CN103302835B - Shunting multiplying assembly, separate system, method and multi-layer film structure - Google Patents
Shunting multiplying assembly, separate system, method and multi-layer film structure Download PDFInfo
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Abstract
A kind of shunting multiplying assembly, separate system, method and multi-layer film structure of being made by the method with thickness gradient change, wherein shunting multiplying assembly is combine to make during multi-layer film structure makes to shunt the device with multiplication function, device includes the feeder receiving input material, also include distributary division, material sections can be divided into the fluid of multiple runner, layers of material is by the conveying of corresponding runner.The fluid of multiple runner is two or more fluid section through the cutting of device inscribe branch, namely each fluid section continues to carry in device through the runner converter section with thickness gradient change of correspondence, each runner converter section comprises multiple runner, to set the relative position of each runner, combine in the multiplication portion of device rear end, produce and there is the superimposed structure of multilayer material, then export a multi-layer film structure by the portion of extruding.
Description
Technical field
The present invention relates to a kind of shunting multiplying assembly, system, method and the multi-layer film structure that made by the method with thickness gradient change, particularly a kind of combination is shunted and multiplication effect, and there is the shunting multiplying assembly of design flexibility, and the method for the multi-layer film structure made with this device.
Background technology
Forming by plural layers are superimposed for optical system or the multi-layer film structure of special-purpose, is the different film of physical characteristic (as refractive index) according to Demand Design between each layer.If be applied in optical system, the design of multilayer film can make the light of certain wavelength section pass through or stop the light of specific wavelength, and this type of optical element with multi-layer optical film can form by high molecular polymer.The multi-layer film structure of various uses utilizes the preparation method of a kind of coextrusion (co-extrsion) especially, schematic diagram as shown in Figure 1.
It is the general arrangement of a co-extrusion device shown in Fig. 1, material is respectively by the first charging aperture 100 and the second charging aperture 102 input unit, after material is mixed into, first through a pre-process, comprise cleaning, dry the step such as (containing water management), decontamination.Material after pre-process can carry out first time shunting through the first dividing cell 104, material is carried with different runners respectively, this example can carry out second time shunting through the second dividing cell 110 again according to demand, is mixed with having levels by material, and carries through multiple runner.
Afterwards, the fluid of multiple runner will process through multiplication units 106, to produce the number of plies of many multiples, now also can introduce surfacing charging aperture 108 again, as the protective layer of each Rotating fields.After multiplication units 106, original number of plies doubly can be increased to the number of plies of several times, compressed by multilayer extrusion unit 111 afterwards, be delivered to die head (extrusiondie, extrusion die) 112 to export, the effect of die head 112 is that the plastics temperature that can make to extrude is comparatively even and produce the finished product of specific thicknesses and given shape with thickness.
Then be provided with a shaping unit 114, this be die head 112 export semi-finished product conveying time be used for the purposes of fine tuning structure and finished product thickness and guiding, 116, roller is used to smooth whole multi-layer film structure, and is delivered to platform.Extending roller set 118 can by the design of extension mechanism, multi-layer film structure material is carried out uniaxial extension, single shaft or twin shaft extension can imposed afterwards through tentering unit 120, be aided with heating unit 122, with mode of heating heating multi-layer film structure, enable to carry out shape according to design, separate stress, and improve the machinery of material or heating power and optical property, finally being received by collector unit 124 is product.
One of implementation of current divider (feedblockdevice) in co-extrusion device prior art schematic diagram as shown in Figure 2.Current divider 2 shown in it has multiple charging aperture 20,21,23,24, can input different materials respectively, as the macromolecule polymer material of liquid, through charging aperture 20, and 21,23,24 input in dividing cell 27.Utilize the mechanism design in dividing cell 27, feed zone is divided into sandwich construction, extrude afterwards and exported by outlet 22.
The number of plies of the sandwich construction that the current divider of this prior art produces by with the entrance number of input with design runner (channel) number separated in current divider and be multiplied and determine.
Fig. 3 A, 3B then show multiplier operation principles and the device schematic diagram of prior art.
Fig. 3 A describes the operation principles of multiplier, and wherein citing includes initial charge 301, is cut into multiple (this example is 4) transport portion through shunting, cuts charging 303a as illustrated in the drawing, 303b, 303c, 303d, afterwards according to demand, cutting charging 303a can be rearranged, 303b, the relative ranks of 303c, 303d, as shown in the figure, originally cutting charging 303a, 303b, 303c, the order of 303d changes 303c into, 303a, 303d and 303b (from top to bottom).
Afterwards according to the superimposed each Rotating fields of order of design, easily extensible is the longer structure of icon, exports the sandwich construction formed as multiplication charging 305, forms multi-layer film structure 307 finally by extrusion membrane stack.
