DE19616402C2 - Device for treating substrates in a fluid container - Google Patents

Description

The invention relates to a device for treating Substrates, in particular semiconductor wafers, in one Fluid container with the features of claim 1.

They are devices from US 5 275 184 or the DE 44 13 077 A1 going back to the same applicant knows in which a fluid via an inlet opening or egg NEN diffuser introduced into the fluid pool and over egg an overflow flows out of it at the upper end. With Ver use of a single inflow opening at the bottom of the fluid container is the amount flowing in per unit time like the velocity of the inflowing fluid borders. In particular, it is not possible to use the Be to achieve even flow conditions, to the substrates or water to be treated in the fluid pool fer across the entire substrate width or area to apply or to wash around evenly with the fluid len. When using a diffuser, it is possible the inflowing fluid in the fluid container better over the Distribute fluid area across that per unit of time flowing amount of fluid and especially the inflow speed of the fluid is when using Diffusers but very limited.

From JP 5-267263 A, JP 6-208984 A, US 5,000 795, JP 6-196466 A, JP 5-267262 A or JP 4-80924 A Devices for substrate treatment in a fluid Containers known in which a nozzle system with several Nozzles for introducing a fluid are provided. The Dü sen are distributed around on a container bottom to ver the fluid distribution across the floor area improve. The fluid flow essentially takes place parallel to the side walls from bottom to top, where  the substrates in some cases in substrate containers, so mentioned cassettes are held with which the sub strate inserted into the fluid container and lifted out become. The flow direction in the known Vorrich lines is parallel to the vertical walls of the fluid container directed. To a flow component in one Obtaining angles to the fluid container walls is at the device according to JP 5-267263 A a round Container bottom provided in which the nozzles are formed are. Such a container bottom is however manufacturing technically extremely complicated and costly, because usually quartz ver for the container walls is applied. According to another, from JP 5-267263 A and the device known from JP 6-208984 A are nozzles provided that in the lower region of the fluid container the treatment fluid from an angle to the vertical shine. Apart from that, there are additional nozzles must be arranged and fixed is the exact one angular alignment of the nozzles complicated, too be silent that for the attachment of such nozzles there is a considerable space requirement in the fluid container with regard to the very expensive fluid materials or the high cost of reprocessing the treatment lungsfluids is undesirable.

The invention is based on the object, a Vorrich device for treating substrates in a fluid container to create that is inexpensive to manufacture, optimal Has flow conditions in the fluid container, and allows high circulation or flow speeds.

The object is achieved with the Features of claim 1 solved.

Due to several nozzles, it is possible to mix the fluid with the desired flow conditions or to achieve ge desired flow conditions in the fluid container  to leave, so that the entire Sub to be treated Strat area evenly washed around by the fluid and be is opened. By using nozzles for on Line of the fluid, it is also possible to ho with the fluid hen inflow speeds and high flow rates per unit of time in the fluid container and in to let him flow, so that while maintaining a laminar flow reached high flow rates become. This will not only treat the sub strate improved, but also the treatment process shortened, so that the productivity of the device increases becomes.

According to the invention is under the bottom of the fluid container ters a fluid supply space is provided with which the nozzles stay in contact. The fluid supply space is in Subspaces for individual nozzles and / or nozzle groups below Splits. The fluid supply space below the bottom of the container is in the form of a space between a double Bottom trained.

According to the invention, at least some have nozzles different beam angles and / or shapes. The Ab jet shapes of the nozzles can preferably be conical, but also be fan-shaped, so that the introduction of the Fluids depending on the circumstances of the individual case and the Position of the nozzles with a view to an even, lamina re flow in the fluid container and an even loading impact of the substrates with the fluid can be optimized.

The nozzles are advantageously combined to form nozzle groups quantitative, preferably on different floors range of the container are arranged. It is advantageous it when a nozzle group in the middle area and each because there is a group of nozzles in the two outside areas is seen, the density and number of nozzles in the individual areas can be chosen differently.  

It is also advantageous if the individual nozzles and / or nozzle groups separate fluid suppliers supply devices so that the nozzles with under different fluid pressure can be applied.

The nozzles are preferred on the bottom of the fluid container arranged in a matrix-like manner. In this way this results in an even distribution of the fluid supply over the entire area of the fluid container and in particular, it is also possible in the edge areas to create good flow conditions.

The bottom of the fluid container is preferably inclined, and falls to the middle, for example to a center line or down to a center of the fluid container. On in this way the fluid container when draining the Anyone draining fluids quickly and completely the. Due to the inclination of the bottom, the container volume can Men can also be reduced so that the expensive and in their reprocessing complex treatment fluids, such as rinsing fluids or the like, need to be used in smaller quantities without that the quality of the treatment process suffers. Another advantage of being towards the center of the fluid container sloping soil is in particular that the nozzles provided or formed in the fluid base or fluid inlet openings through the treatment fluid the slope of the ground itself at an angle of inclination of the floor corresponding angle to the normal to the Substrates, such as wafers, what the Treatment, especially for cleaning and rinsing the wafer is advantageous because it doesn't cause the fluid only parallel to the vertically arranged in the fluid container Neten wafer flows past, but also on the side Areas of the wafer occurs.  

In addition to the nozzles, flushing openings can be used for flushing of the nozzles are provided, which advantageously also are arranged in a maxtrix shape and are located between the nozzles are located. In this way it is possible to even the twos spaces between the nozzles and the blind spots free to wash. The flushing openings are advantageous also like the nozzles with the one underneath the fluid supply space in connection.

To drain the fluid quickly, the fluid container and there in particular in the middle or in the middle never, a closable opening provided one has a large diameter. In the event of a power failure or any other irregularity, but also in the Zu in connection with common procedural steps it is on in this way possible those located in the fluid container Substrates quickly from the treatment medium, for example wise corrosive substances. To accommodate the rapidly drained fluid is preferably below of the fluid pool, a collecting container is provided.

Another embodiment of the invention consists in in addition to or instead of the nozzles on the tank bottom To provide nozzles on the side walls of the fluid container, in order to be on the side or in the area of Transition of the fluid floor to the side walls fluid in to initiate the fluid container so that the flow conditions  further improved or thereby the circulation volume men will be increased.

According to a further very advantageous embodiment the invention are nozzles and / or nozzle groups for under different fluids are provided. The individual nozzles and / or nozzle groups for different groups also with regard to the supply lines and pumps from separated from each other so that the different fluids, about different chemicals, through nozzle and / or Nozzle groups are introduced to the chemicals are ordered. This is a fluid change possible quickly and without the risk of mixing because to the respective nozzles always only those nozzles ordered fluid.

When operating the device, in addition to other fluids introduced via the nozzles, for example additional chemicals, gases, ozone, Water, etc. are introduced into the fluid container. Especially for the additional introduction of chemicals, There is at least gas, ozone or water in the fluid container a diffuser is provided.

An embodiment of the invention is also very advantageous dung, with the spray nozzles in the upper area of the fluid loading halters, such as are arranged on the side walls to clean the fluid container and / or serve the substrates between different in the same fluid Processes running on the container, for example between the etching process process, the cleaning process and the drying process moisturize or keep wet. Preferably here for aerosols, water, other chemical vapors be sprayed, or also fluids from below into the Fluid containers are introduced.  

The fluid container preferably has a substrate Recording device, which advantageously three stops areas for holding the substrates. in the Contrary to the use of substrate cassettes, the Treatment fluid flow from bottom to top not or significantly less disturbed, so the treatment process runs better and no or less blind spots occur for the treatment fluid. Through the bracket the substrate at three locations is a defined position the substrates ensured without guides in Fluid basins are required. The substrate uptake direction can preferably be raised and lowered. Advantage it is contingent if at least one mounting area is a knife-like bridge that is perpendicular to the longitudinal bridge device slots for receiving the substrate edge areas has. There is preferably at least one mounting area relative to at least one other bracket richly movable in the vertical direction. Repetitions to avoid, is with regard to this feature on the German patent application with the file number P 196 15 108.2 and the unpublished DE 195 46 990 A1 referenced by the same applicant, to avoid Repetitions to the extent of the subject of the present Registration will be made.

The substrate receiving device advantageously has only one mounting area, such as a knife-like one Web, at least in or on the inner surface a side wall of the fluid container guides for the Substrates are provided. This embodiment has in addition to reducing blind spots and swirls lungs of the high-flow treatment fluid the advantage that in the fluid pool for the substrate cradle little or no space is required, so that Container volume and thus the chemical volume small remains and the process costs, which to a large extent from Depending on the consumption of chemicals, be kept small  can. The guides are preferably through slots however formed by webs, pins and / or knobs that have the advantage over slots that they are easier and cleaned faster and - if necessary - ge can be dried. When displacing a fluid by another or when decanting the fluid container relatively much fluid adheres to the slots and contaminates the subsequently introduced fluid.

The inner surfaces of the sides advantageously have walls of the fluid container areas without guides. Without the secure guidance and mounting of the substrates in the Fluid reservoirs are the areas of concern Interior surfaces without guides to the areas of the Inner surfaces offset with guides. If for example, guides in an area of the inner surface there are guided tours on the opposite inner surface is not necessary as guides on one side is sufficient. At the leadership-free areas the inner surfaces are preferably inlet openings, Spray nozzles, diffusers, ultraviolet light sources and / or Megasonic emitting devices are provided.

There is the possibility of Can be used to bring pelvis hood, at least one Fluid inlet opening, in particular for admitting a Fluids for the drying process according to the MARANGONI Principle. To repetitions on this off Avoiding leadership is particularly important to the DE 44 13 077 A1 and the same applicant declining German patent applications with the Case number P 195 00 239.3, P 196 15 108.2 and P 196 15 970.9 referenced, which is the subject of present application are made.

It is also advantageous to use a heating and / or cooling device for heating and / or cooling the  Fluids in the fluid container with which the fluid temperature can be set to a selectable, optimal value. Also is the use of an ultraviolet light source partial, which on the floor and / or on the side walls of the Fluid container is arranged.

Another advantageous embodiment of the invention be is a egg hold-down in the form of egg ner retaining strip to be provided on the upper edge range of substrates can be placed. Repetitions To avoid this, the same applicant declining German patent application with the file symbol P 196 15 970.9, registered on April 22, 1996, referred to the content of the present Registration is made.

A Magasonic radiation device is also advantageous tion, which is preferably in the form of a Megasonic Trans ducers is or are integrated in the fluid container. On advantageous location for this is from the ground and corners of the fluid container formed on the side walls, the direction of radiation with respect to the horizontal is preferably 45 °.

Since with the device according to the invention the container can be filled very quickly, and strong nozzles effect when introducing the fluid into the container occurs, is in particular a device for covering the Fluid container advantageous, which prevents fluid in Splashes into an existing hood that is preferably used for the drying process.

The device can be with a fluid treatment be connected in the direction of fluids or fluid mixtures collected and processed  be so that they can be reused and before preferably be returned to the fluid container.

Another advantage is a separation system in which the Alkaline and acidic vapors contained in the exhaust air can be separated.

It is especially for the treatment and rinsing processes advantageous if the substrates are rotated in the fluid container can be. There is preferably a device for this provided that rotates the substrates in the fluid container.

It is advantageous to use the fluids Fluid mixtures before introduction into the fluid container premix.

The invention is based on preferred Embodiments with reference to the figures explained. Show it:

Fig. 1 shows an embodiment of the device according to the invention in cross-section,

Fig. 2 shows the device shown in Fig. 1 in supervision or looking from above into the fluid container, and

Fig. 3 shows a cross section along a cross-sectional area which is rotated by 90 ° with respect to the cross-sectional area of the illustration shown in Fig. 1.

As can be seen from the figures, the fluid container 1 of the device according to the invention has a base 2 and side walls 3 . On the side walls 3 in FIG. 1, slots 4 are provided, in which substrate disks 5 are guided, and which are on a substrate receiving device 6 , which is movable in the vertical direction by means of a drive device, not shown, and the wafers 5 lowered into the fluid container 1 and moves out of it. The substrate receiving device 6 consists in the exemplary embodiment shown from a knife-like web with slots or notches which are spaced apart in accordance with the distance between the guide slots 4 in the mutually opposite side walls 3 .

As can best be seen from FIG. 1, the base 2 is inclined inwards on both sides of a center line, so that a fluid flows out downwards in the middle when the container 1 is emptied.

The bottom 2 has a plurality of nozzles 7 , which are arranged in a triangular shape, as can best be seen from FIG. 3. The nozzles have different nozzle exit or radiation angles 8 , 9 , as shown in FIG. 1. Due to the different beam angles or due to the different jet shapes, there is a good, uniform laminar flow over the entire fluid container profile and the substrates 5 are applied uniformly across the entire width with the fluid emerging from the nozzles 7 .

From Fig. 1 it can be seen that 2 cavities 12 , 13 , 14 , 15 are formed below the bottom, which are closed at the bottom by an end plate 16 . The fluid is fed via the cavities 12 to 15 to the nozzles 7 connected to the respective cavities.

Between the nozzles 7 , 2 flushing openings 18 are provided in the bottom, which are also distributed in a matrix in FIG. 2 on the bottom 2 of the fluid container 1 . The flushing openings 18 flush the areas of the base 2 between the nozzles 7 and are also for the fluid supply with corresponding fluid supply spaces 12 to 15 below the base 2 in connection.

