CN101308774B - System for manufacturing flat display - Google Patents
System for manufacturing flat display Download PDFInfo
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- CN101308774B CN101308774B CN2008100891392A CN200810089139A CN101308774B CN 101308774 B CN101308774 B CN 101308774B CN 2008100891392 A CN2008100891392 A CN 2008100891392A CN 200810089139 A CN200810089139 A CN 200810089139A CN 101308774 B CN101308774 B CN 101308774B
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- substrate
- latch well
- load latch
- conveyer belt
- supply line
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32807—Construction (includes replacing parts of the apparatus)
Abstract
The invention discloses a system for producing a flat plate display (FPD) which comprises one or more substrate transmitting line moving the substrate continuously along the travelling route and multiple load locking cavities overlapped for loading and unloading the substrate after being processing, so that the substrate can be effectively processed.
Description
The application is to be on May 26th, 2006 applying date, and application number is No.200610078441.9, and name is called the dividing an application of patent application of the system of flat-panel monitor " make ".
Technical field
The present invention relates to a kind of equipment that is used to make flat-panel monitor (FPD), more specifically, the FPD manufacturing equipment that relates to a kind of clustered, it comprises a plurality of load latch wells stacked on top of each other (load lock chamber), the FPD manufacturing system of can be used for embarking on journey (in-line).
Background technology
With reference to figure l, it shows the example of main flat-panel monitor (FPD) manufacturing equipment that uses, and normally, each FPD manufacturing equipment 10a includes a load latch well 20, a feeding chamber 22 and a plurality of processing cavity 24 that is connected in turn with 10b.
Load latch well 20 is connected to an outside platform, and is used for a substrate that sends from outside platform is loaded into the FPD manufacturing equipment that this substrate is processed or will unloads the outside at the substrate that the FPD manufacturing equipment is processed fully.
When conversion repeatedly between a vacuum state and atmospheric pressure state, the inside of load latch well 20 and external communications.Be provided with a supporting mould (not shown) in the load latch well 20, be used for thereon substrate supports.Supporting mould is designed to support one or more substrate (not shown)s thereon.
One aspirator (not shown) and air-breather (not shown) also are set in the load latch well 20, are used for inside conversion between vacuum state and atmospheric pressure state load latch well 20.
Feeding chamber 22 is connected to load latch well 20 and is connected to a plurality of processing cavitys 24.Be provided with a gadgetize arm (not shown) in the feeding chamber 22, make feeding chamber 22 as a center-aisle that is used between load latch well 20 and processing cavity 24, being written into and unloading substrate.Feeding chamber 22 is under the vacuum state all the time, thereby makes that the inside of processing cavity 24 remains under the vacuum state naturally when substrate is in processing cavity 24 discharges or be loaded into processing cavity 24.
---be used for supporting a substrate thereon---and one add the multiplexer (not shown)---is used for substrate is carried out certain processing, for example under vacuum state substrate carried out an etching and processing to be provided with a support (not shown) in each processing cavity 24.
Above-mentioned FPD manufacturing equipment 10a and 10b are arranged in the room of a cleaning, pollute the substrate machining accuracy that is improved simultaneously to prevent the substrate that aligns in processing.
When a plurality of FPD manufacturing equipment 10a that are set parallel to each other and 10b are connected to an independent substrate supply platform 30, finished single FPD manufacturing system in clean room.
That is, at least two FPD manufacturing equipment 10a and 10b are connected in parallel with each other forming a single FPD manufacturing system, and all FPD manufacturing equipment 10a and 10b of forming this single FPD manufacturing system drive independently.
When operation, correspondingly, a substrate supply mechanical arm 34 that is arranged on the single substrate supply platform 30 moves so that one will be fed in the load latch well 20 of FPD manufacturing equipment 10a and 10b at the substrate that FPD manufacturing equipment 10a and 10b process along a track 32, and the substrate that will finish after the processing is sent to the position that will carry out next processing.
Yet in above-mentioned FPD manufacturing equipment 10a and 10b, load latch well 20 must carry out being written into and unloading operation of substrate continuously, conversion repeatedly between vacuum state and atmospheric pressure state simultaneously.This needs aspirator continuously to operate forming a vacuum state, and needs air-breather constantly to operate recovering an atmospheric pressure state, thereby, may cause various device problems.
In addition, owing to only used single supply mechanical arm 34 in turn substrate is fed among a plurality of FPD manufacturing equipment 10a and the 10b, have such problem: the deadline of the course of processing has been delayed inevitably, and the supply operating efficiency of substrate is not high enough.
Summary of the invention
Thereby, consider above-mentioned problem and proposed the present invention, an object of the present invention is to provide a kind of FPD manufacturing system of clustered, wherein adopted one to embark on journey conveyer belt in turn substrate is infeeded load latch well stacked on top of each other.
Description of drawings
By detailed description hereinafter, simultaneously with reference to the accompanying drawings, with above-mentioned and other purpose, feature and other advantage that the present invention may be better understood, wherein;
Fig. 1 is the schematic diagram of a conventional P FD manufacturing equipment;
Fig. 2 is a vertical view, shows the clustered FPD manufacturing equipment according to first embodiment of the invention;
Fig. 3 and 4 is respectively side sectional view and vertical view cutaway drawing, show load latch well and following load latch well and a conveyer belt, described conveyer belt is used for substrate is conveyed into corresponding load latch well, and described load latch well is included in according in the first embodiment of the invention FPD manufacturing equipment;
Fig. 5 and 6 is vertical view and end view, show be arranged on be written into unload lower conveyor belt on the different examples of stop, described conveyer belt is included in the FPD manufacturing equipment of Fig. 2;
Fig. 7 and 8 is a vertical view, shows the operation that is written into and unloads the substrate aligner on the lower conveyor belt that is arranged on Fig. 2;
Fig. 9 and 10 is a vertical view, shows the operation that is arranged on the substrate aligner on the vertical removable conveyer belt, and described vertical removable conveyer belt is arranged on being written into of Fig. 2 and unloads on the lower conveyor belt;
Figure 11 A is the process view to 11F, the step successively that it shows a process, be used for substrate be loaded into Fig. 2 the FPD manufacturing equipment go up and down the load latch well and with substrate from the FPD manufacturing equipment of Fig. 2 and under unload the load latch well;
Figure 12 is a side sectional view, show load latch well and following load latch well and a conveyer belt, described conveyer belt is used for substrate is sent to corresponding load latch well, and described load latch well is included in the FPD manufacturing equipment according to second embodiment of the invention;
Figure 13 A is the process view to 13J, the step successively that it shows a process, be used for substrate be loaded into Figure 12 the FPD manufacturing equipment go up and down the load latch well and with substrate from the FPD manufacturing equipment of Figure 12 and under unload the load latch well;
Figure 14 and 15 is respectively side sectional view and vertical view cutaway drawing, show load latch well and following load latch well and a conveyer belt, described conveyer belt is used for substrate is conveyed into corresponding load latch well, and described load latch well is included in the FPD manufacturing equipment according to third embodiment of the invention;
Figure 16 A is the process view to 16H, the step successively that it shows a process, be used for substrate be loaded into Figure 14 and 15 the FPD manufacturing equipment go up and down the load latch well and with substrate from the FPD manufacturing equipment of Figure 14 and 15 and under unload the load latch well;
The diagrammatic sketch of Figure 17 shows the layout according to the FPD manufacturing equipment of four embodiment of the invention;
The diagrammatic sketch of Figure 18 shows the structure of Figure 17 feeding chamber;
The diagrammatic sketch of Figure 19 shows the structure of Figure 17 load latch well;
The diagrammatic sketch of Figure 20 A and 20B shows the different operating example of the FPD manufacturing equipment of Figure 17;
The diagrammatic sketch of Figure 21 shows the layout according to the FPD manufacturing equipment of fifth embodiment of the invention;
The diagrammatic sketch of Figure 22 shows the structure of Figure 21 load latch well;
The diagrammatic sketch of Figure 23 shows an operation example of the FPD manufacturing equipment of Figure 21;
The diagrammatic sketch of Figure 24 shows the layout according to the FPD manufacturing equipment of sixth embodiment of the invention;
The diagrammatic sketch of Figure 25 shows the structure of Figure 24 load latch well;
Figure 26 A and 26B and 27 diagrammatic sketch show the operation example of the FPD manufacturing equipment of Figure 24;
Figure 28 is a side sectional view, diagrammatically shows the FPD manufacturing equipment according to seventh embodiment of the invention;
Figure 29 is a side sectional view, shows a top electrode and is placed on cover piece on this top electrode, and described top electrode and cover piece are included in the FPD manufacturing equipment of Figure 28;
The diagrammatic sketch of Figure 30 shows the layout according to the clustered FPD manufacturing equipment of eighth embodiment of the invention; And
Figure 31 is a flow chart, shows foreign peoples's etching (disparate etching) process of using the FPD manufacturing equipment among Figure 30.
