CN101813889A - Spraying device of liquid material thin film and spraying method thereof - Google Patents
Spraying device of liquid material thin film and spraying method thereof Download PDFInfo
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- CN101813889A CN101813889A CN201010126040A CN201010126040A CN101813889A CN 101813889 A CN101813889 A CN 101813889A CN 201010126040 A CN201010126040 A CN 201010126040A CN 201010126040 A CN201010126040 A CN 201010126040A CN 101813889 A CN101813889 A CN 101813889A
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Abstract
The invention relates to a spraying device of a liquid material thin film and a spraying method thereof, which belong to the technical field of semiconductor device production. The invention aims to solve the problem that sufficient atomization flow can not be ensured while enough thin ultrasonic atomization liquid particles are obtained. The spraying device comprises an atomization container, an ultrasonic vibration generator used for carrying out ultrasonic atomization operation, a liquid material input device used for introducing liquid raw materials, a carrier gas input device used for introducing carrier gas, a fog output device used for outputting fog and a spray nozzle used for receiving the fog and spraying the fog to a wafer to be sprayed, wherein the carrier gas is used for being mixed with the particles which is formed after the liquid materials are atomized to form the fog. The technical scheme has the characteristics that each functional module is independently installed in the scheme, and thereby, the overall work capacity and efficiency of the device are improved, and the waste of the liquid materials is greatly reduced, and then the environmental pollution is reduced; the thinner and evener spraying effect can be obtained, and a liquid thin film which is thinner and has better evenness can be generated; the spraying device can be used for spraying step surfaces.
Description
Technical field
The invention belongs to the semiconductor device production field, be specifically related to a kind of spray equipment and spraying method thereof of liquid material film.
Background technology
Photoetching is a technology very crucial in the semiconductor devices production technology, the quality of its photoresist mask quality greatly influences the quality of photoetching, the preparation method of traditional photoresist mask is the method that adopts rotation, the photoresist droplets of material that soon need smear is in the central authorities of wafer, the rotation wafer, after treating the solvent evaporates of photoresist the inside, form thin film, i.e. mask at crystal column surface at last.There is the serious phenomenon of waste in this process, most of photoresist is thrown out of, on crystal column surface, only stay the very thin photoresist of one deck of few quantity, simultaneously, this method can not be directly forms photoresist film having on the surface of step, along with the increasing of wafer size, traditional spin coating method further strengthens in the difficulty that the large scale crystal column surface forms evenly smooth photoresist film.
At the shortcoming of traditional whirl coating process, external in the manufacture process of some IC chip, adopted the method for manufacturing thin film that sprays.The principle of spraying has a variety of, as revolve a glass spraying, electrostatic spraying, plasma spraying, aerial spraying, thermal spray, ultrasonic spraying etc., at the special process environments requirement of IC chip manufacturing, as can not have impact, can not static electrification etc., adopted ultrasonic spraying to carry out the preparation of photoresist film abroad at present.Utilize the ultrasonic atomizatio technology, photoresist is atomized into tiny particle, other atomization method of comparing, the particle size of ultrasonic atomizatio is less, and therefore good uniformity is well suited for the preparation of photoresist film.Mainly contain two families at present abroad and be engaged in the exploitation of ultrasonic atomizatio equipment spraying, be the USI company of the U.S. and the SonoTek company of the U.S., its product all has above the preparation that is applied to photoresist film.
The method that liquid material film is made in the ultrasonic atomizatio spraying is by utilizing ultrasonic atomizing nozzle to carry out the atomizing and the spraying of liquid, forming liquid material film at device surface.At present, employed ultrasonic atomizing nozzle integrated ultrasonic oscillator in the general spraying process, ultrasonic transducer, ultrasonic amplitude transformer and ultrasonic atomizatio head are in one, its principle is: ultrasonator produces ultrasound wave, convert mechanical vibration to by ultrasonic transducer, amplification by ultrasonic amplitude transformer, form the mechanical vibration of bigger amplitude at the tip of ultrasonic atomizatio head, fluent material is transported to ultrasonic atomizatio head tip, under the oscillating action at ultrasonic atomizatio head tip, liquid is atomized into the small drop of particle diameter at the atomization surface of ultrasonic atomizatio head, control action by air-flow, atomizing particle flies to device surface, the motion of control ultrasonic nozzle makes its inswept equably device, thereby forms liquid material film at device surface.
