CN103302835A - Shunting and multiplying device, shunting system, shunting method and multi-layer membrane structure - Google Patents
Shunting and multiplying device, shunting system, shunting method and multi-layer membrane structure Download PDFInfo
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- CN103302835A CN103302835A CN2012100675417A CN201210067541A CN103302835A CN 103302835 A CN103302835 A CN 103302835A CN 2012100675417 A CN2012100675417 A CN 2012100675417A CN 201210067541 A CN201210067541 A CN 201210067541A CN 103302835 A CN103302835 A CN 103302835A
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Abstract
The invention discloses a shunting and multiplying device with gradient thickness change, a shunting system, a shunting method and a multi-layer membrane structure produced by using the method. The shunting and multiplying device is a device integrating a shunting function and a multiplying function during the production of the multi-layer membrane structure. The shunting and multiplying device comprises a material feeding part for receiving an input material, and a shunting part capable of dividing the material into fluids in a plurality of flowing passageways; respective layers the materials are conveyed by the corresponding flowing passageways; the fluids in the flowing passageways are cut into two or more than two fluid sections by an inner cutting part respectively; the fluid sections are continuously conveyed in the device through flowing passageway conversion parts with the gradient thickness changes; each flowing passageway conversion part comprises a plurality of flowing passageways; the relative positions of the flowing passageways are set, so that the flowing passageways are combined on a multiplying part at the rear end of the device, and the structure formed by stacking a plurality of layers of materials is produced; the multi-layer membrane structure is output through an extrusion part.
Description
Technical field
The present invention relates to a kind of have shunting multiplying assembly, system, the method for thickness gradient variation and the multi-layer film structure of being made by this method, particularly a kind of in conjunction with shunting and multiplication effect, and the shunting multiplying assembly with design flexibility, and install the method for the multi-layer film structure made from this.
Background technology
Being used for optical system or the multi-layer film structure of special-purpose and forming by plural layers are superimposed, is the different film of physical characteristic (as refractive index) according to Demand Design between each layer.If be applied in the optical system, the light that the design of multilayer film can make certain wavelength section by or stop the light of specific wavelength, this type of optical element with multi-layer optical film can be formed by high molecular polymer.The multi-layer film structure of various uses utilizes the preparation method of a kind of coextrusion (co-extrsion) especially, schematic diagram as shown in Figure 1.
Be the general arrangement of a co-extrusion device shown in Fig. 1, material after material is sneaked into, earlier through a pre-process, comprises steps such as cleaning, oven dry (containing water management), decontamination respectively by in first charging aperture 100 and second charging aperture, 102 input units.Can carry out the shunting first time through first dividing cell 104 through the material after the pre-process, material is carried with different runners respectively, this example can be carried out the shunting second time through second dividing cell 110 again according to demand, material is mixed with having levels, and carry through a plurality of runners.
Afterwards, the fluid of a plurality of runners will be handled through multiplication units 106, and to produce the number of plies of many multiples, also can introduce surfacing charging aperture 108 again this moment, as the protective layer of each layer structure.Through after the multiplication units 106, original number of plies doubly can be increased to the number of plies of several times, extrude unit 111 compressions by multilayer afterwards, be delivered to die head (extrusion die, extrusion die) 112 outputs, the effect of die head 112 are to make the plastics temperature extruded and thickness comparatively even and produce the finished product of specific thicknesses and given shape.
Then be provided with a shaping unit 114, these semi-finished product for die head 112 output are used for the purposes of fine tuning structure and finished product thickness and guiding when carrying, and 116 on roller is smooth whole multi-layer film structure, and is delivered to platform.Extending roller set 118 can be by the design of extension mechanism, the multi-layer film structure material is carried out uniaxial extension, the extension of single shaft or twin shaft can imposed through tentering unit 120 afterwards, be aided with heating unit 122, with mode of heating heating multi-layer film structure, enable to carry out shape, separate stress according to design, and improve machinery or heating power and the optical property of material, taken in by collector unit 124 at last and be product.
The reality of the current divider in co-extrusion device (feedblock device) is made one of mode prior art schematic diagram as shown in Figure 2.Current divider 2 shown in it has a plurality of charging apertures 20,21,23,24, can import different materials respectively, as the macromolecule polymer material of liquid, inputs in the dividing cell 27 through charging aperture 20,21,23,24.Utilize the mechanism design in the dividing cell 27, feed zone is divided into sandwich construction, extrude afterwards by outlet 22 outputs.
The number of plies of the sandwich construction that the current divider of this prior art produces will multiply each other and decide to design runner (channel) number that separates in entrance number and the current divider of input.
Fig. 3 A, 3B then show the multiplier operation principles and device schematic diagram of prior art.
Fig. 3 A describes the operation principles of multiplier, wherein includes initial charge 301 for example, is cut into a plurality of (this example is 4) transport portion, cutting charging 303a as shown in FIG. through shunting, 303b, 303c, 303d, according to demand, can rearrange cutting charging 303a, 303b afterwards, 303c, the relative order of 303d, as shown in the figure, originally cut charging 303a, 303b, 303c, the order of 303d changes 303c into, 303a, 303d and 303b (from top to bottom).
According to superimposed each layer structure of order of design, can expand to icon than long structure afterwards, export the sandwich construction that forms as double charging 305, finally by extruding membrane stack formation multi-layer film structure 307.
Carry out the multiplier schematic diagram of one of the design prior art shown in Fig. 3 B of above-mentioned multiplication principle.
Multiplier may be located at after the shunting as shown in Figure 1, and the feed zone 31 of Fig. 3 B shows charging respectively by minute inflow entrance 311, in 312,313,314 accesss to plant, the material of each entrance is carried through different runners, conversion place 311 ', 312 ' that arrives as scheme to show, 313 ', 314 ', the relative position of runner can be changed according to design, when having arrived the position of multiplication outlet 32, except relative position changed, the number of plies doubly increased to four layers, at last output after compression.
In the prior art, when the super multilayer runner of the super multilayer current divider of disc inside itself does not have the graded of thickness or width or length equidimension, macromolecule is stable and even in the suffered back pressure of the internal flow of super multilayer current divider, be difficult for causing excessive flow velocity difference, the stability of each flow passage can be fine in theory, the multilayer film of producing is comparatively even in the varied in thickness of integral body, be not easy to produce defectives such as color spot and color lump, but has the super multilayer current divider that thickness gradient changes for reaching in the practical application, usually when making, just produces by super multilayer current divider the super multilayer runner with thickness or width or length variations, but because of mechanical dimensions such as runner thickness width or length variant, the mobile suffered back pressure of portion is also variant within it for macromolecule, so this causes super multilayer film excessive in the inner suffered differential back distance of runner, the instability of super multilayer runner when causing film extrusion, make that multilayer film thickness evenness quality is not good, cause color spot and the vitta line of multilayer film.
Summary of the invention
For the preparation method of effective and disposable generation multi-layer film structure is provided, the present invention proposes a kind of shunting multiplying assembly that thickness gradient changes that has, the function of the shunting in the multi-layer film structure technology and multiplication is combined in the shunting multiplying assembly, can be applicable in the coextrusion processes.
This shunting multiplying assembly mainly comprises a feeder that receives charging, just receives the position of material injection device, and the feeder injection material so far has the shunting multiplying assembly that thickness gradient changes thus.
Connect feeder, device includes a distributary division, makes the material of this multi-layer film structure and will divide into the fluid of a plurality of runners through this distributary division, and according to demand, distributary division is carried layers of material by corresponding runner.Fluid then is delivered to all branches of device, and cutting portion is arranged at the output of distributary division, when the fluid of a plurality of runners conveyings is delivered to cutting portion, is two or more fluid sections with cutting, and each fluid section includes the fluid through a plurality of runners of cutting.
Then, fluid is with the two or more runner converter section of the device of flowing through respectively, each runner converter section includes a plurality of a plurality of runners through cutting, afterwards in the combination of multiplication portion, a plurality of runners can be superimposed in multiplication portion, comprise the relative position of setting superimposed runner, output afterwards has the multi-layer film structure that multilayer material is formed by stacking, and the device rear end comprises the portion that extrudes of co-extrusion output multi-layer film structure.
Above-mentioned have shunting multiplying assembly that thickness gradient changes specifically, cutting portion can be two fluid sections with the fluid cutting of a plurality of runners, and two fluid sections have the runner of similar number, the tangent plane of cutting portion can be a nonlinear irregular tangent plane, as inclined-plane or curved surface, can cause the thickness gradient of multi-layer film structure to change in the rear end of device through two fluid sections of the irregular tangent plane institute cutting of this cutting portion.
The number of the runner converter section in the device also comprises having identical runner number a plurality of (as two) runner converter section according to the number of institute of cutting portion cutting, specifically, the thickness of a plurality of runners has graded in the runner converter section, and runner wherein has a specific phase to transfer position, and may change relative position when being incorporated into multiplication portion according to demand.
According to inventive embodiments, utilize the step of above-mentioned multilayer film formation method with shunting multiplying assembly that thickness gradient changes as follows:
The material of multi-layer film structure is made in input, carries material to the distributary division that has in the shunting multiplying assembly that thickness gradient changes again, and material is divided into the fluid of a plurality of runners through distributary division.Be two or more fluid sections with cutting portion according to the structure cutting of tangent plane then, each fluid section includes the fluid through a plurality of runners of cutting.
The runner converter section that two or more fluid sections is flowed through two or more respectively, the fluid of each runner will be incorporated into multiplication portion in the runner converter section, wherein the fluid of a plurality of runners can design according to demand and be converted to different relative transfer positions, last superimposed in multiplication portion, and through the portion's of extruding output, generation has the multi-layer film structure that multilayer material is formed by stacking.
The thickness of the above-mentioned a plurality of runners of runner converter section has graded, makes each layer of multi-layer film structure of final output have different thickness.
According to one of embodiment, the shunting multiplying assembly can be combined with another preposition current divider, forms a separate system, can produce more multi-layered multi-layer film structure.
The embodiment of the invention also comprises the multi-layer film structure of being made by above-mentioned preparation method.
Description of drawings
Fig. 1 is shown as prior art coextrusion processes device schematic diagram is set;
Figure 2 shows that the current divider schematic diagram of prior art;
Fig. 3 A is depicted as the multiplier operation principles schematic diagram of prior art;
Fig. 3 B is depicted as the multiplier schematic diagram of prior art;
Fig. 4 is shown as a multi-layer film structure schematic diagram;
Figure 5 shows that the shunting multiplying assembly schematic diagram that thickness gradient changes that has of the present invention;
Fig. 6 describes and utilizes the shunting multiplying assembly with thickness gradient variation of the present invention to make the program schematic diagram of multi-layer film structure;
Figure 7 shows that one of structure embodiment schematic diagram with shunting multiplying assembly that thickness gradient changes of the present invention;
Figure 8 shows that two of the structure embodiment schematic diagram with shunting multiplying assembly that thickness gradient changes of the present invention;
Figure 9 shows that three of the structure embodiment schematic diagram with shunting multiplying assembly that thickness gradient changes of the present invention;
Figure 10 shows that four of the structure embodiment schematic diagram with shunting multiplying assembly that thickness gradient changes of the present invention;
The embodiment schematic diagram of cutting when Figure 11 A, Figure 11 B, Figure 11 C, Figure 11 D are depicted as shunting;
The embodiment schematic diagram of cutting when Figure 12 A, Figure 12 B, Figure 12 C, Figure 12 D are depicted as shunting;
Figure 13 is described as coextrusion processes;
Flow process shown in Figure 14 is described the multilayer film formation method of utilizing shunting multiplying assembly of the present invention;
Figure 15 A, B, C are shown as and utilize the formed separate system schematic diagram of shunting multiplying assembly of the present invention;
Figure 16 A, 16B are shown as the schematic appearance of separate system of the present invention.
[main element symbol description]
First charging aperture, 100 second charging apertures 102
First dividing cell, 104 second dividing cell 110
Multiplication units 106 surfacing charging apertures 108
Multilayer is extruded unit 111 die heads 112
Shaping unit 114 rollers 116
Extend roller set 118 tentering unit 120
Heating unit 122 collector units 124
Export 22 dividing cell 27
Cutting charging 303a, 303b, 303c, 303d
Divide inflow entrance 311,312,313,314
Conversion place 311 ', 312 ', 313 ', 314 '
Multiplication outlet 32 first functional layers 401
Feeder 506 distributary divisions 508
Cutting portion 510 runner converter sections 512
Multi-layer film structure body 520
The first cutting structure 605a, the second cutting structure 605b
First extrudes structure 607a second extrudes structure 607b
Extrude finished product 609 distributary divisions 701
The 703 first flow converter section 705a of cutting portion
The second runner converter section 705b multiplication portion 707
Extrude portion's 709 preposition current dividers 152
Step S131～S139 coextrusion processes
Step S141～S159 multilayer film formation flow process
The specific embodiment
The present invention relates to a kind of have shunting multiplying assembly, the method for thickness gradient variation and the multi-layer film structure of being made by this method, the shunting multiplying assembly with thickness gradient variation that proposes utilizes the design in the mechanism, combine shunting and the function that doubles, can do flexible design according to demand, strengthened the effect of shunting and multiplication, the present invention also relates to the method that has the multi-layer film structure that shunting multiplying assembly that thickness gradient changes makes with this.
Wherein what deserves to be mentioned is, shunting multi-layer film structure that multiplying assembly produces through the present invention can be and have the design that thickness gradient changes, when if the membrane stack thickness in the multilayer film does not have the thickness gradient variation, the blooming piece product of made has reflectivity or penetrance can't expand to broad frequency range and the scope of Wavelength distribution, and so application will be limited.Therefore one of motivation of the present invention namely provides this to have the part of cutting sth. askew in the middle of the shunting multiplying assembly of thickness gradient variation and produces the thickness gradient effect, can just can reach the blooming of the wide wavelength reflectivity of wide frequency range or penetrance with reference to the schematic diagram of Figure 11.
The structure of general multilayer film can have the different multi-layer film structures different with function of thickness according to Demand Design with reference to multi-layer film structure schematic diagram shown in Figure 4, comprises the blooming that is applied in optical system, or the multi-layer film structure of other purposes, as explosion-proof.
