CN101813889B - Spraying device of liquid material thin film and spraying method thereof - Google Patents
Spraying device of liquid material thin film and spraying method thereof Download PDFInfo
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- CN101813889B CN101813889B CN2010101260402A CN201010126040A CN101813889B CN 101813889 B CN101813889 B CN 101813889B CN 2010101260402 A CN2010101260402 A CN 2010101260402A CN 201010126040 A CN201010126040 A CN 201010126040A CN 101813889 B CN101813889 B CN 101813889B
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Abstract
The invention relates to a spraying device of a liquid material thin film and a spraying method thereof, which belong to the technical field of semiconductor device production. The invention aims to solve the problem that sufficient atomization flow can not be ensured while enough thin ultrasonic atomization liquid particles are obtained. The spraying device comprises an atomization container, an ultrasonic vibration generator used for carrying out ultrasonic atomization operation, a liquid material input device used for introducing liquid raw materials, a carrier gas input device used for introducing carrier gas, a fog output device used for outputting fog and a spray nozzle used for receiving the fog and spraying the fog to a wafer to be sprayed, wherein the carrier gas is used for being mixed with the particles which is formed after the liquid materials are atomized to form the fog. The technical scheme has the characteristics that each functional module is independently installed in the scheme, and thereby, the overall work capacity and efficiency of the device are improved, and the waste of the liquid materials is greatly reduced, and then the environmental pollution is reduced; the thinner and evener spraying effect can be obtained, and a liquid thin film which is thinner and has better evenness can be generated; the spraying device can be used for spraying step surfaces.
Description
Technical field
The invention belongs to the semiconductor device production field, be specifically related to a kind of spray equipment and spraying method thereof of liquid material film.
Background technology
Photoetching is a technology very crucial in the semiconductor devices production technology; The quality of its photoresist mask quality greatly influences the quality of photoetching, and the preparation method of traditional photoresist mask is the method that adopts rotation, and the photoresist droplets of material that soon need smear is in the central authorities of wafer; The rotation wafer; After treating the solvent evaporates of photoresist the inside, form thin film, i.e. mask at crystal column surface at last.There is the serious phenomenon of waste in this process; Most of photoresist is thrown out of; On crystal column surface, only stay the very thin photoresist of one deck of few quantity, simultaneously, this method can not be directly forms photoresist film having on the surface of step; Along with the increasing of wafer size, traditional spin coating method further strengthens in the difficulty that the large scale crystal column surface forms evenly smooth photoresist film.
To the shortcoming of traditional whirl coating process, external in the manufacture process of some IC chip, adopted the method for manufacturing thin film that sprays.The principle of spraying has a variety of; As revolve a glass spraying, electrostatic spraying, plasma spraying, aerial spraying, thermal spray, ultrasonic spraying etc.; To the special process environments requirement of IC chip manufacturing; As can not have impact, can not static electrification etc., adopted ultrasonic spraying to carry out the preparation of photoresist film abroad at present.Utilize the ultrasonic atomizatio technology, photoresist is atomized into tiny particle, other atomization method of comparing, the particle size of ultrasonic atomizatio is less, and therefore good uniformity is well suited for the preparation of photoresist film.Mainly contain two families at present abroad and be engaged in the exploitation of ultrasonic atomizatio equipment spraying, be the USI company of the U.S. and the SonoTek company of the U.S., its product all has above the preparation that is applied to photoresist film.
