CN104027195B - Method for producing microplasma with biocompatibility - Google Patents
Method for producing microplasma with biocompatibility Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000000034 method Methods 0.000 claims abstract description 61
- 239000007789 gas Substances 0.000 claims description 46
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 43
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 28
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- 239000001301 oxygen Substances 0.000 description 18
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Abstract
A method for generating micro-plasma with biological compatibility features that the generated micro-plasma is low-temp, controllable in composition and low in energy consumption. The method provides a device which comprises a first gas storage unit, a second gas storage unit, a micro-plasma generation unit and a power supply unit.
Description
Technical field
The main object of the present invention is to provide a kind of microplasma generation side with bio-compatibility
Method, particularly provides the microplasma of a kind of low temperature, Modulatory character and low power consuming.
Background technology
Microplasma is a kind of by providing energy, makes gas in the shape that part is free and tool is reactive
State, contains: the compositions such as heat, light, charged particle, neutral active species, current microplasma skill
Art is applied on skin, is only limitted to the application of the heat effect that microplasma produces.
In daily life, almost everybody has skin injury to cause the experience of wound, and no matter the wound origin cause of formation is
What, its wound repair machine turns and is substantially similar.Wound formed after 24 to 48 hours, be first solidifying
Blood (Coagulation) and inflammation (Inflammation) phase, then 2 to 10 days be cell proliferation
(Proliferation) phase, last 1 to 12 month is then to reinvent (Remodeling) phase.
Due to the heat effect of laser skin can be made temporarily to be dehydrated, hydropenia, current postoperative most important
Wound to look after work be exactly incremental to carry out moisturizing and sun-proof, and with the use of facial film or dressing
Deng product, promote impaired tissue repair.Evaporation type invasive laser wound restores to normal condition
Needed for about 4 to 12 weeks, but, wound rehabilitation period is the longest, the most easily increases and infects and pigment after inflammation
The chance of the postoperative sequela such as precipitation.
And, during wound recovery, commonly used facial film or dressing contain antibacterial or antibiotic composition,
Wherein, too much antibiotic is used to be unfavorable for wound healing on the contrary.So far there is no normal data and carry out specification:
After skin accepts laser therapy, antibiotic and the sun-prevention component that should smear how much dosage are suitable
's；In the Scientific Periodicals delivered after relevant skin laser treatment, owing to skin loses completely
Property, embrocate antibiotic and sun-prevention component is easily trapped in wound, because excessive consumption can cause skin quick
Sense, even presents toxicity phenomena.
Patient often has drop for the desired effects that dermatological laser is postoperative, how to reach optimal postoperative one-tenth
Effect, minimum injury, the always ultimate aim of medical care.In recent years, the relevant research and development in whole world group
Team pays close attention to wound repair and the research theme of tissue new life simultaneously, and microplasma medical application exists
Infected wound healing or the research improved at deposited material, the most popular topic.After laser surgery
Skin repair, for seeking the effect reaching best, minimum injures and lowers complication, is medical care
Ultimate aim.
In view of this, need a kind of low temperature, without heat effect accumulation method or system, shorten laser control
Sensitive wound recovery time after treatment.
Summary of the invention
Present invention is primarily targeted at and provide a kind of microplasma with bio-compatibility to produce
Method, with produce low temperature, controllable composition and low power consuming microplasma reduce heat effect accumulate on
Skin causes damage.
For achieving the above object, the microplasma generation side with bio-compatibility that the present invention provides
Method, the method comprises the steps of
A) providing a device, this device comprises one first gas storage unit, one second gas storage
Unit, a microplasma generation unit and a power-supply unit；
B) would be stored at the helium in this first gas storage unit or argon is passed through this microplasma
Generation unit, within the predetermined time, is excited microplasma to steady statue by this first gas；
C) oxygen or the nitrogen that would be stored at this second gas storage unit are passed through this microplasma and produce
Raw unit, and produce microplasma and excite species.
Described method, wherein, step A) in this microplasma generation unit comprise a capillary
Pipe, and excite microplasma to produce low temperature microplasma at this capillary tube.
Described method, wherein, step A) this first gas storage unit comprise a gas flow
Display, this gas flow display is in order to show the steady statue exciting microplasma.
Described method, wherein, this microplasma exciting power is 1～50W.
Described method, wherein, the flow of this argon is 1～10slm.
