DE3377154D1 - Infrared furnace with controlled environment - Google Patents

Infrared furnace with controlled environment

Info

Publication number
DE3377154D1
DE3377154D1 DE8383113216T DE3377154T DE3377154D1 DE 3377154 D1 DE3377154 D1 DE 3377154D1 DE 8383113216 T DE8383113216 T DE 8383113216T DE 3377154 T DE3377154 T DE 3377154T DE 3377154 D1 DE3377154 D1 DE 3377154D1
Authority
DE
Germany
Prior art keywords
controlled environment
infrared furnace
furnace
infrared
environment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383113216T
Other languages
English (en)
Inventor
Norman Robert Crain
Robert Perry Hardison
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiant Tech Corp
Original Assignee
Radiant Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiant Tech Corp filed Critical Radiant Tech Corp
Application granted granted Critical
Publication of DE3377154D1 publication Critical patent/DE3377154D1/de
Expired legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0073—Seals
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/04—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity adapted for treating the charge in vacuum or special atmosphere
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
    • F27B9/066—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated heated by lamps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/3077—Arrangements for treating electronic components, e.g. semiconductors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/36—Arrangements of heating devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
    • F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
    • F27B9/24—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace being carried by a conveyor
    • F27B9/243—Endless-strand conveyor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0073—Seals
    • F27D2099/0078—Means to minimize the leakage of the furnace atmosphere during charging or discharging
DE8383113216T 1983-01-10 1983-12-29 Infrared furnace with controlled environment Expired DE3377154D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/456,564 US4477718A (en) 1983-01-10 1983-01-10 Infrared furnace with controlled environment

Publications (1)

Publication Number Publication Date
DE3377154D1 true DE3377154D1 (en) 1988-07-28

Family

ID=23813264

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383113216T Expired DE3377154D1 (en) 1983-01-10 1983-12-29 Infrared furnace with controlled environment

Country Status (4)

Country Link
US (1) US4477718A (de)
EP (1) EP0113919B1 (de)
JP (1) JPS59129378A (de)
DE (1) DE3377154D1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144196U (ja) * 1984-08-27 1986-03-24 日本碍子株式会社 赤外線焼成炉
FR2627849B1 (fr) * 1988-02-26 1991-07-12 Vieillard Guy Dispositif d'obturation permettant la mise en place d'un appareil de mesure ou d'intervention dans une enceinte a atmosphere chaude et sous pression
US5551670A (en) * 1990-10-16 1996-09-03 Bgk Finishing Systems, Inc. High intensity infrared heat treating apparatus
US5960158A (en) * 1997-07-11 1999-09-28 Ag Associates Apparatus and method for filtering light in a thermal processing chamber
US5930456A (en) * 1998-05-14 1999-07-27 Ag Associates Heating device for semiconductor wafers
US5970214A (en) * 1998-05-14 1999-10-19 Ag Associates Heating device for semiconductor wafers
US6210484B1 (en) 1998-09-09 2001-04-03 Steag Rtp Systems, Inc. Heating device containing a multi-lamp cone for heating semiconductor wafers
US20010031229A1 (en) * 1998-10-20 2001-10-18 Spjut Reed E. UV-enhanced, in-line, infrared phosphorous diffusion furnace
US6771895B2 (en) 1999-01-06 2004-08-03 Mattson Technology, Inc. Heating device for heating semiconductor wafers in thermal processing chambers
WO2001014811A1 (en) 1999-08-23 2001-03-01 Radiant Technology Corporation Continuous-conduction wafer bump reflow system
US6495800B2 (en) 1999-08-23 2002-12-17 Carson T. Richert Continuous-conduction wafer bump reflow system
US8328551B2 (en) * 2002-09-26 2012-12-11 Btu International, Inc. Convection furnace thermal profile enhancement
US20050166844A1 (en) * 2004-02-03 2005-08-04 Nicholas Gralenski High reflectivity atmospheric pressure furnace for preventing contamination of a work piece
US20080041836A1 (en) * 2004-02-03 2008-02-21 Nicholas Gralenski High temperature heating element for preventing contamination of a work piece
US7514650B2 (en) * 2005-12-08 2009-04-07 Despatch Industries Limited Partnership Continuous infrared furnace
PL213246B1 (pl) * 2009-02-12 2013-02-28 Seco Warwick Spolka Akcyjna Piec retortowy do obróbki cieplnej i cieplno-chemicznej
US8965185B2 (en) * 2009-03-02 2015-02-24 Btu International, Inc. Infrared furnace system
WO2011130518A1 (en) * 2010-04-14 2011-10-20 Babcock & Wilcox Technical Services Y-12, Llc Heat treatment furnace
WO2012009636A1 (en) * 2010-07-15 2012-01-19 Despatch Industries Limited Partnership Firing furnace configuration for thermal processing system
US9589817B2 (en) 2011-04-15 2017-03-07 Illinois Tool Works Inc. Dryer
CN102306621A (zh) * 2011-08-25 2012-01-04 上海煦康电子科技有限公司 半导体元件烧结的工艺方法
JP5931769B2 (ja) * 2013-02-01 2016-06-08 アイシン高丘株式会社 赤外炉及び赤外線加熱方法
CN103499209A (zh) * 2013-09-06 2014-01-08 北京吉阳技术股份有限公司 一种应用于晶硅光伏电池生产的链式烧结炉炉膛结构及方法
WO2017163624A1 (ja) 2016-03-24 2017-09-28 日本碍子株式会社 工業炉及びその熱利用方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2549619A (en) * 1945-11-30 1951-04-17 William J Miskella Infrared oven
US2521232A (en) * 1946-03-27 1950-09-05 Ralph W Lashells Infrared ray equipment
DE925785C (de) * 1952-08-28 1955-03-31 Siemens Ag Bestrahlungseinrichtung
US3242314A (en) * 1962-07-05 1966-03-22 Aerojet General Co Portable brazing and welding device
US3188459A (en) * 1962-11-02 1965-06-08 Northrop Corp Lamp holder
US3239651A (en) * 1963-08-21 1966-03-08 Ekco Products Company Heating unit
US3305680A (en) * 1965-01-11 1967-02-21 Hi Shear Corp Lamp terminal assembly
US3441454A (en) * 1965-10-29 1969-04-29 Westinghouse Electric Corp Method of fabricating a semiconductor by diffusion
US3473510A (en) * 1966-02-23 1969-10-21 Corning Glass Works Method and apparatus for the continuous doping of semiconductor materials
US3415503A (en) * 1967-08-18 1968-12-10 Btu Eng Corp Conditioned atmosphere furnace muffle
ES378214A1 (es) * 1969-05-19 1973-01-01 Ibm Un sistema para tratar material, especialmente semiconduc- tor.
US3688685A (en) * 1971-03-12 1972-09-05 R F Wrench Electric broiler for simultaneously broiling a plurality of large viands
US3792230A (en) * 1972-03-30 1974-02-12 Industrial Innovations Inc Gas-cooled torch lamp
US4101759A (en) * 1976-10-26 1978-07-18 General Electric Company Semiconductor body heater
EP0061158B1 (de) * 1981-03-23 1987-09-09 Radiant Technology Corporation Verfahren zum Einbrennen von elektronischen Dickschichtschaltungen

Also Published As

Publication number Publication date
EP0113919B1 (de) 1988-06-22
JPS618355B2 (de) 1986-03-13
EP0113919A1 (de) 1984-07-25
JPS59129378A (ja) 1984-07-25
US4477718A (en) 1984-10-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee