CN102423823B - Vacuum brazing process of plasma cutting electrode - Google Patents
Vacuum brazing process of plasma cutting electrode Download PDFInfo
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- CN102423823B CN102423823B CN 201110302962 CN201110302962A CN102423823B CN 102423823 B CN102423823 B CN 102423823B CN 201110302962 CN201110302962 CN 201110302962 CN 201110302962 A CN201110302962 A CN 201110302962A CN 102423823 B CN102423823 B CN 102423823B
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- plasma cutting
- cutting electrode
- vacuum brazing
- vacuum
- copper
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Abstract
The invention discloses a vacuum brazing process of a plasma cutting electrode. The vacuum brazing process comprises the following steps: assembling a plasma cutting electrode assembly; placing the assembly in a vacuum furnace for vacuumizing; stepwise heating to a brazing temperature; brazing; cooling; and discharging. The vacuum brazing process is characterized in that the procedure of assembling the plasma cutting electrode assembly comprises the following steps: firstly placing a solder wire and a hafnium wire in a copper bush seat sequentially from the top down; adding a locating copper ring around the protruding hafnium wire; propping up the hafnium wire by a lower post rod arranged at the center of the locating copper ring, and pressing the copper bush seat by an upper post rod arranged at the axle center of the copper bush seat; and finally placing the formed assembly in a fixture with a horizontal bottom plane. The vacuum brazing process has the following beneficial effects: the vacuum brazing process of the plasma cutting electrode is simplified, the copper bush seat and the hafnium wire are directly brazed, so the obtained electrode has the advantages of simple structure, low cost, good surface quality and uniform and compact welding seams; and in addition, the resistivity of the electrode measured by the resistance method is only (0.03-0.04)*10<-6>Omega.m.
Description
Technical field
The present invention relates to a kind of vacuum brazing technique, specifically, relate to a kind of vacuum brazing technique of plasma cutting electrode, belong to the material welding technology field.
Background technology
In industrial production, near the quality of laser cutting, but cost is far below laser cutting aspect the cutting surfaces quality of material for the fine plasma cutting technique.Therefore, in recent years, the quantity of digital controlling plasma cutting equipment gathers way very fast in each enterprise.Yet the at present main dependence on import of efficient numerically controlled plasma cutting machines must be bought as annex simultaneously as the crucial consumable accessory electrode of equipment, and it is expensive.And electrode is as the main consumables in the plasma cutting operation, and the length in its service life directly has influence on processing cost and the production efficiency of plasma cutting, and electrode is changed more frequent, and its processing cost is higher, and production efficiency is corresponding just lower.
External plasma cutting electrode be by copper sheathing seat, silver-colored body and hafnium filament core three with axis body mechanical compaction mix proportion, heavy current by the time, have two bed boundary contact resistances and gap thermal resistance, make radiating effect and conductive effect not good enough.Chinese patent ZL03150716.6 discloses a kind of employing vacuum brazing method oxygen-free copper block set, silver-colored body, hafnium filament has been connected, by brazing member being assembled (as adopting positioning fixture control postweld interval), being placed thread and foil-shaped brazing material, and control soldering processes, the electrode surface quality that obtains is good, non-oxidation, coloured light is bright, the welding even compact, and steady quality, product percent of pass reach more than 98%; Operating mode is used and is shown, the electrode that obtains reaches 500 meters for the cutting ship plate single-piece life-span, than exceed 200 meters of inlet electrode.But, not only there is the expensive problem of pure white silver-colored coolant jacket of use in this technology, and when welding needs itself and copper sheathing seat and hafnium filament are coupled together respectively, also need adopt paper tinsel shape and thread solder during connection, in addition, also need formulate special positioning fixture the joint clearance of brazing is positioned, have complex operation, the defective of plasma cutting electrode assembling unit structure complexity.
Summary of the invention
For the existing the problems referred to above of prior art and defective; the purpose of this invention is to provide that a kind of cost is low, simple to operate, quality is good, be fit to the vacuum brazing technique of the plasma cutting electrode of large-scale production, to satisfy the market demand of plasma cutting electrode.
For achieving the above object, the technical solution used in the present invention is as follows:
A kind of vacuum brazing technique of plasma cutting electrode, comprise: assembling plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumize, step heating is to brazing temperature, soldering, cooling, come out of the stove, it is characterized in that: described assembling plasma cutting electrode sub-assembly refers to put into successively from top to bottom solder wire and hafnium filament in the copper sheathing seat first, then around outstanding hafnium filament, add the location copper band, withstand hafnium filament with the lower push rod that is located at copper band center, location again and push down the copper sheathing seat with the upper ejector pin that is located at copper sheathing seat axle center, be placed on the bottom in the anchor clamps of horizontal plane.
As preferred version, the fit-up gap of copper sheathing seat and hafnium filament is 0.02～0.05mm.
As preferred version, the diameter of described solder wire and hafnium filament diameter are equal to.
As preferred version, the draw ratio of described solder wire is 0.7～0.8.
As preferred version, described solder wire is silver-bearing copper eutectic solder silk.
As preferred version, described vacuum is 1.0 * 10
-2～8 * 10
-3Pa.
As preferred version, described step heating refers to brazing temperature: be heated to 400～500 ℃ with 15～25 ℃/min first, insulation 10～30min; Then be heated to 700～770 ℃ with 5～15 ℃/min, insulation 40～80min; Be heated to brazing temperature with 15～25 ℃/min again.
As preferred version, described brazing temperature is 820～860 ℃.
As preferred version, described soldering refers at brazing temperature insulation 20～50min.
As preferred version, described cooling refers to cool off with stove.
Compared with prior art, beneficial effect of the present invention has been to simplify the vacuum brazing technique of plasma cutting electrode, adopt vacuum brazing method directly copper sheathing seat and hafnium filament to be carried out soldering, make the electrode that obtains not only simple in structure, cost is low, and surface quality is good, and even weld is fine and close, and the resistivity that adopts electric-resistivity method to record electrode only has (0.03～0.04) * 10
-6Ω m.
Description of drawings
Fig. 1 is the structural representation of plasma cutting electrode sub-assembly of the present invention.
Fig. 2 is the main TV structure schematic diagram of anchor clamps described in the embodiment.
Fig. 3 is the plan structure schematic diagram of anchor clamps described in the embodiment.
Among the figure: 1, oxygen-free copper block set; 2, solder wire; 3, hafnium filament; 4, location copper band; 5, lower push rod; 6, upper ejector pin; 7, anchor clamps; 71, upper plate; 72, lower plate; 73, support bar; 74, fixing hole; 75, locating hole.
The specific embodiment
The present invention will be further described in detail below in conjunction with drawings and Examples.
The vacuum brazing technique of a kind of plasma cutting electrode provided by the invention, comprise: assembling plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumize, step heating is to brazing temperature, soldering, cooling, come out of the stove, it is characterized in that: described assembling plasma cutting electrode sub-assembly refers to first solder wire 2 and hafnium filament 3 be put into 1 li of copper sheathing seat from top to bottom successively, then around outstanding hafnium filament, add location copper band 4, withstand hafnium filament 3 with the lower push rod 5 that is located at copper band 4 centers, location again and push down copper sheathing seat 1 with the upper ejector pin 6 that is located at copper sheathing seat 1 axle center, be placed on the bottom in the anchor clamps 7 of horizontal plane.(as shown in Figure 1).
Described anchor clamps 7 are comprised of upper plate 71, lower plate 72 and four support bars 73, and upper plate 71 is provided with fixing hole 74 and several locating holes 75 of 4 fixed support bars 73, the upper surface of described lower plate 72 is the plane, the external diameter of the internal diameter of described locating hole 75 and copper sheathing seat 1 is complementary (as shown in Figures 2 and 3), places a plasma cutting electrode sub-assembly that assembles in each locating hole.
The present invention uses following approach to make the abundant joint filling of solder: the one, solder is placed on the top of surface to be welded, and make liquid solder under capillarity and gravity double action, fill up the gap; The 2nd,, add upper ejector pin at the copper sheathing seat, make copper sheathing seat pressurized even, the compressing liquid solder is to accelerate the solder joint filling; In addition, add lower push rod at copper band center, location and withstand hafnium filament, prevent that hafnium filament from dropping on the one hand, with the extruding liquid solder its acceleration is flowed downward on the other hand.
Because of the fit-up gap of copper sheathing seat and hafnium filament size affect solder the capillary joint filling and and the Degree of interaction of solder and mother metal, thereby affect compactness and the performance of soldering; The joint clearance of brazing is excessive, and capillarity weakens even disappears, and solder is difficult to fill up the gap; The joint clearance of brazing is too little, hinders solder and fills, and is difficult to form the high joint of ratio of brazing area; Therefore, the fit-up gap of preferably copper block set of the present invention and hafnium filament is 0.02～0.05mm.
Because what of shape, size and the solder amount of solder have certain impact to brazing quality, and the plasma electric pole piece is columned, therefore, the present invention selects brazing wire, diameter and the hafnium filament diameter of preferred solder wire are equal to, and assembling is simple like this, and the solder amount is controlled easily.In addition, the draw ratio of the preferred solder wire of the present invention is 0.7～0.8, and can satisfy solder fills up whole joint clearance of brazing to this solder amount on the one hand, can prevent that on the other hand the solder amount from too much flowing out brazed seam and polluting surface of the work and cause waste etc.
Because the fusing point of silver-bearing copper eutectic solder is moderate, good manufacturability, and have good electric conductivity, thermal conductivity, intensity and toughness, and therefore, the preferred silver-bearing copper eutectic solder of the present invention silk.
Affect the wetting of solder and brazing member surface state because the vacuum degree is too low, and the too high volatilization that can accelerate metallic element of vacuum, therefore, the preferred vacuum of the present invention is 1.0 * 10
-2～8 * 10
-3Pa.
As preferred version, the present invention carries out step heating and to the process of brazing temperature is: be heated to 400～500 ℃ with 15～25 ℃/min first, and insulation 10～30min, purpose is impurity and the gas of extracting out in the stove, the generation of reduce injection defect; Then be heated to 700～770 ℃ with 5～15 ℃/min, insulation 40～80min, mainly be to make the temperature of test specimen even this moment; Be heated to brazing temperature with 15～25 ℃/min at last.
The inventor also studies discovery: brazing temperature is too low or temperature retention time is too short, can cause the solder fusing insufficient, form easily the cavity in the joint, and brazing temperature be too high or the long meeting of temperature retention time causes the more frangible compounds of generation in the joint, even crackle appears, affect the performance of joint.Therefore, brazing temperature of the present invention is preferably 820～860 ℃, at brazing temperature insulation 20～50min, then cools off with stove.
Embodiment 1
According to Fig. 1, (diameter is 2.5mm with oxygen-free copper block set 1, silver-bearing copper eutectic solder silk 2 first, highly be 2.0mm), the hafnium filament 3 fit-up gap assembling of pressing 0.05mm, then around outstanding hafnium filament 3, add location copper band 4, withstand hafnium filament 3 with the lower push rod 5 that is located at copper band 4 centers, location again and push down copper sheathing seat 1 with the upper ejector pin 6 that is located at copper sheathing seat 1 axle center, be placed on the bottom in the anchor clamps 7 of horizontal plane.
Assembly is put into vacuum drying oven, be evacuated to 8 * 10
-3Pa.
First be heated to 400 ℃ with 20 ℃/min, insulation 20min; Be heated to 750 ℃ with 10 ℃/min again, insulation 60min; Be heated to 840 ℃ with 20 ℃/min again, insulation 30min.
Come out of the stove with stove cooling, cut away localization part, it is full namely to obtain joint filling, and solder is without the cross flow phenomenon, joint flawless, and the moderate plasma cutting electrode of compound layer thickness, and described plasma cutting electrode only is comprised of copper sheathing seat and hafnium filament.
The resistivity that adopts electric-resistivity method to record the electrode that obtains is 0.04 * 10
-6Ω m.
According to Fig. 1, (diameter is 2.5mm with oxygen-free copper block set 1, silver-bearing copper eutectic solder silk 2 first, highly be 1.8mm), the hafnium filament 3 fit-up gap assembling of pressing 0.03mm, then around outstanding hafnium filament 3, add location copper band 4, withstand hafnium filament 3 with the lower push rod 5 that is located at copper band 4 centers, location again and push down copper sheathing seat 1 with the upper ejector pin 6 that is located at copper sheathing seat 1 axle center, be placed on the bottom in the anchor clamps 7 of horizontal plane.
Assembly is put into vacuum drying oven, be evacuated to 1 * 10
-2Pa.
First be heated to 400 ℃ with 20 ℃/min, insulation 20min; Be heated to 750 ℃ with 10 ℃/min again, insulation 60min; Be heated to 830 ℃ with 20 ℃/min again, insulation 40min.
Come out of the stove with stove cooling, cut away localization part, it is full namely to obtain joint filling, and solder is without the cross flow phenomenon, joint flawless, and the moderate plasma cutting electrode of compound layer thickness, and described plasma cutting electrode only is comprised of copper sheathing seat and hafnium filament.
The resistivity that adopts electric-resistivity method to record the electrode that obtains is 0.03 * 10
-6Ω m.
In sum, the vacuum brazing technique of plasma cutting electrode of the present invention is simple, and the electrode that obtains is not only simple in structure, cost is low, and surface quality is good, and even weld is fine and close, and the resistivity that adopts electric-resistivity method to record electrode only has (0.03～0.04) * 10
-6Ω m.
Should be noted that at last: above embodiment only is used for the present invention is further specified; can not be interpreted as limiting the scope of the invention, some nonessential improvement that those skilled in the art's foregoing according to the present invention is made and adjustment all belong to protection scope of the present invention.
Claims (10)
1. the vacuum brazing technique of a plasma cutting electrode, comprise: assembling plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumize, step heating is to brazing temperature, soldering, cooling, come out of the stove, it is characterized in that: described assembling plasma cutting electrode sub-assembly refers to put into successively from top to bottom solder wire and hafnium filament in the copper sheathing seat first, then around outstanding hafnium filament, add the location copper band, withstand hafnium filament with the lower push rod that is located at copper band center, location again and push down the copper sheathing seat with the upper ejector pin that is located at copper sheathing seat axle center, be placed on the bottom in the anchor clamps of horizontal plane.
2. the vacuum brazing technique of plasma cutting electrode according to claim 1, it is characterized in that: the fit-up gap of copper sheathing seat and hafnium filament is 0.02～0.05mm.
3. the vacuum brazing technique of plasma cutting electrode according to claim 1, it is characterized in that: the diameter of described solder wire and hafnium filament diameter are equal to.
4. the vacuum brazing technique of plasma cutting electrode according to claim 1, it is characterized in that: the draw ratio of described solder wire is 0.7～0.8.
5. the vacuum brazing technique of plasma cutting electrode according to claim 1, it is characterized in that: described solder wire is silver-bearing copper eutectic solder silk.
6. the vacuum brazing technique of plasma cutting electrode according to claim 1, it is characterized in that: being evacuated to vacuum is 1.0 * 10
-2～8 * 10
-3Pa.
7. the vacuum brazing technique of plasma cutting electrode according to claim 1, it is characterized in that: described step heating refers to brazing temperature: be heated to 400～500 ℃ with 15～25 ℃/min first, insulation 10～30min; Then be heated to 700～770 ℃ with 5～15 ℃/min, insulation 40～80min; Be heated to brazing temperature with 15～25 ℃/min again.
8. the vacuum brazing technique of plasma cutting electrode according to claim 1, it is characterized in that: described brazing temperature is 820～860 ℃.
9. the vacuum brazing technique of plasma cutting electrode according to claim 1 is characterized in that: described soldering refers at brazing temperature insulation 20～50min.
10. the vacuum brazing technique of plasma cutting electrode according to claim 1, it is characterized in that: described cooling refers to cool off with stove.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110302962 CN102423823B (en) | 2011-10-09 | 2011-10-09 | Vacuum brazing process of plasma cutting electrode |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110302962 CN102423823B (en) | 2011-10-09 | 2011-10-09 | Vacuum brazing process of plasma cutting electrode |
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| CN102423823A CN102423823A (en) | 2012-04-25 |
| CN102423823B true CN102423823B (en) | 2013-04-10 |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104722902B (en) * | 2015-03-31 | 2016-08-03 | 常州特尔玛枪嘴有限公司 | A kind of novel soldering formula plasma electrode and manufacture method thereof |
| CN110280865B (en) * | 2019-06-19 | 2023-07-25 | 南京卡德威焊切器材有限公司 | Plasma electrode hafnium wire brazing equipment and brazing method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5097111A (en) * | 1990-01-17 | 1992-03-17 | Esab Welding Products, Inc. | Electrode for plasma arc torch and method of fabricating same |
| KR20020034537A (en) * | 2000-11-02 | 2002-05-09 | 신현준 | Method for manufacturing plasma cutting electrode |
| US6423922B1 (en) * | 2001-05-31 | 2002-07-23 | The Esab Group, Inc. | Process of forming an electrode |
| US6583378B1 (en) * | 1999-11-26 | 2003-06-24 | Komatsu Industries Corporation | Plasma machining electrode and plasma machining device |
| CN1493430A (en) * | 2003-09-03 | 2004-05-05 | 上海市机械制造工艺研究所 | Plasma cutting electrode vacuum soldering method |
-
2011
- 2011-10-09 CN CN 201110302962 patent/CN102423823B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5097111A (en) * | 1990-01-17 | 1992-03-17 | Esab Welding Products, Inc. | Electrode for plasma arc torch and method of fabricating same |
| US6583378B1 (en) * | 1999-11-26 | 2003-06-24 | Komatsu Industries Corporation | Plasma machining electrode and plasma machining device |
| KR20020034537A (en) * | 2000-11-02 | 2002-05-09 | 신현준 | Method for manufacturing plasma cutting electrode |
| US6423922B1 (en) * | 2001-05-31 | 2002-07-23 | The Esab Group, Inc. | Process of forming an electrode |
| CN1493430A (en) * | 2003-09-03 | 2004-05-05 | 上海市机械制造工艺研究所 | Plasma cutting electrode vacuum soldering method |
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Granted publication date: 20130410 Termination date: 20181009 |