CA982666A - Thin-film capacitor and method for the fabrication thereof - Google Patents

Thin-film capacitor and method for the fabrication thereof

Info

Publication number
CA982666A
CA982666A CA160,084A CA160084A CA982666A CA 982666 A CA982666 A CA 982666A CA 160084 A CA160084 A CA 160084A CA 982666 A CA982666 A CA 982666A
Authority
CA
Canada
Prior art keywords
fabrication
thin
film capacitor
capacitor
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA160,084A
Inventor
Takeshi Hayashi
Masami Onuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of CA982666A publication Critical patent/CA982666A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • H01G4/08—Inorganic dielectrics
    • H01G4/085—Vapour deposited
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/43—Electric condenser making
    • Y10T29/435—Solid dielectric type
CA160,084A 1971-12-29 1972-12-28 Thin-film capacitor and method for the fabrication thereof Expired CA982666A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47000262A JPS4870855A (en) 1971-12-29 1971-12-29

Publications (1)

Publication Number Publication Date
CA982666A true CA982666A (en) 1976-01-27

Family

ID=11468984

Family Applications (1)

Application Number Title Priority Date Filing Date
CA160,084A Expired CA982666A (en) 1971-12-29 1972-12-28 Thin-film capacitor and method for the fabrication thereof

Country Status (3)

