CN103107057A - Air guide electrode plate - Google Patents
Air guide electrode plate Download PDFInfo
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- CN103107057A CN103107057A CN2011104062412A CN201110406241A CN103107057A CN 103107057 A CN103107057 A CN 103107057A CN 2011104062412 A CN2011104062412 A CN 2011104062412A CN 201110406241 A CN201110406241 A CN 201110406241A CN 103107057 A CN103107057 A CN 103107057A
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- Prior art keywords
- conducting material
- air guide
- lead plate
- battery lead
- several micropores
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- 239000004020 conductor Substances 0.000 claims abstract description 53
- 238000009826 distribution Methods 0.000 claims abstract description 16
- 239000011241 protective layer Substances 0.000 claims description 13
- 239000004411 aluminium Substances 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- 239000004642 Polyimide Substances 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 claims description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- -1 polytetrafluoroethylene Polymers 0.000 claims description 4
- 229910000838 Al alloy Inorganic materials 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- 150000001336 alkenes Chemical class 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 229910052594 sapphire Inorganic materials 0.000 claims description 3
- 239000010980 sapphire Substances 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 239000002689 soil Substances 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 23
- 238000005452 bending Methods 0.000 abstract 1
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 42
- 230000005611 electricity Effects 0.000 description 36
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- 230000008021 deposition Effects 0.000 description 9
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- 239000006185 dispersion Substances 0.000 description 6
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000003574 free electron Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
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- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229920002472 Starch Polymers 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
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- 125000004429 atom Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
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- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
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- 239000013081 microcrystal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
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- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
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- 238000004513 sizing Methods 0.000 description 1
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- 238000000427 thin-film deposition Methods 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Abstract
The invention discloses an air guide electrode plate, which comprises: a conducting material having a conducting part; and a plurality of micropores penetrating through the conductive material, wherein the distribution of the micropores in the conductive material conforms to the following relation: 0.35 ≧ AoA ≧ 0.045, wherein AoThe total area of the plurality of micro holes is A, and A is the area of the conducting material. The gas guide electrode plate can uniformly disperse gas between the electrodes and simultaneously maintain the potential uniformity on the electrodes so as to ensure the uniformity of plasma generation and achieve the effect of improving the yield of deposited films. The gas guide electrode plate can effectively reduce the phenomenon of ion excessive bombardment in plasma, so as to stabilize the bending degree of the deposited film and achieve the effect of producing a high-quality film.
Description
Technical field
The present invention is relevant for a kind of battery lead plate, particularly a kind of air guide battery lead plate with air guide and even Potential distribution.
Background technology
Tradition is that electric sizing process (such as electricity slurry assistant chemical vapor coating, electricity slurry assisted etch or electricity slurry macromolecule etc.) is widely used in various industry, such as membrane transistor display factory, solar energy factory or wafer factory etc.
Take solar energy factory deposition micro crystal silicon matter film as example, it is to select to starch enhanced chemical vapor deposition (plasma enhaced chemical vapor deposition by electricity, PECVD) device, and pass into hydrogen and silane mixture gas in this device, with deposition micro crystal silicon matter film.Before this, first pass into radio-frequency current and make the required electric field of generation reaction between upper and lower electrode, the electricity slurry that passes into the electronic impact of being scattered by electric field (for example: argon gas) generates gas, and destroy this gas atom or intermolecular bond and form electricity slurry attitude, can make free electron in electricity slurry clash into the gas molecule that this hydrogen and silane mix, and this mist molecule of ionization gradually forms the siliceous film of crystallite with deposition.
Along with the continuous lifting of industry production capacity and quality requirements, must improve electricity slurry intermediate ion because of the effect of electric field linear accelerating, excessively bombard substrate for film deposition and produce ion, the film that causes being deposited on substrate warpage occurs and spends large phenomenon.More in response to the increase gradually of substrate for film deposition size, certainly will for speed and the quality of accelerating deposit film, starch and relatively must promote electricity speed and the uniformity that generates.
Tradition is to improve the frequency of operation of upper and lower electrode by the higher radio-frequency power of input, to promote the electric field strength that is produced between upper and lower electrode, making the electricity slurry generate gas can dissociate in electric field fast, reaches the purpose that improves the gas dissociation yield and generate fast electricity slurry attitude.
Yet, more than the frequency of operation of this upper and lower electrode progressively is promoted to normal running frequency 13.56 MHz, even up to VHF(30 ~ 100 MHz) time, shorten gradually because exporting electromagnetic wavelength, and easily produce standing wave effect (standing wave effect) in electrode surface, force the electromagnetic wave that transmits on this electrode because of its phase change, and cause electric field to produce undulating movement; Even, therefore cause upper and lower interelectrode Electric Field Distribution uneven, and cause the voltage instability of upper and lower electrode, the distributing homogeneity that relative effect electricity slurry generates, make post-depositional film probably produce the situation that thickness differs, seriously reduce quality and the efficient of deposit film.
Please refer to shown in Figure 1, as TaiWan, China bulletin M342906 Patent Case, it discloses a kind of electrode 9 that uniform electric field distributes that has, comprise an electrode slice 91, and the corresponding perturbation slotted eye 92 that is etched in this electrode slice 91 4 limits, to be controlled the electric-field intensity distribution on this electrode slice 91 edges by this perturbation slotted eye 92, promote whereby the uniformity that the electricity slurry generates.
Though should existing electrode 9 can avoid as above-mentioned because the high frequency effect produces standing wave effect, and have the effect that the stable electrical slurry generates the uniformity.But this existing electrode 9 but can't resolve electricity slurry intermediate ion all the time because of the effect of electric field linear accelerating, excessively bombards substrate for film deposition and produce ion, and the film that causes being deposited on substrate warpage occurs and spends large phenomenon, makes post-depositional membrane quality cause anxiety.
In addition, if in the time of should having electrode 9 now and be applied to above-mentioned any electricity slurry generating apparatus, necessary another collocation simultaneously one gas dispersion plate, after generating the electricity slurry in this electrode 9, pass into the gas of wanting deposit film from this gas dispersion plate, gas uniform is scattered in the electric field that this electrode 9 generates, completes free electron and clash into and cause gas ionization, with the operation of deposit film.
So, not only need expend extra cost and time to install this gas dispersion plate additional, more be subject to this gas dispersion plate required space is set, and cause this existing electrode 9 only can be applicable to large-scale electricity slurry generating apparatus, the application that relative reduce should existing electrode 9.Even, in the time of should having electrode 9 for small electrical slurry generating apparatus now, although wanting the gas of deposit film can pass between electrode slice 91 via several perturbation slotted eyes 92, but a factor perturbation slotted eye 92 is arranged at the characteristic of side all the time, and can't thoroughly reach the effect that gas uniform disperses, more may therefore cause gas ionization incomplete, and have a strong impact on the quality of film forming.
In view of this, really be necessary to develop a kind of supplied gas directly by interspersing among the air guide battery lead plate in electric field, and have simultaneously the even distribution of current potential in this air guide battery lead plate, to solve variety of issue as above.
Summary of the invention
Main purpose of the present invention is to improve above-mentioned purpose, and so that a kind of air guide battery lead plate to be provided, it can supplied gas be dispersed evenly between electrode, and keeps simultaneously the electric potential uniform on electrode, to guarantee the uniformity that the electricity slurry generates and the yield that promotes deposit film.
The present invention's time purpose is to provide a kind of air guide battery lead plate, can effectively reduce the excessively phenomenon of bombardment of electricity slurry intermediate ion, with the film-folding curvature after stably depositing, and the output high quality thin film.
For reaching aforementioned goal of the invention, air guide battery lead plate of the present invention comprises: a conducting material has a junction; And several micropores, run through this conducting material, and these several micropores meet following pass formula: 0.35＞=A in the distribution of this conducting material
o/ A＞=0.045, wherein, A
oBe the ventilative area summation of these several micropores, A is the area of this conducting material.
Wherein, these several micropores are all circular hole, and it is wide to have an identical footpath, the ventilative area summation A of these several micropores
oBe (R * π * ψ
2)/4, wherein R is the quantity of these several micropores, ψ is that the footpath of these several micropores is wide.