The method that liquid material film is made in the ultrasonic atomizatio spraying is through utilizing ultrasonic atomizing nozzle to carry out the atomizing and the spraying of liquid, forming liquid material film at device surface.At present, employed ultrasonic atomizing nozzle integrated ultrasonic oscillator, ultrasonic transducer, ultrasonic amplitude transformer and ultrasonic atomizatio head are in one in the general spraying process, and its principle is: ultrasonator produces ultrasound wave; Convert mechanical vibration to through ultrasonic transducer,, form the mechanical vibration of bigger amplitude at the tip of ultrasonic atomizatio head through the amplification of ultrasonic amplitude transformer; Fluent material is transported to ultrasonic atomizatio head tip; Under the most advanced and sophisticated oscillating action of ultrasonic atomizatio head, liquid is atomized into the small drop of particle diameter at the atomization surface of ultrasonic atomizatio head, through the control action of air-flow; Atomizing particle flies to device surface; The motion of control ultrasonic nozzle makes its inswept equably device, thereby forms liquid material film at device surface.
Wherein, Mentioned ultrasonic atomization technique has become common a kind of technological means at present; The formation mechanism of concrete ultrasonic atomizatio is such: the liquid liquid film covers on the smooth surface, and makes it vibration, the direction of vibration and Surface Vertical; The liquid absorbing member energy of vibration, and be translated into standing wave.This ripple also is called as capillary wave, forms the ripple of rectangle at liquid surface, and on two right angle orientation, alternately occurs crest and trough regularly.When the smooth surface Oscillation Amplitude increases, the also corresponding increase of wave amplitude, that is: crest uprises, and trough deepens.Finally can reach critical amplitude, at this moment, capillary wave is too high, can't keep stable.The result is the waveform disintegration, and drop ejects from the wave crest portion of disappearing vertical with atomization surface, and the mass median diameter of its atomizing particle can be formulated as:
Wherein, d---atomized drop mass median diameter; γ---atomized liquid surface tension;
ρ---fluid density; The f---ultrasonic frequency.
This shows that the frequency of ultrasonic atomizatio is high more, the mean diameter of the atomizing particle that obtains is more little; Surface tension of liquid is big more, and the mean diameter of the atomizing particle that obtains is big more.For obtaining littler atomizing particle,, need to improve frequency of ultrasonic and realize certain liquid.
On the other hand, when adopting ultrasonic atomizing nozzle to carry out atomizing and the spraying of fluent material, its flow can be expressed as:
The flow of F---atomized liquid; K---28500, constant;
The A---area that atomizes; The f---ultrasonic frequency.
The clump flow formula can find out that ultrasonic frequency is big more, and its flow is more little, concerning certain atomizing area, for obtaining higher atomizing flow, must reduce frequency.
The method that ultrasonic atomizatio spraying at present prepare film just is applied in the photoetching process of salient point packaging technology, because the thickness of the photoresist film of technological requirement is at five to 100 microns, the mean diameter of fluent material atomizing particle at this moment is at tens microns; And the photo-mask process in the IC manufacturing process, photoresist thickness generally is about hundreds of nanometer to a micron, it is enough little that this atomizing particle mean diameter that just requires the ultrasonic atomizatio spraying to produce is wanted, must be below several microns.If adopt the pattern of ultrasonic nozzle atomizing spraying photoresist; Must the mean diameter of atomizing particle be dwindled more than 10 times; According to the relation formula of ultrasonic frequency and atomizing particle diameter and the relation formula of ultrasonic frequency and atomizing flow, its atomizing flow has just dwindled more than 10 times.Be that its atomizing flow is just very little under tens microns the condition in the atomizing particle mean diameter, per minute is no more than 800 milliliters, dwindles ten times again, will reduce production efficiency greatly, can't satisfy need of industrial production; Simultaneously, ultrasonic frequency is high more, and the size of the piezoelectric chip of corresponding ultrasonic transducer is more little, and the amplitude of atomization surface is also corresponding thereupon reduces, and the atomizing ability also significantly reduces; And ultrasonic frequency is high more, and then the vibration frequency of ultrasonic amplitude transformer is high more, and high more to the strength of materials requirement of forming nozzle, material more easy fatigue destroys, and has satisfied not requirement designed life of nozzle.Therefore adopt high-frequency ultrasonic atomizing nozzle form to carry out the preparation of liquid material film, actual on commercial Application is infeasible.
