
CA921314A CA061408A CA61408A CA921314A CA 921314 A CA921314 A CA 921314A CA 061408 A CA061408 A CA 061408A CA 61408 A CA61408 A CA 61408A CA 921314 A CA921314 A CA 921314A
Authority
CA
Canada
Prior art keywords
dye
photopolymerization process
sensitized photopolymerization
sensitized
photopolymerization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA061408A
Inventor
J. Cerwonka Edward
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GAF Corp
Original Assignee
GAF Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GAF Corp filed Critical GAF Corp
Application granted granted Critical
Publication of CA921314A publication Critical patent/CA921314A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
CA061408A 1968-09-09 1969-09-08 Dye-sensitized photopolymerization process Expired CA921314A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75863268A 1968-09-09 1968-09-09

Publications (1)

Publication Number Publication Date
CA921314A true CA921314A (en) 1973-02-20

Family

ID=25052490

Family Applications (1)

Application Number Title Priority Date Filing Date
CA061408A Expired CA921314A (en) 1968-09-09 1969-09-08 Dye-sensitized photopolymerization process

Country Status (8)

Country Link
US (1) US3615452A (en)
BE (1) BE738539A (en)
CA (1) CA921314A (en)
CH (1) CH528754A (en)
DE (1) DE1944750A1 (en)
FR (1) FR2017669A1 (en)
GB (1) GB1281225A (en)
NL (1) NL6913547A (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918809B1 (en) * 1970-04-08 1974-05-13
US3769023A (en) * 1971-05-07 1973-10-30 Horizons Inc Light sensitive reproduction and electron beam sensitive material
US3793033A (en) * 1972-09-05 1974-02-19 Minnesota Mining & Mfg Development-free printing plate
US3847771A (en) * 1973-03-30 1974-11-12 Scm Corp Uv and laser curing of pigmented polymerizable binders
US3966574A (en) * 1974-01-07 1976-06-29 Scm Corporation Ultraviolet polymerization coatings suitable for food packaging using FDA approved dyes as photosensitizers
BR7700555A (en) * 1976-02-02 1977-10-04 Eastman Kodak Co PHOTOSENSITIVE COMPOSITION AND RESPECTIVE PHOTOGRAPHIC ELEMENT
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
US4248959A (en) * 1978-12-07 1981-02-03 American Hoechst Corporation Preparation of diazo printing plates using laser exposure
DE3248246A1 (en) * 1982-12-28 1984-06-28 Basf Ag, 6700 Ludwigshafen POSITIVE WORKING METHOD FOR THE PRODUCTION OF RELIEF AND PRINTING FORMS
US4937159A (en) * 1985-11-20 1990-06-26 The Mead Corporation Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers
US4772541A (en) * 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4874450A (en) * 1987-01-29 1989-10-17 The Mead Corporation Laminating transparent or translucent materials using ionic dye-counter ion complexes
US4924009A (en) * 1987-06-03 1990-05-08 Bowling Green State University Xanthene dye complexes
JP6848767B2 (en) * 2016-09-27 2021-03-24 信越化学工業株式会社 Resist material and pattern formation method
WO2018085787A1 (en) 2016-11-06 2018-05-11 Massachusetts Institute Of Technology Light-assisted photocatalyst regeneration and oxygen-resilient radical polymerization

Also Published As

Publication number Publication date
US3615452A (en) 1971-10-26
BE738539A (en) 1970-02-16
CH528754A (en) 1972-09-30
GB1281225A (en) 1972-07-12
DE1944750A1 (en) 1970-03-19
NL6913547A (en) 1970-03-11
FR2017669A1 (en) 1970-05-22

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