CN100462738C - Light filter - Google Patents
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- CN100462738C CN100462738C CNB2005100360402A CN200510036040A CN100462738C CN 100462738 C CN100462738 C CN 100462738C CN B2005100360402 A CNB2005100360402 A CN B2005100360402A CN 200510036040 A CN200510036040 A CN 200510036040A CN 100462738 C CN100462738 C CN 100462738C
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- index material
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- filtering chamber
- rete
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Abstract
This invention relates to a light-filtering device , it includes one base, one filtering ultraviolet ray film stack and once filtering infrared ray film stack, the filtering ultraviolet ray film stack and filtering infrared ray film stack are set respectively in the two relative surfaces of the base, the filtering ultraviolet ray film stack includes several the first light-filtering cavity and several the second light-filtering cavity which are piled up in the surface of the base in proper order, filtering infrared ray film stack includes several the third light-filtering cavity , several the fourth light-filtering cavity and several the fifth light-filtering cavity which are piled up in the surface of the base in proper order, the five light-filtering cavity is piled up alternately with high and low refraction material, and the thickness of the high and low refraction material in the five light-filtering cavity are gained by optimizing the corresponding criterion thickness modulus, the criterion thickness modulus of the high and low refraction material in the said first, second, third, fourth, fifth light-filtering cavity is 1 , 0.76 1 , 1.3 and 1 in turn.
Description
[technical field]
The present invention is about a kind of filtering apparatus, particularly a kind ofly can filter ultraviolet and infrared light and allows the filtering apparatus of visible light transmissive.
[background technology]
Be applied to the glass of automobile, aircraft, normally make by substrate with filtering functions, or on common substrate, form one deck filter coating, can eliminate unnecessary light, reduce ultraviolet ray and infrared ray energy into the car, thereby avoid ultraviolet ray to damage of elements in human body and the car, prevent infrared radiation and cause vehicle interior temperature to rise and element in burn human body and the car.
For the glass that makes automobile, aircraft can have certain effect that ends to ultraviolet ray, infrared ray, realize by dual mode usually.A kind of mode is to add some absorbing agents to come by unwanted light in glass material, makes visible light transmissive.As United States Patent (USP) the 2nd, 444, disclose a kind of filtering apparatus that aircraft windows is used that is suitable for for No. 976, contain iron oxide, a large amount of cerium oxide (1.5～3%) and titanium dioxide (6～9%) in the light absorber of this filtering apparatus, have utmost point low ultraviolet ray penetrance and higher visible light penetrance.The filtering apparatus of this patent is to come ultraviolet-cutoff by add ultraviolet light absorber in glass material.
Another kind of mode is to form a kind of functional film to come by unwanted light in substrate, makes visible light transmissive.Disclose a kind of windshield 200410000007.X number as Chinese patent application with properties of infrared reflection, be provided with the semiconductor sull between the outer substrate of this glass and the PVB film or between inner substrate and the PVB film, be mixed with the indium oxide film that contains tin oxide in this oxide semiconductor film; Or being mixed with at least a above zinc-oxide film of salic, monox, boron oxide, gallium oxide or dysprosia, the mass percent total amount of institute's doping oxide is 0.1～10%.This windshield is higher than 70% to the transmitance of visible light, greater than 70%, makes glass have heat-proof quality to ultrared reflectivity.But, do not relate in this windshield wiper designs and ending, and mainly utilize reflex to eliminate infrared ray ultraviolet, the infrared ray of each wave band efficiently can not be ended.
Therefore, be necessary to provide a kind of filtering apparatus that the ultraviolet ray and the infrared ray of each wave band are efficiently ended.
[summary of the invention]
Below, will a kind of filtering apparatus that the ultraviolet ray and the infrared ray of each wave band efficiently can be ended be described with embodiment.
