DE3585856D1 - Antistatische zusammensetzungen enthaltend, polymerisierten oxyalkylenmonomere und ein anorganisches salz. - Google Patents

Antistatische zusammensetzungen enthaltend, polymerisierten oxyalkylenmonomere und ein anorganisches salz.

Info

Publication number
DE3585856D1
DE3585856D1 DE8585305490T DE3585856T DE3585856D1 DE 3585856 D1 DE3585856 D1 DE 3585856D1 DE 8585305490 T DE8585305490 T DE 8585305490T DE 3585856 T DE3585856 T DE 3585856T DE 3585856 D1 DE3585856 D1 DE 3585856D1
Authority
DE
Germany
Prior art keywords
compositions containing
inorganic salt
containing polymerized
antistatic compositions
oxyalkylene monomers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585305490T
Other languages
English (en)
Inventor
Janglin Chen
James Edward Kelly
James Plakunov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of DE3585856D1 publication Critical patent/DE3585856D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
    • G03C1/853—Inorganic compounds, e.g. metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/32—Phosphorus-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/38—Boron-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
    • C08K5/098—Metal salts of carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41—Compounds containing sulfur bound to oxygen
    • C08K5/42—Sulfonic acids; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/16—Anti-static materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/27—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.]
    • Y10T428/273—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.] of coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated
DE8585305490T 1984-08-01 1985-08-01 Antistatische zusammensetzungen enthaltend, polymerisierten oxyalkylenmonomere und ein anorganisches salz. Expired - Fee Related DE3585856D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/636,764 US4582781A (en) 1984-08-01 1984-08-01 Antistatic compositions comprising polymerized oxyalkylene monomers and an inorganic tetrafluoroborate, perfluoroalkyl carboxylate, hexafluorophosphate or perfluoroalkylsulfonate salt

Publications (1)

Publication Number Publication Date
DE3585856D1 true DE3585856D1 (de) 1992-05-21

Family

ID=24553233

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585305490T Expired - Fee Related DE3585856D1 (de) 1984-08-01 1985-08-01 Antistatische zusammensetzungen enthaltend, polymerisierten oxyalkylenmonomere und ein anorganisches salz.

Country Status (5)

Country Link
US (1) US4582781A (de)
EP (1) EP0170529B1 (de)
JP (1) JPS6141143A (de)
CA (1) CA1257086A (de)
DE (1) DE3585856D1 (de)

