CN100590487C - Plate processing apparatus - Google Patents
Plate processing apparatus Download PDFInfo
- Publication number
- CN100590487C CN100590487C CN200710109022A CN200710109022A CN100590487C CN 100590487 C CN100590487 C CN 100590487C CN 200710109022 A CN200710109022 A CN 200710109022A CN 200710109022 A CN200710109022 A CN 200710109022A CN 100590487 C CN100590487 C CN 100590487C
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- Prior art keywords
- carrying platform
- processing apparatus
- catoptron
- plate processing
- light
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Abstract
A plate processor comprises a carrier platform for supporting a plate product as the glass baseboard of liquid crystal display device, a light source at one end of the platform for lighting the baseboard on the platform, and a mirror at another end opposite the light source on the platform, to reflect the light reflected from the baseboard on the platform secondary, into eye of operator. Therefore, operator can clearly watch the processing state on the surface of the baseboard on the platform, as clearness or the like.
Description
Technical field
The present invention relates to a kind of plate processing apparatus, relate in particular to a kind of can clear view planar surface situation, be convenient to flat board is carried out the plate processing apparatus of processing operation.
Background technology
Known flat panel products, employed glass substrate of LCD etc. for example, in its manufacture process, need carry out various processing usually, for example with the glass substrate encapsulated liquid crystal, attaching colored filter on the substrate, on the substrate that attaches optical filter, attaching polaroid, be assembled into backlight etc.
Figure 1 shows that known flat board (for example, liquid crystal panel) treatment facility 101, it is used for the employed glass substrate for the treatment of fluid crystal display.Plate processing apparatus 101 has the carrying platform 102 that is obliquely installed, and pending substrate 103 is positioned on the carrying platform 102.The top of carrying platform 102 is provided with a planar light source 104, is used to illuminate substrate 103, so that be correlated with operation.Because the size of general substrate 103 is bigger, therefore carrying platform 102 is obliquely installed; If substrate 103 is horizontal positioned, then can make operator 105 be difficult for carrying out processing such as clean substrate and attaching polaroid.In addition, if substrate 103 is horizontal positioned, then the operator handles to compare because of bending over and is easier to fatigue.Therefore, can carry out various works of treatment easily on substrate 103 for the ease of the operator 105 of standing at work, one is set to this carrying platform 102 to tilt.
When substrate 103 attaches polaroid; because the cleanliness to substrate 103 surfaces require very high; and require to fit tightly between polaroid and the substrate 103 and bubble can not occur; so operator 105 must can know the situation of seeing substrate 103 whole surfaces; clean fully with the whole surface of guaranteeing substrate 103, just guarantee between polaroid and substrate 103, can not have foreign matter or bubble.As previously mentioned, because the carrying platform 102 of existing plate processing apparatus 101 tilts, when the illumination of being sent of the planar light source 104 of carrying platform 102 tops was mapped on the substrate 103 like this, light was after substrate 103 reflections, and some light can't enter among 105 of the operators of standing at work; In other words, operator 105 possibly can't see substrate 103 some regional surface condition, attach in the process of polaroid at substrate 103 like this, may occur existing between polaroid and the substrate 103 unfavorable condition of foreign matter or bubble in the zone that the operator can't see.
Therefore, be necessary to provide a kind of scheme, to overcome and to improve the above-mentioned defective of known technology.
Summary of the invention
In view of this, the object of the present invention is to provide a kind of plate processing apparatus, it can make the operator clearly observe whole planar surface, so that flat board is carried out operation.
According to above-mentioned purpose of the present invention, the invention provides a kind of plate processing apparatus, it comprises that one can carry the carrying platform of pending flat board, this carrying platform and surface level are obliquely installed at angle; One light source, the end that it is arranged at the carrying platform of this plate processing apparatus is used to shine the carrying platform of this plate processing apparatus; An and catoptron, it is arranged at the relative other end of the carrying platform of this plate processing apparatus, carries out secondary reflection with light that should flat board was reflected, thereby light is entered in operator's eye, described catoptron is set to adjust its angle, with assurance light is reflexed in operator's eye; Wherein this light source is arranged at the top of this carrying platform; This catoptron is arranged at the below of this carrying platform.
The present invention also provides a kind of polaroid attaching device, is used for polaroid is attached at panel, and it comprises: carrying platform, and it is used to carry pending panel, and this carrying platform and surface level are obliquely installed at angle; Light source, the end that it is arranged at this carrying platform is used to shine the panel on this carrying platform; And catoptron, it is arranged at the relative other end of this carrying platform, and so that the light that this panel was reflected is carried out secondary reflection, and described catoptron is set to adjust its angle, light reflexed in operator's eye guaranteeing; Wherein this light source is arranged at the top of this carrying platform; This catoptron is arranged at the below of this carrying platform.
Aforementioned catoptron comprises a lens holder, and this lens holder is fixed on the support by a pivot, and this catoptron can rotate and the adjustment angle around support.
Compare with known technology, adopt plate processing apparatus of the present invention, the operator can be clear that the cleaning situation of the planar surface on the carrying platform in operating process, therefore when handling flat panel products, for example when the substrate of giving liquid crystal panel attaches polaroid, can not produce the unfavorable condition that has foreign matter or bubble between polaroid and the substrate, help improving the qualification rate of product.
Description of drawings
Fig. 1 is the synoptic diagram of known liquid crystal panel treatment facility;
Fig. 2 is the synoptic diagram of plate processing apparatus of the present invention;
Fig. 3 is the light source of plate processing apparatus of the present invention and the distance setting synoptic diagram of carrying platform;
Fig. 4 is the synoptic diagram of lens holder of the catoptron of plate processing apparatus of the present invention;
Fig. 5 is the synoptic diagram of the mirror support of plate processing apparatus of the present invention.
Wherein, description of reference numerals is as follows:
101 plate processing apparatus, 102 carrying platforms, 103 substrates, 104 light sources
105 operators, 1 plate processing apparatus, 2 carrying platforms, 21 baffle plates
22 keepers, 3 substrates, 4 light sources, 41 fluorescent tubes
42 reflex housings, 402 the most inboard light 401 outermost light 5 catoptrons
51 lens holder, 511 rotating shafts, 52 supports, 521 screws
522 fixed orifices, 6 operators
Embodiment
See also Fig. 2, plate processing apparatus 1 of the present invention comprises a carrying platform 2, and its upper surface is a dip plane.Carrying platform 2 is a lengthwise platform perpendicular to drawing, and its side schematic view only is shown among the figure.The size of the inclination alpha of aforementioned dip plane is operating as suitable with the product on 6 pairs of plate processing apparatus of handled easily person.According to a preferred embodiment of the invention, the size of tested liquid crystal panel, inclination alpha are 60 ± 5 °.
Be provided with a baffle plate 21 that exceeds carrying platform 2 surfaces in the bottom of carrying platform 2, a keeper 22 be set respectively in the both sides of carrying platform 2; So, when pending substrate 3 is positioned over this carrying platform 2 surperficial, can come restricting substrate 3, drop from carrying platform 2 to prevent substrate 3 from the bottom and the both sides of carrying platform 2.
Above an end of carrying platform 2, be provided with one with the approximately uniform light source 4 of carrying platform length.Light source 4 comprises a lengthwise fluorescent tube 41 and a reflection lampshade 42.Reflection lampshade 42 can pool the light of lengthwise fluorescent tube 41 light of approximate banded directional light, is positioned over substrate 3 on the carrying platform 2 with irradiation.The range of exposures of banded directional light is determined jointly that by reflex housing 42 and fluorescent tube 41 wherein Zhao She length is by the length decision of fluorescent tube 41.In the present embodiment, the equal in length of the length of fluorescent tube 41 and carrying platform 2; Banded parallel light-struck width then is subjected to the size influence of reflex housing, and reflex housing 42 is big more, and then the width of directional light is big more.
Please consult Fig. 2 and Fig. 3 simultaneously,, be used for illuminating carrying platform 2 after reflex housing 42 reflections because the light of light source 4 converges to approximate banded directional light.If light source 4 is far away excessively apart from carrying platform 2 surfaces, then when banded directional light irradiate light to carrying platform 2 away from an end of fluorescent tube 41 surperficial the time, the surface of carrying platform 2 close fluorescent tube 41 1 ends can not be shone simultaneously by banded parallel rays.Therefore, according to embodiments of the invention, the distance on the point of the most close carrying platform 2 and carrying platform 2 surfaces is no more than 2cm on the reflecting surface of reflex housing 42.In addition, the angle of banded directional light irradiation carrying platform 2 is unsuitable excessive, be that outermost light 401 banded directional light, close this carrying platform 2 is unsuitable excessive with the angles that carrying platform 2 surfaces form, cause banded directional light can only shine the surface of an end of the close light source of carrying platform 2 because angle is crossed conference, and can't shine the surface of carrying platform 2 away from an end of light source 4.As shown in Figure 3, in a preferred embodiment, the formula below needing to satisfy between the width a of the angle theta that the outermost light 401 of banded directional light and carrying platform surface form and the banded directional light of light source 4 and the width b of carrying platform:
sinθ≤a/b
Could guarantee that banded directional light can shine whole carrying platform 2.In the present embodiment, the width a of banded directional light is 1cm, and the width of carrying platform is 50cm; When the angle on the outermost light of this band shape directional light and carrying platform surface was arcsin (0.02), light can shine the whole surface of carrying platform 2 just.
