CN105232145B - Improved plasma resectoscope - Google Patents
Improved plasma resectoscope Download PDFInfo
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- CN105232145B CN105232145B CN201510795529.1A CN201510795529A CN105232145B CN 105232145 B CN105232145 B CN 105232145B CN 201510795529 A CN201510795529 A CN 201510795529A CN 105232145 B CN105232145 B CN 105232145B
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- electrode
- hole
- mirror according
- improved bipolar
- technique mirror
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Abstract
The invention discloses an improved plasma resectoscope comprising a cutting electrode and a loop electrode, wherein an insulation sleeve is arranged between the cutting electrode and the loop electrode; an endoscope mechanism is arranged at the outer side of the insulation sleeve; the cutting electrode comprises a base, a discharge point is arranged in the center of the base, and a metal ring is arranged at the outer side of the discharge point and is fixed on the base by virtue of a bracket; the loop electrode comprises a first electrode and a second electrode which are concentrically sleeved together, the second electrode is positioned at the inner side of the first electrode, and the length of the second electrode is less than that of the first electrode; and the endoscope mechanism comprises a seal housing, a camera is arranged at the bottom of the seal housing, a lens group is arranged above the camera, a light-permeable cover is arranged above the lens group, and a baffle is arranged at the edge of the light-permeable cover. The improved plasma resectoscope disclosed by the invention can overcome defects of the prior art, improve the operation efficiency, and reduce interference to visual operative field during operation.
Description
Technical field
The present invention relates to a kind of urological surgery apparatus, especially a kind of improved bipolar plasmakinetic technique mirror.
Background technology
Bipolar plasmakinetic technique mirror is to prostate and the maximally effective treatment means of tumor of bladder TURP.The resectoscope of past routine
Maximum problem is exactly easily to form patient's water intoxication, and haemostatic effect is poor, it is desirable to which surgeon's operation control is complete in 1 hour
Into.Compared with conventional TURP, plasma Bipolar electrocautery does flushing liquor with physiological saline, it is to avoid dilutional hyponatremia
The generation of disease, occurs without TURS substantially.And intraoperative hemorrhage is few, post-operative recovery is fast.The B of Chinese invention patent CN 102429723
A kind of safe transurethral bladder neoplasm electric cutting ring is disclosed, the security of operation is improve.But, existing resectoscope is in hand
The interference of surgical field of view can be caused during art.
The content of the invention
The technical problem to be solved in the present invention is to provide a kind of improved bipolar plasmakinetic technique mirror, can solve the problem that prior art
Deficiency, improves procedure efficiency, the interference in reduction surgical procedure to surgical field of view.
In order to solve the above technical problems, the technical solution used in the present invention is as follows.
A kind of improved bipolar plasmakinetic technique mirror, including cutting electrode and loop electrode, between cutting electrode and loop electrode
Insulation sleeve is provided with, endoscope mechanism is provided with the outside of insulation sleeve, the cutting electrode includes pedestal, and base central is provided with
Discharge tip, is provided with becket on the outside of discharge tip, becket is fixed on pedestal by support；The loop electrode bag
The first electrode and second electrode of concentric socket are included, second electrode is located at the inner side of first electrode, and the length of second electrode is less than
The length of first electrode；Endoscope mechanism includes seal casinghousing, and the bottom of seal casinghousing is provided with camera, and camera top sets
Lens group is equipped with, lens group top is provided with euphotic cover, and the edge of euphotic cover is provided with baffle plate.
Preferably, discharge tip top sets fluted, the edge of groove is provided with leading of being connected with pedestal
Chute.
Preferably, arc convex portion is provided with the top of the metal needle, when metal needle rotates, on adjacent metal pin
The selective exposure of arc convex portion.
Preferably, arc convex portion is provided with the top of the metal needle, when metal needle rotates, on adjacent metal pin
The selective exposure of arc convex portion.
Preferably, being provided with insulation silk screen layer between the first electrode and second electrode.
Preferably, being provided with endless metal set at the top of the first electrode, endless metal set surface is provided with some
Individual circular hole, is provided with insulating barrier in circular hole, intert in insulating barrier and be fixed with wire.
Preferably, being provided with endless metal frame at the top of the second electrode, the section of endless metal frame is in the shape of the letter V,
Metallic plate is provided with the top of endless metal frame, third through-hole is provided with metallic plate.
Preferably, the side of the baffle plate is provided with first through hole, the second through hole is provided with first through hole, second leads to
Hole is obliquely installed towards baffle plate inner side, and the second through hole is 72 ° with the angle of euphotic cover.
Preferably, the baffle plate inner side is provided with flange shape minute surface with the junction of euphotic cover.
The beneficial effect brought using above-mentioned technical proposal is：The present invention is by optimizing TURP mechanism and endoscope machine
The structure and mounting means of structure, optimize the molding effect of plasma, improve procedure efficiency, while real in surgical procedure
The quick removing for hydrops of being performed the operation in endoscopic visual is showed.Discharge tip complexed metal ring can form a uniform post
Shape electric field, while coordinating with first electrode and second electrode so that plasma forms a banded structure for stabilization, improves
Cutting speed, reduces blood excessive.Simultaneously during band shaped plasma is cut, hydrops passes through first through hole and second
Through hole is outwards constantly discharged, so as to improve surgical field of view.
Brief description of the drawings
Fig. 1 is a structure chart for specific embodiment of the invention.
Fig. 2 is the structure chart of cutting electrode in a specific embodiment of the invention.
Fig. 3 is the structure chart of metal needle in a specific embodiment of the invention.
Fig. 4 is the structure chart of loop electrode in a specific embodiment of the invention.
Fig. 5 is the structure chart of endoscope mechanism in a specific embodiment of the invention.
Fig. 6 is the structure chart of lens group in a specific embodiment of the invention.
In figure：1st, cutting electrode；2nd, loop electrode；3rd, insulation sleeve；4th, endoscope mechanism；5th, pedestal；6th, discharge tip；7、
Becket；8th, support；9th, first electrode；10th, second electrode；11st, seal casinghousing；12nd, camera；13rd, lens group；14th, printing opacity
Lid；15th, baffle plate；16th, groove；17th, guiding gutter；18th, metal needle；19th, bearing；20th, arc convex portion；21st, first through hole；22、
Second through hole；23rd, flange shape minute surface；24th, insulate silk screen layer；25th, endless metal set；26th, circular hole；27th, insulating barrier；28th, metal
Silk；29th, endless metal frame；30th, metallic plate；31st, third through-hole；32nd, the first convex lens；33rd, the second convex lens；34th, first is recessed
Lens；35th, slide rail；36th, balladeur train；37th, sliding block.
Specific embodiment
Reference picture 1-6, one specific embodiment of the present invention includes cutting electrode 1 and loop electrode 2, the He of cutting electrode 1
Insulation sleeve 3 is provided between loop electrode 2, the outside of insulation sleeve 3 is provided with endoscope mechanism 4, and the cutting electrode 1 includes base
Seat 5, pedestal 5 is provided centrally with discharge tip 6, and the outside of discharge tip 6 is provided with becket 7, and becket 7 is solid by support 8
It is scheduled on pedestal 5；The loop electrode 2 includes the first electrode 9 and second electrode 10 of socket with one heart, and second electrode 10 is located at the
The inner side of one electrode 9, the length of the length less than first electrode 9 of second electrode 10；Endoscope mechanism 4 includes seal casinghousing 11,
The bottom of seal casinghousing 11 is provided with camera 12, and the top of camera 12 is provided with lens group 13, and the top of lens group 13 is provided with
Euphotic cover 14, the edge of euphotic cover 14 is provided with baffle plate 15.The top of discharge tip 6 sets fluted 16, and the edge of groove 16 sets
It is equipped with the guiding gutter 17 being connected with pedestal 5.Be provided with several metal needles 18 in guiding gutter 17, the end of metal needle 18 with lead
Chute 17 is rotatably connected by bearing 19.The top of metal needle 18 is provided with arc convex portion 20, when metal needle 18 rotates, phase
The selective exposure of arc convex portion 20 on adjacent metal needle 18.Insulation silk screen is provided between first electrode 9 and second electrode 10
Layer 24.The top of first electrode 9 is provided with endless metal set 25, and endless metal covers 25 surfaces and is provided with several circular holes 26, circle
Insulating barrier 27 is provided with hole 26, is interted in insulating barrier 27 and is fixed with wire 28.The top of second electrode 10 is provided with annular
Metal frame 29, the section of endless metal frame 29 is in the shape of the letter V, and the top of endless metal frame 29 is provided with metallic plate 30, metallic plate 30
On be provided with third through-hole 31.The side of baffle plate 15 is provided with first through hole 21, and the second through hole 22 is provided with first through hole 21,
Second through hole 22 is obliquely installed towards the inner side of baffle plate 15, and the second through hole 22 is 72 ° with the angle of euphotic cover 14.The inner side of baffle plate 15 with
The junction of euphotic cover 14 is provided with flange shape minute surface 23.