Perform the multiplier schematic diagram of one of design of above-mentioned multiplication principle prior art as shown in Figure 3 B.
As shown in Figure 1, after may being located at shunting, the feed zone 31 of Fig. 3 B shows charging respectively by a point inflow entrance 311 multiplier, 312,313, in 314 accesss to plant, the material of each entrance, through the conveying of different runners, arrives conversion place 311 ', 312 ' as figure shows, 313 ', 314 ', the relative position of runner can be changed according to design, when having arrived the position of multiplication outlet 32, except relative position changes, the number of plies doubly increases to four layers, finally exports after compression.
In prior art, when the super multi-layer flow channels itself that disc surpasses multilayer current divider inside does not have the graded of thickness or width or length equidimension, the back pressure of macromolecule suffered by the internal flow of super multilayer current divider is comparatively stable and even, more not easily cause excessive flow velocity difference, the stability of each flow passage can be very well in theory, the multilayer film produced is comparatively even in the varied in thickness of entirety, be not easy to produce the defect such as color spot and color lump, but for reaching the super multilayer current divider with thickness gradient change in practical application, usually just produce the super multi-layer flow channels with thickness or width or length variations when super multilayer current divider manufactures, but because the mechanical dimensions such as gate thickness width or length are variant, the macromolecule suffered back pressure that flows therein is also variant, so this causes the differential back of super multilayer film suffered by runner inside apart from excessive, cause the instability surpassing multi-layer flow channels during film extrusion, make thickness of multilayer film uniformity quality not good, cause color spot and the vitta line of multilayer film.
Summary of the invention
For providing the preparation method of effective and disposable generation multi-layer film structure, the present invention proposes a kind of shunting multiplying assembly with thickness gradient change, the function of the shunting in multi-layer film structure technique and multiplication is combined in one shunt in multiplying assembly, can be applicable in a coextrusion processes.
This shunting multiplying assembly mainly comprises the feeder receiving charging, and namely receive the position of material injection device, feeder injection material so far has the shunting multiplying assembly of thickness gradient change thus.
Connect feeder, device includes a distributary division, and the material making this multi-layer film structure will divide into the fluid of multiple runner through this distributary division, and according to demand, layers of material is carried by corresponding runner by distributary division.Fluid is then delivered to all branches of device, and cutting portion is arranged at the output of distributary division, and when the fluid that multiple runner is carried is delivered to cutting portion, be two or more fluid section by cutting, each fluid section includes the fluid of the multiple runners through cutting.
Then, fluid will flow through the two or more runner converter section of device respectively, each runner converter section includes multiple multiple runners through cutting, combine in multiplication portion afterwards, multiple runner can be superimposed in multiplication portion, comprise the relative position of the superimposed runner of setting, export the multi-layer film structure having multilayer material and be formed by stacking afterwards, what device rear end comprised that co-extrusion exports multi-layer film structure extrudes portion.
Above-mentioned have thickness gradient change shunting multiplying assembly specifically, the fluid cutting of multiple runner can be two fluid section by cutting portion, and two fluid section have the runner of identical number, the tangent plane in cutting portion can be a nonlinear irregular tangent plane, as inclined-plane or curved surface, two fluid section of the irregular tangent plane institute cutting through this cutting portion can cause the thickness gradient of multi-layer film structure to change in the rear end of device.
The number of the runner converter section in device also comprises according to the number of institute of cutting portion cutting and has same stream road number multiple (as two) runner converter section, specifically, in runner converter section, the thickness of multiple runner has graded, and runner wherein has a specific phase to transfer position, and relative position may be changed according to demand when being incorporated into multiplication portion.
According to inventive embodiments, utilize the above-mentioned step of multilayer film formation method with the shunting multiplying assembly of thickness gradient change as follows:
Input makes the material of multi-layer film structure, then carries material to the distributary division in the shunting multiplying assembly with thickness gradient change, and material divides into the fluid of multiple runner through distributary division.Then be two or more fluid section with cutting portion according to the structure cutting of tangent plane, each fluid section includes the fluid of the multiple runners through cutting.
Two or more fluid section flows through two or more runner converter sections respectively, in runner converter section, the fluid of each runner will be incorporated into multiplication portion, wherein the fluid of multiple runner can design according to demand and be converted to different relative transfer positions, finally be superimposed on multiplication portion, and export through the portion of extruding, produce the multi-layer film structure that there is multilayer material and be formed by stacking.
The thickness of the above-mentioned multiple runner of runner converter section has graded, makes the final each layer of multi-layer film structure exported have different thickness.
According to one of embodiment, shunting multiplying assembly can be combined with another preposition current divider, forms a separate system, can produce more multi-layered multi-layer film structure.
The embodiment of the present invention also comprises the multi-layer film structure made by above-mentioned preparation method.
