CN102612863B - Microwave antenna for generating plasma - Google Patents
Microwave antenna for generating plasma Download PDFInfo
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- CN102612863B CN102612863B CN201080037782.6A CN201080037782A CN102612863B CN 102612863 B CN102612863 B CN 102612863B CN 201080037782 A CN201080037782 A CN 201080037782A CN 102612863 B CN102612863 B CN 102612863B
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- antenna
- microwave antenna
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32229—Waveguides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/364—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith using a particular conducting material, e.g. superconductor
- H01Q1/366—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith using a particular conducting material, e.g. superconductor using an ionized gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/52—Means for reducing coupling between antennas; Means for reducing coupling between an antenna and another structure
- H01Q1/526—Electromagnetic shields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q13/00—Waveguide horns or mouths; Slot antennas; Leaky-waveguide antennas; Equivalent structures causing radiation along the transmission path of a guided wave
- H01Q13/08—Radiating ends of two-conductor microwave transmission lines, e.g. of coaxial lines, of microstrip lines
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/4622—Microwave discharges using waveguides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
- H05H1/461—Microwave discharges
- H05H1/463—Microwave discharges using antennas or applicators
Abstract
The present invention relates to an antenna of a novel construction for generating a uniform and large-area plasma by using microwaves, and the microwave antenna for generating plasma of the present invention comprises a waveguide, an antenna main body, and a connecting part of coaxial construction for electrically connecting the waveguide and the antenna main body; wherein the antenna main body consists of a doughnut-shaped electrical conductor block formed with a plurality of slots, recesses are formed between the plurality of slots in the electrical conductor block, and a plurality of permanent magnets are inserted in the recesses. The plurality of slots can be formed passing through inner and outer parts of the electrical conductor block, and the plurality of slots can be formed so as to repeat in a square-wave shape.; The present invention has the advantageous effect that a plasma can be generated which has uniform symmetry of uniform large area because the permanent magnets are mounted directly on the antenna itself, hot electrons (energetic electrons) produced by means of ECR pass through and are distributed by the microwave antenna as a whole due to a force caused by magnetic field gradient and curvature, and the hot electrons again ionise the surrounding neutral particles.
Description
Technical field
The present invention relates to produce the microwave antenna of uniform large area plasma.In more detail, the present invention relates to following microwave antenna: permanent magnet is directly installed on antenna body itself, the high energy electron being produced by ECR (energetic electrons) is distributed in whole antenna body equably according to magnetic field, and by above-mentioned high energy electron, Ionized plasma has uniform symmetry.This microwave antenna is for generation of described plasma.
Background technology
Usually, ECR (Electronic Cyclotron Resonance; Electron cyclotron resonance) plasma source is effectively plasma generation source, and its mobile and technology field by plasma can expand low-pressure (for example, 10 to
-4torr) field.
And, in utilizing the multiple semiconductor technologies (Plasma processing) such as the etching of plasma and evaporation, the limiting behaviour and the earning rate that in order to meet industry, require, require the more plasma generation source of large area (large-area) gradually.And large-area plasma should evenly distribute simultaneously (uniformity).
Ground related to this, the round-shaped Li Xitanuo coil of Li Xitanuo (Lisitano) shape antenna, different from existing microwave plasma, its diameter is not limited to the wavelength size of the ripple of regulation, and independently the diameter of its coil be can be adjusted to required size with wavelength size, can produce effective antenna structure of corresponding large area plasma.
But Li Xitanuo coil has following shortcoming: (i) plasma distribute (profile) nonaxisymmetry (nonaxisymmetry) and (ii) use the restriction etc. of the caused regulation power of non-cooling coaxial cable (coaxial cable).So be considered to the uncomfortable antenna as Large-Area-Uniform plasma source.
Summary of the invention
Thus, consider the problems referred to above, the invention provides can produce there is good being distributed symmetrically property of plasma, the microwave antenna of the uniform large area plasma of less regulation Power Limitation.
The microwave antenna of generation plasma according to an embodiment of the invention, comprising: waveguide; Antenna body; And coaxial configuration connecting portion, it is electrically connected to above-mentioned waveguide and above-mentioned antenna body.Above-mentioned antenna body forms the electric conductor piece of the ring-type that is provided with a plurality of grooves, between a plurality of grooves of above-mentioned electric conductor piece, is formed with groove, inserts a plurality of permanent magnets in above-mentioned groove.
In the microwave antenna of generation plasma of the present invention, above-mentioned a plurality of flute profiles become the inside and outside that can connect above-mentioned electric conductor piece.
In the microwave antenna of generation plasma of the present invention, above-mentioned antenna body also comprises lid, is used for preventing that above-mentioned permanent magnet from departing to outside.
In the microwave antenna of generation plasma of the present invention, above-mentioned a plurality of grooves can form square-wave pulse shape repeatedly.
In the microwave antenna of generation plasma of the present invention, the short transverse of above-mentioned a plurality of grooves and the length of circumferencial direction all form according to 1/2 of the definite wavelength of frequency of utilization, and above-mentioned a plurality of grooves are in end short circuit.
In the microwave antenna of generation plasma of the present invention, above-mentioned a plurality of permanent magnets are inserted in the groove between a plurality of grooves that are formed on above-mentioned electric conductor piece, and can be arranged in top is the N utmost point, and bottom is the S utmost point.And it is the S utmost point that the arrangement of the permanent magnet in above-mentioned groove can form top, bottom is the N utmost point.
In the microwave antenna of generation plasma of the present invention, above-mentioned antenna body also comprises: coaxial configuration connecting portion; The external current conductor connecting portion being electrically connected to; And, inner conductive body connecting portion.
In the microwave antenna of generation plasma of the present invention, according to the motion of the high energy electron of the magnetic field gradient of above-mentioned antenna body inside (gradient) and curvature (curvature), according to following formula, control.
At this,
v dfor drift velocity vector,
V
||for magnetic direction velocity vector,
V
⊥for magnetic field and vertical speed,
bfor magnetic field vector,
r cfor magnetic field curvature vector.
In the microwave antenna of generation plasma of the present invention, above-mentioned coaxial configuration connecting portion forms large-diameter coaxial structure, and it can comprise: inner conductive body; External current conductor, it is arranged on the outside of above-mentioned inner conductive body; And, ceramics insulator, it covers an end of above-mentioned inner conductive body.
In the microwave antenna of generation plasma of the present invention, above-mentioned coaxial configuration connecting portion, also comprises: cools stacks, its cooling above-mentioned inner conductive body and external current conductor.
In the microwave antenna of generation plasma of the present invention, above-mentioned coaxial configuration connecting portion also comprises: antenna body connecting portion.
In the microwave antenna of generation plasma of the present invention, above-mentioned inner conductive body is inserted into above-mentioned waveguide, thereby is coaxial configuration by the microwave coupling in waveguide, and then passes on power.
According to the present invention, permanent magnet is directly installed on to antenna body, thereby the high energy electron (energetic electrons) producing via ECR utilizes according to the active force of magnetic field gradient and curvature, be distributed in microwave antenna body, high energy electron carries out ionization to neutral particle around again, thereby produce, has uniform large-area and the plasma of property symmetrically.
Accompanying drawing explanation
Fig. 1 means according to the perspective view of the microwave antenna of generation plasma of the present invention.
Fig. 2 is the view of the microwave antenna of the generation plasma of the present invention that represents in Fig. 1.
Fig. 3 is the part-structure schematic diagram of the summary of the coaxial configuration connecting portion that represents in Fig. 2 and waveguide.
Fig. 4 is the decomposition view of the summary of the antenna body that represents in Fig. 2.
Fig. 5 means the schematic diagram that moves (Vd) according to the magnetic field gradient of microwave antenna body inside of generation plasma of the present invention and the high energy electron of curvature.
Embodiment
The description of relevant ad hoc structure or function, at this, be only used to describe for the embodiment of the concept according to the present invention, and according to the present invention, the embodiment of concept can implement by multiple different mode, and is not just defined in the embodiment that this specification is stated.
According to the embodiment of concept of the present invention, can carry out numerous variations and can there is variform, therefore, specific embodiment being explained by accompanying drawing, and be described in detail in this manual.But according to the present invention, to have more than be to be defined in disclosed herein concrete form or mode to the embodiment of concept, and should comprise all changes, replacement or the equivalents that design of the present invention and technical scope thereof comprise.
