DE3375329D1 - Optical system - Google Patents

Optical system

Info

Publication number
DE3375329D1
DE3375329D1 DE8383104686T DE3375329T DE3375329D1 DE 3375329 D1 DE3375329 D1 DE 3375329D1 DE 8383104686 T DE8383104686 T DE 8383104686T DE 3375329 T DE3375329 T DE 3375329T DE 3375329 D1 DE3375329 D1 DE 3375329D1
Authority
DE
Germany
Prior art keywords
optical system
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383104686T
Other languages
English (en)
Inventor
David A Shafer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SVG Lithography Systems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Application granted granted Critical
Publication of DE3375329D1 publication Critical patent/DE3375329D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/082—Catadioptric systems using three curved mirrors
    • G02B17/0828—Catadioptric systems using three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE8383104686T 1982-06-01 1983-05-11 Optical system Expired DE3375329D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/383,683 US4469414A (en) 1982-06-01 1982-06-01 Restrictive off-axis field optical system

Publications (1)

Publication Number Publication Date
DE3375329D1 true DE3375329D1 (en) 1988-02-18

Family

ID=23514222

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383104686T Expired DE3375329D1 (en) 1982-06-01 1983-05-11 Optical system

Country Status (4)

Country Link
US (1) US4469414A (de)
EP (1) EP0095622B1 (de)
JP (1) JPS58219517A (de)
DE (1) DE3375329D1 (de)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6093410A (ja) * 1983-10-27 1985-05-25 Canon Inc 反射光学系
US4812028A (en) * 1984-07-23 1989-03-14 Nikon Corporation Reflection type reduction projection optical system
US4701035A (en) * 1984-08-14 1987-10-20 Canon Kabushiki Kaisha Reflection optical system
JPS61156737A (ja) * 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US4711535A (en) * 1985-05-10 1987-12-08 The Perkin-Elmer Corporation Ring field projection system
GB8612609D0 (en) * 1986-05-23 1986-07-02 Wynne C G Optical imaging systems
US4807965A (en) * 1987-05-26 1989-02-28 Garakani Reza G Apparatus for three-dimensional viewing
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
US5734496A (en) * 1991-06-03 1998-03-31 Her Majesty The Queen In Right Of New Zealand Lens system
US5153772A (en) * 1991-04-09 1992-10-06 Toledyne Industries, Inc. Binary optic-corrected multistage imaging system
US5657164A (en) * 1991-05-28 1997-08-12 Discovision Associates Optical beamsplitter
US5331622A (en) * 1991-05-28 1994-07-19 Applied Magnetics Corporation Compact optical head
US5414555A (en) * 1992-01-13 1995-05-09 Aerojet-General Corporation Method for the manufacture of a three-mirror optical system and the optical system resulting therefrom
US5274498A (en) * 1992-04-14 1993-12-28 Pactylamatic, Inc. Optical system for a night vision video camera
US5323263A (en) * 1993-02-01 1994-06-21 Nikon Precision Inc. Off-axis catadioptric projection system
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
US5515207A (en) * 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
JP2565149B2 (ja) * 1995-04-05 1996-12-18 キヤノン株式会社 回路の製造方法及び露光装置
US6157498A (en) 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
US6084706A (en) * 1997-07-09 2000-07-04 Etec Systems, Inc. High efficiency laser pattern generator
GB2332533A (en) * 1997-12-19 1999-06-23 Image Automation Limited Optical system comprising beam splitter and Offner relay
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US6879383B2 (en) * 2002-12-27 2005-04-12 Ultratech, Inc. Large-field unit-magnification projection system
US7085075B2 (en) * 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
CN102830487A (zh) 2004-01-14 2012-12-19 卡尔蔡司Smt有限责任公司 反射折射投影物镜
US7712905B2 (en) 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
EP1751601B1 (de) 2004-05-17 2007-12-05 Carl Zeiss SMT AG Katadioptrisches projektionsobjektiv mit zwischenbildern
US7148953B2 (en) * 2004-11-01 2006-12-12 Ultratech, Inc. Apochromatic unit-magnification projection optical system
US20060158615A1 (en) * 2005-01-18 2006-07-20 Williamson David M Catadioptric 1x projection system and method
US20080112927A1 (en) * 2006-10-23 2008-05-15 Genegrafts Ltd. Cells and methods utilizing same for modifying the electrophysiological function of excitable tissues
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
EP2196838A1 (de) 2008-12-11 2010-06-16 Carl Zeiss SMT AG Chromatisch korrigiertes katadioptrisches Objektiv und Projektionsbelichtungsvorrichtung, die dieses enthält
CN110646091B (zh) * 2019-10-08 2021-08-20 中国科学院光电研究院 一种采用自由曲面的大视场Dyson光谱成像系统

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL269391A (de) * 1961-09-19
US3748015A (en) * 1971-06-21 1973-07-24 Perkin Elmer Corp Unit power imaging catoptric anastigmat
CA1103498A (en) * 1977-02-11 1981-06-23 Abe Offner Wide annulus unit power optical system
US4293186A (en) * 1977-02-11 1981-10-06 The Perkin-Elmer Corporation Restricted off-axis field optical system
US4331390A (en) * 1979-10-09 1982-05-25 The Perkin-Elmer Corporation Monocentric optical systems

Also Published As

Publication number Publication date
US4469414A (en) 1984-09-04
EP0095622B1 (de) 1988-01-13
EP0095622A1 (de) 1983-12-07
JPS58219517A (ja) 1983-12-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SVG LITHOGRAPHY SYSTEMS, INC., WILTON, CONN., US

8328 Change in the person/name/address of the agent

Free format text: GRUENECKER, A., DIPL.-ING. KINKELDEY, H., DIPL.-ING. DR.-ING. STOCKMAIR, W., DIPL.-ING. DR.-ING. AE.E. CAL TECH SCHUMANN, K., DIPL.-PHYS. DR.RER.NAT. JAKOB, P., DIPL.-ING. BEZOLD, G., DIPL.-CHEM. DR.RER.NAT. MEISTER, W., DIPL.-ING. HILGERS, H., DIPL.-ING. MEYER-PLATH, H., DIPL.-ING. DR.-ING. EHNOLD, A., DIPL.-ING. SCHUSTER, T., DIPL.-PHYS. GOLDBACH, K., DIPL.-ING.DR.-ING. AUFENANGER, M., DIPL.-ING. KLITZSCH, G., DIPL.-ING., PAT.-ANWAELTE, 8000 MUENCHEN

8339 Ceased/non-payment of the annual fee