Accompanying drawing explanation
Fig. 1 is shown as prior art coextrusion processes device and arranges schematic diagram;
Figure 2 shows that the current divider schematic diagram of prior art;
Fig. 3 A is depicted as the multiplier operation principles schematic diagram of prior art;
Fig. 3 B is depicted as the multiplier schematic diagram of prior art;
Fig. 4 is shown as a multi-layer film structure schematic diagram;
Figure 5 shows that the shunting multiplying assembly schematic diagram with thickness gradient change of the present invention;
Fig. 6 describes and utilizes the shunting multiplying assembly with thickness gradient change of the present invention to make the program schematic diagram of multi-layer film structure;
Figure 7 shows that one of constructive embodiment schematic diagram with the shunting multiplying assembly of thickness gradient change of the present invention;
Figure 8 shows that the constructive embodiment schematic diagram two with the shunting multiplying assembly of thickness gradient change of the present invention;
Figure 9 shows that the constructive embodiment schematic diagram three with the shunting multiplying assembly of thickness gradient change of the present invention;
Figure 10 shows that the constructive embodiment schematic diagram four with the shunting multiplying assembly of thickness gradient change of the present invention;
The embodiment schematic diagram that Figure 11 A, Figure 11 B, Figure 11 C, Figure 11 D cut when being depicted as shunting;
The embodiment schematic diagram that Figure 12 A, Figure 12 B, Figure 12 C, Figure 12 D cut when being depicted as shunting;
Figure 13 is described as coextrusion processes;
Flow process shown in Figure 14 describes the multilayer film formation method utilizing shunting multiplying assembly of the present invention;
Figure 15 A, B, C are shown as the separate system schematic diagram utilizing shunting multiplying assembly of the present invention to be formed;
Figure 16 A, 16B are shown as the schematic appearance of separate system of the present invention.
[main element symbol description]
First charging aperture 100 second charging aperture 102
First dividing cell 104 second dividing cell 110
Multiplication units 106 surfacing charging aperture 108
Multilayer extrusion unit 111 die head 112
Shaping unit 114 roller 116
Extend roller set 118 tentering unit 120
Heating unit 122 collector unit 124
Current divider 2 charging aperture 20,21,23,24
Export 22 dividing cell 27
Initial charge 301 is doubled charging 305
Cutting charging 303a, 303b, 303c, 303d
Multi-layer film structure 307 feed zone 31
Divide inflow entrance 311,312,313,314
Conversion place 311 ', 312 ', 313 ', 314 '
Multiplication outlet 32 first functional layer 401
Multi-layer film structure 403 second functional layer 405
Substrate layer 407 charging aperture 1
Charging aperture 2 502 shunts multiplying assembly 50
Feeder 506 distributary division 508
Cutting portion 510 runner converter section 512
Multiplication portion 514 extrudes portion 516
Multi-layer film structure body 520
Initial multilayer material 601 inclined-plane cutting structure 603
First cutting structure 605a second cutting structure 605b
First extrudes structure 607a second extrudes structure 607b
Extrude finished product 609 distributary division 701
Cutting portion 703 first flow converter section 705a
Second runner converter section 705b multiplication portion 707
Extrude the preposition current divider 152 in portion 709
Runner 153,41,42,43,44,45,46,47,48
Total runner 154 shunts multiplying assembly 150
Distributary division 151
Step S131 ~ S139 coextrusion processes
Step S141 ~ S159 multilayer film formation flow process
Detailed description of the invention
The present invention relates to a kind of shunting multiplying assembly, method and the multi-layer film structure that made by the method with thickness gradient change, the shunting multiplying assembly with thickness gradient change proposed utilizes the design in mechanism, combine shunting and the function doubled, flexible design can be done according to demand, strengthen the effect of shunting and multiplication, the present invention also relates to the method for multi-layer film structure made with this shunting multiplying assembly with thickness gradient change.
Wherein it is worth mentioning that, shunt through the present invention the multi-layer film structure that multiplying assembly produces and can be the design with thickness gradient change, if when the membrane stack thickness in multilayer film does not have thickness gradient change, made blooming piece product has reflectivity or penetrance cannot expand to broader frequency range and the scope of Wavelength distribution, and so application will be limited.Therefore namely one of motivation of the present invention provides this to have the part of cutting sth. askew in the middle of the shunting multiplying assembly of thickness gradient change and produces thickness gradient effect, with reference to the schematic diagram of Figure 11, just can reach the blooming of the wide wavelength reflection of wide frequency range or penetrance.
The structure of general multilayer film with reference to the multi-layer film structure schematic diagram shown in figure 4, can have the different multi-layer film structure different from function of thickness according to Demand Design, comprises the blooming being applied in optical system, or the multi-layer film structure of other purposes, as explosion-proof.