The term such as first and/or second can be used for illustrating multiple inscape, but above-mentioned inscape is not limited in above-mentioned term.Above-mentioned term is so that an inscape is different from other inscapes is object, for example, do not depart from the interest field of the concept according to the present invention, the first inscape can called after the second inscape, similarly, the second inscape can called after the first inscape.
When mentioning any inscape " connection " or " coupling " in other inscapes, can directly connect or be coupled in other inscapes, also can be regarded as and in centre, have other inscape.On the contrary, when mentioning any inscape " directly connection " or " direct-coupling " in other inscapes, be interpreted as not existing in centre other inscape.For other that relation between inscape is described, express, that is, "～between " and " just～between " or "～in abutting connection with " and the expression of " in～direct adjacency " etc. also with above-mentioned the same understanding.
The term using at this specification, just in order to illustrate that specific embodiment is used, does not therefore limit the intent of the present invention.Other the meaning is not pointed out clearly in the expression of odd number on context, comprises plural expression.In this manual, " comprise " or existence that the term such as " having " is interpreted as referring to set feature, numeral, stage, action, inscape, parts or combines above-mentioned part, and do not get rid of one or more than one other features or numeral, stage, action, inscape, parts or combine existence or the additional possibility of above-mentioned part.
Only otherwise do other definition, comprise technical or scientific term, as used herein all terms with according to usually the understanding and there is the same meaning of technical staff in belonging to technical field of the present invention with ABC.The general prior defined term using is interpreted as having the meaning consistent with the meaning having on correlation technique context, as long as in the definition clearly of this specification, just can not be interpreted as desirability or the meaning of formality too.
Below, with reference to accompanying drawing, the preferred embodiments of the present invention are described, thereby to content of the present invention detailed explanation in addition.The same label adopting in each figure represents same parts.
Fig. 1 represents according to the perspective view of the microwave antenna of generation plasma of the present invention, and Fig. 2 is the view of the microwave antenna of the generation plasma of the present invention that represents in Fig. 1.As shown in the figure, the microwave antenna of generation plasma of the present invention, comprising: antenna body 100; Waveguide 300; And, coaxial configuration connecting portion 200, it is electrically connected to above-mentioned waveguide and antenna body.Above-mentioned antenna body 100 forms the electric conductor piece 110 of the ring-type that is provided with a plurality of grooves 120, between a plurality of grooves of above-mentioned electric conductor piece, is formed with groove 170, is inserted with a plurality of permanent magnets 130 in above-mentioned groove 170.Above-mentioned a plurality of groove 120 forms the inside and outside (with reference to Fig. 5) that can connect above-mentioned electric conductor piece, and forms square-wave pulse shape and (vertically get off, after circumferencial direction extends, vertically get on, at circumferencial direction, extend again, and the shape of the pattern of again vertically getting off
shape) (with reference to Fig. 2 and Fig. 4).As shown in Figure 4, the groove 170 that inserts permanent magnet 130 is formed between a plurality of grooves 120 of the electric conductor piece 110 that is arranged at antenna body 100, in above-mentioned groove 170, can be formed with lid 140, and it prevents that permanent magnet 130 from departing to outside.For example, above-mentioned lid 140 can form iron plate.The short transverse of electric conductor piece of above-mentioned a plurality of groove 120 and the length of circumferencial direction form according to 1/2 length of the definite wavelength of the frequency of utilization of microwave antenna of the present invention.Above-mentioned a plurality of groove 120 is in end short circuit.
Above-mentioned a plurality of permanent magnet 130 is inserted in the groove 170 that is formed on above-mentioned electric conductor piece 110, and to arrange the top in the outside of line body 100 be all day long the N utmost point, and bottom is the S utmost point.On the contrary, the top that also can be arranged in the outside of antenna body 100 is the S utmost point, and bottom is the N utmost point.
Thus, referring to figs. 1 through Fig. 3, the coaxial configuration connecting portion 200 of the microwave antenna of generation plasma according to the present invention is described.
Fig. 3 is the part-structure schematic diagram of the summary of the coaxial configuration connecting portion that represents in Fig. 2 and waveguide.In the present invention, antenna body 100, according to external current conductor connecting portion 150 and inner conductive body connecting portion 160, is electrically connected on coaxial configuration connecting portion 200.The antenna interconnecting piece 250 of coaxial configuration connecting portion 200 is connected in antenna body 100.
As shown in Figure 3, said external electric conductor 220 is arranged on the outside of inner conductive body 210.Above-mentioned coaxial configuration connecting portion 200 forms large-diameter coaxial structure, and comprises, inner conductive body 210; External current conductor 220; And ceramics insulator 230, it covers an end of above-mentioned inner conductive body.As mentioned above, utilize large-diameter coaxial structure, thereby can pass on fully the power of introducing coaxial configuration.And, as mentioned above, the power syndeton of antenna of the present invention, the end that makes 230 pairs of ceramics insulators be inserted in the inner conductive body 210 in waveguide 300 covers, thereby the insulator-conductor that does not need to have high cost engages, or use and to run into heat and for example, import machine (feedthrough) with regard to the electricity of unsettled hermetically-sealed construction (sealing) (, 0 type circle etc.).
And above-mentioned coaxial configuration connecting portion 200 also comprises cools stacks 240, its cooling above-mentioned inner conductive body 210 and external current conductor 220.Above-mentioned cools stacks 240 can form the cold water stove that water circulates.As described above, if coaxial configuration connecting portion 200 comprises cools stacks 240, can eliminate following problem: according to by existing in coaxial cable (coaxial cable) by the heating of conducting electricity and dielectric loss (conduction & dielectric loss) causes, can make coaxial cable or electric importing machine (feedthrough) breakage.Above-mentioned cools stacks 240, for cooling above-mentioned inner conductive body 210 and external current conductor 220, is formed on the exterior circumferential of inner conductive body according to it, and shows as the pressure cooling type (forced cooled) without electric importing machine.
And the inner conductive body 210 of above-mentioned coaxial configuration connecting portion 200 is inserted in above-mentioned waveguide 300, thereby be coaxial configuration by the microwave coupling in waveguide.For above-mentioned inner conductive body 210 and the above-mentioned waveguide 300 of being effectively coupled, should suitably adjust diameter (Φ) and the intubating length (l) (with reference to Fig. 3) of inner conductive body 210.
And above-mentioned coaxial configuration connecting portion 200 comprises antenna interconnecting piece 250.
And, be supplied to the microwave current of coaxial configuration connecting portion 200, by inner conductive body 210, flow to the inner conductive body connecting portion 160 of antenna body.Microwave current flows along with being formed on the groove 120 of the square-wave pulse shape of antenna body again, by external current conductor 220, flows out.Current flowing in the antenna body so forming is formed on antenna inside by the magnetic field for generation of plasma.
As implied above, regulation power as the structure from waveguide (waveguide) direct-coupling (coupling) in coaxial configuration connecting portion 200 (, in the inside of waveguide 300, be inserted with the inner conductive body 210 of coaxial configuration connecting portion 200 structure of coupling), waveguide is directly connected with coaxial configuration connecting portion, and together by water, carries out forcibly cooling with Li Xitanuo (Lisitano) coil.
Above-mentioned waveguide 300 can be used the WR340 specification that end face is quadrangle form.
Below, the effect of the microwave antenna of generation plasma according to the present invention is described.
The microwave antenna of generation plasma of the present invention forms structure as above, be inserted in the arrangement of the permanent magnet 130 in the groove 170 forming between the groove 120 of electric conductor piece 110 of antenna body 100, will convey to according to the active force of magnetic field gradient (gradient) and curvature (curature) (according to ECR generation) high energy electron (energetic electrons).And, the high energy electron in producing plasma with Main Function is utilizing above-mentioned active force along antenna inwall, to drift about in (drift) rotation, be conducive to ionization, and guarantee the symmetry of plasma, and by being conducive to drift (drift) rotation of Ionized high energy electron, obtain the symmetry of plasma.
