CN106353841A - Method for preparing photonic crystals by virtue of calculus intramode lamination of melt - Google Patents
Method for preparing photonic crystals by virtue of calculus intramode lamination of melt Download PDFInfo
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- CN106353841A CN106353841A CN201611006261.XA CN201611006261A CN106353841A CN 106353841 A CN106353841 A CN 106353841A CN 201611006261 A CN201611006261 A CN 201611006261A CN 106353841 A CN106353841 A CN 106353841A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
- G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
Abstract
The invention relates to a method for preparing photonic crystals by virtue of calculus intramode lamination of a melt. The method comprises the following steps of: carrying out melt extrusion on two high-polymer materials with different refractive indexes or dielectric constants respectively through two micro-extrusion units, introducing the high-polymer materials into a micro-nano converging unit to form an upper-layer structure and a lower-layer structure through converging, and carrying out division, reversion and lamination for n times by virtue of a micro-nano laminating unit with n runners, so as to obtain a laminated structure with 2n layers; introducing the laminated structure to pass through m micro-nano laminating unit I with 90-degree reversion runners to obtain a laminated structure with 2*nm layers, so as to form one-dimensional photonic crystals; and continuously introducing the laminated structure with 2*nm layers to pass through a micro-nano laminating unit II with 180-degree reversion runners to obtain a laminated structure with 2*nm layers and n columns, so as to form two-dimensional photonic crystals. By referencing a mathematical calculus idea, the preparation of the micro-scale photonic crystal can be realized by virtue of macroscopic equipment, namely the micro-nano laminating units, so that the operating and machining difficulties are reduced, the precision is easily guaranteed, and the arrangement of the prepared photonic crystals is ordered and sequential.
Description
Technical field
The invention belongs to material science, it is related to a kind of method that melt calculus mould internal layer folds standby photonic crystal,
Specifically, it is related to a kind of method that one or more dimensions photonic crystal is prepared by lamination compound extruded or injection moulding
Background technology
Photonic crystal refers to the material of dielectric periodicity change, due to having to the light of characteristic frequency, specific direction
Regulating and controlling effect, has wide practical use in fields such as optical computer, chip, sensors.Photonic crystal is according to spatial distribution
Periodically one-dimensional, two and three dimensions photonic crystal can be divided into, its common feature is with forbidden photon band, its band gap variation rule
Meet Bragg diffraction formula.
The preparation technology of photonic crystal mainly has photoengraving, electrochemical etching, electron beam and focused-ion-beam lithography etc. multiple
Miscellaneous semiconductor microactuator process technology, such as kral etc. (z kral., thin solid films, 2008,516:8059-8063.) are adopted
Etch the two-dimensional pore structure that micropore is prepared for regular arrangement on silicon chip with photoetching combined with electrochemical.In recent years, developed many
Prepare the new method of photonic crystal, such as liu etc. (w y liu., polymer, 2009,50:2716-2726.) is existed using vapor
The droplet that material solution surface condenses is template, prepares photonic crystal by hologram pattern method；Li etc. (xli., langmuir,
2010,26:2930-2936.) with the micro- image of silicone rubber for substrate template, ps and sio is prepared for using self-assembling method2Microsphere
Photonic crystal arrays.
Disclose a kind of preparation method of One-dimensional photonic crystal microsphere in patent (patent No.: cn 103143304 a),
Coated in solution microsphere alternately being immersed successively two kinds of different refractivities, but the poor controllability of every thickness degree.Special
Propose a kind of solvent volatilization self-assembly method in sharp (patent No.: cn 103409802 b) and obtain polymer microballoon to prepare opal
The method of structure photonic crystal, but this method is affected larger by the solvent volatilization factor such as condition and environment, is hardly formed rule
The then photonic crystal arrays of ordered arrangement.Patent (patent No.: cn 103064146 a) is mentioned and is only write skill using femtosecond micro Process
Art, dispersion processing, the method for assembling stacking make one-dimensional, two-dimentional or three-dimensional terahertz wave band photonic crystal, but minute yardstick behaviour
Work is complicated, difficulty is larger.
Content of the invention
The present invention for prior art prepare photonic crystal poor controllability, minute yardstick process operation difficulty big the problems such as, carry
Go out micro-nano stacking in a kind of melt calculus mould and prepare one-dimensional or 2 D photon crystal method.
For achieving the above object, melt calculus mould internal layer of the present invention folds the method for standby photonic crystal by micro- extrusion list
Unit, micro-nano joining unit, micro-nano lamination unit, head unit composition, two micro- extrusion units are respectively with micro-nano joining unit even
Connect, micro-nano joining unit is followed by one or more micro-nano lamination units, after through head unit sizing.Wherein, micro-nano stacking is single
Unit is internal to comprise n runner, has two kinds of forms, and one kind is n 90 ° torsion runners, referred to as micro-nano lamination unit；Another kind of
It is that n/2 180 ° reverses runners and n/2 non-twisted runner distributes alternately, referred to as micro-nano lamination unit.Melt is reversing
Flow passage entry carries out n segmentation, then respectively enters corresponding torsion runner, is finally laminated in exit again, thus
Form micro-nano stepped construction.
