CN101907784A - Wave-front phase optimization method for light beams focused by multi-level scattering layers - Google Patents
Wave-front phase optimization method for light beams focused by multi-level scattering layers Download PDFInfo
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Abstract
The invention relates to a wave-front phase optimization method for light beams focused by multi-level scattering layers. In the prior art, pixel points are optimized one by one, the time for the optimization process is long, and the optimization efficiency is low. The wave-front phase optimization method is based on a characteristic that focused beams are axially symmetric, and adopts an annular area optimization method which takes the symmetric centre of a centre pixel point as the centre of a circle and the long side of a pixel point rectangle as a step length for increasing the radius and sequentially increasing the radius of the annular area; and when each turn of optimization process is finished, the phase of the optimized pixel point is set as an optimization quantity, and the next turn of optimization of the annular area is performed. The method has the characteristics of short time in the optimization process, high optimization efficiency, high increase degree of the light intensity of a target focus area, and capability of realizing super-resolution characteristic optimization.
Description
Technical field
The invention belongs to optical technical field, relate to the wave-front phase optimization method for light beams of a kind of Wave-front phase optimization method, particularly a kind of focused by multi-level scattering layers, be mainly used in fields such as optical microphotograph imaging, the little processing of optics, super-resolution.
Technical background
In Order Scattering layers such as Chinese white, biological tissue and paper, because the space wave of refractive index has caused that light gets Order Scattering, cause beam divergence, can not focus on.In classical imaging system, because reduced the resolution characteristic of system, the Order Scattering that takes place during light beam process Order Scattering layer is a unfavorable factor.After the Order Scattering layer is positioned at lens, scattering will cause not having focal spot and form.Along with the development of optics, the Wave-front phase and the polarization characteristic of light wave have obtained paid certain attention, and through discovering, propagation and focus characteristics that Wave-front phase and polarization can the appreciable impact light beams.Particularly in nearly 5 years, the vector optics development is rapid, by distribution of incident beam wavefront and Order Scattering layer are complementary, behind light beam Order Scattering layer, can form light field in the target area and strengthen interference mutually, at this moment, although the Order Scattering of light has taken place, light beam still can focus on, and this peculiar phenomenon has important theoretical research meaning and application prospects.
Regulate the Beam Wave-Front phase place and adopt phase type spatial light modulator more.Formerly the optimization optical system in the technology is as follows, the light beam that light emitted goes out passes through phase type spatial light modulator and Order Scattering layer successively, the photodetector that is set at the goal-focus zone receives, system control unit links to each other with photodetector with phase type spatial light modulator, the photosignal that photodetector detects passes to system control unit, feedback input as Wave-front phase optimization method, system control unit obtains can producing in the goal-focus zone through the Order Scattering layer Beam Wave-Front PHASE DISTRIBUTION of optical convergence according to the phase place of each pixel on the Wave-front phase optimization method setting phase type spatial light modulator.A kind of existing optimization method of the Beam Wave-Front PHASE DISTRIBUTION that the Order Scattering layer is complementary is that at first the phase place with all pixels on the phase type spatial light modulator is initialized as 0; Then, the phase place of first pixel on the control phase type spatial light modulator increases by 2 π/n successively from 0, until 2 π, wherein n=2
8Increase the phase place of this pixel each time, system control unit all detects the photosignal that photodetector detects, and the record phase place is increased to the 2 π processes from 0, the phase value of first pixel of maximum photosignal correspondence is initialized as 0 with the phase place of first pixel; The phase place of second pixel on the control phase type spatial light modulator increases by 2 π successively from 0 again, finds the phase value of second pixel of maximum photosignal correspondence, and the phase place with second pixel is initialized as 0 again; According to phase type spatial light modulator ranks order, repeat said process, find the phase value of the maximum photosignal correspondence of each pixel on the phase type spatial light modulator successively; At last, the phase value of all pixels on the phase type spatial light modulator is set to the phase value of maximum photosignal correspondence, and Order Scattering strata Jiao's Beam Wave-Front phase optimization process finishes.Though this optimization method has certain advantage, but exist essence not enough, phase place increases successively from 0 and only optimizes a pixel the 2 π processes each time, and do not consider that actual light beam is generally the rotational symmetry characteristic, so the optimizing process required time is long, it is low to optimize efficient, light intensity amplification degree in the goal-focus zone is not high, can not reach the optimization of super-resolution characteristic.
Summary of the invention
The objective of the invention is at the deficiencies in the prior art, a kind of wave-front phase optimization method for light beams of focused by multi-level scattering layers is provided, has optimizing process required time weak point, optimize the efficient height, light intensity amplification degree in the goal-focus zone is big, can reach the characteristics of super-resolution characteristic optimizing.