Summary of the invention
The technical matters that (one) will solve
The technical matters that the present invention will solve be in the prior art for obtaining enough thin ultrasonic atomizatio liquid particles rising vibration frequency, and then limit the problem of needed enough atomizing flows again.
(2) technical scheme
For solving the problems of the technologies described above, the present invention provides a kind of spray equipment of liquid material film, comprising:
The atomizing container is used for the carrying liquid material and atomization space is provided;
Ultrasonic oscillator is arranged at said atomizing container bottom, is used for the fluent material in the said atomizing container is carried out the ultrasonic atomizatio operation;
The fluent material input media connects said atomizing container, is used for feeding liquid charging stock to said atomizing container;
The carrier gas input media connects said atomizing container, is used for feeding carrier gas to said atomizing container, and the particle that said carrier gas is used for forming with said fluent material atomizing back mixes formation fog;
The fog output unit connects said atomizing container, is used to export said fog;
Nozzle connects said fog output unit, is used to receive the fog of said fog output unit conveying and it is sprayed on wafer to be sprayed.
Be provided with baffle plate in the said atomizing container, be used to make said carrier gas to feed, realize that said carrier gas atomizes fully mixing of particle afterwards with said through the upper surface of said fluent material.
Said ultrasonic oscillator comprises several supersonic oscillations sheets, and the quantity of said supersonic oscillations sheet depends on the requirement of atomizing flow in the concrete application.
Said carrier gas be air, nitrogen or other not with the inert gas of said fluent material chemically reactive.
Said carrier gas input media is provided with flowmeter, is used to control the load volume of conveying.
Said fog output unit comprises air exhauster and fog fairing;
Said air exhauster is used for said fog from fog container suction to said fog output unit;
Said fog fairing is used for said fog is carried out rectification, forms uniform and stable one dimension fog and flows.
Said jet expansion is round exit, square outlet or the outlet of other given shape;
Said nozzle exit is provided with the fog retracting device, is used for reclaiming the reassemble drop of formation of the fog and the spraying process that do not have ejection.
Said fluent material input media, carrier gas input media and fog output unit all are connected to the constant temperature holding device, are used to keep said spray equipment to be in the running status of constant temperature.
The conveyance conduit of said fluent material input media, carrier gas input media and fog output unit is the concentric circles double-decker, and internal layer is used to carry fluent material, carrier gas or fog, and skin is used to carry constant temperature, liquid that heat exchanger effectiveness is high.
In addition, the present invention also provides a kind of spraying method of liquid material film, it is characterized in that, said method comprises the steps:
Step 1: start the constant temperature holding device, the heat exchanging process through the constant temperature holding device guarantees that whole device is in the running status of constant temperature;
Step 2: in the atomizing container, feed the fluent material of certain altitude by the fluent material input media, and guarantee that solution height keeps stable;
Step 3: start ultrasonic oscillator, atomize, feed carrier gas through the carrier gas input media simultaneously, be mixed into fog with fluent material particle after atomizing;
Step 4: start air exhauster, open each valve, with fog suction fog fairing;
Step 5: the fog fairing carries out rectification to fog, and the formation one dimension is stablized fog and flowed, and sprays from nozzle;
Step 6: according to the shape of spraying object, direction of motion, distance and the spray angle of adjustment nozzle spray;
Step 7: the drop of the formation that through the fog retracting device shower nozzle do not had to reassemble in fog and the spraying process of ejection reclaims.
Comprise in the said step 3, the load volume that feeds is controlled through the flowmeter that is arranged on the carrier gas transport;
Comprise in the step 6, change the nozzle of different outlet shapes, to adapt to different spraying requirements.
