CN102540736B - Uniformity compensation device applied to large field-of-view montage illumination - Google Patents
Uniformity compensation device applied to large field-of-view montage illumination Download PDFInfo
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- CN102540736B CN102540736B CN201010582214.6A CN201010582214A CN102540736B CN 102540736 B CN102540736 B CN 102540736B CN 201010582214 A CN201010582214 A CN 201010582214A CN 102540736 B CN102540736 B CN 102540736B
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Abstract
The invention provides a uniformity compensation device applied to large field-of-view montage illumination, which sequentially comprises a light source, a light distribution structure with at least two light outlets and relay lenses with the number of optical fiber light outlets to be identical along the light transmission direction. The uniformity compensation device is characterized by further comprising a light evening optical element and a feedback controller. Light emitted from the light source passes through the light evening optical element, the light distribution structure and the relay lenses to obtain a uniform illumination field of view on a substrate. The feedback controller can adjust positions and/or angles of a mercury lamp according to uniformity signals of the substrate.
Description
Technical field
The present invention relates to large scale integrated circuit manufacturing technology field, especially a kind of uniformity compensating for large field stitching illumination.
Background technology
TFT is the abbreviation of Thin Film Transistor (Thin Film Transistor (TFT)), is a kind of large-scale semiconductive completely inegrated circuit manufacturing technology that adopts new material and new technology.TFT is that (can certainly on wafer) be formed and manufactured the essential various films of circuit by sputter, chemical deposition process on the on-monocrystalline sheets such as glass or plastic base, by the processing and fabricating large-scale semiconductive integrated circuit (LSIC) to film.Along with the development of associated electrical consumer product, increasing to the dimensional requirement of TFT, integrated unit is more and more, and single illuminator is difficult to meet the demand of TFT photoetching.Conventionally use the maximum illumination field of view at stepping lithographic equipments such as integrated circuit manufacture, encapsulation to be generally 8 inches, scanning photoetching also just has larger visual field in direction of scanning, be generally also no more than 10 inches.But TFT more than present five generations exposure visual field is all more than 17 inches, so the illumination field of view of single lens can not meet the requirement of large visual field photoetching far away.
Adopting a plurality of illuminator splicing scanning is one of solution realizing the TFT photoetching of large visual field.In the prior art of TFT photoetching, US Patent No. 6480262 adopts the mode of 7 camera lenses splicings to realize the exposure of large visual field, and how one of difficult point of this joining method is the light average effective of mercury lamp light source outgoing to assign to unit illumination field of view.In order to address this problem, two kinds of technical schemes in this patent, are provided.The first technical scheme, as shown in accompanying drawing 1a and accompanying drawing 1b, has adopted optical fibre light splitting mode to realize the uniformity requirement of many splicing camera lenses, and a lamp house is to a plurality of illuminations or the corresponding a plurality of illuminations of a plurality of lamp house.The first technical scheme, as shown in accompanying drawing 2a and accompanying drawing 2b, adopts the mode of spectroscope light splitting.Although above-mentioned two kinds of technical schemes can solve the Uniform Illumination problem of many splicing camera lenses to a certain extent, their common shortcoming is there is no illumination uniformity governor motion in each road illuminator.
US Patent No. 5579147 can regulate the homogeneity between each road, as shown in Figure 3.The prerequisite of this adjusting is that the homogeneity on each road itself has reached requirement.Even if having quartz pushrod and microlens array to carry out even light after light splitting, according to the actual experience of debuging, can not guarantee that all cell illumination visual field homogeneitys reach requirement simultaneously.Therefore, providing a kind of independent homogeneity governor motion in each road of can realizing is technical matters in the urgent need to address in large field stitching illumination uniformity compensation technique.
Summary of the invention
For solving the problems of the technologies described above, the invention provides a kind of uniformity compensating of large field stitching illumination, make the visual field of each lighting unit there is good illumination uniformity.
The invention provides a kind of uniformity compensating for large field stitching illumination, direction along light transmition, comprise successively: light source, light-emitting window are at least the beam-splitting structure of two-way and the relay lens consistent with described beam-splitting structure light-emitting window number, it is characterized in that: described uniformity compensating also comprises even smooth optical element, and feedback controller; The light that described light source sends, after even smooth optical element, beam-splitting structure and relay lens, obtains Uniform Illumination visual field on substrate; Described feedback controller is according to position and/or the angle of substrate homogeneity Signal Regulation mercury lamp.
Further, described even smooth optical element comprises microlens array and quartz pushrod, and described microlens array and quartz pushrod are successively between described light source and beam-splitting structure.
Further, described uniformity compensating also comprises adjusting washer array.
Further, described adjusting washer array is between described quartz pushrod and described beam-splitting structure.
Further, described feedback controller is according to the position and/or the angle that regulate washer array described in substrate homogeneity Signal Regulation.
Further, described uniformity compensating also comprises the even unit consistent with described beam-splitting structure light-emitting window number, and described even unit is positioned at the light-emitting window of described beam-splitting structure, and the light-emitting window of described even unit is provided with described adjusting washer array.
Further, described even smooth optical element is even unit and adjusting washer array, and described even unit is consistent with described beam-splitting structure light-emitting window number respectively with the number of adjusting washer array.
Further, described uniformity compensating also comprises ellipsoidal reflector, and described light source is placed on the interior focus place of described ellipsoidal reflector.
Further, described relay lens comprises 8 lens.Described relay lens comprises front group of lens, diaphragm and rear group of lens.
Further, described beam-splitting structure is optical fiber.Described light splitting optical fiber is comprised of some fibre cores, and the light inlet bore of described light splitting optical fiber is 20mm, and the bright dipping bore of described light splitting optical fiber is 5-10mm, and described every core diameter is 0.02-0.07mm.
The invention provides a kind of in the large field stitching exposure system of scan-type of mercury lamp illumination, the device that the homogeneity of each the unit spliced visual field in illumination field of view is regulated, this device can make the visual field of each lighting unit have good illumination uniformity.Compared with prior art, device provided by the present invention can make the illumination field of view of large field of view scan splicing have better illumination uniformity, can be by simple and effective regulative mode in the situation that light source stability, plated film unevenness, optics such as debug at the factor, the illumination uniformity of each cell illumination visual field be declined, can also on mask plate, obtain higher illumination uniformity.
Accompanying drawing explanation
Can be by following detailed Description Of The Invention and appended graphic being further understood about the advantages and spirit of the present invention.
Fig. 1 a to Fig. 1 b is one of method realizing in prior art large visual field uniform exposure;
Fig. 2 a to Fig. 2 b be in prior art, realize large visual field uniform exposure method two;
Fig. 3 be in prior art, realize large visual field uniform exposure method three;
Fig. 4 is the first embodiment of the uniformity compensating of large field stitching illumination provided by the present invention;
Fig. 5 is the second embodiment of the uniformity compensating of large field stitching illumination provided by the present invention;
Fig. 6 is the structural representation of adjusting catch involved in the present invention;
Fig. 7 is the 3rd embodiment of the uniformity compensating of large field stitching illumination provided by the present invention;
Fig. 8 is the 4th embodiment of the uniformity compensating of large field stitching illumination provided by the present invention;
Fig. 9 is the structural representation of relay lens involved in the present invention.
Embodiment
Below in conjunction with accompanying drawing, describe specific embodiments of the invention in detail.
The uniformity compensating that the invention provides a kind of large field stitching illumination, makes the visual field of each lighting unit have good illumination uniformity.In order to make each illumination field of view there is good illumination uniformity, technical scheme provided by the present invention adopts the method for even light before light splitting, between light source and light splitting optical fiber, carry out even light, namely before light enters light splitting optical fiber, just with integrating rod or lenticule, carry out even light.Particularly, first regulate mercury lamp or cold mirror to make light splitting optical fiber porch illumination uniformity reach requirement, after optical fibre light splitting, the illumination uniformity of each road illumination field of view also can reach requirement.
This uniformity compensating, direction along light transmition, comprise successively: light source, light-emitting window are at least the beam-splitting structure on 2 tunnels and the relay lens consistent with described optical fiber light-emitting window number, in the present invention, described light source adopts mercury lamp, described beam-splitting structure is light splitting optical fiber, it is characterized in that: described uniformity compensating also comprises even smooth optical element and feedback controller; The ultraviolet light that described mercury lamp light source sends, after even smooth optical element, optical fiber and relay lens, obtains Uniform Illumination visual field on substrate; Described feedback controller is according to position and/or the angle of substrate homogeneity Signal Regulation mercury lamp.