This example includes the first functional layer 401, as the structure of waterproof, the light absorbing ultraviolet light or specific wavelength, antireflection, the protection such as structure-reinforced, scratch resistant, shock-resistant.
Multi-layer film structure 403 has consistency of thickness or inconsistent structure, can make by coextrusion processes.Multi-layer film structure 403 is formed by layer high molecule polymeric material, material is as polymethyl methacrylate (Poly (Methylmethacrylate), PMMA), polycarbonate resin (Polycarbonate, PC), methyl methacrylate polystyrene ((Methylmethacrylate) Styrene, and polystyrene (PolyStyrene MS), PS), and polyphenyl dicarboxylate (Poly (EthyleneTerephthalate), PET), PEN (Poly (EthyleneNaphthalate), PEN), polypropylene (Polypropylene, at least one material in the material group of the composition such as PP) or its combined polymerization object, but be not limited with above-mentioned.
Then can there is the second functional layer 405 by bamboo product, make overall structure have certain effects.Finally there is the substrate layer 407 of structure.
Make above-mentioned multi-layer film structure, particularly have the multi-layer film structure of thickness design, the shunting multiplying assembly with thickness gradient change of the present invention's proposition can with reference to the shunting multiplying assembly schematic diagram shown in figure 5.
This figure discloses the description in each portion of shunting multiplying assembly, includes feeder 506, distributary division 508, cutting portion 510, runner converter section 512, multiplication portion 514 and extrudes portion 516.
Charging can comprise single or multiple material, has charging aperture 1 and charging aperture 2 502 in figure, can input identical or different material respectively to shunting multiplying assembly 50.
Shunting multiplying assembly 50 comprises feeder 506, and can inject the different materials of single or corresponding sandwich construction by this, material is flowable fluid.
Distributary division 508 connects feeder 506, and above-mentioned material divides into the fluid of multiple runner (channel) through this distributary division 508, carries respectively with the runner of correspondence.
Device includes the cutting portion 510 being located at distributary division 508 output, and when the fluid that above-mentioned multiple runner is carried carries so far cutting portion 510, be two or more fluid section by cutting, each fluid section includes the fluid of the multiple runners through cutting.Cutting portion 510 structure can be designed with different tangent planes according to demand, and each embodiment as Figure 11 and Figure 12 is graphic.
Cutting portion 510 is connected to runner converter section 512, the quantity of runner converter section 512 is decided by the design (two or more) of cutting, each runner converter section 512 is formed by multiple runner through cutting, and the fluid section after cutting is carried respectively by different runner converter sections 512.
Device then comprises a multiplication portion 514, be connected to above-mentioned runner converter section 512, by the output in conjunction with two or more runner converter sections 512, in order to by superimposed for the runner through runner converter section 512, export the multi-layer film structure that there is multilayer material and be formed by stacking.The last portion that extrudes 516 co-extrusion being connected to multiplication portion 514 with again exports multi-layer film structure body 520.
Structurally, fluid, can because the design of thickness forms different pressure in each runner when above-mentioned runner converter section 512, can be overcome by structural design, the back segment of shunting multiplying assembly is located at by multiplier 514, is used for performing the design of thickness arrangement, and can be finely tuned.
Apply above-mentioned shunting multiplying assembly, Fig. 6 then describes the program schematic diagram utilizing this shunting multiplying assembly with thickness gradient change to make multi-layer film structure.
During beginning, show an initial multilayer material 601, this example, through shunting generation 4 layers of original material, is then cut through above-mentioned cutting portion 510 and is formed inclined-plane cutting structure 603, graphic for an inclined-plane.The mode of cutting will the thickness of the last multi-layer film structure of image.
In this example, the structure after inclined-plane cutting is divided into the first cutting structure 605a and the second cutting structure 605b, and two structure 605a and 605b are obvious a scarf, and the first cutting structure 605a can have the number of plies of identical number with the second cutting structure 605b.
Afterwards, the the first cutting structure 605a being cut into two is carried by different runner converter sections respectively from the second cutting structure 605b, due to two-part sandwich construction because there is different volumes after oblique cutting, therefore after runner conversion, each Rotating fields presents and has different thickness, as first extrudes structure 607a and second and extrude shown in structure 607b.In addition, according to another embodiment, extrude the thickness of finished product diaphragm design can also by the inner flow passage of runner converter section thickness gradient change reach, namely the present embodiment extrude the thickness of finished product diaphragm be by middle runner converter section inner flow passage varied in thickness each other change extrude in finished product diaphragm between each layer thickness proportion.
Finally, extrude structure 607a and second through a times mistake increasing portion superimposed first and extrude structure 607b, formed and extrude finished product 609.