Conducting material of the present invention forms a first surface and a second surface, and can also separately be provided with a protective layer in this first surface and second surface, and these several micropores run through described each protective layer, and described each is protective layer used with the opposing corrosive gas.Wherein, described each protective layer selects the oxide of free yittrium oxide, alkene great soil group element or the formed film of one that polyimides is resin.
Wherein, respectively the footpath of this micropore is wide is 0.5 ~ 1 millimeter.And during as a datum line, these several micropores can be symmetrical or asymmetrical distributional pattern according to this datum line take the long limit center line of this conducting material, particularly can be radially, the distributional pattern of concentric circles or matrix form.
Wherein, this conducting material is selected from the one of aluminium, aluminium alloy, stainless steel, oxygen-free copper, coating aluminium, silicon, quartz, carborundum, silicon nitride, sapphire, polyimides or polytetrafluoroethylene.And being shaped as of this conducting material is square, circular, hexagon or other polygon.
Beneficial effect of the present invention is: air guide battery lead plate of the present invention can supplied gas be dispersed evenly between electrode, and keeps simultaneously the electric potential uniform on electrode, and the uniformity to guarantee that the electricity slurry generates reaches the effect that promotes the deposit film yield.Air guide battery lead plate of the present invention can effectively reduce the excessively phenomenon of bombardment of electricity slurry intermediate ion, with the film-folding curvature after stably depositing, and reaches the effect of output high quality thin film.
Description of drawings
Fig. 1: the schematic perspective view of existing battery lead plate.
Fig. 2: the schematic perspective view of air guide battery lead plate of the present invention.
Fig. 3: the generalized section of air guide battery lead plate of the present invention.
Fig. 4 a ~ 4c: the distribution map of the different patterns of several micropores of air guide battery lead plate of the present invention.
Fig. 5: the application schematic diagram of air guide battery lead plate of the present invention.
Fig. 6: the potential fields distribution simulation analysis chart of air guide battery lead plate of the present invention.
Wherein:
(the present invention)
1 conducting material 11 junction 12 first surfaces
13 second surface 14 protective layer 2 micropores
3 electricity slurry case 31 chamber 32 air inlets
P1, P2 electric pole plate R radio-frequency current supply L datum line
9 electrode 91 electrode slice 92 perturbation slotted eyes.
Embodiment
For above-mentioned and other purpose of the present invention, feature and advantage can be become apparent, preferred embodiment of the present invention cited below particularly, and cooperation accompanying drawing are described in detail below:
Please refer to shown in Figure 2ly, it is a preferred embodiment of the present invention, and this air guide battery lead plate comprises a conducting material 1 and several micropores 2, and these several micropores 2 run through this conducting material 1.Whereby, can be changed by these several micropores 2 internal structure of this conducting material 1, produce standing wave effect to avoid inputting in this conducting material 1 because of high frequency, coordinate with reference to Fig. 2～Fig. 4, be specified in down.
This conducting material 1 can be selected by aluminium, aluminium alloy, stainless steel, oxygen-free copper, coating aluminium, silicon, quartz, carborundum, silicon nitride, sapphire, polyimides or polytetrafluoroethylene (polytetrafluoroethylene, the material of one tool conducting character such as PTFE) is to consist of as square, circular, hexagon or other polygonal plane tabular thing.
Referring again to shown in Figure 2, this conducting material 1 has a junction 11, this junction 11 is located at the perisporium of this conducting material 1, in order to connect a radio-frequency current (Radio Frequency, RF), and this junction 11 particularly can be selected to adopt monolateral or around the setting of shape, provide radio-frequency current in this conducting material 1 as main principle take stable, for those skilled in the art can understand easily, be preferably take around the junction 11(that is arranged at this conducting material 1 perisporium in detail as shown in Figure 2 in this) as preferred embodiment of the present invention.
Specifically; please continue with reference to shown in Figure 3; this conducting material 1 forms i.e. as shown in Figure 3 the upper surface of a first surface 12() and i.e. as shown in Figure 3 the lower surface of a second surface 13(); this first surface 12 and second surface 13 all are provided with a protective layer 14; this protective layer 14 is in order to resist corrosive gas; avoiding gas Long contact time electrode surface, and the useful life of reducing electrode because of gas attack.Wherein, this protective layer 14 can be selected to wait coating mode moulding one film by coating, and to be preferably the oxide or the polyimides that are chosen as yittrium oxide, alkene great soil group element be the corrosion resistant material such as resin.
Please coordinate with reference to Fig. 2 and shown in Figure 3; these several micropores 2 run through this conducting material 1; particularly be through to the second surface 13 of this conducting material 1 by first surface 12 moulding of this conducting material 1; especially when this first surface 12 and second surface 13 all are provided with this protective layer 14; run through simultaneously this protective layer 14, can pass through as better principle from these several micropores 2 with supplied gas.These several micropores 2 are in the distribution scenario that arranges of this conducting material 1, (namely these several micropores 2 are in the area summation of first surface 12 formed openings in first surface 12 or the formed ventilative area of second surface 13 to refer to especially these several micropores 2, area corresponding relation with conducting material 1 first surface 12, perhaps these several micropores 2 are in the area summation of the formed opening of second surface, area corresponding relation with conducting material 1 second surface 13), meet following relationship: 0.35＞=A
o/ A＞=0.045, wherein A
oBe the summation of the ventilative area of these several micropores 2, A is the area of this conducting material 1, refers to especially the first surface 12 of this conducting material 1 or the area of second surface 13.For example, these several micropores 2 are all circular hole, and have the wide ψ in identical footpath, and these several micropores 2 are in first surface 12 or the formed ventilative area summation A of second surface 13
oBe R * π * ψ
2/ 4, wherein R is the quantity of these several micropores 2, and the micropore 2 in response to the wide ψ of Different Diameter designs whereby, and has better micropore distributed quantity R, is used to present on this conducting material 1 area A several better micropore 2 distribution patterns.
It should be noted that, these several micropores 2 can be for symmetrical or asymmetrical distributional pattern (namely take the conducting material 1 long limit center line shown in Fig. 4 a ~ 4c as a datum line L, make these several micropores 2 be left and right symmetry or asymmetrical form according to this datum line L), on average intersperse among first surface 12 and the second surface 13 of this conducting material 1, and run through this conducting material 1, particularly can be radially, the distribution (seeing for details shown in Fig. 4 a ~ 4c) of concentric circles or matrix form, and to meet above-mentioned 0.35＞=A
oThe relational expression of/A＞=0.045 is main principle, and not only with form as restriction.Wherein, take the micropore 2 of circle as example, respectively the wide ψ in the footpath of this micropore 2 especially can be chosen as 0.5 ~ 1 millimeter, respectively this micropore 2 forms the path of a process gas circulation, one better uniform flow field can be provided in process cavity, in addition, after this conducting material 1 connects a radio-frequency current, can form thereon an even potential fields, and then form an even electric field of starching.
For example, the present embodiment is as conducting material 1 with long 425 millimeters (mm), the square type aluminium sheet of wide 425 millimeters, and to select to offer footpath wide in the first surface 12 of this conducting material 1 be several micropores 2 of 1 millimeter, making the ratio of first surface 12 areas of the ventilative area summation of these several micropores 2 and conducting material 1 is 0.12, these several micropores 2 more can be the first surface 12 that rectangular form on average intersperses among this conducting material 1 simultaneously, and be through to the second surface 13 of this conducting material 1, to complete the design of air guide battery lead plate of the present invention.As shown in Figure 6, it offers footpath wide for these several micropores 2 in first surface 12 is 1 millimeter, and the ratio of first surface 12 areas of the ventilative area summation of these several micropores 2 and conducting material 1 is 0.12 o'clock, the potential fields distribution simulation analysis result of gained.
Air guide battery lead plate of the present invention is preferably and can be applied to aumospheric pressure cvd (APCVD), low-pressure chemical vapor deposition (LPCVD), high density plasma enhanced chemical vapor deposition (HDPCVD), electricity with systems such as assistant chemical vapor deposition (PECVD), induction coupled plasma ion(ic) etchings (ICP), controls whereby various chemical gas-phase deposition systems or electric paste etching system and generates density and uniformity in the electricity slurry of operating process.