Wherein, mentioned ultrasonic atomization technique has become common a kind of technological means at present, the formation mechanism of concrete ultrasonic atomizatio is such: the liquid liquid film covers on the smooth surface, and make it to vibrate, the direction and the Surface Vertical of vibration, the liquid absorbing member energy of vibration, and be translated into standing wave.This ripple is also referred to as capillary wave, forms the ripple of rectangle at liquid surface, and alternately occur crest and trough regularly on two right angle orientation.When the smooth surface Oscillation Amplitude increases, the also corresponding increase of wave amplitude, that is: crest uprises, and trough deepens.Finally can reach critical amplitude, at this moment, capillary wave is too high, can't keep stable.The result is the waveform disintegration, and drop ejects from the wave crest portion of disappearing vertical with atomization surface, and the mass median diameter of its atomizing particle can be formulated as:
Wherein, d---atomized drop mass median diameter; γ---atomized liquid surface tension;
ρ---fluid density; The f---ultrasonic frequency.
This shows that the frequency of ultrasonic atomizatio is high more, the mean diameter of the atomizing particle that obtains is more little; Surface tension of liquid is big more, and the mean diameter of the atomizing particle that obtains is big more.For obtaining littler atomizing particle,, need to improve frequency of ultrasonic and realize certain liquid.
On the other hand, when adopting ultrasonic atomizing nozzle to carry out the atomizing of fluent material and spraying, its flow can be expressed as:
The flow of F---atomized liquid; K---28500, constant;
The A---area that atomizes; The f---ultrasonic frequency.
The clump flow formula as can be seen, ultrasonic frequency is big more, its flow is more little, concerning certain atomizing area, for obtaining higher atomizing flow, must reduce frequency.
The method that ultrasonic atomizatio spraying at present prepare film just is applied in the photoetching process of salient point packaging technology, because the thickness of the photoresist film of technological requirement is at five to 100 microns, the mean diameter of fluent material atomizing particle at this moment is at tens microns; And the photo-mask process in the IC manufacturing process, photoresist thickness generally is about hundreds of nanometer to a micron, it is enough little that this atomizing particle mean diameter that just requires the ultrasonic atomizatio spraying to produce is wanted, must be below several microns.If adopt the pattern of ultrasonic nozzle atomizing spraying photoresist, the mean diameter of atomizing particle must be dwindled more than 10 times, according to the relation formula of ultrasonic frequency and atomizing particle diameter and the relation formula of ultrasonic frequency and atomizing flow, its atomizing flow has just dwindled more than 10 times.Be that its atomizing flow is just very little under tens microns the condition in the atomizing particle mean diameter, per minute is no more than 800 milliliters, dwindles ten times again, will reduce production efficiency greatly, can't satisfy need of industrial production; Simultaneously, ultrasonic frequency is high more, and the size of the piezoelectric chip of corresponding ultrasonic transducer is more little, and the amplitude of atomization surface is also corresponding thereupon reduces, and the atomizing ability also significantly reduces; And ultrasonic frequency is high more, and then the vibration frequency of ultrasonic amplitude transformer is high more, and high more to the strength of materials requirement of forming nozzle, requirement designed life of nozzle is not satisfied in the easier fatigure failure of material.Therefore adopt high-frequency ultrasonic atomizing nozzle form to carry out the preparation of liquid material film, actual on commercial Application is infeasible.
Summary of the invention
(1) technical matters that will solve
The technical problem to be solved in the present invention be in the prior art for obtaining enough thin ultrasonic atomizatio liquid particles rising vibration frequency, and then limit the problem of needed enough atomizing flows again.
(2) technical scheme
For solving the problems of the technologies described above, the invention provides a kind of spray equipment of liquid material film, comprising:
The atomizing container is used for the carrying liquid material and atomization space is provided;
Ultrasonic oscillator is arranged at described atomizing container bottom, is used for the fluent material in the described atomizing container is carried out the ultrasonic atomizatio operation;
The fluent material input media connects described atomizing container, is used for feeding liquid charging stock to described atomizing container;
The carrier gas input media connects described atomizing container, is used for feeding carrier gas to described atomizing container, and the particle that described carrier gas is used for forming with described fluent material atomizing back mixes formation fog;
The fog output unit connects described atomizing container, is used to export described fog;
Nozzle connects described fog output unit, is used to receive the fog of described fog output unit conveying and it is sprayed on wafer to be sprayed.
