CN1199410A - 涂覆的塑料基材 - Google Patents

涂覆的塑料基材 Download PDF

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CN1199410A
CN1199410A CN96197584A CN96197584A CN1199410A CN 1199410 A CN1199410 A CN 1199410A CN 96197584 A CN96197584 A CN 96197584A CN 96197584 A CN96197584 A CN 96197584A CN 1199410 A CN1199410 A CN 1199410A
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layer
oxygen
laminating material
protective coating
plasma polymerization
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I－F·胡
P·J·奥科诺
J·C·图
J·H·瑟顿
S·E·巴勒斯
D·J·皮里迪
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Dow Chemical Co
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Abstract

本发明涉及一种层压材料,包含:a)具有一个表面的基材;b)粘合促进层,该层通过将淀积在基材表面上的有机硅化合物在基本不存在氧的条件下进行第一次等离子体聚合而得到;和c)保护性涂层,该层通过将淀积在粘合层表面上的有机硅化合物在106J/kg至108J/kg的能量密度下且在足以超过化学计算量的氧存在下进行第二次等离子体聚合而得到,从而形成式SiO1.8－2.4C0.3－1.0和H0.7－4.0的硅聚合物。该涂层为基材提供耐磨性和耐溶剂性,且粘合促进层防止涂层与基材剥离。涂覆的塑料基材可用于液晶显示装置中代替玻璃。

Description

涂覆的塑料基材
本发明涉及涂覆的塑料基材，其一个实施方案可用于液晶显示装置中。该涂层保护基材不受磨蚀和溶剂降解。
目前，需要具有改进强度的更薄且重量更轻的液晶显示器。这一需要由以下事实表明：昂贵的便携式装置因值10分的玻璃的破裂而遭到毁灭性破坏。此外，某些装置中发生的所有场破坏半数以上是由这种破裂引起的。由于具有优异的柔韧性和抗冲击性，塑料基材为在液晶显示装置(LCD)中用作基材的玻璃的替代品。塑料基材也可通过改进制造方法中的产量而提供比玻璃基材更为经济的优点。
然而，不能因改进强度而牺牲玻璃基材所固有的优点。若选择塑料作为基材，理想的是将其设计成具有一定的物理性能，包括a)光学透明度；b)在加工该显示器所需的温度，通常至少160℃下的稳定性；c)低的双折射；d)对显示器生产中所用化学试剂的耐性；e)光稳定性；f)耐划伤性；g)硬度和h)电阻率。
因此，需要发现一种对用于LCD和其他用途的玻璃的替代品，它克服了玻璃基材的上述缺陷。
图1为9，9-双(4-羟苯基)芴和双酚A的共聚碳酸酯的应力光学系数(SOC)与玻璃化转变温度(Tg)的图。
在第一方面，本发明为一种层压材料，包括：
a)具有一个表面的塑料基材；
b)粘合促进层，该层通过将淀积在基材表面上的有机硅化合物在足以产生用于粘合的界面化学反应的能量水平下且在基本不存在氧的条件下进行第一次等离子体聚合而得到；和
c)保护性涂层，该层通过将淀积在粘合层表面上的有机硅化合物在106J/kg至108J/kg的能量密度下且在比步骤(b)中氧浓度高的氧存在下进行第二次等离子体聚合而得到。
在第二方面，本发明为一种层压材料，包括：
a)具有一个表面且厚度为0.1-10mm的塑料基材；
b)粘合促进层，该层通过将淀积在基材表面上的四甲基二硅氧烷在基本不存在氧的条件下进行等离子体聚合得到且厚度为1000-2000；
c)保护性涂层，该层通过将淀积在粘合促进层表面上的四甲基二硅氧烷在106J/kg至108J/kg的能量密度且在足以超过化学计算量的氧存在下进行等离子体聚合而得到，从而形成式SiO1.8-2.4C0.3-1.0和H0.7-4.0的有机硅化合物，该化合物含有滞留的水和至少一种下列官能基团：Si-O-Si-，-Si-CH2-，-Si-H或-Si-OH；其中该保护性涂层厚度不低于0.1μm且不超过2μm；和
d)SiOx层，该层为淀积在保护性涂层表面上的四甲基二硅氧烷在超过化学计算量的氧存在下且在至少4倍于用于形成保护性涂层的能量密度的能量密度下等离子体聚合得到的层，其中SiOx层的厚度不低于0.1μm且不大于1μm。
本发明的层压材料能耐磨和耐溶剂，这是因为存在层状涂层。此外，该涂层因存在粘合促进层而耐剥离。
用于本发明层压材料的基材可以是热塑性或热固性材料。合适的热塑性材料实例包括聚乙烯，聚丙烯，聚苯乙烯，聚乙酸乙烯酯，聚乙烯醇，聚乙烯醇缩醛，聚甲基丙烯酸酯，聚丙烯酸，聚醚，聚酯，聚碳酸酯，纤维素树脂，聚丙烯腈，聚酰胺，聚酰亚胺，聚氯乙烯，含氟树脂和聚砜。热固性材料的实例为环氧树脂和脲三聚氰胺树脂。
基材的厚度与应用有关，但优选不低于0.1mm，更优选不低于0.3mm，最优选不低于0.5mm，且优选不超过10mm，更优选不超过5mm，最优选不超过2mm。
基材的表面首先用粘合促进层涂覆，该层通过将淀积在基材表面上的有机硅化合物进行等离子体聚合而形成。有机硅化合物等离子体聚合以生产粘合促进层在足以产生用于粘合的界面化学反应的能量水平下进行，优选在5×107J/kg至5×109J/kg的能量水平下。粘合促进层在不存在或基本不存在载气如氧的条件下制备。术语“基本不存在氧”在本文中用来表示等离子体聚合方法中氧的存在量不足以氧化有机硅化合物中的所有硅和碳。类似地，术语“超过化学计算量的氧”在本文中用来表示所存在的氧的总摩尔数大于有机硅化合物中硅和碳的总摩尔数。
粘合促进层的厚度与应用有关，优选不低于50，更优选不低于500，最优选不低于1000，且优选不超过10000，更优选不超过5000，最优选不超过2000。
