CN104403575A - Preparation method of high-precision aluminum oxide polishing powder - Google Patents

Preparation method of high-precision aluminum oxide polishing powder Download PDF

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Publication number
CN104403575A
CN104403575A CN201410807470.9A CN201410807470A CN104403575A CN 104403575 A CN104403575 A CN 104403575A CN 201410807470 A CN201410807470 A CN 201410807470A CN 104403575 A CN104403575 A CN 104403575A
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powder
polishing
polishing powder
aluminum oxide
preparation
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CN104403575B (en
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李梅
周国祥
张晓伟
张存瑞
柳召刚
胡艳宏
韩磊
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BAOTOU HUACHEN RARE EARTH MATERIALS Co Ltd
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BAOTOU HUACHEN RARE EARTH MATERIALS Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Abstract

The invention discloses a preparation method of high-precision aluminum oxide polishing powder. The polishing powder is used as an abrasive material, and mainly contains aluminum oxide, silicon oxide, cerium oxide and titanium oxide. The Al2O3:SiO2 ratio is 12:1-8:3, and the CeO2:TiO2 ratio is 1:1-3:1. In order to enhance the polishing effect, the dispersing agent is added in the synthesis and preparation process, so that the prepared aluminum oxide polishing powder can be utilized to obtain a favorable polished and ground surface. The preparation method comprises the following steps: thoroughly mixing aluminum nitrate, silica sol, cerium nitrate, titanium oxide powder and a dispersing agent, carrying out spray drying, and roasting to obtain the aluminum oxide polishing powder. The aluminum oxide polishing powder has the advantages of favorable suspensibility, favorable dispersity, narrow particle size distribution, high smoothness of the polished and ground surface, high polishing capacity and long service life.

Description

A kind of preparation method of high accuracy aluminum oxide polishing powder
Technical field
The invention belongs to inorganic powder preparation field, particularly a kind of preparation method of high precision alpha-alumina polishing powder, the alpha-alumina polishing powder of preparation has very high polishing precision and minimum medium particle diameter, narrower size-grade distribution.
Background technology
In recent years, the domestic demand to Alpha-alumina is day by day vigorous, mainly because its glass screen of current high-end handsets market all adopts sapphire glass, U.S. CORNING is mainly in the glass supplier of China's Mobile Phone Market, and the mobile phone of main sapphire glass uses business for we are well-known, they are the high-end mobile-phone manufacturers such as millet, association, Huawei, Samsung, LG, apple.Have stimulated the domestic research to sapphire glass polishing powder thus.
Alpha-alumina is a kind of polishing material of extreme hardness, its hardness is 8.8, be widely used in the polishing of the components and parts such as unicircuit, glass substrate, sapphire glass due to its satisfactory stability and homogeneity simultaneously, therefore, alpha-alumina polishing powder is widely studied, and how can obtain good surface topography for alpha-alumina polishing powder, less Abrasive Particle Size, narrower size-grade distribution, more succinct preparation technology, related scientific research worker has made a large amount of effort and work.
As CN 101824279 A discloses a kind of aluminum oxide polishing powder and production method thereof, its preparation method comprises the steps: raw material Alpha-alumina and water to pull an oar, then classification, obtains product.The aluminum oxide polishing powder of this invention, has meso-position radius grain little, the feature that particle size distribution is narrow, can be used for liquid crystal display glass, the precise polished processing of the electronic product components and parts such as plane display, optical element, ultrathin glass substrate, glass disk.But this invention is not to the polishing speed of polishing powder and claim to the rough degree in surface of workpiece after workpiece polishing.
As CN 1398939 discloses a kind of polishing composition, it is a kind of at least containing the abrasive of silica, aluminum oxide, but does not claim to the granularity of polishing material.
Along with the fast development of science and technology, the scientific and technological content for polish abrasive industry improves constantly requirement, how to improve the quality of polish abrasive, and strengthen its wear resistance is study hotspot in industry always.
Summary of the invention
The technical issues that need to address of the present invention are just the defect overcoming prior art, provide a kind of preparation method of high accuracy aluminum oxide polishing powder.
The present invention adopts following technical scheme:
The each constituent mass of the present invention compares Al 2o 3: SiO 2=12:1 ~ 8:3, CeO 2: TiO 2=1:1 ~ 3:1;
Polishing powder crystal formation of the present invention is Alpha-alumina, and its polishing powder is initially thrown erosion amount and is greater than 0.30 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is still greater than 0.15 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to below 0.15nm.
A kind of preparation method of high accuracy aluminum oxide polishing powder is as follows:
1) by the mass ratio of aluminum nitrate, silicon sol, cerous nitrate compares feeding with the quality of titanium dioxide powder, first silicon sol is dissolved in the mixing solutions of second alcohol and water and obtains solution 1., getting the nitrate reagent of aluminium and cerium respectively, 2. and be 3. configured to solution separately, obtain solution, will 1. 2. 3. solution mix and add titanium dioxide powder, then add dispersion agent, mix down to solution in situation about stirring;
2) the spray-dried machine spraying dry of the solution mixed step 1) obtained, obtains solid powder particle;
3) gained powder particle in step 2 is calcined in rotary tube furnace, first by powder particle pre-burning, insulation, then high-temperature calcination, insulation, subsequently furnace cooling, obtain alpha-alumina polishing powder.
It is fast that the present invention adopts spray-drying process to prepare aluminum oxide polishing powder rate of drying, and products obtained therefrom is spherical particle, epigranular, good fluidity, and solvability is good, and product purity is high, and quality is good; Product cut size, loose density, moisture can regulate within the specific limits.
The roasting system of present invention employs first pre-burning, calcining again, rational pre-burning condition first can remove moisture and some foreign gases, product is avoided to produce bubble and crackle, eliminate internal stress simultaneously, increase granule strength, presintering can also transmit some energy to sample particle, increases driving of whole burning stage energy, shortens sintering time.
The present invention adopts rotary tube furnace, and to calcine, powder temperature-controlled precision is high, high insulating effect, fire box temperature homogeneity are high, and regulate and control the polishing powder even particle size that rational roasting parameter makes to prepare, particle size distribution range is little, and powder dispersity is good.
The present invention by introducing SiO in aluminum oxide polishing powder 2, CeO 2, TiO 2be to want by each polishing powder between synergy, improve the polishing performance of aluminum oxide polishing powder.
The present invention by introducing silicon sol in aluminum nitrate solution, utilize the special property parcel aluminum nitrate particle of colloid, utilize affinity interaction special between silicon ion and aluminum particulate simultaneously, make aluminum nitrate and silicon ion in the process of calcining, form atom to substitute and cause particle surface charged, thus make it in the process of polishing, have good dispersiveness, making it when calcining simultaneously, possessing narrower size-grade distribution; Also because silicon oxide preparation is simple, cheap, substitute with silicon oxide the polishing performance that aluminum oxide not only can improve polishing powder, also have good economic benefit.
The present invention, by introducing cerium oxide in aluminum nitrate solution, is due to CeO 2rumbling compound has the character of multivalence, Ce(III)/Ce(IV) redox reaction can break glass lattice, and by chemisorption, the material making glass surface contact with rumbling compound (comprising glass and Hydrolysis of compound) is oxidized or form complex compound and be removed.
The present invention by introducing titania powder in aluminum nitrate solution, be because titanium dioxide in dry powder usually with static charge, because surface forms diffusion double layer with electric charge will adsorb contrary electric charge in liquid medium, when particle is closer to each other, arrange because of each tool same sex electric charge, be conducive to the stable of dispersion system.Therefore, when handle is containing CeO 2, SiO 2al 2o 3when polishing powder is mixed with polishing slurries, TiO 2add and be conducive to the stable of polishing slurries system.
