CN103279012A - Novel etched wafer continuous exposing machine and process thereof - Google Patents
Novel etched wafer continuous exposing machine and process thereof Download PDFInfo
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- CN103279012A CN103279012A CN2013100992680A CN201310099268A CN103279012A CN 103279012 A CN103279012 A CN 103279012A CN 2013100992680 A CN2013100992680 A CN 2013100992680A CN 201310099268 A CN201310099268 A CN 201310099268A CN 103279012 A CN103279012 A CN 103279012A
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Abstract
The invention discloses a novel etched wafer continuous exposing machine. The novel etched wafer continuous exposing machine comprises an upper frame and a lower frame, a space between the upper frame and the lower frame forms an exposing area, supporting plates are arranged below two sides of the upper frame and the lower frame respectively, a roller is arranged between the two supporting plates, the roller is positioned at one side of the exposing area, a fixed transmission pulley is arranged between the roller and the exposing area, and the fixed transmission pulley is utilized to send a product on the roller to the exposing area for product exposure. The novel etched wafer continuous exposing machine effectively increases the continuity of the exposing machine in the production process, reduces the material transportation time during processing, has a simple structure, and is greatly convenient for the use of people.
Description
Technical field
The present invention relates to field of semiconductor manufacture, relate in particular to a kind of novel etch slide continuous exposure machine and process thereof.
Background technology
As everyone knows, exposure machine refers to the image information on film or other transparent bodies be transferred to the lip-deep equipment that scribbles photoactive substance by opening the ultraviolet ray that light sends the UVA wavelength.In the process to the product exposure, be to use single face to expose in the past.Along with constantly bringing forth new ideas of world's microelectric technique, the demand of some particular device such as sensor, bidirectional triode thyristor, power rectifier device grows with each passing day, the semiconductor manufacturing needs more and more with the manufacturing process of special photoetching method as power semiconductor device, so the special status of double-sided alignment exposure machine is more and more outstanding.
But existing double-sided exposure machine is in the process of exposing, at first product is placed on the processing platform and is covered on the surface of product of will exposing by mask plate, by light source mask plate is shone afterwards, the throwing of pattern in the mask plate is imprinted on product surface, take out product afterwards and put into next processed product again, the operation of segmentation not only brings many inconveniences in processing like this, has influenced the efficient of producing simultaneously.
Summary of the invention
The invention discloses a kind of novel etch slide continuous exposure machine, in order to solve prior art exposure machine not high problem of efficient in the process of work.
For achieving the above object, the technical solution used in the present invention is:
A kind of novel etch slide continuous exposure machine, wherein, comprise: appear on the stage frame and leave from office frame, the described frame of appearing on the stage is located at described leave from office frame top, described space of appearing on the stage between frame and the described leave from office frame forms the exposure area, described frame and the leave from office frame of appearing on the stage is rectangle, described leave from office frame downside drift angle place is equipped with a little cylinder, described upper ledge platform downside drift angle place is equipped with a big cylinder, described frame and the leave from office frame down either side of appearing on the stage is equipped with a back up pad, described little cylinder and described big cylinder all are connected in described support plate top surface, the length of each described back up pad is longer than the length of described appear on the stage frame and described leave from office frame, be provided with a roller bearing between the two described back up pads, and described roller bearing is positioned at a side of exposure area, is provided with the fixing pulley that transmits between described roller bearing and the described exposure area.
Above-mentioned novel etch slide continuous exposure machine, wherein, the outside that each described support plate top surface is positioned at described big cylinder respectively is provided with lamp sliding rail rack on, and two described going up between the lamp sliding rail rack are provided with lamp slide rail on.
Above-mentioned novel etch slide continuous exposure machine, wherein, the described lamp slide rail downside of going up is provided with light-emitting component.
Above-mentioned novel etch slide continuous exposure machine wherein, is provided with lamp slide rail between the two described back up pads and below being positioned at described leave from office frame.