Described method, wherein, the flow of this argon is 1～5slm.
Described method, wherein, the interpolation ratio of this oxygen is 0.1～5%sccm (standard cubic
centimeter per minute)。
Described method, wherein, the interpolation ratio of this oxygen is 0.1～2%sccm.
Described method, wherein, the interpolation percentage ratio of this nitrogen is 0.1～2%sccm.
Described method, wherein, the interpolation percentage ratio of this nitrogen is 0.1～1%sccm.
Described method, wherein, the microplasma process time is 5～300 seconds.
Described method, wherein, the method is contained in step C) middle setting one operating distance, its mesh
Mark thing and the distance of microplasma end.
Described method, wherein, this operating distance is the scope of 1～12mm.
Described method, wherein, the method comprises a use power, and this use power is 15～30W
Scope.
Described method, wherein, this use power 17～25W scope.
Described method, wherein, step A) device comprise a system for measuring temp, in order to measure
Microplasma temperature, its temperature range is 34～40 DEG C.
Described method, wherein, step A) device that used comprises a microplasma radiating light
Spectrometer, excites species for quantitative or qualitative detecting microplasma.
Described method, wherein, this microplasma excites species to be reactive oxidants species or reaction
Property nitridation species.
Effect of the present invention is to reduce microplasma temperature, with cold service when the skin, longer
Time is also unlikely scorching hot for skin, for the sensitive skin after laser treatment, can carry out gentleness
Skin look after；Simultaneously by reacting gas and the shunting supply of microplasma excited gas, it is greatly reduced
Microplasma maintains required energy, consumes energy the lowest.In sum, inventive feature is for providing one
Plant low temperature, controllable composition and the microplasma production method of low power consuming；And by produce micro-etc. from
The device of daughter and the application of above-mentioned relevant parameter.
Accompanying drawing explanation
Fig. 1 is installation drawing used in the present invention.
Fig. 2 is that the microplasma exciting power of the embodiment of the present invention 1 is along with adding nitrogen and temperature
Graph of a relation.
Fig. 3 is that the microplasma exciting power of the embodiment of the present invention 2 is along with adding oxygen and temperature
Graph of a relation.
Fig. 4 is the embodiment of the present invention 1 radiating light of main microplasma species under complete wavelength range
Spectrum.
Fig. 5 is the embodiment of the present invention 2 radiating light of main microplasma species under complete wavelength range
Spectrum.
Fig. 6 is the nitrogenous microplasma dominant species phase with nitrogen addition of the embodiment of the present invention 1
To Strength Changes situation.
Fig. 7 is the oxygen-containing microplasma dominant species phase with oxygen addition of the embodiment of the present invention 2
To Strength Changes situation.
Fig. 8 (a) and (b) are that the embodiment of the present invention 1 and 2 changes oxygen and nitrogen in argon microplasma
The full wavelength light radioscannogram of the interpolation percentage ratio of gas.
Fig. 9 (a) to (d) is that the embodiment of the present invention 4 is female to process fiber with argon microplasma with nitrogen
Cell L929 cell proliferation.
Figure 10 (a), (c) and (e) is backscatter intensity optical coherence fault image, Figure 10 (b), (d)
And (f) is tissue image.
Figure 11 (a), (c) and (e) is backscatter intensity optical coherence fault image, Figure 11 (b), (d)
And (f) is tissue image.
Symbol description in accompanying drawing:
1 first gas storage unit；
2 second gas storage units；
3 microplasma generation units；
4 power-supply units；
5 system for measuring temp；
6 microplasma emission spectrometry.
Detailed description of the invention
The present invention provides a kind of microplasma production method with bio-compatibility, and the method comprises
The following step:
(A) providing a device, this device comprises one first gas storage unit, one second gas storage
Unit, a microplasma generation unit and a power-supply unit；
(B) would be stored at the helium in this first gas storage unit or argon is passed through this microplasma
Generation unit, within the predetermined time, is excited microplasma to steady statue by this first gas；
(C) oxygen or the nitrogen that would be stored at this second gas storage unit are passed through this microplasma and produce
Raw unit, and produce microplasma and excite species.Its breakdown voltage produced is little.With low-power and
Low breakdown voltage excites microplasma, and reduces average microplasma temperature.
This microplasma generation unit in step of the present invention (A) can also comprise a capillary tube, and
Microplasma is excited to produce low temperature microplasma at this capillary tube.
The preferred scope of microplasma exciting power used in the present invention is 1～50W.
In step of the present invention (B), it is stored in the helium in this first gas storage unit or the stream of argon
Amount is preferably 1～10slm, more preferably 1～5slm.
In step of the present invention (C), it is stored in the interpolation of oxygen of this second gas storage unit than preferably
It is 0.1～5%sccm, more preferably 0.1～2%sccm.
In step of the present invention (C), it is stored in the interpolation of nitrogen of this second gas storage unit than preferably
It is 0.1～2%sccm, more preferably 0.1～1%sccm.
The microplasma process time of the present invention is 5～300 seconds.
The method of the present invention can also be contained in step (C) and set an operating distance, and it is that object is with micro-
The distance of plasma end, this operating distance is preferably the scope of 1～12mm.
The method of the present invention can also comprise a use power, and this use power is preferably the model of 15～30W
Enclose, more preferably 17～25W.
The device of the step (A) of the method for the present invention can also comprise a system for measuring temp, in order to measure
Microplasma mean temperature, its average temperature range is 34～40 DEG C.
The device that the step (A) of the method for the present invention is used can also comprise a microplasma radiating light
Spectrometer, excites species for quantitative or qualitative detecting microplasma, and this microplasma excites
Species can be reactive oxidants species or reactive nitridation species.
The following is, by specific embodiment, embodiments of the present invention are described, those skilled in the art can be by this
Content disclosed in description understands other advantages and effect of the present invention easily.Additionally, the present invention
Also can be implemented by other different specific embodiments or be applied, be entered under without departing from the spirit
The various modifications of row and change.
In the present invention, the meaning of noun " low temperature " is: at biomedical sector, for human body skin
During skin tissue, according to human skin physiology, central body temperature homoiothermous be 37.0 ± 2 DEG C to maintain
Normal physiological function, when body temperature more than 43 DEG C or less than 24～25 DEG C can cause organism produce irreversible
Pathological change.Be active in the environment of 27～29 DEG C in the presence of frivolous medicated clothing static state, dermal sensation is to comfortable
The temperature of body surface be 31～34 DEG C, be distributed in the sense of cold accepter (cold receptors) of dermal layer of the skin
Can be activated at 7～40 DEG C, when 30～50 DEG C, sense of heat accepter (warmth receptors) then can be by
Activation.
In the present invention, noun " low temperature microplasma " means for mean temperature 31～34 DEG C
Microplasma is used for human body skin, and now human body will not produce uncomfortable sensation, its discomfort
Mean overheated or supercool cause the pain sensation accepter activation cause pain.When skin has wound, because sending out
Scorching reaction, this position can reach body temperature more than 37.0 ± 2 DEG C.Therefore, the output of assembly of the invention
Temperature with between this temperature as principle.Additionally, the general conventional non-thermal microplasma of low temperature used refers to
Below 100 DEG C.
In the present invention, microplasma steady statue is defined as microplasma plume (plasma
Plume) stable luminescence, plume will not flash, and gas flow controller display numerical stability, it is stable
Required time 10 to 15 seconds.
Embodiment 1
Embodiments of the invention 1 are the microplasma methods producing bio-compatibility, and the method includes
The following step: provide and comprise this first gas storage unit 1, this second gas storage unit 2, micro-
Plasma generating element 3 and the device of power-supply unit 4；Its device is as shown in Figure 1.Will storage
This first gas being stored in this first pneumatic reservoir 1 is passed through this microplasma generation unit 3
In, make the first gas excite microplasma, after 10 to 15 seconds, microplasma reaches steady statue,
Wherein the first gas is argon.Then, would be stored at this second gas in this second pneumatic reservoir 2
Body is passed through in this microplasma generation unit 3, and produces microplasma and excite species.Warp after
The emission spectrum measured by this microplasma emission spectrometry 6 is to distinguish microplasma excimer
Kind.
The second gas in the present embodiment 1 is nitrogen, and it adds percentage ratio is 0%, 0.1%, 0.5%
And 2%sccm.Microplasma exciting power is 15,16,17,18,19,20 and 25W.
Fig. 2 is under conditions of embodiment 1, the nitrogen of interpolation and the graph of a relation of temperature.Fig. 2 is micro-
Plasma exciatiaon power is 15,16,17,18,19,20 and under 25W, add 0%, 0.1%,
0.5% and 2%sccm nitrogen and the graph of a relation of temperature, mean temperature maintains less than 40 DEG C.By Fig. 2
Result can learn, under the exciting power of 15～25W, microplasma produced by the present embodiment
Temperature, between the scope of 30～54 DEG C, can produce the low temperature microplasma between 31～34 DEG C.
Embodiment 2
In embodiments of the invention 2, except the second gas impose a condition different from embodiment 1 it
Outward, remaining step is the most same as in Example 1.Second gas of embodiment 2 is oxygen, and it adds hundred
Proportion by subtraction is 0%, 0.1%, 0.5% and 2%sccm.
Fig. 3 is under conditions of embodiment 2, the oxygen of interpolation and the graph of a relation of temperature.By Fig. 3's
Result can be learnt along with percentage ratio and the exciting power adding oxygen, can produce the low temperature required for the present invention
Microplasma.Fig. 3 is to be 15,16,17,18,19,20 in microplasma exciting power
And under 25W, interpolation 0%, 0.1%, 0.5% and 2%sccm oxygen and the graph of a relation of temperature.Fig. 4
Under conditions of embodiment 1, reactive microplasma species with add 0.5% nitrogen percentage ratio and
The graph of a relation of intensity, the species inspired are NO, OH, Ar and O.Fig. 5 is in embodiment 2
Under conditions of, reactive microplasma species and interpolation 0.5% oxygen concentration and the relation of intensity
Figure, the species inspired are NO, OH, Ar and O.Understood by Fig. 4 and 5 and add 0.5% nitrogen
What gas or oxygen concentration can produce different intensity excites species, and therefore adjustable microplasma becomes
Point.Fig. 6 is under conditions of embodiment 1, nitrogenous microplasma reaction species NO, OH,
Ar and O changes situation with the relative intensity of nitrogen addition, and wherein nitrogen addition is 0 to 2%.
Fig. 7 is under conditions of embodiment 2, oxygen-containing microplasma reaction species NO, OH, Ar with
And O changes situation with the relative intensity of oxygen addition, wherein oxygen addition is 0 to 2%.
Fig. 8 (a) and (b) are under conditions of embodiment 1 and 2, change in argon microplasma
O2And N2Add the full wavelength light radioscannogram of percentage ratio.Understood the present invention by Fig. 3 to 8 to be produced
The raw microplasma that microplasma is controllable composition and low power consuming.
Understand, with 2, the second gas that interpolation is different by the above embodiments 1, microplasma species
Change situation, thus can by the result of embodiment learn in microplasma produce radiating light wavelength and
Microplasma excites the kind of species.Additionally, from the result of embodiment 1 and 2, add few
Second gas of amount can control microplasma and excite the generation of species.
Embodiment 3
In embodiments of the invention 3, except exciting power is 19,21,23,25,27,29
And outside 31, all conditions is the most same as in Example 1, and increase temperature measurement system 5 further.
Operating distance be not Wei under 3mm, 6mm and 9mm, exciting power be 19,21,23,
25,27,29 and 31 time, measure temperature produced by microplasma, measured temperature results
As shown in table 1.
Can be selected to be suitable for the temperature parameter of human body by the result measured by embodiment 3.Temperature is caused to become
Turn to power, operating distance and the gas added.
Embodiment 4
In embodiments of the invention 4, except nitrogen that the second gas is 0.5%sccm, excite merit
Rate is 17W, operating distance is 9mm and the microplasma process time is outside 5 to 15 seconds, its
Remaining condition is the most same as in Example 1.Embodiment 4 is that the microplasma excited is applied to fiber
On blast cell.
Comparative example 1
The microplasma that comparative example 1 does not use embodiment 4 to be excited by cell processes.
Fig. 9 (a) is after exposing 5,10 or 15 seconds and cultivating 24 or 48 hours, is simulated
Cell proliferation, almost increases by 3 times at 48 little cell numbers constantly；Fig. 9 (b) is at gas flowing
Reason, cell number does not observe great change.In Fig. 9 (c) and (d), under micro-imaging technique
Process, with argon microplasma, the signaling excited: (c) was at 6 and 12 hours with 0.5% nitrogen
Afterwards, process with argon microplasma with nitrogen, capture the representational image of display signaling.
