CN102612863A - Microwave antenna for generating plasma - Google Patents
Microwave antenna for generating plasma Download PDFInfo
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- CN102612863A CN102612863A CN2010800377826A CN201080037782A CN102612863A CN 102612863 A CN102612863 A CN 102612863A CN 2010800377826 A CN2010800377826 A CN 2010800377826A CN 201080037782 A CN201080037782 A CN 201080037782A CN 102612863 A CN102612863 A CN 102612863A
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- antenna
- microwave antenna
- connecting portion
- generation plasma
- plasma according
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32229—Waveguides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/364—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith using a particular conducting material, e.g. superconductor
- H01Q1/366—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith using a particular conducting material, e.g. superconductor using an ionized gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/52—Means for reducing coupling between antennas; Means for reducing coupling between an antenna and another structure
- H01Q1/526—Electromagnetic shields
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q13/00—Waveguide horns or mouths; Slot antennas; Leaky-waveguide antennas; Equivalent structures causing radiation along the transmission path of a guided wave
- H01Q13/08—Radiating ends of two-conductor microwave transmission lines, e.g. of coaxial lines, of microstrip lines
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
Abstract
The present invention relates to an antenna of a novel construction for generating a uniform and large-area plasma by using microwaves, and the microwave antenna for generating plasma of the present invention comprises a waveguide, an antenna main body, and a connecting part of coaxial construction for electrically connecting the waveguide and the antenna main body; wherein the antenna main body consists of a doughnut-shaped electrical conductor block formed with a plurality of slots, recesses are formed between the plurality of slots in the electrical conductor block, and a plurality of permanent magnets are inserted in the recesses. The plurality of slots can be formed passing through inner and outer parts of the electrical conductor block, and the plurality of slots can be formed so as to repeat in a square-wave shape.; The present invention has the advantageous effect that a plasma can be generated which has uniform symmetry of uniform large area because the permanent magnets are mounted directly on the antenna itself, hot electrons (energetic electrons) produced by means of ECR pass through and are distributed by the microwave antenna as a whole due to a force caused by magnetic field gradient and curvature, and the hot electrons again ionise the surrounding neutral particles.
Description
Technical field
The present invention relates to produce the microwave antenna of uniform large area plasma.In more detail; The present invention relates to following microwave antenna: permanent magnet is directly installed on antenna body itself; The high energy electron (energetic electrons) that is produced by ECR is distributed in the entire antenna body equably according to magnetic field, and Ionized plasma has uniform symmetry by above-mentioned high energy electron.This microwave antenna is used to produce said plasma.
Background technology
Usually, ECR (Electronic Cyclotron Resonance; Electron cyclotron resonance) plasma source is effectively plasma generation source, and it reaches technology field with flowing of plasma can expand low-pressure (for example, 10 to
-4Torr) field.
And, in multiple semiconductor technologies (Plasma processing) such as etching that utilizes plasma and vapor deposition,, require the more plasma generation source of large tracts of land (large-area) gradually in order to satisfy limiting behaviour and the earning rate that industry requires.And large-area plasma should evenly distribute (uniformity) simultaneously.
Therewith relatively; The round-shaped Li Xitanuo coil of Li Xitanuo (Lisitano) shape antenna; Different with existing microwave plasma; The wavelength size of the ripple that its diameter is not limited to stipulate, and irrespectively the diameter of its coil can be adjusted to required size with the wavelength size, can produce effective antenna structure of corresponding large area plasma.
But the Li Xitanuo coil has following shortcoming: (i) nonaxisymmetry (nonaxisymmetry) of plasma distribution (profile) and (ii) use restriction of the caused regulation power of non-cooling coaxial cable (coaxial cable) etc.So be considered to uncomfortable antenna as large tracts of land uniform plasma body source.
Summary of the invention
Thus, consider the problems referred to above, the present invention provide can produce have good plasma distribution symmetry, the microwave antenna of the uniform large area plasma of less regulation Power Limitation.
The microwave antenna of generation plasma according to an embodiment of the invention comprises: waveguide; Antenna body; And the coaxial configuration connecting portion, it is electrically connected above-mentioned waveguide and above-mentioned antenna body.Above-mentioned antenna body forms the electric conductor piece of the ring-type that is provided with a plurality of grooves, between a plurality of grooves of above-mentioned electric conductor piece, is formed with groove, in above-mentioned groove, inserts a plurality of permanent magnets.