Above-mentioned novel etch slide continuous exposure machine, wherein, described lamp slide rail down top is provided with light-emitting component.
Above-mentioned novel etch slide continuous exposure machine, wherein, described support plate top surface is notch cuttype, described support plate top surface by height to be followed successively by down little cylinder, big cylinder and on the lamp sliding rail rack.
The process of above-mentioned novel etch slide continuous exposure machine wherein, comprises following processing step:
Step 3 utilizes stingy cylinder control leave from office frame downward, and cylinder control is appeared on the stage frame upwards greatly, and the product that the fixing transmission pulley that rolls spreads out of is sent in the exposure area;
The process of above-mentioned novel etch slide continuous exposure machine, wherein, when stingy cylinder control leave from office frame upwards, the big cylinder control frame of appearing on the stage is downward, fixing transmission pulley stops operating when carrying out product clamped.
The product of required exposure is set in outside the described roller bearing, one end of product is inserted the fixing pulley that transmits, utilize the fixing driving force that transmits pulley that product is sent into the described exposure area between frame and the described leave from office frame of appearing on the stage, afterwards by stingy cylinder control leave from office frame, big cylinder is controlled the frame of appearing on the stage and is clamped the product of sending into the exposure area, and by last light-emitting component and down light-emitting component the product in the exposure area is carried out double-sided exposure, after finishing post-exposure, control by little cylinder and big cylinder separates leave from office frame and the frame of appearing on the stage, the transmission of fixing transmission pulley transmits the product on the roller bearing in the exposure area, the product that processed is simultaneously ejected by the follow-up product of sending into to exposure, after product was sent the exposure area fully after the exposure, the product that then begins to carry out sending in the exposure area exposed.
A kind of novel etch slide continuous exposure machine of the present invention has adopted the following effect that has of as above scheme, the time of transporting material when improving exposure machine effectively continuity reducing processing in process of production.
Description of drawings
By the detailed description that reading is done non-limiting example with reference to following accompanying drawing, the further feature of invention, it is more obvious that purpose and advantage will become.
Fig. 1 is the synoptic diagram of a kind of novel etch slide continuous exposure machine of the present invention;
Fig. 2 is the synoptic diagram of overlooking the exposure area of a kind of novel etch slide continuous exposure machine of the present invention;
Fig. 3 is the fixing synoptic diagram that transmits pulley in a kind of novel etch slide continuous exposure machine of the present invention;
Fig. 4 is the schematic flow sheet of a kind of novel etch slide continuous exposure machine process of the present invention.
As scheme reference: the frame 1 of appearing on the stage, leave from office frame 2, stingy cylinder 3, big cylinder 4, back up pad 5, roller bearing 6, fixingly transmit pulley 7, go up lamp sliding rail rack 8, go up lamp slide rail 81, go up light-emitting component 811, lamp slide rail 9, light-emitting component 911 down down.
Embodiment
For technological means that invention is realized, create feature, reach purpose and effect is easy to understand, following to specifically illustrating, further set forth the present invention.
Fig. 1 is a kind of novel etch slide continuous exposure machine of invention.As shown in Figure 1, a kind of novel etch slide continuous exposure machine, wherein, comprise: appear on the stage frame 1 and leave from office frame 2, the frame 1 of appearing on the stage is located at leave from office frame 2 tops, the space of appearing on the stage between frame 1 and the leave from office frame 2 forms the exposure area, this exposure area (among the figure not explicit identification) is used for the exposure to product, the frame 1 of appearing on the stage is rectangle with leave from office frame 2, leave from office frame 2 downside drift angle places are equipped with a stingy cylinder 3, upper ledge platform 1 downside drift angle place is equipped with a big cylinder 4, and the frame 1 of appearing on the stage is equipped with a back up pad 5 with leave from office frame 2 down either side, and stingy cylinder 3 all is connected in back up pad 5 end faces with big cylinder 4, the length of each back up pad 5 is longer than the length of appear on the stage frame 1 and leave from office frame 2, be provided with a roller bearing 6 between two back up pads 5, and roller bearing 6 is positioned at a side of exposure area, is provided with the fixing pulley 7 that transmits between roller bearing 6 and the described exposure area.