然后用保护性涂层涂敷粘合促进层，该保护性涂层通过将淀积在粘合促进层表面上的有机硅化合物在106J/kg至108J/kg的能量密度且在高于形成粘合促进层所用的氧浓度下等离子体聚合而得到。优选保护性涂层在超过化学计算量的氧存在下形成。
基材的保护性涂层厚度主要取决于涂层以及基材的性能，但通常足够厚以赋予基材耐溶剂性。优选涂层厚度不低于0.1μm，更优选不低于0.4μm，最优选不低于0.8μm，且不大于10μm，更优选不大于5μm，最优选不大于2μm。
层压材料可非必要地包含SiOx层，该层通过将淀积在保护性涂层表面上的有机硅化合物在超过化学计算量的氧存在下且在至少两倍，更优选至少4倍，最优选6倍于用来形成保护性涂层的能量密度的能量密度下进行等离子体聚合得到。该层方便地称作SiOx层。然而，该SiOx层也可含有氢和碳原子。该SiOx层的厚度通常低于保护性涂层的厚度，且优选不低于0.01μm，更优选不低于0.02μm，最优选不低于0.05μm，且优选不大于5μm，更优选不大于2μm，最优选不大于1μm。
理想的是用交替的保护性涂层和SiOx层涂覆粘合促进层。保护性涂层与SiOx层的厚度比优选不低于1∶1，更优选不低于2∶1，且优选不大于10∶1，更优选不大于5∶1。
有机硅聚合物涂层由有机硅化合物如硅烷，硅氧烷或硅氮烷制备。硅烷的实例包括二甲氧基二甲基硅烷，甲基三甲氧基硅烷，四甲氧基硅烷，甲基三乙氧基硅烷，二乙氧基二甲基硅烷，甲基三乙氧基硅烷，三乙氧基乙烯基硅烷，四乙氧基硅烷，二甲氧基甲基苯基硅烷，苯基三甲氧基硅烷；3-缩水甘油氧丙基三甲氧基硅烷，3-甲基丙烯酰氧丙基三甲氧基硅烷，二乙氧基甲基苯基硅烷，三(2-甲氧基乙氧基)乙烯基硅烷，苯基三乙氧基硅烷和二甲氧基二苯基硅烷。硅氧烷的实例包括四甲基二硅氧烷(TMDSO)和六甲基二硅氧烷。硅氮烷的实例包括六甲基硅氮烷和四甲基硅氮烷。
有机硅聚合物涂层优选通过US 5,298,587中所公开的等离子体增强的化学蒸汽淀积(PECVD)技术施加。
在本发明的一个方面，层压材料呈光学透明且包含一种应力光学系数(SOC)为-2000至+2500 Brewsters和Tg(由差示扫描量热法测定)优选为160-270℃的基材。优选基材的SOC不低于-1000，更优选不低于-500，最优选不低于-100，且不大于1000，更优选不大于500，最优选不大于100 Brewsters。基材的Tg优选不低于180℃，更优选不低于190℃，最优选不低于200℃，至不大于250℃，更优选不大于240℃，最优选不大于230℃。术语“光学透明”在本文中用来表示根据ASTM D-1003测得基材的总透光率为至少80％，优选至少85％。
对于液晶显示应用，基材优选包含碳酸酯聚合物，该聚合物可以为均聚物或共聚物或具有所需SOC和Tg的共混物。优选基材包含碳酸酯聚合物，它为芳族多醇，更优选芳族二醇与碳酸酯前体的反应产物。芳族二醇的代表性实例包括邻苯二酚，氢醌，二羟基萘，二羟基蒽，双(羟芳基)芴，二羟基菲，二羟基联苯和双(羟苯基)丙烷。优选芳族二醇包括9，9-双(4-羟苯基)芴和双酚A。
适用于制备这些碳酸酯聚合物的碳酸酯前体在本领域是众所周知的且包括碳酸衍生物，光气，卤代甲酸酯，或碳酸酯如碳酸二甲酯或碳酸二苯酯。碳酸酯聚合物可以由多种聚合方法制备，如界面方法，溶液方法或熔融方法，所有这些在本领域是众所周知的。
优选基材包含的碳酸酯聚合物含有二羟基芳基芴单体和双酚单体，更优选9，9’-二羟基芳基芴和双酚A的重复单元。9，9’-二羟基芳基芴与双酚A的单元比优选不低于30∶70，更优选不低于40∶60，且优选不大于90∶10，更优选不大于70∶30。
图1图示说明多种9，9-二羟苯基芴(BHPF)和双酚A(BPA)的共聚碳酸酯的SOC和Tg变化。该图表明BHPF/BPA为30∶70至90∶10mol％的共聚碳酸酯的SOC和Tg尤其适于液晶显示器应用中。最佳SOC(SOC等于0)发生在BHPF/BPA比为70∶30，而最佳Tg发生在稍低的比率下。幸运的是，Tg的调整可以在不显著改变SOC的情况下进行，例如通过将酯单元掺入碳酸酯聚合物中以制备碳酸酯/酯共聚物，或通过将聚酯和/或碳酸酯/酯共聚物与碳酸酯聚合物共混。掺入碳酸酯聚合物中的酯单元浓度或与碳酸酯聚合物共混的聚酯和/或碳酸酯/酯共聚物量足以达到所需的Tg，而不显著降低其他物理性能。
优选酯单元为脂族或芳族二酸或二酰氯的反应产物。脂族二酸或二酰氯优选为C3-12二酸或二(酰氯)，更优选C4-8二酸或二(酰氯)，最优选己二酸，己二酰氯，丁二酸或丁二酰氯。芳族二酸优选为对苯二甲酸，对苯二甲酰氯，间苯二甲酸，间苯二甲酰氯，2，6-萘二甲酸，或2，6-萘二酰氯。优选基材中酯单元的浓度基于碳酸酯单元和酯单元总摩尔数为10-50mol％。
以下实施例仅用于说明，而不是用来限制本发明范围。除非另有说明，所有百分比均为重量∶重量。
实施例1-SiOxCyHz涂覆的碳酸酯聚合物的制备
A.制备60∶40(摩尔比)的BHPF/BPA共聚碳酸酯
按如下制备60mol％9，9-双(4-羟苯基)芴(BHPF)和40mol％双酚A(BPA)的共聚碳酸酯。向100ml高压反应器(装有活塞)中加入BPA(0.913g，4.0mmol)，BHPF(2.102g，6.0mmol)，叔丁酚(0.045g，0.30mmol)，50％NaOH水溶液(2.0g，25.0mmol)和水(16.14g)。用氮气吹扫反应器。将氮气吹过反应器内部空间10分钟，然后盖紧活塞。将密封的反应器放入水浴(69-71℃)中并搅拌溶液。单体溶解后将光气在二氯甲烷中的溶液(20.08g，6.65％溶液，13mmol)使用一个25ml气密注射器加到搅拌的混合物中。取出注射器并振摇反应混合物30秒。通过隔膜由注射器加入第二份50％NaOH(2.0g，25mmol)。
振摇混合物1分钟，然后用注射器加入额外的二氯甲烷(11.17g)，再加入4-二甲氨基吡啶(0.6ml 1％水溶液)。振摇该混合物1分钟，然后将反应器在冰浴中振荡。打开反应器，吸移水相。有机相用1N HCl洗1次并用水洗两次，然后通过蒸发除去溶剂。所得共聚碳酸酯的Tg为230℃(PC-230)。该通用程序用于制备额外量的共聚碳酸酯，并将它们注塑成127×127×1.6mm的板。
B.制备BHPF/BPA共聚碳酸酯共混物
