CN1165952C - 用于等离子体工艺的工艺检测系统 - Google Patents
用于等离子体工艺的工艺检测系统 Download PDFInfo
- Publication number
- CN1165952C CN1165952C CNB98123402XA CN98123402A CN1165952C CN 1165952 C CN1165952 C CN 1165952C CN B98123402X A CNB98123402X A CN B98123402XA CN 98123402 A CN98123402 A CN 98123402A CN 1165952 C CN1165952 C CN 1165952C
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- plasma
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32963—End-point detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
Abstract
Description
Claims (11)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US954387 | 1997-10-20 | ||
US954,387 | 1997-10-20 | ||
US08/954,387 US5971591A (en) | 1997-10-20 | 1997-10-20 | Process detection system for plasma process |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1224987A CN1224987A (zh) | 1999-08-04 |
CN1165952C true CN1165952C (zh) | 2004-09-08 |
Family
ID=25495357
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB98123402XA Expired - Fee Related CN1165952C (zh) | 1997-10-20 | 1998-10-19 | 用于等离子体工艺的工艺检测系统 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5971591A (zh) |
EP (1) | EP0911863A3 (zh) |
KR (1) | KR19990037208A (zh) |
CN (1) | CN1165952C (zh) |
IL (1) | IL126385A0 (zh) |
TW (1) | TW406331B (zh) |
Families Citing this family (114)
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1997
- 1997-10-20 US US08/954,387 patent/US5971591A/en not_active Expired - Lifetime
-
1998
- 1998-08-07 EP EP98306325A patent/EP0911863A3/en not_active Withdrawn
- 1998-08-11 TW TW087113152A patent/TW406331B/zh not_active IP Right Cessation
- 1998-09-28 IL IL12638598A patent/IL126385A0/xx unknown
- 1998-10-19 CN CNB98123402XA patent/CN1165952C/zh not_active Expired - Fee Related
- 1998-10-20 KR KR1019980043781A patent/KR19990037208A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
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US5971591A (en) | 1999-10-26 |
EP0911863A2 (en) | 1999-04-28 |
CN1224987A (zh) | 1999-08-04 |
IL126385A0 (en) | 1999-05-09 |
KR19990037208A (ko) | 1999-05-25 |
TW406331B (en) | 2000-09-21 |
EP0911863A3 (en) | 2001-09-12 |
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