The basic design of the inventive method is: based on focused beam is axisymmetric characteristic, and at first the phase place with all pixels on the phase type spatial light modulator is initialized as 0; Then, the phase place of regulating the central pixel point on the corresponding phase type spatial light modulator in beam center zone increases by 2 π/n successively from 0, until 2 π, wherein n=2
mM is the integer more than or equal to 8, when increasing the phase place of this central pixel point each time, system control unit all detects the photosignal that photodetector detects, the record phase place is increased to the 2 π processes from 0, the phase value of the central pixel point of maximum photosignal correspondence, and the phase settings of central pixel point is the phase mass after optimizing; Then, symcenter with central pixel point is the center of circle, long limit with the pixel rectangle is the step-length that radius increases, the border circular areas that forms, interior radius is from step-length of each increase, identical with central pixel point phase optimization process, with the phase optimization of the phase point do not optimized in the border circular areas, and be set at phase mass after the optimization; Greater than the launching spot diameter, the phase optimization process stops until the border circular areas diameter, and this moment, goal-focus zone light intensity reached maximum value, realized the super-resolution focus of light beam through the Order Scattering layer.
The inventive method is specifically: the light beam that light emitted goes out passes through phase type spatial light modulator and Order Scattering layer successively, the photodetector that is set at the goal-focus zone receives, system control unit links to each other with photodetector with phase type spatial light modulator, the photosignal that photodetector detects passes to system control unit, as the feedback input of Wave-front phase optimization method, system control unit is set the phase place of each pixel on the phase type spatial light modulator according to Wave-front phase optimization method.
The concrete steps of the inventive method are as follows,
(1) phase place with all pixels on the phase type spatial light modulator is initialized as 0;
(2) phase place of regulating the central pixel point on the corresponding phase type spatial light modulator in beam center zone increases by 2 π/n successively from 0, until 2 π, wherein n=2
mM is the integer more than or equal to 8, when increasing the phase place of this central pixel point each time, system control unit all detects the photosignal that photodetector detects, the record phase place is increased to the 2 π processes from 0, the phase value of the central pixel point of maximum photosignal correspondence, and with the phase settings of central pixel point for the phase mass after optimizing, it is optimized mark;
(3) symcenter with central pixel point is the center of circle, 1.5 double-length degree with the long limit of pixel rectangle are radius, and the border circular areas of formation increases by 2 π/n with the phase place that is completely contained in the pixel of not optimizing mark in the border circular areas and as yet successively from 0, until 2 π, wherein n=2
mM is the integer more than or equal to 8, when increasing the phase place of pixel each time, system control unit all detects the photosignal that photodetector detects, the record phase place is increased to the 2 π processes from 0, the phase value of the pixel of maximum photosignal correspondence, and with the phase settings of these pixels for the phase mass after optimizing, it is optimized mark;
(4) the long limit with the pixel rectangle is the step-length that radius increases, increase the border circular areas radius successively, each border circular areas radius increases by a step, all will be completely contained in the border circular areas and the phase place of not having a pixel of optimizing mark increases by 2 π/n successively from 0, until 2 π, wherein n=2
mM is the integer more than or equal to 8, when increasing the phase place of pixel each time, system control unit all detects the photosignal that photodetector detects, the record phase place is increased to the 2 π processes from 0, the phase value of the pixel of maximum photosignal correspondence, and with the phase settings of these pixels for the phase mass after optimizing, it is optimized mark;
(5) when border circular areas diameter during greater than the launching spot diameter, the phase optimization process stops, the phase value optimization of the pixel of incident beam overlay area is finished on the phase type spatial light modulator, has finished the Wave-front phase optimization of focused by multi-level scattering layers by the light beam of phase type spatial light modulator.
The invention has the advantages that: after central pixel point is optimised, each takes turns the number of optimised pixel in the border circular areas all greater than 1, and increase along with the border circular areas radius, same batch of optimised pixel number increases rapidly, with pixel optimization method comparison one by one, whole light beam Wave-front phase optimization process time is significantly accelerated, it is short to have the optimizing process required time, optimize the high distinguishing feature of efficient, significantly expanded the range of application of Order Scattering layer, Order Scattering strata Jiao and imaging characteristic can be applied in the dynamic scattering operating position, dynamically and in high speed focusing and the imaging system used.This optimization method has been considered the rotational symmetry characteristic of incident beam, and the pixel phase settings that will optimize before new round optimizing process begins becomes to optimize the phase value of gained, make the light intensity in goal-focus zone improve significantly, light intensity amplification degree is big, and the goal-focus zone can reach the super-resolution characteristic.