(3) beneficial effect
Deficiency and defective to prior art; The pattern that technical scheme of the present invention is jumped out the integrated ultrasonic concussion atomizing of nozzle in the prior art, carried and spray repertoire; Adopt the high-frequency ultrasonic oscillator plate to be directly installed on liquid internal; Guarantee to obtain enough thin ultrasonic atomizatio liquid particles in high frequency ultrasound, rely on the supersonic oscillations sheet that sufficient amount is installed simultaneously, guarantee the atomizing flow that suitability for industrialized production needs.Apparatus structure that this technical scheme provided and spraying method are through the ultrasonic atomizatio technology; Fluent material is carried out nebulisation operation,, carry out the air-flow rectification then through carrier gas; Make the spout of spraying at last through particular design; Be ejected into device surface, form liquid material film, and can be applicable to through the spray angle of adjustment nozzle on the surface of step and form liquid material film; The concrete characteristic of this technical scheme can show as: each functional module independently is provided with in (1) apparatus structure scheme, and Each performs its own functions, compared to prior art in the integrated unified running of each functional module, improved whole ability to work and the work efficiency of spray equipment; (2) significantly reduce the waste of fluent material in the spraying coating process, and then reduce environmental pollution; (3) can be sprayed under the specified temp, viscosity obtains the thinner effect that more uniformly sprays less than the fluent material of 30 centipoises, and it is thinner to produce thickness, the better fluid film of uniformity coefficient; (4) can spray step surface through the adjustment spray angle.
Description of drawings
Fig. 1 is about the synoptic diagram of spray equipment in the embodiment of the invention;
Fig. 2 is the synoptic diagram of nozzle head in the embodiment of the invention;
Fig. 3 is the synoptic diagram of fog fairing in the embodiment of the invention;
Fig. 4 is the synoptic diagram of the spout of circle in the embodiment of the invention;
Fig. 5 is the synoptic diagram of the spout of rectangle in the embodiment of the invention;
Fig. 6 is the synoptic diagram of nozzle scan mode in the embodiment of the invention;
Embodiment
For making the object of the invention, content and advantage clearer, below in conjunction with accompanying drawing and embodiment, specific embodiments of the invention describes in further detail.Following examples only are used for technical scheme of the present invention more clearly is described, and can not limit protection scope of the present invention with this.
Embodiment
Present embodiment specifically describes spray equipment and the method thereof that realizes photoresist film according to technical scheme of the present invention.
At first; About the spray equipment of said photoresist film, be to adopt similar ultrasonic humidifier working forms, the high frequency mechanical oscillation that utilizes ultrasonator to produce directly arrives liquid level through liquid transfer; Form capillary wave at liquid surface; Can obtain thinner atomizing particle, a plurality of such ultrasonators are installed, can obtain the ultrasonic atomizatio amount that needs.
As shown in Figure 1, said spray equipment comprises:
Ultrasonic oscillator; Be arranged at said atomizing container 103 bottoms; Comprise several supersonic oscillations sheets 102, the quantity of said supersonic oscillations sheet 102 depends on the requirement of atomizing flow in the concrete application, is used for the photoresist solution 101 in the said atomizing container 103 is carried out the ultrasonic atomizatio operation;
Photoresist solution input media 116; Connect said atomizing container 103; Be used at atomization process, constantly photoresist solution 118 be passed in the said atomizing container 103 through valve 119, to replenish the photoresist solution that is atomized; Guarantee that photoresist solution 101 is in a static relatively height in said atomizing container 103, to keep constant atomization quantity;
Carrier gas input media 125; Connect said atomizing container 103; Be used for feeding a certain amount of carrier gas 122 to said atomizing container 103, the particle that said carrier gas 122 is used for forming with photoresist atomizing back mixes formation fog 106, and said fog 106 is pushed said fog output unit 107;
Be provided with baffle plate 126 in the said atomizing container 103, be used to make said carrier gas 122 to feed, realize that said carrier gas 122 atomizes fully mixing of particle afterwards with said through the upper surface of photoresist solution 101.
Said carrier gas input media 125 is provided with valve 123 and flowmeter 124; Be used to control the load volume of feeding; The frequency of control ultrasonic oscillator simultaneously accurately can guarantee to control the size of the atomizing particle amount of jet expansion, and then guarantee the homogeneity of spraying and the thickness of photoresist film layer.
