CN103974517A - Constraint plasma aggregator under condition of high frequency electromagnetic field and aggregation method achieved by adoption of same - Google Patents
Constraint plasma aggregator under condition of high frequency electromagnetic field and aggregation method achieved by adoption of same Download PDFInfo
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- CN103974517A CN103974517A CN201410219015.7A CN201410219015A CN103974517A CN 103974517 A CN103974517 A CN 103974517A CN 201410219015 A CN201410219015 A CN 201410219015A CN 103974517 A CN103974517 A CN 103974517A
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Abstract
The invention provides a constraint plasma aggregator under the condition of a high frequency electromagnetic field and an aggregation method achieved by adoption of the constraint plasma aggregator, and relates to the technical field of aircraft measurement and control. The constraint plasma aggregator under the condition of high frequency electromagnetic field and the aggregation method achieved by adoption of the plasma aggregator aim to solve the problem that a method to obtain a constraint plasma device under the condition of the high frequency electromagnetic field lacks currently. A plasma generator is located at one end of a vacuum cavity, the other end of the vacuum cavity is provided with a vacuum pump system, another vacuum pump system is located in the middle of the vacuum cavity, two resonators are arranged between the two vacuum pump systems, resonant cavities of the resonators are communicated with an electromagnetic signal sending end of a high frequency electromagnetic signal generator through pipelines respectively, and the vacuum cavity is wound with a plurality of sets of electromagnetic coils; the two vacuum pump systems are adopted to pump the air pressure in a sealing cavity to vacuum, plasma is sprayed into the cavity through the plasma generator, through the adoption of the high frequency electromagnetic signal generator and the electromagnetic coils, plasma in the cavity generates a high frequency electromagnetic field under the actions of high frequency microwave signals and an electromagnetic field, and the basic parameter of the high frequency electromagnetic field is adjusted through the two resonators.
Description
Technical field
The present invention relates to the plasma aggtegation under high-frequency electromagnetic field condition.Belong to Spacecraft TT&C technical field.
Background technology
At present, the black barrier problem of hypersonic vehicle is extensively present in space plasma subject.Because black barrier is a difficult problem for telemetry communication in aerospace craft Returning ball process.Research finds, speed in atmosphere of it and aerospace craft, highly, the factor close relation such as how much external forms, thrust and materials, so far its stage in research and exploration still.So-called black barrier, be exactly when the aerospace crafts such as satellite, space shuttle, intercontinental missile, spaceship are during with ultraspeed atmospheric reentry, make spacecraft surface produce the fine and close plasma sheath of one deck with atmospheric friction, because plasma density is very high, external electromagnetic ripple cannot be reflected, at certain height and the liaison severe exacerbation in the time and between ground, to interrupt even completely, this phenomenon is called as " black barrier ".The appearance of black barrier, has brought very large harm to Spacecraft reentry atmosphere.In the time that satellite returns, black barrier can make to satellite catch increase difficulty, the drop point of satellite cannot be accurately calculated on ground, reclaims army to commander's search and brings certain difficulty, postpones the recovery time of satellite, What is more can not find satellite.For manned spaceship or space shuttle, spacefarer returns to safely the key that ground is manned space flight success or failure, and the reentry stage that returns of spacecraft is multiple section of accident.Therefore, the each state in the whole world is all concentrating the black barrier problem of breaking through, but because technological means is still imperfect at present, therefore mainly concentrates on theoretical research and ground simulation for the research of black barrier.The density of its applying plasma is in ground simulation, to guarantee to test important parameter and the key factor of authenticity.What the present invention relates to is the plasma aggtegation under high-frequency electromagnetic field condition.
Summary of the invention
The present invention lacks in order to solve the problem that obtains the constraint plasma device under high-frequency electromagnetic field condition at present.The method for congregating that constraint plasma collector under high-frequency electromagnetic field condition is now provided and adopts this collector to realize.