Embodiment
embodiment 1
Get Al (NO 3) 39H 2o solid 110g, 184.2g/l cerous nitrate solution 3ml, massfraction 30% silicon sol 83g, titanium dioxide powder 0.55g, ethanol solution 80ml, cetyl trimethylammonium bromide 0.2g.First silicon sol is poured in ethanolic soln and fully shake up, then get 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and wherein fully shakes up, then add titanium dioxide powder.The most backward solution adds deionized water to 400ml, adds dispersion agent cetyl trimethylammonium bromide 0.2g simultaneously.Above-mentioned solution is carried out spraying dry by spraying dry instrument and obtains powder, carry out roasting.First by powder particle pre-burning between 200 DEG C of temperature, insulation 1h, then be warmed up to 1150 DEG C, furnace cooling after sintering soak 2h, obtains alpha-alumina polishing powder, the D of powder 50medium particle diameter is 1.473 μm.In experiment, the test parameter of spraying dry instrument is set as: the frequency of ultrasonic atomization instrument is 0.5MHz, and air flow quantity is set to 650 L/h, and temperature out is 75 DEG C, air compressor machine pressure 2.0 Bar, blower fan rotational frequency 50 Hz, inlet amount 5%, cleansing pin frequency 5s/ time; Rotary tube furnace optimum configurations is stove temperature rise rate is 5 DEG C/min, and barrel body rotation speed is 4 revs/min, and angle of inclination is 8 degree.
Polishing powder of the present invention carries out polishing to sapphire glass, and erosion amount initially thrown by its polishing powder is 0.330 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.178 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to 0.145nm.
embodiment 2
Get Al (NO 3) 39H 2o solid 110g, 184.2g/l cerous nitrate solution 3ml, massfraction 30% silicon sol 83g, titanium dioxide powder 0.55g, ethanol solution 80ml, cetyl trimethylammonium bromide 0.2g.First silicon sol is poured in ethanolic soln and fully shake up, then get 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and wherein fully shakes up, then add titanium dioxide powder.The most backward solution adds deionized water to 400ml, adds dispersion agent cetyl trimethylammonium bromide 0.3g simultaneously.Above-mentioned solution is carried out spraying dry by spraying dry instrument and obtains powder, carry out roasting.First by powder particle pre-burning between 250 DEG C of temperature, insulation 1.5h, then be warmed up to 1250 DEG C, furnace cooling after sintering soak 4h, obtains alpha-alumina polishing powder, the D of powder 50medium particle diameter is 1.032 μm.In experiment, the test parameter of spraying dry instrument is set as: the frequency of ultrasonic atomization instrument is 1.0 MHz, and air flow quantity is set to 750 L/h, and temperature out is 80 DEG C, air compressor machine pressure 2.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 10 %, cleansing pin frequency 10 s/ time; Rotary tube furnace optimum configurations is stove temperature rise rate is 10 DEG C/min, and barrel body rotation speed is 8 revs/min, and angle of inclination is 3 degree.Polishing powder of the present invention carries out polishing to sapphire glass, and erosion amount initially thrown by its polishing powder is 0.325 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.160 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to 0.140nm.
embodiment 3
Get Al (NO 3) 39H 2o solid 90g, 184.2g/l cerous nitrate solution 4ml, massfraction 30% silicon sol 88g, titanium dioxide powder 0.74g, ethanol solution 80ml, many sodium-metaphosphates 0.2g.First silicon sol is poured in ethanolic soln and fully shake up, then get 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and wherein fully shakes up, then add titanium dioxide powder.The most backward solution adds deionized water to 400ml, adds dispersion agent cetyl trimethylammonium bromide 0.2g simultaneously.Above-mentioned solution is carried out spraying dry by spraying dry instrument and obtains powder, carry out roasting.First by powder particle pre-burning between 300 DEG C of temperature, insulation 2h, then be warmed up to 1350 DEG C, furnace cooling after sintering soak 5h, obtains alpha-alumina polishing powder, the D of powder 50medium particle diameter is 0.932 μm.In experiment, the test parameter of spraying dry instrument is set as: the frequency of ultrasonic atomization instrument is 1.5 MHz, and air flow quantity is set to 750 L/h, and temperature out is 80 DEG C, air compressor machine pressure 3.0 Bar, blower fan rotational frequency 50 Hz, inlet amount 20 %, cleansing pin frequency 10 s/ time; Rotary tube furnace optimum configurations is stove temperature rise rate is 15 DEG C/min, and barrel body rotation speed is 5 revs/min, and angle of inclination is 3 degree.Polishing powder of the present invention carries out polishing to sapphire glass, and erosion amount initially thrown by its polishing powder is 0.342 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.172 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to 0.148nm.
embodiment 4
Get Al (NO 3) 39H 2o solid 90g, 184.2g/l cerous nitrate solution 4ml, massfraction 30% silicon sol 88g, titanium dioxide powder 0.74g, ethanol solution 80ml, many sodium-metaphosphates 0.2g.First silicon sol is poured in ethanolic soln and fully shake up, then get 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and wherein fully shakes up, then add titanium dioxide powder.The most backward solution adds deionized water to 400ml, adds dispersion agent cetyl trimethylammonium bromide 0.25g simultaneously.Above-mentioned solution is carried out spraying dry by spraying dry instrument and obtains powder, carry out roasting.First by powder particle pre-burning between 350 DEG C of temperature, insulation 2.5h, then be warmed up to 1400 DEG C, furnace cooling after sintering soak 7 h, obtains alpha-alumina polishing powder, the D of powder 50medium particle diameter is 1.002 μm.In experiment, the test parameter of spraying dry instrument is set as: the frequency of ultrasonic atomization instrument is 2.0 MHz, and air flow quantity is set to 850 L/h, and temperature out is 85 DEG C, air compressor machine pressure 3.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 30 %, cleansing pin frequency 15 s/ time; Rotary tube furnace optimum configurations is stove temperature rise rate is 20 DEG C/min, and barrel body rotation speed is 8 revs/min, and angle of inclination is 2 degree.Polishing powder of the present invention carries out polishing to sapphire glass, and erosion amount initially thrown by its polishing powder is 0.327 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.165 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to 0.141nm.
embodiment 5
Get Al (NO 3) 39H 2o solid 110g, 184.2g/l cerous nitrate solution 3ml, massfraction 30% silicon sol 60g, titanium dioxide powder 0.35g, ethanol solution 80ml, many sodium-metaphosphates 0.2g.First silicon sol is poured in ethanolic soln and fully shake up, then get 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and wherein fully shakes up, then add titanium dioxide powder.The most backward solution adds deionized water to 400ml, adds dispersion agent cetyl trimethylammonium bromide 0.15g simultaneously.Above-mentioned solution is carried out spraying dry by spraying dry instrument and obtains powder, carry out roasting.First by powder particle pre-burning between 400 DEG C of temperature, insulation 1.5h, then be warmed up to 1450 DEG C, furnace cooling after sintering soak 4 h, obtains alpha-alumina polishing powder, the D of powder 50medium particle diameter is 0.843 μm.In experiment, the test parameter of spraying dry instrument is set as: the frequency of ultrasonic atomization instrument is 2.5 MHz, and air flow quantity is set to 850 L/h, and temperature out is 85 DEG C, air compressor machine pressure 3.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 40 %, cleansing pin frequency 20 s/ time; Rotary tube furnace optimum configurations is stove temperature rise rate is 10 DEG C/min, and barrel body rotation speed is 5 revs/min, and angle of inclination is 5 degree.Polishing powder of the present invention carries out polishing to sapphire glass, and erosion amount initially thrown by its polishing powder is 0.318 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.162 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to 0.139nm.
embodiment 6
Get Al (NO 3) 39H 2o solid 110g, 184.2g/l cerous nitrate solution 3ml, massfraction 30% silicon sol 60g, titanium dioxide powder 0.35g, ethanol solution 80ml, many sodium-metaphosphates 0.2g.First silicon sol is poured in ethanolic soln and fully shake up, then get 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and wherein fully shakes up, then add titanium dioxide powder.The most backward solution adds deionized water to 400ml, adds dispersion agent cetyl trimethylammonium bromide 0.35g simultaneously.Above-mentioned solution is carried out spraying dry by spraying dry instrument and obtains powder, carry out roasting.First by powder particle pre-burning between 500 DEG C of temperature, insulation 2.5h, then be warmed up to 1500 DEG C, furnace cooling after sintering soak 10 h, obtains alpha-alumina polishing powder, the D of powder 50medium particle diameter is 0.543 μm.In experiment, the test parameter of spraying dry instrument is set as: the frequency of ultrasonic atomization instrument is 2.5 MHz, and air flow quantity is set to 950 L/h, and temperature out is 90 DEG C, air compressor machine pressure 4.0 Bar, blower fan rotational frequency 50 Hz, inlet amount 45 %, cleansing pin frequency 25 s/ time; Rotary tube furnace optimum configurations is stove temperature rise rate is 10 DEG C/min, and barrel body rotation speed is 5 revs/min, and angle of inclination is 0 degree.Polishing powder of the present invention carries out polishing to sapphire glass, and erosion amount initially thrown by its polishing powder is 0.321 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.152 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to 0.129nm.
