CN102423823A - Vacuum brazing process of plasma cutting electrode - Google Patents
Vacuum brazing process of plasma cutting electrode Download PDFInfo
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- CN102423823A CN102423823A CN2011103029629A CN201110302962A CN102423823A CN 102423823 A CN102423823 A CN 102423823A CN 2011103029629 A CN2011103029629 A CN 2011103029629A CN 201110302962 A CN201110302962 A CN 201110302962A CN 102423823 A CN102423823 A CN 102423823A
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- plasma cutting
- cutting electrode
- vacuum brazing
- vacuum
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Abstract
The invention discloses a vacuum brazing process of a plasma cutting electrode. The vacuum brazing process comprises the following steps: assembling a plasma cutting electrode assembly; placing the assembly in a vacuum furnace for vacuumizing; stepwise heating to a brazing temperature; brazing; cooling; and discharging. The vacuum brazing process is characterized in that the procedure of assembling the plasma cutting electrode assembly comprises the following steps: firstly placing a solder wire and a hafnium wire in a copper bush seat sequentially from the top down; adding a locating copper ring around the protruding hafnium wire; propping up the hafnium wire by a lower post rod arranged at the center of the locating copper ring, and pressing the copper bush seat by an upper post rod arranged at the axle center of the copper bush seat; and finally placing the formed assembly in a fixture with a horizontal bottom plane. The vacuum brazing process has the following beneficial effects: the vacuum brazing process of the plasma cutting electrode is simplified, the copper bush seat and the hafnium wire are directly brazed, so the obtained electrode has the advantages of simple structure, low cost, good surface quality and uniform and compact welding seams; and in addition, the resistivity of the electrode measured by the resistance method is only (0.03-0.04)*10<-6>Omega.m.
Description
Technical field
The present invention relates to a kind of vacuum brazing technique, specifically, relate to a kind of vacuum brazing technique of plasma cutting electrode, belong to the material welding technology field.
Background technology
In commercial production, near the quality of cut, but cost is far below cut aspect the cutting surface quality of material for meticulous plasma cutting technique.Therefore, in recent years, the quantity of digital controlling plasma cutting equipment gathers way very fast in each enterprise.Yet the at present main dependence on import of efficient numerically controlled plasma cutting machines must be bought as annex as the crucial consumable accessory electrode of equipment simultaneously, and it costs an arm and a leg.And electrode is as the main consumables in the plasma cutting operation, and the length in its service life directly has influence on the processing cost and the production efficiency of plasma cutting, and electrode is changed frequent more, and its processing cost is high more, and production efficiency is corresponding just low more.
External plasma cutting electrode is cooperated with the axis body mechanical compaction by copper sheathing seat, silver-colored body and hafnium filament core three and forms, and when heavy current is passed through, has two bed boundary contact resistances and gap thermal resistance, makes radiating effect and conductive effect not good enough.Chinese patent ZL03150716.6 discloses a kind of employing vacuum brazing method anaerobic copper sheathing seat, silver-colored body, hafnium filament has been connected, through brazing member being assembled (as adopting positioning fixture control postweld interval), is placed thread and foil-shaped brazing material, and the control soldering processes; The electrode surface quality that obtains is good; Non-oxidation, coloured light is bright, the welding even compact; And steady quality, product percent of pass reach more than 98%; Operating mode is used and to be shown, the electrode that is obtained is used to cut the ship plate single-piece life-span and reaches 500 meters, than exceed 200 meters of inlet electrode.But; Not only there is the expensive problem of pure white silver-colored coolant jacket of use in this technology, and when welding need itself and copper sheathing seat and hafnium filament are coupled together respectively, also need adopt paper tinsel shape and thread solder during connection; In addition; Also need formulate special positioning fixture the joint clearance of brazing is positioned, have complex operation, the defective that plasma cutting electrode assembling unit structure is complicated.
Summary of the invention
To existing in prior technology the problems referred to above and defective; The purpose of this invention is to provide that a kind of cost is low, simple to operate, quality is good, be fit to the vacuum brazing technique of the plasma cutting electrode of large-scale production, to satisfy the market demand of plasma cutting electrode.
For realizing the foregoing invention purpose, the technical scheme that the present invention adopts is following:
A kind of vacuum brazing technique of plasma cutting electrode; Comprise: assemble plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumizes, is heated to brazing temperature, soldering step by step, is cooled off, comes out of the stove; It is characterized in that: described assembling plasma cutting electrode sub-assembly is meant to be put into solder wire and hafnium filament in the copper sheathing seat earlier from top to bottom successively; Around outstanding hafnium filament, add the location copper band then; Withstand hafnium filament with the lower push rod that is located at copper band center, location again and push down the copper sheathing seat, be placed on the bottom in the anchor clamps of horizontal plane with the upper ejector pin that is located at copper sheathing seat axle center.
