CN102559056A - 一种用于抛光合金相变材料的化学机械抛光液 - Google Patents

一种用于抛光合金相变材料的化学机械抛光液 Download PDF

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CN102559056A
CN102559056A CN2010105911760A CN201010591176A CN102559056A CN 102559056 A CN102559056 A CN 102559056A CN 2010105911760 A CN2010105911760 A CN 2010105911760A CN 201010591176 A CN201010591176 A CN 201010591176A CN 102559056 A CN102559056 A CN 102559056A
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chemical mechanical
polishing liquid
mechanical polishing
acid
liquid according
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CN102559056B (zh
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庞可亮
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Anji Microelectronics Shanghai Co Ltd
Anji Microelectronics Co Ltd
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  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
CN201010591176.0A 2010-12-16 2010-12-16 一种用于抛光合金相变材料的化学机械抛光液 Active CN102559056B (zh)

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Cited By (4)

* Cited by examiner, † Cited by third party
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CN104987839A (zh) * 2015-06-30 2015-10-21 安徽德诺化工有限公司 Led用蓝宝石衬底研磨液
CN107532066A (zh) * 2015-05-08 2018-01-02 信越化学工业株式会社 合成石英玻璃基板用研磨剂以及合成石英玻璃基板的研磨方法
CN109975207A (zh) * 2019-03-30 2019-07-05 西北有色金属研究院 一种Zamak 2锌合金彩色金相组织的观察方法
CN113913116A (zh) * 2021-11-11 2022-01-11 中国电子科技集团公司第二十六研究所 一种用于抛光锗单晶的抛光液及锗单晶抛光方法

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CN1329118A (zh) * 2000-06-21 2002-01-02 普莱克斯S.T.技术有限公司 抛光组合物和抛光方法
US20050155296A1 (en) * 2004-01-16 2005-07-21 Siddiqui Junaid A. Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization
CN1900206A (zh) * 2005-07-21 2007-01-24 安集微电子（上海）有限公司 化学机械抛光液及其用途
CN101103089A (zh) * 2005-01-11 2008-01-09 克莱麦克斯工程材料有限公司 用于化学机械抛光的抛光浆液和方法
KR100856543B1 (ko) * 2007-05-30 2008-09-04 재단법인서울대학교산학협력재단 반도체 소자용 구리 배선의 산화 및 확산 방지막 형성방법
CN101333420A (zh) * 2007-06-29 2008-12-31 第一毛织株式会社 用于化学机械抛光的浆料组合物及抛光方法
CN101372606A (zh) * 2008-10-14 2009-02-25 中国科学院上海微系统与信息技术研究所 硫系化合物相变材料氧化铈化学机械抛光液
CN101586005A (zh) * 2009-07-03 2009-11-25 中国科学院上海微系统与信息技术研究所 SiSb基相变材料用化学机械抛光液
CN101665662A (zh) * 2008-09-05 2010-03-10 安集微电子科技(上海)有限公司 一种化学机械抛光液
CN101675138A (zh) * 2007-05-04 2010-03-17 卡伯特微电子公司 含有可溶性金属过氧酸盐络合物的化学机械抛光组合物及其使用方法

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000034470A (ja) * 1998-07-21 2000-02-02 Kao Corp 研磨液組成物
CN1329118A (zh) * 2000-06-21 2002-01-02 普莱克斯S.T.技术有限公司 抛光组合物和抛光方法
US20050155296A1 (en) * 2004-01-16 2005-07-21 Siddiqui Junaid A. Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization
US7077880B2 (en) * 2004-01-16 2006-07-18 Dupont Air Products Nanomaterials Llc Surface modified colloidal abrasives, including stable bimetallic surface coated silica sols for chemical mechanical planarization
CN101103089A (zh) * 2005-01-11 2008-01-09 克莱麦克斯工程材料有限公司 用于化学机械抛光的抛光浆液和方法
CN1900206A (zh) * 2005-07-21 2007-01-24 安集微电子（上海）有限公司 化学机械抛光液及其用途
CN101675138A (zh) * 2007-05-04 2010-03-17 卡伯特微电子公司 含有可溶性金属过氧酸盐络合物的化学机械抛光组合物及其使用方法
KR100856543B1 (ko) * 2007-05-30 2008-09-04 재단법인서울대학교산학협력재단 반도체 소자용 구리 배선의 산화 및 확산 방지막 형성방법
CN101333420A (zh) * 2007-06-29 2008-12-31 第一毛织株式会社 用于化学机械抛光的浆料组合物及抛光方法
CN101665662A (zh) * 2008-09-05 2010-03-10 安集微电子科技(上海)有限公司 一种化学机械抛光液
CN101372606A (zh) * 2008-10-14 2009-02-25 中国科学院上海微系统与信息技术研究所 硫系化合物相变材料氧化铈化学机械抛光液
CN101586005A (zh) * 2009-07-03 2009-11-25 中国科学院上海微系统与信息技术研究所 SiSb基相变材料用化学机械抛光液

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107532066A (zh) * 2015-05-08 2018-01-02 信越化学工业株式会社 合成石英玻璃基板用研磨剂以及合成石英玻璃基板的研磨方法
CN107532066B (zh) * 2015-05-08 2020-06-02 信越化学工业株式会社 合成石英玻璃基板用研磨剂以及合成石英玻璃基板的研磨方法
US10683437B2 (en) 2015-05-08 2020-06-16 Shin-Etsu Chemical Co., Ltd. Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate
CN104987839A (zh) * 2015-06-30 2015-10-21 安徽德诺化工有限公司 Led用蓝宝石衬底研磨液
CN109975207A (zh) * 2019-03-30 2019-07-05 西北有色金属研究院 一种Zamak 2锌合金彩色金相组织的观察方法
CN113913116A (zh) * 2021-11-11 2022-01-11 中国电子科技集团公司第二十六研究所 一种用于抛光锗单晶的抛光液及锗单晶抛光方法

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