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US6369159B1 (en) 1987-05-13 2002-04-09 Pdm Holdings Corp. Antistatic plastic materials containing epihalohydrin polymers
US4912157A (en) * 1987-05-18 1990-03-27 Eastman Kodak Company Ink compositions and preparation
IT1228436B (it) * 1987-07-24 1991-06-17 Minnesota Mining & Mfg Materiali fotografici agli alogenuri d'argento sensibili alla luce
US4948720A (en) * 1987-08-20 1990-08-14 Eastman Kodak Company Photographic element containing polyphosphazene antistatic composition
DE3871654T2 (de) * 1987-08-20 1993-02-04 Eastman Kodak Co Photographisches element mit polyphosphasen-antistatikmittel.
US5258276A (en) * 1987-12-07 1993-11-02 E. I. Du Pont De Nemours And Company Ternary surfactant system to reduce static in photographic silver halide systems
EP0319951A1 (de) * 1987-12-07 1989-06-14 Du Pont De Nemours (Deutschland) Gmbh Antistatische photographische Aufzeichnungsmaterialien
US4957947A (en) * 1988-06-17 1990-09-18 Eastman Kodak Company Radiation-curable composition for forming an abrasion-resistant antistatic layer
US4910050A (en) * 1988-08-04 1990-03-20 Hughes Aircraft Company Method and composition for providing electrostatic discharge protection for spacecraft
JP2860404B2 (ja) * 1989-03-03 1999-02-24 キヤノン株式会社 帯電部材および該帯電部材を有する電子写真装置
US5010128A (en) * 1989-03-27 1991-04-23 Eastman Kodak Company Composites of etheric phosphazene and metal oxides and the method of their formation
JPH0312647A (ja) * 1989-06-09 1991-01-21 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料及びその製造方法
US5013640A (en) * 1989-06-15 1991-05-07 Eastman Kodak Company Preparation of low viscosity small-particle photographic dispersions in gelatin
US5135844A (en) * 1989-06-15 1992-08-04 Eastman Kodak Company Preparation of low viscosity small particle photographic dispersions in gelatin
US5006451A (en) * 1989-08-10 1991-04-09 Eastman Kodak Company Photographic support material comprising an antistatic layer and a barrier layer
JP2877854B2 (ja) * 1989-10-03 1999-04-05 三菱化学株式会社 帯電防止性表面を有する硬化樹脂層の形成方法
US5210013A (en) * 1991-05-14 1993-05-11 Eastman Kodak Company Very low coefficient of variation tabular grain emulsion
US5272048A (en) * 1991-05-14 1993-12-21 Eastman Kodak Company Reversal photographic elements containing tabular grain emulsions
US5236817A (en) * 1991-05-14 1993-08-17 Eastman Kodak Company Tabular grain emulsion containing reversal photographic elements exhibiting improved sharpness in underlying layers
US6399206B1 (en) 1992-09-30 2002-06-04 The Dow Chemical Company Electrostatically painted polymers and a process for making same
GB9319790D0 (en) * 1993-09-24 1993-11-10 Kodak Ltd Antistatic composition
DE69327461T2 (de) * 1993-10-06 2000-07-27 Imation Corp Photographisches Silberhalogenidmaterial mit verbesserten antistatischen Eigenschaften
GB9407803D0 (en) * 1994-04-20 1994-06-15 Ici Plc Polymeric film
US5541049A (en) * 1994-06-30 1996-07-30 Minnesota Mining And Manufacturing Company Silver halide photographic material having improved antistatic properties
US5518788A (en) * 1994-11-14 1996-05-21 Minnesota Mining And Manufacturing Company Antistatic hard coat incorporating a polymer comprising pendant fluorinated groups
US5585201A (en) * 1995-06-05 1996-12-17 Minnesota Mining And Manufacturing Company Radiation-curable composition comprising a polydimethylsiloxane
EP0752711B1 (de) 1995-07-07 1999-10-06 Minnesota Mining And Manufacturing Company Antistatischer Verstärkungsschirm für Röntgenstrahlen mit Fluoroalkylsulfonat-Salzen
US6025111A (en) * 1996-10-23 2000-02-15 Eastman Kodak Company Stable matte formulation for imaging elements
JP4751815B2 (ja) * 1996-11-29 2011-08-17 株式会社クレハ 電子写真方式の画像形成装置における帯電ロール、転写ロール、現像ロール、帯電ベルト、または除電ベルト
US5858634A (en) * 1997-06-19 1999-01-12 Eastman Kodak Company Photographic element containing polymeric particles made by a microsuspension process
USRE38530E1 (en) * 1997-07-23 2004-06-08 General Electric Company Anti-static resin composition containing fluorinated phosphonium sulfonates
US6194497B1 (en) * 1997-07-23 2001-02-27 General Electric Company Anti-static resin composition containing fluorinated phosphonium sulfonates
US6110656A (en) * 1998-09-28 2000-08-29 Eastman Kodak Company Colloidal vanadium oxide having improved stability
GB9827982D0 (en) 1998-12-19 1999-02-10 Eastman Kodak Co Surfactants and their use as antistatic agents in photographic materials
US6372829B1 (en) * 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6592988B1 (en) 1999-12-29 2003-07-15 3M Innovative Properties Company Water-and oil-repellent, antistatic composition
US20030054172A1 (en) * 2001-05-10 2003-03-20 3M Innovative Properties Company Polyoxyalkylene ammonium salts and their use as antistatic agents
EP1296182A1 (de) * 2001-09-21 2003-03-26 Eastman Kodak Company Zusammensetzungen für Überzugsschutzbeschichtungen mit fluorhaltigen Netzmitteln und diese enthaltende Elemente
US6740413B2 (en) 2001-11-05 2004-05-25 3M Innovative Properties Company Antistatic compositions
US6924329B2 (en) * 2001-11-05 2005-08-02 3M Innovative Properties Company Water- and oil-repellent, antistatic compositions
US20040006147A1 (en) * 2002-02-22 2004-01-08 Spicher Dennis R. Physical properties improvement additive for flexible polyurethane foam
US20040009440A1 (en) * 2002-07-11 2004-01-15 Alice Moon Coating composition for photographic materials
US20030158313A1 (en) * 2003-03-12 2003-08-21 Spicher Dennis R. Antistatic additives including tetrahalogenated ionic compounds for organic polymer packaging compositions
US7211690B2 (en) 2004-04-13 2007-05-01 General Electric Company Methods of making an antistatic agent
US7258968B1 (en) * 2006-04-13 2007-08-21 Carestream Health, Inc. Thermally developable materials with buried conductive backside coatings
EP2023891B1 (de) * 2006-05-11 2018-01-24 Evonik Degussa GmbH Körperpflegezusammensetzungen mit funktionalisierten polymeren
JP5275574B2 (ja) * 2007-03-15 2013-08-28 株式会社潤工社 フッ素樹脂組成物
JP2010523806A (ja) * 2007-04-13 2010-07-15 スリーエム イノベイティブ プロパティズ カンパニー 静電気防止性の光学的に透明な感圧性接着剤
US9233063B2 (en) * 2009-12-17 2016-01-12 Air Products And Chemicals, Inc. Polymeric compositions for personal care products
TWI421514B (zh) * 2010-08-11 2014-01-01 Univ Shu Te 漏電顯示裝置
BR112014032247A2 (pt) 2012-06-21 2018-05-02 3M Innovative Properties Co filme gravável a laser susceptível a dissipação estática:

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BE789556A (fr) * 1971-10-01 1973-03-29 Union Carbide Corp Element alcain de pile au zinc
US3861924A (en) * 1973-02-09 1975-01-21 Gaf Corp Improvement in viscosity of gelatin solutions for photosensitive materials
JPS589408B2 (ja) * 1974-02-13 1983-02-21 富士写真フイルム株式会社 写真感光材料
CA1078107A (en) * 1975-08-04 1980-05-27 Kimberly-Clark Corporation Anti-static composition
JPS5836893B2 (ja) * 1978-06-07 1983-08-12 富士写真フイルム株式会社 写真感光材料
JPS5974554A (ja) * 1982-10-21 1984-04-27 Fuji Photo Film Co Ltd 写真感光材料

Also Published As

Publication number Publication date
JPS6141143A (ja) 1986-02-27
CA1257086A (en) 1989-07-11
EP0170529A2 (de) 1986-02-05
EP0170529B1 (de) 1992-04-15
US4582781A (en) 1986-04-15
JPH0410054B2 (de) 1992-02-24
EP0170529A3 (en) 1989-03-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee