CN103365079A - Making method of photonasty substrate composition for shielding layer formation - Google Patents
Making method of photonasty substrate composition for shielding layer formation Download PDFInfo
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- CN103365079A CN103365079A CN2013100923958A CN201310092395A CN103365079A CN 103365079 A CN103365079 A CN 103365079A CN 2013100923958 A CN2013100923958 A CN 2013100923958A CN 201310092395 A CN201310092395 A CN 201310092395A CN 103365079 A CN103365079 A CN 103365079A
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- shield layer
- light shield
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Abstract
The invention provides a making method of photonasty substrate composition for shielding layer formation, and provides a high quality black matrix without generating pinholes. The making method of the photonasty substrate composition for shielding layer formation is characterized in that photonasty substrate constituent (A) is dissolved in organic solvent constituent (S); the obtained substrate solution is filtered by a PTFE film with pores under 1 micron, so pigment constituent (G) is dispersed in the substrate solution. The photonasty substrate constituent (A) contains alkali soluble resin (A1), light polymerism compound (A2) or light polymerism initiator (A3).
Description
Technical field
The present invention relates to light shield layer and form the manufacture method of using the photonasty substrate composition.
Background technology
For example, in colour display device, in the situation of used color filter, usually has to be called as the cancellate black light shield layer encirclement of black matrix by the structure of the pixel of red (R), green (G), blue (B) formation of all kinds.
As one of manufacture method of described color filter, proposed to deceive matrix as the next door, utilize ink-jetting style to form the method (for example, following patent documentation 1) of the dyed layer of color filter.
In addition, be not limited to color filter, in various display device, also exist by the border between each pixel black matrix is set, thus the situation that the contrast of realization image improves.
Black matrix is for example with containing the anti-corrosion agent composition of black pigment and forming by lithography.As black pigment, usually use carbon black (for example, patent documentation 1).
Yet the impurity that exists in the anti-corrosion agent composition, foreign matter are the flaw (surface imperfection) that produces corrosion-resisting pattern, the reason of pin hole.Put down in writing a kind of manufacture method of anti-corrosion agent composition in the patent documentation 2, wherein, in order to remove the minuteness particle that produces in the resist solution keeping, and had the operation of using filtrator with specific current potential that anti-corrosion agent composition is filtered.
The prior art document
Patent documentation
Patent documentation 1: TOHKEMY 2004-325736 communique
Patent documentation 2: TOHKEMY 2004-212975 communique
Summary of the invention
Invent problem to be solved
In the manufacture method of the anti-corrosion agent composition that comprises aforesaid filter progress, normally after base material component etc. is all mixed, through filter progress.
When making black matrix, be present in the uneven homogenize etc. that impurity in photoresist, the organic solvent or foreign matter can make black matrix surface produce pin hole etc. and cause pattern.
In order to make the high-quality black matrix that does not produce pin hole etc., need to remove impurity or foreign matter in photoresist, the organic solvent.
For the method for dealing with problems
In view of the above fact, the inventor etc. find a kind of method, when making black matrix, by using PTFE film (poly tetrafluoroethylene) that impurity or the foreign matter that exists in photoresist, the organic solvent filtered, thereby remove these impurity or foreign matter, the high-quality black matrix that does not produce pin hole etc. is provided thus.
The present invention is that a kind of light shield layer forms the manufacture method with the photonasty substrate composition, it is characterized in that, photonasty base material component (A) is dissolved in the Elements in Organic Solvents (S), be after PTFE film below the 1 μ m filters the substrate solution of gained, pigment composition (G) to be scattered in this substrate solution with the aperture.
The invention effect
Form manufacture method with the photonasty substrate composition according to light shield layer according to the present invention, the high-quality black matrix that does not produce pin hole etc. can be provided.
Embodiment
Light shield layer forms the manufacture method with the photonasty substrate composition
Light shield layer of the present invention forms the manufacture method with the photonasty substrate composition, it is characterized in that, make photonasty base material component (A) (below, be called (A) composition.) be dissolved in Elements in Organic Solvents (S) (below, be called (S) composition.) in, be after the following PTFE film of 1 μ m filters the substrate solution of gained with the aperture, make pigment composition (G) (below, be called (G) composition.) be scattered in this substrate solution.
For the photonasty substrate composition that utilizes manufacture method of the present invention to make, because through utilizing the filter progress of PTFE film, thereby the impact of the foreign matter that can not be subject to existing in the substrate solution or impurity and presenting when forming light shield layer does not produce the high-quality of pin hole etc.
(A) composition
Used (A) composition is not particularly limited in the manufacture method of light shield layer formation of the present invention with the photonasty substrate composition, can use in the past known material.For example, can list comprise alkali soluble resin (A1) (below, be called (A1) composition.), optical polymerism compound (A2) (below, be called (A2) composition.) and Photoepolymerizationinitiater initiater (A3) (below, be called (A3) composition.) and the material that solidifies by light such as irradiation ultraviolet radiations.By make through the irradiation light partly solidified, thereby the pattern of the shape that can obtain to expect.
(A1) composition
Among the present invention, (A1) composition can use following alkali soluble resin (A1-1) (below, be called (A1-1) composition.) or following alkali soluble resin (A1-2) with photo-curable (below, be called (A1-2) composition.)。
(A1-1) composition
As (A1-1) composition, can list: be selected from acrylic acid, methacrylic acids etc. have the material more than a kind in the monomer of carboxyl, with be selected from methyl acrylate, methyl methacrylate, ethyl acrylate, β-dimethyl-aminoethylmethacrylate, acrylic acid 2-hydroxyl ethyl ester, HEMA, methacrylic acid 2-hydroxypropyl acrylate, n-butyl acrylate, n-BMA, isobutyl acrylate, isobutyl methacrylate, benzyl acrylate, benzyl methacrylate, acrylic acid benzene oxygen ester, methacrylic acid benzene oxygen ester, isobornyl acrylate, isobornyl methacrylate, glycidyl methacrylate, styrene, acrylamide, the multipolymer of material more than a kind in the vinyl cyanide etc.;
The resins such as phenol phenolic varnish type acrylic acid epoxy ester polymer, phenol phenolic varnish type epoxymethacrylate polymkeric substance, cresols phenolic varnish type acrylic acid epoxy ester polymer, cresols phenolic varnish type epoxymethacrylate polymkeric substance, bisphenol A-type acrylic acid epoxy ester polymer, bisphenol S type acrylic acid epoxy ester polymer.
These resins have been owing to having imported acryloyl group or methacryl has improved cross-linking efficiency, and the photostability of filming, chemical reagent resistance are excellent.
Consist of in the monomer component of above-mentioned (A1-1) composition, the content that acrylic acid, methacrylic acid etc. has a monomer component of carboxyl is preferably the scope of 5～40 quality %.
(A1-2) composition
As (A1-2) composition, can list the polymkeric substance shown in the following general formula (1).Compound shown in this general formula (1) is owing to himself have an optical polymerism (photo-curable), thereby forms for the photomask that contains it and use photoresist, by the raising transmission of ultraviolet rays, can further improve light sensitivity.
[changing 1]
(in the formula, X is the group shown in the following chemical formula (2), and Y removes the acid anhydride (residue CO-O-CO-), Z are to remove 2 residues behind the acid anhydride from the tetracarboxylic dianhydride from dicarboxylic anhydride.)
[changing 2]
Concrete example as the dicarboxylic anhydride that above-mentioned Y is derived (removing acid anhydride's dicarboxylic anhydride before) can list such as maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrabydrophthalic anhydride, hexahydrophthalic anhydride, methyl carbic anhydride, chlorendic anhydride, methyl tetrahydrophthalic anhydride, glutaric anhydride etc.
In addition, concrete example as the tetracarboxylic dianhydride that above-mentioned Z is derived (removing 2 acid anhydrides tetracarboxylic dianhydride before) can list tetracarboxylic dianhydrides such as pyromellitic acid acid anhydride, benzophenone tetracarboxylic dianhydride, biphenyl tetracarboxylic dianhydride, xenyl ether tetracarboxylic dianhydride etc.
(A1) composition can be used alone, also can mix more than 2 kinds and use.In addition, can only use above-mentioned (A1-1) composition, also can only use (A1-2) composition, can also and use both.
The matter average molecular weight (Mw) of (A1) composition among the present invention (utilizing the polystyrene conversion benchmark of gel permeation chromatography) is not particularly limited, and is preferably 1000～1000000, more preferably 3000～50000, most preferably is 5000～15000.If the upper limit than this scope is little, then have the dissolubility to the resist solvent that is enough to as resist, if larger than the lower limit of this scope, then the corrosion-resisting pattern cross sectional shape is good.
(A2) composition
As (A2) composition among the present invention, can list methyl acrylate, methyl methacrylate, acrylic acid 2-hydroxyl ethyl ester, HEMA, methacrylic acid 2-hydroxypropyl acrylate, glycol diacrylate, ethylene glycol dimethacrylate, triethylene glycol diacrylate, TEGDMA, tetraethylene glycol diacrylate, the TEG dimethylacrylate, propylene glycol diacrylate, the propylene glycol dimethylacrylate, trimethylolpropane triacrylate, trimethylol-propane trimethacrylate, tetra methylol propane tetraacrylate, tetra methylol propane tetramethyl acrylate, pentaerythritol triacrylate, pentaerythritol acrylate trimethyl, tetramethylol methane tetraacrylate, pentaerythritol tetramethylacrylate, dipentaerythritol five acrylate, dipentaerythritol pentamethyl acrylate, the dipentaerythritol tetraacrylate, dipentaerythritol acrylate, dipentaerythritol hexamethyl acrylate, 1, the 6-hexanediyl ester, benzyl acrylate, benzyl methacrylate, phenolphthalein base (Cardo) epoxy diacrylate, acrylic acid, methacrylic acid etc., but be not limited to these materials.
(A2) composition can be used alone or two or more kinds may be used.
In addition, among the present invention, the polymkeric substance with alkali-soluble of optical polymerism is included in above-mentioned (A1) composition, and the monomer with optical polymerism is included in (A2) composition.
State in the use in the situation of (A1-1) composition, (A2) composition is preferably the scope of 5～500 mass parts with respect to these (A1-1) composition 100 mass parts.Preferred scope is 20～300 mass parts.
Use level by making (A2) composition is more than the lower limit of above-mentioned scope, thereby the curing when being difficult to produce exposure is bad, can obtain sufficient thermotolerance, chemical reagent resistance.In addition, aspect obtaining that good tunicle forms ability, film after preventing from developing is residual, be preferably below the higher limit of above-mentioned scope.
(A3) composition
(A3) composition among the present invention is not particularly limited, and can use so far the Photoepolymerizationinitiater initiater of using as photosensitive composite and the material that proposes.As (A3) composition, preferably containing oxime is Photoepolymerizationinitiater initiater, and more preferably containing the oxime shown in the following formula (3) is Photoepolymerizationinitiater initiater.More preferably make in the formula (3) with R
aThe carbazyl of basis representation and R
cIn the base contained oxime oxygen with respect to the C=N key be shown as trans three-dimensional conformation, namely the ratio of the isomeride of the three-dimensional conformation as following formula (6) (trans body) is more than 90%.The ratio that is accompanied by such isomeride uprises, and the light shield layer after the exposure forms with the dissolubility reduction of photosensitive polymer combination to developer, the craspedodrome raising of formed pattern.
[changing 3]
[R here,
aRepresent following formula (4), R
bOrganic group, the R of expression monovalence
cRepresent following formula (5).]
[changing 4]
(R
A1Expression can have substituent heterocyclic radical, condensed ring formula aromatic series base or aromatic series base, R
A2The organic group of expression monovalence.)
[changing 5]
(R
C1The organic group of expression monovalence.)
[changing 6]
[R here,
aRepresent above-mentioned formula (4), R
bOrganic group, the R of expression monovalence
cRepresent above-mentioned formula (5).]
In the above-mentioned formula (4), R
A1That expression can have is substituent, heterocyclic radical, condensed ring formula aromatic series base or aromatic series base.As heterocyclic radical, can list heterocyclic radicals at least 1 atom comprising in nitrogen-atoms, sulphur atom and the oxygen atom, 5 yuan of above preferred 5 yuan of rings of ring or 6 yuan of rings.This heterocyclic radical can comprise condensed ring.As the example of heterocyclic radical, can list nitrogenous 5 yuan of cyclic groups such as pyrrole radicals, imidazole radicals, pyrazolyl; Nitrogenous 6 yuan of cyclic groups such as pyridine radicals, pyrazinyl, pyrimidine radicals, pyridazinyl; The nitrogenous sulfenyl that contains such as thiazolyl, isothiazolyl; The nitrogenous oxygen bases that contain such as oxazolyl, isoxazolyl; Thienyl, thiapyran base etc. contain sulfenyl; Furyl, pyranose etc. contain the oxygen base; Etc..In the middle of these, preferably comprise the heterocyclic radical of 1 nitrogen-atoms or sulphur atom.Can comprise condensed ring in this heterocycle.As the example of the heterocyclic radical that comprises condensed ring, can list benzothienyl etc.As R
A1The substituting group that can have can list the alkyl of carbon number 1～5, the alkoxy of carbon number 1～5 etc.
As condensed ring formula aromatic series base, can list naphthyl, anthryl, phenanthryl etc.In addition, as the aromatic series base, can list phenyl.
Heterocyclic radical, condensed ring formula aromatic series base or aromatic series base can have substituting group.Particularly at R
A1In the situation for the aromatic series base, preferably has substituting group.As such substituting group, can list-NO
2,-CN ,-SO
2R
3,-COR
3,-NR
4R
5,-R
6Deng.
Above-mentioned R
3Represent independently respectively alkyl, they can be replaced by halogen atom, also can be interrupted by ehter bond, thioether bond, ester bond.R
3In alkyl be preferably the alkyl of carbon number 1～5, can list such as methyl, ethyl, propyl group, isopropyl, butyl, isobutyl etc.
Above-mentioned R
4, R
5Represent independently respectively hydrogen atom, alkyl or alkoxy, they can be replaced by halogen atom, and in the middle of these, the alkylene moiety of alkyl and alkoxy can be interrupted by ehter bond, thioether bond or ester bond.In addition, R
4With R
5Can also in conjunction with and formation ring structure.R
4, R
5In alkyl or the alkoxy alkyl or the alkoxy that are preferably carbon number 1～5, can list such as methyl, ethyl, propyl group, isopropyl, butyl, isobutyl, methoxyl, ethoxy or propoxyl group etc.
As R
4With R
5In conjunction with and the ring structure that can form can list heterocycle.As this heterocycle, can list the heterocycle of～7 yuan of rings of above, the preferred 5 yuan of rings of 5 yuan of rings of at least 1 atom that comprises in nitrogen-atoms, sulphur atom and the oxygen atom.This heterocycle can comprise condensed ring.As the example of heterocycle, can list piperidine ring, morpholine ring, thiomorpholine ring etc.In the middle of these, preferred morpholine ring.
Above-mentioned R
6The alkyl that part or all of expression hydrogen atom can be replaced by halogen atom.R
6In alkyl be preferably the alkyl of carbon number 1～5, can list such as methyl, ethyl, propyl group, isopropyl, butyl, isobutyl etc.
In the middle of above-mentioned, as R
A1Preferred example, can list pyrrole radicals, pyridine radicals, thienyl, thiapyran base, benzothienyl, naphthyl, be combined with the phenyl as substituent methyl or morpholinyl.
In the above-mentioned formula (4), R
A2The organic group of expression monovalence.As this organic group, preferred-R
7,-OR
7,-COR
7,-SR
7,-NR
7R
8Shown group.Above-mentioned R
7, R
8Represent independently respectively alkyl, thiazolinyl, aryl, aralkyl or heterocyclic radical, they can be replaced by halogen atom and/or heterocyclic radical, and in the middle of these, the alkylene moiety of alkyl and aralkyl can be interrupted by unsaturated link, ehter bond, thioether bond, ester bond.In addition, R
7With R
8Can also in conjunction with and form ring structure with nitrogen-atoms.
As above-mentioned R
7, R
8Shown alkyl is preferably the alkyl of carbon number 1～20, the alkyl of carbon number 1～5 more preferably.As the example of alkyl, can list the group of the straight chain shape such as methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, isobutyl, sec-butyl, the tert-butyl group, n-pentyl, isopentyl, sec-amyl, tertiary pentyl, n-hexyl, n-heptyl, n-octyl, iso-octyl, secondary octyl, uncle's octyl group, n-nonyl, different nonyl, positive decyl, isodecyl or a chain.In addition, this alkyl can have substituting group.As the example with substituent alkyl, can list methoxyethoxyethyl, ethoxy ethoxy ethyl, propoxyl group ethoxyethyl group, methoxy-propyl etc.
As above-mentioned R
7, R
8Shown thiazolinyl is preferably the thiazolinyl of carbon number 1～20, the thiazolinyl of carbon number 1～5 more preferably.As the example of thiazolinyl, can list the group of the straight chain shape such as ethene (vinyl) base, allyl, butenyl group, ethene (ethenyl) base, propenyl or a chain.In addition, this thiazolinyl can have substituting group.As having substituent example, can list 2-(benzoxazole-2-yl) vinyl etc.
As above-mentioned R
7, R
8Shown aryl is preferably the aryl of carbon number 6～20, the aryl of carbon number 6～10 more preferably.As the example of aryl, can list phenyl, tolyl, xylyl, ethylphenyl, naphthyl, anthryl, phenanthryl etc.
As above-mentioned R
7, R
8Shown aralkyl is preferably the aralkyl of carbon number 7～20, the aralkyl of carbon number 7～12 more preferably.As the example of aralkyl, can list benzyl, α-methylbenzyl, alpha, alpha-dimethylbenzyl, phenylethyl, phenyl vinyl etc.
As above-mentioned R
7, R
8Shown heterocyclic radical can list the heterocyclic radicals of～7 yuan of rings of above, the preferred 5 yuan of rings of 5 yuan of rings of at least 1 atom that comprises in nitrogen-atoms, sulphur atom and the oxygen atom.This heterocyclic radical can comprise condensed ring.As the example of heterocyclic radical, can list pyrrole radicals, pyridine radicals, pyrimidine radicals, furyl, thienyl etc.
These R
7, R
8Can be replaced by halogen atom.As the example that is replaced by halogen atom, can list single fluoro methyl, two fluoro methyl, three fluoro methyl, perfluoro ethyl, chlorphenyl, chlorobenzyl etc.
And then, these R
7, R
8In, the alkylene moiety of alkyl and aralkyl can be interrupted by unsaturated link, ehter bond, thioether bond, ester bond.
In addition, as passing through R
7With R
8In conjunction with and the ring structure that forms can list heterocycle.As this heterocycle, can list the heterocycle of～7 yuan of rings of above, the preferred 5 yuan of rings of 5 yuan of rings of at least 1 atom that comprises in nitrogen-atoms, sulphur atom and the oxygen atom.This heterocycle can comprise condensed ring.As the example of heterocycle, can list piperidine ring, morpholine ring, thiomorpholine ring etc.
In the middle of these, as R
A2, most preferably be ethyl.
In above-mentioned formula (3) or the formula (6), R
bOrganic group for monovalence.Wherein, be preferably the organic group of the monovalence shown in the following formula (7).