Country Link
US (1) US3819990A (en)
JP (1) JPS4870855A (en)
CA (1) CA982666A (en)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
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US4089038A (en) * 1976-03-30 1978-05-09 E. I. Du Pont De Nemours And Co. Dielectric compositions of zirconates and/or aluminates and devices thereof
US4432035A (en) * 1982-06-11 1984-02-14 International Business Machines Corp. Method of making high dielectric constant insulators and capacitors using same
US4437139A (en) 1982-12-17 1984-03-13 International Business Machines Corporation Laser annealed dielectric for dual dielectric capacitor
US4506026A (en) * 1982-12-22 1985-03-19 Tam Ceramics, Inc. Low firing ceramic dielectric for temperature compensating capacitors
EP0140462B1 (en) * 1983-09-27 1990-06-20 Filtronic Components Limited Temperature compensated capacitor
US5097800A (en) * 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US4499520A (en) * 1983-12-19 1985-02-12 General Electric Company Capacitor with dielectric comprising poly-functional acrylate polymer and method of making
US5018048A (en) * 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US5032461A (en) * 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US5125138A (en) * 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
JPS60226455A (en) * 1984-04-19 1985-11-11 日立金属株式会社 Non-magnetic ceramic for magnetic head
US4851096A (en) * 1984-07-07 1989-07-25 Kyocera Corporation Method for fabricating a magneto-optical recording element
US4888246A (en) * 1985-05-23 1989-12-19 Matsushita Electric Industrial Co., Ltd. Dielectric thin film, and method for making the thin film
US4628405A (en) * 1985-08-19 1986-12-09 National Semiconductor Corporation Integrated circuit precision capacitor
JPH0644405B2 (en) * 1985-11-07 1994-06-08 株式会社住友金属セラミックス Dielectric porcelain composition for microwave
US4631633A (en) * 1985-12-23 1986-12-23 North American Philips Corporation Thin film capacitors and method of making the same
JPS62222512A (en) * 1986-03-20 1987-09-30 キヤノン株式会社 Dielectric material
US4731695A (en) * 1987-02-17 1988-03-15 General Electric Company Capacitor and method for making same with high yield
US4835656A (en) * 1987-04-04 1989-05-30 Mitsubishi Mining And Cement Co., Ltd. Multi-layered ceramic capacitor
US4876628A (en) * 1987-09-08 1989-10-24 Tufts University Thin film ion conducting coating
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US5605609A (en) * 1988-03-03 1997-02-25 Asahi Glass Company Ltd. Method for forming low refractive index film comprising silicon dioxide
JPH01225149A (en) * 1988-03-04 1989-09-08 Toshiba Corp Capacitor and manufacture thereof
DE68905668T2 (en) * 1988-05-24 1993-10-14 Sumitomo Metal Ceramics Inc Dielectric ceramic composition.
US4888820A (en) * 1988-12-06 1989-12-19 Texas Instruments Incorporated Stacked insulating film including yttrium oxide
US5014158A (en) * 1989-04-11 1991-05-07 Matsushita Electric Industrial Co., Ltd. Laminated ceramic capacitor
US5140498A (en) * 1991-04-19 1992-08-18 Westinghouse Electric Corp. Method of producing a wound thin film capacitor
US5142437A (en) * 1991-06-13 1992-08-25 Ramtron Corporation Conducting electrode layers for ferroelectric capacitors in integrated circuits and method
US5189593A (en) * 1991-11-04 1993-02-23 Motorola, Inc. Integrated distributed resistive-capacitive network
US5191510A (en) * 1992-04-29 1993-03-02 Ramtron International Corporation Use of palladium as an adhesion layer and as an electrode in ferroelectric memory devices
KR100190558B1 (en) * 1995-03-04 1999-10-15 구본준 Ferroelectric and capacitor of semiconductor device
US5590017A (en) * 1995-04-03 1996-12-31 Aluminum Company Of America Alumina multilayer wiring substrate provided with high dielectric material layer
JP3929513B2 (en) * 1995-07-07 2007-06-13 ローム株式会社 Dielectric capacitor and manufacturing method thereof
US6255688B1 (en) * 1997-11-21 2001-07-03 Agere Systems Guardian Corp. Capacitor having aluminum alloy bottom plate
US6114015A (en) * 1998-10-13 2000-09-05 Matsushita Electronic Materials, Inc. Thin-laminate panels for capacitive printed-circuit boards and methods for making the same
US6783620B1 (en) 1998-10-13 2004-08-31 Matsushita Electronic Materials, Inc. Thin-laminate panels for capacitive printed-circuit boards and methods for making the same
US6242299B1 (en) 1999-04-01 2001-06-05 Ramtron International Corporation Barrier layer to protect a ferroelectric capacitor after contact has been made to the capacitor electrode
US6339527B1 (en) 1999-12-22 2002-01-15 International Business Machines Corporation Thin film capacitor on ceramic
JP2002075783A (en) * 2000-08-25 2002-03-15 Alps Electric Co Ltd Thin-film capacitor for compensating temperature
UA77459C2 (en) * 2001-11-03 2006-12-15 Thin-film capacitor and a method for producing the capacitor
IL154598A0 (en) * 2003-02-24 2003-09-17 Capacitor
JP2005093597A (en) * 2003-09-16 2005-04-07 Shinko Electric Ind Co Ltd Thin film capacitor and its manufacturing method
US7285312B2 (en) * 2004-01-16 2007-10-23 Honeywell International, Inc. Atomic layer deposition for turbine components
WO2008072448A1 (en) * 2006-12-12 2008-06-19 Murata Manufacturing Co., Ltd. Method for fabricating multilayer ceramic electronic component and multilayer ceramic electronic component
US8723654B2 (en) 2010-07-09 2014-05-13 Cypress Semiconductor Corporation Interrupt generation and acknowledgment for RFID
US9092582B2 (en) 2010-07-09 2015-07-28 Cypress Semiconductor Corporation Low power, low pin count interface for an RFID transponder
US9846664B2 (en) 2010-07-09 2017-12-19 Cypress Semiconductor Corporation RFID interface and interrupt
US8813325B2 (en) * 2011-04-12 2014-08-26 Intermolecular, Inc. Method for fabricating a DRAM capacitor
DE102013109357A1 (en) * 2013-08-29 2015-03-05 Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG Ion-sensitive layer structure for an ion-sensitive sensor and method for producing the same
CN111223669B (en) * 2020-01-10 2021-08-03 河南理工大学 Solid dielectric film capacitor with high energy storage density and preparation method thereof

Also Published As

Publication number Publication date
JPS4870855A (en) 1973-09-26
US3819990A (en) 1974-06-25

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