As preferred version, the fit-up gap of copper sheathing seat and hafnium filament is 0.02～0.05mm.
As preferred version, the diameter of said solder wire and hafnium filament diameter are equal to.
As preferred version, the draw ratio of said solder wire is 0.7～0.8.
As preferred version, said solder wire is a silver-bearing copper eutectic solder silk.
As preferred version, said vacuum is 1.0 * 10
-2～8 * 10
-3Pa.
As preferred version, said substep is heated to brazing temperature and is meant: be heated to 400～500 ℃ with 15～25 ℃/min earlier, insulation 10～30min; Be heated to 700～770 ℃ with 5～15 ℃/min then, insulation 40～80min; Be heated to brazing temperature with 15～25 ℃/min again.
As preferred version, said brazing temperature is 820～860 ℃.
As preferred version, said soldering is meant at brazing temperature insulation 20～50min.
As preferred version, said cooling is meant with stove cools off.
Compared with prior art; Beneficial effect of the present invention has been to simplify the vacuum brazing technique of plasma cutting electrode, adopts vacuum brazing method directly copper sheathing seat and hafnium filament to be carried out soldering, makes the electrode that is obtained not only simple in structure; Cost is low; And surface quality is good, and even weld is fine and close, and the resistivity that adopts electric-resistivity method to record electrode has only (0.03～0.04) * 10
-6Ω m.
Description of drawings
Fig. 1 is the structural representation of plasma cutting electrode sub-assembly of the present invention.
Fig. 2 is the main TV structure sketch map of anchor clamps described in the embodiment.
Fig. 3 is the plan structure sketch map of anchor clamps described in the embodiment.
Among the figure: 1, anaerobic copper sheathing seat; 2, solder wire; 3, hafnium filament; 4, location copper band; 5, lower push rod; 6, upper ejector pin; 7, anchor clamps; 71, upper plate; 72, lower plate; 73, support bar; 74, fixing hole; 75, locating hole.
The specific embodiment
Below in conjunction with accompanying drawing and embodiment the present invention is done further detailed explanation.
The vacuum brazing technique of a kind of plasma cutting electrode provided by the invention; Comprise: assemble plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumizes, is heated to brazing temperature, soldering step by step, is cooled off, comes out of the stove; It is characterized in that: described assembling plasma cutting electrode sub-assembly is meant earlier puts into 1 li of copper sheathing seat from top to bottom successively with solder wire 2 and hafnium filament 3; Around outstanding hafnium filament, add location copper band 4 then; Withstand hafnium filament 3 with the lower push rod 5 that is located at copper band 4 centers, location again and push down copper sheathing seat 1, be placed on the bottom in the anchor clamps 7 of horizontal plane with the upper ejector pin 6 that is located at 1 center of copper sheathing seat.(as shown in Figure 1).
Said anchor clamps 7 are made up of upper plate 71, lower plate 72 and four support bars 73; And upper plate 71 is provided with the fixing hole 74 and several locating holes 75 of 4 fixing branch struts 73; The upper surface of said lower plate 72 is the plane; The external diameter of the internal diameter of said locating hole 75 and copper sheathing seat 1 is complementary (as shown in Figures 2 and 3), places a plasma cutting electrode sub-assembly that assembles in each locating hole.
The present invention uses following approach to make the abundant joint filling of solder: the one, solder is placed on the top of surface to be welded, and make liquid solder under capillarity and gravity double action, fill up the gap; The 2nd,, on the copper sheathing seat, add upper ejector pin, make copper sheathing seat pressurized even, the compressing liquid solder is to quicken the solder joint filling; In addition, add lower push rod at copper band center, location and withstand hafnium filament, prevent that hafnium filament from dropping on the one hand, with the extruding liquid solder its acceleration is flowed downward on the other hand.
Because of the fit-up gap of copper sheathing seat and hafnium filament size influence solder the capillary joint filling and and the interaction degree of solder and mother metal, thereby influence the compactness and the performance of soldering; The joint clearance of brazing is excessive, and capillarity weakens even disappears, and solder is difficult to fill up the gap; The joint clearance of brazing is too little, hinders solder and fills, and is difficult to form the high joint of ratio of brazing area; Therefore, the fit-up gap of preferred copper sheathing seat of the present invention and hafnium filament is 0.02～0.05mm.
Because of what of shape, size and the solder amount of solder have certain influence to brazing quality, and the plasma electric pole piece is columned, therefore; The present invention selects brazing wire; The diameter and the hafnium filament diameter of preferred solder wire are equal to, and assembling is simple like this, and the solder amount is controlled easily.In addition, the draw ratio of the preferred solder wire of the present invention is 0.7～0.8, and can satisfy solder fills up whole joint clearance of brazing to this solder amount on the one hand, can prevent that on the other hand the solder amount from too much flowing out brazed seam and polluting surface of the work and cause waste etc.