[changing 7]
In the above-mentioned formula (7), R
B1The alkylidene of the carbon number 1～5 that expression can be interrupted by oxygen atom.As such alkylidene, can list the group of the straight chain shape such as methylene, ethylidene, positive propylidene, isopropylidene, positive butylidene, isobutylene, sec-butylidene, positive pentylidene, isopentylidene, secondary pentylidene or a chain.In the middle of these, R
B1Most preferably be isopropylidene.
In the above-mentioned formula (7), R
B2Expression-NR
B3R
B4Organic group (the R of shown monovalence
B3, R
B4The organic group that represents independently respectively monovalence).In such organic group, if R
B2Structure be the structure shown in the following formula (8), be to be preferred aspect Photoepolymerizationinitiater initiater deliquescent improving oxime then.
[changing 8]
In the above-mentioned formula (8), R
B5, R
B6Be the alkyl of carbon number 1～5 independently respectively.As such alkyl, can list methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, isobutyl, sec-butyl, the tert-butyl group, n-pentyl, isopentyl, sec-amyl, tertiary pentyl etc.In the middle of these, R
B5, R
B6Most preferably be methyl.
In above-mentioned formula (3) or the formula (6), R
cThe organic group of expression monovalence.Wherein, preferably represent the such organic group of following formula (9).
[changing 9]
In the above-mentioned formula (9), R
C1Be preferably the alkyl of carbon number 1～5.As such alkyl, can list methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, isobutyl, sec-butyl, the tert-butyl group, n-pentyl, isopentyl, sec-amyl, tertiary pentyl etc.In the middle of these, R
C1Most preferably be methyl.
In the Photoepolymerizationinitiater initiater of the oxime ester system shown in above-mentioned formula (3) or the formula (6), as particularly preferred concrete example, can list the compound shown in following formula (10)～(15).
[changing 10]
[changing 11]
[changing 12]
[changing 13]
[changing 14]
[changing 15]
Among the present invention, the oxime shown in above-mentioned except comprising (3) is the Photoepolymerizationinitiater initiater in the photonasty base material component (A), can also comprise various Photoepolymerizationinitiater initiaters.Can list for example 1-hydroxycyclohexylphenylketone; 2-hydroxy-2-methyl-1-phenyl-propane-1-ketone; 1-(4-(2-hydroxyl-oxethyl) phenyl)-2-hydroxy-2-methyl-1-propane-1-ketone; 1-(4-isopropyl phenyl)-2-hydroxy-2-methyl propane-1-ketone; 1-(4-dodecylphenyl)-2-hydroxy-2-methyl propane-1-ketone; 2; 2-dimethoxy-1; 2-diphenylethane-1-ketone; two (4-dimethylaminophenyl) ketone; 2-methyl isophthalic acid-(4-(methyl mercapto) phenyl)-2-morpholino propane-1-ketone; 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-butane-1-ketone; 2; 4; 6-trimethylbenzoyl diphenyl phosphine oxide; 4-benzoyl-4 '-methyl dimethoxy base thioether; the 4-dimethylaminobenzoic acid; 4-dimethylaminobenzoic acid methyl esters; EDMAB; 4-dimethylaminobenzoic acid butyl ester; 4-dimethylamino-2-ethylhexyl benzoic acid; 4-dimethylamino-2-isoamyl benzene formic acid; benzyl-'beta '-methoxy ethyl acetal; the benzil dimethyl ketal; 1-phenyl-1; 2-propanedione-2-(adjacent ethoxy carbonyl) oxime; o-benzoyl yl benzoic acid methyl esters; 2; the 4-diethyl thioxanthone; CTX; 2; 4-dimethyl thioxanthones; 1-chloro-4-propoxyl group thioxanthones; thioxanthene; 2-diuril ton; 2; 4-diethyl thioxanthene; 2-methyl thioxanthene; 2-isopropyl thioxanthene; the 2-EAQ; the prestox anthraquinone; 1; 2-benzo anthraquinone; 2; 3-diphenyl anthraquinone; azoisobutyronitrile; benzoyl peroxide; cumene peroxide; 2-mercaptobenzimidazole; the 2-mercaptobenzoxazole; 2-mercaptobenzothiazole; 2-(Chloro-O-Phenyl)-4; 5-two (m-methoxyphenyl)-imidazolinyl dipolymer; benzophenone; the 2-chlorobenzophenone; p; p '-two (dimethylamino) benzophenone; 4; 4 '-two (diethylamino) benzophenone; 4; 4 '-dichloro benzophenone; 3; 3-dimethyl-4-methoxy benzophenone; benzil; benzoin; benzoin methyl ether; the benzoin ethylether; the benzoin isopropyl ether; the benzoin n-butyl ether; the benzoin isobutyl ether; the benzoin butyl ether; acetophenone; 2; the 2-diethoxy acetophenone; to dimethyl acetophenone; to the dimethylamino propiophenone; dichloroacetophenone; trichloroacetophenone; p-tert.-butyl acetophenone; to the dimethylamino benzoylformaldoxime; to tert-butyl group trichloroacetophenone; to tert-butyl group dichloroacetophenone; α; α,α-dichloro-4-phenoxy acetophenone; thioxanthones; 2-methyl thioxanthones; ITX; Dibenzosuberone; amyl group-4-dimethylaminobenzoic acid ester; the 9-phenylacridine; 1; 7-pair-(9-acridinyl) heptane; 1; 5-pair-(9-acridinyl) pentane; 1; 3-pair-(9-acridinyl) propane; to the methoxyl triazine; 2; 4; 6-three (trichloromethyl) s-triazine; 2-methyl-4; two (trichloromethyl) s-triazine of 6-; 2-[2-(5-methylfuran-2-yl) vinyl]-4; two (trichloromethyl) s-triazine of 6-; 2-[2-(furans-2-yl) vinyl]-4; two (trichloromethyl) s-triazine of 6-; 2-[2-(4-diethylamino-2-aminomethyl phenyl) vinyl]-4; two (trichloromethyl) s-triazine of 6-; 2-[2-(3; the 4-Dimethoxyphenyl) vinyl]-4; two (trichloromethyl) s-triazine of 6-; 2-(4-methoxyphenyl)-4; two (trichloromethyl) s-triazine of 6-; 2-(4-ethoxybenzene vinyl)-4; two (trichloromethyl) s-triazine of 6-; 2-(4-n-butoxy phenyl)-4; two (trichloromethyl) s-triazine of 6-; 2; 4-pair-trichloromethyl-6-(3-bromo-4-methoxyl) phenyl s-triazine; 2; 4-pair-trichloromethyl-6-(2-bromo-4-methoxyl) phenyl s-triazine; 2; 4-pair-trichloromethyl-6-(3-bromo-4-methoxyl) styryl phenyl-s-triazine; 2,4-pair-trichloromethyl-6-(2-bromo-4-methoxyl) styryl phenyl s-triazine etc.
In the middle of these, preferably use triazines such as methoxyl triazines, 2,4,6-three (trichloromethyl) s-triazine, 2-methyl-4, two (trichloromethyl) s-triazine of 6-, 2-[2-(5-methylfuran-2-yl) vinyl]-4, two (trichloromethyl) s-triazine of 6-, 2-[2-(furans-2-yl) vinyl]-4, two (trichloromethyl) s-triazine of 6-, 2-[2-(4-diethylamino-2-aminomethyl phenyl) vinyl]-4, two (trichloromethyl) s-triazine of 6-, 2-[2-(3, the 4-Dimethoxyphenyl) vinyl]-4, two (trichloromethyl) s-triazine of 6-, 2-(4-methoxyphenyl)-4, two (trichloromethyl) s-triazine of 6-, 2-(4-ethoxybenzene vinyl)-4, two (trichloromethyl) s-triazine of 6-, 2-(4-n-butoxy phenyl)-4, two (trichloromethyl) s-triazine etc. of 6-have the triaizine compounds such as triazines of halogenated methyl; 2-(Chloro-O-Phenyl)-4,5-two (the m-methoxyphenyl)-imidazole-based compounds such as imidazole radicals dipolymer; And 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-butane-amino ketones compounds such as 1-ketone.
Among the present invention, as (A3) composition, may be used Multiple components.Particularly, preferred also with the compound shown in the above-mentioned formula (3) and at least a compound in addition.Effectively activate at the light that utilizes small exposure, also further improve aspect light sensitivity, the development nargin (margin), preferably as described above also with at least two kinds of compounds ((A3) composition).
The mixing ratio of the compound shown in the above-mentioned formula (3) and other compounds (particularly triaizine compounds, imidazolium compounds and amino ketones compound) except the compound shown in the above-mentioned formula (3) is preferably by quality ratio 10: 90～90: 10, is particularly preferably 20: 80～80: 20.Mixing ratio by making the compound shown in the above-mentioned formula (3) and other compounds except the compound shown in the above-mentioned formula (3) is in above-mentioned scope, thereby both compounds interact effectively, can further improve light shield layer and form light sensitivity, the development nargin of using photosensitive polymer combination.
Light shield layer of the present invention forms in the manufacture method of using the photonasty substrate composition, and the use level of above-mentioned (A3) composition is preferably the scope of 0.1～30 mass parts with respect to (A1) composition 100 mass parts.
In addition, as (A3) composition, use contains the material that oxime is Photoepolymerizationinitiater initiater, when the ratio of particularly stating in the use the oxime shown in the formula (6) and be the isomeride (trans body) that is shown as the three-dimensional conformation as above-mentioned formula (6) in the Photoepolymerizationinitiater initiater is material more than 90%, although improved the resist characteristic, but solvent solubility is impaired, consequently produces easily pin hole.Yet, light shield layer of the present invention forms with in the manufacture method of photosensitive polymer combination, by before the dispersion of pigment composition, be that PTFE film below the 1 μ m filters substrate solution with the aperture, even to contain the oxime shown in the above-mentioned formula (6) be the composition of Photoepolymerizationinitiater initiater thereby use, also can alleviate the generation of pin hole.
Light shield layer of the present invention forms with in the manufacture method of photosensitive polymer combination, in order to improve coating, adjusting viscosity, and (A) composition is dissolved in (S) composition.
As (S) composition, can list benzene, toluene, dimethylbenzene, MEK, acetone, methyl isobutyl ketone, cyclohexanone, methyl alcohol, ethanol, propyl alcohol, butanols, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, glycerine, the glycol monomethyl methyl ether, ethylene glycol monomethyl ether, propylene glycol monomethyl ether, propylene glycol list ethylether, diethylene glycol monomethyl ether, TC, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, 3-methoxyl butylacetic acid ester, 3-methyl-3-methoxyl butylacetic acid ester, propylene glycol monomethyl ether (PGMEA), the propylene glycol monomethyl ether propionic ester, propylene glycol list ethylether propionic ester, methyl carbonate, ethyl carbonate, propyl carbonate, butyl carbonate etc.Wherein, 3-methoxyl butylacetic acid ester not only forms with the solvable composition in the photosensitive polymer combination for light shield layer and demonstrates excellent dissolubility, and the dispersiveness of the insoluble compositions such as pigment is become well, so preferred.
(S) use amount of composition is not particularly limited, and can be applied to the concentration of substrate etc., suitably set according to coating film thickness.It is 5～100cp that light shield layer among the present invention forms viscosity with photosensitive polymer combination, be preferably 10～50cp, 20～30cp more preferably.In addition, solid component concentration is 5～100 quality %, is preferably the scope of 20～50 quality %.
In addition, light shield layer of the present invention forms with adding hot polymerization inhibitor, defoamer, surfactant etc. in the photosensitive polymer combination.
As above-mentioned hot polymerization inhibitor, can be known hot polymerization inhibitor in the past, can list quinhydrones, Hydroquinone monoethylether etc.
As above-mentioned defoamer, can be known defoamer in the past, can list silicone-based, fluorine based compound.
As above-mentioned surfactant, can be known surfactant in the past, can list the compound of negative ion system, kation system, nonionic system etc.
Manufacture method of the present invention has following operation: (A) composition is dissolved in (S) composition, is that the following PTFE film of 1 μ m filters the substrate solution of gained with the aperture.Among the present invention the aperture of used PTFE film be preferably 0.01～0.9 μ m, more preferably 0.05～0.6 μ m, be particularly preferably 0.1～0.3 μ m.In the manufacture method of the present invention, filtration unit and filter method are not particularly limited, and can use known filtration unit and filter method.
For manufacture method of the present invention, because through the operation of after making (A) composition be dissolved in (S) composition the substrate solution of gained being filtered, thereby can to use the aperture be that the PTFE film of the following such path of 1 μ m filters.Thereby, is inferred and can also remove fine impurity and foreign matter, also can reduce the generation of pin hole.
(G) composition
Among the present invention, as (G) composition, can use the black pigments such as carbon black.In addition, can also with and regulate the material of tone etc. with black, red, blue, green, yellow, purple pigment.Pigment can also suitably use known pigment.
Particularly, in as pigment and the situation with carbon black and other pigments, if 15 quality % in the not enough all pigment of carbon black then can form in the situation with the light sensitivity of photosensitive polymer combination not reducing above-mentioned light shield layer, improve shading rate.
Among the present invention, as (G) composition, preferred Shi Yong perylene be black pigment (below, Jian Cheng is perylene pigment.)。As concrete example, can list De perylene pigment shown in De perylene pigment shown in the following general formula (I) and the following general formula (II).The product that in addition, can preferably use BASF AG to make is called the commercially available product of K0084, K0086 etc.
[changing 16]
(in the formula, R
1, R
2The alkylidene that represents independently respectively carbon number 1～3, R
3, R
4Represent independently respectively hydrogen atom, hydroxyl, methoxyl or acetyl group.)
[changing 17]
(in the formula, R
5, R
6The alkylidene that represents independently respectively carbon number 1～7.)
Compound shown in compound shown in the above-mentioned general formula (I) and the general formula (II) can synthesize with the method for putting down in writing in for example Japanese kokai publication sho 62-1753 communique, the Japanese Patent Publication 63-26784 communique.That is, with perylene-3,5,9,10-tetrabasic carboxylic acid or its dicarboxylic anhydride and amine add thermal response as raw material in water or organic solvent.Then, precipitate again in sulfuric acid by the rough thing with gained, perhaps, in water, organic solvent or their mixed solvent, make its recrystallization, thereby obtain object.
Zhong ， perylene pigment of the present invention can be used alone or two or more kinds may be used.
In addition, be in disperse state for light shield layer is formed with photosensitive polymer combination Zhong De perylene pigment, the mean grain size of preferred Shi perylene pigment is 10～1000nm.
The content that light shield layer of the present invention forms with photosensitive polymer combination Zhong De perylene pigment is preferably 5～250 mass parts with respect to (A1) composition 100 mass parts.Preferred scope is 10～200 mass parts.The content of Tong Guo Shi perylene pigment is more than the lower limit of above-mentioned scope, thereby can obtain good light-proofness.In addition, prevent ill-exposed, solidify bad aspect, the content of preferred Shi perylene pigment is below the higher limit of above-mentioned scope.
Close at Hun in the situation of Shi Yong perylene pigment and above-mentioned pigment, pigment, the use amount of other pigment, pigment is preferred to be that mode more than the 85 quality % arranges in Zhao perylene pigment shared ratio in the summation of pigment overall, Ji perylene pigment and other pigments.More preferably 90 quality %, can also be 100 quality %.
By more than above-mentioned lower limit, thus the light sensitivity in the time of can obtaining to use above-mentioned light shield layer to form to form the thick film that surpasses 2 μ m with photosensitive polymer combination, and can reach the good shading rate of photomask.
In addition, light shield layer of the present invention forms in the manufacture method of using the photonasty substrate composition, preferably the operation through filtering once again after (G) composition is disperseed.At this moment, for (G) composition after preventing from disperseing is removed, preferably using the large filtrator in aperture, for example aperture is the filtrator of 0.6～1.5 μ m.Used filtrator in filter progress once again then is not particularly limited so long as do not remove the filtrator of pigment, can use known filtrator.Can preferably use PTFE film (poly tetrafluoroethylene), PP film (polypropylene screen), PE film (polyethylene film).
Forming in the method for light shield layer with photosensitive polymer combination forming with light shield layer of the present invention, can also be according to expectation, suitably add contain have blended adjuvant, such as surfactant, stabilizing agent etc.
The formation method of＜light shield layer 〉
Below, as forming an embodiment that forms the method for light shield layer with photosensitive polymer combination with light shield layer of the present invention, the example of the method that forms black matrix is described.
At first, use roll coater, reverse coating machine (reverse coater), rod to be coated with contact transfer printing type apparatus for coating or the non-contact type apparatus for coating such as spinner (rotary apparatus for coating), curtain formula curtain coater (curtain flow coater) such as machine, form at substrate coating light shield layer and use photosensitive polymer combination.Substrate uses the substrate with transmitance, for example glass substrate of thick 0.5～1.1mm.
Form adaptation with photosensitive polymer combination in order to improve glass substrate and light shield layer, also silicon-coating coupling agent on glass substrate in advance.Perhaps also can when forming preparation with photosensitive polymer combination, add in advance light shield layer silicone couplet.
After the above-mentioned coating, make its drying and desolventizing.Drying means is not particularly limited, and for example can be any following method: (1) is by hot plate method of dry 60 seconds～120 seconds under 80 ℃～120 ℃, preferred 90 ℃～100 ℃ temperature; (2) at room temperature place several hours～several days method; (3) put into storage heater, infrared heater dozens of minutes～several hours and the method for desolventizing.
Next, across the minus mask, irradiation ultraviolet radiation, excimer laser isoreactivity energy-ray carry out the part exposure.The energy-ray amount of irradiation forms according to light shield layer that difference is preferably for example 30～2000mJ/cm with the composition of photosensitive polymer combination
2About.
By make the film development after the exposure form black matrix pattern with developer solution.Developing method is not particularly limited, such as using infusion process, gunite etc.As the concrete example of developer solution, can list the organic system developer solutions such as monoethanolamine, diethanolamine, triethanolamine; The aqueous solution of NaOH, potassium hydroxide, sodium carbonate, ammoniacal liquor, quaternary ammonium salt etc.
Photosensitive polymer combination is used in light shield layer formation according to the present invention, even thickness surpasses 2 μ m, also can utilize photoetching process (photolithography) to form good pattern.Thereby, can form the light shield layer of the thick films such as black matrix of thick film.
This is considered to because Tong crosses Shi Yong perylene pigment as the light-proofness pigment, thereby makes resin combination can realize transmission exposure light and the characteristic of visible light being carried out shading.
＜distance piece 〉
In addition, in order to be accommodated in the liquid crystal display of two structures between substrate having liquid crystal, make two intervals between substrate keep certain, use light shield layer of the present invention to form with photosensitive polymer combination light shield layer that form, that thickness is certain, can double as to be held on the distance piece that the state between these two substrates arranges.Thickness to light shield layer with such distance piece function is not particularly limited, and is preferably to surpass 2 μ m.
In liquid crystal display in the past, the spacer arrangement that forms with spherical spacer particle or with photosensitive polymer combination is between two substrates.In the situation of using spherical spacer particle, when applying vibration or impacting, distance piece is mobile in liquid crystal, may be impaired in the alignment films that the substrate inner face arranges, if but utilize the present invention then can solve this kind problem.In addition, in the situation of using as mentioned above the distance piece that forms with photosensitive polymer combination, need to form separately black matrix, if but utilize the present invention then do not need to form separately black matrix, the manufacturing process of liquid crystal display can be reduced.
And then, because distance piece has light-proofness, so can prevent that distance piece part is owing to " whiting " that often be in the light transmissive state and cause.