Embodiment
Hereinafter, with reference to the accompanying drawings the example embodiment of manufacturing equipment according to flat-panel monitor of the present invention (FPD) is described.
First execution mode
With reference to Fig. 2, it shows the FPD manufacturing equipment according to first embodiment of the invention, and FPD manufacturing equipment 110 is clustereds, includes last load latch well stacked on top of each other 122 and following load latch well 124, a feeding chamber 126 and an a plurality of processing cavity 128.At this, these chambeies are provided with embarking on journey, and being written into and unloading by a conveyer belt of embarking on journey and realize of substrate S.
Shown in Fig. 3 and 4, a plurality of upward load latch wells 122 and following load latch well 124 are vertically gone up stacked each other, and are connected to feeding chamber 126 respectively.Use two load latch wells though present embodiment discloses, should be appreciated that the quantity of load latch well can increase.
In the present embodiment, following load latch well 124 is that a substrate is written into the chamber, is that a substrate unloads cavity of resorption and go up load latch well 122, but to use conversely also be possible for they.
One conveyer belt is arranged on the place ahead and the rear of load latch well 122 and following load latch well 124.This conveyer belt is suitable in turn substrate S being loaded into the neutralization of FPD manufacturing equipment and unloads from FPD manufacturing equipment 110.Correspondingly, in order to limit the substrate movable passageway, the substrate entrance and exit penetrate respectively load latch well 122 and following load latch well 124 two oblique right walls---these two oblique right walls align with conveyer belt, promptly descend the antetheca of load latch well 124 and the rear wall of last load latch well 122.The entrance and exit of substrate is respectively arranged with opening/closing gate valve G.
At this, should be noted that: conveyer belt comprises horizontal movement unit 130, is written into conveyer belt 140 and unloads lower conveyor belt 150 and vertically movable conveyer belt 160.Vertically movable conveyer belt 160 is arranged on and unloads on the lower conveyor belt 150, makes its roller and the roller that unloads lower conveyor belt 150 alternately be provided with and can not interfere.
In the present embodiment, be written into conveyer belt 140 and unload lower conveyor belt 150 and be provided with along the longitudinal, be positioned at respectively load latch well 124 down the place ahead and rear, be positioned at the position close with gate valve G.The horizontal movement unit 130 that is vertically arranged with along following load latch well 124 lower areas.Horizontal movement unit 130 is a roll conveyor, is positioned on the identical height, aligns coaxially with these two conveyer belts simultaneously with being written into conveyer belt 140 and unloading lower conveyor belt 150.
Similarly, last load latch well 122 also is provided with a horizontal movement unit 130.Last load latch well 122 is mutually the same with the 26S Proteasome Structure and Function of the horizontal movement unit 130 of following load latch well 124, now only will be described in detail one of them.
A plurality of vertically movable stripper pins 134 are arranged on the single substrate of horizontal movement unit 130, between each roller of unit 130 securely.Simultaneously, used independently the drive unit (not shown) this plate is provided one move all stripper pin 134 needed actuating forces vertically.
---to be the far-end of substrate approach axis---at it near the end place of unloading lower conveyor belt 150 be provided with a pair of first stop 132 to horizontal movement unit 130.The effect of first stop 132 is shift positions of restriction substrate S.
As illustrated in Figures 5 and 6, first stop 132 matches with the first inductor (not shown).If first inductor detects that substrate S exists and to signal of first stop, 132 outputs, then first stop 132 is worked in response to output signal.
Alternatively, first stop 132 can be taked the form of vertically movable post, makes them be elevated to a position---and this position is higher than being written into of substrate S and unloads height, thereby (seeing Fig. 6 A and 6B) limited in the position of substrate S.
First inductor is connected to a controller (not shown) conductively.Therefore, if detect the existence of substrate S, then controller is controlled the roller driving device of horizontal movement unit 130, controls with the rotating speed of pair of rollers.For example, if close first stop 132 of substrate S, then controller low speed ground rotary rollers is damaged owing to colliding to prevent substrate S.
With reference to Fig. 3 and 4, be written into conveyer belt 140 and comprise a pair of framework that is provided with in parallel with each other, each framework all has a suitable length, a plurality of rollers space is arranged between the framework equably, and a roller driving device (not shown) is arranged on the specific location of conveyer belt 140, as one man to drive each roller.
Be written into conveyer belt 140 and be provided with a pair of second stop 142, be used to stop to move of substrate S.More specifically, second stop 142 is installed in the approaching end place of two framework up and down load latch wells 124 respectively, is raised to prevent substrate S.
Identical with shown in Fig. 5 and 6, second stop 142 is combined with the second inductor (not shown).If second inductor detects the existence of substrate S and to signal of second stop, 142 outputs, then second stop 142 is worked in response to this output signal.
Be written into conveyer belt 140 and also be provided with a plurality of aligner in the part of close load latch well 124 down, being used for aliging to be loaded into down the substrate S of load latch well 124.Shown in Fig. 7 and 8, aligner is set in place equably on two frameworks of roller opposite end, with operation side by side.Each aligner all comprises the contact element 126 of a pivoting member 144 and a softness, described pivoting member towards usually parallel with framework, but can rotate pivotally inwardly when needed, described contact element 126 is coupled to an end of pivoting member 144 and is suitable for oppressing the either side of substrate S.
Particularly, a plurality ofly be provided with equably along two frameworks with contact element 146 all-in-one-piece pivoting member 144 respectively, make them based on the operation of drive unit (not shown) and rotate pivotly towards substrate S.Thereby when the periphery of each contact element 146 began oppressively to contact the opposite side of substrate S of deflection, substrate S can be aligned.
With reference to Fig. 3 and 4, unloading lower conveyor belt 150 and comprise a pair of framework that is provided with in parallel with each other---each framework all has suitable length, an a plurality of space and is arranged on roller and a roller driving device that is used for synchronously driving each roller between the framework equably.
Vertically movable conveyer belt 160 is arranged on and unloads on the lower conveyor belt 150 near the front end place of last load latch well 122 and following load latch well 124, and it is suitable for substrate S being raise and being reduced on the height of load latch well 122 and following load latch well 124.
Vertically movable conveyer belt 160 comprises a pair of framework that is provided with in parallel with each other---each framework all has suitable length, an a plurality of space and is arranged on roller and a roller driving device that is used for synchronously driving each roller between the framework equably.
Vertically the effect of movable conveyer belt 160 is that substrate S is reduced on the height that unloads lower conveyor belt 150, described substrate S the front end that unloads lower conveyor belt 150 from load latch well 122 unload.Vertically movable conveyer belt 160 at first with unload lower conveyor belt 150 and be on the identical height, make the roller of vertically movable conveyer belt 160 alternately be provided with and do not interfere with the roller that unloads lower conveyor belt 150.
Vertically movable conveyer belt 160 is provided with a pair of the 3rd stop 162 with last load latch well 122 back end opposite places on two frameworks, and is suitable for the shift position of substrate S is limited.The 3rd stop 162 cooperates with the 3rd inductor (not shown).
Vertically movable conveyer belt 160 also is provided with a pair of elevating lever 168 that is installed in each framework lower surface center.
The effect of elevating lever 168 be with substrate S move to vertically be arranged on load latch well 122 in the identical height of horizontal movement unit 130 on.Based on a signal of exporting from the 3rd inductor that is associated with the 3rd stop 162 elevating lever 168 is controlled.
Elevating lever 168 can be from the reciprocating air cylinder of linearity and will the rotatablely move CD-ROM drive motor that converts linear reciprocal movement to and screw select, they are installed in each framework lower surface center respectively.
As shown in Figures 9 and 10, vertically movable conveyer belt 160 also is provided with a pair of aligner, is used to the substrate S of aliging and unloading from last load latch well 122.Each aligner all comprises a guide member 164 and drive unit 166.The form of the guide member 164 of each aligner is the plate of longitudinal extension, and is positioned at the opposite side of each vertically movable conveyer belt 160 framework respectively, and described vertically movable conveyer belt 160 is parallel with framework.For the substrate S of aliging, guide member 164 moves inwardly to contact with the opposite side of substrate S.
At this, the function of guide member 164 is to prevent that the substrate S that is imported from not lining up.Especially, the substrate contact portion of each guide member 164 is favourable by the flexible material manufacturing.
The form of drive unit 166 is the cylinder that is fixed on relevant guide member 164 lateral walls.Drive unit 166 is used to make guide member 164 to move inwardly and towards the other places, is fixed on simultaneously on the relevant framework.
Hereinafter, the substrate of explaining above-mentioned FPD manufacturing system is written into and unloads process.
With reference to Figure 11 A, a plurality of substrate S 1, S2 ..., Sn in turn transmits by the roller that is written into conveyer belt 140.In substrate S 1, S2 and S3, top substrate S 1 is at first by being arranged on the aligner alignment that is written into conveyer belt 140 rear portions.The substrate S 1 of alignment moves in the following load latch well of opening 124 along the horizontal movement unit 130 of descending load latch well 124 then.
Detected substrate S 2 subsequently if be arranged on second inductor that is written into conveyer belt 140 lower rear, thereby signal of second inductor output is to second stop 142, then second stop 142 is operated to stop the motion of substrate S 2 in response to this output signal, and the operation that is written into conveyer belt 140 stops.
By after being arranged on the aligner alignment that is written into conveyer belt 140 rear ends, the substrate S 2 that moves is under the standby mode.
And, if first inductor that substrate S 1---it is moved on to down in the load latch well 124 by horizontal movement unit 130---is located at horizontal movement unit 130 belows detects, thereby signal of first inductor output is to first stop 132, then first stop 132 is operated to stop the motion of substrate S 1 in response to this output signal, and the operation of horizontal movement unit 130 stops.Therefore, following load latch well 124 is adjusted, and the internal conversion in chamber 124 becomes vacuum state.
With reference to Figure 11 B, be sent in the processing cavity of expectation by the substrate S 1 of using a mechanical arm (not shown) that is arranged in the feeding chamber to be loaded into, to accept plasma process.
When substrate S 1 after this unloads, the inside of following load latch well 124 is transformed into atmospheric pressure state from vacuum state.
Then, substrate S 2---it is waited in the rear end that is written into conveyer belt 140---is loaded into down in the load latch well 124, to move according to the operation of horizontal movement unit 130 roller driving devices.
If being positioned at first inductor of horizontal movement unit 130 belows detects substrate S 2 and exports a signal to first stop 132, then first stop 132 is operated in response to this output signal stopping the motion of substrate S 2, and the operation of horizontal movement unit 130 stops.
With reference to Figure 11 C, the substrate S 1 of having finished processing is sent in the load latch well 122 by the mechanical arm (not shown) that use is arranged in the feeding chamber.Then, the inside of last load latch well 122 is transformed into atmospheric pressure state from vacuum state.
With reference to Figure 11 D, the substrate S 2 that is moved to down in the load latch well 124 is sent in the processing cavity of expectation by using a mechanical arm (not shown) that is arranged in the feeding chamber, to accept plasma process.
When substrate S 2 after this unloads, the inside of following load latch well 124 is transformed into atmospheric pressure state from vacuum state.
With reference to Figure 11 E, finish substrate S 1 after the processing and unload from last load latch well 122 and be sent to the outside.
Especially, under the state that unloads lower conveyor belt 150 rises, substrate S 1 moves on the conveyer belt 160 according to the operation of horizontal movement unit 130 at vertically movable conveyer belt 160.
If substrate S 1 fully is positioned on the vertically movable conveyer belt 160, then substrate S 1 is alignd by aligner.
And the inside of last load latch well 122 is transformed into vacuum state from atmospheric pressure state.
Subsequently, substrate S 3, and---it is waited in the rear end that is written into conveyer belt 140---is loaded into down load latch well 124.Detect the substrate S 4 that is positioned at substrate S 3 rears if be arranged on second inductor that is written into conveyer belt 140 rearward end below, thereby signal of described second inductor output is to second stop 142, then second stop 142 is operated in response to this output signal, and the operation that is written into conveyer belt 140 stops.
After by the alignment that is arranged on the aligner that is written into conveyer belt 140 rear ends, the substrate S 4 that moves is under the standby mode.
With reference to Figure 11 F, vertical movable conveyer belt 160 was reduced on the height identical with unloading lower conveyor belt 150 by elevating lever 168 after, the substrate S 1 that is positioned at vertically movable conveyer belt 160 moved along the moving direction that unloads lower conveyor belt 150.
Repeatedly carry out above-mentioned process, with to remaining substrate S 2, S3 ..., the processing expected in the mode identical of Sn with substrate S 1.
Second execution mode
Different with the first above-mentioned execution mode, present embodiment has adopted two vertically movable conveyer belts that are separately positioned on load latch well the place ahead and rear.This feasible each that goes up in load latch well and the following load latch well can be carried out being written into and unloading operation of substrate.The structure of other composed component is identical, not described hereinafter with element in the function and first execution mode.
Now, will---this method is used and according to the FPD manufacturing system of present embodiment substrate carried out desired processing---make an explanation to a kind of method.
With reference to Figure 13 A, a plurality of substrate S 1, S2 ..., Sn in turn transmits by the roller that is written into conveyer belt 240.In substrate, if being arranged on first inductor that is written into conveyer belt 240 belows at first detects top substrate S 1 and first stop 243 is exported a signal, then first stop 243 temporarily stops to move of substrate S 1 in response to this output signal operation in a pre-position that is written into conveyer belt 240.
Subsequently, substrate S 1 moves on in the following load latch well 224 of opening by being written into conveyer belt 240, so that 224 horizontal movement unit 230 moves along the chamber.
Detect the substrate S 1 that moves by horizontal movement unit 230 if be positioned at second inductor of substrate S 1 below, thereby signal of this second inductor output is to second stop 242, then second stop 242 is operated in response to this output signal, and the operation of horizontal movement unit 230 stops.
Then, after by the alignment that is arranged on the aligner that is written into conveyer belt 240 rear end, substrate S 1 is loaded into down in the load latch well 224.If substrate S 1 fully is written into, then descend load latch well 224 to adjust, and the inside in chamber 224 convert vacuum state to by an aeration.
With reference to Figure 13 B, substrate S 2 is elevated on the height of load latch well 222 by vertically movable conveyer belt 250 in front side and elevating lever 256.
After quilt fully raise, the substrate S 2 that is seated on the vertically movable conveyer belt 250 in front side was alignd by the aligner of conveyer belt 250.
If conveyer belt 250 has arrived at the height of last load latch well 222, then the vertical motion of vertically movable conveyer belt 250 stops.Simultaneously, when the substrate S 3 of another wait moves to down the porch of load latch well 224 by being written into conveyer belt 240, then be positioned at first and second inductors that are written into conveyer belt 240 belows are exported signal from the substrate directions to first and second stops 243 and 242.Thereby first and two stops 243 and 242 are operated in response to this output signal, thereby substrate S 3 is remained in the wait state, is positioned at the rear end that is written into conveyer belt 240.
Following load latch well 224 is transformed into vacuum state from atmospheric pressure state.
With reference to Figure 13 C, the inlet of last load latch well 222 has been opened, and then, substrate S 2 moves in the horizontal movement unit 230 that is arranged in the load latch well 222 according to the operation of the roller of the vertically movable conveyer belt 250 in front side.Simultaneously, substrate S 1 will be sent in the feeding chamber.
With reference to Figure 13 D, after substrate S 2 was loaded into wherein, the inside of last load latch well 222 was transformed into vacuum state from atmospheric pressure state.And substrate S 1 unloads from following load latch well 224, and is conveyed in the processing cavity of expectation by the mechanical arm (not shown) that is arranged in the feeding chamber, to accept plasma process.
With reference to Figure 13 E, the substrate S of finishing after the processing 1 moves on the horizontal movement unit 230 that is arranged on down in the load latch well 224.Then, the inside of following load latch well 224 is transformed into atmospheric pressure state from vacuum state.
The substrate S 2 that is loaded in the load latch well 222 is conveyed in the processing cavity of expectation by the mechanical arm (not shown) that is arranged in the feeding chamber, to accept plasma process.
With reference to Figure 13 F, the substrate S of finishing after the processing 1 unloads from load latch well 224 down, unloads on the lower conveyor belt 260 to move to.
When unloading substrate S 1, substrate S 3 is loaded into down in the load latch well 224.Then, the inside of following load latch well 224 is transformed into vacuum state from atmospheric pressure state.
