CN1250488A - 斯腾特氏支架的制备方法 - Google Patents

斯腾特氏支架的制备方法 Download PDF

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CN1250488A
CN1250488A CN98803235A CN98803235A CN1250488A CN 1250488 A CN1250488 A CN 1250488A CN 98803235 A CN98803235 A CN 98803235A CN 98803235 A CN98803235 A CN 98803235A CN 1250488 A CN1250488 A CN 1250488A
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pipe fitting
preparation
stent support
stent
support according
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托马斯·特罗茨纳
格里·戈姆林格
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InterVentional Technologies Inc
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Abstract

本发明公开一种斯腾特氏支架的制备方法,其涉及无需平面图案的边缘连接从而没有接点的加工管件。该方法包括步骤:将污物从管件(20)上除掉,用光敏抗蚀剂材料(24)涂覆金属管件外表面,将管件置于设计的装置内的同时旋转管件,同时使特定构型的照相框架负片在UV光源和管件(26)之间通过,将管件外表面裸露于光抗蚀剂显影液一定时间(28),将多于的显影液和未老化的刻蚀剂从管件外表面淋洗掉(30),用电化学方法处理管件除掉未被覆盖的金属(32)。

Description

斯腾特氏支架的制备方法
本发明一般涉及用于治疗人体脉管腔阻塞(硬化)的一种经皮的透过管腔(translmninal)的器件和方法。具体涉及制备斯腾特氏支架(Stent)或假体的改进方法。另外，还涉及该改进方法使用的一种新型设备。
心血管疾病是当今社会面临的最严重的影响健康的疾病之一。冠状动脉病患和阻塞会阻碍血液流动并造成组织局部缺血和坏死。关于心血管硬化疾病的确切病因学仍然存在问题，而同时治疗冠状动脉狭窄更受到限制。当在一个或多个动脉中存在一些病患部分时，冠状动脉旁路移植物的外科结构物(CABG)是通常选择的方法。常规的打开心脏的外科手术当然会使经历这种治疗的患者遭受严重侵害和创伤。在许多情况下，为减少创伤，用经皮治疗心血管疾病作为替代方法是有效的。这些替代的治疗方法通常是采用各种类型的囊球(血管成形术)或切除器件(动脉切除术)来改造或去除大块病患的脉管部分。另一种替代治疗方法涉及在硬化的损伤里经皮的、管腔内安装一个或多个可膨胀的管状斯腾特氏支架或者假体。管腔内血管修复移植是一种替代常规血管手术的方法。管腔内血管移植涉及经皮插入一种血液脉管的管状修复移植物，并且要经过导管将其输送到血管系统内所要求的位置。代替经皮血管再形成的方法是将静脉、动脉或从主动脉来的其他旁路部分手术安置在冠状动脉上，这将需要打开心脏的手术，并有显著的致病率和死亡率。经皮血管再形成方法的超过常规血管手术的优点包括其避免了外科裸露、切除、替换或旁路分流有缺陷的血液脉管，包括心肺分流、开胸和一般的麻醉。
作为植入物的斯腾特氏支架或假体是本领域公知的，其功能是维持人体体腔的开放并将这种植入物专门用于血液脉管。它们具有代表性的是形成一种管状金属网，其在向内施加压力时能膨胀。作为选择，也可形成围成管状的丝网。本发明涉及对斯腾特氏支架制备方法的一种改进。
斯腾特氏支架或假体可用于人体内的各种管状结构，非限制性包括动脉和静脉、输尿管、普通的胆管等等。斯腾特氏支架用来扩张血管腔或在血管成形术或动脉切除术(atherectomy)操作后维持其开放，切开压在主动脉上的动脉瘤，对脉管壁切开的固定(tack)，消除瓣膜内裂伴随原发性干预程序造成闭塞的危险，或者防止脉管的弹性回缩。