Fig. 7 then shows the constructive embodiment schematic diagram with the shunting multiplying assembly of thickness gradient change proposed by the invention.
Single or multiple material is first injected the shunting multiplying assembly of this tool thickness gradient change through feed entrance thus by the shunting multiplying assembly shown in figure.
Then be the distributary division 701 of anatomical connectivity feeder, the material sections of input is divided into the fluid of multiple runner by distributary division 701 in this embodiment, this example (being not limited thereto the example of figure) shows the runner of four same thickness, therefore charging will be distinguished and be carried by four runners, and layers of material is delivered to cutting portion 703 with the runner of correspondence.
Cutting portion 703 in this example is arranged at the output of distributary division 701, it is two or more fluid section parts by the fluid cutting of script four runners, this example display cutting is two fluid section, each fluid section includes the fluid of four runners through cutting, carries respectively by the first flow converter section 705a and the second runner converter section 705b equally with four runners.
Above-mentioned first flow converter section 705a and the second runner converter section 705b is connected to cutting portion 703, and according to embodiment, the tangent plane in the quantity basis cutting portion 703 of runner converter section designs and determines, and the fluid section of cutting flows through a corresponding runner converter section respectively.
Fluid section through first flow converter section 705a and the second runner converter section 705b is finally incorporated into multiplication portion 707, the one end in multiplication portion 707 connects first flow converter section 705a and the second runner converter section 705b, by superimposed for the runner through these runner converter sections, to export the multi-layer film structure that there is multilayer material and be formed by stacking, export finally by the portion of extruding 709.
As seen from the figure, exit, the structure namely exported through the portion of extruding 709 presents the multi-layer film structure with thickness gradient change, and according to embodiment, the varied in thickness of multi-layer film structure designs relevant by the tangent plane in above-mentioned cutting portion 703; In addition, the design also having thickness gradient to change between multiple runners of above-mentioned first flow converter section 705a and the second runner converter section 705b, also affects the pattern of last multi-layer film structure.
According to the shunting multiplying assembly constructive embodiment of Fig. 7, Fig. 8 then shows the constructive embodiment schematic diagram of another angle of this shunting multiplying assembly.
Change an angle, this shunting multiplying assembly embodiment includes the distributary division 701 of input material, can determine the basic number of plies of multi-layer film structure according to this; Flow path area is divided into the cutting portion 703 of two, the multiple of multi-layer film structure basis number of plies development can be determined according to this, and the design of foundation tangent plane can determine the varied in thickness of multi-layer film structure.
First flow converter section 705a and the second runner converter section 705b is divided into after runner, respectively by different future developments, finally be incorporated into multiplication portion 707, the conversion of runner herein can determine putting in order between each runner, therefore can change the thickness arrangement of product; Further, the runner design in runner converter section also can have thickness gradient change, therefore also can determine the varied in thickness of end-results.Extrude portion 709 and be namely connected multiplication portion 707, export the goods through overcompression.
Figure 9 shows that another angled arrangement embodiment schematic diagram of this shunting multiplying assembly.This example is top view, and obvious first flow converter section 705a carries fluid by different directions respectively from the second runner converter section 705b, and comes together in multiplication portion 707.
Figure 10 then shows the side-looking structural representation of shunting multiplying assembly, and this example can be found out and to design at the gate thickness of different parts.
In this example, one end is the distributary division 701 that runner has same thickness, enter cutting portion 703 afterwards, be delivered to first flow converter section 705a and the second runner converter section 705b respectively, side view is visible thus, runner design in first flow converter section 705a or/and the second runner converter section 705b can have thickness gradient change, can change the design of final products by this.
After entering multiplication portion 707, superpose the fluid carried in first flow converter section 705a and the second runner converter section 705b runner, have the design of different-thickness gradient, finally exported by the portion of extruding 709.
At the shunting multiplying assembly with thickness gradient change described in the invention, wherein the shunting effect in cutting portion can be determined by the design of the tangent plane in cutting portion, can be an irregular tangent plane.
Ratio tangent plane is as shown in Figure 11 A an inclined-plane, the tangent plane on inclined-plane can distribute the fluid of different runner same time conveying different volumes, except determining the number of plies multiple (twice) developed in technique, the varied in thickness of multi-layer film structure also effectively can be controlled.
Figure 11 B shows the tangent plane that cutting portion has two inclined-planes, therefore can be three fluid section by the fluid cutting of multiple runner, again respectively with the conveying of different runner converter sections, except multiple (three times) can be determined, also multi-layer film structure thickness can be controlled.
The embodiment in other cutting portions has three scarves as shown in Figure 11 C, and Figure 11 D is shown with four scarves.