In the microwave antenna of generation plasma of the present invention, above-mentioned a plurality of flute profiles become the inside and outside that can connect above-mentioned electric conductor piece.
In the microwave antenna of generation plasma of the present invention, above-mentioned antenna body also comprises lid, is used for preventing that above-mentioned permanent magnet breaks away to the outside.
In the microwave antenna of generation plasma of the present invention, above-mentioned a plurality of grooves can form square-wave pulse shape repeatedly.
In the microwave antenna of generation plasma of the present invention, the short transverse of above-mentioned a plurality of grooves and the length of circumferencial direction all form according to 1/2 of the definite wavelength of frequency of utilization, the short circuit in the end of above-mentioned a plurality of grooves.
In the microwave antenna of generation plasma of the present invention, above-mentioned a plurality of permanent magnets are inserted in the groove between a plurality of grooves that are formed on above-mentioned electric conductor piece, and can be arranged in top is the N utmost point, and the bottom is the S utmost point.And it is the S utmost point that the arrangement of the permanent magnet in above-mentioned groove can form top, and the bottom is the N utmost point.
In the microwave antenna of generation plasma of the present invention, above-mentioned antenna body also comprises: the coaxial configuration connecting portion; The external current conductor connecting portion that is electrically connected; And, inner conductive body connecting portion.
In the microwave antenna of generation plasma of the present invention, control according to following formula according to the motion of the high energy electron of inner magnetic field gradient (gradient) of above-mentioned antenna body and curvature (curvature).
At this,
V dBe the drift velocity vector,
V
||Be the magnetic direction velocity vector,
V
⊥Be magnetic field and vertical speed,
BBe magnetic field vector,
R cBe the magnetic field curvature vector.
In the microwave antenna of generation plasma of the present invention, above-mentioned coaxial configuration connecting portion forms the large-diameter coaxial structure, and it can comprise: the inner conductive body; External current conductor, it is arranged on the outside of above-mentioned inner conductive body; And, ceramics insulator, it covers an end of above-mentioned inner conductive body.
In the microwave antenna of generation plasma of the present invention, above-mentioned coaxial configuration connecting portion also comprises: cools stacks, it cools off above-mentioned inner conductive body and external current conductor.
In the microwave antenna of generation plasma of the present invention, above-mentioned coaxial configuration connecting portion also comprises: the antenna body connecting portion.
In the microwave antenna of generation plasma of the present invention, above-mentioned inner conductive body is inserted into above-mentioned waveguide, thereby the microwave in the waveguide is coupled as coaxial configuration, and then passes on power.
According to the present invention; Permanent magnet is directly installed on antenna body; Thereby the high energy electron (energetic electrons) via ECR produces utilizes the active force according to magnetic field gradient and curvature; Be distributed in the microwave antenna body, high energy electron again to around neutral particle carry out ionization, have the uniform large-area and the plasma of property symmetrically thereby produce.
Description of drawings
Fig. 1 is the perspective view of expression according to the microwave antenna of generation plasma of the present invention.
Fig. 2 is the view of the microwave antenna of the generation plasma of the present invention in Fig. 1, represented.
Fig. 3 is the part-structure sketch map of the summary of the coaxial configuration connecting portion in Fig. 2, represented and waveguide.
Fig. 4 is the decomposition view of the summary of the antenna body in Fig. 2, represented.
To be expression move the sketch map of (Vd) according to the high energy electron of inner magnetic field gradient of the microwave antenna body of generation plasma of the present invention and curvature to Fig. 5.
Embodiment
The description of relevant ad hoc structure or function; At this only is to describe for the embodiment to the notion according to the present invention; And the embodiment of notion can implement through different ways according to the present invention, and just is not defined in the embodiment that this specification is stated.
Embodiment according to notion of the present invention can carry out numerous variations and can have variform, therefore, certain embodiments is explained through accompanying drawing, and is carried out detailed explanation in this manual.But to have more than be to be defined in concrete form or the mode that this paper discloses to the embodiment of notion according to the present invention, and should comprise design of the present invention and all changes, replacement or equivalents that technical scope comprised.