Fig. 5 represents (Vd) schematic diagram that flows according to the high energy electron of the magnetic field gradient of above-mentioned antenna body inside and curvature.As shown in the figure, the arrangement of permanent magnet will convey to (producing according to ECR) high energy electron according to the strength of magnetic field gradient and curvature.Thus, when above-mentioned high energy electron utilizes above-mentioned active force to circumferencial direction drift rotation, be conducive to ionization, and the plasma so producing can be guaranteed symmetry effectively.
And, according to the mobile of high energy electron of the magnetic field gradient of above-mentioned antenna body inside and curvature, be
At this,
v dfor drift velocity vector, V
||for magnetic direction velocity vector, V
⊥for magnetic field and vertical speed,
bfor magnetic field vector,
r cfor magnetic field curvature vector.
As above the present invention of explanation is not limited to the above embodiments and accompanying drawing, within not departing from the scope of the technology of the present invention design, can carry out various displacements, change or adjustment, and this is very clearly to those skilled in the art.Therefore, the adjustment of doing based on above-described embodiment or change scheme all should belong to scope of patent protection of the presently claimed invention.
According to the permanent magnet mount type antenna for uniform large-area microwave plasma source of the present invention, permanent magnet is inserted/is arranged in antenna body, therefore plasma has uniform and large-area distribution, and can realize the uniform large area microwave plasma source that utilizes the pressure cooling type large-diameter coaxial structure without electric importing machine by this permanent magnet mount type antenna.
Claims (9)
1. a microwave antenna that produces plasma, it comprises:
Waveguide;
Antenna body; And
Coaxial configuration connecting portion, it is electrically connected to described waveguide and described antenna body;
Wherein, described antenna body is provided with the electric conductor piece of the ring-type of a plurality of grooves, between described a plurality of grooves of described electric conductor piece, forms groove, is inserted with a plurality of permanent magnets in described groove,
Described antenna body is electrically connected to described coaxial configuration connecting portion by external current conductor connecting portion and inner conductive body connecting portion,
Described coaxial configuration connecting portion forms large-diameter coaxial structure, and comprise inner conductive body, external current conductor and ceramics insulator, wherein said external current conductor is arranged on the outside of described inner conductive body, and described ceramics insulator covers the end of described inner conductive body.
2. the microwave antenna of generation plasma according to claim 1, wherein:
Described a plurality of groove connects the inside and outside of described electric conductor piece.
3. the microwave antenna of generation plasma according to claim 1, wherein:
Described antenna body also comprises lid, and it prevents that described permanent magnet from departing to outside.
4. the microwave antenna of generation plasma according to claim 1 and 2, wherein:
Described a plurality of groove has square-wave pulse shape repeatedly.
5. the microwave antenna of generation plasma according to claim 4, wherein:
The short transverse of described a plurality of grooves in described electric conductor piece and the length of circumferencial direction are according to the length of the definite wavelength 1/2 of frequency of utilization,
The short circuit in end of described a plurality of groove.
6. the microwave antenna of generation plasma according to claim 1 and 2, wherein:
Described a plurality of permanent magnet is inserted in the groove forming between described a plurality of grooves of described electric conductor piece, and to be arranged in top be the N utmost point, and bottom is the S utmost point, or top is the S utmost point, and bottom is the N utmost point.
7. the microwave antenna of generation plasma according to claim 1 and 2, wherein:
According to the following formula that moves through of the high energy electron of the magnetic field gradient of described antenna body inside and curvature, control,
At this,
v dfor drift velocity vector,
V
‖for the velocity vector parallel with magnetic direction,
V
⊥for the velocity vector vertical with the vertical direction in magnetic field,
bfor magnetic field vector,
r cfor magnetic field curvature vector.
8. the microwave antenna of generation plasma according to claim 1, wherein:
Described coaxial configuration connecting portion also comprises cools stacks, its cooling described inner conductive body and described external current conductor.