The tangent plane design in the cutting portion of shunting multiplying assembly also can be the irregular tangent planes such as curved surface, the aspect of the various curved surface tangent planes as shown in Figure 12 A, Figure 12 B, Figure 12 C, Figure 12 D difference, tangent plane design determines that the number of plies multiple of technological development and thickness gradient change by this.
Figure 13 is described as the coextrusion processes making multi-layer film structure, coextrusion processes comprises first by after main feed zone, secondary feed zone or more feed zone charging, first carries out material dedusting clean (step S131), dry baking (step S132), heating (step S133) and is carried out by material mixing with kneading operation (step S134).Mixing condensate needs heater heated polymerizable thing usually, is melting.
The machinery of material or thermodynamic properties etc. (step S115).Mixing process can by Han Saier mixer, revolve ribbon blender, drum mixer etc. and fully make its macromolecule material gel through kneading device kneading again after mixing.
Afterwards, by the combined polymerization object that reaches mixing kneading through again through strainer filtering (step S135) impurity, and discharge-amount (step S136) is controlled by gear.Afterwards, the shunting multiplying assembly with thickness gradient change proposed by the invention is utilized to carry out shunting, doubling, to determine the number of plies of final products, varied in thickness and size (step S137), last extrusion molding (step S138), makes finished product (step S139) after cutting.
This molten state macromolecule polymer material carries out shunting, doubling through the shunting multiplying assembly with thickness gradient change of the present invention, afterwards by the continuous coextrusion of die head (step S119), the plastics temperature extruded and thickness can be made comparatively even, and discharge-amount and diaphragm thickness when extruding and size when effectively controlling to extrude.
Flow process shown in Figure 14 describes and utilizes the present invention to shunt the multilayer film formation method of multiplying assembly, shunting wherein and multiplying step comprise first input material (step S141), after being delivered to distributary division (step S143), input material is divided into the fluid (step S145) of multiple runner, the step now shunted can determine the basic number of plies of multi-layer film structure.
Again the fluid of shunting is delivered to cutting portion (step S147), cutting portion will design different tangent planes according to demand, fluid zone is divided into multiple fluid section (number is determined according to tangent plane number) by the mode (step S149) of cutting according to this, and determines the number of plies multiple of multi-layer film structure accordingly.In general, this multiple is multiplied by the number of plies produced by shunting, is the overall number of plies of final multi-layer film structure.Other also form other functional layers or structure by additional technique.
Afterwards, the different fluid section (step S151) of conveying is continued by the multiple runners in multiple runner converter section, in runner conversion, by by the different thickness gradient of structural design, determine the varied in thickness of product with this, and change each layer relative position (sequentially) (step S153) simultaneously.
Again after the conveying of runner converter section, as step S155, by the fluid (step S157) of multiplication portion in conjunction with multiple runner, each runner will may, according to being designed with different varied in thickness, make the structure (step S159) exported have the change of the number of plies, each layer position, thickness gradient.
In the front end of the shunting multiplying assembly that the present invention proposes, according to an embodiment, one " preposition current divider " can be set up, connect the distributary division (label 701 as Fig. 7) of the front end of this shunting multiplying assembly, form a separate system, namely first receive the input material of the multilayer distributed from preposition current divider, this multilayer input material after shunting multiplying assembly of the present invention, will can form the multilayer film with different-thickness graded and multiplication afterwards.
The embodiment of above-mentioned separate system can with reference to the schematic diagram shown in figure 15A, Figure 15 B and Figure 15 C, simultaneously with reference to the surface structure schematic diagram of figure 16A and Figure 16 B.
As Figure 15 A, this routine leading portion is the preposition current divider 152 of a disc type, this preposition current divider generally becomes discoid and innerly generally has super multilayer microchannel structural design, preposition current divider 152 main purpose be two or more material flow is done the junction of fluid, shunting arranges with reformation.The inside of the preposition current divider 152 of disc type is generally multi-disc plate-like die assembly and forms, the outward appearance of the embodiment that preposition current divider 152 is combined with shunting multiplying assembly 150 is demonstrated in Figure 16 A, the preposition current divider 152 that Figure 16 B demonstrates the similar disc type of shape is combined by five discoid bodies and forms, and its function is that the material feeding reaching polymeric fluid is joined, fluid channel shunting and fluid channel reform the object arranged.
Its inside of discoid body being arranged on the shunting of inner most fluid channel in multi-disc plate-like mould in the preposition current divider of Figure 15 A 152 includes the runner of multiple radial arrangement, through being received from the fluid macromolecular material of outside feeder input, by the structural design of the multiple runner 153 in inside, can be multi-layered fluid by the material separates of input.Runner 153 can be different-thickness or length and width each other, pressure and the shearing force etc. dorsad of feedback when the structure of runner 153 all can have influence on the flow velocity of polymeric fluid when internal flow, fluid flowing.The Demand Design that the change in size Chang Yizhao of runner 153 is different, the change width of runner 153 is reflected to last extrudes each layer thickness variation that diaphragm will be reacted to inner membrane stack.The width dimensions of runner 153 is generally gradually reduce or Enlargement Design gradually, asymmetric excessive with the flow velocity difference problem that fluid itself may be caused like this to flow, cause fluid turbulence to wreck, the stratified film making finally to extrude finished product diaphragm inside produces in uneven thickness with generation color spot and color lump problem.
One of embodiment of the present invention according to Figure 15 B, being presented in figure in preposition current divider 152 has width and length to have the runner 41 to 48 of change in size, and the version in U-shaped, now runner 41 is mapped to the change width of the runner of runner 48 and the arrangement of the number of plies and is just presented the form of similar U-shaped symmetry, the relation of the result of last film extrusion just thickness as shown in figure 15 c and the number of plies.
The multilayer film number of plies of its inside of film forming finished product in Figure 15 C about 200 layers, runner 153 quantity also about about two hundred of representative in Figure 15 A (or Figure 15 B), and the width of runner 153 is by the first change becoming gradually and present greatly U-shaped that diminishes gradually of arrangement with the number of plies.Embodiment as shown in fig. 15b, the change of the width of flow path between runner 41 wherein to runner 44 is width is more and more less, and the width of flow path between runner 45 to runner 48 is increasing variation tendency.As said before, width of flow path arrangement mode in Figure 15 B between 41 ~ 48 will cause by total runner mouth 154 flowed out polymeric fluid of joining also have after back segment film extrusion U-shaped multi-layered thickness change structure, the last film forming thickness of certain polymeric fluid film forming also can because of the intrinsic swelling (Swelling of fluid discharge-amount, fluid velocity, fluid pressure and macromolecule, expand) phenomenon, diaphragm Drawing rate, with the factor such as extension ratio and changing to some extent.This current divider of passage with thickness gradient change add in shunting multiplying assembly 150 have cut sth. askew cut subcombinations, the multi-layered fluid of different-thickness gradient can be produced by this according to the design of gate thickness or length or width.
After the material that multiple runner 153 produces, be combined into the structure of multilayer again through total runner mouth 154, input to shunting multiplying assembly 150, the embodiment of shunting multiplying assembly can consult above-mentioned Fig. 7 to Figure 10.
The separate system that formed of shunting multiplying assembly be upper preposition current divider 152 anatomical connectivity in the distributary division 151 of shunting multiplying assembly 150 front end, material, through this shunting multiplying assembly 150, will doubly increase to the multi-layer film structure of more multi-layered number after shunting again.
In sum, the present invention proposes a kind of shunting multiplying assembly, method and the multi-layer film structure that made by the method with thickness gradient change, wherein first can utilize the distributary division producing and not there is thickness gradient change, recycle multiplication portion afterwards and cause graded, therefore can reach the multilayer film manufacturing and provide thickness gradient change, and manufacture process is stablized simultaneously.This shunting multiplying assembly combines the function of shunting and multiplication, and can change according to the cutting in demand correction device and runner design and produce multi-layer film structure, the hardware design with design flexibility is provided by this.
But the foregoing is only preferred possible embodiments of the present invention, non-ly therefore namely limit to the scope of the claims of the present invention, therefore the equivalent structure change of such as using description of the present invention and diagramatic content to do, be all in like manner contained in right of the present invention, close and give Chen Ming.
Claims (16)
1., for the shunting multiplying assembly with thickness gradient change that a multi-layer film structure makes, it is characterized in that, described device comprises:
One feeder, makes the material of described multi-layer film structure via the shunting multiplying assembly described in described feeder injection with thickness gradient change;
One distributary division, connects described feeder, and described material divides into the fluid of multiple runner through described distributary division;
All branches, be arranged at the output of described distributary division, fluid through described multiple runner conveying is split as plural fluid section being delivered to described cutting portion, described plural fluid section includes the fluid of the multiple runners through cutting respectively, and two or more fluid section described in the irregular tangent plane cutting in wherein said cutting portion changes to cause the thickness gradient of described multi-layer film structure;
Plural runner converter section, connects described cutting portion, and described plural runner converter section includes the described multiple runner through cutting respectively, and described plural fluid section flows through one in described plural runner converter section respectively;
One multiplication portion, in conjunction with the output of described plural runner converter section, by superimposed for the runner through described plural runner converter section, exports the described multi-layer film structure having multilayer material and be formed by stacking; And
Co-extrusion exports one of described multi-layer film structure and extrudes portion, connects the output in described multiplication portion.
2. the shunting multiplying assembly with thickness gradient change according to claim 1, it is characterized in that, the fluid cutting of described multiple runner is two fluid section by described cutting portion, and described two fluid section have the runner of identical number.