通过干混以A部分所述方式制备的共聚碳酸酯(56重量份)与双酚A聚碳酸酯(44重量份)制备Tg为190℃的BHPF/BPA共聚碳酸酯共混物(PC-190)。将所得混合物使用30mm Werner-Pfleiderer挤出机(进料区设在200℃，剩下4个区设在310℃)挤塑并造粒。
C.PECVD涂层在碳酸酯聚合物基材上的淀积
高度交联的有机硅涂层(通式SiOxCyHz)的淀积在装有US5,320,875的图1、2和3中所示喷淋头平面磁控管阴极的PECVD不锈钢箱中进行。将A或B部分制备的板(PC-230或PC-190)放入阴极上方3.2cm处，并围绕该阴极的中心。首先用1000-1500厚的等离子体聚合的TMDSO粘合层涂敷该板。将TMDSO(4sccm)通过喷淋头阴极供入室中。该喷淋头的气体入口孔均匀分布在磁控管阴极的等离子体环上。气体入口的这种构型通过使分子流过最强的等离子体区域而达到最大程度的四甲基二硅氧烷分解。用MKS Inc.的Model 1152蒸气流控制器控制TMDSO蒸气流，并用ENI电源(Model PlasmaLoc 2)提供等离子体能量。在粘合促进层淀积过程中加于等离子体上的能量为500瓦(W)，40Khz，相当于6.3×108J/kg的能量密度。室内基础压力低于1m Torr。加工压力大约为27mTorr。
通过将40sccmO2(流速由Model 1160 MKS气流控制器控制)和4sccm TMDSO混合物供入室中而将高度交联的有机硅涂层淀积到粘合层上。在淀积过程中加于等离子体上的能量为40W，40Khz，对应于2.9×107J/kg的能量密度。
涂敷板对N-甲基吡咯烷酮(NMP)的耐性通过将1滴NMP加到涂敷表面上，然后使其在用水漂洗前保留5分钟而测定。目测无浑浊表明对NMP具有耐性。对于PC-230，1.0，1，2，1.4和1.6μm厚的涂层赋予耐溶剂性。对于PC-190，1.2，1.4和1.6μm厚的涂层赋予耐溶剂性。
实施例2-SiOxCyHz/SiOx涂敷的碳酸酯聚合物的制备
将实施例1中制得的具有粘合促进层的板(PC-190或PC-230)用SiOx和有机硅涂层交替涂敷。各SiOx涂层厚0.072μm，各高度交联的有机硅涂层厚0.262μm。第一层SiOx涂层通过将40sccmO2(流速由Model 1160MKS气流控制器控制)和4sccm TMDSO混合物供入室中而施于板上。在淀积过程中加于等离子体上的能量为250W，40Khz，对应于1.8×108J/kg的能量密度。然后使用实施例1中所述条件施加第一层有机硅涂层。施加第二层SiOx涂层，然后是第二层有机硅涂层，再后是第三层SiOx涂层，最后是第三层有机硅涂层。涂层总厚度为1.0μm。PC-190和PC-230样品用这种交替涂敷技术都能耐NMP。

Claims (10)

1.一种层压材料，包含：
a)具有一个表面的塑料基材；
b)粘合促进层，该层通过将淀积在基材表面上的有机硅化合物在足以产生用于粘合的界面化学反应的能量水平下且在基本不存在氧的条件下进行第一次等离子体聚合而得到；和
c)保护性涂层，该层通过将淀积在粘合层表面上的有机硅化合物在106J/kg至108J/kg的能量密度下且在比步骤(b)中氧浓度高的氧存在下进行第二次等离子体聚合而得到。
2.权利要求1的层压材料，还包含SiOx层，该层通过将淀积在保护性涂层表面上的第三种有机硅化合物在超过化学计算量的氧存在下且在至少两倍于用于形成保护性涂层的能量密度的能量密度下进行等离子体聚合得到。
3.权利要求2的层压材料，还包含交替的保护性涂层和SiOx层。
4.权利要求1-3中任一项的层压材料，其中等离子体聚合的有机硅聚合物各自独立地选自包括二甲氧基二甲基硅烷，甲基三甲氧基硅烷，四甲氧基硅烷，甲基三乙氧基硅烷，二乙氧基二甲基硅烷，甲基三乙氧基硅烷，三乙氧基乙烯基硅烷，四乙氧基硅烷，二甲氧基甲基苯基硅烷，苯基三甲氧基硅烷，3-缩水甘油氧丙基三甲氧基硅烷，3-甲基丙烯酰氧丙基三甲氧基硅烷，二乙氧基甲基苯基硅烷，三(2-甲氧基乙氧基)乙烯基硅烷，苯基三乙氧基硅烷，二甲氧基二苯基硅烷，四甲基二硅氧烷，六甲基二硅氧烷，六甲基硅氮烷和四甲基硅氮烷。
5.权利要求1-4中任一项的层压材料，其中等离子体聚合的有机硅聚合物各自为四甲基二硅氧烷。
6.权利要求1-5中任一项的层压材料，其中基材为包含碳酸酯前体与芳族二醇的反应产物的重复单元的碳酸酯聚合物。
7.权利要求6的层压材料，其中芳族二醇包括邻苯二酚，间苯二酚，氢醌，二羟基萘，二羟基蒽，双(羟芳基)芴，二羟基菲，二羟基联苯，或双(羟苯基)丙烷。
8.权利要求7的层压材料，其中9，9-双(4-羟苯基)芴与双酚A的重复单元比为40∶60-70∶30。
9.权利要求1-7中任一项的层压材料，其中基材的Tg不低于180℃且不大于240℃，层压材料的SOC不低于-1000 Brewsters且不大于1000 Brewsters，该层压材料光学透明。
10.一种层压材料，包含：
a)具有一个表面且厚度不低于0.1mm且不大于10mm的塑料基材；
b)粘合促进层，该层通过将淀积在基材表面上的四甲基二硅氧烷在基本不存在氧的条件下进行等离子体聚合得到且厚度为1000-2000；
c)保护性涂层，该层通过将淀积在粘合促进层表面上的四甲基二硅氧烷在106J/kg至108J/kg的能量密度且在相对于四甲基二硅氧烷足以超过化学计算量的氧存在下进行等离子体聚合而得到，从而形成式SiO1.8-2.4C0.3-1.0和H0.7-4.0的有机硅化合物，该化合物含有滞留的水和至少一种下列官能基团：Si-O-Si-，-Si-CH2-，-Si-H或-Si-OH；其中该保护性涂层厚度不低于0.1μm且不超过2μm；和
d)SiOx层，该层为淀积在保护性涂层表面上的四甲基二硅氧烷在超过化学计算量的氧存在下且在至少4倍于用于形成保护性涂层的能量密度的能量密度下等离子体聚合得到的层，其中SiOx层的厚度不低于0.1μm且不大于1μm。
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100444974C (zh) * 2003-05-19 2008-12-24 关西涂料株式会社 在塑料基材上形成涂膜的方法
CN100469820C (zh) * 2000-02-18 2009-03-18 罗狄亚化学公司 用具有反应性功能的可聚合和/或可交联有机组合物处理塑料材料表面
