DE3476703D1 - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
DE3476703D1
DE3476703D1 DE8484304415T DE3476703T DE3476703D1 DE 3476703 D1 DE3476703 D1 DE 3476703D1 DE 8484304415 T DE8484304415 T DE 8484304415T DE 3476703 T DE3476703 T DE 3476703T DE 3476703 D1 DE3476703 D1 DE 3476703D1
Authority
DE
Germany
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484304415T
Other languages
English (en)
Inventor
Kunihiro Ichimura
Tsuguo Yamaoka
Sadayoshi Kaneda
Toru Shibuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murakami Screen KK
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Murakami Screen KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27469195&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3476703(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP11848783A external-priority patent/JPS6010243A/ja
Priority claimed from JP11848683A external-priority patent/JPS6010245A/ja
Priority claimed from JP11848883A external-priority patent/JPH0248105B2/ja
Priority claimed from JP10423684A external-priority patent/JPS60247637A/ja
Application filed by Agency of Industrial Science and Technology, Murakami Screen KK filed Critical Agency of Industrial Science and Technology
Application granted granted Critical
Publication of DE3476703D1 publication Critical patent/DE3476703D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
DE8484304415T 1983-06-30 1984-06-28 Photosensitive resin composition Expired DE3476703D1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP11848783A JPS6010243A (ja) 1983-06-30 1983-06-30 感光性樹脂組成物
JP11848683A JPS6010245A (ja) 1983-06-30 1983-06-30 感光性樹脂組成物
JP11848883A JPH0248105B2 (ja) 1983-06-30 1983-06-30 Kankoseijushisoseibutsu
JP10423684A JPS60247637A (ja) 1984-05-23 1984-05-23 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
DE3476703D1 true DE3476703D1 (en) 1989-03-16

Family

ID=27469195

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484304415T Expired DE3476703D1 (en) 1983-06-30 1984-06-28 Photosensitive resin composition

Country Status (3)