Technical scheme for realizing said method is: by the macromolecular material of two kinds of different refractivities or dielectric constant respectively
Melt extruded by two micro- extrusion units, enter micro-nano joining unit and conflux into upper and lower 2 Rotating fields, then in turn through multiple
Micro-nano lamination unit carries out n segmentation, reverses, is laminated, forms one-dimensional or 2 D photon crystal.If comprising 90 ° of torsions through m
The micro-nano lamination unit in turn of tidal stream road, will obtain 2 × nmLayer stacked structure, thus form 1-D photon crystal；If continuing warp again
Cross 1 micro-nano lamination unit comprising 180 ° of torsion runners, 2 × n will be obtainedmLayer, the 2 D photon crystal of n row.
The invention has the beneficial effects as follows: by using for reference mathematical Differential Integral Thought, can achieve have with macroscopical equipment
The preparation of the photonic crystal of micro-scale, reduces operation difficulty of processing, and precision is easily guaranteed that, obtained photonic crystal arranges
Regular orderly.
Brief description
Fig. 1 folds the schematic device of the method for standby photonic crystal for melt calculus mould internal layer of the present invention；
The photonic crystal that Fig. 2 folds the method for standby photonic crystal for melt calculus mould internal layer of the present invention prepares evolution diagram；
The micro-nano lamination unit runner that Fig. 3 folds the method for standby photonic crystal for melt calculus mould internal layer of the present invention is illustrated
Figure；
The micro-nano lamination unit runner that Fig. 4 folds the method for standby photonic crystal for melt calculus mould internal layer of the present invention shows
It is intended to；
The micro-nano lamination unit runner that Fig. 5 folds the method for standby photonic crystal for melt calculus mould internal layer of the present invention shows
It is intended to；
In figure, 1. micro- extrusion unit；2. micro-nano joining unit；3. micro-nano lamination unit；4. micro-nano lamination unit；5.
Head unit；6. micro-nano lamination unit runner；7. micro-nano lamination unit runner, 7-1. micro-nano lamination unit non-twisted stream
Road；180 ° of torsion runners of 7-2. micro-nano lamination unit.
Specific embodiment
The method that melt calculus mould internal layer of the present invention folds standby photonic crystal, as shown in figure 1, by micro- extrusion unit 1, micro-
Receiving joining unit 2, micro-nano lamination unit, head unit 5 forms, and two micro- extrusion units 1 are respectively with micro-nano joining unit 2 even
Connect, micro-nano joining unit 2 is followed by one or more micro-nano lamination units, after through head 5 unit sizing.Wherein, micro-nano stacking
Comprise n runner inside unit, have two kinds of forms, one kind is n 90 ° torsion runners, referred to as micro-nano lamination unit 3；Another
Planting is n/2 180 ° torsion runners and n/2 non-twisted runner distributes alternately, referred to as micro-nano lamination unit 4.Fluid is being turned round
Turn flow passage entry and carry out n segmentation, then respectively enter corresponding torsion runner, be finally laminated again in exit, from
And form micro-nano stepped construction.
Technical scheme for realizing said method is: by the macromolecular material of two kinds of different refractivities or dielectric constant respectively
Melt extruded by two micro- extrusion units 1, enter micro-nano joining unit 2 and conflux into upper and lower 2 Rotating fields, then in turn through many
Individual micro-nano lamination unit carries out n segmentation, reverses, is laminated, forms one-dimensional or 2 D photon crystal.If comprising 90 ° through m
Reverse the micro-nano lamination unit 3 of runner, 2 × n will be obtainedmLayer stacked structure, thus form 1-D photon crystal；If continued
Again through 1 micro-nano lamination unit 4 comprising 180 ° of torsion runners, 2 × n will be obtainedmLayer, the 2 D photon crystal of n row.Figure
2 photonic crystals showing during n=4 prepare evolution diagram, and n is the even number more than or equal to 4, and m is the integer more than or equal to 2；
2 layers of material that two micro- extrusion units 1 melt extrude, are divided into four through a micro-nano lamination unit 3 one, and reverse through 90 °
Form 8 layers, then be divided into four through a micro-nano lamination unit 3 one, and reverse through 90 ° and form 32 layers, be then passed through one micro-
Lamination unit 4 one of receiving is divided into four, and alternate 180 ° rotate, and form 4 row 32 row 2 D photon crystal.
Micro-nano lamination unit runner schematic diagram, as shown in Fig. 3,4,5, is divided into micro-nano lamination unit runner 6 and micro-nano stacking
7 two kinds of forms of unit flow passage, wherein, micro-nano lamination unit runner 7 is by micro-nano lamination unit non-twisted runner 7-1 and micro-
It is spaced that 180 ° of lamination unit of receiving reverses runner 7-2.
The above is concrete equipment and the process condition of the present invention, coordinates each figure to be explained.But the present invention is not
Be confined to above-described concrete equipment and technical process, any based on above-mentioned described for relevant device modification or replace,
Any based on the above-mentioned described local directed complete set for related process, as long as in the range of the realm of spirit of the present invention, belong to
The present invention.
Claims (3)
1. melt calculus mould internal layer fold standby photonic crystal method it is characterised in that: by two kinds of different refractivities or dielectric
The macromolecular material of constant is melt extruded by two micro- extrusion units respectively, enters micro-nano joining unit and confluxes into upper and lower two-layer
Structure, the micro-nano lamination unit being then passed through having n runner carries out n segmentation, reverses, is laminated, obtains 2n layer stacked structure；
Through the above-mentioned m micro-nano lamination unit comprising 90 ° of torsion runners, 2 × n will be obtainedmLayer stacked structure, thus form one-dimensional
Photonic crystal；Continue, again through 1 micro-nano lamination unit comprising 180 ° of torsion runners, 2 × n will be obtainedmLayer, n row two
Dimensional photonic crystal.
2. melt calculus mould internal layer according to claim 1 fold standby photonic crystal method it is characterised in that: micro-nano
N runner is comprised, n/2 180 ° torsion runners and n/2 non-twisted runner distribute alternately inside lamination unit.
3. melt calculus mould internal layer according to claim 1 fold standby photonic crystal method it is characterised in that: n is
Even number more than or equal to 4, m is the integer more than or equal to 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611006261.XA CN106353841A (en) | 2016-11-16 | 2016-11-16 | Method for preparing photonic crystals by virtue of calculus intramode lamination of melt |
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| CN201611006261.XA CN106353841A (en) | 2016-11-16 | 2016-11-16 | Method for preparing photonic crystals by virtue of calculus intramode lamination of melt |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110014709A (en) * | 2019-03-12 | 2019-07-16 | 北京化工大学 | Polyurethane elastomer phonon crystal noise reduction film and its manufacturing method |
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| US20020004307A1 (en) * | 2000-07-05 | 2002-01-10 | Nec Corporation | Photonic crystal multilayer substrate and manufacturing method thereof |
| JP2005331812A (en) * | 2004-05-21 | 2005-12-02 | National Institute Of Advanced Industrial & Technology | Three-dimensional photonic crystal structure and its manufacturing method |
| WO2012111991A2 (en) * | 2011-02-16 | 2012-08-23 | 한국과학기술원 | Metamaterial having a high refractive index |
| CN104260310A (en) * | 2014-08-08 | 2015-01-07 | 北京化工大学 | Device for manufacturing fiber materials and product by laminating method |
| CN204414536U (en) * | 2014-01-27 | 2015-06-24 | 爱丽汶森(北京)材料有限公司 | A kind of micro-nano MULTILAYER COMPOSITE product preparation facilities |
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2016
- 2016-11-16 CN CN201611006261.XA patent/CN106353841A/en active Pending
Patent Citations (6)
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| US20020004307A1 (en) * | 2000-07-05 | 2002-01-10 | Nec Corporation | Photonic crystal multilayer substrate and manufacturing method thereof |
| JP2005331812A (en) * | 2004-05-21 | 2005-12-02 | National Institute Of Advanced Industrial & Technology | Three-dimensional photonic crystal structure and its manufacturing method |
| WO2012111991A2 (en) * | 2011-02-16 | 2012-08-23 | 한국과학기술원 | Metamaterial having a high refractive index |
| CN204414536U (en) * | 2014-01-27 | 2015-06-24 | 爱丽汶森(北京)材料有限公司 | A kind of micro-nano MULTILAYER COMPOSITE product preparation facilities |
| CN104260310A (en) * | 2014-08-08 | 2015-01-07 | 北京化工大学 | Device for manufacturing fiber materials and product by laminating method |
| CN105403935A (en) * | 2015-12-02 | 2016-03-16 | 山东建筑大学 | Preparation method of white-light three-dimensional photonic crystal and apparatus thereof |
Non-Patent Citations (1)
| Title |
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| ZHOU LIBIN: "《The Dispersion Characteristic of 2D Air-Hole-Type Square Photonic Crystal Calculated by Plane Wave Expansion Method》", 《2012 INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY TECHNOLOGY AND ADVANCED MATERIALS(ICNTAM 2012)》 * |
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| CN110014709A (en) * | 2019-03-12 | 2019-07-16 | 北京化工大学 | Polyurethane elastomer phonon crystal noise reduction film and its manufacturing method |
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