Constraint plasma collector under high-frequency electromagnetic field condition, it comprises vacuum cavity, high-frequency electromagnetic signal generator, two vacuum pump systems, resonator, solenoid and plasma generators,
Described plasma generator is positioned at one end of vacuum cavity, the vacuum cavity other end is provided with a vacuum pump system, another vacuum pump system is positioned at vacuum cavity middle part, between two vacuum pump systems, be provided with two resonators, the resonant cavity of each resonator is communicated with the electromagnetic signal transmitting terminal of high-frequency electromagnetic signal generator by pipeline respectively, is wound with plurality of electromagnetic coil outward at vacuum cavity.
Adopt constraint plasma collector to realize the method for congregating of the constraint plasma under high-frequency electromagnetic field condition,
First adopt two vacuum pump systems that the air pressure in annular seal space is evacuated, then using plasma generator sprays plasma in chamber, adopt high-frequency electromagnetic signal generator and multiple solenoid to make plasma in chamber produce electromagnetic field of high frequency under the effect of high-frequency microwave signal and electromagnetic field, utilize two resonators to adjust the basic parameter of electromagnetic field of high frequency, plasma focus is in two resonators.
Beneficial effect of the present invention: first adopt two vacuum pump systems that the air pressure in annular seal space is evacuated, then using plasma generator sprays plasma in chamber, adopt high-frequency electromagnetic signal generator and multiple solenoid to make plasma in chamber produce electromagnetic field of high frequency under the effect of high-frequency microwave signal and electromagnetic field, utilize two resonators to adjust the basic parameter of electromagnetic field of high frequency, to guarantee that plasma parameters can reach necessary requirement, be f at the basic parameter of electromagnetic field of high frequency
0=2375MHz, E
0=220Vcm
-1time, the plasma density that the present invention produces reaches as high as 6 × 10
10cm
-3, meet general plasma jet and tested required density, guarantee the authenticity of ground simulation plasma density.
Brief description of the drawings
Fig. 1 is the principle schematic of the constraint plasma collector under the high-frequency electromagnetic field condition described in embodiment one.
Embodiment
Embodiment one: illustrate present embodiment with reference to Fig. 1, constraint plasma collector under high-frequency electromagnetic field condition described in present embodiment, it comprises vacuum cavity, high-frequency electromagnetic signal generator 1, two vacuum pump systems 2, resonator 4, solenoid 6 and plasma generators 7
Described plasma generator 7 is positioned at one end of vacuum cavity, the vacuum cavity other end is provided with a vacuum pump system 2, another vacuum pump system 2 is positioned at vacuum cavity middle part, between two vacuum pump systems 2, be provided with two resonators 4, the resonant cavity of each resonator 4 is communicated with the electromagnetic signal transmitting terminal of high-frequency electromagnetic signal generator 1 by pipeline respectively, is wound with plurality of electromagnetic coil 6 outward at vacuum cavity.
Embodiment two: the difference of the constraint plasma collector under the high-frequency electromagnetic field condition described in present embodiment and embodiment one is, it also comprises multi grid analyzer 3,
Described multi grid analyzer 3 is positioned at the other end of vacuum cavity, for detection of the parameter of the plasma penetrating in vacuum chamber.
In present embodiment, the parameter of plasma refers to the collision frequency of plasma density, plasma temperature and plasma etc.
Embodiment three: the difference of the constraint plasma collector under the high-frequency electromagnetic field condition described in present embodiment and embodiment one is, it also comprises electrostatic probe 5,
The inside of the vacuum chamber of described electrostatic probe 5 between two resonators 4, for detection of the density of plasma in vacuum cavity.
Embodiment four: the constraint plasma collector described in employing embodiment one is realized the method for congregating of the constraint plasma under high-frequency electromagnetic field condition,
First adopt two vacuum pump systems 2 that the air pressure in annular seal space is evacuated, then using plasma generator 7 sprays plasma in chamber, adopt high-frequency electromagnetic signal generator 1 and multiple solenoid 6 to make plasma in chamber produce electromagnetic field of high frequency under the effect of high-frequency microwave signal and electromagnetic field, utilize two resonators 4 to adjust the basic parameter of electromagnetic field of high frequency, plasma focus is in two resonators 4.
In present embodiment, in the time that needs obtain high-density plasma, open high frequency signal generator 1 and solenoid 6, make an electromagnetic field of high frequency of generation in chamber, the basic parameter (amplitude, frequency) of the electromagnetic field of high frequency producing can be adjusted by resonator 4, owing to there being electromagnetic field of high frequency in chamber, can play constraint effect to spraying the plasma of coming in, therefore can greatly improve plasma density.