This example includes first functional layer 401, as the structure of waterproof, the light that absorbs ultraviolet light or specific wavelength, antireflection, protection such as structure-reinforced, scratch resistant, shock-resistant.
Then can design second functional layer 405 again, make overall structure have certain effects.The substrate layer 407 that structure is arranged at last.
Make above-mentioned multi-layer film structure, the multi-layer film structure that particularly has Thickness Design, the shunting multiplying assembly with thickness gradient variation that the present invention proposes can be with reference to shunting multiplying assembly schematic diagram shown in Figure 5.
This figure discloses the description of each one of shunting multiplying assembly, includes feeder 506, distributary division 508, cutting portion 510, runner converter section 512, multiplication portion 514 and extrudes portion 516.
Charging can comprise single or multiple material, and charging aperture 1 and charging aperture 2 502 are arranged among the figure, can import identical or different material respectively to shunting multiplying assembly 50.
Shunting multiplying assembly 50 comprises feeder 506, can inject the single or different materials of corresponding sandwich construction by this, and material is flowable fluid.
Device includes the cutting portion 510 that is located at distributary division 508 outputs, when carrying the portion 510 of cutting so far through the fluid of above-mentioned a plurality of runners conveyings, is two or more fluid sections with cutting, and each fluid section includes the fluid through a plurality of runners of cutting.Can design different tangent planes according to demand on cutting portion 510 structures, graphic as each embodiment of Figure 11 and Figure 12.
Cutting portion 510 is connecting runner converter section 512, the quantity of runner converter section 512 is decided by the design (two or more) of cutting, each runner converter section 512 is formed by a plurality of runners through cutting, and the fluid section after cutting is carried by different runner converter section 512 respectively.
Device then comprises a multiplication portion 514, connecting above-mentioned runner converter section 512, will be in conjunction with the output of two or more runner converter sections 512, in order to will be superimposed through the runner of runner converter section 512, output has the multi-layer film structure that multilayer material is formed by stacking.Export multi-layer film structure body 520 with the portion that extrudes 516 co-extrusions that connecting multiplication portion 514 more at last.
Structurally, fluid can be because the design of thickness form different pressure in each runner during through above-mentioned runner converter section 512, can overcome by structural design, multiplier 514 is located at the back segment of shunting multiplying assembly, is used for carrying out the design that thickness is arranged, and can be finely tuned.
Use above-mentioned shunting multiplying assembly, Fig. 6 then describes the program schematic diagram that utilizes this shunting multiplying assembly with thickness gradient variation to make multi-layer film structure.
During beginning, show an initial multilayer material 601, this example produces 4 layers of original material through shunting, and then 510 cuttings of the above-mentioned cutting of process portion form inclined-plane cutting structure 603, and graphic is example with an inclined-plane.The mode of cutting will the last multi-layer film structure of image thickness.
In this example, be divided into the first cutting structure 605a and the second cutting structure 605b through the structure after the inclined-plane cutting, two structure 605a and 605b be obvious a scarf, and the first cutting structure 605a and the second cutting structure 605b can have the number of plies of similar number.
Afterwards, being cut into two the first cutting structure 605a is carried by different runner converter sections respectively with the second cutting structure 605b, because two-part sandwich construction is because have different volumes after the oblique cutting, therefore after the runner conversion, each layer structure presents and has different thickness, extrudes structure 607a and second as first and extrudes shown in the structure 607b.In addition, according to another embodiment, the design of extruding the thickness of finished product diaphragm can also be changed by the thickness gradient of the inner flow passage of runner converter section reaches, namely present embodiment extrude the thickness of finished product diaphragm be by middle runner converter section inner flow passage varied in thickness each other change extrude in the finished product diaphragm between each layer thickness proportion.
At last, increase portion superimposed first and extrude structure 607a and second and extrude structure 607b through doubly crossing, finished product 609 is extruded in formation.
Fig. 7 then shows the structure embodiment schematic diagram of the shunting multiplying assembly with thickness gradient variation proposed by the invention.
The shunting multiplying assembly that shows among the figure earlier will single or multiple material injects the shunting multiplying assembly of this tool thickness gradient variation through feed entrance thus.
It then is the distributary division 701 that structure connects feeder, distributary division 701 is divided into the material sections of input the fluid of a plurality of runners in this embodiment, this example (being not limited thereto the example of figure) shows the runner of four same thickness, therefore charging will be distinguished by four runners and carry, and layers of material is delivered to cutting portion 703 with the runner of correspondence.
Cutting portion 703 in this example is arranged at the output of distributary division 701, with the fluid cutting of four runners originally be two or more fluid section partly, this example shows that cutting is two fluid sections, each fluid section includes the fluid through four runners of cutting, carries by first flow converter section 705a and the second runner converter section 705b that has four runners equally respectively.