Please continue to consult Fig. 2.According to the present invention, the carrying platform 2 of plate processing apparatus 1 is provided with a catoptron 5 with respect to the below of the other end of aforementioned light source, after the reflection of light that light source 4 is launched, can shine on the catoptron 5 through the substrate 3 on the carrying platform 2, pass through catoptron 5 then, form secondary reflection and enter in operator's eye, operator 6 just can see the light through 3 reflections of the substrate on the carrying platform 2 like this, just can see the surface condition of the substrate 3 on the carrying platform 2.
According to embodiments of the invention, catoptron 5 is high reflectance eyeglasses of a rectangle, and its reflectivity is preferably more than or equal to 98%, and its length is preferably identical in fact with the length of carrying platform 2, its width can be set as required, and its width is 10～20cm in the present embodiment.
Please consult Fig. 2 and Fig. 4 simultaneously, plate processing apparatus also comprises a lens holder 51, and it is used for fixing this catoptron 5.In the present embodiment, lens holder 51 is the picture frame at a wrap lens edge and the back side.
Please consult Fig. 2 and Fig. 5 simultaneously, plate processing apparatus can also comprise a support 52, and support 52 is used for fixing this catoptron 5.In the present embodiment, support 52 is a tripod, and wherein, an end on the triangle base of support 52 is provided with two screws 521, can this support 52 be fixed on the plate processing apparatus 1 by screw is passed screw 521.Leg-of-mutton drift angle one end is formed with a fixed orifice 522, and the back side of aforementioned lens holder 51 can be provided with a rotating shaft 511, to match with this fixed orifice 522 and lens holder 51 pivotally is fixed on the support 52.Like this, catoptron 5 can rotate around support 52, thereby realizes the whole purpose of angle adjustable angle between catoptron and the surface level.For realizing going in operator's eye through this mirror reflects just through the substrate light reflected on the carrying platform, catoptron and carrying platform leave certain distance away from the needs of an end of light source, and the angle of catoptron and surface level need satisfy certain angle.In the present embodiment, when the inclination alpha of the inclined surface of plate processing apparatus 1 is 60 ± 5 °, catoptron 5 is preferably 10 °～15 ° with the angle β of surface level, and the distance L of catoptron 5 and carrying platform 2 one ends (being defined herein as catoptron center and the carrying platform distance near an end of this catoptron) is preferably 5～15cm.So, height be 1.50 meters to 1.90 meters operator 6 can be more convenient and comfortable posture carry out operation.
In the aforementioned embodiment, lens holder 51 is the edge of an encirclement catoptron 5 and the picture frame at the back side, but the present invention is not limited thereto; In fact can utilize other known any way that catoptron is fixed on the support pivotly, and support 52 also being not limited to the form of tripod, in fact can be any other fixed mount form.
In the aforementioned embodiment, light source 4 is arranged at the top of carrying platform one end, and catoptron 5 is arranged at the below of the other end of carrying platform 2.Because light is reversible, so light source 4 also can be arranged at the below of carrying platform 2 one ends, and catoptron 5 is arranged at the top of the other end of carrying platform 2.
In the above-described embodiments, plate processing apparatus of the present invention is a liquid crystal panel treatment facility, but the present invention is not limited to liquid crystal panel.In other embodiments, can comprise that other need be positioned over the product of handling on the carrying platform.Plate processing apparatus of the present invention can also be a kind of polaroid attaching device, and it is used for polaroid is attached at panel.
The above only is a preferred implementation of the present invention, and equivalent modifications or variation that every those skilled in the art does according to design of the present invention all are covered by in the scope of appending claims of the present invention.