Description of drawings
Fig. 1 is the Beam Wave-Front phase optimization optical system synoptic diagram of focused by multi-level scattering layers;
Fig. 2 is that the first step of the present invention is optimized pixel situation distribution schematic diagram;
Fig. 3 optimizes pixel situation distribution schematic diagram in second step of the present invention;
Fig. 4 optimizes pixel situation distribution schematic diagram in the 3rd step of the present invention;
Fig. 5 optimizes pixel situation distribution schematic diagram in the 4th step of the present invention.
Embodiment
The invention will be further described below in conjunction with drawings and Examples.
Fig. 1 is the Beam Wave-Front phase optimization optical system synoptic diagram of focused by multi-level scattering layers, is the hardware foundation that is optimized.The light beam that light source 1 is launched passes through phase type spatial light modulator 2 and Order Scattering layer 3 successively, the photodetector 4 that is set at the goal-focus zone receives, system control unit 5 links to each other with photodetector 4 with phase type spatial light modulator 2, the photosignal that photodetector 4 detects passes to system control unit 5, feedback input as Wave-front phase optimization method, system control unit 5 obtains can producing in the goal-focus zone through Order Scattering layer 3 the Beam Wave-Front PHASE DISTRIBUTION of optical convergence according to the phase place of each pixel on the Wave-front phase optimization method setting phase type spatial light modulator 2.
In this optical system, light source 1 adopts the helium-neon laser that disposes the collimator and extender mirror, and operation wavelength is that 632.8nm, power are that 10mW, beam diameter are 10mm; The phase type spatial light modulator that phase type spatial light modulator 2 adopts based on liquid crystal, mode of operation is a transmission-type, pel array is that 1024x768, each pixel are of a size of 18 μ mX18 μ m; It is the zinc white coat of colo(u)r of 6 μ m that Order Scattering layer 3 adopts thickness, and the Order Scattering scatterer is a Zinc oxide nanoparticle; Photodetector 4 adopts charge-coupled image sensor, the CCD that promptly is referred to as usually; System control unit 5 adopts industrial computer; System control unit 5 is connected by general VGA interface with phase type spatial light modulator 2; System control unit 5 adopts the Universal USB interface to be connected with photodetector 4.
Based on above-mentioned optical system, a kind of concrete grammar step of wave-front phase optimization method for light beams of focused by multi-level scattering layers is as follows,
(1) phase place with all pixels on the phase type spatial light modulator 2 is initialized as 0;
(2) phase place of regulating the central pixel point on the corresponding phase type spatial light modulator 2 in beam center zone increases by 2 π/n successively from 0, until 2 π, wherein n=2
m, m=8 in the present embodiment, i.e. n=2
8=256.As shown in Figure 2, R is that polar coordinate system is represented the radial coordinate under the situation, and the oblique line fill area has represented to set the phase value after optimizing.When increasing the phase place of this central pixel point each time, system control unit 5 all detects the photosignal that photodetector 4 detects, the record phase place is increased to the 2 π processes from 0, the phase value of the central pixel point of maximum photosignal correspondence, and with the phase settings of central pixel point for the phase mass after optimizing, it is optimized mark;
(3) symcenter with central pixel point is the center of circle, is radius with the 1.5 double-length degree on the long limit of pixel rectangle, and the border circular areas of formation increases by 2 π/n with the phase place that is completely contained in the border circular areas and do not have a pixel of optimizing mark from 0, successively until 2 π.In the present embodiment, the pixel of phase type spatial light modulator 2 is of a size of 18 μ mX18 μ m, and square is a special case of rectangle, also is a kind of rectangle, so the pixel rectangle is grown limit 18 μ m herein, D is expressed as the long limit of rectangle, so D=18 μ m.As shown in Figure 3, when increasing the phase place of pixel each time, system control unit 5 all detects the photosignal that photodetector 4 detects, the record phase place is increased to the 2 π processes from 0, the phase value of the pixel of maximum photosignal correspondence, and with the phase settings of these pixels for the phase mass after optimizing, it is optimized mark;
(4) the long limit with the pixel rectangle is the step-length that radius increases, increase the border circular areas radius successively, each border circular areas radius increases by a step, the phase place that all will be completely contained in the border circular areas and not have a pixel of optimizing mark increases by 2 π/n successively from 0, when increasing the phase place of pixel each time, system control unit 5 all detects the photosignal that photodetector 4 detects, the record phase place is increased to the 2 π processes from 0, the phase value of the pixel of maximum photosignal correspondence, and the phase settings of these pixels is the phase mass after optimizing, it is optimized mark, and Fig. 4 and Fig. 5 schematically provided for the 3rd step respectively and the 4th step pixel is optimized the situation distribution schematic diagram;
(5) when the border circular areas diameter greater than the launching spot diameter, in the present embodiment as R during greater than 10mm, the phase optimization process stops, the phase value optimization of the pixel of incident beam overlay area is finished on the phase type spatial light modulator 2, has finished the Wave-front phase optimization of focused by multi-level scattering layers by the light beam of phase type spatial light modulator 2.