As Fig. 1 shows, in the middle of the base 2 is provided an opening 19 for the rapid draining of the fluid in the fluid-Behäl ter 1, as when a power failure occurs and / or that are available in the fluid container 1 substrates 5 must be quickly removed from the fluid environment, for example an etching medium. When a closure 20 is opened, the fluid is emptied within a short period of time into a collecting container, not shown, arranged below the fluid container 1 .

The substrate receiving device 6 is located in the loading area above the closure 20 partially within the base 2 and only protrudes to a small extent above the nozzle openings. As a result, only a little additional space is required for the substrate receiving device within the fluid container 1 , so that the fluid volume in the fluid container 1 can be kept small.

On the top of the side walls 3 are over run openings 21 through which the fluid flowing in from below flows out.

The invention was explained above using a preferred exemplary embodiment. However, numerous modifications and refinements are possible for the person skilled in the art without departing from the inventive idea. In example, a hood can be brought over the fluid container 1 , or there are provided on the side walls 3 of the fluid container 1 , for example in the upper region, spray nozzles for cleaning the basin or for spraying the substrates 5 between the individual method steps and treatment processes . It is also possible to use Me gasonic transducers, ultraviolet light sources or devices for rotating the wafer 5 in the fluid container 1 , as has already been described above.

Claims (18)

1. Device for treating substrates ( 5 ), in particular semiconductor substrates, in a fluid container ( 1 ), with a nozzle system with a plurality of nozzles ( 7 ) for introducing a fluid, the nozzles ( 7 ) being distributed on a container bottom ( 2 ) are arranged, under the bottom ( 2 ) of the fluid container ( 1 ) a fluid supply space ( 12 , 13 , 14 , 15 ) is provided, which is formed by an intermediate space between a double th floor ( 2 , 16 ) is formed, and which is divided into fluid subspaces ( 12 , 13 , 14 , 15 ) for individual nozzles ( 7 ) and / or nozzle groups and with which the nozzles ( 7 ) are connected, and wherein at least some nozzles ( 7 ) have different beam angles and / or beam shapes ( 8 , 9 ). 2. Device according to claim 1, characterized in that at least one nozzle ( 7 ) has a fan-shaped radiation shape. 3. Device according to one of the preceding claims, characterized in that at least one nozzle ( 7 ) has a conical jet shape. 4. Device according to one of the preceding claims, characterized in that the nozzles ( 7 ) are combined to form nozzle groups. 5. Device according to one of the preceding claims, characterized in that the nozzle groups are arranged on different bottom regions of the fluid container ( 1 ). 6. Device according to one of the preceding claims, characterized in that a nozzle group in the central region and one nozzle group in each of the two outer regions of the base ( 2 ) is seen before. 7. Device according to one of the preceding claims, characterized in that individual nozzles ( 7 ) and / or individual nozzle groups have separate fluid supply devices. 8. Device according to one of the preceding claims, characterized in that the bottom of the fluid container ( 1 ) is inclined. 9. The device according to claim 8, characterized in that the bottom ( 2 ) drops towards the center of the fluid container ( 1 ). 10. Device according to one of the preceding claims, characterized by an opening ( 19 ) for quickly draining the fluid from the fluid container ( 1 ). 11. Device according to one of the preceding claims, characterized in that further nozzles ( 7 ) on the side walls ( 3 ) of the fluid container ( 1 ) are provided. 12. Device according to one of the preceding claims, characterized in that supply lines to the nozzles ( 7 ) and / or nozzle groups seen for different fluids are provided separately from one another. 13. Device according to one of the preceding claims, characterized by a device for covering the fluid container ( 1 ). 14. The device according to any one of the preceding claims, characterized by at least one substrate holding strip, which lies in the upper Randbe rich on the substrates ( 5 ). 15. The device according to any one of the preceding claims, characterized by ultraviolet light sources which are arranged on the bottom ( 2 ) and / or on the side walls ( 3 ) of the fluid container ( 1 ). 16. Device according to one of the preceding claims, characterized net by at least one Megasonic radiation device. 17. The apparatus according to claim 16, characterized in that the Me gasonic radiation device in the from the bottom ( 2 ) and the side walls (3) formed corners of the fluid container ( 1 ) is arranged. 18. Device according to one of the preceding claims, characterized by a rotating the substrates ( 5 ) in the fluid container ( 1 ) Before direction.