For realizing foregoing, a kind of filtering apparatus is provided, it comprises: a substrate, an one ultraviolet membrane stack of filter and a filter infrared ray membrane stack, this filters two surfaces relatively that ultraviolet membrane stack and filter infrared ray membrane stack are arranged at this substrate respectively, this is filtered ultraviolet membrane stack and comprises that order stack is added on a plurality of first optical filtering chambeies and a plurality of second optical filtering chamber of substrate surface, this filter infrared ray membrane stack comprises that order stack is added on one the 3rd optical filtering chamber of substrate surface, a plurality of the 4th optical filtering chambeies and a plurality of the 5th optical filtering chamber, these five optical filtering chambeies alternately are formed by stacking by high-index material rete and low-index material rete respectively, and it is high in these five optical filtering chambeies, the thickness of low-index material rete is optimized gained through corresponding benchmark thickness coefficient, the described first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, high in the 4th optical filtering chamber and the 5th optical filtering chamber, the root thickness coefficient of low-index material rete all is followed successively by 1,0.76,1,1.3 and 1.
The thickness of high and low refractive index film layer is λ/4 wavelength retes of optimizing through corresponding benchmark thickness coefficient in the above-mentioned first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, the 4th optical filtering chamber and the 5th optical filtering chamber.
The root thickness coefficient in the above-mentioned first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, the 4th optical filtering chamber and the 5th optical filtering chamber is followed successively by 1,1,0.5,1 and 1.
The above-mentioned first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, the 4th optical filtering chamber and the 5th optical filtering chamber number be followed successively by 7,6,1,9 and 8.
The rete of high and low refractive index material adds up to 26 layers in the above-mentioned filter ultraviolet ray membrane stack.
The rete of high and low refractive index material adds up to 36 layers in the above-mentioned filter infrared ray membrane stack.
In the above-mentioned filter ultraviolet ray membrane stack, the thickness coefficient scope in the first optical filtering chamber after the optimization of high-index material rete is 0.372～1.064, and the thickness coefficient scope after the optimization of low-index material rete is 0.962～1.203.
In the above-mentioned filter ultraviolet ray membrane stack, the thickness coefficient scope in the second optical filtering chamber after the optimization of high-index material rete is 0.477～0.946, and the thickness coefficient scope after the optimization of low-index material rete is 0.389～2.183.
In the above-mentioned filter infrared ray membrane stack, the thickness coefficient in the 3rd optical filtering chamber after the optimization of high-index material rete is 0.130, and the thickness coefficient after the optimization of low-index material rete is 0.274.
In the above-mentioned filter infrared ray membrane stack, the thickness coefficient scope in the 4th optical filtering chamber after the optimization of high-index material rete is 1.217～1.312, and the thickness coefficient scope after the optimization of low-index material rete is 1.231～1.372.
In the above-mentioned filter infrared ray membrane stack, the thickness coefficient scope in the 5th optical filtering chamber after the optimization of high-index material rete is 0.940～1.069, and the thickness coefficient scope after the optimization of low-index material rete is 0.544～1.105.
Above-mentioned filtering apparatus also comprises an antireflection membrane stack, and it is arranged between ultraviolet membrane stack of filter and the substrate respectively or filters between infrared ray membrane stack and the substrate.
Above-mentioned antireflection membrane stack alternately is formed by stacking by high-index material and low-index material.
The rete of high-index material and low-index material adds up to four layers in the above-mentioned antireflection membrane stack.
Each rete of above-mentioned antireflection membrane stack the arrange high-index material that is followed successively by 0.301 λ/4 optical thicknesses, the low-index material of 0.421 λ/4 optical thicknesses, the low-index material of the high-index material of 2.546 λ/4 optical thicknesses, 1.137 λ/4 optical thicknesses.