Embodiment five: the difference that the employing constraint plasma collector described in present embodiment and embodiment four is realized the method for congregating of the constraint plasma under high-frequency electromagnetic field condition is, described constraint plasma collector also comprises multi grid analyzer 3, and described multi grid analyzer 3 is positioned at the other end of vacuum cavity;
Described multi grid analyzer 3 is used for the parameter of high-frequency plasma of detection of aggregation.
In present embodiment, the parameter of plasma refers to the collision frequency of plasma density, plasma temperature and plasma etc.
Embodiment six: the difference that the employing constraint plasma collector described in present embodiment and embodiment four is realized the method for congregating of the constraint plasma under high-frequency electromagnetic field condition is, described constraint plasma collector also comprises electrostatic probe 5, the inside of the vacuum chamber of described electrostatic probe 5 between two resonators 4
Described electrostatic probe 5 is used for detecting the plasma density in vacuum chamber, if described density lower than the plasma density of setting, changes the basic parameter of the frequency adjustment electromagnetic field of high frequency of resonator 4, makes plasma density equal to set density.
Claims (6)
1. the constraint plasma collector under high-frequency electromagnetic field condition, it is characterized in that, it comprises vacuum cavity, high-frequency electromagnetic signal generator (1), two vacuum pump systems (2), resonator (4), solenoid (6) and plasma generator (7)
Described plasma generator (7) is positioned at one end of vacuum cavity, the vacuum cavity other end is provided with a vacuum pump system (2), another vacuum pump system (2) is positioned at vacuum cavity middle part, between two vacuum pump systems (2), be provided with two resonators (4), the resonant cavity of each resonator (4) is communicated with the electromagnetic signal transmitting terminal of high-frequency electromagnetic signal generator (1) by pipeline respectively, is wound with plurality of electromagnetic coil (6) outward at vacuum cavity.
2. the constraint plasma collector under high-frequency electromagnetic field condition according to claim 1, is characterized in that, it also comprises multi grid analyzer (3),
Described multi grid analyzer (3) is positioned at the other end of vacuum cavity, for detection of the parameter of the plasma penetrating in vacuum chamber.
3. the constraint plasma collector under high-frequency electromagnetic field condition according to claim 1, is characterized in that, it also comprises electrostatic probe (5),
Described electrostatic probe (5) is positioned at the inside of the vacuum chamber between two resonators (4), for detection of the density of plasma in vacuum cavity.
4. adopt constraint plasma collector claimed in claim 1 to realize the method for congregating of the constraint plasma under high-frequency electromagnetic field condition, it is characterized in that,
First adopt two vacuum pump systems (2) that the air pressure in annular seal space is evacuated, then using plasma generator (7) sprays plasma in chamber, adopt high-frequency electromagnetic signal generator (1) and multiple solenoid (6) to make plasma in chamber produce electromagnetic field of high frequency under the effect of high-frequency microwave signal and electromagnetic field, utilize two resonators (4) to adjust the basic parameter of electromagnetic field of high frequency, plasma focus is in two resonators (4).
5. employing constraint plasma collector according to claim 4 is realized the method for congregating of the constraint plasma under high-frequency electromagnetic field condition, it is characterized in that, described constraint plasma collector also comprises multi grid analyzer (3), and described multi grid analyzer (3) is positioned at the other end of vacuum cavity;
Described multi grid analyzer (3) is used for the parameter of high-frequency plasma of detection of aggregation.
6. employing constraint plasma collector according to claim 4 is realized the method for congregating of the constraint plasma under high-frequency electromagnetic field condition, it is characterized in that, described constraint plasma collector also comprises electrostatic probe (5), described electrostatic probe (5) is positioned at the inside of the vacuum chamber between two resonators (4)
Described electrostatic probe (5) is used for detecting the plasma density in vacuum chamber, if described density is lower than the plasma density of setting, the frequency that changes resonator (4) is adjusted the basic parameter of electromagnetic field of high frequency, makes plasma density equal to set density.
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Application publication date: 20140806 |