斯腾特氏支架可在动脉切除术后使用，它们是切除斑块，或切除囊球的血管成形术，其是在动脉壁扩张前划痕，以便维持脉管的急性和长期开放。
斯腾特氏支架也可用于旁路分流以维持脉管开放。斯腾特氏支架还能在呼吸道、胆道、泌尿系或其他束道中加固萎陷的结构。
如授予Palmaz的US4776337中所公开的是通过激光切割薄壁金属管来制造管状金属网形状。用激光切除该网直线和曲线外的一切。US4776337的方法能用于相当大的网形体而且网的直线相当宽。但是对柔弱和/或复杂的形体，激光斑的尺寸就太大了。
EP 0709067 A2公开了一种斯腾特氏支架的制备方法，这种方法是准备平面图案设计、在平面板材上切割图案，使板材变形造成接触边缘，通常用焊接方法以最小触点将边缘连接，然后将最终产物抛光。这种方法的缺点是必须将平面板材变形来形成最终的管状结构，并且存在纵向接合点(其使外形轮廓有了非连续点)，这将是失败的潜在弱点。而且焊接在冶金和化学上是不稳定的，其会在人体内退化。另外，这种方法需要几个被本发明取消的严格的制造步骤。
US 5514154和5421955公开了一种斯腾特氏支架的制备方法，其是使用计算机控制激光选择性去除抗蚀剂涂层来形成类似设计的斯腾特氏支架。用激光选择性去除抗蚀剂涂层相当昂贵和复杂。激光器必须连接控制X-Y两维移动体系的计算机，该体系必须精确控制制造斯腾特氏支架激光器的旋转和移动。这种方法中的变化将超越进入所制造斯腾特氏支架中的变化。而本发明既不需要昂贵的激光体系也不需要复杂的移动体系。
因此，本发明一个目的是提供一种斯腾特氏支架的制备方法，其可由管件制备相对复杂、柔软和精细设计的斯腾特氏支架，该管件克服了现有技术的缺点。
本发明另一个目的是提供一种斯腾特氏支架的制备方法，其涉及加工一种无需连接平面图案边缘从而没有接点的管件。
本发明涉及通过加工管件制备一种斯腾特氏支架的方法。在该制备过程中，使用一种新型设备使涂覆管件对由专门设计的软片所控制的UV光的精确图案曝光，其软片在旋转时移过管件。
该制备方法包括用合适溶液首先电清洗管件的步骤。除非指明可采用任何数目的金属元素，管件包括不锈钢，铂、金合金或金/铂合金。
管件上的污物一旦被洗净掉，就用光敏抗蚀剂均匀涂覆其外表面。可选择地使用一种偶联剂来促进光敏抗蚀剂对管件的粘合。偶联剂并不是必需的，在某些管件组合物直接与光敏抗蚀剂溶液粘合时就不需要偶联剂。
然后将涂覆管件置于一个设备上，该设备是设计用来旋转管件的，同时该涂覆管件对紫外光(UV)的设计图案曝光。该设备对涂覆管件曝光的控制是通过使用带有由特定计算机产生的印刷图案的照相软片，并将特定图案的紫外光传输到涂覆管件来进行的。紫外光激活光敏抗蚀剂，使处于紫外光区域的光敏抗蚀剂曝光(交联)。在紫外光曝光区域的光敏抗蚀剂形成交联，由此则形成硬化和固化了的聚合物图案，其是模拟被未固化聚合物包围的斯腾特氏支架特别设计的图案。薄膜能适应事实上是数量不限的复杂的斯腾特氏支架设计。源于该装置的方法得到的管件具有经曝光了的光敏材料的非连续图案，其上保留了未曝光的光敏抗蚀剂区域。
将曝光的管件在负性抗蚀剂显影液内浸渍一定时间。显影液可去除相对柔软且未固化的光敏抗蚀剂聚合物并留下已固化的模拟斯腾特氏支架设计的光敏抗蚀剂。随后用合适的溶剂淋洗将多余的显影液从管件上除掉。与此同时，将整个管件保温一定时间，使留下的光敏抗蚀剂聚合物完全固化(硬化)而附着在加工管件的表面。
之后将加工好的管件按照电化学刻蚀方法裸露，将被未覆盖的金属从管件上除掉，得到最终管件或斯腾特氏支架构型。
事实上，这种方法本身就提供了不限数目的斯腾特氏支架设计和构型。通过改进软片并采用同一方法，人们就能制造各种斯腾特氏支架设计。
以下参照附图并结合下文的详述对本发明做充分的了解和领会。
附图说明
图1是本发明斯腾特氏支架制备方法的流程图；
图2是本发明经抛光的斯腾特氏支架在其操作环境下的示意图；
图3是本发明制备方法首先清洗步骤的示意图；
图4是带有用于管件外表面的可选择的偶联剂的本发明管件的剖视图；
图5A是在软片上印刷斯腾特氏支架图案的一个软片框架俯视图；
图5B是在软片片材上的几个框架的斜视俯视图，其每个框架的软片带有一个印刷的斯腾特氏支架图案；
图6是所用装置的侧视图，装置能同时旋转涂覆管件，推进软片并使管件的部分外表面对紫外光曝光；
图7是曝光于紫外光的涂覆管件在负性抗蚀剂显影液中浸渍得到斯腾特氏支架粗品的加工步骤的示意图；
图8是从斯腾特氏支架粗品上淋洗多余负性抗蚀剂显影液的加工步骤的示意图；
图9是化学或电化学处理斯腾特氏支架粗品得到斯腾特氏支架抛光产品的加工步骤的示意图；
图10是由本发明制备方法得到斯腾特氏支架的透视图；
图11是沿图10中11-11线的斯腾特氏支架外表面的一个构型的剖视图，其表示梯形突出的构型，它是直接从本发明制备方法得到斯腾特氏支架的纵轴径向伸出的；
图12是沿图10中11-11的斯腾特氏支架外表面的另一个构型的剖视图，其表示三角形突出的构型，它是直接从本发明制备方法得到斯腾特氏支架的纵轴径向伸出的；
图13是沿图10中11-11线的斯腾特氏支架外表面再一个构型的剖视图，其表示有半圆基底突出的构型，它是直接从本发明制备方法得到斯腾特氏支架的纵轴径向伸出的；
图14是本发明斯腾特氏支架制备方法所用设备的透视图；
图15是沿表示设备的透视图的图1中2-2线的设备的剖视图；
图16是光源和控制平台的剖视图；
图17是设备的控制平台放大的剖视图；
图18是控制平台的透视图。
实施例
现在参照图1说明本发明的斯腾特氏支架的制备方法。
在本发明斯腾特氏支架的制备方法中，绘图表达的斯腾特氏支架由计算机设计，其产生带有所希望的斯腾特氏支架图案的以展开格式40存在的打印输出。步骤40的图案可印刷在任何尺寸的打印输出上，但是一般必须要缩小，使之适合照相软片42和所希望的斯腾特氏支架设计尺寸的要求。斯腾特氏支架图案的绘图样被缩小后转印在高对比度的透明软片44上。最终步骤要求调整透光软片使之与所用制备方法46中管件的周边和尺寸相匹配。
管件可以是任何类型的生物配伍性材料，例如不锈钢，铂，金合金或铂/金合金，或者用生物配伍性材料被覆的材料。用于管件的不锈钢材料中优选的目标是316类或321类不锈钢。形成管件的方法是公知的挤出技术。优选具有相对恒定的直径、同心度、厚度和无缝度的管件。
为了加工特殊管件，优选清洗并去除污物20。根据管件的材质和所用的光敏抗蚀剂材料，决定是否需用偶联剂来增强光敏抗蚀剂与管件外表面的粘合性。因此，清洗后可选择地使用偶联剂22涂覆管件外表面。然后用光敏溶液24涂覆加工后的管件。下一步是，用一种新型装置，其使涂覆的抗蚀剂对紫外光26的特定图案曝光。之后将曝光的管件浸入负性抗蚀剂显影液28中，从而将未曝光的抗蚀剂从加工管件上除掉。
图2是本发明抛光的斯腾特氏支架在操作环境下的示意图。本发明得到的斯腾特氏支架可用于治疗动脉粥样硬化疾病，防止脉管回弹，切除压在主动脉上的动脉瘤，对脉管壁切开的固定，消除瓣膜在冠状天然脉管和旁路分流时造成闭塞的危险。斯腾特氏支架还能用于呼吸道、胆道、泌尿系或其他束道中加固萎陷的结构。
关于步骤20、22和24，如图3所示说明了一种简单的操作方法，其是将管件64裸露在容器62内的清洗溶液60、偶联剂61或光敏抗蚀剂63中。例如，Amway公司生产的工业清洗溶剂型洗涤剂是合适的商品化清洗溶液的一个实例。在目前的发明方法中采用大量的有机硅烷偶联剂。商品化有机硅偶联剂的一些实例包括Union Carbide公司制造的乙烯基三乙氧基硅烷，和Dow Coming公司制造的Z-6040(含有缩水甘油氧基三甲氧基硅烷)或Z-6020(含有氨乙基氨丙基三甲氧基硅烷)。OlinIndustries公司制造的Probimide是合适商品化光敏抗蚀剂的一个实例。光将管件64裸露在商品化光敏抗蚀剂63中时，抗蚀剂聚合物层的厚度取决于裸露时间长短，可能的裸露方法或其他变量。采用控制光敏抗蚀剂厚度的一种方法是均匀拉拽管件通过光敏抗蚀剂溶液一特定的时间，以便得到所要求涂层的厚度。另外，在裸露加工期间，保护管件内腔使其不触及光敏抗蚀剂聚合物是合乎要求的。