3. the shunting multiplying assembly with thickness gradient change according to claim 1, it is characterized in that, the tangent plane in described cutting portion is an inclined-plane or a curved surface.
4. the shunting multiplying assembly with thickness gradient change according to claim 2, it is characterized in that, described runner converter section comprises and has same stream number of channels object one first flow converter section and one second runner converter section, and described two fluid section flow through described first flow converter section and described second runner converter section respectively.
5. the shunting multiplying assembly with thickness gradient change according to claim 1, is characterized in that, described plural runner converter section is in order to the relative transfer position of the multiple runners in conversion wherein each runner converter section.
6. the shunting multiplying assembly with thickness gradient change according to claim 5, it is characterized in that, described multiplication portion is by superimposed through the runner of described plural runner converter section photograph to transfer position, and the relative transfer position entering the runner in described multiplication portion is different from the relative position of the multiple runners initially distinguished through described distributary division.
7. the shunting multiplying assembly with thickness gradient change according to claim 5, it is characterized in that, the thickness of the multiple runners in described plural runner converter section has graded.
8. utilize the multilayer film formation method of shunting multiplying assembly that has a thickness gradient change, it is characterized in that, described method comprises:
Input material;
Conveying material to described in there is the distributary division of shunting multiplying assembly of thickness gradient change, material divides into the fluid of multiple runner through described distributary division;
The fluid of described multiple runner is delivered to all branches, described cutting portion is located at the output of described distributary division, cutting is plural fluid section, described plural fluid section includes the fluid of the multiple runners through cutting respectively, and two or more fluid section described in the irregular tangent plane cutting in wherein said cutting portion changes to cause the thickness gradient of described multi-layer film structure;
Described plural fluid section flows through plural runner converter section respectively, and described runner converter section connects described cutting portion, and is incorporated into a multiplication portion;
The fluid of the multiple runners included by each in described plural fluid section is superimposed on described multiplication portion; And
The fluid being superimposed on multiple runners in described multiplication portion exports in the portion of extruding, and produces the multi-layer film structure having multilayer material and be formed by stacking.
9. multilayer film formation method according to claim 8, it is characterized in that, the thickness of the multiple runners of each in described plural runner converter section has graded, the fluid of the multiple runners of each in described plural runner converter section through graded structure compresses and produce in described multiplication portion the structure that each layer has different-thickness.
10. multilayer film formation method according to claim 8, is characterized in that, the multiple runners flowing through described plural runner converter section respectively have certain relative transfer position, and in described multiplication portion in conjunction with time change relative transfer position.
11. multilayer film formation methods according to claim 8, is characterized in that, the fluid of described multiple runners is delivered to described cutting portion, and cutting is two fluid section, and described two fluid section have the runner of identical number.
12. multilayer film formation methods according to claim 11, is characterized in that, the multiple runners being described two fluid section through described cutting portion cutting have certain relative transfer position, and are changing relative transfer position through two runner converter sections.
13. 1 kinds of separate systems formed in conjunction with the shunting multiplying assembly with thickness gradient change for a multi-layer film structure making according to claim 1 and a preposition current divider, it is characterized in that, the fluid exported through described preposition current divider then will input described shunting multiplying assembly by the distributary division of one end of described shunting multiplying assembly.
14. separate systems according to claim 13, is characterized in that, described preposition current divider is the current divider of a disc type, and inside includes multiple runners radially.
15. separate systems according to claim 14, is characterized in that, described multiple runner has different thickness.
16. separate systems according to claim 14, is characterized in that, described multiple runner has different length.
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| CN201210067541.7A CN103302835B (en) | 2012-03-14 | 2012-03-14 | Shunting multiplying assembly, separate system, method and multi-layer film structure |
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| CN106707374B (en) * | 2016-12-07 | 2019-05-07 | 北京化工大学 | A kind of optical multilayer gradient film and its preparation facilities |
| CN109638206A (en) * | 2018-12-29 | 2019-04-16 | 武汉中兴创新材料技术有限公司 | It is used to prepare the device and method for preparing polyolefin microporous membrane of MIcroporous polyolefin film |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5389324A (en) * | 1993-06-07 | 1995-02-14 | The Dow Chemical Company | Layer thickness gradient control in multilayer polymeric bodies |
| US6696142B2 (en) * | 2000-04-07 | 2004-02-24 | Case Western Reserve University | Polymer 1D photonic crystals |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5389324A (en) * | 1993-06-07 | 1995-02-14 | The Dow Chemical Company | Layer thickness gradient control in multilayer polymeric bodies |
| US6696142B2 (en) * | 2000-04-07 | 2004-02-24 | Case Western Reserve University | Polymer 1D photonic crystals |
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