DE3367287D1 - Displacement device, particularly for the photolithographic treatment of a substrate - Google Patents

Displacement device, particularly for the photolithographic treatment of a substrate

Info

Publication number
DE3367287D1
DE3367287D1 DE8383201632T DE3367287T DE3367287D1 DE 3367287 D1 DE3367287 D1 DE 3367287D1 DE 8383201632 T DE8383201632 T DE 8383201632T DE 3367287 T DE3367287 T DE 3367287T DE 3367287 D1 DE3367287 D1 DE 3367287D1
Authority
DE
Germany
Prior art keywords
substrate
displacement device
photolithographic treatment
photolithographic
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383201632T
Other languages
English (en)
Inventor
Stefan Wittekoek
Adrianus Gerardus Bouwer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3367287D1 publication Critical patent/DE3367287D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
DE8383201632T 1982-11-17 1983-11-15 Displacement device, particularly for the photolithographic treatment of a substrate Expired DE3367287D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8204450A NL8204450A (nl) 1982-11-17 1982-11-17 Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat.

Publications (1)

Publication Number Publication Date
DE3367287D1 true DE3367287D1 (en) 1986-12-04

Family

ID=19840602

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383201632T Expired DE3367287D1 (en) 1982-11-17 1983-11-15 Displacement device, particularly for the photolithographic treatment of a substrate

Country Status (6)

Country Link
US (1) US4655594A (de)
EP (1) EP0109718B1 (de)
JP (1) JPS59101835A (de)
CA (1) CA1217088A (de)
DE (1) DE3367287D1 (de)
NL (1) NL8204450A (de)

Families Citing this family (31)

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Publication number Priority date Publication date Assignee Title
US4742286A (en) * 1985-10-29 1988-05-03 Micro-Stage, Inc. Gas bearing X-Y-θ stage assembly
JPS62152645A (ja) * 1985-12-25 1987-07-07 Hitachi Seiki Co Ltd 工作機械の座標修正装置
NL8601095A (nl) * 1986-04-29 1987-11-16 Philips Nv Positioneerinrichting.
US4758091A (en) * 1986-11-20 1988-07-19 Ateo Corporation Pattern generator part holder
JP2573502B2 (ja) * 1987-09-22 1997-01-22 日本電信電話株式会社 二軸移動装置
US5191465A (en) * 1990-03-28 1993-03-02 Matsushita Electric Industrial Co., Ltd. Optical apparatus for alignment of reticle and wafer in exposure apparatus
US5287166A (en) * 1990-07-20 1994-02-15 Konica Corporation Displacement meter with stared displacement values
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
US5438419A (en) * 1991-12-23 1995-08-01 Electronics And Telecommunications Research Institute Precision wafer driving device by utilizing solid type actuator
US5363196A (en) * 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
DE4304912C2 (de) * 1993-02-18 2003-03-06 Klaus Siebert Verfahren und Vorrichtung zur durchgehend automatischen Chipherstellung unter Vakuum
JPH07142336A (ja) * 1993-06-30 1995-06-02 Canon Inc 露光装置
JPH07260472A (ja) * 1994-03-22 1995-10-13 Nikon Corp ステージ装置の直交度測定方法
JPH10144596A (ja) * 1996-11-05 1998-05-29 Canon Inc 露光装置およびデバイス製造方法
US6189875B1 (en) 1997-11-12 2001-02-20 U.S. Philips Corporation Positioning device with H-drive having spring coupling between beams
JP3483452B2 (ja) 1998-02-04 2004-01-06 キヤノン株式会社 ステージ装置および露光装置、ならびにデバイス製造方法
JP3869938B2 (ja) 1998-06-05 2007-01-17 キヤノン株式会社 ステージ装置、露光装置、およびデバイス製造方法
DE19948797C2 (de) * 1999-10-11 2001-11-08 Leica Microsystems Substrathalter und Verwendung des Substrathalters in einem hochgenauen Messgerät
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
EP1107067B1 (de) * 1999-12-01 2006-12-27 ASML Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
EP1111470B1 (de) * 1999-12-21 2007-03-07 ASML Netherlands B.V. Lithographischer Apparat mit einem ausbalancierten Positionierungssystem
US6486941B1 (en) 2000-04-24 2002-11-26 Nikon Corporation Guideless stage
ATE446800T1 (de) * 2000-05-12 2009-11-15 Pall Corp Filter
US6963821B2 (en) * 2003-02-11 2005-11-08 Nikon Corporation Stage counter mass system
CN102290365B (zh) 2004-06-09 2015-01-21 尼康股份有限公司 基板保持装置、具备其之曝光装置及方法、元件制造方法
KR100573771B1 (ko) * 2004-06-25 2006-04-25 삼성전자주식회사 갠트리장치
SG10201801998TA (en) 2004-09-17 2018-04-27 Nikon Corp Substrate holding device, exposure apparatus, and device manufacturing method
US7298495B2 (en) * 2005-06-23 2007-11-20 Lewis George C System and method for positioning an object through use of a rotating laser metrology system
US8109395B2 (en) * 2006-01-24 2012-02-07 Asm Technology Singapore Pte Ltd Gantry positioning system
US8973768B1 (en) * 2009-10-09 2015-03-10 Par Systems, Inc. Gantry robot system
JP6761279B2 (ja) * 2016-05-16 2020-09-23 キヤノン株式会社 位置決め装置、リソグラフィー装置および物品製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522287A1 (de) * 1966-07-01 1969-08-07 Telefunken Patent Einrichtung zur Feinjustierung von Fotomasken
US3550276A (en) * 1968-04-25 1970-12-29 Baldwin Kongsberg Co Multiple-pen automatic drafting machine
FR1587573A (de) * 1968-10-25 1970-03-20
US3622244A (en) * 1970-01-29 1971-11-23 Optomechanisms Inc Dual axes interferometer
JPS4859279A (de) * 1971-11-26 1973-08-20
US3884580A (en) * 1973-09-07 1975-05-20 Gerber Scientific Instr Co Apparatus for measuring and positioning by interferometry
US3934949A (en) * 1973-12-27 1976-01-27 Bell Telephone Laboratories, Incorporated Method for reducing rotation components in table translation
US3941480A (en) * 1974-02-08 1976-03-02 The Gerber Scientific Instrument Company Work locating system and method with temperature and other compensation capabilities
US3969004A (en) * 1974-08-02 1976-07-13 The Computervision Corporation Air bearing piston assembly for semiconductor mask-to-wafer aligner
US4226526A (en) * 1976-10-04 1980-10-07 Harry Arthur Hele Spence-Bate Transport and positioning mechanism
JPS5485678A (en) * 1977-12-20 1979-07-07 Canon Inc High accuracy alignment method for air bearing guide system xy stage
US4311390A (en) * 1979-02-27 1982-01-19 Optimetrix Corporation Interferometrically controlled stage with precisely orthogonal axes of motion
US4345836A (en) * 1979-10-22 1982-08-24 Optimetrix Corporation Two-stage wafer prealignment system for an optical alignment and exposure machine
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system

Also Published As

Publication number Publication date
CA1217088A (en) 1987-01-27
JPH0314223B2 (de) 1991-02-26
JPS59101835A (ja) 1984-06-12
NL8204450A (nl) 1984-06-18
US4655594A (en) 1987-04-07
EP0109718A1 (de) 1984-05-30
EP0109718B1 (de) 1986-10-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8327 Change in the person/name/address of the patent owner

Owner name: ASM LITHOGRAPHY B.V., VELDHOVEN, NL