＜color filter 〉
According to the present invention, can form black matrix with thick film.Thereby, thereby in the peristome of ink-jetting style at preformed black matrix, forming in the formation of the black matrix in the method that dyed layer forms color filter, preferred light shield layer of the present invention forms uses photosensitive polymer combination.Black matrix in the method plays the effect of so-called next door (cofferdam (bank)).
In the present invention, the thickness of the black matrix that uses as the next door in the ink-jetting style (cofferdam) is not particularly limited, and preferably surpasses 2 μ m.
Using light shield layer of the present invention to form with photosensitive polymer combination formation can similarly carry out with the formation method of above-mentioned light shield layer as the method for the black matrix in next door (cofferdam).
Then; after the black matrix that forms as next door (cofferdam), repeatedly carry out in the peristome of this black matrix, being coated with the operation of painted China ink and making this painted black operation of solidifying with ink-jetting style, form dyed layer; and then form as required transparent protective film, can make color filter thus.The method of utilizing ink-jetting style to form dyed layer can be used known way.
According to the present invention, can form in the ink-jetting style the black matrix that uses as next door (cofferdam) with thick film, so can prevent from surpassing that the next door is overflowed and the situation of colour mixture occuring to the painted China ink that the peristome of black matrix is given between pixel.
In addition, compare with the situation of black matrix thin (next door is low), can use low viscous painted China ink.
In addition, also can be by as in the past, utilizing photoetching process to form color filter.
Embodiment
Below, be described more specifically the present invention by embodiment, but the present invention is not subjected to the restriction of following examples.
(synthesizing of resin (A))
According to TOHKEMY 2001-354735 communique, in the 500mL four-hole boiling flask, add bisphenol fluorene type epoxy resin 235g (epoxide equivalent 235), tetramethyl ammonium chloride 110mg, 2,6-di-tert-butyl-4-methy phenol 100mg and acrylic acid 72.0g, on one side with 25mL/ minute speed to wherein being blown into air, on one side 90～100 ℃ of lower heating for dissolving.
Then, be slowly to heat up under the state of gonorrhoea at solution, be heated to 120 ℃ it is dissolved fully.Become gradually transparent thickness at this solution, but still continue to stir.
At this moment, measure acid number, continuous heating is stirred to the not enough 1.0mgKOH/g of acid number.Acid number arrives target needs 12 hours.Then, be cooled to room temperature, obtain bisphenol fluorene type acrylic acid epoxy ester water white transparency and solid shape, shown in the following chemical formula (3).
[changing 18]
Next, after adding propylene glycol monomethyl ether 600g and dissolving in the above-mentioned bisphenol fluorene type acrylic acid epoxy ester 307.0g that obtains like this, mix biphenyl tetracarboxylic dianhydride 78g and tetraethylammonium bromide 1g, slowly heat up, make it 110～115 ℃ of lower reactions 4 hours.
After the disappearance of confirming anhydride group, mix 1,2,3,6-tetrabydrophthalic anhydride 38.0g makes its reaction 6 hours under 90 ℃, obtain above-mentioned chemical formula (1) (in the formula, X is for removing 2 divalent residues behind the hydroxyl from the compound shown in the above-mentioned chemical formula (3), Y is from 1,2,3, remove the divalent residue behind the acid anhydride in the 6-tetrabydrophthalic anhydride, Z is for removing 4 valency residues behind 2 acid anhydrides from biphenyl tetracarboxylic dianhydride.Mol ratio=the 50.0/50.0 of Y/Z in the formula.) shown in compound 1.Utilize IR spectrum to confirm the disappearance of acid anhydrides.
[oxime is the synthetic of Photoepolymerizationinitiater initiater (B)]
[changing 19]
N-ethyl carbazole 7.8g (40mmol) is dissolved among the methylene chloride 40ml, adds aluminum chloride 5.8g (44mmol).Cool off in ice bath on the limit, and the limit drips 1-naphthoyl chloride (naphthoyl chloride) 8.4g (44mmol) when making reactant liquor remain on 5 ℃.The limit slowly was warming up to room temperature with 1 hour, and stir on the limit, then at room temperature made its reaction 3 hours.Reactant liquor is cooled off in ice bath, behind the adding aluminum chloride 5.8g (44mmol), cool off in ice bath on the limit again, and the limit drips 2-butyl chloride 4.6g (44mmol) when the temperature with reactant liquor remains on below 5 ℃.The limit slowly was warming up to room temperature with 1 hour, after stir on the limit, it was at room temperature reacted 3 hours.Reactant liquor is added drop-wise among the frozen water 300ml, adds ethyl acetate 200ml, extract, re-use ethyl acetate 100ml water layer is extracted, merge with organic layer, extract with 10% aqueous sodium carbonate 300ml.Water 300ml extracts organic layer again, with anhydrous magnesium sulfate this organic layer is carried out drying after, heat up in a steamer desolventizing with evaporator, the result obtains oily mater.(developing solvent is ethyl acetate: normal hexane=1: 1 (mass ratio)) make with extra care, obtain faint yellow solid to utilize silica gel column chromatography.
The faint yellow solid (0.81g, 0.002mol) of gained is dissolved among the ethanol 10ml, adds hydroxylamine hydrochloride (0.15g, 0.0021mmol), refluxed 2 hours.After heating up in a steamer ethanol, add entry, the dissolving inorganics, and filter.Filtrate is dissolved in the ethyl acetate, carries out drying with magnesium sulphate, utilize evaporator to obtain the material of oxime body.The substance dissolves of gained in THF6ml, is added acetyl chloride (0.46g, 0.0044mol) and also stirs.At room temperature in reactant liquor, drip triethylamine (0.42g, 0.0046mol).Confirm the sedimentation of salt when dripping.Stir after 2 hours, add water 40ml, 40ml extracts with ethyl acetate.With organic layer water 40ml washing 2 times, then with unsaturated carbonate aqueous solutions of potassium 40ml washing 2 times, behind the dried over mgso organic layer, heat up in a steamer desolventizing with evaporator.(developing solvent is ethyl acetate: normal hexane=1: 1 (mass ratio)) make with extra care, the oxime shown in the above-mentioned formula (23) of acquisition faint yellow solid is Photoepolymerizationinitiater initiater (B) to utilize silica gel column chromatography.
The structure of this compound is used
1HNMR identifies.
1HNMR(CDCl
3)：δ8.7(s，1H)，8.5(s，1H)，8.2-7.9(m，5H)，7.7-7.4(m，6H)，4.9(s，1H)，4.4(q，2H)，3.3(d，2H)，2.4(s，3H)，2.2(s，3H)，1.8(s，3H)，1.4(t，3H)，1.2(d，3H)
[preparation of Photoepolymerizationinitiater initiater]
The oxime of gained is Photoepolymerizationinitiater initiater (B), and (developing solvent is water: acetonitrile=9: 1 (mass ratio)) be separated into trans body and cis body, the oxime of the trans body shown in the acquisition formula (24) is Photoepolymerizationinitiater initiater (anti--(B)) with the oxime of the cis body shown in the formula (25) is Photoepolymerizationinitiater initiater (suitable-(B)) using thereafter silica gel column chromatography.They are mixed preparation Photoepolymerizationinitiater initiater 1～3 according to the ratio shown in the table 1.
[changing 20]
[changing 21]
[table 1]
| ? | Instead-(B) (%) | Suitable-(B) (%) | Purity (%) | Instead-(B)/(B) overall |
| Photoepolymerizationinitiater initiater 1 | 95 | 0 | 95 | 1.00 |
| Photoepolymerizationinitiater initiater 2 | 90 | 5 | 95 | 0.95 |
| Photoepolymerizationinitiater initiater 3 | 80 | 5 | 85 | 0.94 |
(embodiment 1～3)
Then, substrate solution 1～3 in the composition shown in the preparation table 2 except coloring agent component, be after the PTFE film (ADVANTEC company system) of 0.2 μ m filters with it with the aperture, above-mentioned colorant as (G) composition is dispersed in each substrate solution with ormal weight, and the light shield layer that forms shown in the preparation table 2 forms uses the photonasty substrate composition.In addition, the unit of the numerical value in the table 2 is mass parts.
[table 2]
DPHA (A2): dipentaerythritol acrylate
Photoepolymerizationinitiater initiater (A3): in embodiment 1, use Photoepolymerizationinitiater initiater 1 (substrate solution 1).In embodiment 2, use Photoepolymerizationinitiater initiater 2 (substrate solution 2).In embodiment 3, use Photoepolymerizationinitiater initiater 3 (substrate solution 3).
Colorant (G): carbon black 25 quality %, solvent: 3-methoxyl butylacetic acid ester, imperial state pigment company system
MA (S): 3-methoxyl butylacetic acid ester
PM (S): propylene glycol monomethyl ether
AN (S): cyclohexanone
Use spin coater, the light shield layer of gained formed with the photonasty substrate composition be applied on the glass substrate with clean surface of thick 1mm (TR25000: chemical industry company system is answered in Tokyo), making its dry film thickness is 1.2 μ m, drying is 2 minutes under 90 ℃, forms light shield layer and forms the film (photographic layer) of using the photonasty substrate composition.
Next, utilize exposure machine (EXM-1066-E01:OAK company system) with irradiation energy quantity of X-rays X 20mJ/cm
2Expose.After the exposure, utilize 0.04% potassium hydroxide developer solution to carry out for 60 seconds with spray regime and develop.Again carry out under 200 ℃ 30 minutes after cure, form matrix pattern, the dot pattern of 20 μ m of thickness 2.5, the black matrix of isolated patterns.The OD value of formed black matrix is 3.0.
The black matrix of Visual Confirmation gained has free of pinholes, and the result is unconfirmed to pin hole, can obtain good black matrix.
(comparative example 1)
Except filtering membrane employing aperture is the PE film (Entegris company system) of 0.2 μ m, by method similarly to Example 1, obtain black matrix.Visual Confirmation has free of pinholes, results verification to tens pin hole.
(comparative example 2)
Except filtering membrane employing aperture is the PP film (KITZ MICRO FILTER company system) of 0.1 μ m, by method similarly to Example 1, obtain black matrix.Visual Confirmation has free of pinholes, results verification to tens pin hole.
According to the above results, demonstrate the light shield layer that the present invention relates to and form with obtaining not produce black matrix pin hole, high-quality in the manufacture method of photonasty substrate composition.
Claims (6)
1. a light shield layer forms the manufacture method of using the photonasty substrate composition, it is characterized in that, photonasty base material component (A) is dissolved in the Elements in Organic Solvents (S), be after PTFE film below the 1 μ m filters the substrate solution of gained, pigment composition (G) to be scattered in this substrate solution with the aperture.
2. light shield layer according to claim 1 forms the manufacture method with the photonasty substrate composition, wherein,
Described photonasty base material component (A) contains alkali soluble resin (A1).
3. light shield layer according to claim 1 and 2 forms the manufacture method with the photonasty substrate composition, wherein,
Described photonasty base material component (A) contains optical polymerism compound (A2).
4. each described light shield layer forms the manufacture method with the photonasty substrate composition according to claim 1～3, wherein,
Described photonasty base material component (A) contains Photoepolymerizationinitiater initiater (A3).
5. light shield layer according to claim 4 forms the manufacture method with the photonasty substrate composition, wherein,
It is Photoepolymerizationinitiater initiater that described Photoepolymerizationinitiater initiater (A3) contains oxime.
6. light shield layer according to claim 1 forms the manufacture method with the photonasty substrate composition, wherein,
Described pigment composition (G) contains black pigment.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6110641A (en) * | 1997-12-04 | 2000-08-29 | Shipley Company, L.L.C. | Radiation sensitive composition containing novel dye |
| JP2001281440A (en) * | 2000-04-03 | 2001-10-10 | Nippon Zeon Co Ltd | Light-shielding film, method for manufacturing the same and use of the same |
| TW594395B (en) * | 2000-09-29 | 2004-06-21 | Nippon Zeon Co | Photoresist composition for insulating film, insulating film for organic electroluminescent element, and process for producing the same |
| CN101799627A (en) * | 2009-02-09 | 2010-08-11 | 日油株式会社 | Positive type photosensitive organic compound |
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| JP4438080B2 (en) * | 2000-09-29 | 2010-03-24 | 日本ゼオン株式会社 | Radiation-sensitive resin composition for forming insulating film and insulating film for organic electroluminescence device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6110641A (en) * | 1997-12-04 | 2000-08-29 | Shipley Company, L.L.C. | Radiation sensitive composition containing novel dye |
| JP2001281440A (en) * | 2000-04-03 | 2001-10-10 | Nippon Zeon Co Ltd | Light-shielding film, method for manufacturing the same and use of the same |
| TW594395B (en) * | 2000-09-29 | 2004-06-21 | Nippon Zeon Co | Photoresist composition for insulating film, insulating film for organic electroluminescent element, and process for producing the same |
| CN101799627A (en) * | 2009-02-09 | 2010-08-11 | 日油株式会社 | Positive type photosensitive organic compound |
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