In addition, lens group 13 includes the first convex lens 32, the second convex lens 33 and the first concavees lens 33, the first concavees lens 33
Between the first convex lens 32 and the second convex lens 33, the first convex lens 32 are located near the side of euphotic cover 14.First convex lens
Mirror 32, the second convex lens 33 and the first concavees lens 33 are rotatably provided on sliding block 37, and sliding block 37 is slidably arranged on balladeur train 36, sliding
Frame 36 is slidably arranged on slide rail 35.By adjusting three horizontal ranges of lens and axial angle, regarding for endoscope can be made
Open country is maintained at one most clearly in region.
Clinical test is carried out by the resectoscope that the present invention is provided, compared with existing resectoscope, hand can be significantly improved
Art efficiency simultaneously reduces the generation of postoperative hemorrhage disease.By 100 operations, the experimental data average value of summary is as follows：
| Prostate excision single time | Postoperative hemorrhage rate | |
| The present invention | 2.5h | 3‰ |
| Prior art | 3h | 1% |
General principle of the invention and principal character and advantages of the present invention has been shown and described above.The technology of the industry
Personnel it should be appreciated that the present invention is not limited to the above embodiments, simply explanation described in above-described embodiment and specification this
The principle of invention, without departing from the spirit and scope of the present invention, various changes and modifications of the present invention are possible, these changes
Change and improvement all fall within the protetion scope of the claimed invention.The claimed scope of the invention by appending claims and its
Equivalent thereof.
Claims (9)
1. a kind of improved bipolar plasmakinetic technique mirror, including cutting electrode（1）And loop electrode（2）, cutting electrode（1）With loop electricity
Pole（2）Between be provided with insulation sleeve（3）, insulation sleeve（3）Outside be provided with endoscope mechanism（4）, it is characterised in that：It is described to cut
Cut electrode（1）Including pedestal（5）, pedestal（5）It is provided centrally with discharge tip（6）, discharge tip（6）Outside be provided with metal
Ring（7）, becket（7）By support（8）It is fixed on pedestal（5）On；The loop electrode（2）The first electricity including concentric socket
Pole（9）And second electrode（10）, second electrode（10）Positioned at first electrode（9）Inner side, second electrode（10）Length be less than
First electrode（9）Length；Endoscope mechanism（4）Including seal casinghousing（11）, seal casinghousing（11）Bottom be provided with shooting
Head（12）, camera（12）Top is provided with lens group（13）, lens group（13）Top is provided with euphotic cover（14）, euphotic cover
（14）Edge be provided with baffle plate（15）.
2. improved bipolar plasmakinetic technique mirror according to claim 1, it is characterised in that：The discharge tip（6）Top sets
It is equipped with groove（16）, groove（16）Edge be provided with and pedestal（5）The guiding gutter being connected（17）.
3. improved bipolar plasmakinetic technique mirror according to claim 2, it is characterised in that：The guiding gutter（17）Inside it is provided with
Several metal needles（18）, metal needle（18）End and guiding gutter（17）By bearing（19）Rotatable connection.
4. improved bipolar plasmakinetic technique mirror according to claim 3, it is characterised in that：The metal needle（18）Top set
It is equipped with arc convex portion（20）, in metal needle（18）During rotation, adjacent metal pin（18）On arc convex portion（20）Selectivity
Contact.