CN101198722B (zh) * 2005-06-16 2010-12-08 创新系统技术公司 通过等离子体在至少一个侧面形成薄涂层的聚合物制品及其生产方法
WO2022007536A1 (zh) * 2020-07-06 2022-01-13 江苏菲沃泰纳米科技股份有限公司 透明耐磨膜层、塑料表面改性方法以及产品

Families Citing this family (104)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5989998A (en) * 1996-08-29 1999-11-23 Matsushita Electric Industrial Co., Ltd. Method of forming interlayer insulating film
FR2756292B1 (fr) * 1996-11-26 1998-12-24 Saint Gobain Vitrage Procede de preparation d'une feuille en matiere plastique, cette feuille et vitrage la comportant
US6110544A (en) * 1997-06-26 2000-08-29 General Electric Company Protective coating by high rate arc plasma deposition
US6390020B1 (en) 1997-10-01 2002-05-21 The Dow Chemical Company Dual face shower head magnetron, plasma generating apparatus and method of coating substrate
US6054379A (en) * 1998-02-11 2000-04-25 Applied Materials, Inc. Method of depositing a low k dielectric with organo silane
DE19808180A1 (de) * 1998-02-26 1999-09-09 Bosch Gmbh Robert Kombinierte Verschleißschutzschicht, Verfahren zur Erzeugung derselben, die damit beschichteten Objekte und deren Verwendung
DE19815182A1 (de) * 1998-04-04 1999-10-14 Beiersdorf Ag Verfahren zur Herstellung von Haftvermittlerschichten
DE19819414A1 (de) * 1998-04-30 1999-11-04 Leybold Ag Für ein Kunststoffsubstrat bestimmtes Schichtpaket und Verfahren zum Erzeugen eines solchen Schichtpaketes
DE19901834A1 (de) 1999-01-19 2000-07-20 Leybold Systems Gmbh Verfahren zum Beschichten von Substraten aus Kunststoff
US6520650B2 (en) 1999-02-08 2003-02-18 Valeo Sylvania L.C.C. Lamp reflector with a barrier coating of a plasma polymer
US6426125B1 (en) 1999-03-17 2002-07-30 General Electric Company Multilayer article and method of making by ARC plasma deposition
US6517687B1 (en) 1999-03-17 2003-02-11 General Electric Company Ultraviolet filters with enhanced weatherability and method of making
US6365016B1 (en) 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
US6261694B1 (en) 1999-03-17 2001-07-17 General Electric Company Infrared reflecting coatings
US6420032B1 (en) * 1999-03-17 2002-07-16 General Electric Company Adhesion layer for metal oxide UV filters
US6582823B1 (en) 1999-04-30 2003-06-24 North Carolina State University Wear-resistant polymeric articles and methods of making the same
GB9925016D0 (en) * 1999-10-23 1999-12-22 Univ Sheffield Binding surface
US20010030876A1 (en) 1999-12-03 2001-10-18 Ing-Feng Hu Self-cleaning automotive head lamp
US6376064B1 (en) * 1999-12-13 2002-04-23 General Electric Company Layered article with improved microcrack resistance and method of making
US6577802B1 (en) * 2000-07-13 2003-06-10 Corning Incorporated Application of silane-enhanced adhesion promoters for optical fibers and fiber ribbons