Above-mentioned novel etch slide continuous exposure machine, wherein, the outside that each back up pad 5 end face is positioned at big cylinder 4 respectively is provided with and is provided with lamp slide rail 81 on one on the lamp sliding rail rack 8, two between the lamp sliding rail rack 8.
In specific embodiments of the invention, last lamp slide rail 81 downsides are provided with light-emitting component 811, and last light-emitting component 811 can carry out slide displacement at last lamp slide rail 81.
In specific embodiments of the invention, between two back up pads 5 and be positioned at leave from office frame 2 belows and be provided with lamp slide rail 9.
In specific embodiments of the invention, following lamp slide rail 9 tops are provided with light-emitting component 911, and following light-emitting component 911 can be in lamp slide rail 9 enterprising line slip displacements down.
In specific embodiments of the invention, back up pad 5 end faces are notch cuttype, back up pad 5 end faces by height to be followed successively by down stingy cylinder 3, big cylinder 4 and on lamp sliding rail rack 8.
In process embodiment of the present invention, the product of required exposure is set in outside the roller bearing 6, one end of product is inserted the fixing pulley 7 that transmits, utilize the fixing driving force that transmits pulley 7 that product is sent into the exposure area between frame 1 and the leave from office frame 2 of appearing on the stage, afterwards by stingy cylinder 3 control leave from office frames 2, big cylinder 4 is controlled the frame 1 of appearing on the stage and is clamped the product of sending into the exposure area, and by last light-emitting component 811 and down the product in 911 pairs of exposure areas of light-emitting component carry out double-sided exposure, after finishing post-exposure, control by stingy cylinder 3 and big cylinder 4 separates leave from office frame 2 and the frame 1 of appearing on the stage, 7 transmissions of fixing transmission pulley transmit the product on the roller bearing 6 in the exposure area, the product that processed is simultaneously ejected by the follow-up product of sending into to exposure, after product was sent the exposure area fully after the exposure, the product that then begins to carry out sending in the exposure area exposed.
In sum, a kind of novel etch slide continuous exposure machine of the present invention, the time of transporting material when improving exposure machine effectively continuity reducing processing in process of production, it is simple in structure, brings greater convenience for people's use.
More than to the invention specific embodiment be described.It will be appreciated that invention is not limited to above-mentioned specific implementations, wherein the equipment of not describing in detail to the greatest extent and structure are construed as with the common mode in this area and are implemented; Those skilled in the art can make various distortion or modification within the scope of the claims, and this does not influence the essence of an invention content.
Claims (8)
1. novel etch slide continuous exposure machine, it is characterized in that, comprise: appear on the stage frame and leave from office frame, the described frame of appearing on the stage is located at described leave from office frame top, described space of appearing on the stage between frame and the described leave from office frame forms the exposure area, described frame and the leave from office frame of appearing on the stage is rectangle, described leave from office frame downside drift angle place is equipped with a little cylinder, described upper ledge platform downside drift angle place is equipped with a big cylinder, described frame and the leave from office frame down either side of appearing on the stage is equipped with a back up pad, described little cylinder and described big cylinder all are connected in described support plate top surface, the length of each described back up pad is longer than the length of described appear on the stage frame and described leave from office frame, be provided with a roller bearing between the two described back up pads, and described roller bearing is positioned at a side of exposure area, is provided with the fixing pulley that transmits between described roller bearing and the described exposure area.
2. novel etch slide continuous exposure machine according to claim 1 is characterized in that, the outside that each described support plate top surface is positioned at described big cylinder respectively is provided with lamp sliding rail rack on, and two described going up between the lamp sliding rail rack are provided with lamp slide rail on.
3. novel etch slide continuous exposure machine according to claim 2 is characterized in that, the described lamp slide rail downside of going up is provided with light-emitting component.
4. novel etch slide continuous exposure machine according to claim 1 is characterized in that, is provided with lamp slide rail between the two described back up pads and below being positioned at described leave from office frame.
5. novel etch slide continuous exposure machine according to claim 4 is characterized in that, described lamp slide rail down top is provided with light-emitting component.
6. novel etch slide continuous exposure machine according to claim 1 is characterized in that described support plate top surface is notch cuttype, described support plate top surface by height to be followed successively by down little cylinder, big cylinder and on the lamp sliding rail rack.
7. a novel etch slide continuous exposure machine and using method thereof is characterized in that, comprise following processing step:
Step 1 is installed the product that need expose at roller bearing;
Step 2, the fixing pulley that transmits that rolls inserts fixing the transmission in the pulley with product one end;
Step 3 utilizes stingy cylinder control leave from office frame downward, and cylinder control is appeared on the stage frame upwards greatly, and the product that the fixing transmission pulley that rolls spreads out of is sent in the exposure area;
Step 4 is utilized stingy cylinder control leave from office frame upwards, and the big cylinder control frame of appearing on the stage is downward, clamps product by described frame and the leave from office frame of appearing on the stage, and exposes;
Step 5 is finished exposure to product, utilizes stingy cylinder control leave from office frame downward, and big cylinder control is appeared on the stage frame upwards, and the product that has exposed is sent the exposure area.
8. the process of novel etch slide continuous exposure machine according to claim 7 is characterized in that, when stingy cylinder control leave from office frame upwards, the big cylinder control frame of appearing on the stage is downward, fixing transmission pulley stops operating when carrying out product clamped.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013100992680A CN103279012A (en) | 2013-03-26 | 2013-03-26 | Novel etched wafer continuous exposing machine and process thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013100992680A CN103279012A (en) | 2013-03-26 | 2013-03-26 | Novel etched wafer continuous exposing machine and process thereof |
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| CN103279012A true CN103279012A (en) | 2013-09-04 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2013100992680A Pending CN103279012A (en) | 2013-03-26 | 2013-03-26 | Novel etched wafer continuous exposing machine and process thereof |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01166037A (en) * | 1987-12-22 | 1989-06-29 | Mitsubishi Electric Corp | Exposure of printed wiring board |
| US5652645A (en) * | 1995-07-24 | 1997-07-29 | Anvik Corporation | High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates |
| CN1619421A (en) * | 2003-11-18 | 2005-05-25 | 株式会社阿迪泰克工程 | Exposure apparatus extendible corresponding to substrate for printed circuitboard |
| JP2005321713A (en) * | 2004-05-11 | 2005-11-17 | Pentax Corp | Lithography apparatus |
| CN203133475U (en) * | 2013-03-22 | 2013-08-14 | 宁波东盛集成电路元件有限公司 | Novel etching sheet continuous exposure machine |
-
2013
- 2013-03-26 CN CN2013100992680A patent/CN103279012A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01166037A (en) * | 1987-12-22 | 1989-06-29 | Mitsubishi Electric Corp | Exposure of printed wiring board |
| US5652645A (en) * | 1995-07-24 | 1997-07-29 | Anvik Corporation | High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates |
| CN1619421A (en) * | 2003-11-18 | 2005-05-25 | 株式会社阿迪泰克工程 | Exposure apparatus extendible corresponding to substrate for printed circuitboard |
| JP2005321713A (en) * | 2004-05-11 | 2005-11-17 | Pentax Corp | Lithography apparatus |
| CN203133475U (en) * | 2013-03-22 | 2013-08-14 | 宁波东盛集成电路元件有限公司 | Novel etching sheet continuous exposure machine |
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Application publication date: 20130904 |