Be provided with baffle plate in the described atomizing container, be used to make described carrier gas to feed, realize that described carrier gas atomizes fully mixing of particle afterwards with described through the upper surface of described fluent material.
Described ultrasonic oscillator comprises several supersonic oscillations sheets, and the quantity of described supersonic oscillations sheet depends on the requirement of atomizing flow in the concrete application.
Described carrier gas be air, nitrogen or other not with the inert gas of described fluent material chemically reactive.
Described carrier gas input media is provided with flowmeter, is used to control the load volume of conveying.
Described fog output unit comprises air exhauster and fog fairing;
Described air exhauster is used for described fog from the suction of fog container to described fog output unit;
Described fog fairing is used for described fog is carried out rectification, forms uniform and stable one dimension fog and flows.
Described jet expansion is round exit, square outlet or the outlet of other given shape;
Described nozzle exit is provided with the fog retracting device, is used for reclaiming the drop that the fog that do not have ejection and spraying process reassemble and form.
Described fluent material input media, carrier gas input media and fog output unit all are connected to the constant temperature holding device, are used to keep described spray equipment to be in the running status of constant temperature.
The conveyance conduit of described fluent material input media, carrier gas input media and fog output unit is the concentric circles double-decker, and internal layer is used to carry fluent material, carrier gas or fog, and skin is used to carry constant temperature, liquid that heat exchanger effectiveness is high.
In addition, the present invention also provides a kind of spraying method of liquid material film, it is characterized in that, described method comprises the steps:
Step 1: start the constant temperature holding device, the heat exchanging process by the constant temperature holding device guarantees that whole device is in the running status of constant temperature;
Step 2: in the atomizing container, feed the fluent material of certain altitude by the fluent material input media, and guarantee that solution height keeps stable;
Step 3: start ultrasonic oscillator, atomize, feed carrier gas by the carrier gas input media simultaneously, be mixed into fog with fluent material particle after atomizing;
Step 4: start air exhauster, open each valve, with fog suction fog fairing;
Step 5: the fog fairing carries out rectification to fog, and the formation one dimension is stablized fog and flowed, and sprays from nozzle;
Step 6: according to the shape of spraying object, adjust direction of motion, distance and the spray angle of nozzle, spray;
Step 7: the shower nozzle drop that forms that do not have to reassemble in the fog of ejection and the spraying process is reclaimed by the fog retracting device.
Comprise in the described step 3, the load volume that feeds is controlled by the flowmeter that is arranged on the carrier gas conveying device;
Comprise in the step 6, change the nozzle of different outlet shapes, to adapt to different spraying requirements.
(3) beneficial effect
At the deficiencies in the prior art and defective, the pattern that technical solution of the present invention is jumped out the integrated ultrasonic concussion atomizing of nozzle in the prior art, carried and spray repertoire, adopt the high-frequency ultrasonic oscillator plate to be directly installed on liquid internal, guarantee to obtain enough thin ultrasonic atomizatio liquid particles in high frequency ultrasound, rely on the supersonic oscillations sheet that sufficient amount is installed simultaneously, guarantee the atomizing flow that suitability for industrialized production needs.Apparatus structure that this technical scheme provided and spraying method are by the ultrasonic atomizatio technology, fluent material is carried out nebulisation operation, by carrier gas, carry out the air-flow rectification then, make the spout of spraying at last through particular design, be ejected into device surface, form liquid material film, and can spray angle be applicable on the surface of step and form liquid material film through adjusting nozzle; The concrete feature of this technical scheme can show as: each functional module independently is provided with in (1) apparatus structure scheme, and Each performs its own functions, compared to prior art in the integrated unified running of each functional module, improved the ability to work and the work efficiency of spray equipment integral body; (2) significantly reduce the waste of fluent material in the spraying coating process, and then reduce environmental pollution; (3) can be sprayed under the specified temp, viscosity obtains the thinner effect that more uniformly sprays less than the fluent material of 30 centipoises, and it is thinner to produce thickness, the better fluid film of uniformity coefficient; (4) can spray step surface by adjusting spray angle.