Please refer to shown in Figure 5, it is selected take plasma enhanced chemical vapor deposition apparatus as example, air guide battery lead plate of the present invention is installed in the chamber 31 of an electricity slurry case 3, with the top electrode (the battery lead plate P1 that namely refers to Fig. 5 drawing top) as this plasma enhanced chemical vapor deposition apparatus, and separately be provided with a bottom electrode (the battery lead plate P2 that namely refers to Fig. 5 drawing below) with respect to this top electrode, this upper and lower electrode is connected to all respectively a radio-frequency current supply R, to this upper and lower electrode, and the better frequency of operation of controlling this radio-frequency current is 1KHz ~ 100MHz with the output radio-frequency current.
so, when radio-frequency current circulates in this top electrode, several micropores 2 that on average scatter because of this top electrode design, advance and hinder electromagnetic wave the possibility that standing wave effect occurs, therefore can be on this, produce the required uniform electric field of reaction between bottom electrode, and make on this, has uniform Potential distribution between bottom electrode, (for example: argon gas generate gas when passing into an electricity slurry, nitrogen, hydrogen etc.) in this chamber 31, when should the electricity slurry by the electronic impact that exists in this electric field generating gas, can destroy this electricity slurry generation gas atom or intermolecular bond comprehensively and produce fast the effect of dissociating, with on this, generate the electricity slurry attitude gas with equal distribution density between bottom electrode.Then, for a film forming gas (such as: silane, disilane, trisilalkane etc.) import this chamber 31 when interior from an air inlet 32, particularly several micropores 2 by this top electrode directly make this film forming gas pass into this chamber 31, and can be dispersed evenly between this upper and lower electrode, and bombard this film forming gas by the free electron of uniformly dispersing in the electricity slurry, and this film forming gas of ionization gradually, to form the operation of thin film depositions in substrate for film deposition 33 surfaces.
In sum, the principal character of air guide battery lead plate of the present invention is: utilize these several micropores 2 to scatter and run through the design of this conducting material 1, can change the internal structure of this conducting material 1, and when high-frequency current passes through this conducting material 1, not only can reduce the current potential of electricity slurry sheath layer (Plasma sheath), avoid electricity slurry intermediate ion because of the effect of electric field linear accelerating, and produce the phenomenon that ion excessively bombards substrate for film deposition, make the film-folding curvature that is deposited on substrate be maintained at better scope; Even, the standing wave effect that more can avoid the shortwave electromagnetic wave because of high-frequency current output to produce, and the electric field that may cause between the reduction electrode rises and falls or change, relatively improve interelectrode voltage, Potential distribution uniformity, generate the uniformity with the electricity slurry of stablizing operation, reach and keep the film thickness homogeneity and promote into film quality and the effect of efficient.
In addition, in follow-up when passing into film forming gas, film forming gas is dispersed evenly between electrode by these several micropores 2, not only need not to expend extra cost and time installs this gas dispersion plate additional, more can not be subject to this gas dispersion plate required space is set, and can effectively promote application of the present invention; Even, the design by several micropores 2 thoroughly reaches the homodisperse effect of film forming gas, under the bombardment with free electron in the electricity slurry, reaches the effect of comprehensive ionization film forming gas, and the film of output higher quality.
Air guide battery lead plate of the present invention can supplied gas be dispersed evenly between electrode, and keeps simultaneously the electric potential uniform on electrode, and the uniformity to guarantee that the electricity slurry generates reaches the effect that promotes the deposit film rate of finished products.
Air guide battery lead plate of the present invention can effectively reduce the excessively phenomenon of bombardment of electricity slurry intermediate ion, with the film-folding curvature after stably depositing, and reaches the effect of output high quality thin film.
But the above person is only preferred embodiment of the present invention, when not limiting the scope of the present invention with this; Therefore all simple equivalences of doing according to the present patent application the scope of the claims and creation description change and modify, and all should still remain within the scope of the patent.
Claims (9)
1. an air guide battery lead plate, is characterized in that, comprises:
A conducting material has a junction; And
Several micropores run through this conducting material, and described several micropores meet following relationship in the distribution of this conducting material:
0.35≧A
o/A≧0.045
Wherein, A
oBe the ventilative area summation of these several micropores, A is the area of this conducting material.
