DE3071422D1 - Apparatus for detecting defects in a periodic pattern - Google Patents

Apparatus for detecting defects in a periodic pattern

Info

Publication number
DE3071422D1
DE3071422D1 DE8080106681T DE3071422T DE3071422D1 DE 3071422 D1 DE3071422 D1 DE 3071422D1 DE 8080106681 T DE8080106681 T DE 8080106681T DE 3071422 T DE3071422 T DE 3071422T DE 3071422 D1 DE3071422 D1 DE 3071422D1
Authority
DE
Germany
Prior art keywords
periodic pattern
detecting defects
defects
detecting
periodic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080106681T
Other languages
English (en)
Inventor
Akito Iwamoto
Hidekazu Sekizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3071422D1 publication Critical patent/DE3071422D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46—Systems using spatial filters
DE8080106681T 1979-11-07 1980-10-30 Apparatus for detecting defects in a periodic pattern Expired DE3071422D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54143228A JPS60708B2 (ja) 1979-11-07 1979-11-07 欠陥検査装置

Publications (1)

Publication Number Publication Date
DE3071422D1 true DE3071422D1 (en) 1986-03-27

Family

ID=15333873

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080106681T Expired DE3071422D1 (en) 1979-11-07 1980-10-30 Apparatus for detecting defects in a periodic pattern

Country Status (4)

Country Link
US (1) US4360269A (de)
EP (1) EP0028774B1 (de)
JP (1) JPS60708B2 (de)
DE (1) DE3071422D1 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4516833A (en) * 1982-12-27 1985-05-14 University Of Dayton Production of high performance optical spatial filters
US4513441A (en) * 1983-08-02 1985-04-23 Sparta, Inc. Image comparison system
US4640620A (en) * 1983-12-29 1987-02-03 Robotic Vision Systems, Inc. Arrangement for rapid depth measurement using lens focusing
JPS6113318U (ja) * 1984-06-25 1986-01-25 株式会社 オ−デイオテクニカ カセツト形クリ−ナ
US4873653A (en) * 1986-04-09 1989-10-10 Carl-Zeiss-Stiftung Microscope system for providing three-dimensional resolution
JPH0682102B2 (ja) * 1987-02-27 1994-10-19 三菱電機株式会社 パターン欠陥検査装置及びパターン欠陥検査方法
GB8806592D0 (en) * 1988-03-19 1988-04-20 Cabot Plastics Ltd Method & apparatus for evaluating surface of object
US4913524A (en) * 1988-05-12 1990-04-03 The Perkin-Elmer Corporation Synthetic imaging technique
JPH01297542A (ja) * 1988-05-25 1989-11-30 Csk Corp 欠陥検査装置
US4972258A (en) * 1989-07-31 1990-11-20 E. I. Du Pont De Nemours And Company Scanning laser microscope system and methods of use
US5073006A (en) * 1990-03-30 1991-12-17 The United States Of America As Represented By The Secretary Of The Air Force Compact 2f optical correlator
US5177559A (en) * 1991-05-17 1993-01-05 International Business Machines Corporation Dark field imaging defect inspection system for repetitive pattern integrated circuits
US5712729A (en) * 1992-04-17 1998-01-27 Olympus Optical Co., Ltd. Artificial retina cell, artificial retina and artificial visual apparatus
US5644429A (en) * 1992-07-23 1997-07-01 Research Foundation Of City College Of New York 2-dimensional imaging of translucent objects in turbid media
US5629768A (en) * 1993-01-28 1997-05-13 Nikon Corporation Defect inspecting apparatus
FR2706048B1 (fr) * 1993-06-04 1995-08-04 Marelli Autronica Collimateur facilement contrôlable.
US5526113A (en) * 1994-06-21 1996-06-11 Honeywell Inc. Method and apparatus for measurement of spatial signal and noise power of imaging systems
US5742422A (en) * 1995-09-19 1998-04-21 Inspex, Inc. Adjustable fourier mask
IL118057A0 (en) * 1996-04-29 1996-09-12 Patir Research And Dev Limited Optical phase element
US5966212A (en) * 1996-07-18 1999-10-12 Pixel Systems, Inc. High-speed, high-resolution, large area inspection using multiple optical fourier transform cells
WO1999027491A1 (en) * 1997-11-20 1999-06-03 Cornell Research Foundation, Inc. A fast method and system for determining local properties of striped patterns
US6137570A (en) * 1998-06-30 2000-10-24 Kla-Tencor Corporation System and method for analyzing topological features on a surface
US6285002B1 (en) * 1999-05-10 2001-09-04 Bryan Kok Ann Ngoi Three dimensional micro machining with a modulated ultra-short laser pulse
US6555781B2 (en) 1999-05-10 2003-04-29 Nanyang Technological University Ultrashort pulsed laser micromachining/submicromachining using an acoustooptic scanning device with dispersion compensation
DE10127352A1 (de) * 2001-06-06 2003-01-23 Infineon Technologies Ag Verfahren und Vorrichtung zur Fehleranalyse von physikalischen Teilobjekten, welche in einem physikalischen Objekt in Form einer Matrix angeordnet sind, Computerlesbares Speichermedium und Computerprogramm-Element
US7262864B1 (en) * 2001-07-02 2007-08-28 Advanced Micro Devices, Inc. Method and apparatus for determining grid dimensions using scatterometry
JP4091605B2 (ja) * 2003-03-31 2008-05-28 富士通株式会社 フォトマスクのパターン検査方法、フォトマスクのパターン検査装置、およびフォトマスクのパターン検査プログラム
US20060289788A1 (en) * 2005-02-25 2006-12-28 Accent Optical Technologies, Inc. Apparatus and method for enhanced critical dimension scatterometry
DE102005031180B4 (de) * 2005-07-01 2008-06-05 König, Hans, Dr. Strukturanalyseverfahren für geordnete Strukturen und Verwendung des Verfahrens
WO2008076974A1 (en) * 2006-12-15 2008-06-26 Kla-Tencor Corporation Systems and methods for blocking specular reflection and suppressing modulation from periodic features on a specimen
JP2008170371A (ja) * 2007-01-15 2008-07-24 Hoya Corp パターン欠陥検査方法、及びパターン欠陥検査装置
US8228497B2 (en) * 2007-07-12 2012-07-24 Applied Materials Israel, Ltd. Method and system for evaluating an object that has a repetitive pattern
US10043259B2 (en) 2016-07-25 2018-08-07 PT Papertech Inc. Facilitating anomaly detection for a product having a pattern

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614232A (en) * 1968-11-25 1971-10-19 Ibm Pattern defect sensing using error free blocking spacial filter
US3790280A (en) * 1972-05-03 1974-02-05 Western Electric Co Spatial filtering system utilizing compensating elements
JPS55124117A (en) * 1979-03-19 1980-09-25 Toshiba Corp Pattern inspecting apparatus

Also Published As

Publication number Publication date
JPS5667486A (en) 1981-06-06
EP0028774A2 (de) 1981-05-20
US4360269A (en) 1982-11-23
EP0028774A3 (en) 1982-04-07
JPS60708B2 (ja) 1985-01-09
EP0028774B1 (de) 1986-02-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee