DE1001448T1 - Dünnfilm-Plasmabehandlungsvorrichtung - Google Patents

Dünnfilm-Plasmabehandlungsvorrichtung

Info

Publication number
DE1001448T1
DE1001448T1 DE1001448T DE00101894T DE1001448T1 DE 1001448 T1 DE1001448 T1 DE 1001448T1 DE 1001448 T DE1001448 T DE 1001448T DE 00101894 T DE00101894 T DE 00101894T DE 1001448 T1 DE1001448 T1 DE 1001448T1
Authority
DE
Germany
Prior art keywords
thin film
treatment device
plasma treatment
film plasma
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE1001448T
Other languages
English (en)
Other versions
DE10001894B4 (de
DE10001894A1 (de
Inventor
Geoffrey N Drummond
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Industries Inc
Original Assignee
Advanced Energy Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Industries Inc filed Critical Advanced Energy Industries Inc
Publication of DE1001448T1 publication Critical patent/DE1001448T1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H01J2237/0044—Neutralising arrangements of objects being observed or treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
DE1001448T 1992-12-30 1993-12-28 Dünnfilm-Plasmabehandlungsvorrichtung Pending DE1001448T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/998,513 US5427669A (en) 1992-12-30 1992-12-30 Thin film DC plasma processing system

Publications (1)

Publication Number Publication Date
DE1001448T1 true DE1001448T1 (de) 2000-10-05

Family

ID=25545314

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69329239T Expired - Lifetime DE69329239T2 (de) 1992-12-30 1993-12-28 Gleichspannungsversorgung für plasmareaktor
DE1001448T Pending DE1001448T1 (de) 1992-12-30 1993-12-28 Dünnfilm-Plasmabehandlungsvorrichtung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69329239T Expired - Lifetime DE69329239T2 (de) 1992-12-30 1993-12-28 Gleichspannungsversorgung für plasmareaktor

Country Status (5)

Country Link
US (1) US5427669A (de)
EP (2) EP0628212B1 (de)
JP (2) JP3485924B2 (de)
DE (2) DE69329239T2 (de)
WO (1) WO1994016458A1 (de)

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Also Published As

Publication number Publication date
WO1994016458A1 (en) 1994-07-21
DE69329239T2 (de) 2001-01-25
JP2004006230A (ja) 2004-01-08
EP0628212A1 (de) 1994-12-14
US5427669A (en) 1995-06-27
JP3671177B2 (ja) 2005-07-13
EP1001448A2 (de) 2000-05-17
JPH07503577A (ja) 1995-04-13
JP3485924B2 (ja) 2004-01-13
EP0628212B1 (de) 2000-08-16
EP1001448A3 (de) 2008-01-09
DE69329239D1 (de) 2000-09-21

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