Description of drawings
Fig. 1 is about the synoptic diagram of spray equipment in the embodiment of the invention;
Fig. 2 is the synoptic diagram of nozzle head in the embodiment of the invention;
Fig. 3 is the synoptic diagram of fog fairing in the embodiment of the invention;
Fig. 4 is the synoptic diagram of the spout of circle in the embodiment of the invention;
Fig. 5 is the synoptic diagram of the spout of rectangle in the embodiment of the invention;
Fig. 6 is the synoptic diagram of nozzle scan mode in the embodiment of the invention;
Embodiment
For making purpose of the present invention, content and advantage clearer,, the specific embodiment of the present invention is described in further detail below in conjunction with drawings and Examples.Following examples only are used for technical scheme of the present invention more clearly is described, and can not limit protection scope of the present invention with this.
Embodiment
Present embodiment specifically describes spray equipment and the method thereof that realizes photoresist film according to technical scheme of the present invention.
At first, spray equipment about described photoresist film, be to adopt similar ultrasonic humidifier working forms, the high frequency mechanical oscillation that utilizes ultrasonator to produce directly arrives liquid level by liquid transfer, form capillary wave at liquid surface, can obtain thinner atomizing particle, a plurality of such ultrasonators are installed, can obtain the ultrasonic atomizatio amount that needs.
As shown in Figure 1, described spray equipment comprises:
Atomizing container 103 is used for splendid attire photoresist solution 101 and atomization space is provided;
Ultrasonic oscillator, be arranged at described atomizing container 103 bottoms, comprise several supersonic oscillations sheets 102, the quantity of described supersonic oscillations sheet 102 depends on the requirement of atomizing flow in the concrete application, is used for the photoresist solution 101 in the described atomizing container 103 is carried out the ultrasonic atomizatio operation;
Photoresist solution input media 116, connect described atomizing container 103, be used at atomization process, constantly photoresist solution 118 is passed in the described atomizing container 103 by valve 119, to replenish the photoresist solution that is atomized, guarantee that photoresist solution 101 is in a static relatively height in described atomizing container 103, to keep constant atomization quantity;
Carrier gas input media 125, connect described atomizing container 103, be used for feeding a certain amount of carrier gas 122 to described atomizing container 103, the particle that described carrier gas 122 is used for forming with photoresist atomizing back mixes formation fog 106, and described fog 106 is pushed described fog output unit 107;
Fog output unit 107 connects described atomizing container 103, is used for described fog 106 is delivered to nozzle 110;
Nozzle 110 connects described fog output unit 107, is used to receive the fog 106 of described fog output unit 107 conveyings and it is sprayed on wafer 111, forms evenly smooth film on wafer 111.
Be provided with baffle plate 126 in the described atomizing container 103, be used to make described carrier gas 122 to feed, realize that described carrier gas 122 atomizes fully mixing of particle afterwards with described through the upper surface of photoresist solution 101.
Described carrier gas 122 be air, nitrogen or other not with the inert gas of described fluent material chemically reactive.
Described carrier gas input media 125 is provided with valve 123 and flowmeter 124, be used to control the load volume of feeding, the frequency of control ultrasonic oscillator simultaneously accurately can guarantee to control the size of the atomizing particle amount of jet expansion, and then guarantee the homogeneity of spraying and the thickness of photoresist film layer.
Be provided with valve 104 between described fog container 103 and the fog output unit 107;
Described fog output unit 107 comprises air exhauster 105 and fog fairing 108;
Described air exhauster 105 is used for described fog 106 from 103 suction of fog container to described fog output unit 107;
Described fog fairing 108 is used for described fog is carried out rectification, forms uniform and stable one dimension fog and flows, and as shown in Figure 3,301 is baffler, and 302 is through hole, and fog enters into the downstream of fog conveying device from through hole 302, goes out from nozzle ejection then.