Be provided with valve 104 between said fog container 103 and the fog output unit 107;
Said fog output unit 107 comprises air exhauster 105 and fog fairing 108;
Said air exhauster 105 is used for said fog 106 from fog container 103 suction to said fog output unit 107;
Said fog fairing 108 is used for said fog is carried out rectification, forms uniform and stable one dimension fog and flows, and as shown in Figure 3,301 is baffler, and 302 is through hole, and fog enters into the downstream of fog transport from through hole 302, goes out from nozzle ejection then.
As shown in Figure 2, fog is ejected on the crystal column surface from jet hole 201 ejections, and the fog retracting device reclaims through 202 pairs of drop and fogs that on jet hole, stopped of recovery channel; Simultaneously, the drop that part fog can be condensed on inclined-plane 203,204 again also reclaims from recovery channel 202;
Said photoresist solution input media 116, carrier gas input media 125 and fog output unit 107 all are connected to the complicated piping system of constant temperature holding device; And valve is installed all above; The switching of controlling plumbing fixtures, said constant temperature holding device are used to keep said device to be in the running status of constant temperature.
The conveyance conduit of said photoresist solution input media 116, carrier gas input media 125 and fog output unit 107 is the concentric circles double-decker; Internal layer is used to carry fluent material, carrier gas or fog, and skin is used to carry constant temperature, liquid that heat exchanger effectiveness is high.The utilidor of said photoresist solution transport 116, carrier gas transport 125 and fog transport 107 forms the heat insulation liquid conveyance conduit of a UNICOM, and heat insulation liquid is carried in circulation, keeps the temperature constant in the piping system.
Secondly, the spraying method about said photoresist film comprises the steps:
Step 1: start the constant temperature holding device, the heat exchanging process through the constant temperature holding device guarantees that whole device is in the running status of constant temperature;
As shown in Figure 1, keep stationary temperature for making system, the conveyance conduit of the pipeline of the delivery of carrier gas of carrier gas transport and photoresist solution transport and the conveyance conduit of fog transport are the concentric circles double-layer structure; The logical medium of being carried of internal layer, the water of outer logical constant temperature is according to the difference of photoresist viscosity; Water temperature is also different; Under this water temperature, the viscosity of photoresist makes atomizing evenly carry out effectively less than 30 centipoises.The device of the conveying water temperature of outer layer pipe can be regarded a constant temperature holding device of keeping fixed temperature as, so that the liquid of different viscosities under different temperature, obtains good atomizing effect.121,117,114,115 the insides are the heat insulation liquid of conveying among Fig. 1; Heat insulation liquid is water generally speaking; Also can be the high liquid of other heat exchanger effectiveness, the heat insulation liquid in the pipeline circulates through pump and other external module, keeps stationary temperature; The whole operation of maintenance system is in the running status of constant temperature, and then obtains uniform film coating at crystal column surface.
Step 2: in the atomizing container, feed the fluent material of certain altitude by the fluent material transport, and guarantee that solution height keeps stable;
Step 3: start the ultrasonic oscillator group; Said ultrasonic oscillator group is equipped with a plurality of ultrasonic oscillators according to the size of atomization quantity; Atomize, feed carrier gas 122 through carrier gas transport 125 simultaneously, be mixed into fog with fluent material particle after the atomizing; Said carrier gas is passed through by the surface of photoresist solution under the effect of baffle plate 126, and realization fully mixes with photoresist solution;
Said carrier gas is that air, nitrogen or other do not produce the gas of chemical reaction with photoresist solution;
Step 4: start air exhauster, open each valve, fog is fed the fog fairing through the fog transport;
Step 5: the fog fairing carries out rectification to fog, forms uniform and stable one dimension fog and flows, and sprays from nozzle;
Step 6: direction of motion, distance and the spray angle of adjustment nozzle, spray, scanned the surface of wafer, just can photoresist be sprayed on crystal column surface equably, on wafer, form the photoresist thin layer.Because the move distance of nozzle is adjustable, thereby spraying all can form evenly smooth photoresist thin layer on the crystal column surface of virtually any size, does not receive the restriction of wafer size, adjusts the angle of nozzle simultaneously, can realize the spraying of ledge surface;
As shown in Figure 6,601 is the wafer that will apply, and nozzle comes flyback retrace in a direction indicated by the arrow, till covering whole wafer.And then on wafer, be coated with and apply very thin one deck photoresist.