Above-mentioned first flow converter section 705a and the second runner converter section 705b are connected to cutting portion 703, and according to embodiment, the quantity of runner converter section is according to the design of the tangent plane of cutting portion 703 and decide, flow through a respectively runner converter section of correspondence of the fluid section of cutting.
Fluid section through first flow converter section 705a and the second runner converter section 705b is incorporated into multiplication portion 707 at last, one end of multiplication portion 707 connects first flow converter section 705a and the second runner converter section 705b, will be superimposed through the runner of these runner converter sections, has the multi-layer film structure that multilayer material is formed by stacking with output, finally by the portion's of extruding 709 outputs.
As seen from the figure, the exit just presents through the structure of the portion of extruding 709 output and has the multi-layer film structure that thickness gradient changes, and according to embodiment, the varied in thickness of multi-layer film structure is relevant by the tangent plane design of above-mentioned cutting portion 703; In addition, the design of thickness gradient variation is arranged also between a plurality of runners of above-mentioned first flow converter section 705a and the second runner converter section 705b, also influence the sample attitude of last multi-layer film structure.
According to the shunting multiplying assembly structure embodiment of Fig. 7, Fig. 8 then shows the structure embodiment schematic diagram of another angle of this shunting multiplying assembly.
Change an angle, this shunting multiplying assembly embodiment includes the distributary division 701 of input material, can determine the basic number of plies of multi-layer film structure according to this; Flow path area is divided into two cutting portion 703, can determines the multiple of multi-layer film structure basis number of plies development according to this, and can determine the varied in thickness of multi-layer film structure according to the design of tangent plane.
Divide into first flow converter section 705a and the second runner converter section 705b after the runner, developed by different directions respectively, be incorporated into multiplication portion 707 at last, the conversion of runner herein can determine putting in order between each runner, and the thickness that therefore can change product is arranged; And the runner design in the runner converter section also can have thickness gradient and change, and therefore also can determine the varied in thickness of end-results.Extrude portion 709 and namely be connected multiplication portion 707, output is through the goods of overcompression.
Another angle structure embodiment schematic diagram of for this reason shunting multiplying assembly shown in Figure 9.This example is vertical view, and obvious first flow converter section 705a carries fluid by different directions respectively with the second runner converter section 705b, and comes together in multiplication portion 707.
Figure 10 then shows the side-looking structural representation of shunting multiplying assembly, and this example can be found out the runner Thickness Design at different parts.
In this example, one end is the distributary division 701 that runner has same thickness, enter cutting portion 703 afterwards, be delivered to first flow converter section 705a and the second runner converter section 705b respectively, side view as seen thus, runner design among first flow converter section 705a or/and the second runner converter section 705b can have thickness gradient and change, and can change the design of final products by this.
After entering multiplication portion 707, the fluid of carrying in stack first flow converter section 705a and the second runner converter section 705b runner has the design of different-thickness gradient, at last by the portion's of extruding 709 outputs.
At the shunting multiplying assembly that thickness gradient changes that has described in the invention, wherein the shunting effect of cutting portion can be decided by the tangent plane design of cutting portion, can be an irregular tangent plane.
Be an inclined-plane such as the tangent plane shown in Figure 11 A, the tangent plane on inclined-plane can distribute the same time of different runners to carry the fluid of different volumes, except the number of plies multiple (twice) that determines to develop in the technology, also can effectively control the varied in thickness of multi-layer film structure.
Figure 11 B shows that cutting portion has the tangent plane on two inclined-planes, can be three fluid sections with the fluid cutting of a plurality of runners therefore, carries with different runner converter sections respectively again, except determining multiple (three times), also can control multi-layer film structure thickness.
The embodiment of other cutting portions such as Figure 11 C are shown with three scarves, and Figure 11 D is shown with four scarves.
The tangent plane design of the cutting portion of shunting multiplying assembly also can be irregular tangent planes such as curved surface, the aspect of the various curved surface tangent planes shown in Figure 12 A, Figure 12 B, Figure 12 C, Figure 12 D difference, the tangent plane design determines the number of plies multiple of technological development and thickness gradient to change by this.
Figure 13 is described as making the coextrusion processes of multi-layer film structure, coextrusion processes comprises elder generation by after main feed zone, inferior feed zone or the more feed zone chargings, carries out the material dedusting earlier and cleans (step S131), dry baking (step S132), heating (step S133) and carry out mixing material and kneading operation (step S134).Mixing condensate needs heater heated polymerizable thing usually, is fusion.
(step S115) such as the machinery of material or thermodynamic propertieses.Mixing process can be by the Han Saier mixer, revolve and make its macromolecule material gel through the kneading of kneading device again after ribbon blender, drum mixer etc. fully mix.
Afterwards, the combined polymerization object that will reach mixing kneading through again through strainer filtering (step S135) impurity, and by gear control discharge-amount (step S136).Afterwards, utilize the shunting multiplying assembly with thickness gradient variation proposed by the invention to shunt, double, to determine the number of plies, varied in thickness and the size (step S137) of final products, finished product (step S139) is made in last extrusion molding (step S138) after cutting.