本领域技术人员显而易见的是将一个或多个管件放入清洗溶液中的标准方法是可商业化的，并可与本发明一起使用。另外，本领域技术人员显然知道，用偶联剂或光敏抗蚀剂涂覆一个或多个管件的标准方法也是可商业化的，并可与本发明一起使用。如上所述，不同金属组成的目标管件要求不同的商品化光敏抗蚀剂，或者如果需要，还要求不同的偶联剂。
图4A是用光敏抗蚀剂66涂覆管件64外表面的剖视图。在该实例中，管件64和抗蚀剂66之间的粘合性能足够坚强有力从而无需使用偶联剂中间层。例如，使用316类或321类不锈钢与Olin Industrie公司制造的Probimide是光敏抗蚀剂/管件合适结合的一个实例，它不需要偶联剂。技工应当了解，有几类聚合物能用于本发明一起使用，从而起到保护涂层的作用。
图4B是用光敏抗蚀剂66涂覆管件64外表面的剖视图。偶联剂68夹杂在管件64和光敏抗蚀剂66之间。该实例中，粘合性能要求使用偶联剂来促进和增强管件64和光敏抗蚀剂66之间的粘合。例如使用金合金或铂金属作管件与Probimide光敏抗蚀剂是这种结合的一个实例，其中需要有机硅烷偶联剂来加强管件和抗蚀剂之间的粘合。
如图5A和图5B所示是在透明照相软片上印刷的优选斯腾特氏支架构型。由计算机程序产生绘图款式，并将其缩小并打印在透明软片上。例如，一种叫作ALGOR的压缩解析程序被用于使计算机产生打印输出显象。然后将打印输出发送至薄膜加工设施，其打印输出缩小并得到精确尺寸的负片。如下文详述，必须调整负片的尺寸以供特定的斯腾特氏支架设计用。由于关于专利附图有禁止大面积涂黑的规则，所示对用来代表照相软片的附图的解释是必需的。在图5A和图5B中，让紫外光通过软片的开放(透明)位置用实体黑线和交互环表示。图5A和图5B的白色区域代表软片的裸露区域(黑色)，其将阻止紫外光通过软片和阻止下面区域对紫外光的曝光。本发明采用的适宜薄膜的实例是柯达公司制造的KodakALI-4 Accumax软片。斯腾特氏支架印刷件的长度77直接等于(1比1)管件64的周边长度。宽度75等于加工的斯腾特氏支架的操作长度。图5B表示的是透明照相软片76，其带有优选斯腾特氏支架构型的多个框架70。
图6表示部分设备，其包括位于具有在组件内密封的灯泡81和灯丝80的一般构型以外的紫外灯82。控制平台84包括带有顶板88的基底84。专门成形的狭缝87将紫外光汇聚成一窄束，其到达并透过透明薄膜76上的特定图案。用紫外光照射涂覆管件的选定部分，其使曝光的光敏抗蚀剂反应并改变其性质(固化和硬化)，且将电化学刻蚀后得到的留下的这些部分作为斯腾特氏支架的支柱118。
平台还包括与管件64啮合的旋转元件86。旋转元件86可结合通过旋转元件上方的软片共同移动。
在步骤28中，图7说明将管件92裸露在容器94内的负性抗蚀剂显影液90中的一种简单方式。技工应当了解，有许多商品化的溶剂可选择性去除未曝光的光敏抗蚀剂聚合物保护涂层；还显然知道，也很明显可采用标准方法将一个或多个管件裸露在负性抗蚀剂显影液中。
图8表示步骤30，其中装置100用来去除未曝光的光敏抗蚀剂或聚合物保护涂层，并用于采用合适溶剂102将多余的负性抗蚀剂显影液或其他选择性溶剂从部分曝光的管件上淋洗除掉。在优选实施方案中，OlinIndostries公司制造的QZ3501是淋洗多余负性抗蚀剂显影液的合适溶剂的一个实例。
图9说明步骤30，其中用电化学装置将未曝光的金属材料自曝光后的管件92上除掉。图9显示出电化学溶液110盛在容器(member)116内。在优选实施方案中，使用磷酸和硫酸结合来刻蚀未曝光的金属材料。Hydrite Industries公司制造的Hydrite 4000是合适商品化的电化学刻蚀溶液的一个实例，该溶液含有硫酸和磷酸。在使用不锈钢304类构成管件时，优选的电化学刻蚀溶液包括氯化铁溶液。如果管件由金合金或铂构成，可用其他电化学刻蚀溶液如氰化钾、王水(盐酸和硝酸)或次氯酸钠。为激活刻蚀剂溶液，可将阴极112(其被浸入刻蚀剂溶液中)提供的负电荷送到带正电荷的电极114，其被啮合到最终的管件119上(其中的两者都被浸入刻蚀剂溶液中)。阴极通常采用的材料是铂或金。本领域技术人员应当懂得在此可采用由电化学手段处理一个或多个管件的标准方法。