Subsequently, be positioned at the vertically movable conveyer belt 250 in the front side that is written into conveyer belt 240 tops and reduce according to the operation of elevating lever 256, and other substrate S subsequently 4 under the effect that is written into conveyer belt 240 down load latch well 224 move.In the moving process of substrate S 4, if be positioned at that first and second inductors that are written into conveyer belt 240 belows detect the existence of substrate S 4 and to first and second stops 243 and 242 output signals, then first and second stops 243 and 242 are operated in response to this output signal, thereby substrate S 4 is remained in the wait state, is positioned at the rear end that is written into conveyer belt 240.
With reference to Figure 13 G, the substrate S 4 of wait is elevated on the height of load latch well 222 by being positioned at vertically movable conveyer belt 250 in the front side that is written into conveyer belt 240 tops and elevating lever 256.
The substrate S 4 that is seated on the vertically movable conveyer belt 250 in front side is alignd by the aligner of conveyer belt 250.
If conveyer belt 250 has arrived at the height of last load latch well 222, then the vertical motion of the vertically movable conveyer belt 250 in front side stops.Subsequently, when the substrate S 5 of another wait is moved to down the porch of load latch well 224 by the effect that is written into conveyer belt 240, be positioned at then that first and second inductors that are written into conveyer belt 240 belows detect the existence of substrate S 5 and to first and second stops 243 and 242 output signals.Thereby first and second stops 243 and 242 are operated in response to this output signal, thereby substrate S 5 is remained in the wait state, is positioned at the rear end that is written into conveyer belt 240.
Following load latch well 224 is transformed into vacuum state from atmospheric pressure state.
After this, one is arranged on the vertically movable conveyer belt 270 of the rear side that unloads on the lower conveyor belt 260 and is elevated on the height of the horizontal movement unit 230 that is arranged in the load latch well 222 by elevating lever 276.
With reference to Figure 13 H, the substrate S of finishing after the processing 2 is conveyed into load latch well 222 from feeding chamber.After this, the inside of last load latch well 222 is transformed into atmospheric pressure state from vacuum state.
Subsequently, the substrate S 3 that is loaded in down in the load latch well 224 is sent in the processing cavity of expectation by the mechanical arm (not shown) that is arranged in the feeding chamber, to accept plasma process.
With reference to Figure 13 I, the substrate S 2 that is loaded in the load latch well 222 moves to the vertically movable conveyer belt 270 of rear side, and the vertically movable conveyer belt 270 of this rear side is lifted on the height of load latch well 222.Simultaneously, the substrate S 4 that is seated on the vertically movable conveyer belt 250---this conveyer belt is lifted on the height of load latch well 222---in front side is loaded on the horizontal movement unit 230 that is arranged in the load latch well 222.
If substrate S 4 is loaded in the load latch well 222 by horizontal movement unit 230, the 3rd inductor that then is positioned at horizontal movement unit 230 belows detects the existence of substrate S 4 and exports a signal to the 3rd stop 232.Thereby the 3rd stop 232 is operated in response to this output signal stopping the motion of substrate S 2, and the operation of horizontal movement unit 230 stops.
After substrate S 4 was loaded in the load latch well 222, the inside of last load latch well 222 was transformed into vacuum state from atmospheric pressure state.
With reference to Figure 13 J, the vertically movable conveyer belt 270 of rear side that substrate S 2 is located thereon is reduced on the height that unloads lower conveyor belt 260 by elevating lever 276.Thereby substrate S 2 moves along unloading lower conveyor belt 260.
Subsequently, the substrate S of finishing after the processing 3 is sent to down the load latch well 224 from feeding chamber.
Remaining substrate S 4 and S5 will process in the same manner and move with aforesaid way.
The 3rd execution mode
Include last load latch well stacked on top of each other and following load latch well, feeding chamber, a plurality of processing cavity and a supply conveyer belt according to FPD manufacturing system of the present invention.Identical identical construction with described first execution mode will no longer repeatedly be explained.
According in the FPD manufacturing system of the present invention, be provided with cushion space at the front side and the rear side of last load latch well 322 and following load latch well 324.In order to make substrate be loaded into down the load latch well and stably to supply with when last load latch well unloads, the cushion space that this area equates with substrate is needs.
In order to limit above-mentioned cushion space, the front side that baffle plate 325 is arranged on load latch well 322 and following load latch well 324 is with rear side, be on the identical height with the border of last load latch well 322 and following load latch well 324.The effect of baffle plate 325 is to prevent dust, and---it is produced by the last substrate that is moved---drops on down on the substrate.
Though at least one baffle plate can be arranged on the front side and/or the rear side of load latch well 322 and following load latch well 324, the explanation of present embodiment is limited to two baffle plates 325 and is separately positioned on the front side of load latch well 322 and following load latch well 324 and the situation of rear side.
Preferably, each baffle plate is provided with an air-breather (not shown).Air-breather was used for before being written into substrate dust, and---it is the processed side product that remains on substrate and the following substrate S---is discharged to the outside.
Conveyer belt is arranged on the front side and the rear side of load latch well 322 and following load latch well 324, and the FPD manufacturing equipment that can in turn substrate be loaded into clustered neutralizes and unloads from the FPD manufacturing equipment of clustered.And, in order to limit the transmission passage of substrate S, on each, be formed with the substrate entrance and exit on the antetheca of load latch well 322 and following load latch well 324 and the rear wall, and preceding inlet and the back outlet of gate valve G to open and close each chamber 322 and 324 is set.
At this, can notice, conveyer belt includes horizontal movement unit 330, be written into conveyer belt 340 and unload lower conveyor belt 360, vertically movable conveyer belt 350 in front side and the vertically movable conveyer belt 370 of rear side, and auxiliary conveyer belt 350 ' and the auxiliary lower conveyor belt 370 ' that unloads of being written into, each vertically the roller of movable conveyer belt all alternately be provided with and can not interfere with the roller that is written into conveyer belt 340 or unloads lower conveyor belt 360, auxiliaryly be written into conveyer belt 350 ' and auxiliaryly unload that lower conveyor belt 370 ' is arranged on the vertically movable conveyer belt 350 in front side and the vertically movable conveyer belt 370 of rear side and upward in the antetheca and the space between the rear wall of load latch well 322.
Be written into conveyer belt 340 and unload lower conveyor belt 360 and be positioned at and be arranged on down the antetheca of load latch well 324 and the close position of gate valve G on the rear wall.Longitudinally be provided with a horizontal movement unit 330 in the following load latch well 324.Horizontal movement unit 330 be one be written into conveyer belt 340 and unload the roller conveyor that lower conveyor belt 360 is positioned on the equal height, aligns coaxially with it simultaneously.At this, be written into conveyer belt 340 and to unload lower conveyor belt 360 and horizontal movement unit 330 identical with structure and function in the above-mentioned first module, thereby, with the repetition of explanation of omitting it.
And, identical in vertically movable conveyer belt 350 and 370 structure and the function and first and second execution modes, except vertical movable conveyer belt 350 and 370 with the antetheca of following load latch well 324 and rear wall between separate by cushion space, thereby, with the repetition of explanation of omission to it.
Shown in Figure 14 or 15, the auxiliary conveyer belt 350 ' that is written into unloads front side and the rear side that lower conveyor belt 370 ' is positioned at baffle plate 325 tops, is positioned at load latch well 322 and following load latch well 324 with assisting.
Each is auxiliary be written into conveyer belt 350 ' and unload framework that lower conveyor belt 370 ' all includes a pair of setting in parallel with each other, a plurality of between described framework the uniform roller in space and a roller driving device (not shown) that is used for synchronously driving each roller.
Auxiliary be written into conveyer belt 350 ' and the auxiliary structure that unloads lower conveyor belt 370 ' is similarly, auxiliaryly be written into conveyer belt 350 ' and be provided with inductor and the stop except only having.
The auxiliary conveyer belt 370 ' that is written into is used to admit that a substrate S---described substrate S unloads from the horizontal movement unit 330 of last load latch well 322, and this substrate S is moved on the vertically movable conveyer belt 370 of rear side of rising.That is, the auxiliary conveyer belt 370 ' that is written into only is used for substrate S is sent to the vertically movable conveyer belt 370 of rear side from horizontal movement unit 330.
The auxiliary conveyer belt 350 ' that is written into is provided with a stop 352 ' away from the far-end of substrate approach axis.Stop 352 ' is used to limit the shift position of substrate S.
Hereinafter, will be written into and unload process to the substrate of the FPD manufacturing equipment of foundation present embodiment is described.