As shown in Figure 4, be the first embodiment of the uniformity compensating of large field stitching illumination provided by the present invention, utilize quartz pushrod or microlens array before light enters light splitting optical fiber, just to carry out even light.In this enforcement, the ultraviolet light that mercury lamp light source 1 sends passes through ellipsoidal reflector 2 optically focused successively, and microlens array 3 and the rear quilt of quartz pushrod 4 are evenly modulated.Ultraviolet light after evenly modulating enters light splitting optical fiber 5 and is at least divided into 2 tunnels.At the light-emitting window place of relay lens 7, place a detector (not shown) in order to obtain substrate illumination uniformity signal, this signal transfers to feedback controller 6, and according to the position of this Signal Regulation mercury lamp.
This uniformity compensating comprises successively along the direction of light transmission: mercury lamp light source 1, ellipsoidal reflector 2, microlens array 3, quartz pushrod 4, light splitting optical fiber 5, relay lens 7.The spectrum that mercury lamp light source 1 sends mainly concentrates on g, h, i tri-lines, and the spectrum that general TFT photoetching is used is i line or ghi tri-lines, need follow-uply with filter plate, leach required wavelength, filter plate select the skill of knowing that belongs to those skilled in the art, therefore omit herein.Ellipsoidal reflector 2 adopts metal material to support, and can bear the light and heat that high-power mercury lamp source 1 is sent, and ellipsoid bowl inside surface is coated with ultraviolet dielectric reflection film, the light of most ghi tri-line wavelength can be reflexed in illuminator.Mercury lamp light source 1 is placed on the interior focus place of ellipsoidal reflector 2, and quartz pushrod 4 is placed on the outer focus place of ellipsoid bowl.Be close to quartz pushrod 4 inlet ends and place microlens arrays 3, can obtain thering is certain visual field at quartz pushrod endpiece, the illumination image planes in certain numerical value aperture.Light splitting optical fiber 5 is close to quartz pushrod outlet, or by fiber coupler coupled into optical fibres.Light splitting optical fiber 5 is silica fibres, can guarantee that ultraviolet light propagates therein and have high permeability, and the light inlet bore of silica fibre can be designed to 20mm, and every core diameter is 0.02-0.07mm, and thinner silica core can guarantee high fill-ratio.Silica fibre light-emitting window can be divided into 2 tunnels, 3 tunnels ..., design bore can be 5-10mm, in the situation that guaranteeing fiber bending radius, imports to respectively in follow-up optical system.Silica fibre will be fixedly connected with, and optical fiber moves and will cause the variation of transmission light energy in optical fiber, causes throwing light on unstable.Feedback controller 6 is accepted substrate illumination uniformity signal, according to the position of this Signal Regulation mercury lamp and/or angle, thereby on substrate, obtains Uniform Illumination visual field.Relay lens 7 is positioned between the light-emitting window and substrate of light splitting optical fiber 5, and the emergent light of light splitting optical fiber 5, after relay lens 7, can effectively form the visual field that needs size on mask face.
The present invention provides the second embodiment simultaneously, discloses in this embodiment even light before entering light splitting optical fiber, can also use integrating rod, lenticule to add the technical scheme of uniformity compensating.Under normal conditions, the technical scheme providing in embodiment mono-can reach conventional uniformity requirement.If after mercury lamp or cold mirror adjusting, the illumination uniformity that enters light splitting optical fiber entrance still can not reach requirement, available uniformity compensating blocks the illumination intensity on stronger path of integration on direction of scanning, makes integration light intensity homogeneity after entering light splitting optical fiber reach requirement.