9. the microwave antenna of generation plasma according to claim 1, wherein:
Described inner conductive body is inserted in described waveguide, thereby is coaxial configuration by the microwave coupling in described waveguide, and then passes on power.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2009-0078248 | 2009-08-24 | ||
| KR20090078248 | 2009-08-24 | ||
| KR10-2009-0117397 | 2009-11-30 | ||
| KR1020090117397A KR20110020702A (en) | 2009-08-24 | 2009-11-30 | Permanent magnet embeded lisitano antenna for large-area uniform plasma generation |
| PCT/KR2010/004406 WO2011025143A2 (en) | 2009-08-24 | 2010-07-06 | Microwave antenna for generating plasma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102612863A CN102612863A (en) | 2012-07-25 |
| CN102612863B true CN102612863B (en) | 2014-11-19 |
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| CN201080037782.6A Active CN102612863B (en) | 2009-08-24 | 2010-07-06 | Microwave antenna for generating plasma |
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| KR (2) | KR20110020702A (en) |
| CN (1) | CN102612863B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101383626B1 (en) * | 2012-02-15 | 2014-04-10 | 한국기초과학지원연구원 | Slots-excited Racetrack ECR Plasma Source for Roll-to-roll(scanning) Processing |
| KR101477060B1 (en) * | 2012-03-23 | 2014-12-29 | 한국기초과학지원연구원 | Waveguide-Coupling Method For Lisitano Coil Antenna |
| US10923324B2 (en) | 2017-07-10 | 2021-02-16 | Verity Instruments, Inc. | Microwave plasma source |
| US10679832B2 (en) * | 2017-07-10 | 2020-06-09 | Verity Instruments, Inc. | Microwave plasma source |
| KR101980273B1 (en) | 2017-11-23 | 2019-05-21 | 한국기초과학지원연구원 | Linear microwave plasma generating device |
| TWI721373B (en) * | 2018-06-28 | 2021-03-11 | 美商梅瑞堤儀器公司 | Plasma source, excitation system for excitation of a plasma, and optical monitoring system |
| US20220246402A1 (en) * | 2021-02-03 | 2022-08-04 | Tokyo Electron Limited | Plasma Processing System And Method Using Radio Frequency And Microwave Power |
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| US3663858A (en) * | 1969-11-06 | 1972-05-16 | Giuseppe Lisitano | Radio-frequency plasma generator |
| US5342472A (en) * | 1991-08-12 | 1994-08-30 | Tokyo Electron Limited | Plasma processing apparatus |
| CN1269692A (en) * | 1999-02-02 | 2000-10-11 | 日新电机株式会社 | Plasma source |
| US6194835B1 (en) * | 1997-05-28 | 2001-02-27 | Leybold Systems Gmbh | Device for producing plasma |
| CN1423824A (en) * | 1999-11-15 | 2003-06-11 | 兰姆研究有限公司 | Materials and gas chemistries for processing systems |
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| JPH07335162A (en) * | 1994-06-07 | 1995-12-22 | Nissin Electric Co Ltd | Antenna for high frequency plasma source |
| DE19801366B4 (en) * | 1998-01-16 | 2008-07-03 | Applied Materials Gmbh & Co. Kg | Device for generating plasma |
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2009
- 2009-11-30 KR KR1020090117397A patent/KR20110020702A/en active Search and Examination
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2010
- 2010-07-06 CN CN201080037782.6A patent/CN102612863B/en active Active
- 2010-07-06 KR KR1020100065094A patent/KR101175324B1/en active IP Right Grant
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3663858A (en) * | 1969-11-06 | 1972-05-16 | Giuseppe Lisitano | Radio-frequency plasma generator |
| US5342472A (en) * | 1991-08-12 | 1994-08-30 | Tokyo Electron Limited | Plasma processing apparatus |
| US6194835B1 (en) * | 1997-05-28 | 2001-02-27 | Leybold Systems Gmbh | Device for producing plasma |
| CN1269692A (en) * | 1999-02-02 | 2000-10-11 | 日新电机株式会社 | Plasma source |
| CN1423824A (en) * | 1999-11-15 | 2003-06-11 | 兰姆研究有限公司 | Materials and gas chemistries for processing systems |
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| Title |
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| JP特开平11-260593A 1999.09.24 * |
| JP特开平7-335162A 1995.12.22 * |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101175324B1 (en) | 2012-08-20 |
| KR20110020702A (en) | 2011-03-03 |
| CN102612863A (en) | 2012-07-25 |
| KR20110020723A (en) | 2011-03-03 |
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