5. improved bipolar plasmakinetic technique mirror according to claim 1, it is characterised in that：The first electrode（9）With second
Electrode（10）Between be provided with insulation silk screen layer（24）.
6. improved bipolar plasmakinetic technique mirror according to claim 5, it is characterised in that：The first electrode（9）Top
It is provided with endless metal set（25）, endless metal set（25）Surface is provided with several circular holes（26）, circular hole（26）Inside it is provided with
Insulating barrier（27）, insulating barrier（27）It is interior interspersed to be fixed with wire（28）.
7. improved bipolar plasmakinetic technique mirror according to claim 5, it is characterised in that：The second electrode（10）Top
It is provided with endless metal frame（29）, endless metal frame（29）Section be in the shape of the letter V, endless metal frame（29）Top be provided with gold
Category plate（30）, metallic plate（30）On be provided with third through-hole（31）.
8. improved bipolar plasmakinetic technique mirror according to claim 1, it is characterised in that：The baffle plate（15）Side set
There is first through hole（21）, first through hole（21）On be provided with the second through hole（22）, the second through hole（22）Towards baffle plate（15）Inner side
It is obliquely installed, the second through hole（22）With euphotic cover（14）Angle be 72 °.
9. improved bipolar plasmakinetic technique mirror according to claim 1, it is characterised in that：The baffle plate（15）Inner side and printing opacity
Lid（14）Junction be provided with flange shape minute surface（23）.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510795529.1A CN105232145B (en) | 2015-11-18 | 2015-11-18 | Improved plasma resectoscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510795529.1A CN105232145B (en) | 2015-11-18 | 2015-11-18 | Improved plasma resectoscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105232145A CN105232145A (en) | 2016-01-13 |
| CN105232145B true CN105232145B (en) | 2017-05-17 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510795529.1A Active CN105232145B (en) | 2015-11-18 | 2015-11-18 | Improved plasma resectoscope |
Country Status (1)
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Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106667572B (en) * | 2017-01-04 | 2019-06-21 | 电子科技大学 | A kind of adjustable plasma gas scalpel of plasma beam diameter |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5582610A (en) * | 1994-09-30 | 1996-12-10 | Circon Corporation | Grooved slider electrode for a resectoscope |
| CN201899560U (en) * | 2010-12-22 | 2011-07-20 | 方润医疗器械科技（上海）有限公司 | Low temperature electrode device for soft tissue ablation |
| CN202723980U (en) * | 2012-08-16 | 2013-02-13 | 珠海市司迈科技有限公司 | Rod-shaped cutting electrode of resectoscope |
| WO2014026470A1 (en) * | 2012-08-16 | 2014-02-20 | 珠海市司迈科技有限公司 | Bipolar electrode for resectoscope |
-
2015
- 2015-11-18 CN CN201510795529.1A patent/CN105232145B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5582610A (en) * | 1994-09-30 | 1996-12-10 | Circon Corporation | Grooved slider electrode for a resectoscope |
| CN201899560U (en) * | 2010-12-22 | 2011-07-20 | 方润医疗器械科技（上海）有限公司 | Low temperature electrode device for soft tissue ablation |
| CN202723980U (en) * | 2012-08-16 | 2013-02-13 | 珠海市司迈科技有限公司 | Rod-shaped cutting electrode of resectoscope |
| WO2014026470A1 (en) * | 2012-08-16 | 2014-02-20 | 珠海市司迈科技有限公司 | Bipolar electrode for resectoscope |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105232145A (en) | 2016-01-13 |
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Address after: The third and fourth floors of J5, Nanjing University of Technology Industrial Park, No. 15, Wanshou Road, Pukou Economic Development Zone, Nanjing, Jiangsu 210000 Patentee after: Nanjing Yigao Medical Technology Co.,Ltd. Address before: The third and fourth floors of J5, Nanjing University of Technology Industrial Park, No. 15, Wanshou Road, Pukou Economic Development Zone, Nanjing, Jiangsu 210000 Patentee before: NANJING ECO MICROWAVE SYSTEM Co.,Ltd. |