Described nozzle 110 outlets are round exit, square outlet or the outlet of other given shape, and as shown in Figure 4,401 for fog reclaims the inclined-plane, and 402 is jet expansion, exports the cross section into circle; As shown in Figure 5,501 for fog reclaims the inclined-plane, and 502 is jet expansion, exports the cross section into rectangle;
Described nozzle 110 exits are provided with fog retracting device 109, described fog retracting device 109 is used for reclaiming the drop 113 that the fog that do not have ejection and spraying process reassemble and form by liquids recovery pipeline 112, thereby reduce the waste of sprayed on material, reduce environmental pollution, be convenient to recycling and harmless treatment;
As shown in Figure 2, fog is ejected on the crystal column surface from jet hole 201 ejections, and the fog retracting device reclaims by 202 pairs of drops that are blocked on jet hole of recovery channel and fog; Simultaneously, the drop that part fog can be condensed on inclined-plane 203,204 again also reclaims from recovery channel 202;
Described photoresist solution input media 116, carrier gas input media 125 and fog output unit 107 all are connected to the complicated piping system of constant temperature holding device, and valve is installed all above, the switching of controlling plumbing fixtures, described constant temperature holding device are used to keep described device to be in the running status of constant temperature.
The conveyance conduit of described photoresist solution input media 116, carrier gas input media 125 and fog output unit 107 is the concentric circles double-decker, internal layer is used to carry fluent material, carrier gas or fog, and skin is used to carry constant temperature, liquid that heat exchanger effectiveness is high.The utilidor of described photoresist solution conveying device 116, carrier gas conveying device 125 and fog conveying device 107 forms the heat insulation liquid conveyance conduit of a UNICOM, and heat insulation liquid is carried in circulation, keeps the intrasystem temperature constant of pipeline.
Secondly, the spraying method about described photoresist film comprises the steps:
Step 1: start the constant temperature holding device, the heat exchanging process by the constant temperature holding device guarantees that whole device is in the running status of constant temperature;
As shown in Figure 1, for making system keep stationary temperature, the conveyance conduit of the conveyance conduit of the pipeline of the delivery of carrier gas of carrier gas conveying device and photoresist solution conveying device and fog conveying device is the concentric circles double-layer structure, the logical medium of being carried of internal layer, the water of outer logical constant temperature is according to the difference of photoresist viscosity, water temperature is also different, under this water temperature, the viscosity of photoresist makes atomizing evenly carry out effectively less than 30 centipoises.The device of the conveying water temperature of outer layer pipe can be regarded a constant temperature holding device of keeping fixed temperature as, so that the liquid of different viscosities under different temperature, obtains good atomizing effect.121,117,114,115 the insides are the heat insulation liquid of conveying among Fig. 1, heat insulation liquid is water generally speaking, also can be the high liquid of other heat exchanger effectiveness, heat insulation liquid in the pipeline circulates by pump and other external module, keep stationary temperature, the whole operation of maintenance system is in the running status of constant temperature, and then obtains uniform film coating at crystal column surface.
Step 2: in the atomizing container, feed the fluent material of certain altitude by the fluent material conveying device, and guarantee that solution height keeps stable;
Step 3: start the ultrasonic oscillator group, described ultrasonic oscillator group is equipped with a plurality of ultrasonic oscillators according to the size of atomization quantity, atomize, feed carrier gas 122 by carrier gas conveying device 125 simultaneously, be mixed into fog with the fluent material particle after the atomizing, described carrier gas is passed through by the surface of photoresist solution under the effect of baffle plate 126, and realization fully mixes with photoresist solution;
Described carrier gas is that air, nitrogen or other do not produce the gas of chemical reaction with photoresist solution;
Step 4: start air exhauster, open each valve, fog is fed the fog fairing by the fog conveying device;
Step 5: the fog fairing carries out rectification to fog, forms uniform and stable one dimension fog and flows, and sprays from nozzle;
Step 6: adjust direction of motion, distance and the spray angle of nozzle, spray, scanned the surface of wafer, just photoresist can be sprayed on crystal column surface equably, on wafer, form the photoresist thin layer.Because the move distance of nozzle is adjustable, thereby spraying all can form evenly smooth photoresist thin layer on the crystal column surface of virtually any size, is not subjected to the restriction of wafer size, adjusts the angle of nozzle simultaneously, can realize the spraying of ledge surface;
As shown in Figure 6,601 is the wafer that will apply, and nozzle comes flyback retrace in a direction indicated by the arrow, till covering whole wafer.And then on wafer, be coated with and apply very thin one deck photoresist.
Step 7: by the fog retracting device shower nozzle is not had the fog of ejection and the drop that forms that reassembles to reclaim, can significantly reduce the waste of photoetching process photoresist, and then reduce environmental pollution.
Comprise in the described step 3, the load volume that feeds is controlled by the flowmeter that is arranged on the carrier gas conveying device;
Comprise in the step 6, change the nozzle of different outlet shapes, to adapt to different spraying requirements.
Technical solution of the present invention is at the deficiencies in the prior art and defective, the pattern of jump out the integrated ultrasonic concussion atomizing of nozzle in the prior art, carrying and spraying repertoire, adopt the high-frequency ultrasonic oscillator plate to be directly installed on liquid internal, guarantee to obtain enough thin ultrasonic atomizatio liquid particles in high frequency ultrasound, rely on the supersonic oscillations sheet that sufficient amount is installed simultaneously, guarantee the atomizing flow that suitability for industrialized production needs.Apparatus structure that this technical scheme provided and spraying method are by the ultrasonic atomizatio technology, fluent material is carried out nebulisation operation, by carrier gas, carry out the air-flow rectification then, make the spout of spraying at last through particular design, be ejected into device surface, form liquid material film, and can spray angle be applicable on the surface of step and form liquid material film through adjusting nozzle; The concrete feature of this technical scheme can show as: each functional module independently is provided with in (1) apparatus structure scheme, and Each performs its own functions, compared to prior art in the integrated unified running of each functional module, improved the ability to work and the work efficiency of spray equipment integral body; (2) significantly reduce the waste of fluent material in the spraying coating process, and then reduce environmental pollution; (3) can be sprayed under the specified temp, viscosity obtains the thinner effect that more uniformly sprays less than the fluent material of 30 centipoises, and it is thinner to produce thickness, the better fluid film of uniformity coefficient; (4) can spray step surface by adjusting spray angle.
The above only is a preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the technology of the present invention principle; can also make some improvement and distortion, these improvement and distortion also should be considered as protection scope of the present invention.
Claims (11)
1. the spray equipment of a liquid material film is characterized in that, described device comprises:
The atomizing container is used for the carrying liquid material and atomization space is provided;
Ultrasonic oscillator is arranged at described atomizing container bottom, is used for the fluent material in the described atomizing container is carried out the ultrasonic atomizatio operation;
The fluent material input media connects described atomizing container, is used for feeding liquid charging stock to described atomizing container;
The carrier gas input media connects described atomizing container, is used for feeding carrier gas to described atomizing container, and the particle that described carrier gas is used for forming with described fluent material atomizing back mixes formation fog;
The fog output unit connects described atomizing container, is used to export described fog;
Nozzle connects described fog output unit, is used to receive the fog of described fog output unit conveying and it is sprayed on wafer to be sprayed.
2. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, is provided with baffle plate in the described atomizing container, is used to make described carrier gas to feed through the upper surface of described fluent material, realizes that described carrier gas atomizes fully mixing of particle afterwards with described.
3. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, described ultrasonic oscillator comprises several supersonic oscillations sheets, and the quantity of described supersonic oscillations sheet depends on the requirement of atomizing flow in the concrete application.
4. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, described carrier gas be air, nitrogen or other not with the inert gas of described fluent material chemically reactive.
5. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, described carrier gas input media is provided with flowmeter, is used to control the load volume of conveying.
6. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, described fog output unit comprises air exhauster and fog fairing;
Described air exhauster is used for described fog from the suction of fog container to described fog output unit;
Described fog fairing is used for described fog is carried out rectification, forms uniform and stable one dimension fog and flows.
7. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, described jet expansion is round exit, square outlet or the outlet of other given shape;
Described nozzle exit is provided with the fog retracting device, is used for reclaiming the drop that the fog that do not have ejection and spraying process reassemble and form.
8. the spray equipment of liquid material film as claimed in claim 1, it is characterized in that, described fluent material input media, carrier gas input media and fog output unit all are connected to the constant temperature holding device, are used to keep described spray equipment to be in the running status of constant temperature.
9. the spray equipment of liquid material film as claimed in claim 1, it is characterized in that, the conveyance conduit of described fluent material input media, carrier gas input media and fog output unit is the concentric circles double-decker, internal layer is used to carry fluent material, carrier gas or fog, and skin is used to carry constant temperature, liquid that heat exchanger effectiveness is high.
10. the spraying method of a liquid material film is characterized in that, described method comprises the steps:
Step 1: start the constant temperature holding device, the heat exchanging process by the constant temperature holding device guarantees that whole device is in the running status of constant temperature;
Step 2: in the atomizing container, feed the fluent material of certain altitude by the fluent material input media, and guarantee that solution height keeps stable;
Step 3: start ultrasonic oscillator, atomize, feed carrier gas by the carrier gas input media simultaneously, be mixed into fog with fluent material particle after atomizing;
Step 4: start air exhauster, open each valve, with fog suction fog fairing;
Step 5: the fog fairing carries out rectification to fog, and the formation one dimension is stablized fog and flowed, and sprays from nozzle;
Step 6: according to the shape of spraying object, adjust direction of motion, distance and the spray angle of nozzle, spray;
Step 7: the shower nozzle drop that forms that do not have to reassemble in the fog of ejection and the spraying process is reclaimed by the fog retracting device.
11. the spraying method of liquid material film as claimed in claim 10 is characterized in that, comprises in the described step 3, by the flowmeter that is arranged on the carrier gas conveying device load volume that feeds is controlled;
Comprise in the step 6, change the nozzle of different outlet shapes, to adapt to different spraying requirements.
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| CN104233224A (en) * | 2013-06-13 | 2014-12-24 | 浩升开发科技股份有限公司 | Spray ultrasonic coating system and coating method |
| CN104562451A (en) * | 2014-12-31 | 2015-04-29 | 杭州诺邦无纺股份有限公司 | Easy-cleaning non-woven fabric and manufacturing method thereof |
| WO2017173987A1 (en) * | 2016-04-05 | 2017-10-12 | 北京梦之墨科技有限公司 | Inverted liquid metal spray printing apparatus and printing method |
| CN109795112A (en) * | 2019-01-31 | 2019-05-24 | 厦门瑶光半导体科技有限公司 | Ultrasonic 3D jet printing appts and its purposes for being used to prepare transparent conductive film |
| CN111804498A (en) * | 2020-06-24 | 2020-10-23 | 沈阳芯源微电子设备股份有限公司 | Nozzle device and spraying method for high-aspect-ratio deep-hole structure wafer or thin glue spraying wafer |
| CN113161445A (en) * | 2020-12-31 | 2021-07-23 | 中国建材国际工程集团有限公司 | CdTe thin film solar cell activation process |
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| WO2017173987A1 (en) * | 2016-04-05 | 2017-10-12 | 北京梦之墨科技有限公司 | Inverted liquid metal spray printing apparatus and printing method |
| CN109795112A (en) * | 2019-01-31 | 2019-05-24 | 厦门瑶光半导体科技有限公司 | Ultrasonic 3D jet printing appts and its purposes for being used to prepare transparent conductive film |
| CN111804498A (en) * | 2020-06-24 | 2020-10-23 | 沈阳芯源微电子设备股份有限公司 | Nozzle device and spraying method for high-aspect-ratio deep-hole structure wafer or thin glue spraying wafer |
| CN111804498B (en) * | 2020-06-24 | 2022-05-06 | 沈阳芯源微电子设备股份有限公司 | Nozzle device and spraying method for high-aspect-ratio deep-hole structure wafer or thin glue spraying wafer |
| CN113161445A (en) * | 2020-12-31 | 2021-07-23 | 中国建材国际工程集团有限公司 | CdTe thin film solar cell activation process |
| CN113571599A (en) * | 2021-06-08 | 2021-10-29 | 中国建材国际工程集团有限公司 | Cadmium telluride thin film solar cell, preparation method and activation treatment equipment |
| CN113571599B (en) * | 2021-06-08 | 2024-01-26 | 中国建材国际工程集团有限公司 | Cadmium telluride thin film solar cell, preparation method and activation treatment equipment |
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