Claims (16)
1. plate processing apparatus, it comprises:
Carrying platform is used to carry pending flat board, and this carrying platform and surface level are obliquely installed at angle;
Light source, the end that it is arranged at this carrying platform is used to shine the flat board on this carrying platform; And
Catoptron, it is arranged at the relative other end of this carrying platform, carries out secondary reflection with light that should flat board was reflected, and described catoptron is set to adjust its angle, light is reflexed in operator's eye guaranteeing;
Wherein this light source is arranged at the top of this carrying platform; This catoptron is arranged at the below of this carrying platform.
2. plate processing apparatus as claimed in claim 1, wherein the angle that becomes with surface level of this carrying platform is that 55 degree are to 65 degree.
3. plate processing apparatus as claimed in claim 1, wherein this light source comprises the lengthwise fluorescent tube.
4. plate processing apparatus as claimed in claim 3, wherein this light source has reflex housing, is approximate banded directional light so that the emitted light of this light source converges; The width of this band shape directional light can be by the size adjustment of this reflex housing, makes that big more the width that should the band shape directional light of this reflex housing is just big more.
5. plate processing apparatus as claimed in claim 4, wherein the point of close this carrying platform and the distance on this carrying platform surface are no more than 2cm on the reflecting surface of this reflex housing.
6. plate processing apparatus as claimed in claim 4 satisfies following formula: sin θ≤a/b between the width a of the angle theta wherein banded directional light of this light source, that form away from the surface of the outermost light of this carrying platform and this carrying platform and the banded directional light of this light source and the width b of carrying platform.
7. plate processing apparatus as claimed in claim 1, wherein the angle of this catoptron and surface level is adjustable, this angle is that 10 degree are to 15 degree.
8. plate processing apparatus as claimed in claim 1, wherein the reflectivity of this catoptron is more than or equal to 98%.
9. plate processing apparatus as claimed in claim 1, wherein this catoptron is a rectangle.
10. plate processing apparatus as claimed in claim 9, wherein the length of this catoptron is identical in fact with carrying platform.
11. plate processing apparatus as claimed in claim 10, wherein the width of this catoptron is 10 to 20cm.
12. plate processing apparatus as claimed in claim 1, wherein the center of this catoptron and carrying platform are 5 to 15cm near the distance of an end of this catoptron.
13. plate processing apparatus as claimed in claim 1, wherein this plate processing apparatus also comprises:
Lens holder, it is used for fixing this catoptron;
Support, it is used for fixing this lens holder, and this lens holder is installed in an end of this support.
14. plate processing apparatus as claimed in claim 13, wherein this lens holder comprises the fixed frame that surrounds this catoptron edge.
15. plate processing apparatus as claimed in claim 13, wherein this lens holder is fixed on this support pivotly by at least one rotating shaft.
16. a polaroid attaching device is used for polaroid is attached at panel, it comprises:
Carrying platform, it is used to carry pending panel, and this carrying platform and surface level are obliquely installed at angle;
Light source, the end that it is arranged at this carrying platform is used to shine the panel on this carrying platform; And
Catoptron, it is arranged at the relative other end of this carrying platform, and so that the light that this panel was reflected is carried out secondary reflection, and described catoptron is set to adjust its angle, light reflexed in operator's eye guaranteeing;
Wherein this light source is arranged at the top of this carrying platform; This catoptron is arranged at the below of this carrying platform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200710109022A CN100590487C (en) | 2007-06-12 | 2007-06-12 | Plate processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200710109022A CN100590487C (en) | 2007-06-12 | 2007-06-12 | Plate processing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101059616A CN101059616A (en) | 2007-10-24 |
| CN100590487C true CN100590487C (en) | 2010-02-17 |
Family
ID=38865806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200710109022A Expired - Fee Related CN100590487C (en) | 2007-06-12 | 2007-06-12 | Plate processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100590487C (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104624591B (en) * | 2015-02-05 | 2017-06-20 | 翰博高新材料(合肥)股份有限公司 | A kind of polaroid end face cleaning and detection means |
| CN108226177A (en) * | 2016-12-21 | 2018-06-29 | 蓝思科技（长沙）有限公司 | A kind of bad detection device of portable face oil |
| CN111443450B (en) * | 2020-03-27 | 2021-02-02 | 山西大学 | Precise optical lens frame capable of adjusting azimuth angle of laser beam |
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2007
- 2007-06-12 CN CN200710109022A patent/CN100590487C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN101059616A (en) | 2007-10-24 |
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Granted publication date: 20100217 Termination date: 20200612 |
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| CF01 | Termination of patent right due to non-payment of annual fee |