FR2812568B1 (fr) * 2000-08-01 2003-08-08 Sidel Sa Revetement barriere depose par plasma comprenant une couche d'interface, procede d'obtention d'un tel revetement et recipient revetu d'un tel revetement
US7128804B2 (en) * 2000-12-29 2006-10-31 Lam Research Corporation Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
KR20030074783A (ko) * 2001-02-05 2003-09-19 다우 글로벌 테크놀로지스 인크. 플라스틱 기판 위의 유기 발광 다이오드
US20030215652A1 (en) * 2001-06-04 2003-11-20 O'connor Paul J. Transmission barrier layer for polymers and containers
JP2003011661A (ja) * 2001-06-25 2003-01-15 Exatec Llc 自動車用固定グレイジングを提供するためのパネルおよび方法
US6733714B2 (en) * 2001-08-13 2004-05-11 Edwin J. Oakey Method for forming high-impact, transparent, distortion-free polymeric material
US20030044553A1 (en) * 2001-08-23 2003-03-06 Ravi Ramanathan Fuel tanks
WO2003031362A1 (en) 2001-10-05 2003-04-17 Dow Global Technologies Inc. Coated glass for use in displays and other electronic devices
US20040052975A1 (en) * 2002-04-18 2004-03-18 Minoru Komada Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
US20030228475A1 (en) * 2002-04-18 2003-12-11 Minoru Komada Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
US20040023818A1 (en) * 2002-08-05 2004-02-05 Nguyen Philip D. Method and product for enhancing the clean-up of hydrocarbon-producing well
EP1388593B1 (de) * 2002-08-07 2015-12-30 Schott AG Schnelles Verfahren zur Herstellung von Mehrfachlagen-Barriereschichten
EP1388594B1 (de) * 2002-08-07 2010-01-06 Schott Ag Verfahren zum Herstellen von glatten Barriereschichten und Verbundmaterial mit glatter Barriereschicht
US7399500B2 (en) * 2002-08-07 2008-07-15 Schott Ag Rapid process for the production of multilayer barrier layers
DE10258678B4 (de) * 2002-12-13 2004-12-30 Schott Ag Schnelles Verfahren zur Herstellung von Multilayer-Barriereschichten
US7056584B2 (en) * 2002-10-11 2006-06-06 General Electric Company Bond layer for coatings on plastic substrates
AU2003290687A1 (en) * 2002-11-12 2004-06-03 Dow Global Technologies Inc. Process and apparatus for depositing plasma coating onto a container
KR101162377B1 (ko) * 2003-03-28 2012-07-09 도요 세이칸 가부시키가이샤 플라즈마 ｃｖｄ법에 의한 화학 증착막 및 그 형성 방법
US20080171185A9 (en) * 2003-04-17 2008-07-17 Minoru Komada Barrier film and laminated material, container for wrapping and image display medium using the saw, and manufacturing method for barrier film
JP4194450B2 (ja) * 2003-08-27 2008-12-10 富士フイルム株式会社 磁気記録再生方法および磁気記録媒体
US7360552B2 (en) * 2004-04-23 2008-04-22 Dow Global Technologies Inc. Injectable structural adhesive
FR2872911B1 (fr) * 2004-07-07 2006-09-15 Commissariat Energie Atomique Procede de localisation d'une espece chimique ou biologique sur un substrat, microsysteme d'analyse et biopuce
EP1799877B2 (en) * 2004-08-18 2016-04-20 Dow Corning Corporation Sioc:h coated substrates
US7736728B2 (en) * 2004-08-18 2010-06-15 Dow Corning Corporation Coated substrates and methods for their preparation
EP1785266A4 (en) * 2004-09-01 2011-03-16 Konica Minolta Holdings Inc GASSPERRENM MULTILAYER BODY AND METHOD OF MANUFACTURING THEREOF
US20080095954A1 (en) * 2004-09-27 2008-04-24 Gabelnick Aaron M Multilayer Coatings By Plasma Enhanced Chemical Vapor Deposition
CA2582286A1 (en) * 2004-10-29 2006-05-11 Dow Global Technologies Inc. Abrasion resistant coatings by plasma enhanced chemical vapor deposition
US20060192183A1 (en) * 2005-02-28 2006-08-31 Andreas Klyszcz Metal ink, method of preparing the metal ink, substrate for display, and method of manufacturing the substrate
US9714371B2 (en) 2005-05-02 2017-07-25 Trican Well Service Ltd. Method for making particulate slurries and particulate slurry compositions
US20070212486A1 (en) * 2005-05-20 2007-09-13 Dinega Dmitry P Plasma Enhanced Chemical Vapor Deposition of Metal Oxide
DE602005011870D1 (de) * 2005-07-01 2009-01-29 Commissariat Energie Atomique Hydrophobe oberflächenbeschichtung mit geringer benetzungshysterese, aufbringungsverfahren dafür, mikrokomponente und verwendung
US20090130463A1 (en) * 2005-10-05 2009-05-21 John Dean Albaugh Coated Substrates and Methods for their Preparation
US7842355B2 (en) * 2005-11-01 2010-11-30 Applied Materials, Inc. System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties
US20070095281A1 (en) * 2005-11-01 2007-05-03 Stowell Michael W System and method for power function ramping of microwave liner discharge sources
US8251688B2 (en) 2006-05-12 2012-08-28 PH Realty, Inc. Apparatus for a mold vacuum system and method of forming a sheet utilizing the system
US20070286966A1 (en) * 2006-06-09 2007-12-13 Meng Chen Method of depositing an abrasion-resistant layer onto an electroluminescent plastic window
US8674007B2 (en) 2006-07-12 2014-03-18 Sabic Innovative Plastics Ip B.V. Flame retardant and scratch resistant thermoplastic polycarbonate compositions
DE602007005017D1 (de) * 2006-10-20 2010-04-08 3M Innovative Properties Co Verfahren für leicht zu reinigende substrate und artikel daraus
JP2010522828A (ja) * 2007-03-28 2010-07-08 ダウ コ−ニング コ−ポレ−ション ケイ素及び炭素を含むバリヤー層のロールツーロールプラズマ強化化学蒸着法
BRPI0810971A2 (pt) 2007-04-26 2015-07-21 Trican Well Service Ltd Método de controle do arraste de particulados por fluidos e composição de lodo aquoso do método
JP5325879B2 (ja) 2007-05-01 2013-10-23 エグザテック・リミテッド・ライアビリティー・カンパニー カプセル化プラスチックパネル及びそのパネルを作製する方法
CN101778719B (zh) * 2007-08-14 2013-05-01 东洋制罐株式会社 具有真空蒸镀膜的生物降解性树脂容器和真空蒸镀膜的形成方法
RU2446496C2 (ru) * 2007-10-08 2012-03-27 Абб Рисерч Лтд Поверхностно модифицированная система электроизоляции с улучшенной трекингостойкостью и эрозионной стойкостью
ATE500597T1 (de) * 2007-10-08 2011-03-15 Abb Research Ltd Oberflächenmodifiziertes elektrisches isolationssystem mit verbessertem tracking und erosionswiderstand
US20100255216A1 (en) * 2007-11-29 2010-10-07 Haley Jr Robert P Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
US8197909B2 (en) * 2008-08-26 2012-06-12 Ford Global Technologies, Llc Plasma coatings and method of making the same
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
PL2251453T3 (pl) 2009-05-13 2014-05-30 Sio2 Medical Products Inc Uchwyt na pojemnik
WO2013170052A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
CN101697343B (zh) * 2009-10-27 2011-06-15 苏州纳科显示技术有限公司 一种薄膜封装方法
DE102009058099A1 (de) * 2009-12-12 2011-06-16 Bayer Materialscience Ag Polycarbonatblends mit hoher Wärmeformbeständigkeit und verbesserten Oberflächeneigenschaften
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
DE102010063887B4 (de) * 2010-12-22 2012-07-19 BSH Bosch und Siemens Hausgeräte GmbH Verfahren zum Herstellen eines pyrolysetauglichen Bauteils eines Gargeräts sowie pyrolysetaugliches Bauteil für ein Gargerät
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US9441133B2 (en) * 2011-08-26 2016-09-13 Exatec, Llc Organic resin laminate, methods of making and using the same, and articles comprising the same
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
US10543662B2 (en) 2012-02-08 2020-01-28 Corning Incorporated Device modified substrate article and methods for making
WO2013180467A1 (ko) * 2012-05-29 2013-12-05 주식회사 엘지화학 인쇄용 실리콘 블랭킷 및 이의 제조방법
US9428287B2 (en) 2012-10-31 2016-08-30 BIOMéRIEUX, INC. Methods of fabricating test sample containers by applying barrier coatings after sealed container sterilization
WO2014071061A1 (en) 2012-11-01 2014-05-08 Sio2 Medical Products, Inc. Coating inspection method
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
JP6382830B2 (ja) 2012-11-30 2018-08-29 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 医療シリンジ、カートリッジ等上でのｐｅｃｖｄ堆積の均一性制御
US9340443B2 (en) 2012-12-13 2016-05-17 Corning Incorporated Bulk annealing of glass sheets
US9523110B2 (en) * 2013-02-15 2016-12-20 Biomerieux, Inc. Culture containers with internal top coating over gas barrier coating and associated methods
US20160015898A1 (en) 2013-03-01 2016-01-21 Sio2 Medical Products, Inc. Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus
KR102167557B1 (ko) 2013-03-11 2020-10-20 에스아이오2 메디컬 프로덕츠, 인크. 코팅된 패키징
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
