CN1035294C - 具有异形掺杂岛的半导体器件耐压层 - Google Patents
具有异形掺杂岛的半导体器件耐压层 Download PDFInfo
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- CN1035294C CN1035294C CN93115356A CN93115356A CN1035294C CN 1035294 C CN1035294 C CN 1035294C CN 93115356 A CN93115356 A CN 93115356A CN 93115356 A CN93115356 A CN 93115356A CN 1035294 C CN1035294 C CN 1035294C
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- island
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- shaped doped
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- 230000015556 catabolic process Effects 0.000 abstract description 5
- 239000010410 layer Substances 0.000 abstract 7
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- 230000005684 electric field Effects 0.000 description 13
- 238000000034 method Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
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- 239000013078 crystal Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
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- H01L29/0623—Buried supplementary region, e.g. buried guard ring
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- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/063—Reduced surface field [RESURF] pn-junction structures
- H01L29/0634—Multiple reduced surface field (multi-RESURF) structures, e.g. double RESURF, charge compensation, cool, superjunction (SJ), 3D-RESURF, composite buffer (CB) structures
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- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0821—Collector regions of bipolar transistors
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- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
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- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/7722—Field effect transistors using static field induced regions, e.g. SIT, PBT
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
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Abstract
Description
Claims (1)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN93115356A CN1035294C (zh) | 1993-10-29 | 1993-10-29 | 具有异形掺杂岛的半导体器件耐压层 |
US08/953,077 US6635906B1 (en) | 1993-10-29 | 1997-10-17 | Voltage sustaining layer with opposite-doped islands for semi-conductor power devices |
US10/382,027 US6936867B2 (en) | 1993-10-29 | 2003-03-05 | Semiconductor high-voltage devices |
US10/860,435 US7227197B2 (en) | 1993-10-29 | 2004-06-03 | Semiconductor high-voltage devices |
US11/365,223 US7271067B2 (en) | 1993-10-29 | 2006-03-01 | Voltage sustaining layer with opposite-doped islands for semiconductor power devices |
US11/838,522 US7498614B2 (en) | 1993-10-29 | 2007-08-14 | Voltage sustaining layer with opposite-doped islands for semiconductor power devices |
US12/355,165 US8071450B2 (en) | 1993-10-29 | 2009-01-16 | Method for forming voltage sustaining layer with opposite-doped islands for semiconductor power devices |
US13/280,518 US20120040521A1 (en) | 1993-10-29 | 2011-10-25 | Voltage sustaining layer wiht opposite-doped island for seminconductor power devices |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN93115356A CN1035294C (zh) | 1993-10-29 | 1993-10-29 | 具有异形掺杂岛的半导体器件耐压层 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1102274A CN1102274A (zh) | 1995-05-03 |
CN1035294C true CN1035294C (zh) | 1997-06-25 |
Family
ID=4990982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN93115356A Expired - Lifetime CN1035294C (zh) | 1993-10-29 | 1993-10-29 | 具有异形掺杂岛的半导体器件耐压层 |
Country Status (2)
Country | Link |
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US (7) | US6635906B1 (zh) |
CN (1) | CN1035294C (zh) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1035294C (zh) * | 1993-10-29 | 1997-06-25 | 电子科技大学 | 具有异形掺杂岛的半导体器件耐压层 |
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US6576516B1 (en) * | 2001-12-31 | 2003-06-10 | General Semiconductor, Inc. | High voltage power MOSFET having a voltage sustaining region that includes doped columns formed by trench etching and diffusion from regions of oppositely doped polysilicon |
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JP4417962B2 (ja) * | 2003-12-19 | 2010-02-17 | サード ディメンジョン (スリーディ) セミコンダクタ インコーポレイテッド | 超接合デバイスの製造での平坦化方法 |
US7052982B2 (en) * | 2003-12-19 | 2006-05-30 | Third Dimension (3D) Semiconductor, Inc. | Method for manufacturing a superjunction device with wide mesas |
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JP4928947B2 (ja) * | 2003-12-19 | 2012-05-09 | サード ディメンジョン (スリーディ) セミコンダクタ インコーポレイテッド | 超接合デバイスの製造方法 |
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US20120273916A1 (en) | 2011-04-27 | 2012-11-01 | Yedinak Joseph A | Superjunction Structures for Power Devices and Methods of Manufacture |
JP5271022B2 (ja) * | 2008-10-01 | 2013-08-21 | 株式会社豊田中央研究所 | 半導体装置 |
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CN105720089B (zh) * | 2016-02-16 | 2018-10-26 | 上海华虹宏力半导体制造有限公司 | 超级结及其制造方法 |
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CN111370469A (zh) * | 2020-04-30 | 2020-07-03 | 上海华虹宏力半导体制造有限公司 | 超级结器件结构及其制造方法 |
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2003
- 2003-03-05 US US10/382,027 patent/US6936867B2/en not_active Expired - Fee Related
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2004
- 2004-06-03 US US10/860,435 patent/US7227197B2/en not_active Expired - Fee Related
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2006
- 2006-03-01 US US11/365,223 patent/US7271067B2/en not_active Expired - Fee Related
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2009
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US7227197B2 (en) | 2007-06-05 |
CN1102274A (zh) | 1995-05-03 |
US6936867B2 (en) | 2005-08-30 |
US20120040521A1 (en) | 2012-02-16 |
US20030160281A1 (en) | 2003-08-28 |
US7271067B2 (en) | 2007-09-18 |
US20090130828A1 (en) | 2009-05-21 |
US20050035406A1 (en) | 2005-02-17 |
US20070272999A1 (en) | 2007-11-29 |
US7498614B2 (en) | 2009-03-03 |
US6635906B1 (en) | 2003-10-21 |
US20060177995A1 (en) | 2006-08-10 |
US8071450B2 (en) | 2011-12-06 |
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