2. air guide battery lead plate as claimed in claim 1; it is characterized in that; this conducting material forms a first surface and a second surface, and this first surface and second surface all are provided with one deck in order to resisting the protective layer of corrosive gas, and these several micropores run through described each protective layer.
3. air guide battery lead plate as claimed in claim 2, is characterized in that, described each protective layer is selected by the oxide of yittrium oxide, alkene great soil group element or the formed film of one that polyimides is resin.
4. air guide battery lead plate as claimed in claim 1 or 2, is characterized in that, respectively the footpath of this micropore is wide is 0.5 ~ 1 millimeter.
5. air guide battery lead plate as claimed in claim 1 or 2, is characterized in that, described several micropores are all circular hole, and it is wide to have an identical footpath, the ventilative area summation A of these several micropores
oBe (R * π * ψ
2)/4, wherein R is the quantity of these several micropores, ψ is that the footpath of these several micropores is wide.
6. air guide battery lead plate as claimed in claim 1 or 2, is characterized in that, the long limit center line of this conducting material is a datum line, and these several micropores are symmetrical or asymmetrical distributional pattern according to this datum line.
7. air guide battery lead plate as claimed in claim 1 or 2, is characterized in that, described several micropores radially, the distributional pattern of concentric circles or matrix form.
8. air guide battery lead plate as claimed in claim 1, is characterized in that, the one of this conducting material aluminium, aluminium alloy, stainless steel, oxygen-free copper, coating aluminium, silicon, quartz, carborundum, silicon nitride, sapphire, polyimides or polytetrafluoroethylene.
9. air guide battery lead plate as claimed in claim 1 or 2, is characterized in that, this junction is located at the perisporium of this conducting material, in order to connect radio-frequency current.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100141473A TWI525887B (en) | 2011-11-14 | 2011-11-14 | Air-guiding electrode plate |
| TW100141473 | 2011-11-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103107057A true CN103107057A (en) | 2013-05-15 |
| CN103107057B CN103107057B (en) | 2016-02-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110406241.2A Active CN103107057B (en) | 2011-11-14 | 2011-12-08 | Air guide electrode plate |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103107057B (en) |
| TW (1) | TWI525887B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019000490A1 (en) * | 2017-06-28 | 2019-01-03 | 武汉华星光电技术有限公司 | Vapor deposition device |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI659450B (en) * | 2014-12-26 | 2019-05-11 | 日商Ａ Ｓａｔ股份有限公司 | Plasma etching device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5052339A (en) * | 1990-10-16 | 1991-10-01 | Air Products And Chemicals, Inc. | Radio frequency plasma enhanced chemical vapor deposition process and reactor |
| WO1999028533A1 (en) * | 1997-12-01 | 1999-06-10 | Applied Materials, Inc. | Mixed frequency cvd process and apparatus |
| CN101307437A (en) * | 2008-06-19 | 2008-11-19 | 东莞宏威数码机械有限公司 | Radio frequency electrode and film preparing device |
| CN201341268Y (en) * | 2008-07-07 | 2009-11-04 | 朗姆研究公司 | Nozzle electrode |
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- 2011-11-14 TW TW100141473A patent/TWI525887B/en active
- 2011-12-08 CN CN201110406241.2A patent/CN103107057B/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5052339A (en) * | 1990-10-16 | 1991-10-01 | Air Products And Chemicals, Inc. | Radio frequency plasma enhanced chemical vapor deposition process and reactor |
| WO1999028533A1 (en) * | 1997-12-01 | 1999-06-10 | Applied Materials, Inc. | Mixed frequency cvd process and apparatus |
| CN101307437A (en) * | 2008-06-19 | 2008-11-19 | 东莞宏威数码机械有限公司 | Radio frequency electrode and film preparing device |
| CN201341268Y (en) * | 2008-07-07 | 2009-11-04 | 朗姆研究公司 | Nozzle electrode |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2019000490A1 (en) * | 2017-06-28 | 2019-01-03 | 武汉华星光电技术有限公司 | Vapor deposition device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI525887B (en) | 2016-03-11 |
| TW201320448A (en) | 2013-05-16 |
| CN103107057B (en) | 2016-02-10 |
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