This molten state macromolecule polymer material is shunted, is doubled through the shunting multiplying assembly with thickness gradient variation of the present invention, afterwards by the continuous coextrusion in die head place (step S119), can make plastics temperature and the thickness extruded comparatively even, and diaphragm thickness and the size of discharge-amount when extruding when effectively control is extruded.
Flow process shown in Figure 14 is described and is utilized the present invention to shunt the multilayer film formation method of multiplying assembly, shunting wherein comprises first input material (step S141) with the multiplication step, after being delivered to distributary division (step S143), input material is divided into the fluid (step S145) of a plurality of runners, and the step of shunting this moment can determine the basic number of plies of multi-layer film structure.
Fluid with shunting is delivered to cutting portion (step S147) again, cutting portion will design different tangent planes according to demand, the mode of cutting (step S149) is divided into a plurality of fluid sections (number is decided according to the tangent plane number) with fluid zone according to this, and determines the number of plies multiple of multi-layer film structure accordingly.In general, this multiple is multiplied by the number of plies that is produced by shunting, is the whole number of plies of final multi-layer film structure.Other also can form other functional layers or structure by additional technique.
Afterwards, continue to carry different fluid sections (step S151) by a plurality of runners in a plurality of runner converter sections, in the runner conversion, can pass through the different thickness gradient of structural design, determine the varied in thickness of product with this, and change each layer relative position (in proper order) (step S153) simultaneously.
Again after the conveying of runner converter section, as step S155, by the fluid (step S157) of multiplication portion in conjunction with a plurality of runners, each runner will have different varied in thickness according to design, make the structure of exporting (step S159) that the variation of the number of plies, each layer position, thickness gradient be arranged.
The front end of the shunting multiplying assembly that proposes in the present invention, according to an embodiment, can set up one " preposition current divider ", the distributary division (as the label 701 of Fig. 7) that connects the front end of this shunting multiplying assembly, form a separate system, namely receive the input material of the multilayer that distributes from preposition current divider earlier, this multilayer input material will can form the multilayer film with different-thickness graded and multiplication behind shunting multiplying assembly of the present invention afterwards.
The embodiment of above-mentioned separate system can be with reference to the schematic diagram shown in figure 15A, Figure 15 B and Figure 15 C, and the while is with reference to the surface structure schematic diagram of figure 16A and Figure 16 B.
As Figure 15 A, this routine leading portion is the preposition current divider 152 of a disc type, this preposition current divider generally becomes the discoid and inner super multilayer fluid channel design that generally has, and preposition current divider 152 main purposes are that two or more material fluids is done junction, the shunting of fluid and the arrangement of reforming.The inside of the preposition current divider 152 of disc type is generally multi-disc plate-like die assembly and forms, demonstrate the outward appearance of the embodiment of preposition current divider 152 and 150 combinations of shunting multiplying assembly among Figure 16 A, the preposition current divider 152 that Figure 16 B demonstrates the similar disc type of shape is constituted by five discoid bodies, and its function is that the material feeding of reaching polymeric fluid is joined, fluid channel is shunted the purpose of reforming and arranging with fluid channel.
Its inside of discoid body that is arranged on inner most fluid channel shunting usefulness in the multi-disc plate-like mould in the preposition current divider 152 of Figure 15 A includes the runner of a plurality of radial arrangements, through being received from the fluid macromolecular material of outside feeder input, by the structural design of a plurality of runners 153 in inside, the material of input can be divided into multi-layered fluid.Runner 153 can be different-thickness or length and width each other, and the structure of runner 153 all can have influence on the flow velocity of polymeric fluid when internal flow, pressure and the shearing force of feeding back when fluid flows etc. dorsad.The Demand Design that the change in size Chang Yizhao of runner 153 is different, the change width of runner 153 are reflected to last each layer thickness variation that diaphragm will be reacted to inner membrane stack of extruding.The width dimensions of runner 153 generally is to dwindle gradually or amplification design gradually, the excessive problem of asymmetric and flow velocity difference that may cause fluid itself to flow like this, cause the fluid disorder to wreck, make the stratified film of extruding finished product diaphragm inside at last produce in uneven thickness and generation color spot and color lump problem.
According to one of shown embodiment of the invention of Figure 15 B, be presented at the runner 41 to 48 that has width and length to have change in size in the preposition current divider 152 among the figure, and the version that is the U font, this moment, runner 41 just presented the form of similar U-shaped symmetry to the arrangement mapping of the change width of the runner of runner 48 and the number of plies, at last the result of the film extrusion relation of the thickness shown in Figure 15 C and the number of plies just.