With reference to Figure 16 A, a plurality of substrate S 1, S2 ..., the roller of Sn by being written into conveyer belt 340 in turn transmit according to the operation of roller driving device (not shown), the place ahead substrate S 1 is at first by the aligner alignment of conveyer belt 340.
First inductor that is written into below, conveyer belt 340 rear ends detects the existence of substrate S 1 and to signal of first stop 342c output along being written into conveyer belt 340 when mobile constantly, being positioned at when substrate S 1.Thereby the first stop 342c works in response to output signal, to stop to move of substrate S 1 on a position before just being positioned at following load latch well 324.
Then, if the edge of back is written into second substrate S 2 that conveyer belt 340 moved, was positioned at substrate S 1 rear and is seated on the vertically movable conveyer belt 350 in front side, second inductor that then is positioned at its below detects the existence of substrate S 2 and to signal of second stop 342b output.Thereby the second stop 342b stops to move of substrate S 2 in response to this output signal.
And, if be positioned at vertically movable conveyer belt 350 front ends below, front side and detect the 3rd substrate S 3 that moves at substrate S 2 rears with the 3rd inductor that this front end is on the identical vertical pivot, thereby the 3rd inductor is to signal of the 3rd stop 342a output, then in response to this output signal, moving of the 3rd substrate S 3 stopped by the 3rd stop 342a, thereby do not enter into the vertically movable conveyer belt 350 in front side.
With reference to Figure 16 B, wait for that the substrate S 2 on the vertically movable conveyer belt 350 in front side is elevated on the height of load latch well 322 by conveyer belt 350 and elevating lever 356.
After rising fully, the substrate S 2 on the vertically movable conveyer belt 350 in front side is by the aligner alignment of conveyer belt 350.
Thereby second substrate S 2 has been ready to be loaded in the load latch well 322, and first substrate S 1 has been ready to be loaded into down in the load latch well 324.
With reference to Figure 16 C, an inlet of following load latch well 324 is opened, and then, the substrate S 1 of front moves to along with the operation that is written into conveyer belt 340 on the horizontal movement unit 330 that is arranged on down in the load latch well 324.
When substrate S 1 was moved by horizontal movement unit 330, the 4th inductor that is positioned at horizontal movement unit 330 belows detected substrate S 1, thereby the 4th inductor is to signal of the 4th stop 332 outputs.Thereby the 4th stop 332 is operated in response to output signal, and the operation of horizontal movement unit 330 stops.
Subsequently, being elevated to second substrate S 2 that is positioned on the equal height with last load latch well 322 horizontal axiss by the vertically movable conveyer belt 350 in front side is written into the operation of conveyer belt 350 ' and moves to load latch well 322 along with auxiliary.
The inside that is written into the following load latch well 324 of substrate S 1 is transformed into vacuum state from atmospheric pressure state.
Then, substrate S 1 is sent in the processing cavity of expectation by a mechanical arm (not shown) that is arranged in the feeding chamber, to accept plasma process.
With reference to Figure 16 D, the inside that is written into the last load latch well 322 of second substrate S 2 is transformed into vacuum state from atmospheric pressure state.
Then, substrate S 2 is sent in the processing cavity of expectation by a mechanical arm (not shown) that is arranged in the feeding chamber, to accept plasma process.
After this, the vertically movable conveyer belt 350 in front side is reduced on the height identical with being written into conveyer belt 340, stops at the 3rd substrate S 3 that is written on conveyer belt 340 1 precalculated positions by the 3rd inductor and the 3rd stop 342a and moves on the vertically movable conveyer belt 350 in front side.
With reference to Figure 16 E, first substrate S of finishing after the processing 1 is loaded into down on the horizontal movement unit 330 of load latch well 324 by mechanical arm.Then, the inside of following load latch well 324 is transformed into atmospheric pressure state from vacuum state.
Subsequently, following load latch well 324 is opened once more, makes substrate S 1 move to along with the operation of horizontal movement unit 330 and unloads on the lower conveyor belt 360.
Simultaneously, when the 3rd substrate S 3 after the alignment when inlet of load latch well 324 is mobile, be positioned at that the first sensor that is written into conveyer belt 340 belows detects the existence of the 3rd substrate S 3 and down to signal of first stop 342c output.Thereby the first stop 342c works in response to output signal, in the rear end that is written into conveyer belt 340 substrate S 1 is remained in the wait state.
And, be positioned at vertically movable conveyer belt 350 front ends below, front side and detect the 4th substrate S 4 that moves at substrate S 3 rear sides, thereby the 3rd inductor is to signal of the 3rd stop 342a output with the 3rd inductor that this front end is on the identical vertical pivot.Thereby the 3rd stop 342a temporarily stops to move of the 4th substrate S 4 in response to this output signal, enters into the vertically movable conveyer belt 350 in front side to prevent the 4th substrate S 4.
With reference to Figure 16 F, second substrate S of finishing after the processing 2 unloads from last load latch well 322 along with the operation of horizontal movement unit 330 by mechanical arm, moves to auxiliary unloading on the lower conveyor belt 370 '.
When unloading second substrate S 2, the 3rd substrate S 3 is loaded into down in the load latch well 324.Thereby, if being positioned at the 4th inductor of horizontal movement unit 330 belows detects the existence of the 3rd substrate S 3 that is moved by horizontal movement unit 330 and exports a signal to the 4th stop 332, then the 4th stop 332 is operated in response to this output signal, and the operation of horizontal movement unit 330 stops.
With reference to Figure 16 G, the substrate S 4 of wait is lifted on the height of load latch well 322 by being positioned at the vertically movable conveyer belt 350 and the elevating lever 356 that are written on the conveyer belt 340.
Then, the 4th substrate S 4 that is seated on the vertically movable conveyer belt 350 in front side is alignd by the aligner of conveyer belt 350.
And the vertically movable conveyer belt 370 of rear side is along with the operation of its elevating lever 376 is elevated on the height that is arranged on the horizontal movement unit 330 in the load latch well 322 from unloading lower conveyor belt 360.
Thereby second substrate S 2 moves on the vertically movable conveyer belt 370 of rear side, and the vertically movable conveyer belt 370 of this rear side is lifted on the interior height of load latch well 322.
With reference to Figure 16 H, be positioned at substrate S 2 on the vertically movable conveyer belt 370 of rear side along with the operation of elevating lever 376 is reduced on the height identical with unloading lower conveyor belt 360, thereby be discharged to the outside.
The 3rd substrate S of finishing after the processing 3 is sent to down in the load latch well 324 from feeding chamber.Then, the inside of following load latch well 324 is transformed into atmospheric pressure state from vacuum state.
When the 4th substrate S 4 after the alignment when inlet of load latch well 324 is mobile down, be positioned at first inductor that is written into conveyer belt 340 belows and detect the existence of substrate S 4 and end signal of 342c output to first grade.Thereby first grade is ended 342c and operates in response to this output signal, substrate S 4 is remained under the standby mode being written into conveyer belt 340 rear end.
If be positioned at vertically movable conveyer belt 350 front ends below, front side and detect the 5th substrate S 5 subsequently that moves later in substrate S 4 with the 3rd inductor that this front end is on the identical vertical pivot, thereby the 3rd inductor is to signal of the 3rd stop 342a output, then the 3rd stop 342a operates in response to this output signal, temporarily stopping to move of substrate S 5, thereby stop substrate S 5 to enter into conveyer belt 350.
Remaining substrate S 4 will process and move with S5 by the mode identical with said method.
The 4th execution mode
As shown in figure 17, the FPD manufacturing system 400 of present embodiment comprises one first substrate supply line 410, the second substrate supply line 420 and a processing module 430.
The first substrate supply line 410 is one and is arranged in the system side zone linearly and is suitable for along the predetermined direction member of mobile substrate continuously.The first substrate supply line 410 is provided with the first load latch well 412 in its pre-position.Especially, load latch well 412 is positioned at the link position place of the first substrate supply line 410 and processing module 430, and is used for substrate being loaded into processing module 430 and unloading from processing module 430, conversion repeatedly between atmospheric pressure state and vacuum state simultaneously.
The second substrate supply line 420 is one and is parallel to the 410 ground settings of the first substrate supply line and is suitable for along the predetermined direction member of mobile substrate continuously.Similar with the first substrate supply line 410, the second substrate supply line 420 is provided with the second load latch well 422 in its pre-position.
In the present embodiment, each in the first substrate supply line 410 and the second substrate supply line 420 all is designed to carry out being written into and unloading operation of substrate.Promptly, be not with one of described supply line be set as only carry out substrate being written into the operation and another supply line is set as the unloading operation of only carrying out substrate, any one supply line can selectively carry out according to the situation needs substrate be written into the operation and/or unloading operation.
Feeding chamber 432 all links to each other with the second load latch well 422 with the first load latch well 412 of the first substrate supply line 410 and the second substrate supply line 420.Feeding chamber 432 is used for a substrate that sends from outside platform is supplied to one of processing cavity 434, and the substrate that will finish after the processing is discharged to the outside.In the present embodiment, as shown in figure 17, the shape of feeding chamber 432 is long rectangles, and vertically is provided with the first substrate supply line 410 and the second substrate supply line 420.By this structure, substrate can side by side be fed into single feeding chamber or is discharged on the substrate supply line from feeding chamber from two substrate supply lines.Its advantage is: process substrate more effectively.
As shown in figure 18, in the feeding chamber 432 of present embodiment, be provided with the gadgetize arm 432a that is used to transmit substrate.For this reason, gadgetize arm 432a can flatly move in feeding chamber 432.Promptly, this gadgetize arm 432a can move to the first or second substrate supply line 410 or 420 by along continuous straight runs in feeding chamber 432, described feeding chamber 432 is joined to one another the first and second substrate supply lines 410 and 420, to receive substrate and substrate is sent to one of them processing cavity 434 from the first or second load latch well 412 or 422.For this reason, also be provided with horizontal rail 432b in the processing cavity 432 of present embodiment, make gadgetize arm 432a to move along track 432b.When usage level track 432b, can control accurately the mobile alignment of mechanical arm, thereby advantage is accurately to carry out the supply operation of substrate and can make a mistake.
Preferably, the first and second substrate supply lines 410 of present embodiment and 420 form be for can moving the conveyer belt that follows back of this substrate along a predetermined direction when its upper surface contacts with the lower surface of substrate, do not damage the danger of substrate with mobile substrate stably.
Therefore, as shown in figure 19, be provided with the conveyer belt that follows back that when its upper surface contacts with the lower surface of substrate, can move substrate in the first load latch well 412 and the second load latch well 422 along a predetermined direction.By the above-mentioned setting of present embodiment, the substrate that moves along the substrate supply line can be loaded in the load latch well effectively and unload from the load latch well.
Now, will the different operating example of the PFD manufacturing system 400 of foundation present embodiment be made an explanation.
At first, shown in Figure 20 A, the first substrate supply line 410 can be used as a substrate carrier lambda line and the second substrate supply line 420 can be used as a substrate unloads and roll off the production line to move substrate along a predetermined direction.In this case, substrate is written into constantly by the first substrate supply line 410, and in turn, the substrate that is loaded into is along with the operation that is arranged on the substrate gadgetize arm in the feeding chamber 432 supplies in the corresponding processing cavity.And the substrate of finishing after the processing is discharged on the second substrate supply line 420 from processing cavity along with the operation of mechanical arm.In this operating process, feeding chamber and load latch well are controlled to be fitted to each other.
Simultaneously, if be used as on the upper surface of the first substrate supply line 410 of substrate carrier lambda line a fault is arranged, then the Sheng Xia second substrate supply line 420 can be used as the substrate carrier lambda line, unloads and rolls off the production line and there is the first substrate supply line 410 of a fault to can be used as substrate on the upper surface.Therefore, even there is fault in the substrate supply line of a specific part, can repairs and safeguard and continue the operation of whole system it.In addition, the FPD manufacturing system of present embodiment can have very high operating efficiency and not need traditional cushion chamber, therefore, can reduce its floor space (footprint) significantly.
Alternatively, shown in Figure 20 B, each in the first substrate supply line 410 and the second substrate supply line 420 all can be used for carrying out being written into and unloading operation of substrate.For example, the substrate of supplying with by the first substrate supply line 410 is discharged by this first substrate supply line 410 after can be therein processing in processing cavity 434 once more, maybe can discharge by the second substrate supply line 420.Certainly, the substrate of supplying with by the second substrate supply line 420 can be discharged in the same manner as described above.The advantage of an operation example like this is: can use each load latch well and gadgetize arm in high operating efficiency ground, and the floor space of whole FPD manufacturing system can reduce significantly.
The 5th execution mode
As shown in figure 21, comprise a substrate supply line 510, first processing module 520 and one second processing module 530 according to the substrate transfer system 500 of present embodiment.
As shown in figure 21, load latch well 512 is connected to first processing module 520 and second processing module 530, thereby and have such advantage: it substrate can be loaded into first processing module 520 and 530 neutralizations of second processing module are unloaded from first processing module 520 and second processing module 530.In this case, load latch well 512 is provided with four gate valves.When forming vacuum in being desirably in chamber 512, four all gate valves all must be closed.Simultaneously, when expectation transmitted substrate, specific one---it is positioned on the substrate moving direction---in four gate valves must open, and simultaneously, other gate valve remains on the closed condition.Therefore, advantageously, a controller is set is fitted to each other, thereby correspondingly open or close according to process to allow four gate valves.In the present embodiment, controller can be the inductor of a cooperation.
Preferably, the form of the substrate supply line 510 of present embodiment be for can moving the conveyer belt that follows back of this substrate along a predetermined direction when its upper surface contacts with the lower surface of substrate, do not damage the danger of substrate with mobile substrate stably.
For this reason, as shown in figure 22, advantageously, be provided with the conveyer belt that follows back that when its upper surface contacts with the lower surface of substrate, can move substrate in the load latch well 512 of present embodiment along a predetermined direction.By the above-mentioned setting of present embodiment, the substrate that moves along substrate supply line 510 can be loaded in the load latch well 512 effectively and unload from load latch well 512.
In the present embodiment, substrate supply line 510 is configured to both can carry out the unloading operation that operation also can be carried out substrate that is written into of substrate.
The first substrate processing module 520 is one and is connected to substrate supply line 510 and is suitable for substrate is expected the member processed.
The first substrate processing module 520 of present embodiment comprises single feeding chamber 522 and a plurality of processing cavity 524.As shown in figure 21, single feeding chamber 522 medially is provided with, and a plurality of processing cavity 524 be arranged on feeding chamber 522 around, be connected simultaneously with feeding chamber 522.In this was provided with, a side of feeding chamber 522 was connected to the load latch well 512 that is arranged on the substrate supply line 510, made substrate to be loaded into to reach in the feeding chamber 522 by load latch well 512 and unloaded from feeding chamber 522.
The second substrate processing module 530 is one and is connected to substrate supply line 510 and is suitable for substrate is expected the member processed.Similar with the first substrate processing module 520, the second substrate processing module 530 comprises single feeding chamber 532 and a plurality of processing cavity 534.Feeding chamber 532 is connected to the load latch well 512 that is arranged on the substrate supply line 510, is used to be written into and unload substrate.
In the present embodiment, each in the first substrate processing module 520 and the second substrate processing module 530 all is designed to receive substrate and finished substrate is discharged to the outside by substrate supply line 510 from substrate supply line 510.When substrate to be processed supplied in two processing modules by single substrate supply line, it provides several advantages: the working (machining) efficiency of substrate had improved, and the floor space of whole system has reduced significantly.
The 6th execution mode
As shown in figure 24, comprise first, second and the 3rd substrate supply line 610,630 and the 620 and first and second substrate processing modules 640 and 650 according to the substrate transfer system 600 of present embodiment.
The first substrate supply line 610 is one and is arranged in substrate transfer system 600 lateral region linearly and is suitable for along the predetermined direction member of mobile substrate continuously.The first substrate supply line 610 is provided with the first load latch well 612 in its pre-position.Especially, load latch well 612 is positioned at the link position place of the first substrate supply line 610 and first processing module 640, and be used for that substrate is loaded into the neutralization of first processing module 640 and unload conversion repeatedly between an atmospheric pressure state and vacuum state simultaneously from first processing module 640.
The second substrate supply line 630 is one and is parallel to the 610 ground settings of the first substrate supply line and is suitable for along the predetermined direction member of mobile substrate continuously.Similar with the first substrate supply line 610, the second substrate supply line 630 is provided with one second load latch well 632 in its pre-position.
In the present embodiment, each in the first substrate supply line 610 and the second substrate supply line 630 all is designed to carry out being written into and unloading operation of substrate.
The first substrate processing module 640 is a member in the space between the first substrate supply line 610 and the second substrate supply line 630, links to each other with the first substrate supply line 610 simultaneously, and is suitable for processing that substrate is expected.
The second substrate processing module 650 is a member in the space between the first substrate supply line 610 and the second substrate supply line 630, links to each other with the second substrate supply line 630 simultaneously, and is suitable for processing that substrate is expected.Similar with first processing module 640, the second substrate processing module 650 comprises single feeding chamber 652 and a plurality of processing cavity 654.Feeding chamber 652 is connected to the second load latch well 632 that is arranged on the second substrate supply line 630, is used to be written into and unload substrate.
The 3rd substrate supply line 620 be one be arranged on linearly between first and second processing modules 640 and 650, with the first and second substrate supply lines 610 member parallel with 630.The 3rd substrate supply line 620 is suitable for being connected with 650 with first and second processing modules 640 simultaneously along a predetermined mobile constantly substrate of direction.For this reason, the 3rd substrate supply line 620 is provided with one the 3rd load latch well 622 in the position that itself and first and second processing modules 640 are connected with 650, be used for substrate is loaded into first and second processing modules 640 and 650 and unload conversion repeatedly between an atmospheric pressure state and vacuum state simultaneously from first and second processing modules 640 and 650.As shown in figure 24, the 3rd load latch well 622 all links to each other with 652 with first and second feeding chambers 642, thereby and have such advantage: substrate can be supplied to first and second processing modules 640 and 650 and discharge from first and second processing modules 640 and 650.In this case, the 3rd load latch well 622 is provided with four gate valves.When forming vacuum in being desirably in chamber 622, four all gate valves all must be closed.Simultaneously, when expectation transmitted substrate, specific one---it is positioned on the substrate moving direction---in four gate valves can open, and simultaneously, other gate valve remains on the closed condition.Therefore, advantageously, a controller is set is fitted to each other, thereby optionally open or close according to process to allow four gate valves.
Preferably, first, second of present embodiment and the 3rd substrate supply line 610,630 and 620 form be for can moving the conveyer belt that follows back of this substrate along a predetermined direction when its upper surface contacts with the lower surface of substrate, do not damage the danger of substrate with mobile substrate stably.
Therefore, as shown in figure 25, advantageously, all be provided with one at each in first, second and the 3rd load latch well 612,632 and 622 and follow back conveyer belt, this follows back conveyer belt for can move this substrate along a predetermined direction when its upper surface contacts with the lower surface of substrate.Be provided with by this of present embodiment, the substrate that moves along each substrate supply line can be loaded in the relevant load latch well effectively and unload from the associated load latch well.
Now, will the different operating example of the substrate transfer system 600 of foundation present embodiment be made an explanation.
At first, will the method for using two supply lines in first to the 3rd substrate supply line to be written into substrate, using remaining substrate supply line to unload substrate simultaneously be made an explanation.In the method, shown in Figure 26 A, freely select two supply lines from first to the 3rd substrate supply line, these two supply lines can be set as the substrate carrier lambda line, and remaining supply line can be set as substrate and unloads and roll off the production line.At this, can notice: as long as needs, the line that is written into that just can reset substrate rolls off the production line with unloading.Therefore, each substrate supply line can be easily converts substrate to from the substrate carrier lambda line and unloads and roll off the production line, and vice versa.For example, suppose the first and the 3rd substrate supply line 610 and 630 as the substrate carrier lambda line, if the upper surface of the first substrate supply line 610 breaks down, then the second substrate supply line 620 can be set as the substrate carrier lambda line to substitute the first substrate supply line 610.Therefore, the advantage of this operation example is: make can be in the process of fault wire reparation and maintenance process substrate constantly.Because two load latch wells are connected to single feeding chamber, thereby being written into and unloading operation of substrate can be carried out in opposite direction side by side, so can realize this advantage.
Simultaneously, shown in Figure 26 B, suppose that each line in first to the 3rd substrate supply line all is divided into to reach the standard grade and roll off the production line that three in reaching the standard grade two can be set as the substrate carrier lambda line, unload and roll off the production line and three in rolling off the production line two can be set as substrate.At this, a large amount of situations is two during three of selections are reached the standard grade or rolled off the production line.Thereby even one of three substrate supply lines break down in the time of also must being repaired, substrate can continue to be written into and to unload by two remaining lines.
Alternatively, each in three substrate supply lines all not only can be used as the substrate carrier lambda line but also can be used as substrate and unloads and roll off the production line.In this case, as shown in figure 27, the top of each substrate supply line can be set as the substrate carrier lambda line, unloads and rolls off the production line and the bottom of each line can be set as substrate.Simultaneously, must use each load latch well, unload from contiguous feeding chamber substrate is loaded into contiguous feeding chamber neutralization.The advantage of this operation example is: the working (machining) efficiency of substrate can improve double or more, and its floor space that occupies is identical with traditional substrate transfer system simultaneously.
The 7th execution mode
Now, will make an explanation to an execution mode that is used for the processing cavity of above-mentioned FPD manufacturing system.As shown in figure 28, the processing cavity of present embodiment comprises a cavity of resorption 712, a top electrode 714, a bottom electrode 716 and a retaining element 724.
Being shaped as of cavity of resorption 712 one has the hollow box of an open upper end, and is used for holding top electrode 714 and bottom electrode 716 within it.In order to be easy to separate, top electrode 714 so is installed in the cavity of resorption 712: have a specific gap between the inner wall surface of the periphery of top electrode 714 and cavity of resorption 712.Therefore,---for example plasma gas---oozed out this gap, be provided with a shielding element 722 in this gap in order to prevent processing gas.
One contact element 720 is arranged on the edge of lower surface of top electrode 714.Contact element 720 is step-like along the periphery of its lower surface.
The form of shielding element 722 is a L shaped cantilever beam and the pre-position that is fixed on cavity of resorption 712.Shielding element 722 is arranged on the identical horizontal plane with contact element 720, closely engages with the step shape part with contact element 720.By this structure, the free end of shielding element 722 joins the step shape part of contact element 720 securely to, thus the gap between sealing cavity of resorption 712 and the top electrode 714.
Preferably, shielding element 722 is by the anodised aluminium manufacturing.Shielding element 722 is arranged on the identical height with the lower surface of top electrode 714.The effect of this setting is: thus make the uniformity that plasma gas can flow equably and improve plasma process.
The lower end of retaining element 724 is partly recessed, and is seated in securely on the upper edge surface of cavity of resorption 712 by inserting an airtight element betwixt.Be located in the state this, the lower surface of retaining element 724 contacts with the upper surface of top electrode 714.
As shown in figure 29, the cap member 726 with suitable thickness can be inserted between the contact surface of retaining element 724 and top electrode 714.The area of cap member 726 equates with the area of top electrode 714, and is used for tackling electromagnetic wave.
As mentioned above, a gap is arranged between top electrode 714 and the cavity of resorption 712, allowing top electrode 714 easily to separate from cavity of resorption 712, and being provided with a shielding element 722 sealing this gap, thereby preventing processing gas---for example plasma gas---oozes out from the gap.
The 8th execution mode
Another execution mode that now explanation is used for the processing cavity of above-mentioned FPD manufacturing system.With reference to Figure 30, a plurality of processing cavitys are foreign peoples (disparate) processing cavity, and it is used for carrying out by different way the same course of processing.Therefore, these processing cavitys that are used for being undertaken by distinct methods identical processing are complementary each other.
For example, be used for the film that is formed on glass substrate being carried out under the situation of etched etched cavity, have such needs: use different etched cavities according to treating etched different film according to a specific pattern at one.For this reason, advantageously, a plurality of etched cavities have the setting of clustered, to deal with multiple film etching processing technology.
Especially, advantageously, (RTE) chamber of plasma etching (PE) chamber and reactive ion etching (reactiveion etching) is set---these two chambeies are complimentary to one another---and form single trooping.The PE chamber is suitable for carrying out active processing, and the RTE chamber is suitable for carrying out passive processing.This etched cavity of two types is arranged to single trooping makes and side by side to realize different etching and processing technology, and can reduce the substrate delivery time of multiple etching and processing technology.
Therefore, a plurality of processing cavitys can comprise (ICP) chamber of at least one PE chamber and at least one sense coupling plasma (inductively-coupled plasma).Because PE chamber and ICP chamber are complimentary to one another, this etched cavity of two types are arranged on singlely can realize above-mentioned effect in trooping.
Now, the FPD manufacturing system that use is had above-mentioned foreign peoples's etched cavity with reference to Figure 31 process of carrying out two etching and processing technologies makes an explanation.
At first, the substrate that will process in the FPD manufacturing system is loaded into (step S101) the load latch well 830 from external substrate supply station 840.If substrate is written in it, then in load latch well 830, form a vacuum state, open a gate valve G then substrate is loaded into (step S102) in the feeding chamber 810.The substrate that is written in the feeding chamber 810 is sent to the first etched cavity 820a, substrate is carried out initial etch processing (step S103).If substrate fully is loaded in the first etched cavity 820a, then gate valve is closed and is carried out initial etch and process (step S104).After finishing initial etch processing, substrate unloads (step S105) by gadgetize arm 812 from the first etched cavity 820a, and is loaded into subsequently among the second etched cavity 820b to carry out secondary etching and processing (step S106).If substrate fully is loaded in the second etched cavity 820b, then gate valve is closed substrate is carried out secondary etching and processing (step S107).After finishing secondary etching and processing, substrate unloads (step S108) by gadgetize arm 812 from the second etched cavity 820b, and is sent to (step S109) in the load latch well 830 subsequently.When the inside of load latch well 830 when vacuum state is transformed into atmospheric pressure state, substrate is discharged to external substrate supply station 840 (step S110).Thus, substrate need not be discharged to the outside, can greatly reduce whole process time owing to can carry out two different etch processs.
Can draw significantly from above-mentioned description, according to FPD manufacturing system of the present invention, a kind of manufacturing equipment of clustered---it comprises a plurality of load latch wells stacked on top of each other---has the setting of embarking on journey, and substrate can be written into and unload by the connecting gear that becomes line.And according to an embodiment of the invention, substrate is loaded into down in the load latch well and from last load latch well and unloads, and a vertically movable conveyer belt is arranged on the top of unloading lower conveyor belt.FPD manufacturing system with above-mentioned structure can reduce the whole process time and the floor space of system effectively.
In addition, according to the present invention, substrate can be handled on high transmission efficiency ground, and need not use a cushion chamber.This can greatly reduce the area of FPD manufacturing system.
Though disclose preferred implementation of the present invention for illustrative purposes, it will be appreciated by those skilled in the art that: can not depart from disclosed category of the present invention and spirit in the appended claim can multiple modification, interpolation and replacement form are arranged.
Claims (2)
1. the manufacturing system of a flat-panel monitor comprises:
Substrate supply line, described substrate supply line are arranged to linearly along the mobile continuously substrate of predetermined direction;
First processing module, described first processing module are arranged on a side place of described substrate supply line and have first feeding chamber and a plurality of processing cavitys that are connected to described first feeding chamber; And
Second processing module, described second processing module are arranged on the opposite side place of described substrate supply line and have second feeding chamber and a plurality of processing cavitys that are connected to described second feeding chamber;
Load latch well, described load latch well are connected to described first feeding chamber and described second feeding chamber;
Wherein, described first feeding chamber and described second feeding chamber are suitable for receiving described substrate also will be finished processing respectively via described load latch well described substrate discharge from described load latch well respectively.
2. the manufacturing system of flat-panel monitor as claimed in claim 1, wherein, described load latch well comprises the conveyer belt that transmits described substrate perpendicular to described predetermined direction by rotating.
Applications Claiming Priority (16)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2005-0044606 | 2005-05-26 | ||
| KR1020050044606A KR100737716B1 (en) | 2005-05-26 | 2005-05-26 | Apparatus for processing substrate with plasma |
| KR20050052005 | 2005-06-16 | ||
| KR10-2005-0052005 | 2005-06-16 | ||
| KR1020050070302A KR100959680B1 (en) | 2005-08-01 | 2005-08-01 | System for transferring the substrate |
| KR1020050070304A KR100965511B1 (en) | 2005-08-01 | 2005-08-01 | System for transferring the substrate |
| KR1020050070301A KR100934769B1 (en) | 2005-08-01 | 2005-08-01 | Substrate Transfer System |
| KR10-2005-0070302 | 2005-08-01 | ||
| KR10-2005-0070304 | 2005-08-01 | ||
| KR10-2005-0070301 | 2005-08-01 | ||
| KR10-2005-0074379 | 2005-08-12 | ||
| KR1020050074381A KR100965512B1 (en) | 2005-08-12 | 2005-08-12 | Flat panel display manufacturing machine |
| KR1020050074379A KR100959678B1 (en) | 2005-08-12 | 2005-08-12 | Flat panel display manufacturing machine |
| KR10-2005-0074381 | 2005-08-12 | ||
| KR10-2005-0074380 | 2005-08-12 | ||
| KR1020050074380A KR100934761B1 (en) | 2005-08-12 | 2005-08-12 | Flat panel display device manufacturing device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100784419A Division CN100481364C (en) | 2005-05-26 | 2006-05-26 | System for manufacturing panel display |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101308774A CN101308774A (en) | 2008-11-19 |
| CN101308774B true CN101308774B (en) | 2011-08-31 |
Family
ID=37443848
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100891392A Expired - Fee Related CN101308774B (en) | 2005-05-26 | 2006-05-26 | System for manufacturing flat display |
| CNB2006100784419A Expired - Fee Related CN100481364C (en) | 2005-05-26 | 2006-05-26 | System for manufacturing panel display |
| CN2008100891388A Expired - Fee Related CN101308773B (en) | 2005-05-26 | 2006-05-26 | System for manufacturing flat display |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100784419A Expired - Fee Related CN100481364C (en) | 2005-05-26 | 2006-05-26 | System for manufacturing panel display |
| CN2008100891388A Expired - Fee Related CN101308773B (en) | 2005-05-26 | 2006-05-26 | System for manufacturing flat display |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR100737716B1 (en) |
| CN (3) | CN101308774B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101367920B1 (en) * | 2007-05-18 | 2014-03-03 | 엘아이지에이디피 주식회사 | Plasma processing apparatus |
| KR100970201B1 (en) * | 2008-03-17 | 2010-07-14 | 주식회사 아이피에스 | Vacuum Processing Apparatus |
| CN102897522B (en) * | 2012-10-22 | 2015-12-09 | 大同齿轮(昆山)有限公司 | Conveying and the efficient processing unit (plant) coordinated of processing |
| CN116493296B (en) * | 2023-06-26 | 2023-09-12 | 福建鲲曜科技有限公司 | Silicon wafer sorting and splitting device and sorting and splitting method |
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|---|---|---|---|---|
| US5388945A (en) * | 1992-08-04 | 1995-02-14 | International Business Machines Corporation | Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers |
| US5944857A (en) * | 1997-05-08 | 1999-08-31 | Tokyo Electron Limited | Multiple single-wafer loadlock wafer processing apparatus and loading and unloading method therefor |
| US6176667B1 (en) * | 1996-04-30 | 2001-01-23 | Applied Materials, Inc. | Multideck wafer processing system |
| US6382895B1 (en) * | 1998-12-28 | 2002-05-07 | Anelva Corporation | Substrate processing apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002057106A (en) * | 2000-08-08 | 2002-02-22 | Tokyo Electron Ltd | Treatment unit and its cleaning method |
-
2005
- 2005-05-26 KR KR1020050044606A patent/KR100737716B1/en not_active IP Right Cessation
-
2006
- 2006-05-26 CN CN2008100891392A patent/CN101308774B/en not_active Expired - Fee Related
- 2006-05-26 CN CNB2006100784419A patent/CN100481364C/en not_active Expired - Fee Related
- 2006-05-26 CN CN2008100891388A patent/CN101308773B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5388945A (en) * | 1992-08-04 | 1995-02-14 | International Business Machines Corporation | Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transportable containers |
| US6176667B1 (en) * | 1996-04-30 | 2001-01-23 | Applied Materials, Inc. | Multideck wafer processing system |
| US5944857A (en) * | 1997-05-08 | 1999-08-31 | Tokyo Electron Limited | Multiple single-wafer loadlock wafer processing apparatus and loading and unloading method therefor |
| US6382895B1 (en) * | 1998-12-28 | 2002-05-07 | Anelva Corporation | Substrate processing apparatus |
Non-Patent Citations (1)
| Title |
|---|
| JP平6-252245A 1994.09.09 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100737716B1 (en) | 2007-07-10 |
| CN100481364C (en) | 2009-04-22 |
| CN101308774A (en) | 2008-11-19 |
| CN1870241A (en) | 2006-11-29 |
| KR20060122272A (en) | 2006-11-30 |
| CN101308773B (en) | 2010-04-21 |
| CN101308773A (en) | 2008-11-19 |
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