D (), under 5,10 and 15 seconds, processes cell, with 6 hours with nitrogen and argon microplasma
After comparative example 1 compare, cell roll up.
Embodiment 5
Embodiments of the invention 5 are to test with the C57BL/6 male wister rat of normal health, step
Rapid as follows: after mouse systemic is anaesthetized, by its back shaving, with the laser (laser energy such as table 2
Parameter) create wound at mouse back, wound gives microplasma immediately and processes after being formed, process
Condition is 1 minute/times/day, totally 1 day, and daily the looking after of wound mice is only raised at one into single
Mouse cage, gives sufficient food and drinking-water, Rearing Condition meet National Chenggong University's laboratory animal look after with
Use committee (NCKU IACUC) regulation.
The power that the microplasma of embodiment 5 excites is between 25 to 35W, first with pure argon
5slm excites microplasma, after 10 to 15 seconds microplasmas are stable, remixes 0.1%sccm
Pure nitrogen gas, power are 17 to 25W, operating distance 3.7mm and microplasma process the time 1
Minute/times/day.
Embodiment 6
It is to test with the C57BL/6 male wister rat of normal health that the present invention executes example 6, its step
Suddenly being 1 minute/times/day except treatment conditions, totally 3 beyond the highest heavens, remaining step all with embodiment 5 phase
With, and the microplasma parameter of embodiment 6 is same as in Example 5.
Comparative example 2
Test with the C57BL/6 male wister rat of normal health, after mouse systemic is anaesthetized, will
Its back shaving, creates wound with laser (such as the laser energy parameter of table 2) at mouse back, not
Give microplasma to process.
Figure 10 (a), (c) and (e) is backscatter intensity optical coherence fault image (backscattered
Intensity OCT image), Figure 10 (b), (d) and (f) is tissue image.Figure 10 (a) and (b) are laser
The wound caused, Figure 10 (c) and (d) by processing, with microplasma, the wound 1 time that laser caused,
Figure 10 (e) and (f), by processing, with microplasma, the wound 3 times that laser caused, observe 3 days altogether.
Figure 11 (a), (c) and (e) is backscatter intensity optical coherence fault image (backscattered
Intensity OCT image), Figure 11 (b), (d) and (f) is tissue image.Figure 11 (a) and (b) are laser
The wound caused, Figure 11 (c) and (d) by processing, with microplasma, the wound 1 time that laser caused,
Figure 11 (e) and (f), by processing, with microplasma, the wound 3 times that laser caused, observe 7 days altogether.
Understood microplasma produced by the present invention by the result of embodiment 5 and 6 and there is bio-compatible
Property, for the process of wound and histiocyte.
The present invention applies in laser wound repair, use gentleness close with human body temperature micro-etc. from
Daughter system, the sensitive wound caused after assist process laser therapy, shortens laser postoperative skin and replys
Time to optimum state.Busy and think the effective and quick modern times improving skin problem for industry and commerce
The skin aging person that people and expectation are rejuvenated, can be helpful.This invention address that and reach to make patient connect
It is painless during by the microplasma course for the treatment of, and energy is comfortable, quickly just complete the step that wound is looked after.
Above-described embodiment explanation merely for convenience and illustrate, the interest field that the present invention is advocated
From being as the criterion described in the right of application, rather than it is only limitted to above-described embodiment.
Table 1
Temperature unit is Celsius temperature (DEG C), and applied power unit is watt (Watts).
Table 2
| Laser model | RF CO2LASER, ALL Metal Sealed type |
| Peak power | 13W(13J/sec) |
| Laser model | TEMoo(10.6μm) |
| Pulsewidth | 3000 μ s, 39mJ |
| Repeat | 1sec/ is single, 3 circulations |
| Overlap (grade) | 3rd level |
| Distance | 0.3mm |
| Wrinkle area | 3*20mm |
| Pixel size | >=100 microns |
| Cooling | Air cools down |
Claims (12)
1. having a microplasma production method for bio-compatibility, the method comprises following step
Rapid:
A) providing a device, this device comprises one first gas storage unit, one second gas storage
Unit, a microplasma generation unit and a power-supply unit；
B) would be stored at the helium in this first gas storage unit or argon is passed through this microplasma
Generation unit, within the predetermined time, is excited microplasma to steady statue by this first gas；
C) nitrogen that would be stored at this second gas storage unit is passed through this microplasma generation unit,
And produce microplasma and excite species；
Wherein, this microplasma exciting power is 15～25W, and the interpolation percentage ratio of this nitrogen is
0.1～2%.