embodiment 7
Get Al (NO 3) 39H 2o solid 110g, 184.2g/l cerous nitrate solution 3ml, massfraction 30% silicon sol 83g, titanium dioxide powder 0.55g, ethanol solution 80ml, many sodium-metaphosphates 0.2g.First silicon sol is poured in ethanolic soln and fully shake up, then get 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and wherein fully shakes up, then add titanium dioxide powder.The most backward solution adds deionized water to 400ml, adds dispersion agent cetyl trimethylammonium bromide 0.2g simultaneously.Above-mentioned solution is carried out spraying dry by spraying dry instrument and obtains powder, carry out roasting.First by powder particle pre-burning between 180 DEG C of temperature, insulation 0.5h, then be warmed up to 1050 DEG C, furnace cooling after sintering soak 0.3 h, obtains alpha-alumina polishing powder, the D of powder 50medium particle diameter is 2.373 μm.In experiment, the test parameter of spraying dry instrument is set as: the frequency of ultrasonic atomization instrument is 3.0 MHz, and air flow quantity is set to 950 L/h, and temperature out is 90 DEG C, air compressor machine pressure 4.0 Bar, blower fan rotational frequency 50 Hz, inlet amount 50 %, cleansing pin frequency 25 s/ time; Rotary tube furnace optimum configurations is stove temperature rise rate is 30 DEG C/min, and barrel body rotation speed is 15 revs/min, and angle of inclination is 25 degree.Polishing powder of the present invention carries out polishing to sapphire glass, and erosion amount initially thrown by its polishing powder is 0.310 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.159 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to 0.149nm.
embodiment 8
Get Al (NO 3) 39H 2o solid 90g, 184.2g/l cerous nitrate solution 4ml, massfraction 30% silicon sol 88g, titanium dioxide powder 0.74g, ethanol solution 80ml, many sodium-metaphosphates 0.2g.First silicon sol is poured in ethanolic soln and fully shake up, then get 200ml deionized water dissolving aluminum nitrate solid, cerous nitrate solution is poured into and wherein fully shakes up, then add titanium dioxide powder.The most backward solution adds deionized water to 400ml, adds dispersion agent cetyl trimethylammonium bromide 0.40g simultaneously.Above-mentioned solution is carried out spraying dry by spraying dry instrument and obtains powder, carry out roasting.First by powder particle pre-burning between 550 DEG C of temperature, insulation 3h, then be warmed up to 1550 DEG C, furnace cooling after sintering soak 12h, obtains alpha-alumina polishing powder, the D of powder 50medium particle diameter is 1.902 μm.The test parameter of laboratory spray drying instrument is set as: the frequency of ultrasonic atomization instrument is 3.5 MHz, and air flow quantity is set to 1000 L/h, and temperature out is 95 DEG C, air compressor machine pressure 4.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 60 %, cleansing pin frequency 30 s/ time; Middle rotary tube furnace optimum configurations is stove temperature rise rate is 3 DEG C/min, and barrel body rotation speed is 2 revs/min, and angle of inclination is 0 degree.Polishing powder of the present invention carries out polishing to sapphire glass, and erosion amount initially thrown by its polishing powder is 0.309 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is 0.160 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to 0.144nm.
Last it is noted that obviously, above-described embodiment is only for example of the present invention is clearly described, and the restriction not to embodiment.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here exhaustive without the need to also giving all embodiments.And thus the apparent change of amplifying out or variation be still among protection scope of the present invention.

Claims (5)

1. a preparation method for high accuracy aluminum oxide polishing powder, is characterized in that: each constituent mass compares Al 2o 3: SiO 2=12:1 ~ 8:3, CeO 2: TiO 2=1:1 ~ 3:1.