First and/or term such as second can be used for explaining multiple inscape, but above-mentioned inscape is not limited in the above-mentioned term.Above-mentioned term is so that an inscape is different from other inscapes is purpose; For example, do not break away from the interest field of notion according to the present invention, but the first inscape called after, second inscape; Likewise, but the second inscape called after, first inscape.
When mentioning any inscape " connection " perhaps " coupling " be in other inscapes, can directly connect or be coupled in other inscapes, also can be regarded as the inscape that has other in the centre.On the contrary, when mentioning any inscape " directly connect " perhaps " directly coupling " is in other inscapes, be interpreted as not existing other inscape in the centre.Be used to explain other expression that concern between the inscape, that is, "～between " and " just～between " perhaps "～in abutting connection with " with the expression of " in～direct adjacency " etc. also with above-mentioned the same understanding.
The term that uses at this specification is just in order to explain that certain embodiments uses, therefore unqualified the intent of the present invention.Being expressed in of odd number do not pointed out other clearly on the context the meaning, comprise the expression of plural number.In this manual; " comprise " that term such as perhaps " having " is interpreted as being meant set characteristic, numeral, stage, action, inscape, parts or the existence of making up above-mentioned part, and do not get rid of one or more than one other characteristics or numeral, stage, action, inscape, parts or make up the existence of above-mentioned part or add possibility.
Only otherwise do other definition, comprise technical or scientific term, whole terms of this use with have the same meaning according to belonging to usually the understanding of technical staff that has ABC in the technical field of the present invention.The general employed term that has defined in advance be interpreted as having with the correlation technique context on the corresponding to meaning of the meaning that had, as long as in the definition clearly of this specification, just can not be interpreted as the perhaps meaning of formality too of desirability.
Below, with reference to accompanying drawing the preferred embodiments of the present invention are described, thus the explanation detailed in addition to content of the present invention.The same label that in each figure, is adopted is represented same parts.
Fig. 1 representes the perspective view according to the microwave antenna of generation plasma of the present invention, and Fig. 2 is the view of the microwave antenna of the generation plasma of the present invention in Fig. 1, represented.As shown in the figure, the microwave antenna of generation plasma of the present invention comprises: antenna body 100; Waveguide 300; And, coaxial configuration connecting portion 200, it is electrically connected above-mentioned waveguide and antenna body.Above-mentioned antenna body 100 forms the electric conductor piece 110 of the ring-type that is provided with a plurality of grooves 120, between a plurality of grooves of above-mentioned electric conductor piece, is formed with groove 170, in above-mentioned groove 170, is inserted with a plurality of permanent magnets 130.Above-mentioned a plurality of groove 120 forms the inside and outside (with reference to Fig. 5) that can connect above-mentioned electric conductor piece; And form the square-wave pulse shape and (vertically get off; After circumferencial direction extends; Vertically get on; Extend at circumferencial direction again, and the shape of the pattern of vertically getting off again,
shape) (with reference to Fig. 2 and Fig. 4).As shown in Figure 4, the groove 170 that inserts permanent magnet 130 is formed between a plurality of grooves 120 of the electric conductor piece 110 that is arranged at antenna body 100, in above-mentioned groove 170, can be formed with lid 140, and it prevents that permanent magnet 130 breaks away to the outside.For example, above-mentioned lid 140 can form iron plate.The short transverse of the electric conductor piece of above-mentioned a plurality of groove 120 and the length of circumferencial direction form 1/2 length of the wavelength of confirming according to the frequency of utilization of microwave antenna of the present invention.The short circuit of above-mentioned a plurality of groove 120 in the end.
Above-mentioned a plurality of permanent magnet 130 is inserted in the groove 170 that is formed on above-mentioned electric conductor piece 110, and arranges all day long that the top in the outside of line body 100 is the N utmost point, and the bottom is the S utmost point.On the contrary, the top that also can be arranged in the outside of antenna body 100 is the S utmost point, and the bottom is the N utmost point.
Thus, referring to figs. 1 through Fig. 3, the coaxial configuration connecting portion 200 of the microwave antenna of generation plasma according to the present invention is described.
Fig. 3 is the part-structure sketch map of the summary of the coaxial configuration connecting portion in Fig. 2, represented and waveguide.In the present invention, antenna body 100 is electrically connected on coaxial configuration connecting portion 200 according to external current conductor connecting portion 150 and inner conductive body connecting portion 160.The antenna interconnecting piece 250 of coaxial configuration connecting portion 200 is connected in antenna body 100.