As shown in Figure 5, in order to prevent, after the even light of quartz pushrod, still can not get uniform illumination field of view on substrate, on the non-direction of scanning that goes out to hold at quartz pushrod, place one and tease and ridicule joint catch array 8.Regulate the concrete set-up mode of catch array 8 as shown in Figure 6, if quartz pushrod is at the long 33mm in non-direction of scanning, regulate the size of catch can be designed to 2mm, in non-direction of scanning, can arrange that like this 17 regulate catch, can be divided into 17 parts to integral uniformity and regulate.Regulate washer B1, B2, B3 ... the control band that Bi is corresponding is K1, K2, K3 ... Ki, when exposing in direction of scanning, the homogeneity of illumination field of view by integral uniformity ∑ I1, ∑ I2, ∑ I3 ... ∑ Ii determines.If control band K m light intensity is larger, can, regulating catch Bm to block a part of control band Km, integration light intensity ∑ Im be reduced.In this enforcement, the ultraviolet light that mercury lamp light source 1 sends passes through ellipsoidal reflector 2 optically focused successively, and microlens array 3, quartz pushrod 4 and adjusting washer array 8 rear quilts are evenly modulated.Ultraviolet light after evenly modulating enters light splitting optical fiber 5 and is at least divided into 2 tunnels.Relay lens 7 light-emitting window place place a detector (not shown) in order to obtain substrate illumination uniformity signal, this signal transfers to feedback controller 6, and according to this Signal Regulation mercury lamp with regulate position and/or the angle of catch array 8.
The 3rd embodiment carries out even light at the diverse location of illuminator to cell illumination visual field according to embodiment mono-and embodiment bis-.Between light source and light splitting optical fiber, between light splitting optical fiber and single illuminator, all each cell illumination splicing view field is carried out to even light.Between light source and light splitting optical fiber, with integrating rod or microlens array, carry out even light, guarantee that illumination intensity just had good homogeneity before entering quartz pushrod.Between light splitting optical fiber and single illuminator, with uniformity compensating, carry out even light, namely in the even light path of single illumination splicing system, such as integrating rod outlet or the lenticule exit at single illumination splicing system, with uniformity compensating, carry out even light, guarantee that light intensity had good illumination uniformity be irradiated to mask plate after light splitting before.
As shown in Figure 7, this uniformity compensating comprises successively along the direction of light transmission: mercury lamp light source 1, ellipsoidal reflector 2, microlens array 3, quartz pushrod 4, light splitting optical fiber 5, even unit 9, cell illumination visual field, cell illumination visual field regulate washer array 803 and relay lens 7.Feedback controller 6 is accepted substrate illumination uniformity signal, according to the position of this Signal Regulation mercury lamp, thereby on substrate, obtains Uniform Illumination visual field.Relay lens 7 is positioned over the control band place that cell illumination visual field regulates washer array 803, can effectively on mask face, form the visual field that needs size.Embodiment tri-regulates integral uniformity with uniformity compensating after light splitting in the light path of each cell illumination visual field.This method can better guarantee the integral uniformity of each visual field, unit.
The 4th embodiment carries out even light according to embodiment mono-and two diverse locations in illuminator to cell illumination visual field.Between light splitting optical fiber and single illuminator, even light is carried out in each lighting unit visual field.In the even light path of cell illumination visual field, such as integrating rod outlet or the lenticule exit at single illumination splicing system, with uniformity compensating, carry out even light, guarantee that light intensity had good illumination uniformity be irradiated to mask plate after light splitting before.The 4th embodiment is in order to overcome the shortcoming of the cost increase of implementing three, microlens array 3 and quartz pushrod 4 have been omitted in the present embodiment, only in the illuminator of the road of each after light splitting, with uniformity compensating, regulate integral uniformity, before light splitting no longer with quartz pushrod or the even light of microlens array.This method can reduce the size of illuminator, reduces system cost.
Accompanying drawing 9 is structural representations of relay lens involved in the present invention.Wherein in this figure, schematically provided the structure of a relay lens, but in actual application, can be according to select different types of relay lens without application scenario.Be somebody's turn to do as shown in Figure 9, this relay lens has 8 lens type structures, is wherein divided into front group of lens and rear group of lens.Along the direction of light transmission, be front group of lens 901, diaphragm 902 and rear group of lens 903 successively.
Compared with prior art, device provided by the present invention can make the illumination field of view of large field of view scan splicing have better illumination uniformity, can be by simple and effective regulative mode in the situation that light source stability, plated film unevenness, optics such as debug at the factor, the illumination uniformity of each cell illumination visual field be declined, can also on mask plate, obtain higher illumination uniformity.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (9)
1. the uniformity compensating for large field stitching illumination, direction along light transmition, comprise successively: light source, light-emitting window are at least the beam-splitting structure of two-way and the relay lens consistent with described beam-splitting structure light-emitting window number, it is characterized in that: described uniformity compensating also comprises even smooth optical element, and feedback controller; The light that described light source sends, after even smooth optical element, beam-splitting structure and relay lens, obtains Uniform Illumination visual field on substrate; Described feedback controller is according to position and/or the angle of substrate homogeneity Signal Regulation mercury lamp; Described even smooth optical element comprises microlens array and quartz pushrod, and described microlens array and quartz pushrod are successively between described light source and beam-splitting structure; Described uniformity compensating also comprises adjusting washer array; Described adjusting washer array is between described quartz pushrod and described beam-splitting structure.