The most the method for claim 1, wherein step A) in this microplasma produce
Unit comprises a capillary tube, and excites microplasma to produce the micro-plasma of low temperature at this capillary tube
Body.
The most the method for claim 1, wherein step A) this first gas storage unit
Comprising a gas flow display, this gas flow display excites the steady of microplasma in order to show
Determine state.
The most the method for claim 1, wherein the flow of this argon is 1～10slm.
5. method as claimed in claim 4, wherein, the flow of this argon is 1～5slm.
The most the method for claim 1, wherein the interpolation percentage ratio of this nitrogen is
0.1～1%sccm.
The most the method for claim 1, wherein the microplasma process time is 5～300 seconds.
The most the method for claim 1, wherein the method is contained in step C) middle setting one
The distance of operating distance, its object and microplasma end.
9. method as claimed in claim 8, wherein, this operating distance is the scope of 1～12mm.
The most the method for claim 1, wherein step A) device comprise a measuring temp
System, in order to measure microplasma temperature, its temperature range is 34～40 DEG C.
11. the method for claim 1, wherein steps A) to comprise one micro-for the device that used
Plasma emission spectrometry, excites species for quantitative or qualitative detecting microplasma.
12. methods as claimed in claim 11, wherein, this microplasma excites species to be anti-
Answering property oxide species or reactive nitridation species.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW102108039A TWI517763B (en) | 2013-03-07 | 2013-03-07 | Method for producing micro plasma with biocompatibility |
| TW102108039 | 2013-03-07 |
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| Publication Number | Publication Date |
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| CN104027195A CN104027195A (en) | 2014-09-10 |
| CN104027195B true CN104027195B (en) | 2016-12-28 |
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| TW (1) | TWI517763B (en) |
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| CN104582227B (en) * | 2015-01-07 | 2017-02-22 | 江苏邦士医疗科技有限公司 | Touchable plasma processing system |
| TWI685356B (en) * | 2019-01-07 | 2020-02-21 | 張家銘 | Handheld cold plasma generator |
| CN113840439B (en) * | 2021-10-11 | 2023-12-12 | 中国科学院合肥物质科学研究院 | Intelligent control plasma air quick sterilization device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5680014A (en) * | 1994-03-17 | 1997-10-21 | Fuji Electric Co., Ltd. | Method and apparatus for generating induced plasma |
| JP2002008894A (en) * | 2000-06-27 | 2002-01-11 | Matsushita Electric Works Ltd | Plasma treatment device and plasma lighting method |
| CN2566580Y (en) * | 2002-08-21 | 2003-08-13 | 王忠义 | High power air plasma generator |
| CN102282916A (en) * | 2009-01-13 | 2011-12-14 | 里巴贝鲁株式会社 | Apparatus and method for producing plasma |
| CN102404927A (en) * | 2010-09-07 | 2012-04-04 | 廖峻德 | Microplasma source and sterilization system including the same |
-
2013
- 2013-03-07 TW TW102108039A patent/TWI517763B/en active
- 2013-04-26 CN CN201310150465.0A patent/CN104027195B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5680014A (en) * | 1994-03-17 | 1997-10-21 | Fuji Electric Co., Ltd. | Method and apparatus for generating induced plasma |
| JP2002008894A (en) * | 2000-06-27 | 2002-01-11 | Matsushita Electric Works Ltd | Plasma treatment device and plasma lighting method |
| CN2566580Y (en) * | 2002-08-21 | 2003-08-13 | 王忠义 | High power air plasma generator |
| CN102282916A (en) * | 2009-01-13 | 2011-12-14 | 里巴贝鲁株式会社 | Apparatus and method for producing plasma |
| CN102404927A (en) * | 2010-09-07 | 2012-04-04 | 廖峻德 | Microplasma source and sterilization system including the same |
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| Publication number | Publication date |
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| CN104027195A (en) | 2014-09-10 |
| TW201436647A (en) | 2014-09-16 |
| TWI517763B (en) | 2016-01-11 |
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