As shown in Figure 3, said external electric conductor 220 is arranged on the outside of inner conductive body 210.Above-mentioned coaxial configuration connecting portion 200 forms the large-diameter coaxial structure, and comprises, inner conductive body 210; External current conductor 220; And ceramics insulator 230, it covers an end of above-mentioned inner conductive body.As stated, utilize the large-diameter coaxial structure, thereby can pass on the power of introducing coaxial configuration fully.And; As stated; The power syndeton of antenna of the present invention, the end that makes 230 pairs of ceramics insulators be inserted in the inner conductive body 210 in the waveguide 300 covers, thus the insulator-conductor that need not have high cost engages; Perhaps use and run into heat and import machine (feedthrough) with regard to the electricity of unsettled hermetically-sealed construction (sealing) (for example, 0 type circle etc.).
And above-mentioned coaxial configuration connecting portion 200 also comprises cools stacks 240, and it cools off above-mentioned inner conductive body 210 and external current conductor 220.Above-mentioned cools stacks 240 can form the cold water stove that water circulates.As described above; If coaxial configuration connecting portion 200 comprises cools stacks 240; Then can eliminate following problem:, can make coaxial cable or electric importing machine (feedthrough) breakage according to by the existing heating that in coaxial cable (coaxial cable), causes by conduction and dielectric loss (conduction & dielectric loss).Above-mentioned cools stacks 240 is formed on the exterior circumferential of inner conductive body according to it, and shows as the pressure cooling type (forced cooled) with electric importing machine in order to cool off above-mentioned inner conductive body 210 and external current conductor 220.
And the inner conductive body 210 of above-mentioned coaxial configuration connecting portion 200 is inserted in above-mentioned waveguide 300, thereby the microwave in the waveguide is coupled as coaxial configuration.For above-mentioned inner conductive body 210 and the above-mentioned waveguide 300 of being coupled effectively, should suitably adjust the diameter (Φ) of inner conductive body 210 and insert length (l) (with reference to Fig. 3).
And above-mentioned coaxial configuration connecting portion 200 comprises antenna interconnecting piece 250.
And, be supplied to the microwave current of coaxial configuration connecting portion 200, flow to the inner conductive body connecting portion 160 of antenna body through inner conductive body 210.Microwave current flows along with the groove 120 of the square-wave pulse shape that is formed on antenna body again, flows out through external current conductor 220.Electric current in the antenna body that so the forms magnetic field that will be used to produce plasma of flowing is formed on antenna inside.
As implied above; Regulation power as the structure from the direct coupling of waveguide (waveguide) (coupling) in coaxial configuration connecting portion 200 (promptly; Be inserted with the inner conductive body 210 of coaxial configuration connecting portion 200 and the structure of coupling in the inside of waveguide 300); Waveguide directly is connected with the coaxial configuration connecting portion, and together cools off by the strong hand through water with Li Xitanuo (Lisitano) coil.
Above-mentioned waveguide 300 can use the WR340 specification of end face as quadrangle form.
Below, the effect of the microwave antenna of generation plasma according to the present invention is described.
The microwave antenna of generation plasma of the present invention forms aforesaid structure; Then be inserted in the arrangement of the permanent magnet 130 in the groove 170 that forms between the groove 120 of electric conductor piece 110 of antenna body 100, will convey to (according to the ECR generation) high energy electron (energetic electrons) according to the active force of magnetic field gradient (gradient) and curvature (curature).And; The high energy electron that in producing plasma, has a main effect is utilizing above-mentioned active force to drift about along the antenna inwall in (drift) rotation; Help ionization; And guarantee the symmetry of plasma, and obtain the symmetry of plasma through drift (drift) rotation that helps Ionized high energy electron.
Fig. 5 representes (Vd) sketch map that flows according to the high energy electron of the magnetic field gradient of above-mentioned antenna body inside and curvature.As shown in the figure, the arrangement of permanent magnet will convey to (producing according to ECR) high energy electron according to the strength of magnetic field gradient and curvature.Thus, above-mentioned high energy electron utilizes above-mentioned active force in the time of circumferencial direction drift rotation, help ionization, and the plasma that so produces can be guaranteed symmetry effectively.