Because the fusing point of silver-bearing copper eutectic solder is moderate, good manufacturability, and have good electrical conductivity, thermal conductivity, intensity and toughness, and therefore, the preferred silver-bearing copper eutectic solder of the present invention silk.
Influence the wetting of solder and brazing member surface state because of the vacuum degree is too low, and the too high volatilization that can quicken metallic element of vacuum, therefore, the preferred vacuum of the present invention is 1.0 * 10
-2～8 * 10
-3Pa.
As preferred version, the present invention carries out the process that substep is heated to brazing temperature and is: be heated to 400～500 ℃ with 15～25 ℃/min earlier, and insulation 10～30min, purpose is impurity and the gas of extracting out in the stove, reduces generation of defects; Be heated to 700～770 ℃ with 5～15 ℃/min then, insulation 40～80min, mainly be to make the temperature of test specimen even this moment; Be heated to brazing temperature with 15～25 ℃/min at last.
The inventor also discovers: brazing temperature is too low or temperature retention time is too short; Can cause the solder fusing insufficient, form the cavity in the joint easily, and brazing temperature be too high or the long meeting of temperature retention time causes the more frangible compounds of generation in the joint; Even crackle appears, influence the performance of joint.Therefore, brazing temperature of the present invention is preferably 820～860 ℃, at brazing temperature insulation 20～50min, cools off with stove then.
Embodiment 1
According to Fig. 1; (diameter is 2.5mm with anaerobic copper sheathing seat 1, silver-bearing copper eutectic solder silk 2 earlier; Highly be 2.0mm), the hafnium filament 3 fit-up gap assembling of pressing 0.05mm; Around outstanding hafnium filament 3, add location copper band 4 then, withstand hafnium filament 3 with the lower push rod 5 that is located at copper band 4 centers, location again and push down copper sheathing seat 1, be placed on the bottom in the anchor clamps 7 of horizontal plane with the upper ejector pin 6 that is located at 1 center of copper sheathing seat.
Assembly is put into vacuum drying oven, be evacuated to 8 * 10
-3Pa.
Earlier be heated to 400 ℃, insulation 20min with 20 ℃/min; Be heated to 750 ℃ with 10 ℃/min again, insulation 60min; Be heated to 840 ℃ with 20 ℃/min again, insulation 30min.
Come out of the stove with the stove cooling, cut away localization part, it is full promptly to obtain joint filling, and solder does not have the cross flow phenomenon, joint flawless, and the moderate plasma cutting electrode of compound layer thickness, and said plasma cutting electrode only is made up of copper sheathing seat and hafnium filament.
The resistivity that adopts electric-resistivity method to record the electrode that is obtained is 0.04 * 10
-6Ω m.
Embodiment 2
According to Fig. 1; (diameter is 2.5mm with anaerobic copper sheathing seat 1, silver-bearing copper eutectic solder silk 2 earlier; Highly be 1.8mm), the hafnium filament 3 fit-up gap assembling of pressing 0.03mm; Around outstanding hafnium filament 3, add location copper band 4 then, withstand hafnium filament 3 with the lower push rod 5 that is located at copper band 4 centers, location again and push down copper sheathing seat 1, be placed on the bottom in the anchor clamps 7 of horizontal plane with the upper ejector pin 6 that is located at 1 center of copper sheathing seat.
Assembly is put into vacuum drying oven, be evacuated to 1 * 10
-2Pa.
Earlier be heated to 400 ℃, insulation 20min with 20 ℃/min; Be heated to 750 ℃ with 10 ℃/min again, insulation 60min; Be heated to 830 ℃ with 20 ℃/min again, insulation 40min.
Come out of the stove with the stove cooling, cut away localization part, it is full promptly to obtain joint filling, and solder does not have the cross flow phenomenon, joint flawless, and the moderate plasma cutting electrode of compound layer thickness, and said plasma cutting electrode only is made up of copper sheathing seat and hafnium filament.
The resistivity that adopts electric-resistivity method to record the electrode that is obtained is 0.03 * 10
-6Ω m.
In sum, the vacuum brazing technique of plasma cutting electrode of the present invention is simple, and the electrode that is obtained is not only simple in structure, and cost is low, and surface quality is good, and even weld is fine and close, and the resistivity that adopts electric-resistivity method to record electrode has only (0.03～0.04) * 10
-6Ω m.
Should be noted that at last: above embodiment only is used for the present invention is further specified; Can not be interpreted as the restriction to protection domain of the present invention, some nonessential improvement that those skilled in the art's foregoing according to the present invention is made and adjustment all belong to protection scope of the present invention.