About 200 layers of its inner multilayer film number of plies of film forming finished product among Figure 15 C, also about about 200 of runner 153 quantity of representative in Figure 15 A (or Figure 15 B), and the width of runner 153 is by becoming the variation that presents the U font greatly more gradually with first the diminishing gradually of the arrangement of the number of plies.Embodiment shown in Figure 15 B, runner 41 wherein is that width is more and more littler to the variation of the width of flow path between the runner 44, runner 45 is increasing variation tendency to the width of flow path between the runner 48.As said before, width of flow path arrangement mode among Figure 15 B between 41～48 will cause by total runner mouth 154 polymeric fluid that flows out also has a U font behind the back segment film extrusion multi-layered thickness of being joined and change structure, certainly the last film forming thickness of polymeric fluid film forming also can be because of the intrinsic swelling (Swelling of fluid discharge-amount, fluid velocity, fluid pressure and macromolecule, expanding) phenomenon, diaphragm extend speed, change to some extent with the factor such as extension ratio.This current divider with passage of thickness gradient variation adds the cutting portion combination of cutting sth. askew in the shunting multiplying assembly 150, can produce the multi-layered fluid of different-thickness gradient by this according to the design of runner thickness or length or width.
Be combined into the structure of multilayer again through total runner mouth 154 after the material that a plurality of runners 153 produce, input to shunting multiplying assembly 150, the embodiment of shunting multiplying assembly can consult above-mentioned Fig. 7 to Figure 10.
The formed separate system of shunting multiplying assembly is the distributary division 151 that last preposition current divider 152 structures are connected in shunting multiplying assembly 150 front ends, and material will doubly increase to the multi-layer film structure of more multi-layered number through this shunting multiplying assembly 150 after shunting again.
In sum, the present invention proposes a kind of have shunting multiplying assembly, the method for thickness gradient variation and the multi-layer film structure of being made by this method, wherein can utilize earlier to produce and not have the distributary division that thickness gradient changes, the portion of recycling multiplication afterwards causes graded, therefore can reach simultaneously to make and provide the multilayer film that thickness gradient changes, and manufacture process is stable.This shunting multiplying assembly combines shunting and the function that doubles, and can provide the hardware design with design flexibility by this according to the multi-layer film structure that designs and produces of the cutting in the demand correction device and runner conversion.
Yet the above only is preferred possible embodiments of the present invention, non-so namely limit to claim of the present invention, so the equivalent structure that uses specification of the present invention and diagramatic content to do such as changes, and all in like manner is contained in the claim scope of the present invention, closes and gives Chen Ming.
Claims (19)
1. one kind is used for the shunting multiplying assembly with thickness gradient variation that a multi-layer film structure is made, and it is characterized in that described device comprises:
One feeder, the material of making described multi-layer film structure injects the described shunting multiplying assembly that thickness gradient changes that has via described feeder;
One distributary division connects described feeder, and described material is divided into the fluid of a plurality of runners through described distributary division;
All branches, be arranged at the output of described distributary division, the fluid of carrying through described a plurality of runners is two or more fluid sections by cutting when being delivered to described cutting portion, and described two or more fluid sections include the fluid through a plurality of runners of cutting respectively;
Two or more runner converter sections, connect described cutting portion, described two or more runner converter section includes the described a plurality of runners through cutting respectively, flow through respectively in described two or more runner converter section one of described two or more fluid sections;
One multiplication portion, in conjunction with the output of described two or more runner converter sections, will be superimposed through the runner of described two or more runner converter sections, output has the described multi-layer film structure that multilayer material is formed by stacking; And
Co-extrusion is exported one of described multi-layer film structure and is extruded portion, connects the output of described multiplication portion.
2. according to claim 1 have a shunting multiplying assembly that thickness gradient changes, and it is characterized in that, described cutting portion is two fluid sections with the fluid cutting of described a plurality of runners, and described two fluid sections have the runner of similar number.
3. according to claim 2 have a shunting multiplying assembly that thickness gradient changes, and it is characterized in that, the tangent plane of described cutting portion is an irregular tangent plane.
4. according to claim 3 have a shunting multiplying assembly that thickness gradient changes, and it is characterized in that, the tangent plane of described cutting portion is an inclined-plane or a curved surface.
5. the shunting multiplying assembly with thickness gradient variation according to claim 3 is characterized in that, described two fluid sections of the described irregular tangent plane cutting of the described cutting of process portion cause the thickness gradient of described multi-layer film structure to change.
6. according to claim 2 have a shunting multiplying assembly that thickness gradient changes, it is characterized in that, described runner converter section comprises a first flow converter section and the one second runner converter section with identical runner number, described two fluid sections flow through respectively described first flow converter section and the described second runner converter section.
7. according to claim 1 have a shunting multiplying assembly that thickness gradient changes, and it is characterized in that, described two or more runner converter sections are in order to the conversion relative transfer position of a plurality of runners in each runner converter section wherein.
8. according to claim 7 have a shunting multiplying assembly that thickness gradient changes, it is characterized in that, described multiplication portion will be superimposed through the runner that described two or more runner converter sections are changed relative transfer position, and the relative transfer position that enters the runner of described multiplication portion is different from the relative position of a plurality of runners that the described distributary division of initial process distinguishes.
9. the shunting multiplying assembly with thickness gradient variation according to claim 7 is characterized in that, the thickness of a plurality of runners in described two or more runner converter sections has graded.
10. one kind is utilized one to have the multilayer film formation method of the shunting multiplying assembly of thickness gradient variation, it is characterized in that described method comprises:
Input material;
Carry material to a described distributary division with shunting multiplying assembly of thickness gradient variation, material is divided into the fluid of a plurality of runners through described distributary division;
The fluid of described a plurality of runners is delivered to all branches, and cutting is two or more fluid sections, and described two or more fluid sections include the fluid through a plurality of runners of cutting respectively;
Described two or more fluid section two or more runner converter sections of flowing through respectively are incorporated into a multiplication portion;
The fluid of each the included a plurality of runner in described two or more fluid section is superimposed in described multiplication portion; And
The fluid of superimposed a plurality of runners in described multiplication portion is exported in the portion of extruding, and produces to have the multi-layer film structure that multilayer material is formed by stacking.
11. multilayer film formation method according to claim 10, it is characterized in that, the thickness of a plurality of runners of each in described two or more runner converter section has graded, produces structure that each layer have different-thickness through the structure compression of graded in described multiplication portion through each the fluid of a plurality of runners in described two or more runner converter sections.
12. multilayer film formation method according to claim 10 is characterized in that, a plurality of runners of the described two or more runner converter sections of flowing through respectively have certain relative transfer position, and described multiplication portion in conjunction with the time change relative transfer position.
13. multilayer film formation method according to claim 10 is characterized in that, the fluid of described a plurality of runners is delivered to described cutting portion, and cutting is two fluid sections, and described two fluid sections have the runner of similar number.
14. multilayer film formation method according to claim 13 is characterized in that, described cutting portion is described two fluid sections with the fluid of described a plurality of runners with an irregular tangent plane cutting.
15. multilayer film formation method according to claim 14 is characterized in that, the cutting of the described cutting of process portion is that a plurality of runners of described two fluid sections have certain relative transfer position, and changes relative transfer position through two runner converter sections the time.
16. one kind in conjunction with shunting multiplying assembly and the formed separate system of a preposition current divider that thickness gradient changes that have for multi-layer film structure making according to claim 1, it is characterized in that, through the fluid of described preposition current divider output will be then the distributary division of an end by described shunting multiplying assembly import described shunting multiplying assembly.
17. separate system according to claim 16 is characterized in that, described preposition current divider is the current divider of a disc type, and inside includes a plurality of runners radially.
18. separate system according to claim 17 is characterized in that, described a plurality of runners have different thickness.
19. separate system according to claim 17 is characterized in that, described a plurality of runners have different length.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210067541.7A CN103302835B (en) | 2012-03-14 | 2012-03-14 | Shunting multiplying assembly, separate system, method and multi-layer film structure |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210067541.7A CN103302835B (en) | 2012-03-14 | 2012-03-14 | Shunting multiplying assembly, separate system, method and multi-layer film structure |
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| CN103302835B CN103302835B (en) | 2015-11-25 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106707374A (en) * | 2016-12-07 | 2017-05-24 | 北京化工大学 | Optical multilayer gradient thin film and preparation device thereof |
| CN109638206A (en) * | 2018-12-29 | 2019-04-16 | 武汉中兴创新材料技术有限公司 | It is used to prepare the device and method for preparing polyolefin microporous membrane of MIcroporous polyolefin film |
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| US5389324A (en) * | 1993-06-07 | 1995-02-14 | The Dow Chemical Company | Layer thickness gradient control in multilayer polymeric bodies |
| US6696142B2 (en) * | 2000-04-07 | 2004-02-24 | Case Western Reserve University | Polymer 1D photonic crystals |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5389324A (en) * | 1993-06-07 | 1995-02-14 | The Dow Chemical Company | Layer thickness gradient control in multilayer polymeric bodies |
| US6696142B2 (en) * | 2000-04-07 | 2004-02-24 | Case Western Reserve University | Polymer 1D photonic crystals |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106707374A (en) * | 2016-12-07 | 2017-05-24 | 北京化工大学 | Optical multilayer gradient thin film and preparation device thereof |
| CN109638206A (en) * | 2018-12-29 | 2019-04-16 | 武汉中兴创新材料技术有限公司 | It is used to prepare the device and method for preparing polyolefin microporous membrane of MIcroporous polyolefin film |
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| Publication number | Publication date |
|---|---|
| CN103302835B (en) | 2015-11-25 |
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