2. the uniformity compensating for large field stitching illumination, direction along light transmition, comprise successively: light source, light-emitting window are at least the beam-splitting structure of two-way and the relay lens consistent with described beam-splitting structure light-emitting window number, it is characterized in that: described uniformity compensating also comprises even smooth optical element, and feedback controller; The light that described light source sends, after even smooth optical element, beam-splitting structure and relay lens, obtains Uniform Illumination visual field on substrate; Described feedback controller is according to position and/or the angle of substrate homogeneity Signal Regulation mercury lamp; Described even smooth optical element comprises microlens array and quartz pushrod, and described microlens array and quartz pushrod are successively between described light source and beam-splitting structure; Described uniformity compensating also comprises adjusting washer array; Described uniformity compensating also comprises the even unit consistent with described beam-splitting structure light-emitting window number, and described even unit is positioned at the light-emitting window of described beam-splitting structure, and the light-emitting window of described even unit arranges described adjusting washer array.
3. the uniformity compensating for large field stitching illumination, direction along light transmition, comprise successively: light source, light-emitting window are at least the beam-splitting structure of two-way and the relay lens consistent with described beam-splitting structure light-emitting window number, it is characterized in that: described uniformity compensating also comprises even smooth optical element, and feedback controller; The light that described light source sends, after beam-splitting structure, even smooth optical element and relay lens, obtains Uniform Illumination visual field on substrate; Described feedback controller is according to position and/or the angle of substrate homogeneity Signal Regulation mercury lamp; Described even smooth optical element is even unit and regulates washer array, described even unit is consistent with described beam-splitting structure light-emitting window number respectively with the number of adjusting washer array, described even unit is positioned at the light-emitting window of described beam-splitting structure, and the light-emitting window of described even unit arranges described adjusting washer array.
4. the uniformity compensating for large field stitching illumination as described in claim 1,2 or 3, is characterized in that, described feedback controller is according to the position and/or the angle that regulate washer array described in substrate homogeneity Signal Regulation.
5. the uniformity compensating for large field stitching illumination as described in claim 1,2 or 3, is characterized in that, described uniformity compensating also comprises ellipsoidal reflector, and described light source is placed on the interior focus place of described ellipsoidal reflector.
6. the uniformity compensating for large field stitching illumination as described in claim 1,2 or 3, is characterized in that, described relay lens comprises 8 lens.
7. the uniformity compensating for large field stitching illumination as described in claim 1,2 or 3, is characterized in that, described relay lens comprises front group of lens, diaphragm and rear group of lens.
8. the uniformity compensating for large field stitching illumination as described in claim 1,2 or 3, is characterized in that, described beam-splitting structure is light splitting optical fiber.
9. the uniformity compensating for large field stitching illumination as claimed in claim 8, it is characterized in that, described light splitting optical fiber is comprised of some fibre cores, and the light inlet bore of described light splitting optical fiber is 20mm, the bright dipping bore of described light splitting optical fiber is 5-10mm, and every core diameter is 0.02-0.07mm.
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| CN106933040B (en) * | 2015-12-30 | 2019-11-26 | 上海微电子装备（集团）股份有限公司 | Litho machine splices lighting system and its method of adjustment |
| CN109657402B (en) * | 2019-01-07 | 2021-02-26 | 中国科学院光电技术研究所 | Light intensity distribution modeling method and device, electronic equipment and storage medium |
| CN110811500A (en) * | 2019-12-19 | 2020-02-21 | 中国科学院长春光学精密机械与物理研究所 | Inclined-emission annular light-homogenizing optical fiber lighting system for endoscope |
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| US5455144A (en) * | 1990-03-20 | 1995-10-03 | Hitachi, Ltd. | Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
| US6480262B1 (en) * | 1993-06-30 | 2002-11-12 | Nikon Corporation | Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein |
| US5579147A (en) * | 1993-12-08 | 1996-11-26 | Nikon Corporation | Scanning light exposure apparatus |
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