Country Link
US (1) US4564580A (de)
EP (1) EP0130804B1 (de)
DE (1) DE3476703D1 (de)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6117138A (ja) * 1984-07-04 1986-01-25 Agency Of Ind Science & Technol プラスチツクフイルム塗布用感光性エマルジヨン
US5246815A (en) * 1984-07-04 1993-09-21 Gen. Director Of The Agency Of Industrial Science & Technology Photosensitive material for screen processing
JPH0743537B2 (ja) * 1985-04-03 1995-05-15 工業技術院長 感光性樹脂組成物
EP0220121A3 (de) * 1985-10-14 1987-07-01 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone
DE3540950A1 (de) * 1985-11-19 1987-05-21 Basf Ag Durch photopolymerisation vernetzbare gemische
DE3617499A1 (de) * 1986-05-24 1987-11-26 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
EP0313221B1 (de) * 1987-10-17 1994-05-04 Autotype International Limited Photoschablone für Siebdruck
GB2226564B (en) * 1988-12-16 1993-03-17 Sericol Group Ltd Photopolymerisable polyvinyl alcohols and compositions containing them
DE3928825A1 (de) * 1989-08-31 1991-03-07 Hoechst Ag Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial
US5200291A (en) * 1989-11-13 1993-04-06 Hoechst Celanese Corporation Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
US5310581A (en) * 1989-12-29 1994-05-10 The Dow Chemical Company Photocurable compositions
US5464538A (en) * 1989-12-29 1995-11-07 The Dow Chemical Company Reverse osmosis membrane
US5238747A (en) * 1989-12-29 1993-08-24 The Dow Chemical Company Photocurable compositions
CA2041023C (en) * 1990-04-26 2002-03-12 William K. Goss Photocurable elements and flexographic printing plates prepared therefrom
DE59108989D1 (de) * 1990-12-18 1998-06-25 Ciba Geigy Ag Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel
US5310862A (en) * 1991-08-20 1994-05-10 Toray Industries, Inc. Photosensitive polyimide precursor compositions and process for preparing same
US5334485A (en) * 1991-11-05 1994-08-02 The Chromaline Corporation Acid soluble photo-resist comprising a photosensitive polymer
GB2263699B (en) * 1992-02-03 1995-11-29 Sericol Ltd Photopolymerizable alcohols and compositions containing them
US6020436A (en) * 1993-03-09 2000-02-01 The Chromaline Corporation Photosensitive resin composition
US5415971A (en) * 1993-04-02 1995-05-16 The Chromaline Corporation Photoresist laminate including photoimageable adhesive layer
EP0671659B1 (de) * 1994-03-03 1998-05-27 Mitsubishi Chemical Corporation Fotoempfindliche Zusammensetzung
US5527655A (en) * 1994-09-28 1996-06-18 Minnesota Mining And Manufacturing Company Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions
US5512607A (en) * 1995-06-06 1996-04-30 W. R. Grace & Co.-Conn. Unsaturated epoxy ester with quaternary ammonium and phosphate groups
WO1996041240A1 (en) * 1995-06-07 1996-12-19 W.R. Grace & Co.-Conn. Water photoresist emulsions and methods of preparation thereof
JP3561061B2 (ja) * 1995-12-11 2004-09-02 東洋合成工業株式会社 ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
MY129788A (en) * 1996-01-25 2007-04-30 Innovia Films Ltd Printable film.
NL1002627C2 (nl) * 1996-03-15 1997-09-17 Stork Screens Bv Fotogevoelige harssamenstelling en deze samenstelling omvattende lak.
NL1002628C2 (nl) * 1996-03-15 1997-09-17 Stork Screens Bv Fotogevoelige harssamenstelling en deze samenstelling omvattende lak.
JP3771705B2 (ja) 1998-03-12 2006-04-26 互応化学工業株式会社 感光性樹脂組成物及びプリント配線板製造用フォトレジストインク
JP3771714B2 (ja) 1998-05-12 2006-04-26 互応化学工業株式会社 感光性樹脂組成物及びプリント配線板製造用フォトソルダーレジストインク
TWI224715B (en) * 1998-08-05 2004-12-01 Toyo Gosei Kogyo Kk Photosensitive resin derived from saponified poly(vinyl acetate)
US6514661B1 (en) 1999-10-15 2003-02-04 E. I Du Pont De Nemours And Company Process for forming a colored image having a dominant attribute
ID28481A (id) * 1999-11-30 2001-05-31 Takeda Chemical Industries Ltd Komposisi emulsi berair dan komposisi bahan perekat
US6740464B2 (en) * 2000-01-14 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP3932099B2 (ja) * 2002-02-06 2007-06-20 セイコーエプソン株式会社 エッチング方法
JP3992550B2 (ja) * 2002-07-04 2007-10-17 國宏 市村 感活性エネルギー線樹脂組成物、感活性エネルギー線樹脂フィルム及び該フィルムを用いるパターン形成方法
CA2521616C (en) 2003-04-07 2011-05-31 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition, photosensitive layer therefrom and photosensitive resin printing original plate
GB0318115D0 (en) * 2003-08-01 2003-09-03 Sericol Ltd A printing ink
US7544381B2 (en) * 2003-09-09 2009-06-09 Boston Scientific Scimed, Inc. Lubricious coatings for medical device
NL1025774A1 (nl) * 2004-03-19 2004-05-03 Stork Prints Bv Werkwijze voor het vervaardigen van een basismateriaal voor zeefdrukken alsmede dergelijk basismateriaal.
KR100733920B1 (ko) * 2004-09-17 2007-07-02 주식회사 엘지화학 에칭 레지스트용 잉크 조성물, 이를 이용한 에칭 레지스트패턴 형성 방법 및 미세 유로 형성 방법
CN100447669C (zh) * 2005-03-29 2008-12-31 上海中大科技发展有限公司 水乳型圆网感光胶
EP1783552B1 (de) 2005-11-03 2015-10-07 Kissel & Wolf GmbH Photopolymerisierbare Zusammensetzung zur Herstellung von Druckformen
US20070115325A1 (en) * 2005-11-21 2007-05-24 Konica Minolta Holdings, Inc. Ink-jet ink and ink-jet recording method
US20070129748A1 (en) * 2005-12-07 2007-06-07 Tracee Eidenschink Selectively coated medical balloons
JP4929722B2 (ja) * 2006-01-12 2012-05-09 日立化成工業株式会社 光硬化型ナノプリント用レジスト材及びパターン形成法
EP2019128A4 (de) * 2006-05-17 2009-04-29 Murakami Co Ltd Lichtempfindliche harzzusammensetzung und daraus hergestellte lichtempfindliche folie und schablone für den siebdruck
EP1975706A3 (de) 2007-03-30 2010-03-03 FUJIFILM Corporation Lithografiedruckplattenvorläufer
CN103176365A (zh) * 2011-12-22 2013-06-26 深圳富泰宏精密工业有限公司 菲林及其制作方法，应用该菲林进行遮蔽的方法
US8609074B2 (en) 2011-12-30 2013-12-17 L'oreal Methods for making up a keratinous substrate
US10731032B2 (en) 2015-12-04 2020-08-04 Japan Vam & Poval Co., Ltd. Dispersion assistant for suspension polymerization, method for producing vinyl-based polymer using the same, and vinyl chloride resin
US11860539B2 (en) 2020-10-13 2024-01-02 Showa Kako Corporation Polyvinyl acetate based photopolymer

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4273857A (en) * 1976-01-30 1981-06-16 E. I. Du Pont De Nemours And Company Polymeric binders for aqueous processable photopolymer compositions
US4221859A (en) * 1976-05-04 1980-09-09 Ball Corporation Photopolymerizable composition with oxalic acid photoinitiator
US4272620A (en) * 1978-08-09 1981-06-09 Agency Of Industrial Science And Technology Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
US4245030A (en) * 1979-05-23 1981-01-13 Hoechst Aktiengesellschaft Photopolymerizable mixture containing improved plasticizer
US4245031A (en) * 1979-09-18 1981-01-13 E. I. Du Pont De Nemours And Company Photopolymerizable compositions based on salt-forming polymers and polyhydroxy polyethers
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
US4444868A (en) * 1981-08-06 1984-04-24 Agency Of Industrial Science & Technology Photosensitive composition
DE3144905A1 (de) * 1981-11-12 1983-05-19 Basf Ag, 6700 Ludwigshafen Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials

Also Published As

Publication number Publication date
EP0130804A2 (de) 1985-01-09
EP0130804B1 (de) 1989-02-08
US4564580A (en) 1986-01-14
EP0130804A3 (en) 1986-07-16

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8365 Fully valid after opposition proceedings