And, according to the magnetic field gradient of above-mentioned antenna body inside and the mobile of high energy electron of curvature be
At this,
V dBe drift velocity vector, V
||Be magnetic direction velocity vector, V
⊥Be magnetic field and vertical speed,
BBe magnetic field vector,
R cBe the magnetic field curvature vector.
As above the present invention of explanation is not limited to the above embodiments and accompanying drawing, in the scope that does not break away from technical conceive of the present invention, can carry out various displacements, change or adjustment, and this is very clearly to those skilled in the art.Therefore, adjustment of being done or the change scheme based on the foregoing description all should belong to scope of patent protection of the presently claimed invention.
According to the permanent magnet mount type antenna that is used for uniform large-area microwave plasma source of the present invention; Permanent magnet is inserted/is arranged in the antenna body; Therefore plasma has uniform and large-area distribution, and can realize utilizing the uniform large area microwave plasma source of the pressure cooling type large-diameter coaxial structure that does not have electric importing machine through this permanent magnet mount type antenna.
Claims (12)
1. microwave antenna that produces plasma, it comprises, waveguide; Antenna body; And, the coaxial configuration connecting portion, it is electrically connected said waveguide and said antenna body, wherein, said antenna body:
Be provided with the electric conductor piece of the ring-type of a plurality of grooves,
Between said a plurality of grooves of said electric conductor piece, form groove,
In said groove, be inserted with a plurality of permanent magnets.
2. the microwave antenna of generation plasma according to claim 1 is characterized in that:
Said a plurality of groove connects the inside and outside of said electric conductor piece.
3. the microwave antenna of generation plasma according to claim 1 is characterized in that:
Said antenna body also comprises lid, and it prevents that said permanent magnet breaks away to the outside.
4. the microwave antenna of generation plasma according to claim 1 and 2 is characterized in that:
Said a plurality of groove has square-wave pulse shape repeatedly.
5. the microwave antenna of generation plasma according to claim 4 is characterized in that:
The short transverse of the said electric conductor piece of said a plurality of grooves and the length of circumferencial direction are the length according to the definite wavelength 1/2 of frequency of utilization,
Said a plurality of groove short circuit in the end (short).
6. the microwave antenna of generation plasma according to claim 1 and 2 is characterized in that:
Said a plurality of permanent magnet is inserted in the groove that forms between said a plurality of grooves of said electric conductor piece, and to be arranged in top be the N utmost point, and the bottom is the S utmost point, and perhaps top is the S utmost point, and the bottom is the N utmost point.
7. the microwave antenna of generation plasma according to claim 1 is characterized in that:
Said antenna body also comprises external current conductor connecting portion and the inner conductive body connecting portion that is electrically connected with said coaxial configuration connecting portion.
8. the microwave antenna of generation plasma according to claim 1 and 2 is characterized in that:
The following formula that moves through according to the high energy electron of inner magnetic field gradient of said antenna body and curvature is controlled,
At this,
V dBe the drift velocity vector,
V
||Be the magnetic direction velocity vector,
V
⊥Be magnetic field and right angle orientation speed,
BBe magnetic field vector,
R cBe the magnetic field curvature vector.
9. the microwave antenna of generation plasma according to claim 1 and 2 is characterized in that:
Said coaxial configuration connecting portion forms the large-diameter coaxial structure, and it comprises, the inner conductive body; External current conductor, it is arranged on the outside of said inner conductive body; And, ceramics insulator, it covers an end of said inner conductive body.
10. the microwave antenna of generation plasma according to claim 9 is characterized in that:
Said coaxial configuration connecting portion also comprises cools stacks, and it cools off said inner conductive body and said external current conductor.
11. the microwave antenna of generation plasma according to claim 9 is characterized in that:
Said coaxial configuration connecting portion also comprises the antenna body connecting portion.
12. the microwave antenna of generation plasma according to claim 9 is characterized in that:
Said inner conductive body is inserted in said waveguide, thereby the microwave in the said waveguide is coupled as coaxial configuration, and then passes on power.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20090078248 | 2009-08-24 | ||
| KR10-2009-0078248 | 2009-08-24 | ||
| KR10-2009-0117397 | 2009-11-30 | ||
| KR1020090117397A KR20110020702A (en) | 2009-08-24 | 2009-11-30 | Permanent magnet embeded lisitano antenna for large-area uniform plasma generation |
| PCT/KR2010/004406 WO2011025143A2 (en) | 2009-08-24 | 2010-07-06 | Microwave antenna for generating plasma |
Publications (2)
| Publication Number | Publication Date |
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| CN102612863A true CN102612863A (en) | 2012-07-25 |
| CN102612863B CN102612863B (en) | 2014-11-19 |
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| CN201080037782.6A Active CN102612863B (en) | 2009-08-24 | 2010-07-06 | Microwave antenna for generating plasma |
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| KR (2) | KR20110020702A (en) |
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Families Citing this family (7)
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| KR101383626B1 (en) * | 2012-02-15 | 2014-04-10 | 한국기초과학지원연구원 | Slots-excited Racetrack ECR Plasma Source for Roll-to-roll(scanning) Processing |
| KR101477060B1 (en) * | 2012-03-23 | 2014-12-29 | 한국기초과학지원연구원 | Waveguide-Coupling Method For Lisitano Coil Antenna |
| US10923324B2 (en) | 2017-07-10 | 2021-02-16 | Verity Instruments, Inc. | Microwave plasma source |
| US10679832B2 (en) * | 2017-07-10 | 2020-06-09 | Verity Instruments, Inc. | Microwave plasma source |
| KR101980273B1 (en) | 2017-11-23 | 2019-05-21 | 한국기초과학지원연구원 | Linear microwave plasma generating device |
| TWI721373B (en) * | 2018-06-28 | 2021-03-11 | 美商梅瑞堤儀器公司 | Plasma source, excitation system for excitation of a plasma, and optical monitoring system |
| US20220246402A1 (en) * | 2021-02-03 | 2022-08-04 | Tokyo Electron Limited | Plasma Processing System And Method Using Radio Frequency And Microwave Power |
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| US3663858A (en) * | 1969-11-06 | 1972-05-16 | Giuseppe Lisitano | Radio-frequency plasma generator |
| US5342472A (en) * | 1991-08-12 | 1994-08-30 | Tokyo Electron Limited | Plasma processing apparatus |
| JPH07335162A (en) * | 1994-06-07 | 1995-12-22 | Nissin Electric Co Ltd | Antenna for high frequency plasma source |
| JPH11260593A (en) * | 1998-01-16 | 1999-09-24 | Leybold Syst Gmbh | Plasma generating apparatus |
| CN1269692A (en) * | 1999-02-02 | 2000-10-11 | 日新电机株式会社 | Plasma source |
| US6194835B1 (en) * | 1997-05-28 | 2001-02-27 | Leybold Systems Gmbh | Device for producing plasma |
| CN1423824A (en) * | 1999-11-15 | 2003-06-11 | 兰姆研究有限公司 | Materials and gas chemistries for processing systems |
-
2009
- 2009-11-30 KR KR1020090117397A patent/KR20110020702A/en active Search and Examination
-
2010
- 2010-07-06 KR KR1020100065094A patent/KR101175324B1/en active IP Right Grant
- 2010-07-06 CN CN201080037782.6A patent/CN102612863B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3663858A (en) * | 1969-11-06 | 1972-05-16 | Giuseppe Lisitano | Radio-frequency plasma generator |
| US5342472A (en) * | 1991-08-12 | 1994-08-30 | Tokyo Electron Limited | Plasma processing apparatus |
| JPH07335162A (en) * | 1994-06-07 | 1995-12-22 | Nissin Electric Co Ltd | Antenna for high frequency plasma source |
| US6194835B1 (en) * | 1997-05-28 | 2001-02-27 | Leybold Systems Gmbh | Device for producing plasma |
| JPH11260593A (en) * | 1998-01-16 | 1999-09-24 | Leybold Syst Gmbh | Plasma generating apparatus |
| CN1269692A (en) * | 1999-02-02 | 2000-10-11 | 日新电机株式会社 | Plasma source |
| CN1423824A (en) * | 1999-11-15 | 2003-06-11 | 兰姆研究有限公司 | Materials and gas chemistries for processing systems |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102612863B (en) | 2014-11-19 |
| KR101175324B1 (en) | 2012-08-20 |
| KR20110020723A (en) | 2011-03-03 |
| KR20110020702A (en) | 2011-03-03 |
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