Present embodiment has been finished the Beam Wave-Front phase optimization of focused by multi-level scattering layers, compare with the individual element point optimization method in the technology formerly, under the same case, this optimization method shortens two orders of magnitude with the optimizing process required time, the optimizing process time significantly accelerates, and optimizes efficient and significantly improves; The light intensity in goal-focus zone increases about 5 times simultaneously, and the focus light intensity significantly improves, and light intensity amplification degree is fairly obvious, and, goal-focus area light spot size dwindles, and the overall height half-breadth amount of hot spot is 3/4 under the individual element point optimization situation, has realized better super-resolution characteristic.
Claims (1)
1. the wave-front phase optimization method for light beams of a focused by multi-level scattering layers, the optimization optical system that is adopted is that the light beam that light emitted goes out passes through phase type spatial light modulator and Order Scattering layer successively, the photodetector that is set at the goal-focus zone receives, system control unit links to each other with photodetector with phase type spatial light modulator, the photosignal that photodetector detects passes to system control unit, feedback input as Wave-front phase optimization method, system control unit is according to the phase place of each pixel on the Wave-front phase optimization method setting phase type spatial light modulator, and it is characterized in that: the concrete steps of this optimization method are:
(1) phase place with all pixels on the phase type spatial light modulator is initialized as 0;
(2) phase place of regulating the central pixel point on the corresponding phase type spatial light modulator in beam center zone increases by 2 π/n successively from 0, until 2 π, wherein n=2
mM is the integer more than or equal to 8, when increasing the phase place of this central pixel point each time, system control unit all detects the photosignal that photodetector detects, the record phase place is increased to the 2 π processes from 0, the phase value of the central pixel point of maximum photosignal correspondence, and with the phase settings of central pixel point for the phase mass after optimizing, it is optimized mark;
(3) symcenter with central pixel point is the center of circle, 1.5 double-length degree with the long limit of pixel rectangle are radius, and the border circular areas of formation increases by 2 π/n with the phase place that is completely contained in the pixel of not optimizing mark in the border circular areas and as yet successively from 0, until 2 π, wherein n=2
mM is the integer more than or equal to 8, when increasing the phase place of pixel each time, system control unit all detects the photosignal that photodetector detects, the record phase place is increased to the 2 π processes from 0, the phase value of the pixel of maximum photosignal correspondence, and with the phase settings of these pixels for the phase mass after optimizing, it is optimized mark;
(4) the long limit with the pixel rectangle is the step-length that radius increases, increase the border circular areas radius successively, each border circular areas radius increases by a step, all will be completely contained in the border circular areas and the phase place of not having a pixel of optimizing mark increases by 2 π/n successively from 0, until 2 π, wherein n=2
mM is the integer more than or equal to 8, when increasing the phase place of pixel each time, system control unit all detects the photosignal that photodetector detects, the record phase place is increased to the 2 π processes from 0, the phase value of the pixel of maximum photosignal correspondence, and with the phase settings of these pixels for the phase mass after optimizing, it is optimized mark;
(5) when border circular areas diameter during greater than the launching spot diameter, the phase optimization process stops, the phase value optimization of the pixel of incident beam overlay area is finished on the phase type spatial light modulator, has finished the Wave-front phase optimization of focused by multi-level scattering layers by the light beam of phase type spatial light modulator.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105763332A (en) * | 2015-12-31 | 2016-07-13 | 中国工程物理研究院电子工程研究所 | Multipoint function fitting-based wave front feedback control algorithm |
| CN106725319A (en) * | 2016-12-12 | 2017-05-31 | 四川大学 | A kind of light cracks modulator approach by the unit that scattering medium is focused on |
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| CN1521537A (en) * | 2003-02-12 | 2004-08-18 | 奥普托古纳公司 | Device for spatially modulating a light beam and corresponding uses |
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| US5973844A (en) * | 1996-01-26 | 1999-10-26 | Proxemics | Lenslet array systems and methods |
| CN1521537A (en) * | 2003-02-12 | 2004-08-18 | 奥普托古纳公司 | Device for spatially modulating a light beam and corresponding uses |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105763332A (en) * | 2015-12-31 | 2016-07-13 | 中国工程物理研究院电子工程研究所 | Multipoint function fitting-based wave front feedback control algorithm |
| CN105763332B (en) * | 2015-12-31 | 2019-02-22 | 中国工程物理研究院电子工程研究所 | A method of the wavefront feedback control based on multipoint function simulation |
| CN106725319A (en) * | 2016-12-12 | 2017-05-31 | 四川大学 | A kind of light cracks modulator approach by the unit that scattering medium is focused on |
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