Step 7: through the fog retracting device shower nozzle is not had the fog of ejection and the drop that forms that reassembles to reclaim, can significantly reduce the waste of photoetching process photoresist, and then reduce environmental pollution.
Comprise in the said step 3, the load volume that feeds is controlled through the flowmeter that is arranged on the carrier gas transport;
Comprise in the step 6, change the nozzle of different outlet shapes, to adapt to different spraying requirements.
Technical scheme of the present invention is to the deficiency and the defective of prior art; The pattern of jump out the integrated ultrasonic concussion atomizing of nozzle in the prior art, carrying and spraying repertoire; Adopt the high-frequency ultrasonic oscillator plate to be directly installed on liquid internal; Guarantee to obtain enough thin ultrasonic atomizatio liquid particles in high frequency ultrasound, rely on the supersonic oscillations sheet that sufficient amount is installed simultaneously, guarantee the atomizing flow that suitability for industrialized production needs.Apparatus structure that this technical scheme provided and spraying method are through the ultrasonic atomizatio technology; Fluent material is carried out nebulisation operation,, carry out the air-flow rectification then through carrier gas; Make the spout of spraying at last through particular design; Be ejected into device surface, form liquid material film, and can be applicable to through the spray angle of adjustment nozzle on the surface of step and form liquid material film; The concrete characteristic of this technical scheme can show as: each functional module independently is provided with in (1) apparatus structure scheme, and Each performs its own functions, compared to prior art in the integrated unified running of each functional module, improved whole ability to work and the work efficiency of spray equipment; (2) significantly reduce the waste of fluent material in the spraying coating process, and then reduce environmental pollution; (3) can be sprayed under the specified temp, viscosity obtains the thinner effect that more uniformly sprays less than the fluent material of 30 centipoises, and it is thinner to produce thickness, the better fluid film of uniformity coefficient; (4) can spray step surface through the adjustment spray angle.
The above only is a preferred implementation of the present invention; Should be pointed out that for those skilled in the art, under the prerequisite that does not break away from know-why of the present invention; Can also make some improvement and distortion, these improvement and distortion also should be regarded as protection scope of the present invention.
Claims (9)
1. the spray equipment of a liquid material film is characterized in that, said device comprises:
The atomizing container is used for the carrying liquid material and atomization space is provided;
Ultrasonic oscillator is arranged at said atomizing container bottom, is used for the fluent material in the said atomizing container is carried out the ultrasonic atomizatio operation;
The fluent material input media connects said atomizing container, is used for feeding fluent material to said atomizing container, to guarantee that fluent material is in static relatively height in said atomizing container;
The carrier gas input media connects said atomizing container, is used for feeding carrier gas to said atomizing container, and the particle that said carrier gas is used for forming with said fluent material atomizing back mixes formation fog;
The fog output unit connects said atomizing container, is used to export said fog; Said fog output unit comprises air exhauster and fog fairing; Said air exhauster is used for said fog from container suction to the said fog output unit that atomizes; Said fog fairing is used for said fog is carried out rectification, forms uniform and stable one dimension fog and flows;
Nozzle connects said fog output unit, is used to receive the fog of said fog output unit conveying and it is sprayed on wafer to be sprayed;
Said fluent material input media, carrier gas input media and fog output unit all are connected to the constant temperature holding device, are used to keep said spray equipment to be in the running status of constant temperature;
Said nozzle exit is provided with the fog retracting device, and said fog retracting device is used for receiving the reassemble drop of formation of the fog and the spraying process that do not have ejection back and forth through the liquids recovery pipeline.
2. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, is provided with baffle plate in the said atomizing container, is used to make said carrier gas to feed through the upper surface of said fluent material, realizes that said carrier gas atomizes fully mixing of particle afterwards with said.
3. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, said ultrasonic oscillator comprises several supersonic oscillations sheets, and the quantity of said supersonic oscillations sheet depends on the requirement of atomizing flow in the concrete application.
4. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, said carrier gas be air, nitrogen or other not with the inert gas of said fluent material chemically reactive.
5. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, said carrier gas input media is provided with flowmeter, is used to control the load volume of conveying.
6. the spray equipment of liquid material film as claimed in claim 1 is characterized in that, said jet expansion is round exit, square outlet or the outlet of other given shape;
Said nozzle exit is provided with the fog retracting device, is used for reclaiming the reassemble drop of formation of the fog and the spraying process that do not have ejection.
7. the spray equipment of liquid material film as claimed in claim 1; It is characterized in that; The conveyance conduit of said fluent material input media, carrier gas input media and fog output unit is the concentric circles double-decker; Internal layer is used to carry fluent material, carrier gas or fog, and skin is used to carry constant temperature, liquid that heat exchanger effectiveness is high.
8. the spraying method of a liquid material film is characterized in that, said method comprises the steps:
Step 1: start the constant temperature holding device, the heat exchanging process through the constant temperature holding device guarantees that whole device is in the running status of constant temperature;
Step 2: in the atomizing container, feed the fluent material of certain altitude by the fluent material input media, and guarantee that solution height keeps stable;
Step 3: start ultrasonic oscillator, atomize, feed carrier gas through the carrier gas input media simultaneously, be mixed into fog with fluent material particle after atomizing;
Step 4: start air exhauster, open each valve, with fog suction fog fairing;
Step 5: the fog fairing carries out rectification to fog, and the formation one dimension is stablized fog and flowed, and sprays from nozzle;
Step 6: according to the shape of spraying object, direction of motion, distance and the spray angle of adjustment nozzle spray;
Step 7: the drop of the formation that through the fog retracting device shower nozzle do not had to reassemble in fog and the spraying process of ejection reclaims.
9. the spraying method of liquid material film as claimed in claim 8 is characterized in that, comprises in the said step 3, through the flowmeter that is arranged on the carrier gas input media load volume that feeds is controlled;
Comprise in the step 6, change the nozzle of different outlet shapes, to adapt to different spraying requirements.
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| CN104233224A (en) * | 2013-06-13 | 2014-12-24 | 浩升开发科技股份有限公司 | Spray ultrasonic coating system and coating method |
| CN104562451B (en) * | 2014-12-31 | 2017-12-12 | 杭州诺邦无纺股份有限公司 | Easy decontamination non-woven fabrics and preparation method |
| CN105855551B (en) * | 2016-04-05 | 2017-11-07 | 北京梦之墨科技有限公司 | Inversion type liquid metal sprays printing equipment and Method of printing |
| CN109795112A (en) * | 2019-01-31 | 2019-05-24 | 厦门瑶光半导体科技有限公司 | Ultrasonic 3D jet printing appts and its purposes for being used to prepare transparent conductive film |
| CN111804498B (en) * | 2020-06-24 | 2022-05-06 | 沈阳芯源微电子设备股份有限公司 | Nozzle device and spraying method for high-aspect-ratio deep-hole structure wafer or thin glue spraying wafer |
| CN113161445A (en) * | 2020-12-31 | 2021-07-23 | 中国建材国际工程集团有限公司 | CdTe thin film solar cell activation process |
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| CN101813889A (en) | 2010-08-25 |
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