US10510576B2 (en) 2013-10-14 2019-12-17 Corning Incorporated Carrier-bonding methods and articles for semiconductor and interposer processing
WO2015112958A1 (en) 2014-01-27 2015-07-30 Corning Incorporated Articles and methods for controlled bonding of thin sheets with carriers
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
EP3129221A1 (en) 2014-04-09 2017-02-15 Corning Incorporated Device modified substrate article and methods for making
KR102573207B1 (ko) 2015-05-19 2023-08-31 코닝 인코포레이티드 시트와 캐리어의 결합을 위한 물품 및 방법
US11905201B2 (en) 2015-06-26 2024-02-20 Corning Incorporated Methods and articles including a sheet and a carrier
CA3204930A1 (en) 2015-08-18 2017-02-23 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
GB201522552D0 (en) * 2015-12-21 2016-02-03 Spts Technologies Ltd Method of improving adhesion
TW202216444A (zh) 2016-08-30 2022-05-01 美商康寧公司 用於片材接合的矽氧烷電漿聚合物
TWI810161B (zh) 2016-08-31 2023-08-01 美商康寧公司 具以可控制式黏結的薄片之製品及製作其之方法
US20200171244A1 (en) * 2017-05-24 2020-06-04 Sio2 Medical Products, Inc. Sterilizable pharmaceutical package for ophthalmic formulations
WO2019118660A1 (en) 2017-12-15 2019-06-20 Corning Incorporated Method for treating a substrate and method for making articles comprising bonded sheets

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3413019A1 (de) * 1984-04-06 1985-10-17 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zum aufbringen einer duennen, transparenten schicht auf der oberflaeche optischer elemente
JP3009520B2 (ja) * 1991-09-26 2000-02-14 株式会社リコー 薄膜積層デバイス用プラスチック基板およびそれを用いた薄膜積層デバイス
JP2755844B2 (ja) * 1991-09-30 1998-05-25 シャープ株式会社 プラスチック基板液晶表示素子
JP2777758B2 (ja) * 1991-10-28 1998-07-23 シャープ株式会社 液晶表示装置の製造方法
JP2958186B2 (ja) * 1992-04-20 1999-10-06 シャープ株式会社 プラスチック基板液晶表示素子
JP3118339B2 (ja) * 1992-08-07 2000-12-18 三井化学株式会社 ガスバリヤー性透明導電性積層体とその製造法
JPH06145317A (ja) * 1992-11-05 1994-05-24 Teijin Chem Ltd 新規芳香族ポリエステルカーボネート樹脂
US5298587A (en) * 1992-12-21 1994-03-29 The Dow Chemical Company Protective film for articles and method
JP2828569B2 (ja) * 1993-08-11 1998-11-25 帝人株式会社 光学用フイルムまたはシート
JP3732531B2 (ja) * 1993-08-11 2006-01-05 帝人株式会社 液晶デイスプレー用基板
US5459176A (en) * 1993-12-23 1995-10-17 Soane Technologies, Inc. Radiation curable coating for plastic articles
JPH07216078A (ja) * 1994-01-28 1995-08-15 Teijin Chem Ltd 位相差フィルム

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100469820C (zh) * 2000-02-18 2009-03-18 罗狄亚化学公司 用具有反应性功能的可聚合和/或可交联有机组合物处理塑料材料表面
CN100444974C (zh) * 2003-05-19 2008-12-24 关西涂料株式会社 在塑料基材上形成涂膜的方法
CN101198722B (zh) * 2005-06-16 2010-12-08 创新系统技术公司 通过等离子体在至少一个侧面形成薄涂层的聚合物制品及其生产方法
WO2022007536A1 (zh) * 2020-07-06 2022-01-13 江苏菲沃泰纳米科技股份有限公司 透明耐磨膜层、塑料表面改性方法以及产品

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