CN102758185A

CN102758185A - Flow divider

Info

Publication number: CN102758185A
Application number: CN2011101106758A
Authority: CN
Inventors: 姜传华; 黄义均; 潘海波; 李旭; 陈甲林
Original assignee: Shenzhen Futaihong Precision Industry Co Ltd
Current assignee: Shenzhen Futaihong Precision Industry Co Ltd
Priority date: 2011-04-29
Filing date: 2011-04-29
Publication date: 2012-10-31
Also published as: TW201243087A; TWI503438B; US20120273346A1

Abstract

The invention discloses a flow divider which is applied to a vacuum sputtering device. The flow divider comprises a machine body and a metal cover arranged on the machine body. A gas suction port is formed on the machine body, and the metal cover is used for covering the gas suction port. The metal cover is formed with a plurality of through holes for enabling gas to pass. A plurality of baffle plates are arranged on the metal cover at intervals, and the baffle plates can block part of the through holes so as to adjust gas entering into the gas suction port. The flow divider can adjust the uniform distribution of gas flow, effectively expand an effective coating area and conveniently coat a plurality of workpieces once by arranging the baffle plates on the metal cover with the holes at intervals.

Description

Splitter

Technical field

The present invention relates to a kind of splitter, relate in particular to a kind of splitter that is applied to vacuum splashing and plating equipment.

Background technology

The common metal plated film mostly adopts vacuum splashing and plating equipment to carry out sputter; Basic principle is to utilize photoglow (glow discharge) with argon gas (Ar) ionic bombardment target (target) surface in a vacuum; Positively charged ion in the electricity slurry quickens to rush at as by the negative electrode surface of sputter material, and the material that makes target flies out and is deposited on and forms film on the workpiece.The character of the film that vacuum splashing and plating forms, uniformity coefficient all than evaporated film come good, therefore be used widely.Because gas is difficult in Vakuumkammer fully evenly, can only the part even relatively, so there is a plated film service area.The film quality that space beyond this plated film service area forms does not just reach requirement.But the plated film service area of existing vacuum splashing and plating equipment is less, once is difficult to the more workpiece of sputter.

Summary of the invention

To the problems referred to above, be necessary to provide the splitter that can enlarge the plated film service area.

A kind of splitter is applied to vacuum splashing and plating equipment, and it comprises body and the metal cap of being located at body; This body is offered bleeding point, and this metal cap covers this bleeding point; This metal cap is offered some through holes and is passed through by gas; At interval some baffle plates are set on this metal cap, the said through hole of these baffle plate shield portions is with the gas of adjustment entering bleeding point.

Above-mentioned splitter is provided with baffle plate through interval on metal cap with holes, thereby the uniform distribution of adjustment air-flow has effectively enlarged the plated film effective area, conveniently once a plurality of workpiece is carried out plated film.

Description of drawings

Fig. 1 is the cross-sectional schematic of preferred embodiments splitter of the present invention;

Fig. 2 is the schematic perspective view of metal cap shown in Figure 1;

Fig. 3 is the sectional view of splitter shown in Figure 1 along the III-III line.

The main element nomenclature

Splitter	100
		Body	10
Containing cavity	12
		Pivoted frame	14
Montant	142
		Support	144
Metal cap	20
		Through hole	22
Baffle plate	30
		Inlet pipe	40
Pin hole	42
		Bleeding point	50
Regulating mechanism	60
		The metal cap width	W1
The bleeding point width	W3
		Metal cap thickness	D1
Metal cap length	L1
		Baffle length	L2

Following embodiment will combine above-mentioned accompanying drawing to further specify the present invention.

Embodiment

See also Fig. 1, splitter 100 of the present invention is applied in vacuum splashing and plating equipment (figure does not show), and it comprises body 10 and metal cap 20.

This body 10 surrounds a containing cavity 12, and this containing cavity 12 is connected with vacuum unit.These body 10 1 sides are offered a bleeding point 50, are used for gas is discharged containing cavity 12.

One end of this body 10 be provided with one be contained in containing cavity 12 pivoted frame 14, this pivoted frame 14 comprises the some montants 142 that are provided with at interval, every montant 142 is provided with some supports 144.These supports 144 are arranged side by side, and are used for fixing workpiece to be coated (figure does not show).

Please consult Fig. 2 and Fig. 3 simultaneously, this metal cap 20 is fixed on a side that is positioned at containing cavity 12 of body 10 and covers on simultaneously on the bleeding point 50.This metal cap 20 is netted, is provided with many through holes 22, and gas gets into bleeding point 50 through these through holes 22.The diameter range of these through holes 22 is 0.5mm-50mm, and hole width between centers scope is 2mm-50mm.This metal cap width W 1 is than bleeding point width W 10mm-300mm more than 3, and metal cap thickness D1 scope is 0.5mm-10mm.

At interval some baffle plates 30 are set on this metal cap 20, these baffle length L2 is suitable with metal cap width W 1, and shield portions through hole 22 flows directly into bleeding point 50 in order to barrier gas, thereby regulates the distribution of air-flow.Metal cap 20 is provided with regulating mechanism 60, can moving stop 30 through this regulating mechanism 60, thus the spacing of controllable register 30.The spacing range of baffle plate 30 is 10 mm-400mm, and the width of baffle plate designs as required.

This body 10 is provided with inlet pipe 40 with bleeding point 50 relative sides.The quantity of this inlet pipe 40 can be one or more, and is roughly parallel with montant 142.This inlet pipe 40 is offered some pin holes 42 at interval, and gas flows out from these pin holes 42, uniformly at containing cavity 12 internal diffusion.

Be provided with metal targets (figure does not show) in containing cavity 12 bottoms of body 10, this target can be titanium (Ti), chromium (Cr), nickel (Ni), zinc (Zr), aluminium (Al), titanium aluminide (TiAl).This target 70 is connected with power supply, is negative voltage during work.This embodiment target 70 is arranged on metal cap 20 2 sides.

During use, each workpiece is hung on the support 144 and along with pivoted frame 14 rotates, the air of containing cavity 12 extracted out, form Vakuumkammer.Inlet pipe 40 feeds argon gas (Ar), under the power supply effect, produces direct current glow discharge, and Ar is ionized into Ar ⁺, form plasma body.Target 70 is a negative voltage, under electric field action, and Ar ⁺Be accelerated and obtain very that high-energy removes to bombard target 70, sputter goes out target 70 atoms, and target 70 atoms fly to workpiece surface deposition film forming.Therebetween; Position and spacing through bleeding regulating mouth 50 metal caps 20 overhead gages 30 are come accurately control air-flow distribution; Both realized whole stove high uniformity plated film, and can slow down fast degree ﹐ that film-coating workpiece heating heat propagates to bleeding point 50 again and reduce heat loss ﹐ and reduced energy consumption.

In order to adjust the color of plated film, when feeding argon gas, can be mingled with among nitrogen (N2), acetylene (C2H2), methane (CH4), oxygen (O2), the hydrogen (H2) one or more.

The pivoted frame 14 of this embodiment is made by electro-conductive material, and is connected with power supply, thereby makes the workpiece that hang over above the support 144 form negative pressure, helps adsorbing target 70 atoms.

The shape and the structure that are appreciated that pivoted frame 14 can be adjusted as required, can change like interval, the quantity of montant 142 and support 144.

Claims

1. a splitter is applied to vacuum splashing and plating equipment, it is characterized in that: this splitter comprises body and the metal cap of being located at body, and this body is offered bleeding point, and this metal cap covers this bleeding point; This metal cap is offered some through holes and is passed through by gas; At interval some baffle plates are set on this metal cap, the said through hole of these baffle plate shield portions is with the gas of adjustment entering bleeding point.

2. splitter as claimed in claim 1 is characterized in that: this metal cap is provided with regulating mechanism, and this baffle plate is adjusted at the position of this metal cap through this regulating mechanism.

3. splitter as claimed in claim 2 is characterized in that: the diameter range of this through hole is 0.5mm-50mm, and hole width between centers scope is 2mm-50mm.

4. splitter as claimed in claim 3 is characterized in that: the width of this metal cap is than the wide 10mm-300mm of bleeding point, and the thickness range of metal cap is 0.5mm-10mm.

5. like each described splitter of claim 1 to 4, it is characterized in that: this body surrounds a containing cavity, in this containing cavity pivoted frame is set.

6. splitter as claimed in claim 5 is characterized in that: this containing cavity is provided with inlet pipe between this body and pivoted frame, and this inlet pipe is offered some pin holes at interval.

7. splitter as claimed in claim 6 is characterized in that: this pivoted frame comprises the montant that is provided with at interval, and every montant is provided with some supports.

8. splitter as claimed in claim 5 is characterized in that: this pivoted frame is processed by conductive material, and this pivoted frame is connected with power supply, forms negative voltage.

9. splitter as claimed in claim 1 is characterized in that: this body is positioned at metal cap two sides and is provided with target.