2. high accuracy aluminum oxide polishing powder according to claim 1, is characterized in that: polishing powder crystal formation is Alpha-alumina, and its polishing powder is initially thrown erosion amount and is greater than 0.30 mg/ (cm 2min), after continuous polishing 8h, the throwing erosion amount of polishing powder is still greater than 0.15 mg/ (cm 2min); After polishing sapphire glass, the roughness RMS value of glass surface within the scope of 10 μm × 10 μm is down to below 0.15nm.
3. the preparation method of high accuracy aluminum oxide polishing powder according to claim 1, is characterized in that, method steps is:
1) aluminum nitrate in mass ratio: silicon sol=6:1 ~ 1:1, cerous nitrate: titanium dioxide powder=5:2 ~ 21:25 feeding, first silicon sol is dissolved in the mixing solutions of second alcohol and water and obtains solution 1., getting the nitrate reagent of aluminium and cerium respectively, 2. and be 3. configured to solution separately, obtain solution, will 1. 2. 3. solution mix and add titanium dioxide powder, then add dispersion agent, mix down to solution in situation about stirring;
2) the spray-dried instrument spraying dry of the solution mixed step 1) obtained, obtains solid powder particle;
3) by step 2) in gained powder particle calcine in rotary tube furnace, first by powder particle pre-burning between 180 ~ 300 DEG C of temperature, insulation 0.5 ~ 3h, then be warmed up to 1050 ~ 1450 DEG C, furnace cooling after sintering soak 0.3 ~ 11h, obtains alpha-alumina polishing powder; In experiment, rotary tube furnace optimum configurations is stove temperature rise rate is 3 ~ 15 DEG C/min, and barrel body rotation speed is 2 ~ 10 revs/min, and angle of inclination is 0-25 degree.
4. the preparation method of high accuracy aluminum oxide polishing powder according to claim 3, is characterized in that, the add-on of dispersion agent is 0.1 ~ 1%.
5. the preparation method of high accuracy aluminum oxide polishing powder according to claim 3, it is characterized in that, the test parameter of spraying dry instrument is set as: the frequency of ultrasonic atomization instrument is 0.5 ~ 3.5 MHz, air flow quantity is set to 650 ~ 1000 L/h, temperature out is 75 ~ 95 DEG C, air compressor machine pressure 2.0 ~ 4.5 Bar, blower fan rotational frequency 50 Hz, inlet amount 5% ~ 60 %, cleansing pin frequency 5 ~ 30 s/ time.
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CN107325789A (en) * 2017-07-15 2017-11-07 无锡易洁工业介质有限公司 A kind of preparation method of the sial abrasive compound polished for Sapphire Substrate
CN113563801A (en) * 2021-07-26 2021-10-29 杭州智华杰科技有限公司 Preparation method of aluminum oxide polishing powder

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CN105647391A (en) * 2016-01-13 2016-06-08 上海欧柏森环境工程管理有限公司 Stone polishing powder
CN105647391B (en) * 2016-01-13 2017-12-15 上海欧柏森环境工程管理有限公司 A kind of stone polishing powder
CN106591950A (en) * 2016-12-15 2017-04-26 安阳方圆研磨材料有限责任公司 Rotary type polishing powder crystal growing furnace
CN106591950B (en) * 2016-12-15 2019-07-02 安阳方圆研磨材料有限责任公司 Rotary polishing powder crystal growing furnace
CN106675519A (en) * 2016-12-21 2017-05-17 安徽中创电子信息材料有限公司 Inorganic compound abrasive and preparation method thereof
CN107325789A (en) * 2017-07-15 2017-11-07 无锡易洁工业介质有限公司 A kind of preparation method of the sial abrasive compound polished for Sapphire Substrate
CN107325789B (en) * 2017-07-15 2018-12-21 无锡易洁工业介质有限公司 A kind of preparation method of the sial abrasive compound for Sapphire Substrate polishing
CN113563801A (en) * 2021-07-26 2021-10-29 杭州智华杰科技有限公司 Preparation method of aluminum oxide polishing powder

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