Claims (10)
1. the vacuum brazing technique of a plasma cutting electrode; Comprise: assemble plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumizes, is heated to brazing temperature, soldering step by step, is cooled off, comes out of the stove; It is characterized in that: described assembling plasma cutting electrode sub-assembly is meant to be put into solder wire and hafnium filament in the copper sheathing seat earlier from top to bottom successively; Around outstanding hafnium filament, add the location copper band then; Withstand hafnium filament with the lower push rod that is located at copper band center, location again and push down the copper sheathing seat, be placed on the bottom in the anchor clamps of horizontal plane with the upper ejector pin that is located at copper sheathing seat axle center.
2. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: the fit-up gap of copper sheathing seat and hafnium filament is 0.02～0.05mm.
3. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: the diameter of said solder wire and hafnium filament diameter are equal to.
4. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: the draw ratio of said solder wire is 0.7～0.8.
5. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: said solder wire is a silver-bearing copper eutectic solder silk.
6. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: being evacuated to vacuum is 1.0 * 10
-2～8 * 10
-3Pa.
7. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: said substep is heated to brazing temperature and is meant: be heated to 400～500 ℃ with 15～25 ℃/min earlier, insulation 10～30min; Be heated to 700～770 ℃ with 5～15 ℃/min then, insulation 40～80min; Be heated to brazing temperature with 15～25 ℃/min again.
8. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: said brazing temperature is 820～860 ℃.
9. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: said soldering is meant at brazing temperature insulation 20～50min.
10. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: said cooling is meant with stove cools off.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110302962 CN102423823B (en) | 2011-10-09 | 2011-10-09 | Vacuum brazing process of plasma cutting electrode |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110302962 CN102423823B (en) | 2011-10-09 | 2011-10-09 | Vacuum brazing process of plasma cutting electrode |
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| Publication Number | Publication Date |
|---|---|
| CN102423823A true CN102423823A (en) | 2012-04-25 |
| CN102423823B CN102423823B (en) | 2013-04-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201110302962 Expired - Fee Related CN102423823B (en) | 2011-10-09 | 2011-10-09 | Vacuum brazing process of plasma cutting electrode |
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| Country | Link |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104722902A (en) * | 2015-03-31 | 2015-06-24 | 常州特尔玛枪嘴有限公司 | Novel brazing type plasma electrode and manufacturing method thereof |
| CN110280865A (en) * | 2019-06-19 | 2019-09-27 | 南京卡德威焊切器材有限公司 | Plasma electrode hafnium filament brazing equipment and its method for welding |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5097111A (en) * | 1990-01-17 | 1992-03-17 | Esab Welding Products, Inc. | Electrode for plasma arc torch and method of fabricating same |
| KR20020034537A (en) * | 2000-11-02 | 2002-05-09 | 신현준 | Method for manufacturing plasma cutting electrode |
| US6423922B1 (en) * | 2001-05-31 | 2002-07-23 | The Esab Group, Inc. | Process of forming an electrode |
| US6583378B1 (en) * | 1999-11-26 | 2003-06-24 | Komatsu Industries Corporation | Plasma machining electrode and plasma machining device |
| CN1493430A (en) * | 2003-09-03 | 2004-05-05 | 上海市机械制造工艺研究所 | Plasma cutting electrode vacuum soldering method |
-
2011
- 2011-10-09 CN CN 201110302962 patent/CN102423823B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5097111A (en) * | 1990-01-17 | 1992-03-17 | Esab Welding Products, Inc. | Electrode for plasma arc torch and method of fabricating same |
| US6583378B1 (en) * | 1999-11-26 | 2003-06-24 | Komatsu Industries Corporation | Plasma machining electrode and plasma machining device |
| KR20020034537A (en) * | 2000-11-02 | 2002-05-09 | 신현준 | Method for manufacturing plasma cutting electrode |
| US6423922B1 (en) * | 2001-05-31 | 2002-07-23 | The Esab Group, Inc. | Process of forming an electrode |
| CN1493430A (en) * | 2003-09-03 | 2004-05-05 | 上海市机械制造工艺研究所 | Plasma cutting electrode vacuum soldering method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104722902A (en) * | 2015-03-31 | 2015-06-24 | 常州特尔玛枪嘴有限公司 | Novel brazing type plasma electrode and manufacturing method thereof |
| CN110280865A (en) * | 2019-06-19 | 2019-09-27 | 南京卡德威焊切器材有限公司 | Plasma electrode hafnium filament brazing equipment and its method for welding |
| CN110280865B (en) * | 2019-06-19 | 2023-07-25 | 南京卡德威焊切器材有限公司 | Plasma electrode hafnium wire brazing equipment and brazing method thereof |
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| Publication number | Publication date |
|---|---|
| CN102423823B (en) | 2013-04-10 |
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Granted publication date: 20130410 Termination date: 20181009 |