The filtering apparatus that present embodiment provided, its advantage is: at first, in the both sides of substrate ultraviolet membrane stack of filter and filter infrared ray membrane stack are set respectively, ultraviolet ray and infrared ray are filtered respectively, to reach accurate ultraviolet ray filtering and infrared ray; Secondly, utilize the digital simulation technology, the root thickness coefficient of filtering root thickness coefficient, high-index material rete and the low-index material rete in optical filtering chamber in ultraviolet membrane stack and the filter infrared ray membrane stack is optimized, the ultraviolet ray of each wave band and infrared ray are filtered as far as possible fully; At last, be preferable between filter ultraviolet membrane stack and the substrate, the antireflection membrane stack be set between filter infrared ray membrane stack and the substrate, can effectively reduce the volume reflection of visible light, increase transmissivity in substrate surface.
[description of drawings]
Fig. 1 is the structural representation of the filter glass of the technical program first embodiment.
Fig. 2 is the structural representation of the filter ultraviolet ray membrane stack of the technical program first embodiment.
Fig. 3 is the structural representation of the filter infrared ray membrane stack of the technical program first embodiment.
Fig. 4 is the structural representation of the filter glass of the technical program second embodiment.
Fig. 5 is the structural representation of the filter glass of the technical program the 3rd embodiment.
Fig. 6 is the structural representation of the filter glass of the technical program the 4th embodiment.
[embodiment]
Below in conjunction with accompanying drawing and some embodiment filtering apparatus and manufacture method thereof are described in further detail.
As shown in Figure 1, the filtering apparatus of the technical program first embodiment is one to be used for the filter glass 1 of automobile, it has a substrate 10, this substrate 10 comprises a medial surface 11 and a lateral surface 12, the ultraviolet membrane stack 20 of one filter is arranged on the medial surface 11, and a filter infrared ray membrane stack 30 is arranged on the lateral surface 12.This filters ultraviolet membrane stack 20 is alternately to be arranged by high-index material rete and low-index material rete to form with filter infrared ray membrane stack 30.This high-index material comprises titania (TiO
2), five oxidation Tritanium/Trititanium (Ti
3O
5), tantalum oxide (Ta
2O
5) etc., low-index material comprises silicon dioxide (SiO
2), aluminium oxide (Al
2O
3) etc.This substrate 10 is a transparent substrates, and its used material comprises glass, pottery, plastics etc., and substrate of glass is adopted in the substrate 10 of present embodiment.
As shown in Figure 2, this is filtered ultraviolet membrane stack 20 and comprises a plurality of first optical filtering chambeies 21 and a plurality of second optical filtering chamber 22, and these first optical filtering chamber, 21 its order stack are added on the surface of medial surface 11, and these second optical filtering chamber, 22 order stack are added on the surface in this first optical filtering chamber 21.
The thickness of high-index material rete is counted H, H=(λ
1/ 4)/and n1, wherein, λ 1 is a wavelength of light to be filtered, n
1Refractive index for high-index material.The thickness of low-index material rete is counted L, L=(λ
1/ 4)/n
2, n
2Refractive index for low-index material.
Form the high-index material rete 211 and the low-index material rete 212 of i.e. alternately stack in the first optical filtering chamber 21 by double-layer films.High-index material rete 211 is identical with the root thickness coefficient of low-index material rete 212, is 1, so in the first optical filtering chamber 21, the root thickness H=1 * (λ of high-index material rete 211
1/ 4)/n
1The root thickness L=1 * (λ of low-index material rete 212
1/ 4)/n
2The first optical filtering chamber 21 is provided with seven altogether, and its total rete number is 14 layers.
The second optical filtering chamber 22 is made up of double-layer films, i.e. the high-index material rete 221 and the low-index material rete 222 of alternately stack.High-index material rete 221 is identical with the root thickness coefficient of low-index material rete 222, is 0.76, so in the second optical filtering chamber 22, the root thickness H=0.76 * (λ of high-index material rete 221
1/ 4)/n
1The root thickness L=0.76 * (λ of low-index material rete 222
1/ 4)/n
2The second optical filtering chamber 22 is provided with six altogether, and its total rete number is a Floor 12.