图10表示本发明方法得到的优选斯腾特氏支架设计72。对紫外光曝光并改变物理特性(老化和硬化)的部分光抗蚀剂在电化学加工期间依然如故并原封不动地作为斯腾特氏支架72的支柱或环圈118。对紫外光未曝光的部分光抗蚀剂在电化学加工期间被除去，从而得到了敞开的空间120。从支柱118和敞开空间120得到的结构包括所要求斯腾特氏支架的构型。
本发明能得到有特定构型支柱118的优选斯腾特氏支架设计72。图11、图12和图13是三种典型的斯腾特氏支架支柱设计例的剖视图。如图11所示，优选的斯腾特氏支架的支柱有一个以梯形构型134向外突出的部分，其直接从斯腾特氏支架纵轴径向伸出。优选斯腾特氏支架的图案采用图11的剖面式样，其有一系列环圈(U型)118和一个环绕斯腾特氏支架全长的单独主支柱，从而形成斯腾特氏支架设计的基本构架。
可形成任何尺寸的图10和图11图案；在形成(挤压)时其优选尺寸范围是直径的千分之0.035-0.100之间。应用于优选的2.5-6.0mm的冠状动脉，其扩展或展开的直径范围是2.0-8.0mm之间。斯腾特氏支架的长度从其初始形成长度至其扩展时的长度实际上是保持恒定的，并且其范围是2-50mm，对冠状动脉应用优选5-20mm。
在另一个选择性实施方案中，斯腾特氏支架72的图案类似于图10和图11的图案，但支柱的向外部分不同，其包括三角形构型132(图12)，其中三角形的点直接从斯腾特氏支架的纵轴径向伸出。在另一个实施方案中，斯腾特氏支架72的图案类似于图10和图11的图案，但支柱的向外部分不同，其包括半圆形伸展的基底130(图13)，其是直接从斯腾特氏支架的纵轴径向伸出。
最后，将斯腾特氏支架72抛光，以除去由该方法不能去掉的任何多余材料。可通过用外周边带金刚砂的抛光棍棒摩擦斯腾特氏支架72内部来进行机械抛光。作为选择，可另外使用电抛光步骤。
图14是本发明斯腾特氏支架制备方法使用的装置的简单示意图。平板台上安装的是支承装置141，其用于在Y型调整平台84上方装载含有UV光源82的壳体箱142。UV光源的波长范围是360-440纳米，优选390纳米。
一系列的斯腾特氏支架重复图案或各单独的框架70在与旋转轴146啮合的软片缠绕轴147上被印刷出来。马达143被啮合并使旋转轴146旋转，其速度由控制器140调节。在平板台上还安装了用于承载已啮合到旋转轴86上的涂覆管件64的调整平台84。调整平台的顶部包括一个平板，其内安装了两个水平的面向内的切入调整平台84的斜槽。该顶部含有特定构型的位于软片76和涂覆管件64上方的中心狭缝87。该构型狭缝的功能是起狭缝透镜的作用，并将光源得到的UV光汇聚在软片的狭窄区域。在这个装置的简单实例中，软片与在旋转轴86上自由旋转的管件64啮合。在管件64上方照相软片的移动产生一种旋转力，其与软片的上升和谐一致。一种未示的选择方法是使用同步马达机械装置，其对软片上升和管件相对旋转两者都能控制。还有未示的一种装置，其是从调整平台上自动除去曝光了的管件92并更换上一涂覆管件64。自动机械装置要求在许多单独的斯腾特氏支架图案(框架)70之间软片的移动与管件的更换要相一致。
在平板台的侧面安装另一个含有旋转轴150的支承装置154。在照相软片148尾端悬挂一重物，其功能是向照相软片提供一种张力以保证其与涂覆管件64的足够接合。对重物148(未示)而言，一种卷轴或任何数目的张力机械装置就足够了。
图15是沿表示装置的示意图的图14中的2-2线的装置的剖视图，由剖视图可见调整平台84上方UV光源82、狭缝87和管件64的相对位置。由图中还可见，重物148提供张力以使照相软片对管件保持接合。
图16是光源和调整平台的剖视图。该图说明光源82在面向调整平台84的方向定向。扩散的紫外光(用自光源散发的箭头表示)完全进入特定构型的狭缝87。该图还说明本装置的一个实施方案，其中照相软片76(箭头表示)的推进在涂覆管件64上面(其与薄膜共同移动)产生了旋转力(表示为顺时针)。
图17是装置调整平台的放大剖视图，特别显示了聚集狭缝87的构型。光进入斜角90，其使电磁波能成漏斗状进入狭窄通道92且最终落到照相软片76上。软片上打印输出的图案阻断了某些光线；同时图案上的空格让光线到达并与涂覆管件64上的光敏抗蚀剂起反应。这种方法使斯腾特氏支柱图案从相当平坦的照相软片上输送到圆筒状的管件上。
图18是调整平台的侧视示意图。该图显示了调整平台84的一个截面，其描述了其中的一个斜角90和狭缝87的狭窄通道92的一个侧面。其还说明斜角90和通道92的宽度大约等于照相软片76的宽度。也显示了照相软片76与涂覆管件64的啮合。设计并调节框架70的长度77使其等于管件64的周边。
本领域技术人员显然知道，本发明绝非限于上面详述。而本发明范围仅由权利要求书限定。

Claims (57)

1.一种斯腾特氏支架的制备方法，其包括下述步骤：
(a)用光敏抗蚀剂涂覆金属管件外表面，得到涂覆管件；
(b)将所述涂覆管件置于一种装置内，该装置能使所述涂覆管件的所述外表面对光源选择一部分曝光，同时选择其他部分遮挡光源，得到部分曝光的管件；
(c)将所述部分曝光的管件浸入负性抗蚀剂显影液中得到处理的管件；和
(d)用电化学刻蚀方法加工所述经处理的管件，以便将遮挡所述光源的位于所述管件的选择部分的金属除掉。
2.根据权利要求1所述的斯腾特氏支架的制备方法，其进一步包括在用所述光敏抗蚀剂涂覆所述金属管件的所述外表面之前清洗所述管件的步骤。
3.根据权利要求1所述的斯腾特氏支架的制备方法，其进一步包括在用所述的光敏抗蚀剂材料涂覆所述金属管件的所述外表面之前用一种偶联剂涂覆所述管件的所述外表面的步骤。
4.根据权利要求1所述的斯腾特氏支架的制备方法，其进一步包括在将所述部分曝光管件浸入所述负性抗蚀剂显影液之后，于一定温度范围内保温所述管件的步骤，所述温度范围为100-400℃之间。
5.根据权利要求1所述的斯腾特氏支架的制备方法，其中所述光源对所述涂覆管件的所述曝光受印刷在照相软片上的图案控制。
6.根据权利要求2所述的斯腾特氏支架的制备方法，其进一步包括在清洗所述管件之后在一定温度范围加热所述管件的步骤，所述温度范围为100-200℃之间。
7.根据权利要求1所述的斯腾特氏支架的制备方法，其中所述光源具有波长范围是360-440纳米的波长，优选波长390纳米。
8.根据权利要求1所述的斯腾特氏支架的制备方法，其中所述光源具有对所用特定光抗蚀剂的最佳化的优选波长。
9.根据权利要求3所述的斯腾特氏支架的制备方法，其中所述偶联剂包括有机硅烷化合物。
10.根据权利要求1所述的斯腾特氏支架的制备方法，其中多个斯腾特氏支架由单一管件制造。
11.根据权利要求1所述的斯腾特氏支架的制备方法，其中制造所述管件的材料选自聚合物，不锈钢，钛、铂、金合金，金/铂合金和钽。
12.根据权利要求1所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用磷酸和硫酸溶液。
13.根据权利要求1所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用氯化铁溶液。
14.根据权利要求1所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用氰化钾溶液。
15.根据权利要求1所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用次氯酸钠溶液。
16.根据权利要求1所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用盐酸和硝酸的溶液。
17.一种斯腾特氏支架的制备方法，其包括下述步骤：
(a)用光敏抗蚀剂涂覆金属管件外表面，得到涂覆管件；
(b)将所述涂覆管件置于一种装置内，其中在旋转所述涂覆管件的同时连同推进照相软片，其能控制所述涂覆管件的外表面对光源选择一部分曝光并选择其他部分遮挡光源，得到部分曝光的管件；
(c)将所述部分曝光的管件浸入负性刻蚀剂显影液中得到经处理的管件；和
(d)用化学刻蚀方法加工经处理的管件，以便除掉未被覆盖的金属的部分。
18.根据权利要求17所述的斯腾特氏支架的制备方法，其进一步包括在用所述光敏抗蚀剂涂覆所述金属管件的外表面之前清洗所述管件的步骤。
19.根据权利要求17所述的斯腾特氏支架的制备方法，其进一步包括在用所述光敏抗蚀剂材料涂覆所述金属管件的外表面之前用偶联剂涂覆所述管件的外表面的步骤。
20.根据权利要求17所述的斯腾特氏支架的制备方法，其进一步包括在将所述部分曝光的管件浸入所述负性刻蚀剂显影液中的步骤之后，于一定温度范围内保温所述管件的步骤，所述温度范围为100-400℃之间。
21.根据权利要求17所述的斯腾特氏支架的制备方法，其中所述光源对所述斯腾特氏支架的曝光受在透明照相软片上的斯腾特氏支架的图案控制。
22.根据权利要求18所述的斯腾特氏支架的制备方法，其进一步包括在清洗所述管件之后，于一定温度范围加热所述管件的步骤，所述温度范围为100-200℃之间。
23.根据权利要求17所述的斯腾特氏支架的制备方法，其中所述光源具有波长范围是360-440纳米，优选波长390纳米。
24.根据权利要求17所述的斯腾特氏支架的制备方法，其中所述光源具有对所用特定光抗蚀剂最佳化的优选波长。
25.根据权利要求19所述的斯腾特氏支架的制备方法，其中所述偶联剂包括有机硅烷化合物。
26.根据权利要求17所述的斯腾特氏支架的制备方法，其中多个斯腾特氏支架由单一管件制造。
27.根据权利要求17所述的斯腾特氏支架的制备方法，其中制造所述管件的材料选自聚合物，不锈钢，钛、铂、金合金，金/铂合金和钽。
28.根据权利要求17所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用磷酸和硫酸溶液。
29.根据权利要求17所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用氯化铁溶液。
30.根据权利要求17所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用氰化钾溶液。
31.根据权利要求17所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用次氯酸钠溶液。
32.根据权利要求17所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用盐酸和硝酸的溶液。
33.一种用于在管件上印刷图象的装置，其包括：
旋转管件的设备；
印刷有构型的照相软片；
连同所述旋转管件一起移动所述照相软片的设备；和
在所述管件上对光敏涂层曝光的光源。
34.根据权利要求33所述的用于在管件上印刷图象的装置，其中所述的连同所述旋转管件一起移所述照相软片的设备促使软片与所述管件外表面的接合。
35.根据权利要求33所述的用于在管件上印刷图象的装置，其中所述连同所述旋转管件一起移动所述照相软片的设备是通过同步齿轮机械作用运行的。
36.根据权利要求33所述的用于在管件上印刷图象的装置，其进一步包括用于引导所述照相软片进入卷轴的设备。
37.根据权利要求33所述的用于在管件上印刷图象的装置，其进一步包括向所述照相软片施加一种力，以便保持软片与所述管件的所述外表面接合。
38.根据权利要求33所述的用于在管件上印刷图象的装置，其进一步包括移除曝光管件并取代涂覆管件的设备。
39.根据权利要求33所述的用于在管件上印刷图象的装置，其中所述印刷包括斯腾特氏支架构型。
40.一种斯腾特氏支架的制备方法，其包括下述步骤：
(a)用保护性聚合物涂料涂覆金属管件外表面，得到涂覆管件；
(b)将所述涂覆管件置于一种装置内，该装置能使所述涂覆管件的所述外表面对光源选择一部分曝光同时选择其他部分遮挡光源，得到一些聚合物涂料曝光的和一些聚合物涂料未曝光的部分曝光的管件；
(c)将所述部分曝光的管件浸入溶剂，以选择性除去未曝光聚合物涂料，得到经处理的管件；和
(d)用电化学刻蚀方法加工所述经处理的管件，以便将遮挡所述光源的位于所述管件的选择部分的金属除掉。
41.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述保护性聚合物涂料包括光敏抗蚀剂。
42.根据权利要求40所述的斯腾特氏支架的制备方法，其中用于选择性除去未曝光聚合物涂料的溶剂包括负性抗蚀剂显影液。
43.根据权利要求40所述的斯腾特氏支架的制备方法，其进一步包括在用所述保护性聚合物涂料涂覆金属管件的外表面之前清洗所述管件的步骤。
44.根据权利要求40所述的斯腾特氏支架的制备方法，其进一步包括在用所述保护性聚合物涂料涂覆金属管件的外表面之前用偶联剂涂覆所述管件的外表面的步骤。
45.根据权利要求40所述的斯腾特氏支架的制备方法，其进一步包括在将所述部分曝光的管件浸入所述溶剂以选择性除去未曝光聚合物涂料之后，于一定温度范围内保温所述管件的步骤，所述温度范围为100-400℃之间。
46.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述光源对涂覆管件的曝光受印刷在照相软片上的图案控制。
47.根据权利要求43所述的斯腾特氏支架的制备方法，其进一步包括在清洗所述管件之后，于一定温度范围内加热所述管件的步骤，所述温度范围为100-200℃之间。
48.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述光源具有波长范围是360-440纳米，优选波长390纳米。
49.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述光源具有对所用特定光抗蚀剂最佳化的优选波长。
50.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述偶联剂包括有机硅烷化合物。
51.根据权利要求40所述的斯腾特氏支架的制备方法，其中多个斯腾特氏支架由单一管件制造。
52.根据权利要求40所述的斯腾特氏支架的制备方法，其中制造所述管件的材料选自聚合物，不锈钢，钛、铂、金合金，金/铂合金和钽。
53.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用磷酸和硫酸溶液。
54.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用氯化铁溶液。
55.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用氰化钾溶液。
56.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用次氯酸钠溶液。
57.根据权利要求40所述的斯腾特氏支架的制备方法，其中所述电化学刻蚀加工采用盐酸和硝酸的溶液。
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CN103352246B (zh) * 2010-05-19 2015-08-19 易生科技(北京)有限公司 支架抛光装置和方法

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US5902475A (en) 1999-05-11
IL131599A0 (en) 2001-01-28
US20030218735A1 (en) 2003-11-27
WO1998045506A1 (en) 1998-10-15
KR20000076061A (ko) 2000-12-26
US6475233B2 (en) 2002-11-05
AU6953798A (en) 1998-10-30
EP0973961A1 (en) 2000-01-26
US6545748B1 (en) 2003-04-08
AU725350B2 (en) 2000-10-12
US20020091438A1 (en) 2002-07-11
CA2283850C (en) 2007-12-04
US6774985B2 (en) 2004-08-10
US20010010014A1 (en) 2001-07-26
CA2283850A1 (en) 1998-10-15
EP0973961A4 (en) 2000-08-02

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