The root thickness coefficient in the above-mentioned first optical filtering chamber 21, the second optical filtering chamber 22 is 1, so, the root thickness of filtering ultraviolet membrane stack 20 is the root thickness sum in above-mentioned two optical filtering chambeies, and the rete of filtering ultraviolet membrane stack 20 adds up to above-mentioned two optical filtering chamber retes sum sums, promptly 26 layers.Selecting high-index material for use is TiO
2, its refractive index is 2.311; Low-index material is SiO
2, its refractive index is 1.473; Then, H=(λ
1/ 4)/2.311, L=(λ/4)/1.473.λ
1Be wavelength of light to be filtered, the default ultraviolet wavelength that will filter, then the root thickness value of H, L can be determined, it is specifically arranged and sees Table 1-1.
Table 1-1 filters the structure and the tabulation of each layer thickness of ultraviolet membrane stack
Ultraviolet range is between 200nm～400nm, and wavelength is shorter, and ultraviolet energy is bigger, and is then big to the human injury.Utilize the digital simulation technology, the structure of the filter ultraviolet ray membrane stack 20 shown in the his-and-hers watches 1-1 is optimized, be specially: the penetrance with visible light is the simulation benchmark, root thickness coefficient to high-index material rete and low-index material rete is optimized, or the root thickness coefficient in each optical filtering chamber is optimized, get the structure of the ultraviolet membrane stack 20 of a best filter, so that the ultraviolet ray between 200nm～400nm is filtered fully as far as possible.The digital simulation process of present embodiment is a mock standard with the visible light of 95% penetrance, and the root thickness coefficient of filtering high and low refractive index film layer in the ultraviolet membrane stack 20 is optimized, and for example getting ultraviolet wavelength is 320nm, and high-index material is selected TiO for use
2, its refractive index is 2.311, low-index material is selected SiO for use
2, its refractive index is 1.473, then, and H=(320/4)/2.311, L=(320/4)/1.473.The structure of optimizing the filter ultraviolet ray membrane stack 20 of gained sees Table 1-2.
The structure and the tabulation of each layer thickness of the filter ultraviolet ray membrane stack after table 1-2 optimizes
As can be seen from the above table, in filter ultraviolet ray membrane stack 20 structures after the optimization, thickness coefficient scope in the first optical filtering chamber 21 after the optimization of high-index material rete is 0.372～1.064, and the thickness coefficient scope after the optimization of low-index material rete is 0.962～1.203.Thickness coefficient scope in the second optical filtering chamber 22 after the optimization of high-index material rete is 0.477～0.946, and the thickness coefficient scope after the optimization of low-index material rete is 0.389～2.183.
As shown in Figure 3, this filter infrared ray membrane stack 30 comprises one the 3rd optical filtering chamber 31, a plurality of the 4th optical filtering chamber 32 and a plurality of the 5th optical filtering chamber 33, the 3rd optical filtering chamber 31 order stack are added on the surface of lateral surface 12, the 4th optical filtering chamber 32 order stack are added on the surface in the 3rd optical filtering chamber 31, and the 5th optical filtering chamber 33 order stack are added on the surface in the 4th optical filtering chamber 32.
The 3rd optical filtering chamber 31 is made up of double-layer films, i.e. the high-index material rete 311 and the low-index material rete 312 of alternately stack.High-index material rete 311 is 1 with the root thickness coefficient of low-index material rete 312, so in the 3rd optical filtering chamber 31, the root thickness H=1 * (λ of high-index material rete 311
2/ 4)/n
1The root thickness L=1 * (λ of low-index material rete 312
2/ 4)/n
2Totally one in the 3rd optical filtering chamber 31, its total rete number is two layers.
The 4th optical filtering chamber 32 is made up of double-layer films, i.e. the high-index material rete 321 and the low-index material rete 322 of alternately stack.High-index material rete 321 is 1.3 with the root thickness coefficient of low-index material rete 322, so in the 4th optical filtering chamber 32, the root thickness H=1.3 * (λ of high-index material rete 321
2/ 4)/n
1The root thickness L=1.3 * (λ of low-index material rete 322
2/ 4)/n
2Totally nine in the 4th optical filtering chamber 32, its total rete number is 18 layers.
The 5th optical filtering chamber 33 is made up of double-layer films, i.e. the high-index material rete 331 and the low-index material rete 332 of alternately stack.High-index material rete 331 is 1 with the root thickness coefficient of low-index material rete 332, so in the 5th optical filtering chamber 33, the root thickness H=1 * (λ of high-index material rete 331
2/ 4)/n
1The root thickness L=1 * (λ of low-index material rete 332
2/ 4)/n
2Totally eight in the 5th optical filtering chamber 33, its total rete number is 16 layers.
The root thickness coefficient in above-mentioned the 3rd optical filtering chamber 31 is 0.5, the root thickness coefficient in the 4th optical filtering chamber 32, the 5th optical filtering chamber 33 is 1, so, the root thickness of filter infrared ray membrane stack 30 is the root thickness in 0.5 times of the 3rd optical filtering chamber 31 and the 4th optical filtering chamber 32, the 5th optical filtering chamber 33 root thickness sums, and the rete of filter infrared ray membrane stack 30 adds up to above-mentioned three optical filtering chamber rete sum sums, promptly 36 layers.Selecting high-index material for use is TiO
2, its refractive index is 2.311; Low-index material is SiO
2, its refractive index is 1.473; Then, H=(λ
2/ 4)/2.311, L=(λ
2/ 4)/1.473.λ
2Be Infrared wavelength to be filtered, the default Infrared wavelength that will filter, then the one-tenth-value thickness 1/10 of H, L can be determined, it is specifically arranged and sees Table 2-1.
The structure and the tabulation of each layer thickness of table 2-1 filter infrared ray membrane stack
Infrared ray is a kind of heat radiation, and it can cause certain injury to skin, retina etc.Infrared wavelength range is between 747nm～840nm, and the shorter energy of wavelength is bigger, and is bigger to the human injury.Utilize the digital simulation technology, the structure of the filter infrared ray membrane stack 30 shown in the his-and-hers watches 2-1 is optimized, be specially: the penetrance with visible light is the simulation benchmark, root thickness coefficient to high-index material rete and low-index material rete is optimized, or the benchmark coefficient in each optical filtering chamber is optimized, get the structure of a best filter infrared ray membrane stack 30, so that the infrared ray between 747nm～840nm is all filtered as far as possible.The digital simulation process of present embodiment is a mock standard with the visible light of 95% penetrance, and the root thickness coefficient of high and low refractive index film layer in the filter infrared ray membrane stack 30 is optimized, and for example getting Infrared wavelength is 747nm, and high-index material is TiO
2, its refractive index is 2.311, low-index material is SiO
2, its refractive index is 1.473, then, and H=(747/4)/2.311, L=(747/4)/1.473.The structure of optimizing the filter infrared ray membrane stack 30 of gained sees Table 2-2.
The structure of the filter infrared ray membrane stack after table 2-2 optimizes and the tabulation of each layer thickness
As can be seen from the above table, in filter infrared ray membrane stack 30 structures after the optimization, the thickness in the 3rd optical filtering chamber 31 after the optimization of high-index material rete is 0.130, and the thickness coefficient scope after the optimization of low-index material rete is 0.274.Thickness coefficient scope in the 4th optical filtering chamber 32 after the optimization of high-index material rete is 1.217～1.312, and the thickness coefficient scope after the optimization of low-index material rete is 1.213～1.372.Thickness coefficient scope in the 5th optical filtering chamber 33 after the optimization of high-index material rete is 0.940～1.069, and the thickness coefficient scope after the optimization of low-index material rete is 0.544～1.105.
As shown in Figure 4, the filtering apparatus of the technical program second embodiment is a filter glass 2, and it has a substrate 10, and this substrate 10 comprises a medial surface 11 and a lateral surface 12, the ultraviolet membrane stack 20 of one filter is arranged on the lateral surface 12, and a filter infrared ray membrane stack 30 is arranged on the medial surface 11.It is identical with the structure among first embodiment with the structure of filter infrared ray membrane stack 30 that this filters ultraviolet membrane stack 20.
As shown in Figure 5, the filtering apparatus of the technical program the 3rd embodiment is a filter glass 3, it has a substrate 10, this substrate 10 has a medial surface 11 and reaches with lateral surface 12, one antireflection membrane stack 41 is arranged on the medial surface 11, one antireflection membrane stack 42 is arranged on the lateral surface 12, and the ultraviolet membrane stack 20 of a filter is arranged on the antireflection membrane stack 41, and a filter infrared ray membrane stack 30 is arranged on the antireflection membrane stack 42.It is identical with the structure among first embodiment with the structure of filter infrared ray membrane stack 30 that this filters ultraviolet membrane stack 20.
In between substrate 10 and the ultraviolet membrane stack 20 of filter, between substrate 10 and the filter infrared ray membrane stack 30, the antireflection membrane stack is set respectively, in the reflection of substrate surface, increase its penetrance with the minimizing visible light.
As shown in Figure 6, the filtering apparatus of the technical program the 4th embodiment is a filter glass 4, it has a substrate 10, this substrate 10 has a medial surface 11 and reaches with lateral surface 12, one antireflection membrane stack 41 is arranged on the medial surface 11, one antireflection membrane stack 42 is arranged on the lateral surface 12, and the ultraviolet membrane stack 20 of a filter is arranged on the antireflection membrane stack 42, and a filter infrared ray membrane stack 30 is arranged on the antireflection membrane stack 41.It is identical with the structure among first embodiment with the structure of filter infrared ray membrane stack 30 that this filters ultraviolet membrane stack 20.The structure and the material therefor of antireflection membrane stack 41,42 are identical with the 3rd embodiment.
In addition, the antireflection membrane stack only is arranged between ultraviolet membrane stack 20 of filter and the substrate 10; Or only be arranged between filter infrared ray membrane stack 30 and the substrate 10; Or only be arranged at the filter ultraviolet membrane stack 20 on substrate 10 facing surfaces; Or only be arranged on the filter infrared ray membrane stack 30 and substrate 10 facing surfaces; Or be arranged at simultaneously on the ultraviolet membrane stack 20 of filter with substrate 10 facing surfaces and filter infrared ray membrane stack 30 on substrate 10 facing surfaces.More than several modes, the antireflection membrane stack all can reach and reduce visible light in the reflecting effect of substrate surface.
The filtering apparatus that present embodiment provided, its advantage is: at first, in the both sides of substrate ultraviolet membrane stack of filter and filter infrared ray membrane stack are set respectively, ultraviolet ray and infrared ray are filtered respectively, to reach accurate ultraviolet ray filtering and infrared ray; Secondly, utilize the digital simulation technology, the thickness coefficient of filtering thickness coefficient, high-index material rete and the low-index material rete in optical filtering chamber in ultraviolet membrane stack and the filter infrared ray membrane stack is optimized, the ultraviolet ray of each wave band and infrared ray are filtered as far as possible fully; At last, be preferable between filter ultraviolet membrane stack and the substrate, the antireflection membrane stack be set between filter infrared ray membrane stack and the substrate, can effectively reduce the volume reflection of visible light, increase transmissivity in substrate surface.
Claims (17)
1. filtering apparatus, it comprises a substrate, an one ultraviolet membrane stack of filter and a filter infrared ray membrane stack, this filters two surfaces relatively that ultraviolet membrane stack and filter infrared ray membrane stack are arranged at this substrate respectively, this is filtered ultraviolet membrane stack and comprises that order stack is added on seven first optical filtering chambeies and six second optical filtering chambeies of substrate surface, this filter infrared ray membrane stack comprises that order stack is added on one the 3rd optical filtering chamber of substrate surface, nine the 4th optical filtering chambeies and eight the 5th optical filtering chambeies
The above-mentioned first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, the 4th optical filtering chamber and the 5th optical filtering chamber are formed by stacking by one deck high-index material rete and one deck low-index material rete respectively; It is characterized in that, this first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, high in the 4th optical filtering chamber and the 5th optical filtering chamber, the thickness of low-index material rete is optimized gained through corresponding benchmark thickness coefficient, and this first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, high in the 4th optical filtering chamber and the 5th optical filtering chamber, the root thickness coefficient of low-index material rete all is followed successively by 1,0.76,1,1.3 and 1, this first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, the root thickness coefficient in the 4th optical filtering chamber and the 5th optical filtering chamber is followed successively by 1,1,0.5,1 and 1.
2. filtering apparatus as claimed in claim 1, it is characterized in that the optical thickness of high and low refractive index film layer is λ/4 wavelength of optimizing through corresponding benchmark thickness coefficient in this first optical filtering chamber, the second optical filtering chamber, the 3rd optical filtering chamber, the 4th optical filtering chamber and the 5th optical filtering chamber.
3. filtering apparatus as claimed in claim 1 is characterized in that, this rete of filtering high and low refractive index material in the ultraviolet membrane stack adds up to 26 layers.
4. filtering apparatus as claimed in claim 1 is characterized in that, the rete of high and low refractive index material adds up to 36 layers in this filter infrared ray membrane stack.
5. filtering apparatus as claimed in claim 1, it is characterized in that, this is filtered in the first optical filtering chamber of ultraviolet membrane stack, and the thickness coefficient scope after the optimization of high-index material rete is 0.372～1.064, and the thickness coefficient scope after the optimization of low-index material rete is 0.962～1.203.
6. filtering apparatus as claimed in claim 1, it is characterized in that, this is filtered in the second optical filtering chamber of ultraviolet membrane stack, and the thickness coefficient scope after the optimization of high-index material rete is 0.477～0.946, and the thickness coefficient scope after the optimization of low-index material rete is 0.389～2.183.
7. filtering apparatus as claimed in claim 1 is characterized in that, in the 3rd optical filtering chamber of this filter infrared ray membrane stack, the thickness coefficient after the optimization of high-index material rete is 0.130, and the thickness coefficient after the optimization of low-index material rete is 0.274.
8. filtering apparatus as claimed in claim 1, it is characterized in that, in the 4th optical filtering chamber of this filter infrared ray membrane stack, the thickness coefficient scope after the optimization of high-index material rete is 1.217～1.312, and the thickness coefficient scope after the optimization of low-index material rete is 1.231～1.372.
9. filtering apparatus as claimed in claim 1, it is characterized in that, in the 5th optical filtering chamber of this filter infrared ray membrane stack, the thickness coefficient scope after the optimization of high-index material rete is 0.940～1.069, and the thickness coefficient scope after the optimization of low-index material rete is 0.544～1.105.
10. filtering apparatus as claimed in claim 1 is characterized in that, this filtering apparatus also comprises an antireflection membrane stack.
11. filtering apparatus as claimed in claim 10 is characterized in that, this antireflection membrane stack is arranged between ultraviolet membrane stack of filter and the substrate respectively and filters between infrared ray membrane stack and the substrate.
12. filtering apparatus as claimed in claim 10 is characterized in that, this antireflection membrane stack is arranged at the ultraviolet membrane stack of filter and substrate apparent surface and filter infrared ray membrane stack and substrate apparent surface.
13. filtering apparatus as claimed in claim 10 is characterized in that, this antireflection membrane stack is arranged between ultraviolet membrane stack of filter and the substrate, or between filter infrared ray membrane stack and the substrate.
14. filtering apparatus as claimed in claim 10 is characterized in that, this antireflection membrane stack is arranged at the ultraviolet membrane stack of filter and substrate apparent surface or filter infrared ray membrane stack and substrate apparent surface.
15. filtering apparatus as claimed in claim 10 is characterized in that, this antireflection membrane stack is alternately to be formed by stacking by high-index material and low-index material.
16. filtering apparatus as claimed in claim 10 is characterized in that, the rete of high-index material and low-index material adds up to four layers in this antireflection membrane stack.
17. filtering apparatus as claimed in claim 10, it is characterized in that each rete of this antireflection membrane stack the arrange high-index material that is followed successively by 0.301 λ/4 optical thicknesses, the low-index material of 0.421 λ/4 optical thicknesses, the high-index material of 2.546 λ/4 optical thicknesses, the low-index material of 1.137 λ/4 optical thicknesses.
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|---|---|---|---|
| CNB2005100360402A CN100462738C (en) | 2005-07-15 | 2005-07-15 | Light filter |
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|---|---|---|---|
| CNB2005100360402A CN100462738C (en) | 2005-07-15 | 2005-07-15 | Light filter |
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|---|---|
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| CN100462738C true CN100462738C (en) | 2009-02-18 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101424761B (en) * | 2007-10-31 | 2010-11-10 | 鸿富锦精密工业（深圳）有限公司 | Infrared cut optical filter and lens module using the infrared cut |
| CN102537852A (en) * | 2009-05-13 | 2012-07-04 | 李欣洋 | LED light source using optical glass filter |
| CN101706085B (en) * | 2009-05-13 | 2011-08-03 | 李欣洋 | LED light source using PMMA optical filter |
| CN104516038A (en) * | 2013-09-30 | 2015-04-15 | 鸿富锦精密工业（深圳）有限公司 | Infrared cut-off filter |
| CN110568537A (en) * | 2019-09-11 | 2019-12-13 | 贵州民族大学 | Radiation type gradual change type light pollution resistant filter lens for astronomical photography |
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| US5360659A (en) * | 1993-05-24 | 1994-11-01 | The Dow Chemical Company | Two component infrared reflecting film |
| US5926317A (en) * | 1996-11-06 | 1999-07-20 | Jds Fitel Inc. | Multilayer thin film dielectric bandpass filter |
| US6611378B1 (en) * | 2001-12-20 | 2003-08-26 | Semrock, Inc. | Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern |
| JP4133004B2 (en) * | 2002-06-13 | 2008-08-13 | 新電元工業株式会社 | Power circuit |
-
2005
- 2005-07-15 CN CNB2005100360402A patent/CN100462738C/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4865405A (en) * | 1987-12-10 | 1989-09-12 | Minolta Camera Kabushiki Kaisha | Optical filter |
| JPH0395502A (en) * | 1989-09-08 | 1991-04-19 | Sumitomo Bakelite Co Ltd | Filter for flame sensor |
| JPH04133004A (en) * | 1990-09-25 | 1992-05-07 | Matsushita Electric Works Ltd | Ultraviolet and infrared cut filter |
| JPH06160622A (en) * | 1992-07-01 | 1994-06-07 | Kokusai Denshin Denwa Co Ltd <Kdd> | Optical filter |
| US5360659A (en) * | 1993-05-24 | 1994-11-01 | The Dow Chemical Company | Two component infrared reflecting film |
| US5926317A (en) * | 1996-11-06 | 1999-07-20 | Jds Fitel Inc. | Multilayer thin film dielectric bandpass filter |
| US6611378B1 (en) * | 2001-12-20 | 2003-08-26 | Semrock, Inc. | Thin-film interference filter with quarter-wavelength unit sub-layers arranged in a generalized pattern |
| JP4133004B2 (en) * | 2002-06-13 | 2008-08-13 | 新電元工業株式会社 | Power circuit |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1896770A (en) | 2007-01-17 |
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